KR950014987A - Resist Composition and Method of Forming Resist Pattern - Google Patents

Abstract

(A) a compound capable of producing an acid by irradiation with actinic rays, a structural unit having a group unstable to an acid (B), and in the presence of an acid derived from the compound (A), the group is decomposed to become alkali-soluble A resist composition containing a polymer and (C) a phenol compound, and a method of forming a resist pattern using the resist composition are provided.

Description

Resist Composition and Method of Forming Resist Pattern

Since this is an open matter, no full text was included.

Claims (18)

A polymer having (A) a compound capable of producing an acid by irradiation with actinic rays, a structural unit having a group unstable to an acid (B), and which is decomposed in the presence of an acid derived from the compound (A) to become alkali-soluble And (C) a resist composition containing a phenolic compound. The structural unit according to claim 1, wherein the polymer (B) has at least one structural unit selected from the structural units represented by the following general formulas (I), (II) and (III) as the structural unit having an unstable group to an acid. It contains a resist composition. [Wherein, R ¹ and R ² are the same as or different from each other, and are a hydrogen atom, a halogen atom, a cyano group, an alkyl group having 1 to 5 carbon atoms, or a substituted alkyl group having 1 to 5 carbon atoms, and R ³ is a linear acetal group or a cyclic An acetal group, a carbonate group or -OR ⁹ . With the proviso that R ⁹ or ^Wherein , in these formulas, R 1 ^O , R ¹¹ , R ^l2 , R ^l3 , R ^l4 and R ^l5 each independently represent a straight chain alkyl group, a substituted straight chain alkyl group, a branched chain alkyl group, a substituted side chain alkyl group, a cycloalkyl group, a substituted cycloalkyl group, and an alken. Or a substituted alkenyl group, an aryl group, a substituted aryl group, an aralkyl group, or a substituted aralkyl group, among which R ¹³ and R ¹⁴ may be hydrogen atoms.] [Wherein, R ⁴ is a hydrogen atom, a halogen atom, a cyano group, an alkyl group having 1 to 5 carbon atoms or a substituted alkyl group having 1 to 5 carbon atoms, and R ⁵ is or ^Wherein , in these formulas, R 1 ^O , R ¹¹ , R ^l2 , R ^l3 , R ^l4 and R ^l5 each independently represent a straight chain alkyl group, a substituted straight chain alkyl group, a branched chain alkyl group, a substituted side chain alkyl group, a cycloalkyl group, a substituted cycloalkyl group, and an alken. Or a substituted alkenyl group, an aryl group, a substituted aryl group, an aralkyl group, or a substituted aralkyl group, among which R ¹³ and R ¹⁴ may be hydrogen atoms.] [Wherein R ⁶ and R ⁷ are a hydrogen atom, a halogen atom, a cyano group, an alkyl group having 1 to 5 carbon atoms or a substituted alkyl group having 1 to 5 carbon atoms, and R ⁸ is or ^Wherein , in these formulas, R 1 ^O , R ¹¹ , R ^l2 , R ^l3 , R ^l4 and R ^l5 each independently represent a straight chain alkyl group, a substituted straight chain alkyl group, a branched chain alkyl group, a substituted side chain alkyl group, a cycloalkyl group, a substituted cycloalkyl group, and an alken. Or a substituted alkenyl group, an aryl group, a substituted aryl group, an aralkyl group, or a substituted aralkyl group, among which R ¹³ and R ¹⁴ may be hydrogen atoms.] The at least one monomer (a), a styrene-based compound, and an acrylic acid-based compound according to claim 1, wherein the component (B) is selected from the group consisting of compounds represented by the following general formulas (IV), (V) and (VI). , Methacrylic acid compound, acrylic acid amide compound, methacrylic acid amide compound, maleic acid compound, maleic anhydride compound, vinyl acetate vinylpinolidine, acrylonitrile, maronitrile, vinylpyrrolidone, vinylcarbazolo A resist composition which is a copolymer with at least one monomer (b) selected from the group consisting of. [Wherein, R ¹ , R ² and R ³ are the same as defined in general formula (I).] [Wherein, R ¹ , R ² and R ³ have the same definitions as in general formula (II).] [Wherein, R ¹ , R ² and R ³ are the same as defined in General Formula (III).] The resist composition of Claim 3 whose component (B) is a copolymer of 30-80 mol% of monomers (a) and 20-70 mol% of monomers (b). 4. The resist composition of claim 3, wherein the copolymer has a weight average molecular weight in the range of 1,000 to 1,000,000. The at least one monomer (a), styrene, and 4-hydroxystyrene according to claim 3, wherein the component (B) is selected from the group consisting of compounds represented by the general formulas (IV), (V) and (VI). And a copolymer with at least one monomer selected from the group consisting of methyl methacrylate. 7. The component group according to claim 6, wherein A resist composition which is a copolymer of the compound of and 4-hydroxy styrene. The component of (B) is a general formula A resist composition which is a copolymer of a compound of and styrene. The component of (B) is a general formula A resist composition which is a copolymer of a compound of and methyl methacrylate. 7. The component (B) according to claim 6, wherein A resist composition which is a copolymer of a compound of and methyl methacrylate. 7. The component (B) according to claim 6, wherein A resist composition which is a copolymer of the compound of 4-hydroxystyrene with. The component of (B) is a general formula The component (A) according to claim 1, wherein the component (A) is an onium salt, a halogenated organic compound, a quinonediazide compound, an α, α'-bis (sulfonyl) diazomethane compound, an α-carbonyl-7'-sulfonyldiazo A resist composition which is at least one compound selected from the group consisting of a methane compound, a sulfone compound, an organic acid ester compound, an organic acid amide compound, and an organic acid amide compound. (C) Component is phenol, bisphenol, trisphenol, tetrakisphenol, hydroxy benzophenone, hydroxy biphenyl, hydroxy benzophenone oxime, hydroxy benzotriazole, hydroxy acet of Claim 1 Phenones, moles, hydroxystyrene, hydroxystyrene oligomers, hydroxy-7-methylstyrene, hydroxy-α-methylstyrene oligomers, novolac oligomers, chromones, flavones, flavonols, flavanones , At least one compound selected from the group consisting of oxyflavanones, isoflavanes, cromanns, catechins, spirobichromans, nitrophenols, cyanophenols, alkoxyphenols, halogenated phenols, and derivatives thereof. Composition. The resist composition of Claim 1 containing 0.01-50 weight part of (A) components and 0.01-100 weight part of (C) component with respect to 100 weight part of (B) components. The resist composition according to claim 1, further comprising a solvent in an amount sufficient to uniformly dissolve the components (A), (B) and (C). A chemical amplification method comprising the steps of applying a chemically amplified resist onto a substrate, a first heat treatment, irradiation of actinic light, a second heat treatment, and development. A method of forming a resist pattern using the resist composition of claim 1 as a type resist. The method of forming a resist pattern according to claim 17, wherein the substrate has a step of 10 nm or more on the resist coating surface. ※ Note: The disclosure is based on the initial application.