KR960035662A - 스테이지 장치 - Google Patents

스테이지 장치 Download PDF

Info

Publication number
KR960035662A
KR960035662A KR1019950053306A KR19950053306A KR960035662A KR 960035662 A KR960035662 A KR 960035662A KR 1019950053306 A KR1019950053306 A KR 1019950053306A KR 19950053306 A KR19950053306 A KR 19950053306A KR 960035662 A KR960035662 A KR 960035662A
Authority
KR
South Korea
Prior art keywords
damping
base
movable member
deviation
damping force
Prior art date
Application number
KR1019950053306A
Other languages
English (en)
Inventor
스스무 마키노우찌
Original Assignee
오노 시게오
니콘 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 오노 시게오, 니콘 주식회사 filed Critical 오노 시게오
Publication of KR960035662A publication Critical patent/KR960035662A/ko

Links

Classifications

    • G—PHYSICS
    • G12—INSTRUMENT DETAILS
    • G12B—CONSTRUCTIONAL DETAILS OF INSTRUMENTS, OR COMPARABLE DETAILS OF OTHER APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G12B5/00—Adjusting position or attitude, e.g. level, of instruments or other apparatus, or of parts thereof; Compensating for the effects of tilting or acceleration, e.g. for optical apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
    • G05B19/19—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
    • G05B19/21—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path using an incremental digital measuring device
    • G05B19/23—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path using an incremental digital measuring device for point-to-point control
    • G05B19/231—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path using an incremental digital measuring device for point-to-point control the positional error is used to control continuously the servomotor according to its magnitude
    • G05B19/232—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path using an incremental digital measuring device for point-to-point control the positional error is used to control continuously the servomotor according to its magnitude with speed feedback only
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/37—Measurements
    • G05B2219/37275—Laser, interferometer
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/41—Servomotor, servo controller till figures
    • G05B2219/41117—Cancel vibration during positioning of slide
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/41—Servomotor, servo controller till figures
    • G05B2219/41165—Compensation corrected by second servo independent from main servo
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/41—Servomotor, servo controller till figures
    • G05B2219/41327—Linear induction motor
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/41—Servomotor, servo controller till figures
    • G05B2219/41337—Linear drive motor, voice coil
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/45—Nc applications
    • G05B2219/45026—Circuit board, pcb

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Human Computer Interaction (AREA)
  • Manufacturing & Machinery (AREA)
  • Automation & Control Theory (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Details Of Measuring And Other Instruments (AREA)

Abstract

스테이지 장치는 베이스, 베이스에 이동가능하게 제공된 가동부재, 댐핑력을 가동 부재에 제공되는 댐핑계, 베이스에 대한 가동부재의 위치를 검출하는 위치 검출기, 위치 검출기에 의한 검출 결과에 의거해서 가동 부재의 목표 위치로부터 가동 부재의 위치 편차를 구하는 편차 검출기 및, 상기 편차 검출기에 의해 검출된 편차에 따라 댐핑력을 변화시키는 댐핑 제어계를 포함한다.ㅣ

Description

스테이지 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 따른 스테이지 장치의 일 실시예를 도시하는 사시도, 제2도는 제1도 중에서 시료대(1: sample stage)를 X방향으로 구동하는 스테이지 기구 및 이 스테이지 기구의 제어계(control system)의 구성을 도시하는 도면.

Claims (8)

  1. 베이스, 베이스에 이동가능하게 제공된 가동부재, 상기 가동부재를 베이스에 대해 이동시키는 구동계, 댐핑력을 가동 부재에 제공하는 댐핑계, 베이스에 대한 가동부재의 위치를 검출하는 위치 검출기, 위치 검출기에 의한 검출 결과에 의거해서 가동 부재의 목표 위치로부터 가동 부재의 위치 편차를구하는 편차 검출기 및, 상기 편차 검출기에 의해 검출된 편차에 따라 댐핑력을 변화시키는 댐핑 제어계를 포함하는 것을 특징으로 하는 스테이지 장치.
  2. 제1항에 있어서, 댐핑계는 리니어 모터인 것을 특징으로 하는 스테이지 장치.
  3. 제1항에 있어서, 댐핑 제어게는 보다 큰 편차로 댐핑력을 보다 작게하는 것을 특징으로 하는 스테이지 장치.
  4. 제1항에 있어서, 댐핑 제어계는 편차가 감소할수록 댐핑력을 단계적으로 증가기키는 것을 특징으로 하는 스테이지 장치.
  5. 제1항에 있어서, 댐핑 제어계는 편차가 감소할수록 댐핑력을 연속적으로 증가시키는 것을 특징으로 하는 스테이지 장치.
  6. 제1항에 있어서, 댐핑 제어계는 편차에 따라 댐핑계수를 변화시키는 것을 특징으로 하는 스테이지 장치.
  7. 베이스, 베이스상에 이동가능하게 제공된 가동부재, 가동부재를 베이스에 대해 이동시키는구동계, 댐핑력을 가동부재에 제공하는 댐핑계, 베이스상의 가동부재의 목표 위치로부터 편차에 따라 가동부재에 제공된 댐핑력을 변화시키는 댐핑 제어계를 포함하는 것을 특징으로 하는 스테이지 장치.
  8. 베이스, 기판에 장착되어 베이스상에 이동 가능하게 제공된 테이블, 테이블을 베이스에 대해 이동시키는 구동게, 댐핑력을 테이블에 제공하는 댐핑계 및, 베이스상의 목표 위치로부터 테이블의 편차에 따라 테이블 부재에 제공된 댐핑력을 변화시키는 댐핑 제어게를 포함하는 것을 특징으로 하는 마이크 패턴을 기판상에 전사하는 노광 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019950053306A 1995-03-07 1995-12-21 스테이지 장치 KR960035662A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP95-047175 1995-03-07
JP04717595A JP3536229B2 (ja) 1995-03-07 1995-03-07 ステージ装置、露光装置、及び位置決め方法

Publications (1)

Publication Number Publication Date
KR960035662A true KR960035662A (ko) 1996-10-24

Family

ID=12767745

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950053306A KR960035662A (ko) 1995-03-07 1995-12-21 스테이지 장치

Country Status (3)

Country Link
US (1) US5714860A (ko)
JP (1) JP3536229B2 (ko)
KR (1) KR960035662A (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1027851C2 (nl) * 2004-12-22 2006-06-27 Assembleon Nv Werkwijze voor het regelen van een dynamisch systeem alsmede een dergelijke inrichting.
GB0605346D0 (en) * 2006-03-16 2006-04-26 Airbus Uk Ltd Feedback control system
US7453228B2 (en) * 2006-04-07 2008-11-18 Asml Netherlands B.V. Method for controlling a positioning device, positioning device, and lithographic apparatus provided with a positioning device
JP5034917B2 (ja) * 2007-12-10 2012-09-26 株式会社ニコン ステージ装置、露光装置、およびステージ装置の制御方法
EP2174748B1 (de) * 2008-10-10 2011-06-29 Siemens Aktiengesellschaft Werkzeugmaschine und Verfahren zur Dämpfung von Schwingbewegungen eines Maschinenelements einer Werkzeugmaschine
JP5308249B2 (ja) * 2009-06-22 2013-10-09 三菱重工業株式会社 サーボ制御装置
JP5634059B2 (ja) * 2009-12-22 2014-12-03 株式会社ソディック 移動装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3434025A (en) * 1966-08-23 1969-03-18 Northern Electric Co Drive system employing dual motors
US4007412A (en) * 1974-03-25 1977-02-08 The Bendix Corporation Combined means for sensing an inertial condition and for providing torquing and damping functions
US3940676A (en) * 1974-10-11 1976-02-24 Electroglas, Inc. Damping control for positioning apparatus
US4591772A (en) * 1984-12-12 1986-05-27 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Load positioning system with gravity compensation
US4890023A (en) * 1985-02-19 1989-12-26 Hinds Walter E Linear induction motor systems
US5301875A (en) * 1990-06-19 1994-04-12 Cummins Engine Company, Inc. Force balanced electronically controlled fuel injector
JPH05111293A (ja) * 1991-10-15 1993-04-30 Mitsubishi Electric Corp 回転角度切換装置
US5223778A (en) * 1992-09-16 1993-06-29 Allen-Bradley Company, Inc. Automatic tuning apparatus for PID controllers
JP3277581B2 (ja) * 1993-02-01 2002-04-22 株式会社ニコン ステージ装置および露光装置
US5572558A (en) * 1994-11-17 1996-11-05 Cirrus Logic, Inc. PID loop filter for timing recovery in a sampled amplitude read channel
JP3448991B2 (ja) * 1994-11-29 2003-09-22 株式会社ニコン ステージ移動制御装置、投影型露光装置およびステージ駆動方法ならびに露光方法。

Also Published As

Publication number Publication date
JP3536229B2 (ja) 2004-06-07
JPH08248157A (ja) 1996-09-27
US5714860A (en) 1998-02-03

Similar Documents

Publication Publication Date Title
KR910005349A (ko) 입력 장치
KR920001308A (ko) 정보입력장치
DE69233546D1 (de) Testvorrichtung mit opponierbaren Elementen
KR910008528A (ko) 위치결정 장치
KR950005315A (ko) 기울기에 따라 화면을 스크롤링시키는 소형 정보처리장치 및 방법
EP1524590A3 (en) Tracking motion using an interference pattern
KR970067035A (ko) 차량의 위치를 테스트하기 위한 측정 시스템 및 그를 위한 감지 기구
KR870010379A (ko) 독립선형 크기 측정 장치용 감지장치
KR880002743A (ko) 전기 체인 블록의 작동장치
KR960035662A (ko) 스테이지 장치
KR920008516A (ko) 렌즈경통(鏡筒)의 초기위치검출장치
DE69011907D1 (de) Positionserfassungseinrichtung für eine lineare Führung.
KR920700390A (ko) 위치결정테이블
KR900018710A (ko) 광학계의 구동장치
ATE221163T1 (de) Verbesserter torantrieb
IT1231293B (it) Telecoordinometro.
KR910007402A (ko) 전자부품 장착장치
WO2005015131A3 (de) Messvorrichtung und verfahren zur erfassung der position eines elektrisch leitfähigen messobjekts
KR890015062A (ko) 촛점 제어장치
KR960043081A (ko) 측정 스테이지
KR930701002A (ko) 지시장치
KR970053308A (ko) 반도체 웨이퍼 로딩 플레이트
KR960013875A (ko) 와이퍼스위치의 접점상태 실험장치
KR970014870A (ko) 코킹 장치
KR970039593A (ko) 압력 감지장치 및 에어백 구동장치

Legal Events

Date Code Title Description
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid