KR20250047726A - 정보 처리 장치, 추론 장치, 기계 학습 장치, 정보 처리 방법, 추론 방법 및 기계 학습 방법 - Google Patents

정보 처리 장치, 추론 장치, 기계 학습 장치, 정보 처리 방법, 추론 방법 및 기계 학습 방법 Download PDF

Info

Publication number
KR20250047726A
KR20250047726A KR1020257002803A KR20257002803A KR20250047726A KR 20250047726 A KR20250047726 A KR 20250047726A KR 1020257002803 A KR1020257002803 A KR 1020257002803A KR 20257002803 A KR20257002803 A KR 20257002803A KR 20250047726 A KR20250047726 A KR 20250047726A
Authority
KR
South Korea
Prior art keywords
polishing
information
reliability
processing device
detection function
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257002803A
Other languages
English (en)
Korean (ko)
Inventor
류이치로 미타니
Original Assignee
가부시키가이샤 에바라 세이사꾸쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 에바라 세이사꾸쇼 filed Critical 가부시키가이샤 에바라 세이사꾸쇼
Publication of KR20250047726A publication Critical patent/KR20250047726A/ko
Pending legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/005—Control means for lapping machines or devices
    • B24B37/013—Devices or means for detecting lapping completion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B24B37/32—Retaining rings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Program-control systems
    • G05B19/02—Program-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N20/00—Machine learning
    • H01L21/304—
    • H01L21/67259—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0606—Position monitoring, e.g. misposition detection or presence detection
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Software Systems (AREA)
  • Automation & Control Theory (AREA)
  • Manufacturing & Machinery (AREA)
  • Quality & Reliability (AREA)
  • Mathematical Physics (AREA)
  • Computing Systems (AREA)
  • Data Mining & Analysis (AREA)
  • Evolutionary Computation (AREA)
  • Medical Informatics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Artificial Intelligence (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • General Factory Administration (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020257002803A 2022-08-01 2023-06-28 정보 처리 장치, 추론 장치, 기계 학습 장치, 정보 처리 방법, 추론 방법 및 기계 학습 방법 Pending KR20250047726A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2022-122766 2022-08-01
JP2022122766A JP2024019962A (ja) 2022-08-01 2022-08-01 情報処理装置、推論装置、機械学習装置、情報処理方法、推論方法、及び、機械学習方法
PCT/JP2023/023932 WO2024029236A1 (ja) 2022-08-01 2023-06-28 情報処理装置、推論装置、機械学習装置、情報処理方法、推論方法、及び、機械学習方法

Publications (1)

Publication Number Publication Date
KR20250047726A true KR20250047726A (ko) 2025-04-04

Family

ID=89848872

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257002803A Pending KR20250047726A (ko) 2022-08-01 2023-06-28 정보 처리 장치, 추론 장치, 기계 학습 장치, 정보 처리 방법, 추론 방법 및 기계 학습 방법

Country Status (6)

Country Link
US (1) US20260034636A1 (https=)
JP (1) JP2024019962A (https=)
KR (1) KR20250047726A (https=)
CN (1) CN119631164A (https=)
TW (1) TW202406675A (https=)
WO (1) WO2024029236A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025170830A (ja) * 2024-05-08 2025-11-20 株式会社荏原製作所 基板研磨装置および膜厚算出方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021028099A (ja) 2019-08-09 2021-02-25 株式会社荏原製作所 終点検知装置、終点検知方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013176828A (ja) * 2012-02-29 2013-09-09 Ebara Corp 研磨終点検出装置の遠隔監視システム
TW202044394A (zh) * 2019-05-22 2020-12-01 日商荏原製作所股份有限公司 基板處理系統

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021028099A (ja) 2019-08-09 2021-02-25 株式会社荏原製作所 終点検知装置、終点検知方法

Also Published As

Publication number Publication date
JP2024019962A (ja) 2024-02-14
WO2024029236A1 (ja) 2024-02-08
TW202406675A (zh) 2024-02-16
CN119631164A (zh) 2025-03-14
US20260034636A1 (en) 2026-02-05

Similar Documents

Publication Publication Date Title
KR20240169036A (ko) 정보 처리 장치, 추론 장치, 기계 학습 장치, 정보 처리 방법, 추론 방법, 및 기계 학습 방법
KR20250047726A (ko) 정보 처리 장치, 추론 장치, 기계 학습 장치, 정보 처리 방법, 추론 방법 및 기계 학습 방법
KR20240169035A (ko) 정보 처리 장치, 추론 장치, 기계 학습 장치, 정보 처리 방법, 추론 방법, 및 기계 학습 방법
KR20240125594A (ko) 정보 처리 장치, 추론 장치, 기계 학습 장치, 정보 처리 방법, 추론 방법, 및 기계 학습 방법
JP2023116396A (ja) 情報処理装置、推論装置、機械学習装置、情報処理方法、推論方法、及び、機械学習方法
KR20240158923A (ko) 정보 처리 장치, 추론 장치, 기계 학습 장치, 정보 처리 방법, 추론 방법 및 기계 학습 방법
KR102936337B1 (ko) 정보 처리 장치, 추론 장치, 기계 학습 장치, 정보 처리 방법, 추론 방법, 및 기계 학습 방법
KR20250038752A (ko) 정보 처리 장치, 기계 학습 장치, 정보 처리 방법 및 기계 학습 방법
CN118434534A (zh) 信息处理装置、推论装置、机器学习装置、信息处理方法、推论方法及机器学习方法
WO2023149162A1 (ja) 情報処理装置、推論装置、機械学習装置、情報処理方法、推論方法、及び、機械学習方法
KR20240146043A (ko) 정보 처리 장치, 추론 장치, 기계 학습 장치, 정보 처리 방법, 추론 방법, 및 기계 학습 방법
JP7807207B2 (ja) 情報処理装置、推論装置、機械学習装置、情報処理方法、推論方法、及び、機械学習方法
KR20240024751A (ko) 정보 처리 장치, 기계 학습 장치, 정보 처리 방법 및 기계 학습 방법
KR20240147989A (ko) 정보 처리 장치, 추론 장치, 기계 학습 장치, 정보 처리 방법, 추론 방법, 및 기계 학습 방법
US20240363449A1 (en) Information processing device, inference device, and machine learning device
JP2023090667A (ja) 情報処理装置、推論装置、機械学習装置、情報処理方法、推論方法、及び、機械学習方法
CN118660786A (zh) 信息处理装置、推论装置、机器学习装置、信息处理方法、推论方法及机器学习方法
KR20250065591A (ko) 정보 처리 장치, 기계 학습 장치, 정보 처리 방법 및 기계 학습 방법
WO2024135150A1 (ja) 情報処理装置、推論装置、機械学習装置、情報処理方法、推論方法、及び、機械学習方法

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000