KR910015889A - 광구조된 층 및 입체 물체의 제조 방법 - Google Patents

광구조된 층 및 입체 물체의 제조 방법 Download PDF

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Publication number
KR910015889A
KR910015889A KR1019910002278A KR910002278A KR910015889A KR 910015889 A KR910015889 A KR 910015889A KR 1019910002278 A KR1019910002278 A KR 1019910002278A KR 910002278 A KR910002278 A KR 910002278A KR 910015889 A KR910015889 A KR 910015889A
Authority
KR
South Korea
Prior art keywords
layer
photo
compound
thermally reactive
sensitive
Prior art date
Application number
KR1019910002278A
Other languages
English (en)
Korean (ko)
Inventor
그로싸 마리오
Original Assignee
원본미기재
이 아이 듀우판 디 네모아 앤드 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 원본미기재, 이 아이 듀우판 디 네모아 앤드 캄파니 filed Critical 원본미기재
Publication of KR910015889A publication Critical patent/KR910015889A/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1019910002278A 1990-02-15 1991-02-11 광구조된 층 및 입체 물체의 제조 방법 KR910015889A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE40046206 1990-02-15
DE4004620A DE4004620C1 (en) 1990-02-15 1990-02-15 Photo-structured layer of three=dimensional object prodn. - by using fusible plastisol or organosol contg. unsatd. monomer, photoinitiator and thermally reactive cpd.

Publications (1)

Publication Number Publication Date
KR910015889A true KR910015889A (ko) 1991-09-30

Family

ID=6400167

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910002278A KR910015889A (ko) 1990-02-15 1991-02-11 광구조된 층 및 입체 물체의 제조 방법

Country Status (7)

Country Link
EP (1) EP0442071B1 (ja)
JP (1) JPH04214326A (ja)
KR (1) KR910015889A (ja)
CN (1) CN1054674A (ja)
AU (1) AU7105191A (ja)
CA (1) CA2035779A1 (ja)
DE (2) DE4004620C1 (ja)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5980812A (en) * 1997-04-30 1999-11-09 Lawton; John A. Solid imaging process using component homogenization
CN1180768C (zh) 1998-01-21 2004-12-22 武田药品工业株式会社 缓释制剂的制备方法
DE60011197T2 (de) * 1999-03-09 2005-04-21 Lee Eisinger Auftragen von texturierten oder gemusterten oberflächen auf einen prototyp
KR20170018451A (ko) 2014-06-23 2017-02-17 카본, 인크. 다중 경화 메커니즘을 갖는 물질로부터 3차원 물체를 제조하는 방법
US10792855B2 (en) 2015-02-05 2020-10-06 Carbon, Inc. Method of additive manufacturing by intermittent exposure
US10391711B2 (en) 2015-03-05 2019-08-27 Carbon, Inc. Fabrication of three dimensional objects with multiple operating modes
EP3344676B1 (en) 2015-09-04 2023-04-12 Carbon, Inc. Cyanate ester dual cure resins for additive manufacturing
WO2017044381A1 (en) 2015-09-09 2017-03-16 Carbon3D, Inc. Epoxy dual cure resins for additive manufacturing
US10647873B2 (en) 2015-10-30 2020-05-12 Carbon, Inc. Dual cure article of manufacture with portions of differing solubility
WO2017079502A1 (en) 2015-11-05 2017-05-11 Carbon, Inc. Silicone dual cure resins for additive manufacturing
US10787583B2 (en) 2015-12-22 2020-09-29 Carbon, Inc. Method of forming a three-dimensional object comprised of a silicone polymer or co-polymer
EP3341792A1 (en) 2015-12-22 2018-07-04 Carbon, Inc. Dual precursor resin systems for additive manufacturing with dual cure resins
US10343331B2 (en) 2015-12-22 2019-07-09 Carbon, Inc. Wash liquids for use in additive manufacturing with dual cure resins
US10647054B2 (en) 2015-12-22 2020-05-12 Carbon, Inc. Accelerants for additive manufacturing with dual cure resins
US10501572B2 (en) 2015-12-22 2019-12-10 Carbon, Inc. Cyclic ester dual cure resins for additive manufacturing
WO2017112571A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Dual cure additive manufacturing of rigid intermediates that generate semi-rigid, flexible, or elastic final products
JP6944935B2 (ja) * 2015-12-22 2021-10-06 カーボン，インコーポレイテッド 二重硬化樹脂を用いた積層造形による複数の中間体からの複合生産物の製作
US10500786B2 (en) 2016-06-22 2019-12-10 Carbon, Inc. Dual cure resins containing microwave absorbing materials and methods of using the same
CN110023056B (zh) 2016-11-21 2021-08-24 卡本有限公司 通过递送反应性组分用于后续固化来制造三维物体的方法
WO2018165090A1 (en) 2017-03-09 2018-09-13 Carbon, Inc. Tough, high temperature polymers produced by stereolithography
US11458673B2 (en) 2017-06-21 2022-10-04 Carbon, Inc. Resin dispenser for additive manufacturing
US11292186B2 (en) * 2018-08-01 2022-04-05 Carbon, Inc. Production of low density products by additive manufacturing
US11504903B2 (en) 2018-08-28 2022-11-22 Carbon, Inc. 1K alcohol dual cure resins for additive manufacturing

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3615448A (en) * 1969-01-14 1971-10-26 Grace W R & Co Lithographic printing plate and method of preparation
US4309331A (en) * 1977-03-22 1982-01-05 E. I. Du Pont De Nemours And Company Surfactant-free acrylic plastisols and organosols compositions
US4288527A (en) * 1980-08-13 1981-09-08 W. R. Grace & Co. Dual UV/thermally curable acrylate compositions with pinacol
CA1194637A (en) * 1982-04-26 1985-10-01 Charles R. Morgan Uv and thermally curable, thermoplastic-containing compositions
DE3512176A1 (de) * 1985-04-03 1986-10-09 Winfried 7758 Meersburg Heinzel Verfahren zur oberflaechenbehandlung eines druckmaschinenzylinders
DE3814567A1 (de) * 1988-04-29 1989-11-09 Du Pont Deutschland Photopolymerisierbare zusammensetzungen mit carboxylgruppen enthaltenden bindemitteln

Also Published As

Publication number Publication date
AU7105191A (en) 1991-08-22
DE59010693D1 (de) 1997-05-07
CN1054674A (zh) 1991-09-18
EP0442071A2 (de) 1991-08-21
JPH04214326A (ja) 1992-08-05
EP0442071A3 (en) 1992-04-29
CA2035779A1 (en) 1991-08-16
DE4004620C1 (en) 1991-09-05
EP0442071B1 (de) 1997-04-02

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