KR890012369A - Silicon Wafer Lifter - Google Patents

Silicon Wafer Lifter Download PDF

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Publication number
KR890012369A
KR890012369A KR1019890000779A KR890000779A KR890012369A KR 890012369 A KR890012369 A KR 890012369A KR 1019890000779 A KR1019890000779 A KR 1019890000779A KR 890000779 A KR890000779 A KR 890000779A KR 890012369 A KR890012369 A KR 890012369A
Authority
KR
South Korea
Prior art keywords
support base
carrier
silicon wafer
centering
wafer lifter
Prior art date
Application number
KR1019890000779A
Other languages
Korean (ko)
Inventor
폴리 베르나르드
친촐 제라드
Original Assignee
원본미기재
레시트 에스.에이.(소시에떼 아노님)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 원본미기재, 레시트 에스.에이.(소시에떼 아노님) filed Critical 원본미기재
Publication of KR890012369A publication Critical patent/KR890012369A/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67326—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67271—Sorting devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

내용 없음.No content.

Description

실리콘 웨이퍼 승강장치Silicon Wafer Lifter

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명에 의한 실리콘 웨이퍼 승강장치의 사시도.1 is a perspective view of a silicon wafer lift apparatus according to the present invention.

제2도는 웨이퍼 캐리어가 장착된 제1도 장치의 종단면도로서, 제3도의 선2-2의 방향에서 취한 단면도이다.FIG. 2 is a longitudinal cross-sectional view of the first FIG. Device on which the wafer carrier is mounted, taken in the direction of line 2-2 of FIG.

Claims (2)

각 회전운동에 의해 오직 선택된 웨이퍼들만 승강시키도록 되어 있으며 각도상으로 병진운동하는 가동요소(2)와 웨이퍼들에 대해 지지기부가 가동요소(2)와 먼저 협동하고 이어서 고정된 요서(8)와 협동하도록 웨이퍼를 취하는 캐리어를 중심을 잡아 정위치시킬 수 있는 수단을 지니는 지지기부(1)를 포함하는 실리콘 웨이퍼 승강장치.With each rotational movement only the selected wafers are lifted and the support base cooperates first with the movable element 2 and then with a fixed yog 8 against the movable element 2 and the wafers which translate in angular translation. And a support base (1) having means for centering and positioning a carrier that takes a wafer to cooperate. 제1항에 있어서, 지지기부(1)는, 캐리어의 저부에 있는 보조수단과 협동하며 지지기부의 지지면에 형성된 홈들과 결합된 캐리어를 중심을 잡아 정위치시키는 수단을 측방 및 횡으로 지니는 실리콘 웨이퍼 승강 장치The support base (1) according to claim 1, wherein the support base (1) has a side and lateral silicone having means for cooperating with the auxiliary means at the bottom of the carrier and for centering and positioning the carrier combined with the grooves formed in the support surface of the support base. Wafer Lifting Device ※참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is to be disclosed based on the initial application.
KR1019890000779A 1988-01-26 1989-01-25 Silicon Wafer Lifter KR890012369A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8801261A FR2626261B1 (en) 1988-01-26 1988-01-26 APPARATUS FOR LIFTING SILICON WAFERS, ESPECIALLY
FR8801261 1988-01-26

Publications (1)

Publication Number Publication Date
KR890012369A true KR890012369A (en) 1989-08-26

Family

ID=9362909

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890000779A KR890012369A (en) 1988-01-26 1989-01-25 Silicon Wafer Lifter

Country Status (3)

Country Link
JP (1) JPH01280331A (en)
KR (1) KR890012369A (en)
FR (1) FR2626261B1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2888409B2 (en) * 1993-12-14 1999-05-10 信越半導体株式会社 Wafer cleaning tank
JPH10223585A (en) 1997-02-04 1998-08-21 Canon Inc Device and method for treating wafer and manufacture of soi wafer
US6391067B2 (en) * 1997-02-04 2002-05-21 Canon Kabushiki Kaisha Wafer processing apparatus and method, wafer convey robot, semiconductor substrate fabrication method, and semiconductor fabrication apparatus
SG63810A1 (en) * 1997-02-21 1999-03-30 Canon Kk Wafer processing apparatus wafer processing method and semiconductor substrate fabrication method
US6767840B1 (en) 1997-02-21 2004-07-27 Canon Kabushiki Kaisha Wafer processing apparatus, wafer processing method, and semiconductor substrate fabrication method
JPH11121585A (en) * 1997-10-17 1999-04-30 Olympus Optical Co Ltd Wafer carrier
US6055694A (en) * 1998-11-30 2000-05-02 Tsk America, Inc. Wafer scrubbing machine
US9449862B2 (en) 2011-06-03 2016-09-20 Tel Nexx, Inc. Parallel single substrate processing system

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4436474A (en) * 1982-01-04 1984-03-13 Western Electric Co., Inc. Selecting articles from an array thereof
US4701096A (en) * 1986-03-05 1987-10-20 Btu Engineering Corporation Wafer handling station

Also Published As

Publication number Publication date
FR2626261B1 (en) 1992-08-14
JPH01280331A (en) 1989-11-10
FR2626261A1 (en) 1989-07-28

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WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid