KR890007376A - Foreign object detection method and device - Google Patents

Foreign object detection method and device Download PDF

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KR890007376A
KR890007376A KR1019880014141A KR880014141A KR890007376A KR 890007376 A KR890007376 A KR 890007376A KR 1019880014141 A KR1019880014141 A KR 1019880014141A KR 880014141 A KR880014141 A KR 880014141A KR 890007376 A KR890007376 A KR 890007376A
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South Korea
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light
sample
detection
foreign matter
linear
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KR1019880014141A
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KR920009713B1 (en
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도시히꼬 나까따
노부유끼 아끼야마
요시히꼬 야마우찌
미쯔요시 고이즈미
요시마사 오시마
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미다 가쓰시게
가부시기가이샤 히다찌세이사뀨쇼
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Priority to JP62-272958 priority Critical
Priority to JP62272958A priority patent/JPH0786465B2/en
Priority to JP87-272958 priority
Priority to JP87-311904 priority
Priority to JP62-311904 priority
Priority to JP62311904A priority patent/JPH0663982B2/en
Priority to JP63042001A priority patent/JP2512059B2/en
Priority to JP63-42001 priority
Priority to JP88-42001 priority
Application filed by 미다 가쓰시게, 가부시기가이샤 히다찌세이사뀨쇼 filed Critical 미다 가쓰시게
Publication of KR890007376A publication Critical patent/KR890007376A/en
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Publication of KR920009713B1 publication Critical patent/KR920009713B1/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • G01N21/95623Inspecting patterns on the surface of objects using a spatial filtering method
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N2021/473Compensating for unwanted scatter, e.g. reliefs, marks
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties

Abstract

내용 없음No content

Description

이물질 검출방법 및 그 장치Foreign object detection method and device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1도는 본 발명에 따른 제1실시예의 이물질 검출 광시스템을 나타낸 사시도.1 is a perspective view showing a foreign matter detection optical system of a first embodiment according to the present invention.

제2A~2D도는 본 발명의 원리를 나타낸 도면.2A-2D illustrate the principles of the present invention.

제3도는 본 발명에 따른 제2실시예의 이물질 검출 광시스템을 나타낸 사시도.3 is a perspective view showing a foreign matter detection optical system of a second embodiment according to the present invention.

Claims (33)

  1. 조명수단에 의해 지향성이 높은 광을 선형상의 범위 내에서 시료를 조명하고, 시료에서의 반사광을 차광수단에 의해서 차광하고, 상기 조명수단을 통과한 시료에서의 반사광을 광검출기에 인도하며, 상기 광검출기내에 배치된 상기 선형 조명범위에 대응하는 검출영역을 갖는 광전변환수단에 의해 시료에서의 반사광을 검출하여 시료상의 이물질을 검출하는 이물질 검출방법.Illuminates the sample with high directivity by the illuminating means within a linear range, shields the reflected light from the sample by the shading means, and guides the reflected light from the sample that has passed through the illuminating means to the photodetector, A foreign material detection method for detecting foreign matter on a sample by detecting reflected light from a sample by photoelectric conversion means having a detection region corresponding to the linear illumination range disposed in the detector.
  2. 특허청구의 범위 제1항에 있어서, 상기 시료는 반도체 웨이퍼인 이물질 검출방법.The foreign material detection method according to claim 1, wherein the sample is a semiconductor wafer.
  3. 특허청구의 범위 제1항에 있어서, 상기 시료는 자기 디스크인 이물질 검출방법.The foreign material detection method according to claim 1, wherein the sample is a magnetic disk.
  4. 특허청구의 범위 제1항에 있어서, 시료상의 패턴을 구성하는 주요한 직선군에 대하여 상기 시료 평면상에서 소정의 각도를 이루는 방향으로 지향성이 높은 조명광에 의해 선형상의 범뉘내에 경사조명하고, 상기 시료에서의 산란광을 검출하기 위하여 상기 조명 영역의 바로 위쪽에 배치한 검출 광시스템내의 공간 주파수 영역에서의 시료상의 패턴을 구성하는 다른 직선군에서 규칙적인 산란광을 차광수단에 의해서 차광하며 상기 차광수단을 통과한 시료상의 이물질에서의 산란광을 상기 검출 광시스템을 통해서 검출하여 시료상의 이물질의 검출을 실행하는 이물질 검출방법.The method according to claim 1, wherein the illumination is highly inclined in a linear range by illumination light having high directivity in a direction forming a predetermined angle on the specimen plane with respect to the main straight group constituting the pattern on the specimen. Samples that pass through the shielding means by shielding the scattered light by means of shading means in another straight line group constituting a pattern on the sample in the spatial frequency region in the detection optical system disposed immediately above the illumination region for detecting scattered light. A foreign matter detection method for detecting scattered light from foreign matter on the sample through the detection optical system to detect foreign matter on the sample.
  5. 특허청구의 범위 제4항에 있어서, 상기 소정의 각도는 상기 주요한 직선군에서의 반사 회절광이 상기 검출 광시스템에 입사하지 않는 각도인 이물질 검출방법.The foreign matter detection method according to claim 4, wherein the predetermined angle is an angle at which reflected diffracted light in the main straight group does not enter the detection optical system.
  6. 특허청구의 범위 제4항에 있어서, 상기 소정의 각도는 상기 검출 광시스템의 NA(개구수)에 의해서 정해지는 값인 이물질 검출방법.The foreign matter detection method according to claim 4, wherein the predetermined angle is a value determined by NA (opening number) of the detection optical system.
  7. 특허청구의 범위 제4항에 있어서, 상기 소정의 각도는 45°인 이물질 검출방법.The foreign material detection method according to claim 4, wherein the predetermined angle is 45 degrees.
  8. 특허청구의 범위 제1항에 있어서, 지향성이 높은 직선 편광 조명으로 선형상의 범위내에 시료를 경사 조명하고, 상기 시료에서의 산란광을 검출하기 위하여 상기 조명영역의 바로 위쪽에 배치한 검출 광시스템내의 공간 주파수 영역에서 소정의 제한된 영역에 편광판을 배치하여 차광수단을 형성하며, 상기 차광수단에 의해서 시표에서의 산란광중의 소정의 공간 주파수 영역의 소정의 편광성분을 선택적으로 차단하는 것에 의해서 상기 차광수단을 통과한 시료상의 이물질에서의 산란광을 상기 검출 광시스템을 통해서 검출하여 시료상의 이물질의 검출을 실행하는 이물질 검출방법.The space in a detection optical system according to claim 1, wherein the sample is inclinedly illuminated within a linear range by linearly polarized light having high directivity, and is disposed directly above the illumination region for detecting scattered light from the sample. The light blocking means is formed by arranging a polarizing plate in a predetermined limited area in the frequency domain, and selectively blocking the predetermined polarization component in a predetermined spatial frequency region of the scattered light in the target by the light blocking means. A foreign matter detection method for detecting scattered light from foreign matter on a sample which has passed through the detection optical system to detect foreign matter on a sample.
  9. 특허청구의 범위 제1항에 있어서, 지향성이 높은 직선 편광 조명광으로 선형상의 범위내에 시료를 경사조명하고, 상기 시료에서의 산란광을 검출하기 위하여 상기 조명영역의 바로 위쪽에 배치한 검출 광시스템내의 공간 주파수 영역에서 소정의 한정된 부분에 광의 편향상태를 변화시키는 광소자를 배치하여 차광수단을 형성하고, 상기 차광수단에 의해서 상기 시료에서의 산란광중의 소정의 공간 주파수 영역의 소정의 편광 성분을 선택적으로 차단하는 것에 의해서 상기 차단수단을 통과한 시료상의 이물질에서의 산란광을 상기 검출 광시스템을 통해서 검출하여 시료상의 이물질의 검출을 실행하는 이물질 검출방법.The space in a detection optical system according to claim 1, wherein the sample is inclinedly illuminated within a linear range by linearly polarized illumination light having high directivity, and is disposed directly above the illumination region to detect scattered light from the sample. An optical element for changing the deflection state of light is arranged in a predetermined limited portion in the frequency domain to form a light shielding means, and the light shielding means selectively blocks a predetermined polarization component in a predetermined spatial frequency region of scattered light in the sample by the light shielding means. And detecting scattered light from the foreign matter on the sample passing through the blocking means through the detection optical system to detect the foreign matter on the sample.
  10. 특허청구의 범위 제1항에 있어서, 하향조명 광시스템에 의해 선형상의 영역내에 시료상의 선형 하향조명을 행하고, 상기 선형 하향 조명 영역에서의 산란광을 검출 광시스템에 의해 집광하며, 상기 선형상의 영역 방향으로 배열 방향을 돌린 1차원 고체 촬상소자에 의해 수광하고 영상신호로 변환하며 상기 영상신호에 의해 시료상의 이물질을 검출하여 시료상의 이물질의 검출을 실행하는 이물질 검출방법.The method according to claim 1, wherein the linear downward illumination on the sample is performed in the linear region by the downward illumination optical system, the scattered light in the linear downward illumination region is condensed by the detection optical system, and the linear region direction is obtained. The foreign material detection method which receives by a 1-dimensional solid-state image sensor which turned the array direction, converts it into an image signal, detects the foreign substance on a sample by the said image signal, and detects the foreign substance on a sample.
  11. 특허청구의 범위 1항에 있어서, 하향조명 광시스템에 의해 선형상의 범위내에 시료상의 선형 하향 조명을 행하고, 상기 선형 하향 조명 영역에서의 산란광중에 0차회절광을 차광수단에 의해 차광하고, 상기 차광된 산란광을 검출 광시스템에 의해 집광하며, 상기 선형상의 영역의 방향으로 배열 방향을 돌린 1차원 고체 촬상소자에 의해 수광하고 영상신호로 변환하며 상기 영상신호에 의해 시료상의 이물질을 검출하여 이물질의 검출을 실행하는 이물질 검출방법.The method according to claim 1, wherein a linear downward illumination on a sample is performed within a linear range by a downward illumination optical system, and zero-order diffracted light is shielded by light-shielding means among scattered light in the linear downward illumination region. Collected scattered light is collected by a detection optical system, received by a one-dimensional solid-state image pickup device which is arranged in the direction of the linear region, converted into an image signal, and foreign substances on a sample are detected by the image signal to detect foreign substances. Foreign object detection method to carry out.
  12. 특허청구의 범위 제1항에 있어서, 하향조명 광시스템에 의해 선형상의 범위내에 소정의 방향으로 편광시킨 시료상의 선형 하향 조명을 행하고, 상기 선형상 영역에서의 산란광을 집광시키고, 상기 산란광을 편광분리 수단에 의해서 임의의 직선 편광 성분 및 다른 직선 평광성분으로 분리하고, 각각의 차광수단에 의해 0차 회절광을 차광하고, 상기 선형상 방향으로 배열 방향을 돌린 1차원 고체 촬상소자에 의해 수광하여 영상 신호로 변환하고, 상기 영상신호를 가산수단에 의해 가산해서 얻어지는 영상신호에 따라서 시료상의 이물질을 검출하여 시료상의 이물질의 검출을 실행하는 이물질 검출방법.The method according to claim 1, wherein a linear downward illumination of a sample polarized in a predetermined direction within a linear range is performed by a downward illumination optical system, condensed scattered light in the linear region, and polarized light separation of the scattered light. A linearly polarized light component and an arbitrary linearly polarized light component by means, and shielding zeroth-order diffracted light by each light-shielding means, and received by a one-dimensional solid-state image pickup device which is rotated in the linear direction. A foreign matter detection method for converting a signal into a foreign matter and detecting foreign matter on a sample in accordance with an image signal obtained by adding the video signal by an adding means.
  13. 지향성이 높은 광을 선형상의 범위내에 시료를 조명하는 조명수단, 시료에서의 반사광을 차광하는 차광수단, 상기 차광수단을 통과한 시료에서의 반사광을 검출하고 상기 선형 조명 영역에 대응하는 검출영역을 갖는 광전변환수단을 마련한 광검출기를 포함하는 이물질 검출장치.Lighting means for illuminating a sample within a linear range of highly directional light, light shielding means for shielding reflected light from the sample, and a detection region for detecting reflected light from the sample passing through the light shielding means and corresponding to the linear illumination region; A foreign matter detection device comprising a photodetector provided with a photoelectric conversion means.
  14. 특허청구의 범위 제13항에 있어서, 상기 시료는 반도체웨이퍼인 이물질 검출방법.The foreign material detection method according to claim 13, wherein the sample is a semiconductor wafer.
  15. 특허청구의 범위 제13항에 있어서, 상기 시료는 자기디스크인 이물질 검출방법.The foreign material detection method according to claim 13, wherein the sample is a magnetic disk.
  16. 지향성이 높은 조명광으로 시료상의 패턴을 구성하는 주요한 직선군에 대해서 시료 평면상에서 소정의 각도를 형성하는 방향으로 선형상의 영역에 시료를 경사조명하는 조명수단, 상기 시료에서의 산란광을 검출하기 위하여 조명 영역의 바로 위쪽에 배치한 검출 광시스템, 상기 검출 광시스템내의 공간 주파수 영역에서 시료상의 패턴을 구성하는 다른 직선군에서의 규칙적인 산란광을 차광하는 차광수단, 상기 차광수단을 통과한 시료상의 이물질에서의 산란광을 상기 검출 광시스템을 통해서 검출하는 광검출기를 포함하는 이물질 검출장치.Illumination means for illuminating the sample in a linear region in a direction forming a predetermined angle on the sample plane with respect to the main straight group constituting the pattern on the sample with highly directional illumination light, and an illumination region for detecting scattered light in the sample. A detection optical system disposed immediately above the light shielding means; light shielding means for shielding regular scattered light from another straight line group constituting a pattern on a sample in a spatial frequency region within the detection optical system; A foreign matter detection device comprising a photodetector for detecting scattered light through the detection optical system.
  17. 특허청구의 범위 제16항에 있어서, 상기 소정의 각도는 상기 주요한 직선군에서의 반사 회절광이 상기 검출 광시스템에 입사하지 않는 각도인 이물질 검출방법.The foreign material detection method according to claim 16, wherein the predetermined angle is an angle at which reflected diffracted light in the main straight group does not enter the detection optical system.
  18. 특허청구의 범위 제16항에 있어서, 상기 소정의 각도는 상기 검출 광시스템의 NA에 의해서 정해지는 값인 이물질 검출장치.The foreign matter detection apparatus according to claim 16, wherein the predetermined angle is a value determined by NA of the detection optical system.
  19. 특허청구 범위 제16항에 있어서, 상기 소정의 각도는 45°인 이물질 검출장치.The foreign matter detection apparatus according to claim 16, wherein the predetermined angle is 45 degrees.
  20. 특허청구의 범위 제13항에 있어서, 상기 시료를 지향성이 높은 직선편광 조명광으로 선형상의 범위내 경사조명하는 조명수단, 상기 시료에서의 산란광을 검출하기 위하여 조명역역의 바로 위쪽에 배치한 검출 광시스템, 상기 검출 광시스템내의 공간 주파수 영역세어 소정의 제한영역에 편광판을 배치하여 이물질에서의 산란광중의 소정의 편광성분을 선택적으로 차광하는 차광수단, 상기 차광수단을 통과한 시료상의 이물질에서의 산란과을 상기 검출 광시스템을 통해서 검출하는 검출기를 포함하는 이물질 검출장치.The illumination system according to claim 13, wherein the specimen is inclined illumination in a linear range by linearly polarized illumination light having a high directivity, and a detection optical system disposed immediately above the illumination region for detecting scattered light from the specimen. And a light shielding means for selectively shielding a predetermined polarization component of the scattered light from the foreign matter by arranging the polarizing plate in a predetermined limit region in the spatial frequency domain within the detection optical system, and scattering from the foreign matter on the sample passing through the light shielding means. A foreign matter detection device comprising a detector for detecting through the detection optical system.
  21. 특허청구의 범위 제13항에 있어서, 상기 시료를 지향성이 높은 직선편광 조명으로 선형상의 범위내에 경사조명하는 조명수단, 상기 시료에서의 산란광을 검출하기위하여 조명 영역의 바로 위쪽에 마련한 검출 광시스템, 상기 검출 광시스템내의 공간 주파수 영역에서 소정의 제한영역에 광의 편광상태를 변화시키는 광소자를 배치하여 상기 시료에서의 산란광중의 소정의 편광성분을 선택적으로 차광하는 차광수단, 상기 차광수단을 통과한 시료상의 이물질에서의 산란광을 상기 검출 광시스템을 통해서 검출하는 검출기를 포함하는 이물질 검출장치.The illumination device according to claim 13, further comprising: illuminating means for illuminating the sample in a linear range with highly directional linearly polarized light, a detection optical system provided directly above the illumination region for detecting scattered light from the sample; Light blocking means for selectively shielding a predetermined polarization component of scattered light in the sample by arranging an optical element for changing a polarization state of light in a predetermined restriction region in a spatial frequency region in the detection optical system, and a sample passing through the light blocking means And a detector for detecting scattered light from foreign substances on the image through the detection optical system.
  22. 특허청구의 범위 제21항에 있어서, 상기 광의 편광상태를 변화시키는 광소자에 액정으로 되는 이물질 검출장치.The foreign matter detection device according to claim 21, wherein the foreign substance is a liquid crystal in an optical element for changing the polarization state of the light.
  23. 특허청구의 범위 제21항에 있어서, 상기 광의 편광상태를 변환시키는 광소자는 파장판으로 구성되는 이물질 검출장치.The foreign material detection device according to claim 21, wherein the optical element for converting the polarization state of the light is composed of a wave plate.
  24. 특허청구의 범위 제20항에 있어서, 상기 지향성이 높은 직선편광 조명광은 단색광인 이물질 검출장치.The foreign material detection apparatus according to claim 20, wherein the highly polarized linearly polarized light is monochromatic light.
  25. 특허청구의 범위 제13항에 있어서, 상기 시료상에 광을 조명하는 조명 광시스템, 상기 시료에서 반사되는 광을 집광하는 집광 렌즈시스템, 상기 집광 렌즈시스템에서 얻은 광을 분리해서 각각 1차원 고체 촬상소자로 화소에 대응하는 분리된 광을 형성하고 전기신호로 변환하는 여러개의 검출 광시스템, 상기 검출 광시스템의 각각의 1차원 고체 촬상소자에서의 화소에 대응하는 출력을 동기시켜서 행하는 구동수단, 상기 구동수단에 의해서 동기출력된 신호를 가산하는 가산수단, 상기 가산수단에 의해서 가산된 출력신호를 양자화하는 양자화수단, 상기 양자화 수단에 의해서 양자화된 신호에 따라서 이물질을 검출하는 검출수단을 포함하는 이물질 검출장치.According to claim 13, The illumination optical system for illuminating the light on the sample, the condensing lens system for condensing the light reflected from the sample, and the light obtained by the condensing lens system, respectively, one-dimensional solid-state imaging A plurality of detection optical systems for forming separated light corresponding to pixels with the elements and converting them into electrical signals, drive means for synchronizing outputs corresponding to pixels in each one-dimensional solid-state image pickup device of the detection optical system, the Foreign matter detection including an addition means for adding a signal synchronized by the driving means, a quantization means for quantizing the output signal added by the adding means, and a detection means for detecting foreign matter in accordance with the signal quantized by the quantization means. Device.
  26. 특허청구 범위 25항에 있어서, 상기 1차원 공체 촬상소자는 직렬출력형인 이물질 검출장치.The foreign matter detection apparatus according to claim 25, wherein the one-dimensional compositing image pickup device is a serial output type.
  27. 특허청구 범위 25항에 있어서, 상기 1차원 공체 촬상소자는 병렬출력형인 이물질 검출장치.The foreign matter detection apparatus according to claim 25, wherein the one-dimensional compositing image pickup device is a parallel output type.
  28. 특허청구의 범위 제13항에 있어서, 선형상의 범위에서 시료의 선형 하향 조명을 행하는 하향조명 광시스템, 상기 하향조명 광시스템에 의해 조명된 선형 하향조명 영역에서의 0차 회절광을 차광하는 차광수단, 상기 차광수단에 의해 차광되지 않는 회절광을 수광해서 영상신호로 변환하도록 상기 선형상 방향으로 배열 방향을 돌려서 배치한 1차원 고체 촬상소자를 마련한 광검출기, 상기 1차원 고체 촬상소자에서 얻어진 영상신호에 따라서 시료상의 이물질을 검출하는 검출수단을 포함하는 이물질 검출장치.The light blocking means according to claim 13, further comprising: a down lighting optical system for performing linear down illumination of a specimen in a linear range, and a light shielding means for shielding zero-order diffracted light in a linear down illumination region illuminated by the down lighting system A photodetector comprising a one-dimensional solid-state image pickup device which is arranged in a rotational direction in the linear direction so as to receive diffracted light not blocked by the light shielding means and convert it into a video signal; and a video signal obtained by the one-dimensional solid-state image pickup device The foreign matter detection apparatus including a detection means for detecting the foreign matter on the sample according to.
  29. 특허청구의 범위 제28항에 있어서, 상기 선형상의 범위내에 상기 시료상의 선형 하향조명 영역을 경사지게 조명하는 경사조명수단을 포함하는 이물질 검출장치.The foreign matter detection apparatus according to claim 28, comprising inclined illumination means for illuminating obliquely a linear downward illumination region on the specimen within the linear phase.
  30. 특허청구의 범위 제13항에 있어서, 상기 시료에 선형상의 범위에서 소정의 방향으로 직선편광된 광을 하향 조명하는 하향 조명수단, 상기 시료에서 상이한 편광을 갖는 반사광을 편광분리 시키는 편광분리수단, 상기 편광분리 수단에 의해 분리된 반사광의 각각에 대해서 0차 회절광을 차광하는 촤광수단, 상기 차광수단에 의해 차광되지 않는 회절광의 각각을 수광해서 영상신호로 변환하는 여러개의 광검출기, 상기 여러개의 광검출기의 각각에서 얻어지는 영상신호에 따라서 시료상의 이물질을 검출하는 검출수단을 포함하는 이물질 검출장치.According to claim 13, Down illumination means for illuminating the light linearly polarized in a predetermined direction in the linear range to the sample, Polarization separation means for polarizing separation of the reflected light having different polarizations in the sample, A plurality of photodetectors for shielding the zero-order diffracted light from each of the reflected light separated by the polarization separating means, a plurality of photodetectors for receiving and converting each of the diffracted light not shielded by the shielding means into an image signal; And a detecting means for detecting a foreign substance on a sample in accordance with an image signal obtained by each of the detectors.
  31. 특허청구의 범위 제30항에 있어서, 또 선형상의 범위내에 상기 시료상의 하향조명 영역을 경사지게 조명하는 경사조명 수단을 포함하는 이물질 검출장치.31. The foreign matter detection apparatus according to claim 30, further comprising inclined illumination means for illuminating the downward illumination region on the specimen obliquely within a linear range.
  32. 특허청구의 범위 제1항에 있어서, 상기 시료상의 선형 미소영역을 경사조명하는데 직선편광을 사용하고, 또한 상기 선형 미소영역의 바로 위쪽에 배치한 대물렌즈의 푸리에 변환면의 영상의 위치에 부분적으로 입사광을 1/2파장판으로 차광하는 마스크를 사용하며, 상기 선형 미소영역에서의 산란광에 의해서 작성되는 결상면에서의 해상도를 저하시키고 화소를 평활하해서 산란광을 검출하는 영상평활화법에 의해 시료상의 이물질을 검출하는 이물질을 검출방법.The method of claim 1, wherein the linearly polarized light is used to obliquely illuminate the linear microregions on the sample, and the position of the image of the image of the Fourier transform plane of the objective lens disposed immediately above the linear microregions. A mask for shielding incident light into a half-wave plate is used, and the image smoothing method is performed by an image smoothing method for detecting scattered light by lowering the resolution at an image plane created by scattered light in the linear microregion and smoothing the pixels. A method for detecting foreign matter that detects foreign matter.
  33. 특허청구의 범위 제13항에 있어서, 상기 시료상의 선형 미소영역을 직선편광에 의해 경사지게 조명하는 조명수단, 상기 선형 미소영역의 바로 위쪽 위치에 배치된 대물렌즈, 상기 대물렌즈의 푸리에 변환면의 영상위에서 부분적으로 1/2파장판에 의해 차폐한 마스크를 사용하고, 상기 선형 미소영역에서의 산란광에 의해서 형성된 결상면에서의 해상도 저하시켜 화소를 평활화하는 영상 평활화수단, 상기 영상 평활화수단을 통해서 상기 산란광을 검출하는 광검출수단을 포함하는 이물질 검출장치.The apparatus of claim 13, further comprising: illumination means for illuminating the linear microregions on the specimen inclined by linearly polarized light, an objective lens disposed directly above the linear microregions, and an image of a Fourier transform surface of the objective lens Image smoothing means for smoothing the pixels by using a mask partially shielded by the half-wave plate from above and degrading the resolution at an image plane formed by scattered light in the linear microregions; the scattered light through the image smoothing means The foreign matter detection apparatus comprising a light detection means for detecting the.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019880014141A 1987-10-30 1988-10-29 Method and its device for detecting foreign matter KR920009713B1 (en)

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JP62-272958 1987-10-30
JP62272958A JPH0786465B2 (en) 1987-10-30 1987-10-30 Foreign object detection method and apparatus
JP87-272958 1987-10-30
JP62311904A JPH0663982B2 (en) 1987-12-11 1987-12-11 Foreign object detection method and apparatus
JP87-311904 1987-12-11
JP62-311904 1987-12-11
JP88-42001 1988-02-26
JP63042001A JP2512059B2 (en) 1988-02-26 1988-02-26 Foreign object detection method and apparatus
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