MX2011012667A - Vidrio que contiene sodio formable por fusion. - Google Patents

Vidrio que contiene sodio formable por fusion.

Info

Publication number
MX2011012667A
MX2011012667A MX2011012667A MX2011012667A MX2011012667A MX 2011012667 A MX2011012667 A MX 2011012667A MX 2011012667 A MX2011012667 A MX 2011012667A MX 2011012667 A MX2011012667 A MX 2011012667A MX 2011012667 A MX2011012667 A MX 2011012667A
Authority
MX
Mexico
Prior art keywords
containing glass
glasses
photovoltaic devices
sodium containing
fusion formable
Prior art date
Application number
MX2011012667A
Other languages
English (en)
Inventor
Bruce G Aitken
Timothy J Kiczenski
James E Dickinson Jr
Michelle D Pierson-Stull
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of MX2011012667A publication Critical patent/MX2011012667A/es

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • H01L31/03925Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including AIIBVI compound materials, e.g. CdTe, CdS
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B19/00Selenium; Tellurium; Compounds thereof
    • C01B19/007Tellurides or selenides of metals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264Inorganic materials
    • H01L31/0296Inorganic materials including, apart from doping material or other impurities, only AIIBVI compounds, e.g. CdS, ZnS, HgCdTe
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264Inorganic materials
    • H01L31/032Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
    • H01L31/0322Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • H01L31/03923Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including AIBIIICVI compound materials, e.g. CIS, CIGS
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/0445PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/40Electric properties
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/541CuInSe2 material PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/543Solar cells from Group II-VI materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Glass Compositions (AREA)
  • Photovoltaic Devices (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

Se describen vidrios de aluminosilicato y boroaluminosilicato que contienen sodio; los vidrios se pueden usar como substratos para dispositivos fotovoltaicos, por ejemplo, dispositivos fotovoltaicos de película delgada tales como los dispositivos fotovoltaicos de CIGS; estos vidrios se pueden caracterizar porque tienen un punto de deformación = 540 °C, coeficiente de expansión térmica de 6.5 ppm/°C a 9.5 ppm/°C y viscosidad de líquido mayor de 50,000 Poise; por lo tanto son ideales para ser formados en forma de lámina mediante el procedimiento de fusión.
MX2011012667A 2009-05-29 2010-05-27 Vidrio que contiene sodio formable por fusion. MX2011012667A (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US18238609P 2009-05-29 2009-05-29
US12/787,711 US9637408B2 (en) 2009-05-29 2010-05-26 Fusion formable sodium containing glass
PCT/US2010/036371 WO2010138698A2 (en) 2009-05-29 2010-05-27 Fusion formable sodium containing glass

Publications (1)

Publication Number Publication Date
MX2011012667A true MX2011012667A (es) 2011-12-16

Family

ID=43218847

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2011012667A MX2011012667A (es) 2009-05-29 2010-05-27 Vidrio que contiene sodio formable por fusion.

Country Status (12)

Country Link
US (2) US9637408B2 (es)
EP (1) EP2445845A2 (es)
JP (4) JP2012528071A (es)
KR (3) KR20120026577A (es)
CN (2) CN109264990A (es)
AU (1) AU2010253992A1 (es)
CA (1) CA2762873A1 (es)
MX (1) MX2011012667A (es)
RU (1) RU2011152979A (es)
SG (1) SG176267A1 (es)
TW (1) TWI565674B (es)
WO (1) WO2010138698A2 (es)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7593154B2 (en) * 2005-10-11 2009-09-22 Sage Electrochromics, Inc. Electrochromic devices having improved ion conducting layers
US9637408B2 (en) * 2009-05-29 2017-05-02 Corsam Technologies Llc Fusion formable sodium containing glass
FR2948356B1 (fr) 2009-07-22 2011-08-19 Saint Gobain Dispositif electrochrome
DE102010023366B4 (de) * 2010-06-10 2017-09-21 Schott Ag Verwendung von Gläsern für Photovoltaik-Anwendungen
US8492297B2 (en) * 2010-08-25 2013-07-23 Sage Electrochromics, Inc. Silica soda lime glass composition and use thereof
DE102010042945A1 (de) * 2010-10-26 2012-04-26 Schott Ag Transparente Schichtverbunde
US10343946B2 (en) 2010-10-26 2019-07-09 Schott Ag Highly refractive thin glasses
US10308545B2 (en) 2010-10-26 2019-06-04 Schott Ag Highly refractive thin glasses
FR2972446B1 (fr) 2011-03-09 2017-11-24 Saint Gobain Substrat pour cellule photovoltaique
EP2692706B1 (en) * 2011-03-31 2016-03-30 Nippon Sheet Glass Company, Limited Glass composition suitable for chemical strengthening and chemically strengthened glass article
US8889575B2 (en) * 2011-05-31 2014-11-18 Corning Incorporated Ion exchangeable alkali aluminosilicate glass articles
JP2013110396A (ja) * 2011-10-27 2013-06-06 Nippon Electric Glass Co Ltd 集光型太陽光発電装置用光学素子、その製造方法および集光型太陽光発電装置
TWI459869B (zh) * 2012-04-16 2014-11-01 Ind Tech Res Inst 軟性基板、複合層在太陽能電池之應用、及太陽能電池
JP2014097916A (ja) * 2012-11-16 2014-05-29 Nippon Electric Glass Co Ltd 薄膜太陽電池用ガラス板及びその製造方法
US11352287B2 (en) 2012-11-28 2022-06-07 Vitro Flat Glass Llc High strain point glass
JP6220053B2 (ja) * 2013-04-29 2017-10-25 コーニング インコーポレイテッド 太陽電池モジュールパッケージ
US9359244B2 (en) 2013-05-21 2016-06-07 Colorado School Of Mines Alumina-rich glasses and methods for making the same
DE102013109087B3 (de) * 2013-08-22 2015-02-19 Schott Ag Flachglas mit Filterwirkung, Verfahren zu seiner Herstellung, Verwendung sowie Schichtverbund
WO2015186486A1 (ja) * 2014-06-04 2015-12-10 旭硝子株式会社 導光板用のガラス板
US11097974B2 (en) 2014-07-31 2021-08-24 Corning Incorporated Thermally strengthened consumer electronic glass and related systems and methods
CA2972778C (en) * 2014-12-31 2019-09-10 Corning Incorporated Methods for thermally treating glass articles
BR112017014200A2 (pt) 2014-12-31 2018-03-06 Corning Incorporated ?métodos para tratamento de artigos de vidro?
GB201505091D0 (en) 2015-03-26 2015-05-06 Pilkington Group Ltd Glass
CN105565647A (zh) * 2015-12-14 2016-05-11 厦门博恩思应用材料科技有限公司 一种不完全熔合玻璃组及其制备方法
EP3402762B1 (en) 2016-01-12 2023-11-08 Corning Incorporated Thin thermally and chemically strengthened glass-based articles
CN105837030B (zh) * 2016-04-06 2019-04-19 东旭科技集团有限公司 一种玻璃用组合物和玻璃及其制备方法和应用
US11040907B2 (en) 2017-03-31 2021-06-22 Corning Incorporated High transmission glasses
CN107162407A (zh) * 2017-04-14 2017-09-15 中建材(宜兴)新能源有限公司 一种超薄光伏压延玻璃
KR102395627B1 (ko) * 2017-06-19 2022-05-09 코닝 인코포레이티드 내화 물품, 산화-환원 반응 방지 코팅용 조성물, 및 내화 물품의 제조 방법
CN109721246B (zh) * 2017-10-30 2021-12-07 浙江晶华玻璃有限公司 一种可耐1300摄氏度高温火抛不变形的玻璃瓶及其制备方法
TWI785156B (zh) * 2017-11-30 2022-12-01 美商康寧公司 具有高熱膨脹係數及對於熱回火之優先破裂行為的非離子交換玻璃
CA3085496A1 (en) 2017-12-19 2019-07-27 Ocv Intellectual Capital, Llc High performance fiberglass composition
CN113727954A (zh) 2019-04-23 2021-11-30 康宁股份有限公司 具有确定的应力分布曲线的玻璃层叠物及其制作方法
US11697617B2 (en) 2019-08-06 2023-07-11 Corning Incorporated Glass laminate with buried stress spikes to arrest cracks and methods of making the same
US20220363586A1 (en) * 2019-10-29 2022-11-17 Corning Incorporated Glass compositions with high modulus and large cte range for laminate structures
EP4077229A4 (en) * 2019-12-18 2024-01-31 Macquarie University ALUMINOSILICATE GLASS
US20230312395A1 (en) * 2020-05-27 2023-10-05 Corning Incorporated Non-iox glasses with high coefficient of thermal expansion and preferential fracture behavior for thermal tempering
WO2023244750A1 (en) * 2022-06-15 2023-12-21 Corning Incorporated Solar devices with borosilicate glass and methods of the same

Family Cites Families (71)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1968823A (en) * 1932-09-23 1934-08-07 Gen Electric Gaseous electric discharge lamp device
US4298389A (en) 1980-02-20 1981-11-03 Corning Glass Works High transmission glasses for solar applications
JPS58204839A (ja) 1982-05-24 1983-11-29 Toshiba Glass Co Ltd 感光性ガラス
US4455383A (en) * 1983-04-04 1984-06-19 Johnson & Johnson Dental Products Company Single-frit glass ceramic
EP0131399B1 (en) 1983-07-11 1987-04-01 Corning Glass Works Glass for cathode ray tube faceplate
JPS62187141A (ja) 1986-02-13 1987-08-15 Nippon Electric Glass Co Ltd 太陽電池カバ−用ガラス
US4734388A (en) 1986-11-04 1988-03-29 Corning Glass Works Glass for cathode ray tube faceplates
JPH06163955A (ja) * 1992-11-27 1994-06-10 Matsushita Electric Ind Co Ltd 太陽電池用基板及び太陽電池
JP3431279B2 (ja) * 1993-06-08 2003-07-28 旭テクノグラス株式会社 陽極接合に使用する低膨張ガラス
US5631195A (en) 1994-09-14 1997-05-20 Asahi Glass Company Ltd. Glass composition and substrate for plasma display
JP3831957B2 (ja) 1994-09-14 2006-10-11 旭硝子株式会社 ガラス組成物及びプラズマディスプレー用基板
CN1047158C (zh) * 1994-10-13 1999-12-08 圣戈班玻璃制造公司 增强的玻璃衬底
JP3666609B2 (ja) * 1995-06-26 2005-06-29 日本電気硝子株式会社 電灯用ガラス組成物
GB9525111D0 (en) * 1995-12-08 1996-02-07 Pilkington Plc Glass and glass products
JP3804115B2 (ja) 1996-01-24 2006-08-02 旭硝子株式会社 ガラス基板
EP0795522B1 (en) * 1996-03-14 1999-08-18 Asahi Glass Company Ltd. Glass composition for a substrate
JP4169013B2 (ja) 1996-03-14 2008-10-22 旭硝子株式会社 基板用ガラス組成物
JP3804159B2 (ja) * 1996-03-15 2006-08-02 旭硝子株式会社 ガラス基板およびpdp用ガラス基板
US5908794A (en) * 1996-03-15 1999-06-01 Asahi Glass Company Ltd. Glass composition for a substrate
US5994642A (en) 1996-05-28 1999-11-30 Matsushita Battery Industrial Co., Ltd. Method for preparing CdTe film and solar cell using the same
JP3867816B2 (ja) * 1996-07-12 2007-01-17 日本電気硝子株式会社 基板用ガラス
JPH10152339A (ja) 1996-09-27 1998-06-09 Nippon Sheet Glass Co Ltd 耐熱性ガラス組成物
JP3957348B2 (ja) * 1996-11-21 2007-08-15 日本板硝子株式会社 防火用板ガラス
KR100238117B1 (ko) * 1996-12-05 2000-01-15 박영구 프라즈마 영상표시판넬용 기판유리조성물
US6060168A (en) 1996-12-17 2000-05-09 Corning Incorporated Glasses for display panels and photovoltaic devices
FR2758550B1 (fr) * 1997-01-17 1999-02-12 Saint Gobain Vitrage Compositions de verre silico-sodo-calcique et leurs applications
DE19721738C1 (de) * 1997-05-24 1998-11-05 Schott Glas Aluminosilicatglas für flache Anzeigevorrichtungen und Verwendungen
JPH11135819A (ja) 1997-10-31 1999-05-21 Matsushita Electric Ind Co Ltd 化合物薄膜太陽電池
JPH11180728A (ja) 1997-12-22 1999-07-06 Central Glass Co Ltd ディスプレイ装置用基板ガラス組成物
JPH11180727A (ja) 1997-12-22 1999-07-06 Central Glass Co Ltd 表示装置用基板ガラス組成物
JPH11310433A (ja) 1998-04-27 1999-11-09 Central Glass Co Ltd 表示装置用基板ガラス
JPH11335133A (ja) 1998-05-27 1999-12-07 Central Glass Co Ltd 表示装置用基板ガラス
TW565539B (en) * 1998-08-11 2003-12-11 Asahi Glass Co Ltd Glass for a substrate
JP3465642B2 (ja) 1998-09-04 2003-11-10 日本板硝子株式会社 淡色高透過ガラスおよびその製造方法
US6017838A (en) * 1998-09-10 2000-01-25 Osram Sylvania Inc. Lead free soft glass having high electrical resistivity
JP2000128572A (ja) 1998-10-26 2000-05-09 Nippon Electric Glass Co Ltd 硼珪酸ガラス及びその製造方法
CN1275889C (zh) * 1998-11-30 2006-09-20 康宁股份有限公司 用于平板显示器的玻璃
JP2000203871A (ja) * 1999-01-18 2000-07-25 Nippon Electric Glass Co Ltd 照明用ガラス、照明用着色ガラスバルブの製造方法及び照明用着色ガラスバルブ
US6207603B1 (en) 1999-02-05 2001-03-27 Corning Incorporated Solar cell cover glass
DE19936699C2 (de) * 1999-08-04 2001-10-31 Nachtmann F X Bleikristall Blei- und bariumfreies Kristallglas
DE19942259C1 (de) 1999-09-04 2001-05-17 Schott Glas Erdalkalialuminoborosilicatglas und dessen Verwendungen
AU2761001A (en) 2000-01-05 2001-07-16 Schott Glass Technologies, Inc. Alkaline-earth-free boroalkali silicate glass
DE10005088C1 (de) 2000-02-04 2001-03-15 Schott Glas Alkalihaltiges Aluminoborosilicatglas und seine Verwendung
JP2002025762A (ja) 2000-07-04 2002-01-25 Nippon Electric Glass Co Ltd 無機elディスプレイガラス基板
JP2002053340A (ja) 2000-08-09 2002-02-19 Nippon Electric Glass Co Ltd 無機elディスプレイガラス基板
JP2004516262A (ja) * 2000-12-21 2004-06-03 ネクター セラピューティクス 親水性活性剤を含有するマイクロ粒子の製造のための誘発相転移法
JP5088914B2 (ja) * 2001-06-28 2012-12-05 日本電気硝子株式会社 半導体封入用ガラス及び半導体封入用外套管
JP2003040643A (ja) * 2001-07-26 2003-02-13 Asahi Techno Glass Corp 照明用ガラス組成物
DE10141666A1 (de) 2001-08-25 2003-03-13 Schott Glas Zinkhaltiges Alkalialuminosilicatglas und seine Verwendungen
US6753279B2 (en) 2001-10-30 2004-06-22 Corning Incorporated Glass composition for display panels
JP2003261352A (ja) 2002-03-08 2003-09-16 Asahi Techno Glass Corp ディスプレイ用ガラスおよびディスプレイ用ガラス部品
US6992030B2 (en) 2002-08-29 2006-01-31 Corning Incorporated Low-density glass for flat panel display substrates
JP2004131314A (ja) 2002-10-09 2004-04-30 Asahi Glass Co Ltd 透明導電膜付き化学強化ガラス基板、およびその製造方法
JP4320772B2 (ja) 2003-02-13 2009-08-26 日本電気硝子株式会社 フラットパネルディスプレイ装置用ガラス基板
JP4371841B2 (ja) * 2004-02-09 2009-11-25 Hoya株式会社 半導体パッケージ用窓材ガラス
KR20070083838A (ko) * 2004-09-29 2007-08-24 니폰 덴키 가라스 가부시키가이샤 반도체 밀봉용 유리 및 반도체 밀봉용 외투관 및 반도체전자 부품
JP4716245B2 (ja) 2004-11-11 2011-07-06 日本電気硝子株式会社 ガラス基板及びその製造方法
JP2007123507A (ja) * 2005-10-27 2007-05-17 Kyocera Corp セラミック多層配線基板の製造方法
US8007913B2 (en) * 2006-02-10 2011-08-30 Corning Incorporated Laminated glass articles and methods of making thereof
US8389852B2 (en) 2006-02-22 2013-03-05 Guardian Industries Corp. Electrode structure for use in electronic device and method of making same
WO2007138986A1 (ja) * 2006-05-25 2007-12-06 Nippon Electric Glass Co., Ltd. 強化ガラス及びその製造方法
JP2008280189A (ja) 2007-05-08 2008-11-20 Nippon Electric Glass Co Ltd 太陽電池用ガラス基板およびその製造方法
US8349454B2 (en) * 2007-06-07 2013-01-08 Nippon Electric Glass Co., Ltd. Strengthened glass substrate and process for producing the same
US20080308146A1 (en) 2007-06-14 2008-12-18 Guardian Industries Corp. Front electrode including pyrolytic transparent conductive coating on textured glass substrate for use in photovoltaic device and method of making same
JP5467490B2 (ja) 2007-08-03 2014-04-09 日本電気硝子株式会社 強化ガラス基板の製造方法及び強化ガラス基板
JP5743125B2 (ja) 2007-09-27 2015-07-01 日本電気硝子株式会社 強化ガラス及び強化ガラス基板
WO2009154314A1 (ja) 2008-06-17 2009-12-23 日本電気硝子株式会社 太陽電池用基板および色素増感型太陽電池用酸化物半導体電極
TWI387468B (zh) 2008-06-26 2013-03-01 Nan Hui Yeh 生醫玻璃陶瓷材料之製造方法
JP5867953B2 (ja) 2008-06-27 2016-02-24 日本電気硝子株式会社 強化ガラスおよび強化用ガラス
CN101428966A (zh) 2008-12-05 2009-05-13 北京工业大学 适用于电光源的硼硅玻璃
US9637408B2 (en) * 2009-05-29 2017-05-02 Corsam Technologies Llc Fusion formable sodium containing glass

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WO2010138698A3 (en) 2011-01-20
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CN109264990A (zh) 2019-01-25
JP2019006677A (ja) 2019-01-17
KR20120026577A (ko) 2012-03-19
KR20180120783A (ko) 2018-11-06
AU2010253992A1 (en) 2012-02-02
US20170250296A1 (en) 2017-08-31
US20100300535A1 (en) 2010-12-02
WO2010138698A2 (en) 2010-12-02
RU2011152979A (ru) 2013-07-10
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CA2762873A1 (en) 2010-12-02
TWI565674B (zh) 2017-01-11
US9637408B2 (en) 2017-05-02
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KR101914400B1 (ko) 2018-11-01
EP2445845A2 (en) 2012-05-02

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