KR930005944B1 - Manufacturing method of semiconductor device - Google Patents

Manufacturing method of semiconductor device

Info

Publication number
KR930005944B1
KR930005944B1 KR8914450A KR890014450A KR930005944B1 KR 930005944 B1 KR930005944 B1 KR 930005944B1 KR 8914450 A KR8914450 A KR 8914450A KR 890014450 A KR890014450 A KR 890014450A KR 930005944 B1 KR930005944 B1 KR 930005944B1
Authority
KR
South Korea
Prior art keywords
manufacturing
semiconductor device
semiconductor
Prior art date
Application number
KR8914450A
Other languages
English (en)
Inventor
Kazunori Imaoka
Yoichi Fujisawa
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Application granted granted Critical
Publication of KR930005944B1 publication Critical patent/KR930005944B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
KR8914450A 1988-10-07 1989-10-07 Manufacturing method of semiconductor device KR930005944B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63254101A JP2645478B2 (ja) 1988-10-07 1988-10-07 半導体装置の製造方法

Publications (1)

Publication Number Publication Date
KR930005944B1 true KR930005944B1 (en) 1993-06-29

Family

ID=17260238

Family Applications (1)

Application Number Title Priority Date Filing Date
KR8914450A KR930005944B1 (en) 1988-10-07 1989-10-07 Manufacturing method of semiconductor device

Country Status (4)

Country Link
US (1) US5426073A (ko)
EP (1) EP0362838A3 (ko)
JP (1) JP2645478B2 (ko)
KR (1) KR930005944B1 (ko)

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JPH0719737B2 (ja) * 1990-02-28 1995-03-06 信越半導体株式会社 Ｓ０１基板の製造方法
EP0529888A1 (en) * 1991-08-22 1993-03-03 AT&T Corp. Removal of substrate perimeter material
EP0585872B1 (en) * 1992-09-01 2000-03-29 Dai Nippon Printing Co., Ltd. Process for fabricating a phase shift photomask or phase shift photomask blank
US5258323A (en) * 1992-12-29 1993-11-02 Honeywell Inc. Single crystal silicon on quartz
JP3113156B2 (ja) * 1994-08-31 2000-11-27 信越半導体株式会社 半導体基板の製造方法
US5498570A (en) * 1994-09-15 1996-03-12 Micron Technology Inc. Method of reducing overetch during the formation of a semiconductor device
US6153501A (en) * 1998-05-19 2000-11-28 Micron Technology, Inc. Method of reducing overetch during the formation of a semiconductor device
US6051501A (en) * 1996-10-09 2000-04-18 Micron Technology, Inc. Method of reducing overetch during the formation of a semiconductor device
JP2923866B2 (ja) * 1996-10-18 1999-07-26 日本電気株式会社 半導体装置の製造方法
US5723385A (en) * 1996-12-16 1998-03-03 Taiwan Semiconductor Manufacturing Company, Ltd Wafer edge seal ring structure
US6127245A (en) * 1997-02-04 2000-10-03 Micron Technology, Inc. Grinding technique for integrated circuits
JP3368799B2 (ja) 1997-05-22 2003-01-20 住友電気工業株式会社 Ｉｉｉ−ｖ族化合物半導体ウェハおよびその製造方法
JPH1131695A (ja) * 1997-07-10 1999-02-02 Mitsubishi Electric Corp 回路パターンが形成されたウェハおよびその製造方法
US6033997A (en) * 1997-12-29 2000-03-07 Siemens Aktiengesellschaft Reduction of black silicon in semiconductor fabrication
US6094965A (en) 1998-05-29 2000-08-01 Vlsi Technology, Inc. Semiconductor calibration structures and calibration wafers for ascertaining layer alignment during processing and calibrating multiple semiconductor wafer coating systems
JPH11349925A (ja) * 1998-06-05 1999-12-21 Fujimi Inc エッジポリッシング用組成物
US6265314B1 (en) * 1998-06-09 2001-07-24 Advanced Micro Devices, Inc. Wafer edge polish
JP2001345294A (ja) 2000-05-31 2001-12-14 Toshiba Corp 半導体装置の製造方法
US6482749B1 (en) * 2000-08-10 2002-11-19 Seh America, Inc. Method for etching a wafer edge using a potassium-based chemical oxidizer in the presence of hydrofluoric acid
DE10063469B4 (de) * 2000-12-19 2004-03-25 Micronas Gmbh Verfahren zur Herstellung eines elektronischen Chips und mit dem Verfahren hergestellter elektronischer Chip
JP3802507B2 (ja) * 2002-05-20 2006-07-26 株式会社ルネサステクノロジ 半導体装置の製造方法
TWI341983B (en) * 2003-02-12 2011-05-11 Nissha Printing Touch panel
FR2852143B1 (fr) * 2003-03-04 2005-10-14 Soitec Silicon On Insulator Procede de traitement preventif de la couronne d'une tranche multicouche
JP2005026413A (ja) * 2003-07-01 2005-01-27 Renesas Technology Corp 半導体ウエハ、半導体素子およびその製造方法
US20060172526A1 (en) * 2003-10-16 2006-08-03 United Microelectronics Corp. Method for preventing edge peeling defect
DE102005035728B3 (de) * 2005-07-29 2007-03-08 Advanced Micro Devices, Inc., Sunnyvale Verfahren zum Reduzieren der Kontamination durch Entfernung eines Zwischenschichtdielektrikums von dem Substratrand
JP4745038B2 (ja) * 2005-11-30 2011-08-10 株式会社東芝 周縁部処理方法及び半導体装置の製造方法
DE102005063089A1 (de) * 2005-12-30 2007-07-12 Advanced Micro Devices, Inc., Sunnyvale Verfahren zum Reduzieren der Kontaminierung durch Vorsehen einer Ätzstoppschicht am Substratrand
US8178287B2 (en) * 2006-09-08 2012-05-15 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist composition and method of forming a resist pattern
TW200845302A (en) * 2007-05-09 2008-11-16 Promos Technologies Inc A method of two-step backside etching
JP4966116B2 (ja) * 2007-07-09 2012-07-04 ルネサスエレクトロニクス株式会社 半導体集積回路装置の製造方法
JP5542543B2 (ja) * 2010-06-28 2014-07-09 株式会社東芝 半導体装置の製造方法
JP6676365B2 (ja) * 2015-12-21 2020-04-08 キヤノン株式会社 撮像装置の製造方法

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DE1269732C2 (de) * 1962-12-24 1973-12-13 Verfahren zum herstellen von halbleiteranordnungen
US4144099A (en) * 1977-10-31 1979-03-13 International Business Machines Corporation High performance silicon wafer and fabrication process
JPS553633A (en) * 1978-06-20 1980-01-11 Sharp Corp Manufacturing semiconductor device
JPS5758338A (en) * 1980-09-26 1982-04-08 Hitachi Ltd Semiconductor integrated device
JPS58100432A (ja) * 1981-12-11 1983-06-15 Hitachi Ltd ウエハの面取り加工方法
JPS5958827A (ja) * 1982-09-28 1984-04-04 Toshiba Corp 半導体ウエ−ハ、半導体ウエ−ハの製造方法及び半導体ウエ−ハの製造装置
US4638553A (en) * 1982-12-08 1987-01-27 International Rectifier Corporation Method of manufacture of semiconductor device
JPS59107520A (ja) * 1982-12-13 1984-06-21 Nippon Telegr & Teleph Corp <Ntt> 半導体基板
JPS59188921A (ja) * 1983-04-12 1984-10-26 Nec Corp 誘電体分離基板の製造方法
US4510176A (en) * 1983-09-26 1985-04-09 At&T Bell Laboratories Removal of coating from periphery of a semiconductor wafer
KR850004178A (ko) * 1983-11-30 1985-07-01 야마모도 다꾸마 유전체 분리형 집적회로 장치의 제조방법
US4631804A (en) * 1984-12-10 1986-12-30 At&T Bell Laboratories Technique for reducing substrate warpage springback using a polysilicon subsurface strained layer
US4662956A (en) * 1985-04-01 1987-05-05 Motorola, Inc. Method for prevention of autodoping of epitaxial layers
IT1229640B (it) * 1987-06-29 1991-09-04 S G S Microelettronica S P A O Processo di conformazione del bordo di fette di materiale semiconduttore e relativa apparecchiatura

Also Published As

Publication number Publication date
US5426073A (en) 1995-06-20
JP2645478B2 (ja) 1997-08-25
EP0362838A2 (en) 1990-04-11
EP0362838A3 (en) 1990-06-27
JPH02100319A (ja) 1990-04-12

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