KR900003251B1 - 석영유리제 노심관 - Google Patents

석영유리제 노심관 Download PDF

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Publication number
KR900003251B1
KR900003251B1 KR1019870001654A KR870001654A KR900003251B1 KR 900003251 B1 KR900003251 B1 KR 900003251B1 KR 1019870001654 A KR1019870001654 A KR 1019870001654A KR 870001654 A KR870001654 A KR 870001654A KR 900003251 B1 KR900003251 B1 KR 900003251B1
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KR
South Korea
Prior art keywords
quartz glass
core tube
core
tube
translucent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
KR1019870001654A
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English (en)
Korean (ko)
Other versions
KR880002240A (ko
Inventor
교오이찌 이나끼
히로시 기무라
가즈오 나까무라
가쯔히고 겡모찌
Original Assignee
신에쯔 세끼에이 가부시끼가이샤
아이하라 데루히꼬
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 신에쯔 세끼에이 가부시끼가이샤, 아이하라 데루히꼬 filed Critical 신에쯔 세끼에이 가부시끼가이샤
Publication of KR880002240A publication Critical patent/KR880002240A/ko
Application granted granted Critical
Publication of KR900003251B1 publication Critical patent/KR900003251B1/ko
Expired legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0436—Apparatus for thermal treatment mainly by radiation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00
    • F27B17/0016—Chamber type furnaces
    • F27B17/0025—Chamber type furnaces specially adapted for treating semiconductor wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Compositions (AREA)
  • Joining Of Glass To Other Materials (AREA)
KR1019870001654A 1986-07-08 1987-02-26 석영유리제 노심관 Expired KR900003251B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP61-160608 1986-07-08
JP160608 1986-07-08
JP61160608A JPS6317300A (ja) 1986-07-08 1986-07-08 石英ガラス製炉芯管

Publications (2)

Publication Number Publication Date
KR880002240A KR880002240A (ko) 1988-04-29
KR900003251B1 true KR900003251B1 (ko) 1990-05-12

Family

ID=15718619

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019870001654A Expired KR900003251B1 (ko) 1986-07-08 1987-02-26 석영유리제 노심관

Country Status (2)

Country Link
JP (1) JPS6317300A (https=)
KR (1) KR900003251B1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0614480Y2 (ja) * 1988-04-26 1994-04-13 信越石英株式会社 半導体熱処理装置
JP3412735B2 (ja) * 1996-08-07 2003-06-03 株式会社山形信越石英 ウエーハ熱処理装置
JPH10163122A (ja) * 1996-11-29 1998-06-19 Fukui Shinetsu Sekiei:Kk 半導体ウエハの熱処理装置及び炉心管
FR2824663B1 (fr) * 2001-05-14 2004-10-01 Semco Sa Procede et dispositif de dopage, diffusion et oxydation pyrolithique de plaquettes de silicium a pression reduite

Also Published As

Publication number Publication date
KR880002240A (ko) 1988-04-29
JPS6317300A (ja) 1988-01-25
JPH0468279B2 (https=) 1992-10-30

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