KR20220023983A - 산화루테늄 가스의 흡수액, 산화루테늄의 분석 방법 및 트랩 장치, 정량 분석 장치 - Google Patents

산화루테늄 가스의 흡수액, 산화루테늄의 분석 방법 및 트랩 장치, 정량 분석 장치 Download PDF

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KR20220023983A
KR20220023983A KR1020217040358A KR20217040358A KR20220023983A KR 20220023983 A KR20220023983 A KR 20220023983A KR 1020217040358 A KR1020217040358 A KR 1020217040358A KR 20217040358 A KR20217040358 A KR 20217040358A KR 20220023983 A KR20220023983 A KR 20220023983A
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ion
ruthenium oxide
absorption liquid
oxide gas
group
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Korean (ko)
Inventor
도모아키 사토
유키 깃카와
다카후미 시모다
다카유키 네기시
시게노리 마에다
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가부시끼가이샤 도꾸야마
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/02—Devices for withdrawing samples
    • G01N1/22—Devices for withdrawing samples in the gaseous state
    • G01N1/2202—Devices for withdrawing samples in the gaseous state involving separation of sample components during sampling
    • G01N1/2214—Devices for withdrawing samples in the gaseous state involving separation of sample components during sampling by sorption
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/0004—Gaseous mixtures, e.g. polluted air
    • G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
    • G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/1493—Selection of liquid materials for use as absorbents
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/40—Concentrating samples
    • G01N1/405—Concentrating samples by adsorption or absorption
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2252/00—Absorbents, i.e. solvents and liquid materials for gas absorption
    • B01D2252/20—Organic absorbents
    • B01D2252/205—Other organic compounds not covered by B01D2252/00 - B01D2252/20494
    • B01D2252/2053—Other nitrogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/60—Heavy metals or heavy metal compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/02—Devices for withdrawing samples
    • G01N1/22—Devices for withdrawing samples in the gaseous state
    • G01N1/2202—Devices for withdrawing samples in the gaseous state involving separation of sample components during sampling
    • G01N1/2214—Devices for withdrawing samples in the gaseous state involving separation of sample components during sampling by sorption
    • G01N2001/2217—Devices for withdrawing samples in the gaseous state involving separation of sample components during sampling by sorption using a liquid
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
    • G01N2021/3155—Measuring in two spectral ranges, e.g. UV and visible

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Molecular Biology (AREA)
  • Biomedical Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Food Science & Technology (AREA)
  • Combustion & Propulsion (AREA)
  • Electrochemistry (AREA)
  • Gas Separation By Absorption (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
KR1020217040358A 2019-06-21 2020-06-17 산화루테늄 가스의 흡수액, 산화루테늄의 분석 방법 및 트랩 장치, 정량 분석 장치 Withdrawn KR20220023983A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2019-115740 2019-06-21
JP2019115740 2019-06-21
PCT/JP2020/023732 WO2020256007A1 (ja) 2019-06-21 2020-06-17 酸化ルテニウムガスの吸収液、酸化ルテニウムの分析方法およびトラップ装置、定量分析装置

Publications (1)

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KR20220023983A true KR20220023983A (ko) 2022-03-03

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KR1020217040358A Withdrawn KR20220023983A (ko) 2019-06-21 2020-06-17 산화루테늄 가스의 흡수액, 산화루테늄의 분석 방법 및 트랩 장치, 정량 분석 장치

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Country Link
US (1) US20220316996A1 (https=)
JP (1) JP7606455B2 (https=)
KR (1) KR20220023983A (https=)
TW (1) TW202110527A (https=)
WO (1) WO2020256007A1 (https=)

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CN114383899A (zh) * 2021-12-01 2022-04-22 中国辐射防护研究院 一种气溶胶中放射性核素的液体吸收方法
CN115028536A (zh) * 2022-06-27 2022-09-09 昆明贵金属研究所 一种四正丙基过钌酸铵(ⅶ)的制备方法
CN120361726A (zh) * 2025-06-25 2025-07-25 中核核电运行管理有限公司 一种用于石墨慢化剂中碳-14回收的方法

Citations (1)

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Publication number Priority date Publication date Assignee Title
JP2002267606A (ja) 2001-03-12 2002-09-18 Hitachi Ltd ガス検知方法

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Publication number Priority date Publication date Assignee Title
JPH0752234B2 (ja) * 1985-11-14 1995-06-05 石川島播磨重工業株式会社 核燃料再処理廃液のガラス固化方法
JPH0269658A (ja) * 1988-09-05 1990-03-08 Ishikawajima Harima Heavy Ind Co Ltd 揮発性ルテニウムの測定方法
JPH07287096A (ja) * 1994-04-18 1995-10-31 Hitachi Ltd ルテニウムの処理方法及び放射性液体廃棄物の処理方法並びに放射性液体廃棄物の処理装置
JPH0972833A (ja) * 1995-09-04 1997-03-18 Mitsubishi Heavy Ind Ltd 揮発性四酸化ルテニウムのサンプリング方法
JP2000034563A (ja) * 1998-07-14 2000-02-02 Japan Energy Corp 高純度ルテニウムスパッタリングターゲットの製造方法及び高純度ルテニウムスパッタリングターゲット
US6479297B1 (en) * 2000-08-31 2002-11-12 Micron Technology, Inc. Sensor devices, methods and systems for detecting gas phase materials
FR2850878B1 (fr) * 2003-02-10 2005-04-01 Cogema Procede et dispositif de capture de ruthenium present dans un effluent gazeux
US7476290B2 (en) * 2003-10-30 2009-01-13 Ebara Corporation Substrate processing apparatus and substrate processing method
WO2011074601A1 (ja) * 2009-12-17 2011-06-23 昭和電工株式会社 ルテニウム系金属のエッチング用組成物およびその調製方法
CN102616868B (zh) * 2012-03-05 2014-04-30 阳光凯迪新能源集团有限公司 利用含钌废催化剂制备固体亚硝酰硝酸钌的方法
JP6066267B2 (ja) * 2012-08-30 2017-01-25 国立研究開発法人日本原子力研究開発機構 ルテニウムの分離回収方法
CN106148725B (zh) * 2016-08-29 2018-07-10 金川集团股份有限公司 一种分离精炼锇的方法
JP7219061B2 (ja) * 2018-11-14 2023-02-07 関東化学株式会社 ルテニウム除去用組成物
WO2020166677A1 (ja) * 2019-02-13 2020-08-20 株式会社トクヤマ オニウム塩を含む半導体ウェハの処理液

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002267606A (ja) 2001-03-12 2002-09-18 Hitachi Ltd ガス検知方法

Non-Patent Citations (1)

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Title
일본 원자력 학회지, 1986 년, Vol.28, No.6, p 493-500

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WO2020256007A1 (ja) 2020-12-24
US20220316996A1 (en) 2022-10-06
JP7606455B2 (ja) 2024-12-25
JPWO2020256007A1 (https=) 2020-12-24
TW202110527A (zh) 2021-03-16

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