KR20210082534A - 저 히드록시기 고순도 석영 유리 및 그 제조 방법 - Google Patents

저 히드록시기 고순도 석영 유리 및 그 제조 방법 Download PDF

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KR20210082534A
KR20210082534A KR1020217018132A KR20217018132A KR20210082534A KR 20210082534 A KR20210082534 A KR 20210082534A KR 1020217018132 A KR1020217018132 A KR 1020217018132A KR 20217018132 A KR20217018132 A KR 20217018132A KR 20210082534 A KR20210082534 A KR 20210082534A
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South Korea
Prior art keywords
temperature
powder
silicon dioxide
quartz glass
dioxide powder
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KR1020217018132A
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English (en)
Korean (ko)
Inventor
밍밍 탕
멍페이 왕
이깡 챈
쥔이 마
샌껀 짱
이춘 썬
야리 천
Original Assignee
종티엔 테크놀로지 어드밴스드 머티리얼즈 컴퍼니 리미티드
장쑤 종티엔 테크놀로지 컴퍼니 리미티드
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Publication of KR20210082534A publication Critical patent/KR20210082534A/ko

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/102—Forming solid beads by blowing a gas onto a stream of molten glass or onto particulate materials, e.g. pulverising
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C01B33/184—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane by hydrolysis of tetrafluoride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/02—Pretreated ingredients
    • C03C1/022—Purification of silica sand or other minerals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/10—Solid density
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • C03B2201/04—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B25/00—Annealing glass products
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/10—Melting processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2204/00—Glasses, glazes or enamels with special properties

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
KR1020217018132A 2020-09-22 2020-12-09 저 히드록시기 고순도 석영 유리 및 그 제조 방법 KR20210082534A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN202011001200.0A CN114249524A (zh) 2020-09-22 2020-09-22 低羟基高纯石英玻璃及其制备方法
CN202011001200.0 2020-09-22
PCT/CN2020/134893 WO2021174936A1 (zh) 2020-09-22 2020-12-09 低羟基高纯石英玻璃及其制备方法

Publications (1)

Publication Number Publication Date
KR20210082534A true KR20210082534A (ko) 2021-07-05

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KR1020217018132A KR20210082534A (ko) 2020-09-22 2020-12-09 저 히드록시기 고순도 석영 유리 및 그 제조 방법

Country Status (6)

Country Link
US (1) US11981594B2 (ja)
EP (1) EP3901106A4 (ja)
JP (1) JP7195441B2 (ja)
KR (1) KR20210082534A (ja)
CN (1) CN114249524A (ja)
WO (1) WO2021174936A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114368757A (zh) * 2022-01-21 2022-04-19 成都光华科技发展有限公司 一种高纯石英砂的提纯方法

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* Cited by examiner, † Cited by third party
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WO2019044805A1 (ja) * 2017-08-29 2019-03-07 住友電気工業株式会社 ガラス微粒子堆積体の製造方法、ガラス母材の製造方法及びガラス母材
CN114751631B (zh) * 2022-05-17 2022-12-20 上海菲利华石创科技有限公司 一种低羟基不透明石英玻璃及其制造方法
CN116177876B (zh) * 2022-12-27 2024-01-16 中建材玻璃新材料研究院集团有限公司 一种降低锂铝硅酸盐玻璃羟基含量的方法

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JPS5858292B2 (ja) 1980-01-21 1983-12-24 株式会社日立製作所 シリカガラスの製造方法
JPS62158121A (ja) 1985-12-27 1987-07-14 Shinetsu Sekiei Kk 石英ガラスの均質化方法
JP2737191B2 (ja) 1987-12-28 1998-04-08 東ソー株式会社 均質な石英ガラス塊の製造方法
JP2835540B2 (ja) 1991-06-29 1998-12-14 信越石英株式会社 エキシマレーザー用石英ガラス部材の製造方法
JP2530954B2 (ja) 1991-08-30 1996-09-04 信越石英株式会社 光学部材
JPH06263468A (ja) 1993-03-12 1994-09-20 Sumitomo Electric Ind Ltd ガラス母材の製造方法
EP1101741B1 (de) 1999-11-15 2005-07-13 Heraeus Quarzglas GmbH & Co. KG Quarzglaskörper für ein optisches Bauteil und Verfahren zu seiner Herstellung
EP1328482A1 (en) * 2000-09-28 2003-07-23 Corning Incorporated Optical glass silica soot particles and method of making same
JP4213412B2 (ja) 2002-06-26 2009-01-21 東ソー株式会社 真空紫外光用合成石英ガラス、その製造方法及びこれを用いた真空紫外光用マスク基板
JP2004338992A (ja) 2003-05-14 2004-12-02 Sumitomo Electric Ind Ltd ガラス母材の製造方法
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CN110040942B (zh) * 2018-01-16 2021-10-12 中天科技集团有限公司 粉末体脱羟处理方法及石英玻璃的制备方法
CN110183100B (zh) * 2019-06-19 2021-07-16 湖北菲利华石英玻璃股份有限公司 一种利用大规格二氧化硅疏松体制备石英玻璃的方法
CN111393022B (zh) * 2020-03-23 2022-11-01 黄冈师范学院 一种高纯度、低羟基石英玻璃原料的制备方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114368757A (zh) * 2022-01-21 2022-04-19 成都光华科技发展有限公司 一种高纯石英砂的提纯方法

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Publication number Publication date
CN114249524A (zh) 2022-03-29
JP7195441B2 (ja) 2022-12-23
US20220340469A1 (en) 2022-10-27
JP2022526062A (ja) 2022-05-23
EP3901106A4 (en) 2022-11-09
US11981594B2 (en) 2024-05-14
EP3901106A1 (en) 2021-10-27
WO2021174936A1 (zh) 2021-09-10

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