KR20210052193A - Compound, photosensitive resin composition comprising the same, photosensitive resin layer, color filter and display device - Google Patents
Compound, photosensitive resin composition comprising the same, photosensitive resin layer, color filter and display device Download PDFInfo
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- KR20210052193A KR20210052193A KR1020200104060A KR20200104060A KR20210052193A KR 20210052193 A KR20210052193 A KR 20210052193A KR 1020200104060 A KR1020200104060 A KR 1020200104060A KR 20200104060 A KR20200104060 A KR 20200104060A KR 20210052193 A KR20210052193 A KR 20210052193A
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- South Korea
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- formula
- photosensitive resin
- solid
- compound
- resin composition
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 157
- 239000011342 resin composition Substances 0.000 title claims abstract description 71
- 239000011347 resin Substances 0.000 title claims abstract description 33
- 229920005989 resin Polymers 0.000 title claims abstract description 33
- 238000010521 absorption reaction Methods 0.000 claims abstract description 19
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000000126 substance Substances 0.000 claims description 44
- 239000000049 pigment Substances 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 30
- 239000002904 solvent Substances 0.000 claims description 19
- 239000011230 binding agent Substances 0.000 claims description 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 13
- 125000005843 halogen group Chemical group 0.000 claims description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 239000001046 green dye Substances 0.000 claims description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 159
- 230000015572 biosynthetic process Effects 0.000 description 148
- 238000003786 synthesis reaction Methods 0.000 description 148
- 239000007787 solid Substances 0.000 description 139
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 71
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 48
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 39
- 238000006243 chemical reaction Methods 0.000 description 39
- 230000000052 comparative effect Effects 0.000 description 37
- 238000000746 purification Methods 0.000 description 37
- 238000004440 column chromatography Methods 0.000 description 36
- 238000003756 stirring Methods 0.000 description 36
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 34
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 33
- OQHXZZGZASQSOB-UHFFFAOYSA-N 3,4,5,6-tetrachlorobenzene-1,2-dicarbonitrile Chemical compound ClC1=C(Cl)C(Cl)=C(C#N)C(C#N)=C1Cl OQHXZZGZASQSOB-UHFFFAOYSA-N 0.000 description 30
- -1 phthalocyanine compound Chemical class 0.000 description 29
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 27
- 238000001840 matrix-assisted laser desorption--ionisation time-of-flight mass spectrometry Methods 0.000 description 27
- 239000004246 zinc acetate Substances 0.000 description 27
- 238000001556 precipitation Methods 0.000 description 26
- 238000001291 vacuum drying Methods 0.000 description 25
- 238000001914 filtration Methods 0.000 description 24
- 229920006391 phthalonitrile polymer Polymers 0.000 description 24
- 238000000605 extraction Methods 0.000 description 22
- XQZYPMVTSDWCCE-UHFFFAOYSA-N phthalonitrile Chemical compound N#CC1=CC=CC=C1C#N XQZYPMVTSDWCCE-UHFFFAOYSA-N 0.000 description 21
- 238000010438 heat treatment Methods 0.000 description 20
- VSTXCZGEEVFJES-UHFFFAOYSA-N 1-cycloundecyl-1,5-diazacycloundec-5-ene Chemical compound C1CCCCCC(CCCC1)N1CCCCCC=NCCC1 VSTXCZGEEVFJES-UHFFFAOYSA-N 0.000 description 19
- 239000000975 dye Substances 0.000 description 19
- 239000006185 dispersion Substances 0.000 description 18
- 239000010408 film Substances 0.000 description 16
- 239000003086 colorant Substances 0.000 description 15
- 239000003999 initiator Substances 0.000 description 15
- 239000004593 Epoxy Substances 0.000 description 13
- 125000001424 substituent group Chemical group 0.000 description 12
- 239000000758 substrate Substances 0.000 description 12
- 125000000217 alkyl group Chemical group 0.000 description 11
- 239000000178 monomer Substances 0.000 description 11
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 10
- 239000002270 dispersing agent Substances 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 7
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Natural products CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 7
- FKRCODPIKNYEAC-UHFFFAOYSA-N propionic acid ethyl ester Natural products CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 7
- 230000037303 wrinkles Effects 0.000 description 7
- 239000002253 acid Substances 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 6
- 229940017219 methyl propionate Drugs 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 5
- SQWTUSNTRUMNMA-UHFFFAOYSA-N 3,4,6-trichloro-5-(2,4-ditert-butylphenoxy)benzene-1,2-dicarbonitrile Chemical compound ClC1=C(C(C#N)=C(C(=C1OC1=C(C=C(C=C1)C(C)(C)C)C(C)(C)C)Cl)Cl)C#N SQWTUSNTRUMNMA-UHFFFAOYSA-N 0.000 description 5
- ICKZBUCPDQLYFF-UHFFFAOYSA-N 3,4,6-trichloro-5-(3-methylbutoxy)benzene-1,2-dicarbonitrile Chemical compound ClC1=C(C(C#N)=C(C(=C1Cl)OCCC(C)C)Cl)C#N ICKZBUCPDQLYFF-UHFFFAOYSA-N 0.000 description 5
- OHNZJDALBVYSKL-UHFFFAOYSA-N 4-(2-tert-butylphenoxy)-3,5,6-trichlorobenzene-1,2-dicarbonitrile Chemical compound C(C)(C)(C)C1=C(OC=2C(=C(C(C#N)=C(C=2Cl)Cl)C#N)Cl)C=CC=C1 OHNZJDALBVYSKL-UHFFFAOYSA-N 0.000 description 5
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 5
- 229940022663 acetate Drugs 0.000 description 5
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 230000007261 regionalization Effects 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- ICKWICRCANNIBI-UHFFFAOYSA-N 2,4-di-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C(C(C)(C)C)=C1 ICKWICRCANNIBI-UHFFFAOYSA-N 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 4
- MTJZPAKSHPIYLB-UHFFFAOYSA-N CC(COC=1C(=C(C(C#N)=C(C=1Cl)Cl)C#N)Cl)(C)C Chemical compound CC(COC=1C(=C(C(C#N)=C(C=1Cl)Cl)C#N)Cl)(C)C MTJZPAKSHPIYLB-UHFFFAOYSA-N 0.000 description 4
- 239000006087 Silane Coupling Agent Substances 0.000 description 4
- 239000012965 benzophenone Substances 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- UXGNZZKBCMGWAZ-UHFFFAOYSA-N dimethylformamide dmf Chemical compound CN(C)C=O.CN(C)C=O UXGNZZKBCMGWAZ-UHFFFAOYSA-N 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- IAPQYJWHSSIDMN-UHFFFAOYSA-N 1-cycloundecyl-1,2-diazacycloundec-7-ene Chemical compound C1CCCCCC(CCCC1)N1CCCC=CCCCCN1 IAPQYJWHSSIDMN-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 3
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 3
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 3
- WZTQUWRJOJJWMY-UHFFFAOYSA-N 3,4,6-trichloro-5-(2,4-dimethoxyphenoxy)benzene-1,2-dicarbonitrile Chemical compound ClC1=C(C(C#N)=C(C(=C1Cl)OC1=C(C=C(C=C1)OC)OC)Cl)C#N WZTQUWRJOJJWMY-UHFFFAOYSA-N 0.000 description 3
- WWLVFZBYIZMZCN-UHFFFAOYSA-N 3,4,6-trichloro-5-(2,6-dimethylphenoxy)benzene-1,2-dicarbonitrile Chemical compound ClC1=C(C(C#N)=C(C(=C1OC1=C(C=CC=C1C)C)Cl)Cl)C#N WWLVFZBYIZMZCN-UHFFFAOYSA-N 0.000 description 3
- UVHHADIQQIICAV-UHFFFAOYSA-N 4-amino-3-[[4-[4-[(1-amino-4-sulfonaphthalen-2-yl)diazenyl]-2-methylphenyl]-3-methylphenyl]diazenyl]naphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(N)C(N=NC=3C=C(C(=CC=3)C=3C(=CC(=CC=3)N=NC=3C(=C4C=CC=CC4=C(C=3)S(O)(=O)=O)N)C)C)=CC(S(O)(=O)=O)=C21 UVHHADIQQIICAV-UHFFFAOYSA-N 0.000 description 3
- RJWROZVKOUBKCS-UHFFFAOYSA-N C(C)(C)(C)C1=C(OC=2C(=C(C(C#N)=C(C=2Cl)Cl)C#N)Cl)C=CC(=C1)C Chemical compound C(C)(C)(C)C1=C(OC=2C(=C(C(C#N)=C(C=2Cl)Cl)C#N)Cl)C=CC(=C1)C RJWROZVKOUBKCS-UHFFFAOYSA-N 0.000 description 3
- ZKENLQGRAXJMIL-UHFFFAOYSA-N CC(COC=1C(=C(C(C#N)=C(C=1Cl)Cl)C#N)Cl)C Chemical compound CC(COC=1C(=C(C(C#N)=C(C=1Cl)Cl)C#N)Cl)C ZKENLQGRAXJMIL-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- CGRTZESQZZGAAU-UHFFFAOYSA-N [2-[3-[1-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoyloxy]-2-methylpropan-2-yl]-2,4,8,10-tetraoxaspiro[5.5]undecan-9-yl]-2-methylpropyl] 3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C)=CC(CCC(=O)OCC(C)(C)C2OCC3(CO2)COC(OC3)C(C)(C)COC(=O)CCC=2C=C(C(O)=C(C)C=2)C(C)(C)C)=C1 CGRTZESQZZGAAU-UHFFFAOYSA-N 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000005907 alkyl ester group Chemical group 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 239000003963 antioxidant agent Substances 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 229960002130 benzoin Drugs 0.000 description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 3
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 238000007334 copolymerization reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 2
- MNVMYTVDDOXZLS-UHFFFAOYSA-N 2,4-dimethoxyphenol Chemical compound COC1=CC=C(O)C(OC)=C1 MNVMYTVDDOXZLS-UHFFFAOYSA-N 0.000 description 2
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 2
- APOFCDRLPFHGDY-UHFFFAOYSA-N 3,4,6-trichloro-5-(2-methylphenoxy)benzene-1,2-dicarbonitrile Chemical compound CC1=CC=CC=C1OC1=C(Cl)C(Cl)=C(C#N)C(C#N)=C1Cl APOFCDRLPFHGDY-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 229940116333 ethyl lactate Drugs 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000001056 green pigment Substances 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- PHTQWCKDNZKARW-UHFFFAOYSA-N isoamylol Chemical compound CC(C)CCO PHTQWCKDNZKARW-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- ZWRUINPWMLAQRD-UHFFFAOYSA-N nonan-1-ol Chemical compound CCCCCCCCCO ZWRUINPWMLAQRD-UHFFFAOYSA-N 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 2
- 239000001052 yellow pigment Substances 0.000 description 2
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 1
- FJKOQFIGFHTRRW-UHFFFAOYSA-N (2-methoxy-3-methylphenyl)-(3-methylphenyl)methanone Chemical compound COC1=C(C)C=CC=C1C(=O)C1=CC=CC(C)=C1 FJKOQFIGFHTRRW-UHFFFAOYSA-N 0.000 description 1
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 1
- WBODDOZXDKQEFS-UHFFFAOYSA-N 1,2,3,4-tetramethyl-5-phenylbenzene Chemical group CC1=C(C)C(C)=CC(C=2C=CC=CC=2)=C1C WBODDOZXDKQEFS-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- BUZYGTVTZYSBCU-UHFFFAOYSA-N 1-(4-chlorophenyl)ethanone Chemical compound CC(=O)C1=CC=C(Cl)C=C1 BUZYGTVTZYSBCU-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- YNSNJGRCQCDRDM-UHFFFAOYSA-N 1-chlorothioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl YNSNJGRCQCDRDM-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 1
- BPIUIOXAFBGMNB-UHFFFAOYSA-N 1-hexoxyhexane Chemical compound CCCCCCOCCCCCC BPIUIOXAFBGMNB-UHFFFAOYSA-N 0.000 description 1
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 description 1
- BRKORVYTKKLNKX-UHFFFAOYSA-N 2,4-di(propan-2-yl)thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC(C(C)C)=C3SC2=C1 BRKORVYTKKLNKX-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- RGQZNGYAMHQVNG-UHFFFAOYSA-N 2-(1,3-benzodioxol-5-ylmethyl)-4-(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC=NC(CC=2C=C3OCOC3=CC=2)=N1 RGQZNGYAMHQVNG-UHFFFAOYSA-N 0.000 description 1
- ZAOMUMJENGCKAR-UHFFFAOYSA-N 2-(1-phenylbut-3-en-2-yloxy)but-3-enylbenzene Chemical compound C=1C=CC=CC=1CC(C=C)OC(C=C)CC1=CC=CC=C1 ZAOMUMJENGCKAR-UHFFFAOYSA-N 0.000 description 1
- DQMOHZLFVGYNAN-UHFFFAOYSA-N 2-(2-phenylethenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=CC=2C=CC=CC=2)=N1 DQMOHZLFVGYNAN-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- FVNIIPIYHHEXQA-UHFFFAOYSA-N 2-(4-methoxynaphthalen-1-yl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C12=CC=CC=C2C(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 FVNIIPIYHHEXQA-UHFFFAOYSA-N 0.000 description 1
- QRHHZFRCJDAUNA-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 QRHHZFRCJDAUNA-UHFFFAOYSA-N 0.000 description 1
- MPNIGZBDAMWHSX-UHFFFAOYSA-N 2-(4-methylphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(C)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 MPNIGZBDAMWHSX-UHFFFAOYSA-N 0.000 description 1
- PUBNJSZGANKUGX-UHFFFAOYSA-N 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=C(C)C=C1 PUBNJSZGANKUGX-UHFFFAOYSA-N 0.000 description 1
- ZJRNXDIVAGHETA-UHFFFAOYSA-N 2-[2-(3,4-dimethoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=C(OC)C(OC)=CC=C1C=CC1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 ZJRNXDIVAGHETA-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- FGTYTUFKXYPTML-UHFFFAOYSA-N 2-benzoylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 FGTYTUFKXYPTML-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- AAXRSWGYLGOFQP-UHFFFAOYSA-N 2-butoxy-1-(2-butoxyphenyl)ethanone Chemical compound CCCCOCC(=O)C1=CC=CC=C1OCCCC AAXRSWGYLGOFQP-UHFFFAOYSA-N 0.000 description 1
- 125000003006 2-dimethylaminoethyl group Chemical group [H]C([H])([H])N(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- MRDMGGOYEBRLPD-UHFFFAOYSA-N 2-ethoxy-1-(2-ethoxyphenyl)ethanone Chemical compound CCOCC(=O)C1=CC=CC=C1OCC MRDMGGOYEBRLPD-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- HXDLWJWIAHWIKI-UHFFFAOYSA-N 2-hydroxyethyl acetate Chemical compound CC(=O)OCCO HXDLWJWIAHWIKI-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- SFAMKDPMPDEXGH-UHFFFAOYSA-N 2-hydroxyethyl propanoate Chemical compound CCC(=O)OCCO SFAMKDPMPDEXGH-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- MWDGNKGKLOBESZ-UHFFFAOYSA-N 2-oxooctanal Chemical compound CCCCCCC(=O)C=O MWDGNKGKLOBESZ-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- HAZQZUFYRLFOLC-UHFFFAOYSA-N 2-phenyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C=CC=CC=2)=N1 HAZQZUFYRLFOLC-UHFFFAOYSA-N 0.000 description 1
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 description 1
- IKEHOXWJQXIQAG-UHFFFAOYSA-N 2-tert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1 IKEHOXWJQXIQAG-UHFFFAOYSA-N 0.000 description 1
- WYYQKWASBLTRIW-UHFFFAOYSA-N 2-trimethoxysilylbenzoic acid Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1C(O)=O WYYQKWASBLTRIW-UHFFFAOYSA-N 0.000 description 1
- FDUZBJLEANZZGM-UHFFFAOYSA-N 3,4,6-trichloro-5-(2,4-dimethylphenoxy)benzene-1,2-dicarbonitrile Chemical compound ClC1=C(C(C#N)=C(C(=C1Cl)OC1=C(C=C(C=C1)C)C)Cl)C#N FDUZBJLEANZZGM-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- OKISUZLXOYGIFP-UHFFFAOYSA-N 4,4'-dichlorobenzophenone Chemical compound C1=CC(Cl)=CC=C1C(=O)C1=CC=C(Cl)C=C1 OKISUZLXOYGIFP-UHFFFAOYSA-N 0.000 description 1
- SRIJSZQFAMLVQV-UHFFFAOYSA-N 4,5-dichlorobenzene-1,2-dicarbonitrile Chemical compound ClC1=CC(C#N)=C(C#N)C=C1Cl SRIJSZQFAMLVQV-UHFFFAOYSA-N 0.000 description 1
- NJCZNNLWHMTUAW-UHFFFAOYSA-N 4-(2-butan-2-ylphenoxy)-3,5,6-trichlorobenzene-1,2-dicarbonitrile Chemical compound C(C)(CC)C1=C(OC=2C(=C(C(C#N)=C(C=2Cl)Cl)C#N)Cl)C=CC=C1 NJCZNNLWHMTUAW-UHFFFAOYSA-N 0.000 description 1
- UNDXPKDBFOOQFC-UHFFFAOYSA-N 4-[2-nitro-4-(trifluoromethyl)phenyl]morpholine Chemical compound [O-][N+](=O)C1=CC(C(F)(F)F)=CC=C1N1CCOCC1 UNDXPKDBFOOQFC-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- ZNSMNVMLTJELDZ-UHFFFAOYSA-N Bis(2-chloroethyl)ether Chemical compound ClCCOCCCl ZNSMNVMLTJELDZ-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- AQZGPSLYZOOYQP-UHFFFAOYSA-N Diisoamyl ether Chemical compound CC(C)CCOCCC(C)C AQZGPSLYZOOYQP-UHFFFAOYSA-N 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- PSBPNWBGNOWCCU-UHFFFAOYSA-N OB(O)O.S.S.S Chemical compound OB(O)O.S.S.S PSBPNWBGNOWCCU-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- JOBBTVPTPXRUBP-UHFFFAOYSA-N [3-(3-sulfanylpropanoyloxy)-2,2-bis(3-sulfanylpropanoyloxymethyl)propyl] 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(COC(=O)CCS)(COC(=O)CCS)COC(=O)CCS JOBBTVPTPXRUBP-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- IPTNXMGXEGQYSY-UHFFFAOYSA-N acetic acid;1-methoxybutan-1-ol Chemical compound CC(O)=O.CCCC(O)OC IPTNXMGXEGQYSY-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 229920005822 acrylic binder Polymers 0.000 description 1
- 150000008360 acrylonitriles Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 229940007550 benzyl acetate Drugs 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 1
- HXTBYXIZCDULQI-UHFFFAOYSA-N bis[4-(methylamino)phenyl]methanone Chemical compound C1=CC(NC)=CC=C1C(=O)C1=CC=C(NC)C=C1 HXTBYXIZCDULQI-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 238000012661 block copolymerization Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229930188620 butyrolactone Natural products 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 125000003739 carbamimidoyl group Chemical group C(N)(=N)* 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 150000001734 carboxylic acid salts Chemical class 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- IPHJYJHJDIGARM-UHFFFAOYSA-M copper phthalocyaninesulfonic acid, dioctadecyldimethylammonium salt Chemical compound [Cu+2].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC.C=1C(S(=O)(=O)[O-])=CC=C(C(=NC2=NC(C3=CC=CC=C32)=N2)[N-]3)C=1C3=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 IPHJYJHJDIGARM-UHFFFAOYSA-M 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- MGNCLNQXLYJVJD-UHFFFAOYSA-N cyanuric chloride Chemical compound ClC1=NC(Cl)=NC(Cl)=N1 MGNCLNQXLYJVJD-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- WYACBZDAHNBPPB-UHFFFAOYSA-N diethyl oxalate Chemical compound CCOC(=O)C(=O)OCC WYACBZDAHNBPPB-UHFFFAOYSA-N 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- NDMXSCGMYOVVJE-UHFFFAOYSA-N ethoxymethyl acetate Chemical compound CCOCOC(C)=O NDMXSCGMYOVVJE-UHFFFAOYSA-N 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine group Chemical group NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- 125000005597 hydrazone group Chemical group 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- AZQGFVRDZTUHBU-UHFFFAOYSA-N isocyanic acid;triethoxy(propyl)silane Chemical compound N=C=O.CCC[Si](OCC)(OCC)OCC AZQGFVRDZTUHBU-UHFFFAOYSA-N 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 150000003903 lactic acid esters Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- MDEDOIDXVJXDBW-UHFFFAOYSA-N methoxymethyl acetate Chemical compound COCOC(C)=O MDEDOIDXVJXDBW-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- UUIQMZJEGPQKFD-UHFFFAOYSA-N n-butyric acid methyl ester Natural products CCCC(=O)OC UUIQMZJEGPQKFD-UHFFFAOYSA-N 0.000 description 1
- KPSSIOMAKSHJJG-UHFFFAOYSA-N neopentyl alcohol Chemical compound CC(C)(C)CO KPSSIOMAKSHJJG-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- ZDHCZVWCTKTBRY-UHFFFAOYSA-N omega-Hydroxydodecanoic acid Natural products OCCCCCCCCCCCC(O)=O ZDHCZVWCTKTBRY-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229940067265 pigment yellow 138 Drugs 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
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Abstract
Description
본 기재는 화합물, 이를 포함하는 감광성 수지 조성물, 감광성 수지막, 컬러필터 및 디스플레이 장치에 관한 것이다.The present description relates to a compound, a photosensitive resin composition comprising the same, a photosensitive resin film, a color filter, and a display device.
디스플레이 장치 중의 하나인 액정디스플레이 장치는 경량화, 박형화, 저가, 저소비 전력 구동화 및 우수한 집적회로와의 접합성 등의 장점을 가지고 있어 노트북 컴퓨터, 모니터 및 TV화상용으로 그 사용범위가 확대되고 있다. 이와 같은 액정디스플레이 장치는 블랙매트릭스, 컬러필터 및 ITO 화소전극이 형성된 하부 기판과, 액정층, 박막트랜지스터, 축전캐패시터층으로 구성된 능동회로부와 ITO 화소전극이 형성된 상부의 기판을 포함하여 구성된다. 컬러필터는 화소 사이의 경계부를 차광하기 위해서 투명 기판 상에 정해진 패턴으로 형성된 블랙 매트릭스층 및 각각의 화소를 형성하기 위해 복수의 색(통상적으로, 적(R), 녹(G), 청(B)의 3원색을 정해진 순서로 배열한 화소부가 차례로 적층된 구조를 취하고 있다. A liquid crystal display device, which is one of the display devices, has advantages such as light weight, thinness, low cost, low power consumption, and excellent integration with integrated circuits, and thus its range of use is expanding for notebook computers, monitors and TV images. Such a liquid crystal display device includes a lower substrate on which a black matrix, a color filter, and an ITO pixel electrode are formed, an active circuit unit composed of a liquid crystal layer, a thin film transistor, and a capacitor layer, and an upper substrate on which an ITO pixel electrode is formed. The color filter is a black matrix layer formed in a predetermined pattern on a transparent substrate to block light at the boundary between pixels, and a plurality of colors (typically, red (R), green (G), blue (B)) to form each pixel. ) Has a structure in which pixel units arranged in a predetermined order are sequentially stacked.
컬러필터를 구현하는 방법 중의 하나인 안료분산법은 흑색 매트릭스가 제공된 투명한 기질 위에 착색제를 함유하는 광중합성 조성물을 코팅하고, 형성하고자 하는 형태의 패턴을 노광한 후, 비노광 부위를 용제로 제거하여 열경화시키는 일련의 과정을 반복함으로써 착색박막이 형성되는 방법이다. 안료분산법에 따른 컬러필터 제조에 사용되는 감광성 수지 조성물은 일반적으로 알칼리 가용성 수지, 광중합 단량체, 광중합 개시제, 에폭시 수지, 용제와 기타 첨가제 등으로 이루어진다. 상기의 특징을 가지는 안료분산법은 휴대폰, 노트북, 모니터, TV 등의 LCD를 제조하는 데 활발하게 응용되고 있다. 그러나, 근래에는 여러 가지 장점을 가지는 안료분산법을 이용한 컬러필터용 감광성 수지 조성물에 있어서도 우수한 패턴 특성뿐만 아니라 더욱 향상된 성능이 요구되고 있다. 특히 높은 색재현율과 함께 고휘도 및 고명암비의 특성이 요구되는 이미지 센서에 적용이 가능한 착색제에 대한 요구가 점점 높아지고 있는 실정이다.In the pigment dispersion method, one of the methods of implementing a color filter, a photopolymerizable composition containing a colorant is coated on a transparent substrate provided with a black matrix, and the pattern of the shape to be formed is exposed, and then the unexposed part is removed with a solvent. This is a method in which a colored thin film is formed by repeating a series of thermal curing processes. The photosensitive resin composition used to manufacture the color filter according to the pigment dispersion method is generally composed of an alkali-soluble resin, a photopolymerization monomer, a photopolymerization initiator, an epoxy resin, a solvent and other additives. The pigment dispersion method having the above characteristics has been actively applied to manufacturing LCDs such as mobile phones, notebook computers, monitors, and TVs. However, in recent years, a photosensitive resin composition for a color filter using a pigment dispersion method having various advantages, as well as excellent pattern characteristics, has been demanded for further improved performance. In particular, the demand for a colorant that can be applied to an image sensor that requires high luminance and high contrast ratio along with high color reproducibility is increasingly being demanded.
이미지 센서는 휴대전화 카메라나 DSC(Digital Still Camera)등의 디스플레이 장치에서 영상을 생성해 내는 영상 촬상 소자 부품을 일컫는 것으로, 그 제작 공정과 응용 방식에 따라 크게 고체 촬상 소자(charge coupled device; CCD) 이미지 센서와 상보성 금속 산화물 반도체(complementary metal oxide semiconductor; CMOS) 이미지 센서로 분류할 수 있다.An image sensor refers to an image pickup device component that generates an image in a display device such as a mobile phone camera or DSC (Digital Still Camera), and is largely a charge coupled device (CCD) depending on the manufacturing process and application method. It can be classified as an image sensor and a complementary metal oxide semiconductor (CMOS) image sensor.
고체촬상소자에 사용되는 컬러필터용 감광성 수지막은 1.5㎛ 이하의 막두께가 요구되기 때문에, 감광성 수지 조성물 중에 다량의 색소를 첨가해야만 하고, 이에 따라 감도가 저하하여 기판과의 밀착이 불충분하게 되거나, 충분한 경화가 얻어지지 않거나, 노광부에서도 염료가 용출되어 색이 빠져버리는 등 패턴 형성성이 현저하게 저하되는 등의 문제가 있다.Since the photosensitive resin film for color filters used in the solid-state image sensor is required to have a film thickness of 1.5 μm or less, a large amount of pigment must be added to the photosensitive resin composition, and the sensitivity decreases accordingly, resulting in insufficient adhesion to the substrate, or There is a problem in that sufficient curing is not obtained, or the pattern formation property is remarkably deteriorated, such as dye elution from the exposed portion and color loss.
이에, 휘도와 내화학성 등의 신뢰성을 만족시키면서 동시에 고색 구현이 가능한, 이미지 센서에 적용 가능한 컬러필터용 감광성 수지 조성물을 개발하려는 노력이 계속되고 있다.Accordingly, efforts have been made to develop a photosensitive resin composition for a color filter applicable to an image sensor that satisfies reliability such as luminance and chemical resistance while simultaneously implementing high colors.
일 구현예는 고선명 컬러펄터를 구현할 수 있는 화합물을 제공하기 위한 것이다.One embodiment is to provide a compound capable of implementing a high-definition color pulser.
다른 일 구현예는 상기 화합물을 포함하는 감광성 수지 조성물을 제공하기 위한 것이다.Another embodiment is to provide a photosensitive resin composition comprising the compound.
또 다른 일 구현예는 상기 감광성 수지 조성물을 이용하여 제조된 감광성 수지막을 제공하기 위한 것이다.Another embodiment is to provide a photosensitive resin film prepared by using the photosensitive resin composition.
또 다른 일 구현예는 상기 감광성 수지막을 포함하는 컬러필터를 제공하기 위한 것이다.Another embodiment is to provide a color filter including the photosensitive resin film.
또 다른 일 구현예는 상기 컬러필터를 포함하는 디스플레이 장치를 제공하기 위한 것이다.Another embodiment is to provide a display device including the color filter.
본 발명의 일 구현예는 최대흡수파장에 대한 반치폭의 최단파장이 600nm 내지 620nm 범위 내에 위치하는 프탈로시아닌계 화합물을 제공한다.One embodiment of the present invention provides a phthalocyanine-based compound in which the shortest wavelength of the half width for the maximum absorption wavelength is located within the range of 600nm to 620nm.
상기 프탈로시아닌계 화합물은 하기 화학식 1로 표시될 수 있다.The phthalocyanine-based compound may be represented by the following formula (1).
[화학식 1][Formula 1]
상기 화학식 1에서,In Formula 1,
R1 내지 R4는 각각 독립적으로 수소 원자이고,R 1 to R 4 are each independently a hydrogen atom,
R5 내지 R8은 각각 독립적으로 수소 원자 또는 할로겐 원자이고,R 5 to R 8 are each independently a hydrogen atom or a halogen atom,
R9 내지 R16은 각각 독립적으로 할로겐 원자 또는 하기 화학식 2로 표시되고,R 9 to R 16 are each independently represented by a halogen atom or the following formula (2),
[화학식 2][Formula 2]
상기 화학식 2에서,In Chemical Formula 2,
R17은 치환 또는 비치환된 C1 내지 C20 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다.R 17 is a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group.
상기 화학식 2는 하기 화학식 2-1 내지 화학식 2-4 중 어느 하나로 표시될 수 있다. Formula 2 may be represented by any one of Formulas 2-1 to 2-4 below.
[화학식 2-1][Formula 2-1]
[화학식 2-2][Formula 2-2]
[화학식 2-3][Formula 2-3]
[화학식 2-4][Formula 2-4]
상기 화학식 2-1 내지 화학식 2-4에서,In Formula 2-1 to Formula 2-4,
R18 및 R19는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고,R 18 and R 19 are each independently a substituted or unsubstituted C1 to C20 alkyl group,
R20 내지 R22는 각각 독립적으로 수소 원자 또는 치환 또는 비치환된 C1 내지 C20 알킬기이고,R 20 to R 22 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group,
L1은 치환 또는 비치환된 C1 내지 C20 알킬렌기이다.L 1 is a substituted or unsubstituted C1 to C20 alkylene group.
상기 R9 내지 R16 중 어느 하나는 상기 화학식 2로 표시될 수 있다.Any one of R 9 to R 16 may be represented by Formula 2.
상기 'R9 내지 R12 중 어느 하나' 또는 상기 'R13 내지 R16 중 어느 하나'는 상기 화학식 2로 표시될 수 있다.The'any one of R 9 to R 12 ' or the'any one of R 13 to R 16 ' may be represented by Formula 2.
상기 'R10, R11, R14 및 R15 중 어느 하나'는 상기 화학식 2로 표시될 수 있다.The'R 10 , R 11 , any one of R 14 and R 15 'may be represented by Chemical Formula 2.
상기 'R9 내지 R16 중 어느 둘'은 상기 화학식 2로 표시될 수 있다.The'any two of R 9 to R 16 ' may be represented by Formula 2.
상기 'R9 내지 R12 중 어느 하나' 및 상기 'R13 내지 R16 중 어느 하나'는 상기 화학식 2로 표시될 수 있다.The'any one of R 9 to R 12 ' and the'any one of R 13 to R 16 ' may be represented by Formula 2.
상기 'R10 및 R11 중 어느 하나' 및 상기 'R14 및 R15 중 어느 하나'는 상기 화학식 2로 표시될 수 있다.The'any one of R 10 and R 11 ' and the'any one of R 14 and R 15 ' may be represented by Formula 2 above.
상기 화학식 1로 표시되는 화합물은 하기 화학식 1-1 내지 화학식 1-20 중 어느 하나로 표시될 수 있다.The compound represented by Formula 1 may be represented by any one of Formulas 1-1 to 1-20 below.
[화학식 1-1][Formula 1-1]
[화학식 1-2][Formula 1-2]
[화학식 1-3][Formula 1-3]
[화학식 1-4][Formula 1-4]
[화학식 1-5][Formula 1-5]
[화학식 1-6][Formula 1-6]
[화학식 1-7][Formula 1-7]
[화학식 1-8][Formula 1-8]
[화학식 1-9][Formula 1-9]
[화학식 1-10][Formula 1-10]
[화학식 1-11][Formula 1-11]
[화학식 1-12][Formula 1-12]
[화학식 1-13][Formula 1-13]
[화학식 1-14][Formula 1-14]
[화학식 1-15][Formula 1-15]
[화학식 1-16][Formula 1-16]
[화학식 1-17][Formula 1-17]
[화학식 1-18][Formula 1-18]
[화학식 1-19][Formula 1-19]
[화학식 1-20][Formula 1-20]
상기 화합물은 녹색 염료일 수 있다.The compound may be a green dye.
다른 일 구현예는 상기 화합물을 포함하는 감광성 수지 조성물을 제공한다.Another embodiment provides a photosensitive resin composition comprising the compound.
상기 화합물은 상기 감광성 수지 조성물 총량에 대해 1 중량% 내지 40 중량%로 포함될 수 있다.The compound may be included in an amount of 1% to 40% by weight based on the total amount of the photosensitive resin composition.
상기 감광성 수지 조성물은 알칼리 가용성 수지, 광중합성 화합물, 광중합 개시제 및 용매를 더 포함할 수 있다.The photosensitive resin composition may further include an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent.
상기 감광성 수지 조성물은 안료를 더 포함할 수 있다.The photosensitive resin composition may further include a pigment.
상기 감광성 수지 조성물은 하기 화학식 3으로 표시되는 화합물을 더 포함할 수 있다.The photosensitive resin composition may further include a compound represented by Formula 3 below.
[화학식 3][Formula 3]
상기 화학식 3에서,In Chemical Formula 3,
R23 및 R24는 각각 독립적으로 히드록시기 또는 치환 또는 비치환된 C1 내지 C20 알킬기이고,R 23 and R 24 are each independently a hydroxy group or a substituted or unsubstituted C1 to C20 alkyl group,
n1 및 n2는 각각 독립적으로 0 내지 5의 정수이되, 3 ≤ n1+n2 ≤ 5 이다.n1 and n2 are each independently an integer of 0 to 5, but 3≦n1+n2≦5.
또 다른 일 구현예는 상기 감광성 수지 조성물을 이용하여 제조되는 감광성 수지막을 제공한다.Another embodiment provides a photosensitive resin film prepared by using the photosensitive resin composition.
또 다른 일 구현예는 상기 감광성 수지막을 포함하는 컬러필터를 제공한다.Another embodiment provides a color filter including the photosensitive resin film.
또 다른 일 구현예는 상기 컬러필터를 포함하는 디스플레이 장치를 제공한다.Another embodiment provides a display device including the color filter.
기타 본 발명의 측면들의 구체적인 사항은 이하의 상세한 설명에 포함되어 있다.Other specifics of aspects of the present invention are included in the detailed description below.
일 구현예에 따른 화합물은 우수한 녹색 분광 특성과 높은 몰흡광계수를 가지고 유기 용매에 대한 용해도가 우수하여, 녹색 컬러필터용 감광성 수지 조성물 제조 시 염료로 사용될 수 있고, 상기 염료를 포함하는 감광성 수지 조성물을 이용하여 제조된 감광성 수지막 및 이를 포함하는 컬러필터는 우수한 휘도 및 명암비를 가질 수 있다.The compound according to an embodiment has excellent green spectral properties and a high molar absorption coefficient, and has excellent solubility in organic solvents, so that it can be used as a dye when preparing a photosensitive resin composition for a green color filter, and a photosensitive resin composition comprising the dye The photosensitive resin film manufactured by using and a color filter including the same may have excellent luminance and contrast ratio.
도 1은 화합물의 최대흡수파장에 대한 반치폭 및 상기 반치폭의 최단파장을 설명하기 위한 그림이다.1 is a diagram for explaining the half-value width of the maximum absorption wavelength of the compound and the shortest wavelength of the half-value width.
이하, 본 발명의 구현예를 상세히 설명하기로 한다. 다만, 이는 예시로서 제시되는 것으로, 이에 의해 본 발명이 제한되지는 않으며 본 발명은 후술할 청구범위의 범주에 의해 정의될 뿐이다. Hereinafter, embodiments of the present invention will be described in detail. However, this is presented as an example, and the present invention is not limited thereby, and the present invention is only defined by the scope of the claims to be described later.
본 명세서에서 특별한 언급이 없는 한, "치환" 내지 "치환된"이란, 본 발명의 작용기 중의 하나 이상의 수소 원자가 할로겐 원자(F, Br, Cl 또는 I), 히드록시기, 니트로기, 시아노기, 아미노기(NH2, NH(R200) 또는 N(R201)(R202)이고, 여기서 R200, R201 및 R202는 동일하거나 서로 상이하며, 각각 독립적으로 C1 내지 C10 알킬기임), 아미디노기, 하이드라진기, 하이드라존기, 카르복실기, 치환 또는 비치환된 알킬기, 치환 또는 비치환된 알케닐기, 치환 또는 비치환된 알키닐기, 치환 또는 비치환된 지환족 유기기, 치환 또는 비치환된 아릴기 및 치환 또는 비치환된 헤테로고리기로 이루어진 군에서 선택되는 1종 이상의 치환기로 치환된 것을 의미한다.Unless otherwise specified in the specification, "substituted" to "substituted" means that at least one hydrogen atom in the functional groups of the present invention is a halogen atom (F, Br, Cl or I), a hydroxy group, a nitro group, a cyano group, an amino group ( NH 2 , NH (R 200 ) or N (R 201 ) (R 202 ), wherein R 200 , R 201 and R 202 are the same or different from each other, and each independently a C1 to C10 alkyl group), an amidino group, A hydrazine group, a hydrazone group, a carboxyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted alicyclic organic group, a substituted or unsubstituted aryl group, and It means substituted with one or more substituents selected from the group consisting of a substituted or unsubstituted heterocyclic group.
본 명세서에서 특별한 언급이 없는 한, "알킬기"란 C1 내지 C20 알킬기를 의미하고, 구체적으로는 C1 내지 C15 알킬기를 의미하고, "사이클로알킬기"란 C3 내지 C20 사이클로알킬기를 의미하고, 구체적으로는 C3 내지 C18 사이클로알킬기를 의미하고, "알콕시기"란 C1 내지 C20 알콕시기를 의미하고, 구체적으로는 C1 내지 C18 알콕시기를 의미하고, "아릴기"란 C6 내지 C20 아릴기를 의미하고, 구체적으로는 C6 내지 C18 아릴기를 의미하고, "알케닐기"란 C2 내지 C20 알케닐기를 의미하고, 구체적으로는 C2 내지 C18 알케닐기를 의미하고, "알킬렌기"란 C1 내지 C20 알킬렌기를 의미하고, 구체적으로는 C1 내지 C18 알킬렌기를 의미하고, "아릴렌기"란 C6 내지 C20 아릴렌기를 의미하고, 구체적으로는 C6 내지 C16 아릴렌기를 의미한다.Unless otherwise specified in the specification, “alkyl group” refers to a C1 to C20 alkyl group, specifically C1 to C15 alkyl group, and “cycloalkyl group” refers to a C3 to C20 cycloalkyl group, specifically C3 To C18 cycloalkyl group, "alkoxy group" refers to a C1 to C20 alkoxy group, specifically C1 to C18 alkoxy group, and "aryl group" refers to a C6 to C20 aryl group, specifically C6 to It means a C18 aryl group, "alkenyl group" means a C2 to C20 alkenyl group, specifically C2 to C18 alkenyl group, and "alkylene group" means a C1 to C20 alkylene group, specifically C1 It means a to C18 alkylene group, "arylene group" means a C6 to C20 arylene group, and specifically, it means a C6 to C16 arylene group.
본 명세서에서 특별한 언급이 없는 한, "(메타)아크릴레이트"는 "아크릴레이트"와 "메타크릴레이트" 둘 다 가능함을 의미하며, "(메타)아크릴산"은 "아크릴산"과 "메타크릴산" 둘 다 가능함을 의미한다.Unless otherwise specified in the specification, "(meth)acrylate" means that both "acrylate" and "methacrylate" are possible, and "(meth)acrylic acid" refers to "acrylic acid" and "methacrylic acid" It means both are possible.
본 명세서에서 별도의 정의가 없는 한, "조합"이란 혼합 또는 공중합을 의미한다. 또한 "공중합"이란 블록 공중합 내지 랜덤 공중합을 의미하고, "공중합체"란 블록 공중합체 내지 랜덤 공중합체를 의미한다.In the present specification, unless otherwise defined, "combination" means mixing or copolymerization. In addition, "copolymerization" means block copolymerization or random copolymerization, and "copolymer" means block copolymer or random copolymer.
본 명세서 내 화학식에서 별도의 정의가 없는 한, 화학 결합이 그려져야 하는 위치에 화학결합이 그려져 있지 않은 경우는 상기 위치에 수소 원자가 결합되어 있음을 의미한다.Unless otherwise defined in the chemical formula in the present specification, when a chemical bond is not drawn at a position where a chemical bond is to be drawn, it means that a hydrogen atom is bonded at the position.
또한, 본 명세서에서 별도의 정의가 없는 한, "*"는 동일하거나 상이한 원자 또는 화학식과 연결되는 부분을 의미한다.In addition, unless otherwise defined in the specification, "*" means a part connected to the same or different atoms or chemical formulas.
일 구현예는 최대흡수파장에 대한 반치폭의 최단파장이 600nm 내지 620nm 범위 내에 위치하는 프탈로시아닌계 화합물을 제공한다.One embodiment provides a phthalocyanine-based compound in which the shortest wavelength of the half width with respect to the maximum absorption wavelength is located within the range of 600nm to 620nm.
착색제로 안료를 사용한 감광성 수지 조성물로 제조된 컬러필터에서는 안료 입자 크기에서 비롯되는 휘도와 명암비의 한계가 존재하기에, 휘도와 명암비 개선에 대한 필요성이 지속적으로 제기되고 있으며, 이를 달성하고자 안료 대신 입자를 이루지 않는 염료를 도입하여 염료에 적합한 감광성 수지 조성물을 제조하여 휘도와 명암비가 개선된 컬러필터를 구현하려는 노력이 계속되고 있고, 이러한 노력에 의해 안료 대신 염료를 주요 착색제로 사용한 감광성 수지 조성물의 경우, 휘도나 명암비 개선에는 어느정도 효과를 보여 왔다. In a color filter made of a photosensitive resin composition using a pigment as a colorant, there is a limit on the luminance and contrast ratio resulting from the pigment particle size, so the need for improving the luminance and contrast ratio is continuously raised. Efforts to implement a color filter with improved luminance and contrast ratio by preparing a photosensitive resin composition suitable for a dye by introducing a dye that does not form a dye are continuing, and by such efforts, in the case of a photosensitive resin composition using a dye as a main colorant instead of a pigment. However, it has been shown to have some effect on improving the luminance and contrast ratio.
한편, 최근에는 종래 LCD와 같은 디스플레이 장치 외에 고체촬상소자 이미지 센서나 상보성 금속 산화물 반도체 이미지 센서 등에도 적용이 가능한 감광성 수지 조성물에 대한 요구가 급증하고 있는데, 종래 염료를 주요 착색제로 사용한 감광성 수지 조성물의 경우, 상기 이미지 센서에 적용 시 고색 구현이 불가하여, 고선명 컬러필터의 제조가 매우 어렵다는 문제가 새롭게 대두되고 있다. 상기와 같이 고색 구현이 불가한 것은 고체촬상소자 이미지 센서 등에 장착되는 컬러필터의 패턴 크기가 종래 LCD용 컬러필터 패턴 크기의 1/100배 내지 1/200배 정도로 매우 작기 때문인 것으로 생각된다. Meanwhile, in recent years, there is a rapid increase in demand for photosensitive resin compositions that can be applied to solid state image sensors or complementary metal oxide semiconductor image sensors in addition to display devices such as conventional LCDs. In this case, when applied to the image sensor, it is impossible to implement a high color, and thus a problem that it is very difficult to manufacture a high-definition color filter is emerging. As described above, it is believed that the reason why high color is not implemented is because the pattern size of a color filter mounted on an image sensor of a solid-state image sensor is very small, about 1/100 to 1/200 times that of a conventional color filter pattern for LCD.
이에 본 발명의 발명자들은 오랜 연구 끝에, 프탈로시아닌계 화합물이 가지는 각각의 최대흡수파장에 대한 반치폭의 최단파장을 특정 파장범위로 한정시킴으로써, 종래 LCD용 컬러필터 패턴 크기보다 100배 내지 200배 작은 크기를 가지는 패턴에도 용이하게 적용이 가능하여, 해상도를 증가시키고, 잔사를 감소시켜, 궁극적으로 고색 구현이 가능한 컬러필터용 감광성 수지 조성물에 사용되는 염료 화합물을 개발하기에 이르렀다.Accordingly, after a long study, the inventors of the present invention limited the shortest wavelength of the half-width for each maximum absorption wavelength of the phthalocyanine compound to a specific wavelength range, thereby reducing the size of 100 to 200 times smaller than the conventional color filter pattern size for LCD. Branches can be easily applied to patterns, increase resolution, reduce residues, and ultimately develop dye compounds used in photosensitive resin compositions for color filters capable of realizing high colors.
최대흡수파장에 대한 반치폭의 최단파장이라 함은 특정 프탈로시아닌계 화합물의 흡수스펙트럼에서 최대 흡수치를 가지는 파장(최대흡수파장, b)의 에너지폭(Δλ중 가장 작은 값을 가지는 파장(a)을 의미한다. (도 1 참조)The shortest wavelength of the half width for the maximum absorption wavelength refers to the energy width of the wavelength (maximum absorption wavelength, b) having the maximum absorption value (maximum absorption wavelength, b) in the absorption spectrum of a specific phthalocyanine compound (the wavelength (a) having the smallest value among Δλ). .(See Fig. 1)
최대흡수파장에 대한 반치폭의 최단파장이 600nm 내지 620nm, 예컨대 610nm 내지 620nm, 예컨대 611nm 내지 616nm 범위 내에 위치하는 프탈로시아닌계 화합물은, 최대흡수파장에 대한 반치폭의 최단파장이 상기 범위를 벗어나는 프탈로시아닌계 화합물 대비, 유기용매에 대한 용해도가 우수할 뿐만 아니라, 이를 착색제로 포함하는 감광성 수지 조성물의 휘도 및 내화학성을 향상시키고, 무엇보다도 고색 구현(CIE 색좌표(Gx, Gy) 상 Gx 값의 저하)이 가능하다는 점에서, 큰 차이가 있다. Phthalocyanine-based compounds located in the range of 600nm to 620nm, such as 610nm to 620nm, such as 611nm to 616nm, the shortest wavelength of the half width for the maximum absorption wavelength, compared to the phthalocyanine-based compound in which the shortest wavelength of the half width for the maximum absorption wavelength is outside the above range , Not only has excellent solubility in organic solvents, but also improves the luminance and chemical resistance of a photosensitive resin composition containing it as a colorant, and above all, it is possible to realize high color (decrease of Gx value on CIE color coordinates (Gx, Gy)). In that regard, there is a big difference.
예컨대, 최대흡수파장에 대한 반치폭의 최단파장이 600nm 내지 620nm 범위 내에 위치하는 프탈로시아닌계 화합물은 하기 화학식 1로 표시될 수 있다.For example, a phthalocyanine-based compound in which the shortest wavelength of the half-width with respect to the maximum absorption wavelength is located within the range of 600 nm to 620 nm may be represented by the following formula (1).
[화학식 1][Formula 1]
상기 화학식 1에서,In Formula 1,
R1 내지 R4는 각각 독립적으로 수소 원자이고,R 1 to R 4 are each independently a hydrogen atom,
R5 내지 R8은 각각 독립적으로 수소 원자 또는 할로겐 원자이고,R 5 to R 8 are each independently a hydrogen atom or a halogen atom,
R9 내지 R16은 각각 독립적으로 할로겐 원자 또는 하기 화학식 2로 표시되고,R 9 to R 16 are each independently represented by a halogen atom or the following formula (2),
[화학식 2][Formula 2]
상기 화학식 2에서,In Chemical Formula 2,
R17은 치환 또는 비치환된 C1 내지 C20 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다.R 17 is a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group.
상기 화학식 1로 표시되는 화합물은 우수한 녹색 분광 특성과 높은 몰흡광계수를 가진다. 나아가, 상기 화학식 1로 표시되는 화합물은 상기 화학식 2로 표시되는 치환기를 적어도 하나 이상 반드시 포함함에 따라 유기용매에 대해 우수한 용해도 및 컬러필터에 적용 시 우수한 휘도 및 내화학성을 나타낼 수 있다.The compound represented by Formula 1 has excellent green spectral properties and a high molar extinction coefficient. Furthermore, since the compound represented by Formula 1 necessarily contains at least one substituent represented by Formula 2, it may exhibit excellent solubility in an organic solvent and excellent luminance and chemical resistance when applied to a color filter.
예컨대, 상기 화학식 1로 표시되는 화합물이 상기 화학식 2로 표시되는 치환기를 전혀 포함하지 않을 경우, 유기용매에 대해 용해도, 휘도 및 내화학성 저하가 커서, 컬러필터용 감광성 수지 조성물 내 착색제로 사용하는 데 무리가 있을 뿐만 아니라, 고색 재현 이미지 센서로의 구현이 매우 어려울 수 있다.For example, when the compound represented by Formula 1 does not contain any substituents represented by Formula 2, the solubility, luminance, and chemical resistance of the organic solvent are largely deteriorated, so that it can be used as a colorant in the photosensitive resin composition for color filters. In addition to being unreasonable, it can be very difficult to implement as a high-color reproduction image sensor.
상기 화학식 2로 표시되는 치환기는 “1개 또는 2개의 알킬기를 치환기로 가지는 아릴옥시기” 또는 “1개 또는 2개의 알킬기를 치환기로 가지는 알콕시기”이며, 상기 아릴옥시기에서 상기 알킬기는 오르쏘(ortho) 및/또는 파라(para) 위치에 치환되어 있어, 휘도 및 내화학성을 더욱 향상시킬 수 있다. 예컨대, 상기 알킬기가 메타(meta) 위치에 치환될 경우, 컬러필터용 녹색화소 구현이 어려울 수 있다.The substituent represented by Formula 2 is “an aryloxy group having one or two alkyl groups as a substituent” or “an alkoxy group having one or two alkyl groups as a substituent”, and in the aryloxy group, the alkyl group is ortho Since it is substituted at the (ortho) and/or para position, brightness and chemical resistance can be further improved. For example, when the alkyl group is substituted at the meta position, it may be difficult to implement a green pixel for a color filter.
예컨대, 상기 화학식 2는 하기 화학식 2-1 내지 화학식 2-4 중 어느 하나로 표시될 수 있으나, 반드시 이에 한정되는 것은 아니다.For example, Formula 2 may be represented by any one of Formulas 2-1 to 2-4 below, but is not limited thereto.
[화학식 2-1][Formula 2-1]
[화학식 2-2][Formula 2-2]
[화학식 2-3][Formula 2-3]
[화학식 2-4][Formula 2-4]
상기 화학식 2-1 내지 화학식 2-4에서,In Formula 2-1 to Formula 2-4,
R18 및 R19는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고,R 18 and R 19 are each independently a substituted or unsubstituted C1 to C20 alkyl group,
R20 내지 R22는 각각 독립적으로 수소 원자 또는 치환 또는 비치환된 C1 내지 C20 알킬기이고,R 20 to R 22 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group,
L1은 치환 또는 비치환된 C1 내지 C20 알킬렌기이다.L 1 is a substituted or unsubstituted C1 to C20 alkylene group.
상기 화학식 2-2 및 화학식 2-3에서, R18 및 R19 중 적어도 하나는 메틸기, 에틸기, n-부틸기 등의 선형(linear) 알킬기인 경우보다, tert-부틸기 등의 비선형(branch) 알킬기인 경우가 휘도 및 내화학성 측면에서 보다 유리할 수 있고, 상기 화학식 2-4에서, R20 내지 R22 중 적어도 하나 이상은 치환 또는 비치환된 C1 내지 C20 알킬기인 경우가 휘도 및 내화학성 측면에서 보다 유리할 수 있다.In Formulas 2-2 and 2-3, at least one of R 18 and R 19 is a nonlinear branch such as a tert-butyl group than in the case of a linear alkyl group such as a methyl group, an ethyl group, or an n-butyl group. The alkyl group may be more advantageous in terms of luminance and chemical resistance, and in Formula 2-4, at least one of R 20 to R 22 is a substituted or unsubstituted C1 to C20 alkyl group in terms of luminance and chemical resistance. It can be more advantageous.
예컨대, 상기 화학식 2로 표시되는 치환기가 상기 화학식 2-4로 표시되는 경우, 현상성을 더욱 개선시킬 수 있다. For example, when the substituent represented by Formula 2 is represented by Formula 2-4, developability may be further improved.
또한, 상기 화학식 1로 표시되는 프탈로시아닌계 화합물은 4개의 수소원자 및 적어도 4개 이상의 할로겐 원자를 포함하며, 이러한 구조적 특징으로 인해 유기용매에 대한 용해도를 더욱 향상시킬 수 있다. 보다 구체적으로 상기 화학식 1로 표시되는 프탈로시아닌계 화합물은 i) R1 내지 R4로 표시되는 기를 가지는 벤젠고리, ii) R5 내지 R8로 표시되는 기를 가지는 벤젠고리, iii) R9 내지 R12로 표시되는 기를 가지는 벤젠고리 및 iv) R13 내지 R16으로 표시되는 기를 가지는 벤젠고리의 4개의 벤젠고리를 코어 구조에 포함하는데, 상기 4개의 벤젠고리 중 상기 화학식 2로 표시되는 치환기를 포함하는 벤젠고리는 상기 화학식 2로 표시되는 치환기 외 나머지 3개의 기가 모두 할로겐 원자이며, 상기 화학식 2로 표시되는 치환기를 포함하지 않는 벤젠고리의 4개의 기는 모두 수소 원자 또는 할로겐 원자일 수 있고, 이러한 구조적 특징으로 인해 최대흡수파장에 대한 반치폭의 최단파장이 600nm 내지 620nm 범위 내에 용이하게 위치할 수 있고, 유기용매에 대한 용해도를 더욱 향상시킬 수 있으며, 휘도 향상 및 공정특성의 확보 측면에서도 유리할 수 있다.In addition, the phthalocyanine-based compound represented by Formula 1 includes 4 hydrogen atoms and at least 4 halogen atoms, and due to such structural characteristics, solubility in an organic solvent may be further improved. More specifically, the phthalocyanine-based compound represented by Formula 1 is i) a benzene ring having a group represented by R 1 to R 4 , ii) a benzene ring having a group represented by R 5 to R 8 , iii) R 9 to R 12 A benzene ring having a group represented by and iv) four benzene rings of a benzene ring having a group represented by R 13 to R 16 are included in the core structure, including a substituent represented by Formula 2 among the four benzene rings. In the benzene ring, all three groups other than the substituent represented by Formula 2 are halogen atoms, and all four groups of the benzene ring not including the substituent represented by Formula 2 may be hydrogen atoms or halogen atoms, and such structural characteristics Therefore, the shortest wavelength of the half width for the maximum absorption wavelength can be easily located within the range of 600nm to 620nm, the solubility in the organic solvent can be further improved, and it can be advantageous in terms of improving brightness and securing process characteristics.
무엇보다도 최대흡수파장에 대한 반치폭의 최단파장이 600nm 내지 620nm 범위 내에 위치하는 프탈로시아닌계 화합물이라 하여도, 상기 화합물이 상기 화학식 1로 표시되는 구조를 가지지 않을 경우, 이를 착색제로 포함하는 감광성 수지 조성물의 휘도 및 내화학성이 크게 저하되거나 고색 구현이 불가할 수 있어, 일 구현예에 따른 프탈로시아닌계 화합물은 최대흡수파장에 대한 반치폭의 최단파장이 600nm 내지 620nm 범위 내에 위치하면서, 동시에 상기 화학식 1로 표시되는 구조를 가지는 것이 바람직할 수 있다.Above all, even if the shortest wavelength of the half-width with respect to the maximum absorption wavelength is a phthalocyanine compound located within the range of 600 nm to 620 nm, when the compound does not have the structure represented by Formula 1, the photosensitive resin composition containing the same as a colorant Since luminance and chemical resistance may be greatly reduced or high color may not be realized, the phthalocyanine-based compound according to an embodiment has a shortest wavelength of half value width for a maximum absorption wavelength within a range of 600 nm to 620 nm, and at the same time represented by Formula 1 It may be desirable to have a structure.
예컨대, 상기 R9 내지 R16 중 하나 또는 둘은 상기 화학식 2로 표시될 수 있다. 상기 R9 내지 R16 중 하나 또는 둘이 상기 화학식 2로 표시되지 않을 경우, 휘도가 저하되는 문제가 발생할 수 있다.For example, one or two of R 9 to R 16 may be represented by Formula 2. When one or two of R 9 to R 16 are not represented by Formula 2, a problem of lowering the luminance may occur.
예컨대, 상기 'R9 내지 R12 중 하나' 및/또는 상기 'R13 내지 R16 중 하나'는 상기 화학식 2로 표시될 수 있다.For example, the'one of R 9 to R 12 ' and/or the'one of R 13 to R 16 ' may be represented by Formula 2 above.
예컨대, 상기 'R10, R11, R14 및 R15 중 하나'는 상기 화학식 2로 표시될 수 있다.For example,'one of R 10 , R 11 , R 14 and R 15 'may be represented by Formula 2.
예컨대, 상기 'R10 및 R11 중 하나' 및 상기 'R14 및 R15 중 하나'는 상기 화학식 2로 표시될 수 있다.For example, the'one of R 10 and R 11 ' and the'one of R 14 and R 15 ' may be represented by Formula 2 above.
예컨대, 상기 화학식 1로 표시되는 화합물은 하기 화학식 1-1 내지 화학식 1-20 중 어느 하나로 표시될 수 있으나, 반드시 이에 한정되는 것은 아니다.For example, the compound represented by Formula 1 may be represented by any one of Formulas 1-1 to 1-20, but is not limited thereto.
[화학식 1-1][Formula 1-1]
[화학식 1-2][Formula 1-2]
[화학식 1-3][Formula 1-3]
[화학식 1-4][Formula 1-4]
[화학식 1-5][Formula 1-5]
[화학식 1-6][Formula 1-6]
[화학식 1-7][Formula 1-7]
[화학식 1-8][Formula 1-8]
[화학식 1-9][Formula 1-9]
[화학식 1-10][Formula 1-10]
[화학식 1-11][Formula 1-11]
[화학식 1-12][Formula 1-12]
[화학식 1-13][Formula 1-13]
[화학식 1-14][Formula 1-14]
[화학식 1-15][Formula 1-15]
[화학식 1-16][Formula 1-16]
[화학식 1-17][Formula 1-17]
[화학식 1-18][Formula 1-18]
[화학식 1-19][Formula 1-19]
[화학식 1-20][Formula 1-20]
예컨대, 상기 화학식 1로 표시되는 프탈로시아닌계 화합물은 1개 이상의 상기 화학식 2로 표시되는 치환기를 포함하기 때문에 적은 양으로도 보다 선명한 색의 발현이 가능하여, 착색제로 사용 시 휘도나 명암비 등의 색특성이 우수한 디스플레이 소자의 제조가 가능하다. 예컨대, 상기 화합물은 착색제, 예컨대 염료, 예컨대 녹색 염료, 예컨대 445nm 내지 560nm의 파장범위에서 최대 투과도를 가지는 염료일 수 있다.For example, since the phthalocyanine-based compound represented by Formula 1 contains one or more substituents represented by Formula 2, it is possible to express more vivid colors even in a small amount.When used as a colorant, color characteristics such as brightness and contrast ratio This excellent display device can be manufactured. For example, the compound may be a colorant, such as a dye, such as a green dye, such as a dye having a maximum transmittance in the wavelength range of 445 nm to 560 nm.
일반적으로, 염료는 컬러필터 내에 사용되는 구성성분 중 가장 고가의 구성성분이다. 그러므로, 원하는 효과, 예컨대 고휘도나 고명암비 등을 달성하기 위해서는 고가의 염료를 더 많이 사용해야 하기 때문에 생산 단가가 상승할 수 밖에 없었다. 그러나, 일 구현예에 따른 화합물을 컬러필터 내 염료로 사용하는 경우, 적은 양으로도 고휘도, 고명암비 등의 우수한 색특성을 달성할 수 있어 생산 단가의 절감이 가능하다.In general, dyes are the most expensive constituents among the constituents used in color filters. Therefore, in order to achieve a desired effect, such as high luminance or high contrast ratio, more expensive dyes must be used, resulting in an increase in production cost. However, when the compound according to an embodiment is used as a dye in a color filter, excellent color characteristics such as high luminance and high contrast ratio can be achieved even with a small amount, thereby reducing production cost.
다른 일 구현예에 따르면, 상기 일 구현예에 따른 프탈로시아닌계 화합물을 포함하는 감광성 수지 조성물을 제공한다.According to another embodiment, a photosensitive resin composition including the phthalocyanine-based compound according to the embodiment is provided.
예컨대, 상기 감광성 수지 조성물은 상기 일 구현예에 따른 프탈로시아닌계 화합물, 바인더 수지, 광중합성 화합물, 광중합 개시제 및 용매를 포함할 수 있다.For example, the photosensitive resin composition may include a phthalocyanine-based compound, a binder resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent according to the embodiment.
일 구현예에 따른 화합물은 감광성 수지 조성물 내에서 착색제, 예컨대 염료, 예컨대 녹색 염료로서의 역할을 하여, 우수한 색특성을 발현할 수 있다.The compound according to an embodiment may serve as a colorant, such as a dye, such as a green dye, in the photosensitive resin composition, and thus may exhibit excellent color characteristics.
일 구현예에 따른 화합물은 상기 감광성 수지 조성물 총량에 대해 1 중량% 내지 40 중량%, 예컨대 10 중량% 내지 40 중량%, 예컨대 20 중량% 내지 40 중량%, 예컨대 1 중량% 내지 30 중량%, 예컨대 1 중량% 내지 20 중량%, 예컨대 1 중량% 내지 10 중량%로 포함될 수 있다. 상기 범위로 일 구현예에 따른 화합물이 포함될 경우 색재현율 및 명암비가 우수해진다. The compound according to an embodiment is 1% to 40% by weight, such as 10% to 40% by weight, such as 20% to 40% by weight, such as 1% to 30% by weight, for example, based on the total amount of the photosensitive resin composition. It may be included in an amount of 1% to 20% by weight, for example, 1% to 10% by weight. When the compound according to the embodiment is included in the above range, color reproduction and contrast ratio are excellent .
상기 감광성 수지 조성물은 안료, 예컨대 황색 안료, 녹색 안료 또는 이들의 조합을 더 포함할 수 있다.The photosensitive resin composition may further include a pigment, such as a yellow pigment, a green pigment, or a combination thereof.
상기 황색 안료는 컬러 인덱스(Color Index) 내에서 C.I. 안료 황색 138, C.I. 안료 황색 139, C.I. 안료 황색 150 등을 들 수 있으며, 이들을 단독으로 또는 2종 이상 혼합하여 사용할 수 있다. The yellow pigment is C.I. Pigment Yellow 138, C.I. Pigment Yellow 139, C.I. Pigment yellow 150, etc. are mentioned, and these can be used individually or in mixture of 2 or more types.
상기 녹색 안료는 컬러 인덱스(Color Index) 내에서 C.I. 안료 녹색 36, C.I. 안료 녹색 58, C.I. 안료 녹색 59 등을 들 수 있으며, 이들을 단독으로 또는 2종 이상 혼합하여 사용할 수 있다.The green pigment is C.I. Pigment Green 36, C.I. Pigment Green 58, C.I. Pigment green 59, etc. are mentioned, and these can be used individually or in mixture of 2 or more types.
상기 안료는 안료분산액의 형태로 상기 감광성 수지 조성물에 포함될 수 있다.The pigment may be included in the photosensitive resin composition in the form of a pigment dispersion.
상기 안료분산액은 고형분의 안료, 용제 및 상기 용제 내에 상기 안료를 균일하게 분산시키기 위한 분산제를 포함할 수 있다.The pigment dispersion may include a solid pigment, a solvent, and a dispersant for uniformly dispersing the pigment in the solvent.
상기 고형분의 안료는 안료분산액 총량에 대하여 1 중량%내지 20 중량%, 예컨대 8 중량% 내지 20 중량%, 예컨대 8 중량% 내지 15 중량%, 예컨대 10 중량% 내지 20 중량%, 예컨대 10 중량% 내지 15 중량%로 포함될 수 있다.The solid pigment is 1% to 20% by weight, such as 8% to 20% by weight, such as 8% to 15% by weight, such as 10% to 20% by weight, such as 10% to 20% by weight, based on the total amount of the pigment dispersion. It may be included in 15% by weight.
상기 분산제로는 비이온성 분산제, 음이온성 분산제, 양이온성 분산제 등을 사용할 수 있다. 상기 분산제의 구체적인 예로는, 폴리알킬렌글리콜 및 이의 에스테르, 폴리옥시알킬렌, 다가알코올 에스테르 알킬렌 옥사이드 부가물, 알코올알킬렌 옥사이드 부가물, 술폰산 에스테르, 술폰산 염, 카르복실산 에스테르, 카르복실산 염, 알킬아미드 알킬렌 옥사이드 부가물, 알킬 아민 등을 들 수 있으며, 이들을 단독으로 또는 둘 이상 혼합하여 사용할 수 있다.Nonionic dispersants, anionic dispersants, cationic dispersants, and the like may be used as the dispersant. Specific examples of the dispersant include polyalkylene glycol and esters thereof, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonic acid salt, carboxylic acid ester, carboxylic acid Salts, alkylamide alkylene oxide adducts, alkyl amines, and the like, and these may be used alone or in combination of two or more.
상기 분산제의 시판되는 제품을 예로 들면, BYK社의 DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001 등; EFKA 케미칼社의EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450 등; Zeneka社의 Solsperse 5000,Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse24000GR, Solsperse 27000, Solsperse 28000 등; 또는 Ajinomoto社의 PB711, PB821 등이 있다.Examples of commercially available products of the above dispersant are BYK's DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK -166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001, etc.; EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450, etc. from EFKA Chemical; Zeneka's Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000, etc.; Alternatively, there are PB711 and PB821 of Ajinomoto.
상기 분산제는 안료분산액 총량에 대하여 1 중량% 내지 20 중량%로 포함될 수 있다. 분산제가 상기 범위 내로 포함될 경우, 적절한 점도를 유지할 수 있어감광성 수지 조성물의 분산성이 우수하며, 이로 인해 제품 적용시 광학적, 물리적 및 화학적 품질을 유지할 수 있다.The dispersant may be included in an amount of 1% to 20% by weight based on the total amount of the pigment dispersion. When the dispersant is included within the above range, it is possible to maintain an appropriate viscosity, and thus the dispersibility of the photosensitive resin composition is excellent, and thus the optical, physical and chemical quality can be maintained when the product is applied.
상기 안료분산액을 형성하는 용제로는 에틸렌글리콜 아세테이트, 에틸셀로솔브, 프로필렌글리콜 메틸에테르아세테이트, 에틸락테이트, 폴리에틸렌글리콜, 사이클로헥사논, 프로필렌글리콜 메틸에테르 등을 사용할 수 있다. As a solvent for forming the pigment dispersion, ethylene glycol acetate, ethyl cellosolve, propylene glycol methyl ether acetate, ethyl lactate, polyethylene glycol, cyclohexanone, propylene glycol methyl ether, and the like may be used.
상기 안료분산액은 상기 감광성 수지 조성물 총량에 대하여 10 중량% 내지 20 중량%, 예컨대 12 중량% 내지 18 중량%로 포함될 수 있다. 상기 안료분산액이 상기 범위 내로 포함될 경우, 공정마진 확보에 유리하고, 색재현율 및 명암비가 우수해진다.The pigment dispersion may be included in an amount of 10% to 20% by weight, such as 12% to 18% by weight, based on the total amount of the photosensitive resin composition. When the pigment dispersion is contained within the above range, it is advantageous to secure a process margin, and color reproduction and contrast ratio are excellent.
상기 바인더 수지는 아크릴계 수지일 수 있다.The binder resin may be an acrylic resin.
상기 아크릴계 수지는 제1 에틸렌성 불포화 단량체 및 이와 공중합 가능한 제2 에틸렌성 불포화 단량체의 공중합체로, 하나 이상의 아크릴계 반복단위를 포함하는 수지이다. The acrylic resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin including at least one acrylic repeating unit.
상기 제1 에틸렌성 불포화 단량체는 하나 이상의 카르복시기를 함유하는 에틸렌성 불포화 단량체이며, 이의 구체적인 예로는 아크릴산, 메타크릴산, 말레산, 이타콘산, 푸마르산또는 이들의 조합을 들 수 있다.The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxy group, and specific examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.
상기 제1 에틸렌성 불포화 단량체는 상기 아크릴계 바인더 수지 총량에 대하여 5 중량% 내지 50 중량%, 예컨대 10 중량% 내지 40 중량%로 포함될 수 있다.The first ethylenically unsaturated monomer may be included in an amount of 5% to 50% by weight, such as 10% to 40% by weight, based on the total amount of the acrylic binder resin.
상기 제2 에틸렌성 불포화 단량체는 스티렌, α-메틸스티렌, 비닐톨루엔, 비닐벤질메틸에테르 등의 방향족 비닐 화합물; 메틸(메타)아크릴레이트, 에틸(메타)아크릴레이트, 부틸(메타)아크릴레이트, 2-히드록시에틸(메타)아크릴레이트, 2-히드록시 부틸(메타)아크릴레이트, 벤질(메타)아크릴레이트, 사이클로헥실(메타)아크릴레이트, 페닐(메타)아크릴레이트 등의 불포화 카르복시산 에스테르 화합물; 2-아미노에틸(메타)아크릴레이트, 2-디메틸아미노에틸(메타)아크릴레이트 등의 불포화 카르복시산 아미노 알킬 에스테르 화합물; 초산비닐, 안식향산 비닐 등의 카르복시산 비닐 에스테르 화합물; 글리시딜(메타)아크릴레이트 등의 불포화 카르복시산 글리시딜 에스테르 화합물; (메타)아크릴로니트릴 등의 시안화 비닐 화합물; (메타)아크릴아미드 등의 불포화 아미드 화합물; 등을 들 수 있으며, 이들을 단독으로 또는 둘 이상 혼합하여 사용할 수 있다.The second ethylenically unsaturated monomers include aromatic vinyl compounds such as styrene, α-methylstyrene, vinyltoluene, and vinylbenzylmethylether; Methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxy butyl (meth) acrylate, benzyl (meth) acrylate, Unsaturated carboxylic acid ester compounds such as cyclohexyl (meth)acrylate and phenyl (meth)acrylate; Unsaturated carboxylic acid amino alkyl ester compounds such as 2-aminoethyl (meth)acrylate and 2-dimethylaminoethyl (meth)acrylate; Carboxylic acid vinyl ester compounds such as vinyl acetate and vinyl benzoate; Unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth)acrylate; Vinyl cyanide compounds such as (meth)acrylonitrile; Unsaturated amide compounds such as (meth)acrylamide; And the like, and these may be used alone or in combination of two or more.
상기 아크릴계 수지의 구체적인 예로는 (메타)아크릴산/벤질메타크릴레이트 공중합체, (메타)아크릴산/벤질메타크릴레이트/스티렌 공중합체, (메타)아크릴산/벤질메타크릴레이트/2-히드록시에틸메타크릴레이트 공중합체, (메타)아크릴산/벤질메타크릴레이트/스티렌/2-히드록시에틸메타크릴레이트 공중합체 등을 들 수 있으나, 이에 한정되는 것은 아니며, 이들을 단독 또는 2종 이상을 배합하여 사용할 수도 있다.Specific examples of the acrylic resin include (meth)acrylic acid/benzyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene copolymer, (meth)acrylic acid/benzyl methacrylate/2-hydroxyethyl methacrylate Rate copolymers, (meth)acrylic acid/benzyl methacrylate/styrene/2-hydroxyethyl methacrylate copolymers, etc., but are not limited thereto, and these may be used alone or in combination of two or more. .
예컨대, 상기 바인더 수지는 상기 아크릴계 수지와 함께 에폭시계 수지를 더 포함할 수 있다.For example, the binder resin may further include an epoxy resin together with the acrylic resin.
상기 바인더 수지의 중량평균 분자량은 3,000 g/mol 내지 150,000 g/mol, 예컨대 5,000 g/mol 내지 50,000 g/mol, 예컨대 20,000 g/mol 내지 30,000 g/mol 일 수 있다. 상기 바인더 수지의 중량평균 분자량이 상기 범위 내일 경우, 상기 감광성 수지 조성물의 물리적 및 화학적 물성이 우수하고 점도가 적절하며, 컬러필터 제조시 기판과의 밀착성이 우수하다. The weight average molecular weight of the binder resin may be 3,000 g/mol to 150,000 g/mol, such as 5,000 g/mol to 50,000 g/mol, such as 20,000 g/mol to 30,000 g/mol. When the weight average molecular weight of the binder resin is within the above range, the photosensitive resin composition has excellent physical and chemical properties, has an appropriate viscosity, and has excellent adhesion to a substrate when manufacturing a color filter.
상기 바인더 수지의 산가는 15 mgKOH/g 내지 60 mgKOH/g, 예컨대 20 mgKOH/g 내지 50 mgKOH/g 일 수 있다. 상기 바인더 수지의 산가가 상기 범위 내일 경우 픽셀 패턴의 해상도가 우수하다.The acid value of the binder resin may be 15 mgKOH/g to 60 mgKOH/g, for example, 20 mgKOH/g to 50 mgKOH/g . When the acid value of the binder resin is within the above range, the resolution of the pixel pattern is excellent.
상기 바인더 수지는 상기 감광성 수지 조성물 총량에 대하여 1 중량% 내지 20 중량%, 예컨대 1 중량% 내지 15 중량%, 예컨대 1 중량% 내지 10 중량%로 포함될 수 있다. 상기 바인더 수지가 상기 범위 내로 포함될 경우, 컬러필터 제조시 현상성이 우수하며 가교성이 개선되어 우수한 표면 평활도를 얻을 수 있다.The binder resin may be included in an amount of 1% to 20% by weight, such as 1% to 15% by weight, such as 1% to 10% by weight, based on the total amount of the photosensitive resin composition. When the binder resin is included within the above range, developability is excellent and crosslinking property is improved when manufacturing a color filter, so that excellent surface smoothness can be obtained.
상기 광중합성 화합물은 적어도 1개의 에틸렌성 불포화 이중결합을 가지는 (메타)아크릴산의 일관능 또는 다관능 에스테르가 사용될 수 있다.The photopolymerizable compound may be a monofunctional or polyfunctional ester of (meth)acrylic acid having at least one ethylenically unsaturated double bond.
상기 광중합성 화합물은 상기 에틸렌성 불포화 이중결합을 가짐으로써, 패턴 형성 공정에서 노광시 충분한 중합을 일으킴으로써 내열성, 내광성 및 내화학성이 우수한 패턴을 형성할 수 있다.Since the photopolymerizable compound has the ethylenically unsaturated double bond, it is possible to form a pattern having excellent heat resistance, light resistance and chemical resistance by causing sufficient polymerization during exposure in the pattern formation process.
상기 광중합성 화합물의 구체적인 예로는, 에틸렌 글리콜 디(메타)아크릴레이트, 디에틸렌 글리콜 디(메타)아크릴레이트, 트리에틸렌 글리콜 디(메타)아크릴레이트, 프로필렌 글리콜 디(메타)아크릴레이트, 네오펜틸 글리콜 디(메타)아크릴레이트, 1,4-부탄디올 디(메타)아크릴레이트, 1,6-헥산디올 디(메타)아크릴레이트, 비스페놀A 디(메타)아크릴레이트, 펜타에리트리톨 디(메타)아크릴레이트, 펜타에리트리톨 트리(메타)아크릴레이트, 펜타에리트리톨 테트라(메타)아크릴레이트, 펜타에리트리톨 헥사(메타)아크릴레이트, 디펜타에리트리톨 디(메타)아크릴레이트, 디펜타에리트리톨 트리(메타)아크릴레이트, 디펜타에리트리톨 펜타(메타)아크릴레이트, 디펜타에리트리톨 헥사(메타)아크릴레이트, 비스페놀A 에폭시(메타)아크릴레이트, 에틸렌 글리콜 모노메틸에테르 (메타)아크릴레이트, 트리메틸올 프로판 트리(메타)아크릴레이트, 트리스(메타)아크릴로일옥시에틸 포스페이트, 노볼락에폭시 (메타)아크릴레이트등을 들 수 있다. Specific examples of the photopolymerizable compound include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, neopentyl glycol Di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, bisphenol A di(meth)acrylate, pentaerythritol di(meth)acrylate , Pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol hexa(meth)acrylate, dipentaerythritol di(meth)acrylate, dipentaerythritol tri(meth) Acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, bisphenol A epoxy (meth) acrylate, ethylene glycol monomethyl ether (meth) acrylate, trimethylol propane tri( Meth)acrylate, tris(meth)acryloyloxyethyl phosphate, novolac epoxy (meth)acrylate, and the like.
상기 광중합성 화합물의 시판되는 제품을 예로 들면 다음과 같다. 상기 (메타)아크릴산의 일관능 에스테르의 예로는, 도아 고세이 가가꾸 고교(주)社의 아로닉스 M-101®, 동 M-111®, 동 M-114® 등; 니혼 가야꾸(주)社의 KAYARAD TC-110S®, 동 TC-120S® 등; 오사카 유끼 가가꾸 고교(주)社의 V-158®, V-2311® 등을 들 수 있다. 상기 (메타)아크릴산의 이관능 에스테르의 예로는, 도아 고세이 가가꾸 고교(주)社의 아로닉스 M-210®, 동 M-240®, 동 M-6200® 등; 니혼 가야꾸(주)社의 KAYARAD HDDA®, 동 HX-220®, 동 R-604® 등; 오사카 유끼 가가꾸 고교(주)社의 V-260®, V-312®, V-335 HP® 등을 들 수 있다. 상기 (메타)아크릴산의 삼관능 에스테르의 예로는, 도아 고세이 가가꾸 고교(주)社의 아로닉스 M-309®, 동 M-400®, 동 M-405®, 동 M-450®, 동 M-710®, 동 M-8030®, 동 M-8060® 등; 니혼 가야꾸(주)社의 KAYARAD TMPTA®, 동 DPCA-20®, 동-30®, 동-60®, 동-120® 등; 오사카 유끼 가야꾸 고교(주)社의 V-295®, 동-300®, 동-360®, 동-GPT®, 동-3PA®, 동-400® 등을 들 수 있다. 상기 제품을 단독 사용 또는 2종 이상 함께 사용할 수 있다.Commercially available products of the photopolymerizable compound are as follows. The (meth) acrylic acid is one example of a polyfunctional ester, such as doah Gosei Kagaku Kogyo's (primary)社Aronix M-101 ®, the same M-111 ®, the same M-114 ®; KAYARAD TC-110S ® of Nihon Kayaku Co., Ltd., TC-120S ®, etc.; Osaka yukki the like Kagaku Kogyo (main)社of V-158 ®, V-2311 ®. The (meth) transfer function of an example esters of acrylic acid are, doah Gosei Kagaku Kogyo (Note)社of Aronix M-210 ®, copper or the like M-240 ®, the same M-6200 ®; KAYARAD HDDA ® , HX-220 ® , R-604 ® of Nihon Kayaku Co., Ltd.; Osaka Yuki Kagaku High School Co., Ltd.'s V-260 ® , V-312 ® , and V-335 HP ® are listed. Examples of the tri-functional ester of (meth) acrylic acid, doah Gosei Kagaku Kogyo (Note)社of Aronix M-309 ®, the same M-400 ®, the same M-405 ®, the same M-450 ®, Dong M -710 ® , M-8030 ® , M-8060 ®, etc.; Nippon Kayaku (Note)社of KAYARAD TMPTA ®, copper DPCA-20 ®, ® copper -30, -60 ® copper, copper ® -120 and the like; Osaka Yuki Kayaku High School Co., Ltd.'s V-295 ® , East-300 ® , East-360 ® , East-GPT ® , East-3PA ® , and East-400 ® are listed. The above products can be used alone or in combination of two or more.
상기 광중합성 화합물은 보다 우수한 현상성을 부여하기 위하여 산무수물로 처리하여 사용할 수도 있다.The photopolymerizable compound may be used after treatment with an acid anhydride in order to impart better developability.
상기 광중합성 화합물은 상기 감광성 수지 조성물 총량에 대하여 1 중량% 내지 15 중량%, 예컨대 1중량% 내지 10 중량%로 포함될 수 있다. 상기 광중합성 화합물이 상기 범위 내로 포함될 경우, 패턴 형성 공정에서 노광시 경화가 충분히 일어나 신뢰성이 우수하며, 알칼리 현상액에의 현상성이 우수하다.The photopolymerizable compound may be included in an amount of 1% to 15% by weight, such as 1% to 10% by weight, based on the total amount of the photosensitive resin composition. When the photopolymerizable compound is included within the above range, hardening occurs sufficiently during exposure in the pattern formation process, thereby providing excellent reliability and excellent developability in an alkaline developer.
상기 광중합 개시제는 감광성 수지 조성물에 일반적으로 사용되는 개시제로서, 예를 들어 아세토페논계 화합물, 벤조페논계 화합물, 티오크산톤계 화합물, 벤조인계 화합물, 트리아진계 화합물, 옥심계 화합물, 또는 이들의 조합을 사용할 수 있다. The photopolymerization initiator is an initiator generally used in the photosensitive resin composition, for example, an acetophenone compound, a benzophenone compound, a thioxanthone compound, a benzoin compound, a triazine compound, an oxime compound, or a combination thereof Can be used.
상기 아세토페논계 화합물의 예로는, 2,2'-디에톡시 아세토페논, 2,2'-디부톡시 아세토페논, 2-히드록시-2-메틸프로피오페논, p-t-부틸트리클로로 아세토페논, p-t-부틸디클로로 아세토페논, 4-클로로 아세토페논, 2,2'-디클로로-4-페녹시 아세토페논, 2-메틸-1-(4-(메틸티오)페닐)-2-모폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모폴리노페닐)-부탄-1-온 등을 들 수 있다.Examples of the acetophenone-based compound include 2,2'-diethoxy acetophenone, 2,2'-dibutoxy acetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyltrichloro acetophenone, pt -Butyldichloro acetophenone, 4-chloro acetophenone, 2,2'-dichloro-4-phenoxy acetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropane-1 -One, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, and the like.
상기 벤조페논계 화합물의 예로는, 벤조페논, 벤조일 안식향산, 벤조일 안식향산 메틸, 4-페닐 벤조페논, 히드록시 벤조페논, 아크릴화 벤조페논, 4,4'-비스(디메틸아미노)벤조페논, 4,4'-비스(디에틸아미노)벤조페논, 4,4'-디메틸아미노벤조페논, 4,4'-디클로로벤조페논, 3,3'-디메틸-2-메톡시벤조페논 등을 들 수 있다.Examples of the benzophenone-based compound include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4 '-Bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like.
상기 티오크산톤계 화합물의 예로는, 티오크산톤, 2-메틸티오크산톤, 이소프로필 티오크산톤, 2,4-디에틸 티오크산톤, 2,4-디이소프로필 티오크산톤, 2-클로로티오크산톤 등을 들 수 있다.Examples of the thioxanthone compound include thioxanthone, 2-methyl thioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthone, 2- And chlorothioxanthone.
상기 벤조인계 화합물의 예로는, 벤조인, 벤조인 메틸 에테르, 벤조인 에틸 에테르, 벤조인 이소프로필 에테르, 벤조인 이소부틸 에테르, 벤질디메틸케탈 등을 들 수 있다.Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyldimethylketal.
상기 트리아진계 화합물의 예로는, 2,4,6-트리클로로-s-트리아진, 2-페닐 4,6-비스(트리클로로메틸)-s-트리아진, 2-(3', 4'-디메톡시스티릴)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4'-메톡시나프틸)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-메톡시페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(p-톨릴)-4,6-비스(트리클로로 메틸)-s-트리아진, 2-비페닐 4,6-비스(트리클로로 메틸)-s-트리아진, 비스(트리클로로메틸)-6-스티릴-s-트리아진, 2-(나프토-1-일)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-메톡시나프토-1-일)-4,6-비스(트리클로로메틸)-s-트리아진, 2-4-비스(트리클로로메틸)-6-피페로닐-s-트리아진, 2-4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-s-트리아진 등을 들 수 있다.Examples of the triazine-based compound include 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis(trichloromethyl)-s-triazine, 2-(3', 4'- Dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-biphenyl 4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho-1-yl)-4, 6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-bis (Trichloromethyl)-6-piperonyl-s-triazine, 2-4-bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine, etc. are mentioned.
상기 옥심계 화합물의 예로는, O-아실옥심계 화합물, 2-(o-벤조일옥심)-1-[4-(페닐티오)페닐]-1,2-옥탄디온, 1-(o-아세틸옥심)-1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]에탄온, O-에톡시카르보닐-α-옥시아미노-1-페닐프로판-1-온 등을 사용할 수 있다. 상기 O-아실옥심계 화합물의 구체적인 예로는, 1,2-옥탄디온, 2-디메틸아미노-2-(4-메틸벤질)-1-(4-모르폴린-4-일-페닐)-부탄-1-온, 1-(4-페닐술파닐페닐)-부탄-1,2-디온2-옥심-O-벤조에이트, 1-(4-페닐술파닐페닐)-옥탄-1,2-디온2-옥심-O-벤조에이트, 1-(4-페닐술파닐페닐)-옥탄-1-온옥심-O-아세테이트 및 1-(4-페닐술파닐페닐)-부탄-1-온옥심-O-아세테이트 등을 들 수 있다. Examples of the oxime-based compound include O-acyloxime-based compounds, 2-(o-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(o-acetyloxime )-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one Etc. can be used. Specific examples of the O-acyloxime-based compound include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butane- 1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione2 -Oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octan-1-oneoxime-O-acetate and 1-(4-phenylsulfanylphenyl)-butan-1-oneoxime-O- Acetate, etc. are mentioned.
상기 광중합 개시제는 상기 화합물 이외에도 카바졸계 화합물, 디케톤류 화합물, 술포늄 보레이트계 화합물, 디아조계 화합물, 이미다졸계 화합물, 비이미다졸계 화합물, 플루오렌계 화합물 등을 사용할 수 있다.In addition to the above compounds, the photopolymerization initiator may be a carbazole-based compound, a diketone-based compound, a sulfonium borate-based compound, a diazo-based compound, an imidazole-based compound, a biimidazole-based compound, or a fluorene-based compound.
상기 광중합 개시제는 빛을 흡수하여 들뜬 상태가 된 후 그 에너지를 전달함으로써 화학반응을 일으키는 광 증감제와 함께 사용될 수도 있다.The photopolymerization initiator may be used together with a photosensitizer that causes a chemical reaction by absorbing light and becoming excited and then transferring the energy.
상기 광 증감제의 예로는, 테트라에틸렌글리콜 비스-3-머캡토 프로피오네이트, 펜타에리트리톨 테트라키스-3-머캡토 프로피오네이트, 디펜타에리트리톨 테트라키스-3-머캡토 프로피오네이트 등을 들 수 있다. Examples of the photosensitizer include tetraethylene glycol bis-3-mercapto propionate, pentaerythritol tetrakis-3-mercapto propionate, dipentaerythritol tetrakis-3-mercapto propionate, etc. Can be mentioned.
상기 광중합 개시제는 상기 감광성 수지 조성물 총량에 대하여 0.01 중량% 내지 10 중량%, 예컨대 0.1 중량% 내지 5 중량%로 포함될 수 있다. 광중합 개시제가 상기 범위 내로 포함될 경우, 패턴 형성 공정에서 노광시 경화가 충분히 일어나 우수한 신뢰성을 얻을 수 있으며, 패턴의 내열성, 내광성 및 내화학성이 우수하고, 해상도 및 밀착성 또한 우수하며, 미반응 개시제로 인한 투과율의 저하를 막을 수 있다.The photopolymerization initiator may be included in an amount of 0.01% to 10% by weight, such as 0.1% to 5% by weight, based on the total amount of the photosensitive resin composition. When the photopolymerization initiator is included within the above range, curing occurs sufficiently during exposure in the pattern formation process to obtain excellent reliability, excellent heat resistance, light resistance and chemical resistance of the pattern, excellent resolution and adhesion, and due to unreacted initiators. It is possible to prevent a decrease in transmittance.
상기 용매는 일 구현예에 따른 화합물, 안료, 바인더 수지, 광중합성 화합물 및 광중합 개시제와의 상용성을 가지되 반응하지 않는 물질들이 사용될 수 있다.The solvent may have compatibility with a compound, a pigment, a binder resin, a photopolymerizable compound, and a photopolymerization initiator according to an embodiment, but materials that do not react may be used.
상기 용매의 예로는, 메탄올, 에탄올 등의 알코올류; 디클로로에틸 에테르, n-부틸 에테르, 디이소아밀 에테르, 메틸페닐 에테르, 테트라히드로퓨란 등의 에테르류; 에틸렌 글리콜 모노메틸에테르, 에틸렌 글리콜 모노에틸에테르 등의 글리콜 에테르류; 메틸 셀로솔브 아세테이트, 에틸 셀로솔브 아세테이트, 디에틸 셀로솔브 아세테이트 등의 셀로솔브 아세테이트류; 메틸에틸 카르비톨, 디에틸 카르비톨, 디에틸렌 글리콜 모노메틸에테르, 디에틸렌 글리콜 모노에틸에테르, 디에틸렌 글리콜 디메틸에테르, 디에틸렌 글리콜 메틸에틸에테르, 디에틸렌 글리콜 디에틸에테르 등의 카르비톨류; 프로필렌 글리콜 모노메틸에테르 아세테이트, 프로필렌 글리콜 프로필에테르 아세테이트 등의 프로필렌 글리콜 알킬에테르 아세테이트류; 톨루엔, 크실렌 등의 방향족 탄화수소류; 메틸에틸케톤, 사이클로헥사논, 4-히드록시-4-메틸-2-펜타논, 메틸-n-프로필케톤, 메틸-n-부틸케톤, 메틸-n-아밀케톤, 2-헵타논 등의 케톤류; 초산 에틸, 초산-n-부틸, 초산 이소부틸 등의 포화 지방족 모노카르복실산 알킬 에스테르류; 젖산 메틸, 젖산 에틸 등의 젖산 에스테르류; 옥시 초산 메틸, 옥시 초산 에틸, 옥시 초산 부틸 등의 옥시 초산 알킬 에스테르류; 메톡시 초산 메틸, 메톡시 초산 에틸, 메톡시 초산 부틸, 에톡시 초산 메틸, 에톡시 초산 에틸 등의 알콕시 초산 알킬 에스테르류; 3-옥시 프로피온산 메틸, 3-옥시 프로피온산 에틸 등의 3-옥시 프로피온산 알킬에스테르류; 3-메톡시 프로피온산 메틸, 3-메톡시 프로피온산 에틸, 3-에톡시 프로피온산 에틸, 3-에톡시 프로피온산 메틸 등의 3-알콕시 프로피온산 알킬 에스테르류; 2-옥시 프로피온산 메틸, 2-옥시 프로피온산 에틸, 2-옥시 프로피온산 프로필 등의 2-옥시 프로피온산 알킬 에스테르류; 2-메톡시 프로피온산 메틸, 2-메톡시 프로피온산 에틸, 2-에톡시 프로피온산 에틸, 2-에톡시 프로피온산 메틸 등의 2-알콕시 프로피온산 알킬 에스테르류; 2-옥시-2-메틸 프로피온산 메틸, 2-옥시-2-메틸 프로피온산 에틸 등의 2-옥시-2-메틸 프로피온산 에스테르류, 2-메톡시-2-메틸 프로피온산 메틸, 2-에톡시-2-메틸 프로피온산 에틸 등의 2-알콕시-2-메틸 프로피온산 알킬류의 모노옥시 모노카르복실산 알킬 에스테르류; 2-히드록시 프로피온산 에틸, 2-히드록시-2-메틸 프로피온산 에틸, 히드록시 초산 에틸, 2-히드록시-3-메틸 부탄산 메틸 등의 에스테르류; 피루빈산 에틸 등의 케톤산 에스테르류 등이 있으며, 또한, N-메틸포름아미드, N,N-디메틸포름아미드, N-메틸포름아닐라드, N-메틸아세트아미드, N,N-디메틸아세트아미드, N-메틸피롤리돈, 디메틸술폭시드, 벤질에틸에테르, 디헥실에테르, 아세틸아세톤, 이소포론, 카프론산, 카프릴산, 1-옥탄올, 1-노난올, 벤질알코올, 초산 벤질, 안식향산 에틸, 옥살산 디에틸, 말레인산 디에틸, γ부티로락톤, 탄산 에틸렌, 탄산 프로필렌, 페닐 셀로솔브 아세테이트 등의 고비점 용매를 들 수 있다.Examples of the solvent include alcohols such as methanol and ethanol; Ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, and tetrahydrofuran; Glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; Cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; Carbitols such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and diethylene glycol diethyl ether; Propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate; Aromatic hydrocarbons such as toluene and xylene; Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-amyl ketone, and 2-heptanone ; Saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, and isobutyl acetate; Lactate esters such as methyl lactate and ethyl lactate; Oxyacetic acid alkyl esters such as methyl oxyacetate, ethyl oxyacetate, and butyl oxyacetate; Alkoxy acetate alkyl esters such as methoxy methyl acetate, methoxy ethyl acetate, methoxy butyl acetate, ethoxy methyl acetate, and ethoxy ethyl acetate; 3-oxypropionic acid alkyl esters such as 3-oxy methyl propionate and 3-oxy ethyl propionate; 3-alkoxy propionic acid alkyl esters such as 3-methoxy methyl propionate, 3-methoxy ethyl propionate, 3-ethoxy ethyl propionate, and 3-ethoxy methyl propionate; 2-oxypropionic acid alkyl esters such as 2-oxy methyl propionate, 2-oxy ethyl propionate, and 2-oxy propionate propyl; 2-alkoxy propionic acid alkyl esters such as 2-methoxy methyl propionate, 2-methoxy ethyl propionate, 2-ethoxy ethyl propionate, and 2-ethoxy methyl propionate; 2-oxy-2-methyl propionic acid esters such as 2-oxy-2-methyl methyl propionate and 2-oxy-2-methyl ethyl propionate, 2-methoxy-2-methyl methyl propionate, 2-ethoxy-2- Monooxy monocarboxylic acid alkyl esters of alkyl 2-alkoxy-2-methyl propionate such as ethyl methyl propionate; Esters such as 2-hydroxy ethyl propionate, 2-hydroxy-2-methyl ethyl propionate, hydroxy ethyl acetate, and 2-hydroxy-3-methyl methyl butanoate; Ketone acid esters such as ethyl pyruvate, and the like, and N-methylformamide, N,N-dimethylformamide, N-methylformanilad, N-methylacetamide, N,N-dimethylacetamide , N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, capronic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, benzoic acid And high boiling point solvents such as ethyl, diethyl oxalate, diethyl maleate, ?butyrolactone, ethylene carbonate, propylene carbonate, and phenyl cellosolve acetate.
이들 중 좋게는 상용성 및 반응성을 고려하여, 에틸렌 글리콜 모노에틸에테르 등의 글리콜 에테르류; 에틸 셀로솔브 아세테이트 등의 에틸렌 글리콜 알킬에테르 아세테이트류; 2-히드록시 프로피온산 에틸 등의 에스테르류; 디에틸렌 글리콜 모노메틸에테르 등의 카르비톨류; 프로필렌 글리콜 모노메틸에테르 아세테이트, 프로필렌 글리콜 프로필에테르 아세테이트 등의 프로필렌 글리콜 알킬에테르 아세테이트류; 및/또는 사이클로헥사논 등의 케톤류가 사용될 수 있다.Among these, in consideration of compatibility and reactivity, glycol ethers such as ethylene glycol monoethyl ether; Ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; Esters such as ethyl 2-hydroxypropionate; Carbitols such as diethylene glycol monomethyl ether; Propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate; And/or ketones such as cyclohexanone may be used.
상기 용매는 상기 감광성 수지 조성물 총량에 대하여 잔부량, 예컨대 30 중량% 내지 80 중량%로 포함될 수 있다. 용매가 상기 범위 내로 포함될 경우 상기 감광성 수지 조성물이 적절한 점도를 가짐에 따라 컬러필터 제조시 공정성이 우수하다.The solvent may be included in the balance, for example, 30% to 80% by weight based on the total amount of the photosensitive resin composition. When the solvent is included within the above range, the photosensitive resin composition has an appropriate viscosity, and thus processability is excellent in manufacturing a color filter.
상기 감광성 수지 조성물은 하기 화학식 3으로 표시되는 화합물을 더 포함할 수 있다.The photosensitive resin composition may further include a compound represented by Formula 3 below.
[화학식 3][Formula 3]
상기 화학식 3에서,In Chemical Formula 3,
R23 및 R24는 각각 독립적으로 히드록시기 또는 치환 또는 비치환된 C1 내지 C20 알킬기이고,R 23 and R 24 are each independently a hydroxy group or a substituted or unsubstituted C1 to C20 alkyl group,
L2 내지 L4는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬렌기이고,L 2 to L 4 are each independently a substituted or unsubstituted C1 to C20 alkylene group,
n1 및 n2는 각각 독립적으로 0 내지 5의 정수이되, 3 ≤ n1+n2 ≤ 5 이다.n1 and n2 are each independently an integer of 0 to 5, but 3≦n1+n2≦5.
예컨대, 상기 화학식 3으로 표시되는 화합물은 산화방지제로서 기능할 수 있다.For example, the compound represented by Formula 3 may function as an antioxidant.
예컨대, 상기 화학식 3에서, R23은 알킬기로 치환된 C1 내지 C20 알킬기이고, R24는 히드록시기이고, n1은 2의 정수이고, n2는 1의 정수일 수 있다. For example, in Formula 3, R 23 is a C1 to C20 alkyl group substituted with an alkyl group, R 24 is a hydroxy group, n1 is an integer of 2, and n2 may be an integer of 1.
다른 일 구현예에 따른 감광성 수지 조성물은 기판과의 밀착성 등을 개선하기 위해 에폭시 화합물을 더 포함할 수 있다. The photosensitive resin composition according to another embodiment may further include an epoxy compound to improve adhesion with the substrate.
상기 에폭시 화합물의 예로는, 페놀 노볼락 에폭시 화합물, 테트라메틸 비페닐 에폭시 화합물, 비스페놀 A형 에폭시 화합물, 지환족 에폭시화합물 또는 이들의 조합을 들 수 있다.Examples of the epoxy compound include a phenol novolac epoxy compound, a tetramethyl biphenyl epoxy compound, a bisphenol A type epoxy compound, an alicyclic epoxy compound, or a combination thereof.
상기 에폭시 화합물은 감광성 수지 조성물 100 중량부에 대하여 0.01 중량부 내지 20 중량부, 예컨대 0.1 중량부 내지 10 중량부로 포함될 수 있다. 에폭시 화합물이 상기 범위 내로 포함될 경우 밀착성, 저장성 등이 우수하다. The epoxy compound may be included in an amount of 0.01 parts by weight to 20 parts by weight, for example, 0.1 parts by weight to 10 parts by weight, based on 100 parts by weight of the photosensitive resin composition. When the epoxy compound is included within the above range, adhesion and storage properties are excellent.
또한 상기 감광성 수지 조성물은 기판과의 접착성을 향상시키기 위해 카르복실기, 메타크릴로일기, 이소시아네이트기, 에폭시기 등의 반응성 치환기를 갖는 실란 커플링제를 더 포함할 수 있다.In addition, the photosensitive resin composition may further include a silane coupling agent having a reactive substituent such as a carboxyl group, a methacryloyl group, an isocyanate group, or an epoxy group to improve adhesion to the substrate.
상기 실란 커플링제의 예로는, 트리메톡시실릴 벤조산, γ메타크릴 옥시프로필 트리메톡시실란, 비닐 트리아세톡시실란, 비닐 트리메톡시실란, γ이소시아네이트 프로필 트리에톡시실란, γ글리시독시 프로필 트리메톡시실란, β에폭시사이클로헥실)에틸트리메톡시실란 등을 들 수 있으며, 이들을 단독 또는 2종 이상 혼합하여 사용할 수 있다. Examples of the silane coupling agent include trimethoxysilyl benzoic acid, γ methacryl oxypropyl trimethoxysilane, vinyl triacetoxysilane, vinyl trimethoxysilane, γ isocyanate propyl triethoxysilane, γ glycidoxy propyl tri Methoxysilane, βepoxycyclohexyl)ethyltrimethoxysilane, and the like, and these may be used alone or in combination of two or more.
상기 실란 커플링제는 감광성 수지 조성물 100 중량부에 대하여 0.01 중량부 내지 10 중량부로 포함될 수 있다. 실란 커플링제가 상기 범위 내로 포함될 경우 밀착성, 저장성 등이 우수하다. The silane coupling agent may be included in an amount of 0.01 parts by weight to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the silane coupling agent is included within the above range, adhesion and storage properties are excellent.
또한 상기 감광성 수지 조성물은 필요에 따라 코팅성 향상 및 결점 생성 방지 효과를 위해 계면 활성제를 더 포함할 수 있다. In addition, the photosensitive resin composition may further include a surfactant to improve coating properties and prevent defects from being generated, if necessary.
상기 계면활성제의 예로는, BM Chemie社의 BM-1000®, BM-1100® 등; 다이 닛폰 잉키 가가꾸 고교(주)社의 메카 팩 F 142D®, 동 F 172®, 동 F 173®, 동 F 183® 등; 스미토모 스리엠(주)社의 프로라드 FC-135®, 동 FC-170C®, 동 FC-430®, 동 FC-431® 등; 아사히 그라스(주)社의 사프론 S-112®, 동 S-113®, 동 S-131®, 동 S-141®, 동 S-145® 등; 도레이 실리콘(주)社의 SH-28PA®, 동-190®, 동-193®, SZ-6032®, SF-8428® 등의 명칭으로 시판된고 있는 불소계 계면 활성제를 사용할 수 있다.Examples of the surfactants include, BM Chemie BM-1000 ® of社, BM-1100 ®, and the like; Mecha Pack F 142D ® , F 172 ® , F 173 ® , F 183 ®, etc. of Dai Nippon Inki Chemical High School Co., Ltd.; Sumitomo M. (Note)社Pro rod FC-135 ®, the same FC-170C ®, copper FC-430 ®, the same FC-431 ®, and the like; Asahi Grass Co., Saffron S-112 ® of社, such S-113 ®, the same S-131 ®, the same S-141 ®, the same S-145 ®, and the like; Toray silicone (Note)社SH-28PA ®, copper -190 ®, may be used copper ® -193, fluorine-based surfactants and commercially available under the name, such as SZ-6032 ®, SF-8428 ®.
상기 계면 활성제는 감광성 수지 조성물 100 중량부에 대하여 0.001 중량부 내지 5 중량부로 사용될 수 있다. 계면 활성제가 상기 범위 내로 포함될 경우 코팅 균일성이 확보되고, 얼룩이 발생하지 않으며, 유리 기판에 대한 습윤성(wetting)이 우수하다.The surfactant may be used in an amount of 0.001 parts by weight to 5 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the surfactant is included within the above range, coating uniformity is ensured, stains do not occur, and wetting properties for the glass substrate are excellent.
또한 상기 감광성 수지 조성물은 물성을 저해하지 않는 범위 내에서 산화방지제, 안정제 등의 기타 첨가제가 일정량 첨가될 수도 있다.In addition, a certain amount of other additives such as antioxidants and stabilizers may be added to the photosensitive resin composition within a range that does not impair physical properties.
또 다른 일 구현예에 따르면, 상기 일 구현예에 따른 감광성 수지 조성물을 이용하여 제조된 컬러필터를 제공한다. According to another embodiment, a color filter manufactured using the photosensitive resin composition according to the embodiment is provided.
상기 컬러필터 내 패턴 형성 공정은 다음과 같다.The pattern formation process in the color filter is as follows.
상기 감광성 수지 조성물을 지지 기판상에 스핀 코팅, 슬릿 코팅, 잉크젯 프린팅 등으로 도포하는 공정; 상기 도포된 감광성 수지 조성물을 건조하여 감광성 수지 조성물 막을 형성하는 공정; 상기 감광성 수지 조성물 막을 노광하는 공정; 상기 노광된 감광성 수지 조성물 막을 알칼리 수용액으로 현상하여 감광성 수지막을 제조하는 공정; 및 상기 감광성 수지막을 가열 처리하는 공정을 포함한다. 상기 공정 상의 조건 등에 대하여는 당해 분야에서 널리 알려진 사항이므로, 본 명세서에서 자세한 설명은 생략하기로 한다. Applying the photosensitive resin composition onto a supporting substrate by spin coating, slit coating, inkjet printing, or the like; Drying the applied photosensitive resin composition to form a photosensitive resin composition film; Exposing the photosensitive resin composition film to light; Developing the exposed photosensitive resin composition film with an aqueous alkali solution to prepare a photosensitive resin film; And a step of heat treating the photosensitive resin film. Since the above process conditions are widely known in the art, detailed descriptions thereof will be omitted herein.
이하, 실시예를 들어 본 발명에 대해서 더욱 상세하게 설명할 것이나, 하기의 실시예는 본 발명의 바람직한 실시예일 뿐 본 발명이 하기 실시예에 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to examples, but the following examples are only preferred examples of the present invention, and the present invention is not limited to the following examples.
(화합물의 합성)(Synthesis of compounds)
합성예 1: 화학식 1-1로 표시되는 화합물의 합성Synthesis Example 1: Synthesis of a compound represented by Formula 1-1
100ml 플라스크에 3,4,5,6-tetrachlorophthalonitrile(5g), 2-isopropropyl-phenol(2.56g), K2CO3(3.9g), N,N-디메틸포름아미드(N,N-dimethylformamide)(25ml)를 넣고 70℃로 가열하면서 교반한다. 반응 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축한 후에 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 진공 건조하여 4-(2-isopropropyl-phenoxy)-3,5,6-trichloro-phthalonitrile를 얻는다.In a 100ml flask, 3,4,5,6-tetrachlorophthalonitrile (5g), 2-isopropropyl-phenol (2.56g), K 2 CO 3 (3.9g), N,N-dimethylformamide (N,N-dimethylformamide) ( 25ml) was added and stirred while heating to 70°C. After completion of the reaction, extraction was performed with ethyl acetate (EA). After extraction and concentration, it is purified by column chromatography. After purification, it is vacuum-dried to obtain 4-(2-isopropropyl-phenoxy)-3,5,6-trichloro-phthalonitrile.
100mL 플라스크에 4-(2-isopropropyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile(0.73g), phthalonitrile(0.35g) 1,8-Diazabicycloundec-7-ene(2.08g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.50g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-1로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(2-isopropropyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile (0.73g), phthalonitrile (0.35g) 1,8-Diazabicycloundec Add -7-ene (2.08g) and 1-pentanol (15g) and heat to 90℃ to dissolve the solid, then add zinc acetate (0.50g) and stir while heating to 140℃. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. After purification, the obtained solid edichloromethane is appropriately added to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-1 below.
[화학식 1-1][Formula 1-1]
Maldi-tof MS : 1190.69 m/zMaldi-tof MS: 1190.69 m/z
합성예 2: 화학식 1-2로 표시되는 화합물의 합성Synthesis Example 2: Synthesis of a compound represented by Formula 1-2
100mL 플라스크에 4-(2-isopropropyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile(2.91g), phthalonitrile(0.70g) 1,8-Diazabicycloundec-7-ene(4.16g) 및 1-펜탄올(30g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(1.00g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-2로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(2-isopropropyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile (2.91g), phthalonitrile (0.70g) 1,8-Diazabicycloundec Add -7-ene (4.16g) and 1-pentanol (30g) and heat to 90℃ to dissolve the solid, then add zinc acetate (1.00g) and stir while heating to 140℃. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. After purification, the obtained solid edichloromethane is appropriately added to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-2 below.
[화학식 1-2][Formula 1-2]
Maldi-tof MS : 1090.96 m/zMaldi-tof MS: 1090.96 m/z
합성예 3: 화학식 1-3으로 표시되는 화합물의 합성Synthesis Example 3: Synthesis of a compound represented by Formula 1-3
100ml 플라스크에 3,4,5,6-tetrachlorophthalonitrile(5g), 2-tert-Butyl-phenol(2.83g), K2CO3(3.9g), N,N-디메틸포름아미드(N,N-dimethylformamide)(25ml)를 넣고 70℃로 가열하면서 교반한다. 반응 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축한 후에 컬럼 크로마토그래피(column chromatography)로 정제한다., 정제 후 진공 건조하여 4-(2-tert-Butyl-phenoxy)-3,5,6-trichloro-phthalonitrile를 얻는다.In a 100ml flask, 3,4,5,6-tetrachlorophthalonitrile (5g), 2-tert-Butyl-phenol (2.83g), K 2 CO 3 (3.9g), N,N-dimethylformamide (N,N-dimethylformamide) )(25ml) was added and stirred while heating to 70℃. After completion of the reaction, extraction was performed with ethyl acetate (EA). After extraction, concentration, and purification by column chromatography, purification and vacuum drying to obtain 4-(2-tert-Butyl-phenoxy)-3,5,6-trichloro-phthalonitrile.
100mL 플라스크에 4-(2-tert-Butyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile(0.70g), phthalonitrile(0.34g) 1,8-Diazabicycloundec-7-ene(2.01g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.48g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-3로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(2-tert-Butyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile (0.70g), phthalonitrile (0.34g) 1,8 -Diazabicycloundec-7-ene (2.01g) and 1-pentanol (15g) are added and heated to 90°C to dissolve the solid, then zinc acetate (0.48g) is added and heated to 140°C while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. After purification, the obtained solid edichloromethane is appropriately added to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-3 below.
[화학식 1-3][Formula 1-3]
Maldi-tof MS : 1218.75 m/zMaldi-tof MS: 1218.75 m/z
합성예 4: 화학식 1-4로 표시되는 화합물의 합성Synthesis Example 4: Synthesis of a compound represented by Formula 1-4
100mL 플라스크에 4-(2-tert-Butyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile(2.80g), phthalonitrile(0.67g) 1,8-Diazabicycloundec-7-ene(4.01g) 및 1-펜탄올(30g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.97g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-4로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(2-tert-Butyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile (2.80g), phthalonitrile (0.67g) 1,8 -Diazabicycloundec-7-ene (4.01g) and 1-pentanol (30g) are added and heated to 90°C to dissolve the solid, then zinc acetate (0.97g) is added and heated to 140°C while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. After purification, the obtained solid edichloromethane is appropriately added to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-4 below.
[화학식 1-4][Formula 1-4]
Maldi-tof MS : 1104.98 m/zMaldi-tof MS: 1104.98 m/z
합성예 5: 화학식 1-5로 표시되는 화합물의 합성Synthesis Example 5: Synthesis of a compound represented by Formula 1-5
100ml 플라스크에 3,4,5,6-tetrachlorophthalonitrile(5g), p-cresol(2.83g), K2CO3(3.9g), N,N-디메틸포름아미드(N,N-dimethylformamide)(25ml)를 넣고 70℃로 가열하면서 교반한다. 반응 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축한 후에 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 진공 건조하여 4-(2-methyl-phenoxy)-3,5,6-trichloro-phthalonitrile를 얻는다.In a 100ml flask, 3,4,5,6-tetrachlorophthalonitrile (5g), p-cresol (2.83g), K 2 CO 3 (3.9g), N,N-dimethylformamide (25ml) Put and stir while heating to 70 ℃. After completion of the reaction, extraction was performed with ethyl acetate (EA). After extraction and concentration, it is purified by column chromatography. After purification, it is vacuum-dried to obtain 4-(2-methyl-phenoxy)-3,5,6-trichloro-phthalonitrile.
100mL 플라스크에 4-(2-methyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile(0.79g), phthalonitrile(0.38g) 1,8-Diazabicycloundec-7-ene(2.26g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.54g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-5로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(2-methyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile (0.79g), phthalonitrile (0.38g) 1,8-Diazabicycloundec Add -7-ene (2.26g) and 1-pentanol (15g) and heat to 90℃ to dissolve the solid, then add zinc acetate (0.54g) and stir while heating to 140℃. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. After purification, the obtained solid edichloromethane is appropriately added to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-5 below.
[화학식 1-5][Formula 1-5]
Maldi-tof MS : 1134.58 m/zMaldi-tof MS: 1134.58 m/z
합성예 6: 화학식 1-6으로 표시되는 화합물의 합성Synthesis Example 6: Synthesis of a compound represented by Formula 1-6
100ml 플라스크에 3,4,5,6-tetrachlorophthalonitrile(5g), 2,6-dimethylphenol(2.30g), K2CO3(3..9g), N,N-디메틸포름아미드(N,N-dimethylformamide)(25ml)를 넣고 70℃로 가열하면서 교반한다. 반응 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축한 후에 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 진공 건조하여 4-(2,6-dimethyl-phenoxy)-3,5,6-trichloro-phthalonitrile를 얻는다.In a 100ml flask, 3,4,5,6-tetrachlorophthalonitrile (5g), 2,6-dimethylphenol (2.30g), K 2 CO 3 (3..9g), N,N-dimethylformamide (N,N-dimethylformamide) )(25ml) was added and stirred while heating to 70℃. After completion of the reaction, extraction was performed with ethyl acetate (EA). After extraction and concentration, it is purified by column chromatography. After purification, it is vacuum-dried to obtain 4-(2,6-dimethyl-phenoxy)-3,5,6-trichloro-phthalonitrile.
100mL 플라스크에 4-(2,6-dimethyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile(0.76g), phthalonitrile(0.36g) 1,8-Diazabicycloundec-7-ene(2.17g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.52g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-6로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(2,6-dimethyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile (0.76g), phthalonitrile (0.36g) 1,8 -Diazabicycloundec-7-ene (2.17g) and 1-pentanol (15g) are added and heated to 90°C to dissolve the solid, then zinc acetate (0.52g) is added and heated to 140°C while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. After purification, the obtained solid edichloromethane is appropriately added to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-6 below.
[화학식 1-6][Formula 1-6]
Maldi-tof MS : 1162.64 m/zMaldi-tof MS: 1162.64 m/z
합성예 7: 화학식 1-7로 표시되는 화합물의 합성Synthesis Example 7: Synthesis of a compound represented by Formula 1-7
100mL 플라스크에 4-(2,6-dimethyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile(3.03g), phthalonitrile(0.73g) 1,8-Diazabicycloundec-7-ene(4.33g) 및 1-펜탄올(30g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(1.04g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-7로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(2,6-dimethyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile (3.03g), phthalonitrile (0.73g) 1,8 -Diazabicycloundec-7-ene (4.33g) and 1-pentanol (30g) are added and heated to 90°C to dissolve the solid, then zinc acetate (1.04g) is added and heated to 140°C while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. After purification, the obtained solid edichloromethane is appropriately added to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-7 below.
[화학식 1-7][Formula 1-7]
Maldi-tof MS : 1076.93 m/zMaldi-tof MS: 1076.93 m/z
합성예 8: 화학식 1-8로 표시되는 화합물의 합성Synthesis Example 8: Synthesis of a compound represented by Formula 1-8
100ml 플라스크에 3,4,5,6-tetrachlorophthalonitrile(5g), 2,4-di-t-butylphenol(3.9g), K2CO3(3.9g), N,N-디메틸포름아미드(N,N-dimethylformamide)(25ml)를 넣고 70℃로 가열하면서 교반한다. 반응 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축한 후에 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 진공 건조하여 4-(2,4-di-t-butyl-phenoxy)-3,5,6-trichloro-phthalonitrile를 얻는다.In a 100ml flask, 3,4,5,6-tetrachlorophthalonitrile (5g), 2,4-di-t-butylphenol (3.9g), K 2 CO 3 (3.9g), N,N-dimethylformamide (N,N Add -dimethylformamide) (25ml) and stir while heating to 70℃. After completion of the reaction, extraction was performed with ethyl acetate (EA). After extraction and concentration, it is purified by column chromatography. After purification, it is vacuum-dried to obtain 4-(2,4-di-t-butyl-phenoxy)-3,5,6-trichloro-phthalonitrile.
100mL 플라스크에 4-(2,4-di-t-butyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile(0.70g), phthalonitrile(0.34g) 1,8-Diazabicycloundec-7-ene(2.01g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.48g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-8로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(2,4-di-t-butyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile (0.70g), phthalonitrile (0.34g) ) Add 1,8-Diazabicycloundec-7-ene (2.01g) and 1-pentanol (15g), heat to 90℃ to dissolve the solid, add zinc acetate (0.48g), and stir while heating to 140℃. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. After purification, the obtained solid edichloromethane is appropriately added to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-8 below.
[화학식 1-8][Formula 1-8]
Maldi-tof MS : 1330.96 m/zMaldi-tof MS: 1330.96 m/z
합성예 9: 화학식 1-9로 표시되는 화합물의 합성Synthesis Example 9: Synthesis of a compound represented by Formula 1-9
100mL 플라스크에 4-(2,4-di-t-butyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile(2.80g), phthalonitrile(0.68g) 1,8-Diazabicycloundec-7-ene(4.01g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.97g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-9로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(2,4-di-t-butyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile (2.80g), phthalonitrile (0.68g) ) Add 1,8-Diazabicycloundec-7-ene (4.01g) and 1-pentanol (15g), heat to 90℃ to dissolve the solid, add zinc acetate (0.97g), and stir while heating to 140℃. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. After purification, the obtained solid edichloromethane is appropriately added to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-9 below.
[화학식 1-9][Formula 1-9]
Maldi-tof MS : 1161.09 m/zMaldi-tof MS: 1161.09 m/z
합성예 10: 화학식 1-10으로 표시되는 화합물의 합성Synthesis Example 10: Synthesis of a compound represented by Formula 1-10
100ml 플라스크에 3,4,5,6-tetrachlorophthalonitrile(5g), 2-tert-Butyl-4-methylphenol (3.09g), K2CO3 (3.9g), N,N-디메틸포름아미드(N,N-dimethylformamide)(25ml)를 넣고 70℃로 가열하면서 교반한다. 반응 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축한 후에 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 진공 건조하여 4-(2-tert-Butyl-4-methyl phenoxy)-3,5,6-trichloro-phthalonitrile를 얻는다.In a 100ml flask, 3,4,5,6-tetrachlorophthalonitrile (5g), 2-tert-Butyl-4-methylphenol (3.09g), K 2 CO 3 (3.9g), N,N-dimethylformamide (N,N Add -dimethylformamide) (25ml) and stir while heating to 70℃. After completion of the reaction, extraction was performed with ethyl acetate (EA). After extraction and concentration, it is purified by column chromatography. After purification, it is vacuum-dried to obtain 4-(2-tert-Butyl-4-methyl phenoxy)-3,5,6-trichloro-phthalonitrile.
100mL 플라스크에 4-(2-tert-Butyl-4-methylphenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile(0.68g), phthalonitrile(0.33g) 1,8-Diazabicycloundec-7-ene(1.9g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.47g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에 디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-10로 표시되는 화합물을 얻는다.4-(2-tert-Butyl-4-methylphenoxy)-3,5,6-trichloro-phthalonitrile (2 g), 3,4,5,6-tetrachlorophthalonitrile (0.68 g), phthalonitrile (0.33 g) 1 in a 100 mL flask ,8-Diazabicycloundec-7-ene (1.9g) and 1-pentanol (15g) are added and heated to 90°C to dissolve the solid, then zinc acetate (0.47g) is added and heated to 140°C while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. Dichloromethane is appropriately added to the solid obtained after purification to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-10 below.
[화학식 1-10][Formula 1-10]
Maldi-tof MS : 1246.80 m/zMaldi-tof MS: 1246.80 m/z
합성예 11: 화학식 1-11로 표시되는 화합물의 합성Synthesis Example 11: Synthesis of a compound represented by Formula 1-11
100mL 플라스크에 4-(2-tert-Butyl-4-methylphenoxy)-3,5,6-trichloro-phthalonitrile (2g), phthalonitrile(0.65g) 1,8-Diazabicycloundec-7-ene(1.9g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.47g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에 디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-11로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(2-tert-Butyl-4-methylphenoxy)-3,5,6-trichloro-phthalonitrile (2 g), phthalonitrile (0.65 g) 1,8-Diazabicycloundec-7-ene (1.9 g) and 1 -Pentanol (15g) is added and heated to 90℃ to dissolve the solid, then zinc acetate (0.47g) is added and heated to 140℃ while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. Dichloromethane is appropriately added to the solid obtained after purification to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-11 below.
[화학식 1-11][Formula 1-11]
Maldi-tof MS : 1109.03 m/zMaldi-tof MS: 1109.03 m/z
합성예 12: 화학식 1-12로 표시되는 화합물의 합성Synthesis Example 12: Synthesis of a compound represented by Formula 1-12
100ml 플라스크에 3,4,5,6-tetrachlorophthalonitrile(5g), 2,2-dimethyl-1-propanol(1.66g), Diazabicycloundec-7-ene (4.29g), N,N-디메틸포름아미드(N,N-dimethylformamide)(25ml)를 넣고 70℃로 가열하면서 교반한다. 반응 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축한 후에 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 진공 건조하여 4-(2,2-dimethyl-1-propoxy)-3,5,6-trichloro-phthalonitrile를 얻는다.In a 100ml flask, 3,4,5,6-tetrachlorophthalonitrile (5g), 2,2-dimethyl-1-propanol (1.66g), Diazabicycloundec-7-ene (4.29g), N,N-dimethylformamide (N, Add N-dimethylformamide) (25ml) and stir while heating to 70℃. After completion of the reaction, extraction was performed with ethyl acetate (EA). After extraction and concentration, it is purified by column chromatography. After purification, it is vacuum-dried to obtain 4-(2,2-dimethyl-1-propoxy)-3,5,6-trichloro-phthalonitrile.
100mL 플라스크에 4-(2,2-dimethyl-1-propoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile(0.84g), phthalonitrile(0.40g) 1,8-Diazabicycloundec-7-ene(2.40g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.58g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에 디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-12로 표시되는 화합물을 얻는다.4-(2,2-dimethyl-1-propoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile (0.84g), phthalonitrile (0.40g) 1 in a 100mL flask Add ,8-Diazabicycloundec-7-ene (2.40g) and 1-pentanol (15g) and heat to 90℃ to dissolve the solid, then add zinc acetate (0.58g) and heat to 140℃ while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. Dichloromethane is appropriately added to the solid obtained after purification to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-12 below.
[화학식 1-12][Formula 1-12]
Maldi-tof MS : 1094.60 m/zMaldi-tof MS: 1094.60 m/z
합성예 13: 화학식 1-13으로 표시되는 화합물의 합성Synthesis Example 13: Synthesis of a compound represented by Formula 1-13
100mL 플라스크에 4-(2,2-dimethyl-1-propoxy)-3,5,6-trichloro-phthalonitrile (1g), 3,4,5,6-tetrachlorophthalonitrile(1.67g), phthalonitrile(0.40g) 1,8-Diazabicycloundec-7-ene(2.40g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.58g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에 디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-13로 표시되는 화합물을 얻는다.4-(2,2-dimethyl-1-propoxy)-3,5,6-trichloro-phthalonitrile (1 g), 3,4,5,6-tetrachlorophthalonitrile (1.67 g), phthalonitrile (0.40 g) 1 in a 100 mL flask Add ,8-Diazabicycloundec-7-ene (2.40g) and 1-pentanol (15g) and heat to 90℃ to dissolve the solid, then add zinc acetate (0.58g) and heat to 140℃ while stirring. After completion of the reaction, the precipitation was confirmed with methanol, filtered, and dried under vacuum. The dried solid is purified by column chromatography. Dichloromethane is appropriately added to the solid obtained after purification to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-13 below.
[화학식 1-13][Formula 1-13]
Maldi-tof MS : 1042.91 m/zMaldi-tof MS: 1042.91 m/z
합성예 14: 화학식 1-14로 표시되는 화합물의 합성Synthesis Example 14: Synthesis of a compound represented by Formula 1-14
100mL 플라스크에 4-(2,2-dimethyl-1-propoxy)-3,5,6-trichloro-phthalonitrile (2g), phthalonitrile(0.81g) 1,8-Diazabicycloundec-7-ene(2.40g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.58g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에 디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-14로 표시되는 화합물을 얻는다.4-(2,2-dimethyl-1-propoxy)-3,5,6-trichloro-phthalonitrile (2 g), phthalonitrile (0.81 g) 1,8-Diazabicycloundec-7-ene (2.40 g) and 1 in a 100 mL flask -Pentanol (15g) is added and heated to 90℃ to dissolve the solid, then zinc acetate (0.58g) is added and heated to 140℃ while stirring. After completion of the reaction, the precipitation was confirmed with methanol, filtered, and dried under vacuum. The dried solid is purified by column chromatography. Dichloromethane is appropriately added to the solid obtained after purification to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-14 below.
[화학식 1-14][Formula 1-14]
Maldi-tof MS : 956.84 m/zMaldi-tof MS: 956.84 m/z
합성예 15: 화학식 1-15로 표시되는 화합물의 합성Synthesis Example 15: Synthesis of a compound represented by Formula 1-15
100ml 플라스크에 3,4,5,6-tetrachlorophthalonitrile(5g), 3-methyl-1-butanol(1.66g), Diazabicycloundec-7-ene (4.29g), N,N-디메틸포름아미드(N,N-dimethylformamide)(25ml)를 넣고 70℃로 가열하면서 교반한다. 반응 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축한 후에 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 진공 건조하여 4-(3-methyl-1-butoxy)-3,5,6-trichloro-phthalonitrile를 얻는다.In a 100ml flask, 3,4,5,6-tetrachlorophthalonitrile (5g), 3-methyl-1-butanol (1.66g), Diazabicycloundec-7-ene (4.29g), N,N-dimethylformamide (N,N- Add dimethylformamide) (25ml) and stir while heating to 70℃. After completion of the reaction, extraction was performed with ethyl acetate (EA). After extraction and concentration, it is purified by column chromatography. After purification, it is vacuum-dried to obtain 4-(3-methyl-1-butoxy)-3,5,6-trichloro-phthalonitrile.
100mL 플라스크에 4-(3-methyl-1-butoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile(0.84g), phthalonitrile(0.40g) 1,8-Diazabicycloundec-7-ene(2.40g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.58g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에 디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-15로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(3-methyl-1-butoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile (0.84g), phthalonitrile (0.40g) 1,8 -Diazabicycloundec-7-ene (2.40g) and 1-pentanol (15g) are added and heated to 90°C to dissolve the solid, then zinc acetate (0.58g) is added and heated to 140°C while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. Dichloromethane is appropriately added to the solid obtained after purification to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-15 below.
[화학식 1-15][Formula 1-15]
Maldi-tof MS : 1094.60 m/zMaldi-tof MS: 1094.60 m/z
합성예 16: 화학식 1-16으로 표시되는 화합물의 합성Synthesis Example 16: Synthesis of a compound represented by Formula 1-16
100mL 플라스크에 4-(3-methyl-1-butoxy)-3,5,6-trichloro-phthalonitrile (1g), 3,4,5,6-tetrachlorophthalonitrile(1.67g), phthalonitrile(0.40g) 1,8-Diazabicycloundec-7-ene(2.40g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.58g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에 디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-16로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(3-methyl-1-butoxy)-3,5,6-trichloro-phthalonitrile (1 g), 3,4,5,6-tetrachlorophthalonitrile (1.67 g), phthalonitrile (0.40 g) 1,8 -Diazabicycloundec-7-ene (2.40g) and 1-pentanol (15g) are added and heated to 90°C to dissolve the solid, then zinc acetate (0.58g) is added and heated to 140°C while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. Dichloromethane is appropriately added to the solid obtained after purification to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-16 below.
[화학식 1-16][Formula 1-16]
Maldi-tof MS : 1042.91 m/zMaldi-tof MS: 1042.91 m/z
합성예 17: 화학식 1-17로 표시되는 화합물의 합성Synthesis Example 17: Synthesis of a compound represented by Chemical Formula 1-17
100mL 플라스크에 4-(3-methyl-1-butoxy)-3,5,6-trichloro-phthalonitrile (2g), phthalonitrile(0.81g) 1,8-Diazabicycloundec-7-ene(2.40g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.58g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에 디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-17로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(3-methyl-1-butoxy)-3,5,6-trichloro-phthalonitrile (2 g), phthalonitrile (0.81 g) 1,8-Diazabicycloundec-7-ene (2.40 g) and 1-pentane Add alcohol (15g) and heat to 90℃ to dissolve the solid, then add zinc acetate (0.58g) and stir while heating to 140℃. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. Dichloromethane is appropriately added to the solid obtained after purification to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-17 below.
[화학식 1-17][Formula 1-17]
Maldi-tof MS : 956.84 m/zMaldi-tof MS: 956.84 m/z
합성예 18: 화학식 1-18로 표시되는 화합물의 합성Synthesis Example 18: Synthesis of a compound represented by Formula 1-18
100ml 플라스크에 3,4,5,6-tetrachlorophthalonitrile(5g), 2-methyl-1-propanol(1.39g), Diazabicycloundec-7-ene (4.29g), N,N-디메틸포름아미드(N,N-dimethylformamide)(25ml)를 넣고 70℃로 가열하면서 교반한다. 반응 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축한 후에 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 진공 건조하여 4-(3-methyl-1-butoxy)-3,5,6-trichloro-phthalonitrile를 얻는다.In a 100ml flask, 3,4,5,6-tetrachlorophthalonitrile (5g), 2-methyl-1-propanol (1.39g), Diazabicycloundec-7-ene (4.29g), N,N-dimethylformamide (N,N- Add dimethylformamide) (25ml) and stir while heating to 70℃. After completion of the reaction, extraction was performed with ethyl acetate (EA). After extraction and concentration, it is purified by column chromatography. After purification, it is vacuum-dried to obtain 4-(3-methyl-1-butoxy)-3,5,6-trichloro-phthalonitrile.
100mL 플라스크에 4-(2-methyl-1-propoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile(0.88g), phthalonitrile(0.42g) 1,8-Diazabicycloundec-7-ene(2.52g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.61g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에 디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-18로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(2-methyl-1-propoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile (0.88g), phthalonitrile (0.42g) 1,8 -Diazabicycloundec-7-ene (2.52g) and 1-pentanol (15g) are added and heated to 90°C to dissolve the solid, then zinc acetate (0.61g) is added and heated to 140°C while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. Dichloromethane is appropriately added to the solid obtained after purification to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-18 below.
[화학식 1-18][Formula 1-18]
Maldi-tof MS : 1066.55 m/zMaldi-tof MS: 1066.55 m/z
합성예 19: 화학식 1-19로 표시되는 화합물의 합성Synthesis Example 19: Synthesis of a compound represented by Formula 1-19
100mL 플라스크에 4-(2-methyl-1-propoxy)-3,5,6-trichloro-phthalonitrile (1g), 3,4,5,6-tetrachlorophthalonitrile(1.76g), phthalonitrile(0.42g) 1,8-Diazabicycloundec-7-ene(2.52g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.61g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에 디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-19로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(2-methyl-1-propoxy)-3,5,6-trichloro-phthalonitrile (1 g), 3,4,5,6-tetrachlorophthalonitrile (1.76 g), phthalonitrile (0.42 g) 1,8 -Diazabicycloundec-7-ene (2.52g) and 1-pentanol (15g) are added and heated to 90°C to dissolve the solid, then zinc acetate (0.61g) is added and heated to 140°C while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. Dichloromethane is appropriately added to the solid obtained after purification to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-19 below.
[화학식 1-19][Formula 1-19]
Maldi-tof MS : 1028.89 m/zMaldi-tof MS: 1028.89 m/z
합성예 20: 화학식 1-20으로 표시되는 화합물의 합성Synthesis Example 20: Synthesis of a compound represented by Formula 1-20
100mL 플라스크에 4-(2-methyl-1-propoxy)-3,5,6-trichloro-phthalonitrile (2g), phthalonitrile(0.85g) 1,8-Diazabicycloundec-7-ene(2.52g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.61g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에 디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-20로 표시되는 화합물을 얻는다.4-(2-methyl-1-propoxy)-3,5,6-trichloro-phthalonitrile (2 g), phthalonitrile (0.85 g) 1,8-Diazabicycloundec-7-ene (2.52 g) and 1-pentane in a 100 mL flask Add ol (15g) and heat to 90℃ to dissolve the solid, then add zinc acetate (0.61g) and stir while heating to 140℃. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. Dichloromethane is appropriately added to the solid obtained after purification to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by Formula 1-20 below.
[화학식 1-20][Formula 1-20]
Maldi-tof MS : 928.78 m/zMaldi-tof MS: 928.78 m/z
합성예 21: 화학식 1-21로 표시되는 화합물의 합성Synthesis Example 21: Synthesis of a compound represented by Chemical Formula 1-21
100mL 플라스크에 4-(2,4-di-t-butyl-phenoxy)-3,5,6-trichloro-phthalonitrile(2g), phthalonitrile(2.03g) 1,8-Diazabicycloundec-7-ene(4.01g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.97g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 1-21로 표시되는 화합물을 얻는다.4-(2,4-di-t-butyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2 g), phthalonitrile (2.03 g) 1,8-Diazabicycloundec-7-ene (4.01 g) in a 100 mL flask And 1-pentanol (15g) is added and heated to 90°C to dissolve the solid, then zinc acetate (0.97g) is added and heated to 140°C while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. After purification, the obtained solid edichloromethane is appropriately added to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by the following formula 1-21.
[화학식 1-21][Formula 1-21]
Maldi-tof MS : 885.56 m/zMaldi-tof MS: 885.56 m/z
비교 합성예 1: 화학식 C-1로 표시되는 화합물의 합성Comparative Synthesis Example 1: Synthesis of a compound represented by Chemical Formula C-1
100mL 플라스크에 4-(2-sec-Butyl-phenoxy)-3,5,6-trichloro-phthalonitrile(1g), 1,8-Diazabicycloundec-7-ene(0.30g), 1-펜탄올(7g), zinc acetate(0.12g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 농축하여 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 액체를 농축하여 고체를 얻는다. 상기 결정화된 고체를 진공건조하여, 하기 화학식 C-1로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(2-sec-Butyl-phenoxy)-3,5,6-trichloro-phthalonitrile (1 g), 1,8-Diazabicycloundec-7-ene (0.30 g), 1-pentanol (7 g), Add zinc acetate (0.12g) and stir while heating to 140℃. After completion of the reaction, the mixture was concentrated and purified by column chromatography. The liquid obtained after purification is concentrated to obtain a solid. The crystallized solid is vacuum-dried to obtain a compound represented by the following formula (C-1).
[화학식 C-1][Chemical Formula C-1]
Maldi-tof MS : 1584.04 m/zMaldi-tof MS: 1584.04 m/z
비교 합성예 2: 화학식 C-2로 표시되는 화합물의 합성Comparative Synthesis Example 2: Synthesis of a compound represented by Formula C-2
100ml 플라스크에 3,4,5,6-tetrachlorophthalonitrile(5g), 2,4-di-tert-butylphenol(2.75g), K2CO3(3.9g), N,N-디메틸포름아미드(N,N-dimethylformamide)(25ml)를 넣고 70℃로 가열하면서 교반한다. 반응 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축하면 고체를 얻을 수 있다. 이 때 얻어진 고체를 소량의 디클로로메탄에 녹인 후, 헥산으로 수회 씻어 주고, 여과 후 진공 건조하여 3,4,6-Trichloro-5-(2,4-dimethyl-phenoxy)-phthalonitrile를 얻는다.In a 100ml flask, 3,4,5,6-tetrachlorophthalonitrile (5g), 2,4-di-tert-butylphenol (2.75g), K 2 CO 3 (3.9g), N,N-dimethylformamide (N,N Add -dimethylformamide) (25ml) and stir while heating to 70℃. After completion of the reaction, extraction was performed with ethyl acetate (EA). A solid can be obtained by concentration after extraction. The obtained solid was dissolved in a small amount of dichloromethane, washed several times with hexane, filtered and dried in vacuo to obtain 3,4,6-Trichloro-5-(2,4-dimethyl-phenoxy)-phthalonitrile.
100mL 플라스크에 3,4,6-Trichloro-5-(2,4-di-tert-butyl-phenoxy)-phthalonitrile (1g), 1,8-Diazabicycloundec-7-ene(1.08g) 및 1-펜탄올(14g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.26g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 C-2로 표시되는 화합물을 얻는다.3,4,6-Trichloro-5-(2,4-di-tert-butyl-phenoxy)-phthalonitrile (1 g), 1,8-Diazabicycloundec-7-ene (1.08 g) and 1-pentanol in a 100 mL flask (14g) is added and heated to 90℃ to dissolve the solid, then zinc acetate (0.26g) is added and heated to 140℃ while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. After purification, the obtained solid edichloromethane is appropriately added to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by the following formula (C-2).
[화학식 C-2][Chemical Formula C-2]
Maldi-tof MS : 1808.47 m/zMaldi-tof MS: 1808.47 m/z
비교 합성예 3: 화학식 C-3으로 표시되는 화합물의 합성Comparative Synthesis Example 3: Synthesis of a compound represented by Chemical Formula C-3
100ml 플라스크에 3,4,5,6-tetrachlorophthalonitrile(5g), 2,4-dimethoxyphenol(3.47g), K2CO3(3.9g), N,N-디메틸포름아미드(N,N-dimethylformamide)(25ml)를 넣고 70℃로 가열하면서 교반한다. 반응 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축하면 고체를 얻을 수 있다. 이 때 얻어진 고체를 소량의 디클로로메탄에 녹인 후, 헥산으로 수회 씻어 주고, 여과 후 진공 건조하여 3,4,6-Trichloro-5-(2,4-dimethoxy-phenoxy)-phthalonitrile를 얻는다.In a 100ml flask, 3,4,5,6-tetrachlorophthalonitrile (5g), 2,4-dimethoxyphenol (3.47g), K 2 CO 3 (3.9g), N,N-dimethylformamide (N,N-dimethylformamide) ( 25ml) was added and stirred while heating to 70°C. After completion of the reaction, extraction was performed with ethyl acetate (EA). A solid can be obtained by concentration after extraction. The obtained solid was dissolved in a small amount of dichloromethane, washed several times with hexane, filtered and dried under vacuum to obtain 3,4,6-Trichloro-5-(2,4-dimethoxy-phenoxy)-phthalonitrile.
100mL 플라스크에 3,4,6-Trichloro-5-(2,4-dimethoxy-phenoxy)-phthalonitrile (2g), 1,8-Diazabicycloundec-7-ene(0.99g) 및 1-펜탄올(14g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.24g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 C-3로 표시되는 화합물을 얻는다.In a 100 mL flask, add 3,4,6-Trichloro-5-(2,4-dimethoxy-phenoxy)-phthalonitrile (2 g), 1,8-Diazabicycloundec-7-ene (0.99 g) and 1-pentanol (14 g). The mixture is heated to 90℃ to dissolve the solid, and then zinc acetate (0.24g) is added and heated to 140℃ while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. After purification, the obtained solid edichloromethane is appropriately added to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by the following formula (C-3).
[화학식 C-3][Chemical Formula C-3]
Maldi-tof MS : 1591.80 m/zMaldi-tof MS: 1591.80 m/z
비교 합성예 4: 화학식 C-4로 표시되는 화합물의 합성Comparative Synthesis Example 4: Synthesis of a compound represented by Chemical Formula C-4
100mL 플라스크에 합성예 1-2의 4-(2,4-dimethoxy-phenoxy)-3,5,6-trichloro-phthalonitrile (0.7g), 3,4,5,6-Tetrachlorophthalonitrile (1.45g), 1,8-Diazabicycloundec-7-ene(1.38g) 및 1-펜탄올(14g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.33g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 C-4로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(2,4-dimethoxy-phenoxy)-3,5,6-trichloro-phthalonitrile (0.7g), 3,4,5,6-Tetrachlorophthalonitrile (1.45g), 1 of Synthesis Example 1-2 ,8-Diazabicycloundec-7-ene (1.38g) and 1-pentanol (14g) were added and heated to 90°C to dissolve the solid, then zinc acetate (0.33g) was added and heated to 140°C while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. After purification, the obtained solid edichloromethane is appropriately added to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by the following formula (C-4).
[화학식 C-4][Chemical Formula C-4]
Maldi-tof MS : 1237.54 m/zMaldi-tof MS: 1237.54 m/z
비교 합성예 5: 화학식 C-5로 표시되는 화합물의 합성Comparative Synthesis Example 5: Synthesis of a compound represented by Chemical Formula C-5
100mL 플라스크에 4-(2-tert-Butyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile(0.70g), 4,5-dichlorophthalonitrile(0.52g) 1,8-Diazabicycloundec-7-ene(2.01g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.48g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 C-5로 표시되는 화합물을 얻는다.In a 100 mL flask, 4-(2-tert-Butyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile (0.70g), 4,5-dichlorophthalonitrile (0.52g) ) Add 1,8-Diazabicycloundec-7-ene (2.01g) and 1-pentanol (15g), heat to 90℃ to dissolve the solid, add zinc acetate (0.48g), and stir while heating to 140℃. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. After purification, the obtained solid edichloromethane is appropriately added to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by the following formula (C-5).
[화학식 C-5][Chemical Formula C-5]
Maldi-tof MS : 1287.63 m/zMaldi-tof MS: 1287.63 m/z
비교 합성예 6: 화학식 C-6으로 표시되는 화합물의 합성Comparative Synthesis Example 6: Synthesis of a compound represented by Chemical Formula C-6
100mL 플라스크에 4-(2-tert-Butyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2g), 3,4,5,6-tetrachlorophthalonitrile(0.70g), 4-dichlorophthalonitrile(0.43g) 1,8-Diazabicycloundec-7-ene(2.01g) 및 1-펜탄올(15g)을 넣고 90℃로 가열하여 고체가 녹은 후 zinc acetate(0.48g)를 넣고 140℃로 가열하면서 교반한다. 반응 종료 후 메탄올로 침전을 확인하고, 여과 후 진공 건조한다. 건조된 고체를 컬럼 크로마토그래피(column chromatography)로 정제한다. 정제 후 얻어진 고체에디클로로메탄을 적당히 넣어 고체를 녹인 후, 메탄올을 첨가하여 결정화한다. 상기 결정화된 고체를 여과하고 진공건조하여 하기 화학식 C-6로 표시되는 화합물을 얻는다.4-(2-tert-Butyl-phenoxy)-3,5,6-trichloro-phthalonitrile (2 g), 3,4,5,6-tetrachlorophthalonitrile (0.70 g), 4-dichlorophthalonitrile (0.43 g) 1 in a 100 mL flask ,8-Diazabicycloundec-7-ene (2.01g) and 1-pentanol (15g) are added and heated to 90°C to dissolve the solid, then zinc acetate (0.48g) is added and heated to 140°C while stirring. After completion of the reaction, the precipitation was confirmed with methanol, followed by filtration and vacuum drying. The dried solid is purified by column chromatography. After purification, the obtained solid edichloromethane is appropriately added to dissolve the solid, and then methanol is added to crystallize. The crystallized solid is filtered and dried in vacuo to obtain a compound represented by the following formula (C-6).
[화학식 C-6][Chemical Formula C-6]
Maldi-tof MS : 1253.19 m/zMaldi-tof MS: 1253.19 m/z
평가 1: 최대흡수파장에 대한 반치폭의 최단파장 측정Evaluation 1: Measurement of the shortest wavelength at half width for the maximum absorption wavelength
상기 합성예 1 내지 합성예 21 및 비교 합성예 1 내지 비교 합성예 6에 따른 화합물을, 희석 용제(PGMEA)를 이용하여 0.005wt%의 농도로 제조하여, 상기 합성예 1 내지 합성예 20 및 비교 합성예 1 내지 비교 합성예 6에 따른 프탈로시아닌계 화합물 각각에 대한 흡수스펙트럼을 얻었으며, 그 결과를 하기 표 1에 타나었다.(UV-1800, SHIMADZU)Compounds according to Synthesis Examples 1 to 21 and Comparative Synthesis Examples 1 to 6 were prepared at a concentration of 0.005 wt% using a diluting solvent (PGMEA), and compared with Synthesis Examples 1 to 20 The absorption spectrum for each of the phthalocyanine-based compounds according to Synthesis Examples 1 to 6 was obtained, and the results are shown in Table 1 below. (UV-1800, SHIMADZU)
평가 2: 용해도 측정Evaluation 2: solubility measurement
상기 합성예 1 내지 합성예 21 및 비교 합성예 1 내지 비교 합성예 6에 따른 화합물 0.5 g에, 희석 용제(PGMEA)를 각각 첨가하고, 해당 용액을 믹스 로터(iuchi 주식회사, MIXROTAR VMR-5)로 25℃rpm로 1시간 동안 교반한 후, 각각의 화합물의 용해도 확인 결과를 하기 표 2에 나타내었다.To 0.5 g of the compounds according to Synthesis Examples 1 to 21 and Comparative Synthesis Examples 1 to 6, a diluting solvent (PGMEA) was added, respectively, and the solution was mixed with a rotor (MIXROTAR VMR-5) After stirring at 25° C. rpm for 1 hour, the results of confirming the solubility of each compound are shown in Table 2 below.
용해도 평가 기준Solubility evaluation criteria
희석용제 총량에 대해 화합물(용질)이 10 중량% 이상 용해: ○Compound (solvent) is dissolved in 10% by weight or more based on the total amount of the diluted solvent: ○
희석용제 총량에 대해 화합물(용질)이 10 중량% 미만 용해: XDissolution of less than 10% by weight of compound (solute) based on the total amount of diluent: X
상기 표 2로부터, 일 구현예에 따른 화합물인 합성예 1 내지 합성예 20의 화합물은 합성예 21 및 비교 합성예 1 내지 비교 합성예 6의 화합물보다 유기용매에 대한 용해도가 우수하여, 감광성 수지 조성물 등에 사용 시 우수한 색특성을 나타낼 수 있음을 확인할 수 있다.From Table 2, the compounds of Synthesis Examples 1 to 20, which are compounds according to an embodiment, have better solubility in an organic solvent than the compounds of Synthesis Example 21 and Comparative Synthesis Examples 1 to 6, and the photosensitive resin composition It can be seen that it can exhibit excellent color characteristics when used on the back.
(감광성 수지 조성물의 합성)(Synthesis of photosensitive resin composition)
실시예 1Example 1
하기 언급된 구성성분들을 하기 표 3 내지 표 5에 나타낸 조성으로 혼합하여 실시예 1 내지 실시예 21 및 비교예 1 내지 비교예 6에 따른 감광성 수지 조성물을 제조하였다.The components mentioned below were mixed in the composition shown in Tables 3 to 5 below to prepare a photosensitive resin composition according to Examples 1 to 21 and Comparative Examples 1 to 6.
구체적으로, 용매에 광중합 개시제를 녹인 후 2 시간 동안 상온에서 교반한 다음, 여기에 바인더 수지 및 광중합성 단량체를 첨가하여 2시간 동안 상온에서 교반하였다. 이어서, 얻어진 상기 반응물에 착색제로서 상기 합성예에서 제조된 화합물(염료) 및 안료(안료분산액 형태)를 넣고 1시간 동안 상온에서 교반하였다. 이어 산화방지제 및 레벨링제를 넣고, 상기 생성물을 3회 여과하여 불순물을 제거함으로써, 감광성 수지 조성물을 제조하였다.Specifically, after dissolving a photopolymerization initiator in a solvent, the mixture was stirred at room temperature for 2 hours, and then a binder resin and a photopolymerizable monomer were added thereto, followed by stirring at room temperature for 2 hours. Subsequently, the compound (dye) and pigment (pigment dispersion type) prepared in Synthesis Example were added as a colorant to the obtained reactant and stirred at room temperature for 1 hour. Then, an antioxidant and a leveling agent were added, and the product was filtered three times to remove impurities, thereby preparing a photosensitive resin composition.
(DAICEL, 에폭시계)EHPE-3150
(DAICEL, epoxy system)
(미원, 아크릴계)NPR-5216
(Miwon, acrylic)
(QPPC)GM66G0P
(QPPC)
(미원)Miramer 2200
(Miwon)
(삼양사)SPI-03
(Samyang Corporation)
(BASF)IRG369
(BASF)
(ADEKA)AO-80
(ADEKA)
(DAICEL, 에폭시계)EHPE-3150
(DAICEL, epoxy system)
(미원, 아크릴계)NPR-5216
(Miwon, acrylic)
(QPPC)GM66G0P
(QPPC)
(미원)Miramer 2200
(Miwon)
(삼양사)SPI-03
(Samyang Corporation)
(BASF)IRG369
(BASF)
(ADEKA)AO-80
(ADEKA)
(DAICEL, 에폭시계)EHPE-3150
(DAICEL, epoxy system)
(미원, 아크릴계)NPR-5216
(Miwon, acrylic)
(QPPC)GM66G0P
(QPPC)
(미원)Miramer 2200
(Miwon)
(삼양사)SPI-03
(Samyang Corporation)
(BASF)IRG369
(BASF)
(ADEKA)AO-80
(ADEKA)
평가 3: 색좌표, 휘도, 내화학성, 현상성 및 표면 주름Evaluation 3: color coordinate, luminance, chemical resistance, developability and surface wrinkle
탈지 세척한 두께 1 mm의 유리 기판 상에 1 ㎛ 내지 3 ㎛의 두께로 상기 실시예 1 내지 실시예 21 및 비교예 1 내지 비교예 6에서 제조한 감광성 수지 조성물을 도포하고, 90℃의 핫 플레이트 상에서 2분 동안 건조시켜 도막을 수득하였다. 계속해서 도막에 365nm의 주파장을 가진 고압수은램프를 사용하여 노광하였다. 이 후, 230℃의 열풍순환식 건조로 안에서 20분 동안 건조시켜 샘플을 수득하였다. 화소층은 분광광도계(MCPD3000, Otsuka electronic社)를 이용하여 C 광원 기준 색순도를 평가하였고, CIE 색좌표 기준으로 휘도(Y)를 계산하여, 하기 표 6에 기재하였다.The photosensitive resin composition prepared in Examples 1 to 21 and Comparative Examples 1 to 6 was applied to a thickness of 1 µm to 3 µm on a degreasing and washed glass substrate, and a hot plate at 90°C It was dried on the bed for 2 minutes to obtain a coating film. Subsequently, the coating film was exposed using a high-pressure mercury lamp having a dominant wavelength of 365 nm. Thereafter, a sample was obtained by drying for 20 minutes in a hot air circulation drying furnace at 230°C. The pixel layer was evaluated for color purity based on the C light source using a spectrophotometer (MCPD3000, Otsuka electronic), and the luminance (Y) was calculated based on the CIE color coordinates, and is shown in Table 6 below.
또한, 상기 노광 및 건조시켜 수득된 샘플(포토레지스트막)의 초기 두께를 측정한 후, NMP 용매에 25℃, 10분 간 정치시킨 후, 초순수로 30초간 세정한 다음 압축공기로 불어 건조하였다. 이후 상기 분광광도계를 이용하여 del(E*)값을 측정하여 내화학성을 확인하였고, 그 결과를 하기 표 6에 나타내었다.In addition, after measuring the initial thickness of the sample (photoresist film) obtained by exposure and drying, it was allowed to stand in NMP solvent at 25° C. for 10 minutes, washed with ultrapure water for 30 seconds, and then blow dried with compressed air. Thereafter, the del(E*) value was measured using the spectrophotometer to confirm chemical resistance, and the results are shown in Table 6 below.
상기 코팅 및 노광 과정을 거쳐 현상기(SVS社, KOH 희석액)를 이용하여 현상성을 확인하였고, 그 결과를 하기 표 6에 나타내었다.Through the coating and exposure process, developability was confirmed using a developer (SVS company, KOH diluent), and the results are shown in Table 6 below.
상기 현상한 기판을 230℃의 열풍순환식 건조로 안에서 20분 동안 건조시켜 샘플을 수득하여 주사전자현미경으로 표면 주름을 확인하였고, 그 결과를 하기 표 6에 나타내었다. The developed substrate was dried in a hot air circulation drying furnace at 230° C. for 20 minutes to obtain a sample, and surface wrinkles were confirmed with a scanning electron microscope, and the results are shown in Table 6 below.
내화학성 평가 기준Criteria for evaluation of chemical resistance
del(E*)가 3 미만: ○del(E*) is less than 3: ○
del(E*)가 3 이상: Xdel(E*) is 3 or greater: X
현상성 평가 기준Developability evaluation criteria
BP가 60초 미만: ○BP less than 60 seconds: ○
BP가 60초 이상: XBP over 60 seconds: X
표면 주름 평가 기준Surface wrinkle evaluation criteria
주사전자현미경으로 관찰 시 패턴 표면에서 주름이 관찰되지 않음: ○No wrinkles observed on the pattern surface when observed with a scanning electron microscope: ○
주사전자현미경으로 관찰 시 패턴 표면에서 주름이 관찰됨: XWhen observed with a scanning electron microscope, wrinkles were observed on the pattern surface: X
상기 표 6으로부터, 일 구현예에 따른 화합물을 염료로 포함하는 실시예 1 내지 실시예 20의 감광성 수지 조성물이 상기 화합물을 포함하지 않은 비교예 1 내지 비교예 6의 감광성 수지 조성물과 비교하여, 고색 재현이 가능함과 동시에 휘도 및 내화학성도 우수하여, 이미지 센서 등에 용이하게 적용되어 색특성이 우수한 고선명 디스플레이 장치의 제조가 가능함을 확인할 수 있다. 실시예 21의 감광성 수지 조성물은 고색 구현은 가능하나, 휘도, 내화학성, 현상성, 표면주름 특성 등이 실시예 1 내지 실시예 20의 감광성 수지 조성물보다 크게 저하됨도 확인할 수 있다.From Table 6, the photosensitive resin compositions of Examples 1 to 20 including the compound according to an embodiment as a dye were compared with the photosensitive resin compositions of Comparative Examples 1 to 6 not including the compound, and high color It can be seen that the reproducibility is possible and at the same time excellent in luminance and chemical resistance, it is easily applied to an image sensor, etc., so that it is possible to manufacture a high-definition display device having excellent color characteristics. The photosensitive resin composition of Example 21 is capable of implementing a high color, but it can also be seen that brightness, chemical resistance, developability, and surface wrinkle characteristics are significantly lower than those of Examples 1 to 20.
이상 본 발명의 바람직한 실시예에 대하여 설명하였지만, 본 발명은 이에 한정되는 것이 아니고, 특허청구범위와 발명의 상세한 설명 및 첨부한 도면의 범위 안에서 여러 가지로 변형하여 실시하는 것이 가능하고, 이 또한 본 발명의 범위에 속하는 것은 당연하다.Although the preferred embodiments of the present invention have been described above, the present invention is not limited thereto, and it is possible to implement various modifications within the scope of the claims, the detailed description of the invention, and the accompanying drawings. It is natural to fall within the scope of the invention.
Claims (19)
Phthalocyanine-based compounds in which the shortest wavelength of the half width for the maximum absorption wavelength is located within the range of 600nm to 620nm.
상기 프탈로시아닌계 화합물은 하기 화학식 1로 표시되는 화합물:
[화학식 1]
상기 화학식 1에서,
R1 내지 R4는 각각 독립적으로 수소 원자이고,
R5 내지 R8은 각각 독립적으로 수소 원자 또는 할로겐 원자이고,
R9 내지 R16은 각각 독립적으로 할로겐 원자 또는 하기 화학식 2로 표시되고,
[화학식 2]
상기 화학식 2에서,
R17은 치환 또는 비치환된 C1 내지 C20 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다.
The method of claim 1,
The phthalocyanine-based compound is a compound represented by the following formula (1):
[Formula 1]
In Formula 1,
R 1 to R 4 are each independently a hydrogen atom,
R 5 to R 8 are each independently a hydrogen atom or a halogen atom,
R 9 to R 16 are each independently represented by a halogen atom or the following formula (2),
[Formula 2]
In Chemical Formula 2,
R 17 is a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group.
상기 화학식 2는 하기 화학식 2-1 내지 화학식 2-4 중 어느 하나로 표시되는 화합물:
[화학식 2-1]
[화학식 2-2]
[화학식 2-3]
[화학식 2-4]
상기 화학식 2-1 내지 화학식 2-4에서,
R18 및 R19는 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기이고,
R20 내지 R22는 각각 독립적으로 수소 원자 또는 치환 또는 비치환된 C1 내지 C20 알킬기이고,
L1은 치환 또는 비치환된 C1 내지 C20 알킬렌기이다.
The method of claim 2,
Formula 2 is a compound represented by any one of the following Formulas 2-1 to 2-4:
[Formula 2-1]
[Formula 2-2]
[Formula 2-3]
[Formula 2-4]
In Formula 2-1 to Formula 2-4,
R 18 and R 19 are each independently a substituted or unsubstituted C1 to C20 alkyl group,
R 20 to R 22 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group,
L 1 is a substituted or unsubstituted C1 to C20 alkylene group.
상기 R9 내지 R16 중 어느 하나는 상기 화학식 2로 표시되는 화합물.
The method of claim 1,
Any one of R 9 to R 16 is a compound represented by Formula 2.
상기 'R9 내지 R12 중 어느 하나' 또는 상기 'R13 내지 R16 중 어느 하나'는 상기 화학식 2로 표시되는 화합물.
The method of claim 4,
The'any one of R 9 to R 12 ' or the'any one of R 13 to R 16 ' is a compound represented by Formula 2.
상기 'R10, R11, R14 및 R15 중 어느 하나'는 상기 화학식 2로 표시되는 화합물.
The method of claim 5,
The'R 10 , R 11 , any one of R 14 and R 15'is a compound represented by Formula 2.
상기 'R9 내지 R16 중 어느 둘'은 상기 화학식 2로 표시되는 화합물.
The method of claim 1,
The'any two of R 9 to R 16 ' is a compound represented by the formula (2).
상기 'R9 내지 R12 중 어느 하나' 및 상기 'R13 내지 R16 중 어느 하나'는 상기 화학식 2로 표시되는 화합물.
The method of claim 7,
The'any one of R 9 to R 12 ' and the'any one of R 13 to R 16 ' is a compound represented by Formula 2 above.
상기 'R10 및 R11 중 어느 하나' 및 상기 'R14 및 R15 중 어느 하나'는 상기 화학식 2로 표시되는 화합물.
The method of claim 8,
The'any one of R 10 and R 11 ' and the'any one of R 14 and R 15 ' is a compound represented by Formula 2 above.
상기 화학식 1로 표시되는 화합물은 하기 화학식 1-1 내지 화학식 1-20 중 어느 하나로 표시되는 화합물.
[화학식 1-1]
[화학식 1-2]
[화학식 1-3]
[화학식 1-4]
[화학식 1-5]
[화학식 1-6]
[화학식 1-7]
[화학식 1-8]
[화학식 1-9]
[화학식 1-10]
[화학식 1-11]
[화학식 1-12]
[화학식 1-13]
[화학식 1-14]
[화학식 1-15]
[화학식 1-16]
[화학식 1-17]
[화학식 1-18]
[화학식 1-19]
[화학식 1-20]
The method of claim 1,
The compound represented by Formula 1 is a compound represented by any one of the following Formulas 1-1 to 1-20.
[Formula 1-1]
[Formula 1-2]
[Formula 1-3]
[Formula 1-4]
[Formula 1-5]
[Formula 1-6]
[Formula 1-7]
[Formula 1-8]
[Formula 1-9]
[Formula 1-10]
[Formula 1-11]
[Formula 1-12]
[Formula 1-13]
[Formula 1-14]
[Formula 1-15]
[Formula 1-16]
[Formula 1-17]
[Formula 1-18]
[Formula 1-19]
[Formula 1-20]
상기 화합물은 녹색 염료인 화합물.
The method of claim 1,
The compound is a green dye.
A photosensitive resin composition containing the compound of any one of Claims 1-11.
상기 화합물은 상기 감광성 수지 조성물 총량에 대해 1 중량% 내지 40 중량%로 포함되는 감광성 수지 조성물.
The method of claim 12,
The compound is a photosensitive resin composition contained in an amount of 1% to 40% by weight based on the total amount of the photosensitive resin composition.
상기 감광성 수지 조성물은 바인더 수지, 광중합성 화합물, 광중합 개시제 및 용매를 더 포함하는 감광성 수지 조성물.
The method of claim 12,
The photosensitive resin composition further comprises a binder resin, a photopolymerizable compound, a photoinitiator, and a solvent.
상기 감광성 수지 조성물은 안료를 더 포함하는 감광성 수지 조성물.
The method of claim 14,
The photosensitive resin composition is a photosensitive resin composition further comprising a pigment.
상기 감광성 수지 조성물은 하기 화학식 3으로 표시되는 화합물을 더 포함하는 감광성 수지 조성물:
[화학식 3]
상기 화학식 3에서,
R23 및 R24는 각각 독립적으로 히드록시기 또는 치환 또는 비치환된 C1 내지 C20 알킬기이고,
n1 및 n2는 각각 독립적으로 0 내지 5의 정수이되, 3 ≤ n1+n2 ≤ 5 이다.
The method of claim 14,
The photosensitive resin composition further comprises a compound represented by the following formula (3):
[Formula 3]
In Chemical Formula 3,
R 23 and R 24 are each independently a hydroxy group or a substituted or unsubstituted C1 to C20 alkyl group,
n1 and n2 are each independently an integer of 0 to 5, but 3≦n1+n2≦5.
A photosensitive resin film manufactured using the photosensitive resin composition of claim 12.
A color filter comprising the photosensitive resin film of claim 17.
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TW109137400A TWI809326B (en) | 2019-10-29 | 2020-10-28 | Phthalocyanine-based compound, photosensitive resin composition, photosensitive resin layer, color filter and display device |
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