KR970013143A - 본딩용 금합금 세선 및 그 제조방법 - Google Patents
본딩용 금합금 세선 및 그 제조방법 Download PDFInfo
- Publication number
- KR970013143A KR970013143A KR1019950036609A KR19950036609A KR970013143A KR 970013143 A KR970013143 A KR 970013143A KR 1019950036609 A KR1019950036609 A KR 1019950036609A KR 19950036609 A KR19950036609 A KR 19950036609A KR 970013143 A KR970013143 A KR 970013143A
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- South Korea
- Prior art keywords
- gold alloy
- kgf
- young
- modulus
- elongation
- Prior art date
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- 229910001020 Au alloy Inorganic materials 0.000 title claims abstract description 11
- 239000003353 gold alloy Substances 0.000 title claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 title claims abstract 3
- 239000004065 semiconductor Substances 0.000 claims abstract 4
- 229910052693 Europium Inorganic materials 0.000 claims abstract 3
- 229910052790 beryllium Inorganic materials 0.000 claims abstract 3
- 238000005266 casting Methods 0.000 claims abstract 3
- 229910052746 lanthanum Inorganic materials 0.000 claims abstract 3
- 229910052763 palladium Inorganic materials 0.000 claims abstract 3
- 238000007747 plating Methods 0.000 claims abstract 3
- 229910052697 platinum Inorganic materials 0.000 claims abstract 3
- 229910052727 yttrium Inorganic materials 0.000 claims abstract 3
- 238000000034 method Methods 0.000 claims description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 6
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000000155 melt Substances 0.000 claims 1
- 239000000956 alloy Substances 0.000 abstract 1
- 229910045601 alloy Inorganic materials 0.000 abstract 1
- 230000006866 deterioration Effects 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 1
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- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
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- C22C5/00—Alloys based on noble metals
- C22C5/02—Alloys based on gold
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Abstract
반도체장치의 소형화, 고밀도화의 대응에 극히 유용한 반도체칩의 본딩용 금합금 세선 및 그 제조방법을 제공한다. 고순도금에 Pt, Pd, Be, Ge, Ca, La, Y, Eu를 규정량 함유하고, 또한 신장률3∼8%, 영률 6800∼9000kgf/㎟의 금합금 세선으로 하였으므로, 선의 지름이 작아도 강도가 높으므로 배선시나 사용중의 단선의 비율이 적고, 고온방치 후의 접합강도의 열화가 작으며, 진동을 받은 때의 단선을 억제할 수 있다. 용해주조공정에서, 본 발명의 조성으로 되는 금합금의 녹인 용액(1)을 도가니(2)내에서 도가니 하단으로부터 상단으로 향해서 냉각하므로서, 전기한 합금조성에서 또한 신장률이 3∼8%, 영률이 6800∼9000kgf/㎟의 금합금 세선을 확실 또한 비교적 쉽게 얻을 수 있다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 관한 본딩용 금합금 세선의 잉곳을 얻는 방법의 일례를 표시하는 간략도
Claims (2)
- 고속도금에 백금(Pt), 팔라듐(Pd)중에서 적어도 1종을 0.1∼2.2중량% 함유하고, 더욱 Be, Ge, Ca, La, Y, Eu 중에서 적어도 1종을 0.0001∼0.005중량% 함유하여, 또 신장률이 3∼8%, 영률이 6800∼9000kgf/㎟인 것을 특징으로 하는 반도체 칩 본딩용 금합금 세선.
- 고속도금에 백금(Pt), 팔라듐(Pd)중에서 적어도 1종을 0.1∼2.2중량% 함유하고, 더욱 Be, Ge, Ca, La, Y, Eu 중에서 적어도 1종을 0.0001∼0.005중량% 함유하는 금합금을 용해주조하여 얻어진 잉곳에 거칠은 가공(粗加工), 신선(伸線)가공, 열처리를 실시하여 금합금 세선을 제조하는 방법에 있어서, 전기한 용해주조방법이, 용해된 금합금을 도가니의 하단으로부터 상단을 향해서 도가니 내에서 냉각하는 것을 특징으로 하는 신장률이 3∼8%, 영률이 6800∼9000kgf/㎟인 반도체칩 본딩용 금합금 세선의 제조방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019990034335A KR100273702B1 (ko) | 1995-08-23 | 1999-08-19 | 본딩용 금합금 세선의 제조방법 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21478895A JP3367544B2 (ja) | 1995-08-23 | 1995-08-23 | ボンディング用金合金細線及びその製造方法 |
JP95-214788 | 1995-08-23 |
Related Child Applications (1)
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KR1019990034335A Division KR100273702B1 (ko) | 1995-08-23 | 1999-08-19 | 본딩용 금합금 세선의 제조방법 |
Publications (1)
Publication Number | Publication Date |
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KR970013143A true KR970013143A (ko) | 1997-03-29 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1019950036609A KR970013143A (ko) | 1995-08-23 | 1995-10-23 | 본딩용 금합금 세선 및 그 제조방법 |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0761831B1 (ko) |
JP (1) | JP3367544B2 (ko) |
KR (1) | KR970013143A (ko) |
DE (1) | DE69613291T2 (ko) |
SG (1) | SG54359A1 (ko) |
TW (1) | TW287310B (ko) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3328135B2 (ja) * | 1996-05-28 | 2002-09-24 | 田中電子工業株式会社 | バンプ形成用金合金線及びバンプ形成方法 |
DE19733954A1 (de) * | 1997-07-07 | 1999-01-14 | Heraeus Gmbh W C | Feinstdraht aus einer Goldlegierung, Verfahren zu seiner Herstellung und seine Verwendung |
EP0890987B1 (de) * | 1997-07-07 | 2003-03-05 | W.C. Heraeus GmbH & Co. KG | Feinstdraht aus einer Goldlegierung, Verfahren zu seiner Herstellung und seine Verwendung |
DE19753055B4 (de) * | 1997-11-29 | 2005-09-15 | W.C. Heraeus Gmbh | Feinstdraht aus einer Gold-Legierung, Verfahren zu seiner Herstellung und seine Verwendung |
DE19821395C2 (de) | 1998-05-13 | 2000-06-29 | Heraeus Gmbh W C | Verwendung eines Feinstdrahtes aus einer nickelhaltigen Gold-Legierung |
US6785912B1 (en) * | 2003-01-24 | 2004-09-07 | Burt V. Julio | Ion toilet seat |
JP2004257950A (ja) * | 2003-02-27 | 2004-09-16 | Denso Corp | 半導体圧力センサ |
EP1830398A4 (en) * | 2004-11-26 | 2012-06-06 | Tanaka Electronics Ind | AU BONDING WIRE FOR A SEMICONDUCTOR ELEMENT |
JP4596467B2 (ja) * | 2005-06-14 | 2010-12-08 | 田中電子工業株式会社 | 高い接合信頼性、圧着ボールの高い真円性、高い直進性および高い耐樹脂流れ性を有するボンディングワイヤ用金合金線 |
JP4726206B2 (ja) * | 2005-06-14 | 2011-07-20 | 田中電子工業株式会社 | 高い初期接合性、高い接合信頼性、圧着ボールの高い真円性、高い直進性、高い耐樹脂流れ性および低い比抵抗を有するボンディングワイヤ用金合金線 |
JP4726205B2 (ja) * | 2005-06-14 | 2011-07-20 | 田中電子工業株式会社 | 高い初期接合性、高い接合信頼性、圧着ボールの高い真円性、高い直進性および高い耐樹脂流れ性を有するボンディングワイヤ用金合金線 |
DE102006006728A1 (de) * | 2006-02-13 | 2007-08-23 | W.C. Heraeus Gmbh | Bonddraht |
JP5240890B2 (ja) * | 2006-08-07 | 2013-07-17 | 田中電子工業株式会社 | 高い初期接合性、高い接合信頼性、圧着ボールの高い真円性、高いループ制御性および低い比抵抗を有するボンディングワイヤ用金合金線 |
JP5403436B2 (ja) * | 2010-10-08 | 2014-01-29 | タツタ電線株式会社 | ボールボンディング用ワイヤ |
KR101288854B1 (ko) * | 2011-04-08 | 2013-07-23 | 한국기계연구원 | 박판 주조된 알루미늄 합금을 이용한 브레이징용 고강도 클래드 판재의 제조 방법 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
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FR2530512A1 (fr) * | 1982-07-23 | 1984-01-27 | Schissler Jean Marie | Fabrication de pieces moulees maintenues en temperature par chauffage pour traitement thermique ulterieur |
JP2737953B2 (ja) * | 1988-09-29 | 1998-04-08 | 三菱マテリアル株式会社 | 金バンプ用金合金細線 |
GB2231336B (en) * | 1989-04-28 | 1993-09-22 | Tanaka Electronics Ind | Gold wire for the bonding of a semiconductor device |
EP0530968A1 (en) * | 1991-08-29 | 1993-03-10 | General Electric Company | Method for directional solidification casting of a titanium aluminide |
JP3090548B2 (ja) * | 1992-09-30 | 2000-09-25 | 田中電子工業株式会社 | 半導体素子用ボンディング線 |
JPH06112251A (ja) * | 1992-09-30 | 1994-04-22 | Tanaka Denshi Kogyo Kk | 半導体素子用ボンディング線 |
-
1995
- 1995-08-23 JP JP21478895A patent/JP3367544B2/ja not_active Expired - Fee Related
- 1995-09-29 TW TW084110153A patent/TW287310B/zh not_active IP Right Cessation
- 1995-10-23 KR KR1019950036609A patent/KR970013143A/ko active Search and Examination
-
1996
- 1996-07-02 DE DE69613291T patent/DE69613291T2/de not_active Expired - Lifetime
- 1996-07-02 EP EP96304889A patent/EP0761831B1/en not_active Expired - Lifetime
- 1996-08-15 SG SG1996010457A patent/SG54359A1/en unknown
Also Published As
Publication number | Publication date |
---|---|
SG54359A1 (en) | 1998-11-16 |
EP0761831B1 (en) | 2001-06-13 |
JPH0964082A (ja) | 1997-03-07 |
DE69613291D1 (de) | 2001-07-19 |
TW287310B (en) | 1996-10-01 |
JP3367544B2 (ja) | 2003-01-14 |
EP0761831A1 (en) | 1997-03-12 |
DE69613291T2 (de) | 2002-05-02 |
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