KR970013143A - 본딩용 금합금 세선 및 그 제조방법 - Google Patents

본딩용 금합금 세선 및 그 제조방법 Download PDF

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KR970013143A
KR970013143A KR1019950036609A KR19950036609A KR970013143A KR 970013143 A KR970013143 A KR 970013143A KR 1019950036609 A KR1019950036609 A KR 1019950036609A KR 19950036609 A KR19950036609 A KR 19950036609A KR 970013143 A KR970013143 A KR 970013143A
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gold alloy
kgf
young
modulus
elongation
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KR1019950036609A
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이치미쭈 이타바시
토시타카 미무라
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사토오 케이지
타나카 덴시 코오교오 카부시키가이샤
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Publication of KR970013143A publication Critical patent/KR970013143A/ko
Priority to KR1019990034335A priority Critical patent/KR100273702B1/ko

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Abstract

반도체장치의 소형화, 고밀도화의 대응에 극히 유용한 반도체칩의 본딩용 금합금 세선 및 그 제조방법을 제공한다. 고순도금에 Pt, Pd, Be, Ge, Ca, La, Y, Eu를 규정량 함유하고, 또한 신장률3∼8%, 영률 6800∼9000kgf/㎟의 금합금 세선으로 하였으므로, 선의 지름이 작아도 강도가 높으므로 배선시나 사용중의 단선의 비율이 적고, 고온방치 후의 접합강도의 열화가 작으며, 진동을 받은 때의 단선을 억제할 수 있다. 용해주조공정에서, 본 발명의 조성으로 되는 금합금의 녹인 용액(1)을 도가니(2)내에서 도가니 하단으로부터 상단으로 향해서 냉각하므로서, 전기한 합금조성에서 또한 신장률이 3∼8%, 영률이 6800∼9000kgf/㎟의 금합금 세선을 확실 또한 비교적 쉽게 얻을 수 있다.

Description

본딩용 금합금 세선 및 그 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 관한 본딩용 금합금 세선의 잉곳을 얻는 방법의 일례를 표시하는 간략도

Claims (2)

  1. 고속도금에 백금(Pt), 팔라듐(Pd)중에서 적어도 1종을 0.1∼2.2중량% 함유하고, 더욱 Be, Ge, Ca, La, Y, Eu 중에서 적어도 1종을 0.0001∼0.005중량% 함유하여, 또 신장률이 3∼8%, 영률이 6800∼9000kgf/㎟인 것을 특징으로 하는 반도체 칩 본딩용 금합금 세선.
  2. 고속도금에 백금(Pt), 팔라듐(Pd)중에서 적어도 1종을 0.1∼2.2중량% 함유하고, 더욱 Be, Ge, Ca, La, Y, Eu 중에서 적어도 1종을 0.0001∼0.005중량% 함유하는 금합금을 용해주조하여 얻어진 잉곳에 거칠은 가공(粗加工), 신선(伸線)가공, 열처리를 실시하여 금합금 세선을 제조하는 방법에 있어서, 전기한 용해주조방법이, 용해된 금합금을 도가니의 하단으로부터 상단을 향해서 도가니 내에서 냉각하는 것을 특징으로 하는 신장률이 3∼8%, 영률이 6800∼9000kgf/㎟인 반도체칩 본딩용 금합금 세선의 제조방법.
KR1019950036609A 1995-08-23 1995-10-23 본딩용 금합금 세선 및 그 제조방법 KR970013143A (ko)

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Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3328135B2 (ja) * 1996-05-28 2002-09-24 田中電子工業株式会社 バンプ形成用金合金線及びバンプ形成方法
DE19733954A1 (de) * 1997-07-07 1999-01-14 Heraeus Gmbh W C Feinstdraht aus einer Goldlegierung, Verfahren zu seiner Herstellung und seine Verwendung
EP0890987B1 (de) * 1997-07-07 2003-03-05 W.C. Heraeus GmbH & Co. KG Feinstdraht aus einer Goldlegierung, Verfahren zu seiner Herstellung und seine Verwendung
DE19753055B4 (de) * 1997-11-29 2005-09-15 W.C. Heraeus Gmbh Feinstdraht aus einer Gold-Legierung, Verfahren zu seiner Herstellung und seine Verwendung
DE19821395C2 (de) 1998-05-13 2000-06-29 Heraeus Gmbh W C Verwendung eines Feinstdrahtes aus einer nickelhaltigen Gold-Legierung
US6785912B1 (en) * 2003-01-24 2004-09-07 Burt V. Julio Ion toilet seat
JP2004257950A (ja) * 2003-02-27 2004-09-16 Denso Corp 半導体圧力センサ
EP1830398A4 (en) * 2004-11-26 2012-06-06 Tanaka Electronics Ind AU BONDING WIRE FOR A SEMICONDUCTOR ELEMENT
JP4596467B2 (ja) * 2005-06-14 2010-12-08 田中電子工業株式会社 高い接合信頼性、圧着ボールの高い真円性、高い直進性および高い耐樹脂流れ性を有するボンディングワイヤ用金合金線
JP4726206B2 (ja) * 2005-06-14 2011-07-20 田中電子工業株式会社 高い初期接合性、高い接合信頼性、圧着ボールの高い真円性、高い直進性、高い耐樹脂流れ性および低い比抵抗を有するボンディングワイヤ用金合金線
JP4726205B2 (ja) * 2005-06-14 2011-07-20 田中電子工業株式会社 高い初期接合性、高い接合信頼性、圧着ボールの高い真円性、高い直進性および高い耐樹脂流れ性を有するボンディングワイヤ用金合金線
DE102006006728A1 (de) * 2006-02-13 2007-08-23 W.C. Heraeus Gmbh Bonddraht
JP5240890B2 (ja) * 2006-08-07 2013-07-17 田中電子工業株式会社 高い初期接合性、高い接合信頼性、圧着ボールの高い真円性、高いループ制御性および低い比抵抗を有するボンディングワイヤ用金合金線
JP5403436B2 (ja) * 2010-10-08 2014-01-29 タツタ電線株式会社 ボールボンディング用ワイヤ
KR101288854B1 (ko) * 2011-04-08 2013-07-23 한국기계연구원 박판 주조된 알루미늄 합금을 이용한 브레이징용 고강도 클래드 판재의 제조 방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2530512A1 (fr) * 1982-07-23 1984-01-27 Schissler Jean Marie Fabrication de pieces moulees maintenues en temperature par chauffage pour traitement thermique ulterieur
JP2737953B2 (ja) * 1988-09-29 1998-04-08 三菱マテリアル株式会社 金バンプ用金合金細線
GB2231336B (en) * 1989-04-28 1993-09-22 Tanaka Electronics Ind Gold wire for the bonding of a semiconductor device
EP0530968A1 (en) * 1991-08-29 1993-03-10 General Electric Company Method for directional solidification casting of a titanium aluminide
JP3090548B2 (ja) * 1992-09-30 2000-09-25 田中電子工業株式会社 半導体素子用ボンディング線
JPH06112251A (ja) * 1992-09-30 1994-04-22 Tanaka Denshi Kogyo Kk 半導体素子用ボンディング線

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