KR880002821A - O-나프토퀴논디아지드 설폰산 에스테르를 제조하는 방법 및 이들을 함유하는 감광성 혼합물 - Google Patents

O-나프토퀴논디아지드 설폰산 에스테르를 제조하는 방법 및 이들을 함유하는 감광성 혼합물 Download PDF

Info

Publication number
KR880002821A
KR880002821A KR870009311A KR870009311A KR880002821A KR 880002821 A KR880002821 A KR 880002821A KR 870009311 A KR870009311 A KR 870009311A KR 870009311 A KR870009311 A KR 870009311A KR 880002821 A KR880002821 A KR 880002821A
Authority
KR
South Korea
Prior art keywords
carried out
esterification reaction
sulfonic acid
range
mixture containing
Prior art date
Application number
KR870009311A
Other languages
English (en)
Other versions
KR950005773B1 (ko
Inventor
에드만 프리쯔
탐 홀스트-디이터
요아킴 스타우트 한스
Original Assignee
베틀라우퍼, 오일러
훽스트 아크티엔게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 베틀라우퍼, 오일러, 훽스트 아크티엔게젤샤프트 filed Critical 베틀라우퍼, 오일러
Publication of KR880002821A publication Critical patent/KR880002821A/ko
Application granted granted Critical
Publication of KR950005773B1 publication Critical patent/KR950005773B1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C303/00—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
    • C07C303/26—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of esters of sulfonic acids
    • C07C303/28—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of esters of sulfonic acids by reaction of hydroxy compounds with sulfonic acids or derivatives thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

내용 없음

Description

O-나프토퀴논디아지드 설폰산 에스테르를 제조하는 방법 및 이들을 함유하는 감광성 혼합물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (7)

  1. O-나프토퀴논디아지드 설폰산 할라이드를 염기성 성분의 존재하에 용매중에서 일가-또는 다가 페놀 화합물을 사용하여 에스테르화 시킨 다음, 에스테르를 침전시키고 건조시켜O-나프토퀴논디아지드 설폰산 에스테르를 제조하는 방법에 있어서, 에스테르화 반응을 약 1.5 내지 약 8.5 범위내의 pH 및 약 15℃ 내지 약 40℃ 범위내의 온도에서 암모니아, 약산의 암모늄염 또는 탄소수 1 내지 3의 암모니아의 지방족 유도체의 존재하에 수행하는 방법.
  2. 제1항에 있어서, 에스테프화 반응을 수성 암모니아의 존재하에 수행하는 방법.
  3. 제1항에 있어서, 에스테르화 반응을 카본산 또는 아세트산의 암모늄염의 존재하에 수행하는 방법.
  4. 제1항에 있어서, 에스테르화 반응을 모노 에탄올아민 또는 디에탄올아민의 존재하에 수행하는 방법.
  5. 제1항 내지 제4항중 어느 한 항에 있어서, 에스테르화 반응을 약 6 내지 약 8의 pH 범위내에서 수행하는 방법.
  6. 제1항 내지 제5항 중 어느 한 항에 있어서, 에스테르화 반응을 약 20℃ 내지 약 35℃의 온도 범위내에서 수행하는 방법.
  7. 수불용성이며 알칼리 수용액에 가용성인 결합제, 및 제1항 내지 제6항중 어느 한 항에 따라O-나프토퀴논디아지드 설포닐 할라이드 및 일가-또는 다가 페놀 화합물로부터 수득한 에스테르를 함유하는 감광성 혼합물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019870009311A 1986-08-27 1987-08-26 O-나프토퀴논디아지드 설폰산 에스테르를 제조하는 방법 및 이들을 함유하는 감광성 혼합물 KR950005773B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19863629122 DE3629122A1 (de) 1986-08-27 1986-08-27 Verfahren zur herstellung eines o-naphthochinondiazidsulfonsaeureesters und diesen enthaltendes lichtempfindliches gemisch
DEP3629122.6 1986-08-27

Publications (2)

Publication Number Publication Date
KR880002821A true KR880002821A (ko) 1988-05-11
KR950005773B1 KR950005773B1 (ko) 1995-05-30

Family

ID=6308285

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019870009311A KR950005773B1 (ko) 1986-08-27 1987-08-26 O-나프토퀴논디아지드 설폰산 에스테르를 제조하는 방법 및 이들을 함유하는 감광성 혼합물

Country Status (5)

Country Link
US (1) US4873169A (ko)
EP (1) EP0258727B1 (ko)
JP (1) JPH0710826B2 (ko)
KR (1) KR950005773B1 (ko)
DE (2) DE3629122A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160003418U (ko) 2015-03-26 2016-10-06 이정훈 입자 비료 주입기의 주입구 구조

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5290656A (en) * 1988-05-07 1994-03-01 Sumitomo Chemical Company, Limited Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound
US5169741A (en) * 1988-10-11 1992-12-08 Matsushita Electric Industrial Co., Ltd. Method for forming high sensitivity positive patterns employing a material containing a photosensitive compound having a diazo group, an alkaline-soluble polymer, a compound capable of adjusting the pH to 4 or less and a solvent
DE3837499A1 (de) * 1988-11-04 1990-05-23 Hoechst Ag Verfahren zur herstellung von substituierten 1,2-naphthochinon-(2)-diazid-4-sulfonsaeureestern und deren verwendung in einem strahlungsempfindlichen gemisch
US5362599A (en) * 1991-11-14 1994-11-08 International Business Machines Corporations Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds
JP4895329B2 (ja) * 2007-01-12 2012-03-14 日本精工株式会社 ボールねじ機構

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE506677A (ko) * 1950-10-31
NL129162C (ko) * 1959-01-17
GB1113759A (en) * 1965-12-17 1968-05-15 Fuji Photo Film Co Ltd Lithographic printing plates
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
JPS505084B1 (ko) * 1970-09-16 1975-02-28
JPS5280022A (en) * 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
DE2828037A1 (de) * 1978-06-26 1980-01-10 Hoechst Ag Lichtempfindliches gemisch
DE2847878A1 (de) * 1978-11-04 1980-05-22 Hoechst Ag Lichtempfindliches gemisch
DE3100077A1 (de) * 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
US4397937A (en) * 1982-02-10 1983-08-09 International Business Machines Corporation Positive resist compositions
JPS59219743A (ja) * 1983-05-28 1984-12-11 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト現像液
GB8505402D0 (en) * 1985-03-02 1985-04-03 Ciba Geigy Ag Modified phenolic resins

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160003418U (ko) 2015-03-26 2016-10-06 이정훈 입자 비료 주입기의 주입구 구조

Also Published As

Publication number Publication date
JPS6368555A (ja) 1988-03-28
EP0258727A1 (de) 1988-03-09
KR950005773B1 (ko) 1995-05-30
US4873169A (en) 1989-10-10
DE3629122A1 (de) 1988-03-10
DE3765370D1 (de) 1990-11-08
JPH0710826B2 (ja) 1995-02-08
EP0258727B1 (de) 1990-10-03

Similar Documents

Publication Publication Date Title
KR940014440A (ko) 수용액에서의 치환도가 중간인 전분에스테르 및 그 제조방법
KR950011474A (ko) 키토산 수용액 및 겔의 제조방법
KR880002821A (ko) O-나프토퀴논디아지드 설폰산 에스테르를 제조하는 방법 및 이들을 함유하는 감광성 혼합물
ATE24314T1 (de) Mit base katalysiertes verfahren zur herstellung von para-acyloxybenzolsulfonaten.
BR8703985A (pt) Processo para a recuperacao de rodio de solucoes aquosas contendo compostos de complexos de rodio
BR8504008A (pt) Processo para a separacao de um acido organico fraco de uma solucao aquosa
GB1284618A (en) ADDUCTS OF LOWER ALKYL ESTERS OF alpha-L-ASPARTYL-L-PHENYLALANINE
GB1494979A (en) Process for the production of 1-aminobenzene-4-and-5-beta-sulphatoethylsulphone-2-sulphonic acid and their hydroxyethylsulphone-and vinylsulphone derivatives
KR830007574A (ko) 5-메틸-4-이미다졸 카복실산 에스테르의 제조방법
KR830009077A (ko) 푸란 유도체의 제조방법
GB1362276A (en) Stable lactone solution
GB997822A (en) Mono-esters of hydroxyalkyl sulphones and sulphoxides
KR830007681A (ko) 세파렉신의 수용성 유도체의 제조방법
KR940000426A (ko) 2,4-디아미노-1,3,5-트리메틸벤젠-6-술폰산의 제조방법
KR830002779A (ko) 결정성 에피머 항생물질
JPS5620595A (en) Method of stabilizing solution which dissolved organic derivative of hexahydric chromium into hydrocarbon solvent with phosphoric acid ester
SE7601714L (sv) Substituerade indanylpropionsyror
ATE39T1 (de) Verfahren zur herstellung von o-methyl-n-cyclohexyl-2,5 -dimethylfuran-3-hydroxamsaeure.
KR870004048A (ko) 신규한 함인(含燐)함황 화합물의 제조방법
ES400637A1 (es) Procedimiento para preparar acido 6 beta - amino - 2,2 - dimetilpenam - 3 - alfa - carboxilico.
KR880000453A (ko) 세팔로스포린 유도체 및 그의 산부가염의 제조방법
KR840008280A (ko) 미세 결정질의 이소식캄을 제조하는 방법
JPS5653685A (en) Production of cephalosporin derivative
KR920021674A (ko) 도료용 용제 및 그 제조방법
GB1505028A (en) Preparation of gamma-pyrones

Legal Events

Date Code Title Description
A201 Request for examination
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20060525

Year of fee payment: 12

LAPS Lapse due to unpaid annual fee