KR20220039729A - 규소이소시아네이트 화합물 함유 조성물 및 그 제조 방법 - Google Patents
규소이소시아네이트 화합물 함유 조성물 및 그 제조 방법 Download PDFInfo
- Publication number
- KR20220039729A KR20220039729A KR1020227003738A KR20227003738A KR20220039729A KR 20220039729 A KR20220039729 A KR 20220039729A KR 1020227003738 A KR1020227003738 A KR 1020227003738A KR 20227003738 A KR20227003738 A KR 20227003738A KR 20220039729 A KR20220039729 A KR 20220039729A
- Authority
- KR
- South Korea
- Prior art keywords
- silicon
- isocyanate compound
- compound
- solvent
- silicon isocyanate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2019-139392 | 2019-07-30 | ||
| JP2019139392 | 2019-07-30 | ||
| PCT/JP2020/028634 WO2021020325A1 (ja) | 2019-07-30 | 2020-07-27 | ケイ素イソシアナト化合物含有組成物及びその製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20220039729A true KR20220039729A (ko) | 2022-03-29 |
Family
ID=74229129
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020227003738A Pending KR20220039729A (ko) | 2019-07-30 | 2020-07-27 | 규소이소시아네이트 화합물 함유 조성물 및 그 제조 방법 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7672652B2 (https=) |
| KR (1) | KR20220039729A (https=) |
| CN (1) | CN114174307A (https=) |
| TW (1) | TWI884161B (https=) |
| WO (1) | WO2021020325A1 (https=) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54119419A (en) | 1978-03-09 | 1979-09-17 | Toshiba Silicone | Manufacture of organoisocyanate silane |
| JPS55102589A (en) | 1980-01-26 | 1980-08-05 | Toyama Chem Co Ltd | Preparation of organo-silicon isocyanates |
| JPS5626895A (en) | 1979-08-09 | 1981-03-16 | Ichiro Kijima | Preparation of silicon isocyanate compound |
| JPS62167785A (ja) | 1987-01-08 | 1987-07-24 | Matsumoto Seiyaku Kogyo Kk | ケイ素イソシアネ−トの製造法 |
| JPH07188257A (ja) | 1993-03-10 | 1995-07-25 | Yoshisaki Abe | トリイソシアナトシランの製造法 |
| JP2000247982A (ja) | 1999-02-26 | 2000-09-12 | Matsumoto Seiyaku Kogyo Kk | イソシアナトジシロキサンの製造法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5835515B2 (ja) * | 1977-09-12 | 1983-08-03 | 日本化成株式会社 | イソシアヌル酸エステルの製造法 |
| JPS5832887A (ja) * | 1981-08-19 | 1983-02-25 | Matsumoto Seiyaku Kogyo Kk | ケイ素イソシアネ−トの製造法 |
| JP3522902B2 (ja) * | 1995-06-03 | 2004-04-26 | 信越化学工業株式会社 | ウレイド基含有アルコキシシランの製造方法 |
| JP2001240796A (ja) * | 2000-02-29 | 2001-09-04 | Ube Nitto Kasei Co Ltd | 有機無機ハイブリッド−無機複合傾斜材料およびその用途 |
| CN1249069C (zh) * | 2001-09-21 | 2006-04-05 | 陶氏康宁东丽硅氧烷株式会社 | 带有氰硫基的有机烷氧基硅烷的制备方法 |
| JP4310639B2 (ja) * | 2004-04-30 | 2009-08-12 | 信越化学工業株式会社 | β−ケトエステル構造含有有機ケイ素化合物の製造方法 |
| JP5444689B2 (ja) | 2008-08-06 | 2014-03-19 | 東洋紡株式会社 | レーザー彫刻用凸版印刷原版及びそれから得られる凸版印刷版 |
| KR101660059B1 (ko) * | 2008-08-22 | 2016-09-26 | 박스알타 인코퍼레이티드 | 중합체 벤질 카르보네이트-유도체 |
| JP6243215B2 (ja) * | 2013-12-18 | 2017-12-06 | 大陽日酸株式会社 | トリイソシアナトシランの精製方法及び供給方法 |
| US10266554B2 (en) * | 2017-05-31 | 2019-04-23 | Momentive Performance Materials Inc. | Preparation of isocyanatosilanes |
-
2020
- 2020-07-27 WO PCT/JP2020/028634 patent/WO2021020325A1/ja not_active Ceased
- 2020-07-27 JP JP2021537013A patent/JP7672652B2/ja active Active
- 2020-07-27 CN CN202080052675.4A patent/CN114174307A/zh active Pending
- 2020-07-27 KR KR1020227003738A patent/KR20220039729A/ko active Pending
- 2020-07-28 TW TW109125430A patent/TWI884161B/zh active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54119419A (en) | 1978-03-09 | 1979-09-17 | Toshiba Silicone | Manufacture of organoisocyanate silane |
| JPS5626895A (en) | 1979-08-09 | 1981-03-16 | Ichiro Kijima | Preparation of silicon isocyanate compound |
| JPS55102589A (en) | 1980-01-26 | 1980-08-05 | Toyama Chem Co Ltd | Preparation of organo-silicon isocyanates |
| JPS62167785A (ja) | 1987-01-08 | 1987-07-24 | Matsumoto Seiyaku Kogyo Kk | ケイ素イソシアネ−トの製造法 |
| JPH07188257A (ja) | 1993-03-10 | 1995-07-25 | Yoshisaki Abe | トリイソシアナトシランの製造法 |
| JP2000247982A (ja) | 1999-02-26 | 2000-09-12 | Matsumoto Seiyaku Kogyo Kk | イソシアナトジシロキサンの製造法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2021020325A1 (ja) | 2021-02-04 |
| CN114174307A (zh) | 2022-03-11 |
| TW202112789A (zh) | 2021-04-01 |
| TWI884161B (zh) | 2025-05-21 |
| JP7672652B2 (ja) | 2025-05-08 |
| JPWO2021020325A1 (https=) | 2021-02-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| D21 | Rejection of application intended |
Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D21-EXM-PE0902 (AS PROVIDED BY THE NATIONAL OFFICE) |
|
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| E13 | Pre-grant limitation requested |
Free format text: ST27 STATUS EVENT CODE: A-2-3-E10-E13-LIM-X000 (AS PROVIDED BY THE NATIONAL OFFICE) |
|
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
|
| P11 | Amendment of application requested |
Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE) |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |