KR940019724U - Diffusion furnace for liquefaction prevention - Google Patents

Diffusion furnace for liquefaction prevention

Info

Publication number
KR940019724U
KR940019724U KR2019930000261U KR930000261U KR940019724U KR 940019724 U KR940019724 U KR 940019724U KR 2019930000261 U KR2019930000261 U KR 2019930000261U KR 930000261 U KR930000261 U KR 930000261U KR 940019724 U KR940019724 U KR 940019724U
Authority
KR
South Korea
Prior art keywords
diffusion furnace
liquefaction prevention
liquefaction
prevention
diffusion
Prior art date
Application number
KR2019930000261U
Other languages
Korean (ko)
Other versions
KR950007920Y1 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to KR2019930000261U priority Critical patent/KR950007920Y1/en
Publication of KR940019724U publication Critical patent/KR940019724U/en
Application granted granted Critical
Publication of KR950007920Y1 publication Critical patent/KR950007920Y1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4557—Heated nozzles

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
KR2019930000261U 1993-01-11 1993-01-11 Diffusion furnace preventing liquid state KR950007920Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930000261U KR950007920Y1 (en) 1993-01-11 1993-01-11 Diffusion furnace preventing liquid state

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930000261U KR950007920Y1 (en) 1993-01-11 1993-01-11 Diffusion furnace preventing liquid state

Publications (2)

Publication Number Publication Date
KR940019724U true KR940019724U (en) 1994-08-22
KR950007920Y1 KR950007920Y1 (en) 1995-09-25

Family

ID=19349517

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930000261U KR950007920Y1 (en) 1993-01-11 1993-01-11 Diffusion furnace preventing liquid state

Country Status (1)

Country Link
KR (1) KR950007920Y1 (en)

Also Published As

Publication number Publication date
KR950007920Y1 (en) 1995-09-25

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20040820

Year of fee payment: 10

LAPS Lapse due to unpaid annual fee