KR20190135553A - Mobile apparatus, power transmission apparatus, exposure apparatus, and device manufacturing method - Google Patents

Mobile apparatus, power transmission apparatus, exposure apparatus, and device manufacturing method Download PDF

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Publication number
KR20190135553A
KR20190135553A KR1020197035191A KR20197035191A KR20190135553A KR 20190135553 A KR20190135553 A KR 20190135553A KR 1020197035191 A KR1020197035191 A KR 1020197035191A KR 20197035191 A KR20197035191 A KR 20197035191A KR 20190135553 A KR20190135553 A KR 20190135553A
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KR
South Korea
Prior art keywords
stage
mask
apparatus
axis direction
side
Prior art date
Application number
KR1020197035191A
Other languages
Korean (ko)
Inventor
야스오 아오키
Original Assignee
가부시키가이샤 니콘
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Priority to JPJP-P-2009-118203 priority Critical
Priority to JPJP-P-2009-118199 priority
Priority to JP2009118197 priority
Priority to JPJP-P-2009-118197 priority
Priority to JP2009118202 priority
Priority to JP2009118203 priority
Priority to JP2009118199 priority
Priority to JPJP-P-2009-118202 priority
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Priority to PCT/JP2010/003284 priority patent/WO2010131485A1/en
Publication of KR20190135553A publication Critical patent/KR20190135553A/en

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    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274Photolithographic processes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/062Easels, stands or shelves, e.g. castor-shelves, supporting means on vehicles
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/707Chucks, e.g. chucking or un-chucking operations
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • G03F7/70725Stages control
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70758Drive means, e.g. actuator, motor
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682Mask-wafer alignment

Abstract

On each of the + Y side and the -Y side of the main stage 40 holding the mask M, the substages 50, 70 which are movable in a long stroke in the X-axis direction as the scanning direction are arranged. The main stage 40 using a voice coil motor comprising a Y mover 44 including a magnet unit formed in the main stage 40 and a Y stator 88 including a coil unit formed in the sub-stage 50. ) Is finely driven in the Y-axis direction, which is the cross scan direction, with respect to the sub-stages 50, 70. On the other hand, the main stage 40 is connected to each of the sub-stages 50 and 70 in a contact (or non-contact) state by using the locking devices 100a to 100d. The main stage 40 is moved in the X axis direction only by driving the sub stages 50 and 70.

Description

Mobile device, force transmission device, and exposure device, and device manufacturing method {MOBILE APPARATUS, POWER TRANSMISSION APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD}

BACKGROUND OF THE INVENTION Field of the Invention The present invention relates to a mobile device, a force transmission device, an exposure device, and a device manufacturing method. The pressure transmission apparatus used for a pressure transmission, the exposure apparatus provided with the said moving body, and the device manufacturing method using the exposure apparatus.

Conventionally, in the lithography process of manufacturing electronic devices (micro devices), such as a liquid crystal display element, a semiconductor element (integrated circuit, etc.), a mask or a reticle (henceforth a "mask"), and an object, such as a glass plate or a wafer, Scanning projection exposure of a step-and-scan method in which a pattern formed on a mask is transferred onto a substrate through a projection optical system while synchronously moving (hereinafter, collectively referred to as "substrate") along a predetermined scanning direction (scan direction). Devices (so-called scanning steppers (also called scanners)) and the like are used.

It is known that this type of scanning exposure apparatus includes a mask stage apparatus that holds a mask and moves in the scanning direction (scan direction), and a substrate stage apparatus that holds a substrate and moves in the scanning direction (for example, See Patent Document 1). The mask stage apparatus which the scanning type exposure apparatus of this patent document 1 has is equipped with the linear motor containing the stator extended in a scanning direction, and the mover fixed to the mask stage, and drives a mask stage by a long stroke in a scanning direction. do. At this time, for example, in order to follow the substrate stage, the mask stage is minutely driven in the direction orthogonal to the scanning direction (cross scan direction) in the horizontal plane in accordance with the scanning direction.

However, in the mask stage apparatus described in Patent Document 1, when the mask stage is driven in the cross scan direction, the relative positions of the stator and the mover in the cross scan direction of the linear motor for driving the mask stage in the scan direction are changed, and the scan is performed. There exists a possibility that the driving force to a direction may fall. For this reason, it was necessary to take measures such as increasing the stator of the linear motor. Moreover, in the mask stage apparatus of the said patent document 1, the movement amount of a mask stage to the cross scan direction is limited to a minute amount. For this reason, the mask stage apparatus which can drive a mask stage in a cross scan direction by larger stroke was desired.

Moreover, in the mask stage apparatus described in the said patent document 1, the structure which floats and supports the mask stage on the predetermined guide member was employ | adopted in order to prevent the vibration (disturbance) transmission from the exterior. In addition, the stator and the mover of the linear motor described above are in a non-contact state. For this reason, in the conventional mask stage apparatus, there is no guide for guiding the mask stage in the moving plane, and for example, it is difficult to guide the mask stage to a desired position at the start of the apparatus of the exposure apparatus. For example, when the power supply to the stator of the linear motor is stopped urgently, for example, the mask stage cannot suddenly stop due to its inertia, and thus the probability of continuously moving on the guide member is high.

Moreover, in the exposure apparatus of the said patent document 1, the mask stage apparatus or the board | substrate stage apparatus is connected with the cable for supplying various electric powers, for example, electric power etc. from the exterior. For this reason, when a mask stage apparatus or a board | substrate stage apparatus moves, there exists a possibility that dust generate | occur | produces or a vibration may generate | occur | produce by sliding of a cable and the support member for supporting the cable horizontally.

Japanese Unexamined Patent Publication No. 2004-14915

According to a first aspect of the present invention, there is provided a mobile device comprising: a first movable member movable along a two-dimensional plane including a first axis and a second axis orthogonal to each other; A second movable body disposed on one side of the first movable body in a direction parallel to the first axis, and movable in a predetermined stroke at least in a direction parallel to the second axis; A third movable body disposed on the other side of the first movable body with respect to the direction parallel to the first axis, and movable in a predetermined stroke at least in a direction parallel to the second axis; A first drive system for driving the second and third movable bodies together in a direction parallel to the second axis; Provided is a first movable body apparatus comprising a first state capable of driving the first to third movable bodies integrally, and a state setting device for switching and setting the second state in which the first to third movable bodies cannot be driven integrally. do.

According to this, when the 1st state is set by the state setting apparatus, when a 2nd and 3rd moving body are driven together by a 1st drive system in the direction parallel to a 2nd axis, a 1st moving body will be made to a 2nd and a 2nd moving object. It moves integrally with the 3rd moving body in the direction parallel to a 2nd axis. That is, the first to third moving bodies move together in a direction parallel to the second axis. Therefore, the first to third moving bodies can be driven in a direction parallel to the second axis by using the first drive system.

According to a second aspect of the present invention, there is provided a mobile device, comprising: a first movable member movable along a two-dimensional plane including first and second axes perpendicular to each other; A second movable body disposed on one side of the first movable body in a direction parallel to the first axis, and movable in a predetermined stroke at least in a direction parallel to the second axis; A third movable body disposed on the other side of the first movable body with respect to the direction parallel to the first axis, and movable in a predetermined stroke at least in a direction parallel to the second axis; A first drive system for driving the second and third movable bodies together in a direction parallel to the second axis; A connecting device for connecting the first moving body to each of the second and third moving bodies in a non-contact state; A first position for limiting a relative movable range of the first movable body and the second and third movable bodies to a predetermined range, and a relative movement exceeding the predetermined range of the first movable body and the second and third movable bodies A second movable body apparatus is provided that includes a limiting device having a movable member that is movable between the allowable second positions.

According to this, when the second and third moving bodies are driven together by the first drive system in a direction parallel to the second axis, the first moving body connected by the connecting device is integrally connected with the second and third moving bodies. Move in a direction parallel to. Here, when the movable member of the limiting device is located at the first position, the relative movable range of the first movable body and the second and third movable bodies is limited to a predetermined range, so that even if the first drive system becomes uncontrollable, The first movable body is prevented from being separated from the second and third movable bodies beyond its relative movable range. On the other hand, when the movable member of the limiting device is located at the second position, the first moving body and the second and third moving bodies can be separated.

According to a third aspect of the present invention, there is provided an exposure apparatus that transfers a pattern onto an object by exposing an object with an energy beam through a pattern, wherein the pattern holder having the pattern and one of the object are the first movable body. Any of the first and second mobile device of the present invention held in the apparatus; A first exposure apparatus is provided having a holding device for holding the pattern holder and the other of the object.

According to the fourth aspect of the present invention, an exposure apparatus which transfers the pattern to the object by exposing an object with an energy beam through a pattern, wherein the pattern holder having the pattern and one of the objects are held to each other. A main stage movable along a two-dimensional plane including an orthogonal first axis and a second axis; A pair of sub-stages disposed on one side and the other side of the main stage with respect to a direction parallel to the first axis, and movable at a predetermined stroke in at least a direction parallel to the second axis; A first drive system for driving the pair of sub-stages in a direction parallel to the second axis; A state setting device configured to switch between a first state capable of integrally driving the main stage and the pair of substages, and a second state in which the main stage and the pair of substages are integrally incapable of driving; A second exposure apparatus is provided having a holding device for holding the pattern holder and the other of the object.

According to this, when the first state is set by the state setting device, when the pair of sub-stages are driven together by the first drive system in the direction parallel to the second axis, the main stage is connected to the pair of sub-stages. Integrally move in a direction parallel to the second axis. That is, the main stage and the pair of substages integrally move in a direction parallel to the second axis. Therefore, the main stage and the pair of sub-stages can be driven in a direction parallel to the second axis by using the first drive system.

According to a fifth aspect of the present invention, an exposure apparatus which transfers the pattern to the object by exposing an object with an energy beam through a pattern, wherein the pattern retainer having the pattern and one of the objects are held to each other. A main stage movable along a two-dimensional plane including an orthogonal first axis and a second axis; A pair of sub-stages disposed on one side and the other side of the main stage with respect to a direction parallel to the first axis, and movable at a predetermined stroke in at least a direction parallel to the second axis; A first drive system for driving the pair of sub-stages in a direction parallel to the second axis; A connection device for connecting the main stage to each of the pair of sub-stages in a non-contact state; A first position of contacting the main stage with each of the pair of sub-stages to limit a relative movable range of the main stage and the pair of sub-stages to a predetermined range, and the main stage and the pair of A limiting device having a movable member movable between second positions allowing relative movement of the sub-stage over the predetermined range; There is provided a third exposure apparatus including a holding device for holding the pattern holder and the other of the object.

According to this, when a pair of sub-stages are driven in a direction parallel to the second axis by the first drive system, the main stages connected by the connecting device are integrally parallel to the second axis with the pair of sub-stages. Move. Here, when the movable member of the limiting device is located at the first position, the relative movable range of the main stage and the pair of sub-stages is limited to a predetermined range, so that even if the first drive system becomes uncontrollable, the relative The main stage is prevented from being separated from the pair of sub stages beyond the movable range. On the other hand, when the movable member of the limiting device is located at the second position, the main stage and the pair of substages can be separated.

According to a sixth aspect of the present invention, an exposure is performed by exposing an energy beam to a pattern disposed on a first surface to expose an object disposed on a second surface with an enlarged image of the pattern formed through a projection optical system having an enlarged magnification. An apparatus comprising: a main stage capable of holding a mask in which the pattern is formed and moving along a two-dimensional plane including a first axis and a second axis orthogonal to each other; A pair of sub-stages respectively disposed on one side and the other side of the main stage with respect to a direction parallel to the first axis, and movable integrally with the main stage; A fourth exposure apparatus is provided having a projection optical system having a plurality of magnifications in which projection areas of the pattern image are arranged at predetermined intervals in a direction parallel to the first axis.

According to this, a pair of sub-stages respectively arranged on one side and the other side of the main stage with respect to the direction parallel to the first axis can be integrally moved with the main stage. For this reason, the main stage is suitably moved in a predetermined stroke in a direction parallel to the first axis integrally with the pair of sub-stages, and the main stage is scanned by a scanning exposure method using a projection optical system having a plurality of magnifications. By forming an enlarged image of the mask pattern held on the surface and exposing the object, it is possible to form the pattern formed on the mask on the object without unnecessary overlapping and defects.

According to a seventh aspect of the present invention, a force transmission device for performing a force transmission between a moving body and an external device moving in a direction parallel to the first axis in a two-dimensional plane including first and second axes perpendicular to each other. A long length flexible member having one end connected to the movable body and the other end connected to the external device to form a transmission path for the force; A first rotary motion member fixed to the other end side first intermediate portion in the longitudinal direction of the flexible member and rotatable in at least a predetermined range around a first axis parallel to the second axis; One end side second intermediate part in the longitudinal direction of the flexible member is fixed and is formed to be accessible and spaced apart from the first rotary motion member by moving in a direction parallel to the first axis with the movable body. And a second rotational movement member which is rotatable in at least a predetermined range around a second axis parallel to the second axis.

Here, the power means any energy, an object or the like (for example, electric power, electric signal, pressurized gas, vacuum suction force, refrigerant) used in the moving body, and the transfer of the force between the moving body and the external device means that the moving body and the external device are used. It means to carry out the above-mentioned power transfer (power supply, transmission and reception of electric signals, supply and recovery of refrigerant, etc.) between the devices. In this specification, the term "force" is used in this sense.

According to this, when a movable body moves in the direction parallel to a 1st axis | shaft, a 2nd rotational movement member moves with a movable body in the direction parallel to a 1st axis, and will approach and space apart from a 1st rotational movement member. In addition, the flexible member having different intermediate portions fixed to each of the first rotary motion member and the second rotary motion member may be bent or parallel to the first axis in accordance with the approach and separation of the first and second rotary motion members. Tension in one direction. At this time, since the first and second rotary motion members rotate, the dust or vibration caused by the sliding of the flexible member and the first and second rotary motion members (or other members) is suppressed. In addition, since each of the first and second rotary motion members rotates, a large bending stress is prevented from acting on the flexible member.

According to an eighth aspect of the present invention, there is provided an exposure apparatus that transfers a pattern onto an object by exposing an object with an energy beam through a pattern holder having a predetermined pattern, wherein the movable body is configured to perform the pattern holder. A force transmission device of the present invention for guiding in a direction parallel to one axis; A fifth exposure apparatus is provided having an object holding device for holding the object and guiding the object in a direction parallel to the first axis.

According to the ninth aspect of the present invention, there is provided a method of exposing an object using any of the first to fifth exposure apparatuses of the present invention; A device manufacturing method is provided that includes developing the exposed object.

Here, the manufacturing method which manufactures a flat panel display as a device is provided by using the board | substrate for flat panel displays as a board | substrate. The board | substrate for flat panel displays contains a film-like member etc. in addition to a glass substrate.

BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows schematic structure of the liquid crystal exposure apparatus of 1st Embodiment.
FIG. 2 is a plan view of the mask stage apparatus of the liquid crystal exposure apparatus of FIG. 1. FIG.
3 is a side view of the mask stage device seen in the + X direction.
4 (A) and 4 (B) are diagrams showing states before and after movement when the main stage of the mask stage apparatus moves in the cross scan direction, respectively.
5 (A) and 5 (B) are diagrams showing states before and after the main stage is positioned by a pair of positioning devices, respectively.
6 is a plan view of the mask stage apparatus according to the second embodiment.
FIG. 7 is a cross-sectional view taken along the line AA of the mask stage apparatus of FIG. 6.
FIG. 8 is a diagram in which part of the schematic configuration of the liquid crystal exposure apparatus according to the first modification is omitted.
9 is a perspective view showing a partially omitted mask stage device according to a second modification.
It is a top view of the mask stage apparatus which the liquid crystal exposure apparatus of 3rd Embodiment has.
FIG. 11 is a side view of the mask stage device of FIG. 10 seen in the + X direction. FIG.
12 (A) and 12 (B) are diagrams showing a schematic configuration of the lock apparatus and the stopper apparatus, and FIG. 12 (A) is a state in which the main stage and the sub stage are connected by the lock apparatus, and FIG. 12 (B). ) Indicate states in which the connection is released.
It is a figure which shows schematic structure of the lock apparatus and stopper apparatus formed in the position different from the lock apparatus and stopper apparatus shown to FIG. 12 (A) and FIG. 12 (B).
It is a figure which shows schematic structure of the lock apparatus and stopper apparatus which concerns on a modification.
It is a top view of the mask stage apparatus which the liquid crystal exposure apparatus of 4th Embodiment has.
16 (A) and 16 (B) are diagrams showing states before and after the main stage is positioned by a pair of positioning devices, respectively.
FIG. 17 (A) and FIG. 17 (B) show a schematic configuration of the lock device and the stopper device, FIG. 17 (A) shows a state in which no connection is made by the lock device, and FIG. 17 (B) shows the lock. The state where the main stage and the substage were connected by the apparatus is shown, respectively.
It is a figure which shows schematic structure of the lock apparatus and stopper apparatus formed in the position different from the lock apparatus and stopper apparatus shown to FIG. 17 (A) and FIG. 17 (B).
19 is a diagram illustrating a state in which the stopper device is released.
20 is a plan view of the mask stage apparatus according to the fifth embodiment.
21 is a cross-sectional view taken along line BB of the mask stage apparatus of FIG. 20.
22 is a diagram (1) for illustrating the operation of the mask loader device of the mask stage device according to the fifth embodiment.
FIG.23 (A) and FIG.23 (B) are figures (2 and 3) for demonstrating operation | movement of the mask loader apparatus which the mask stage apparatus which concerns on 5th Embodiment has.
24 is a plan view of the mask stage apparatus according to the sixth embodiment.
FIG. 25 is a diagram (1) for explaining the operation of the mask loader device of the mask stage device according to the sixth embodiment.
26A and 26B are diagrams (2 and 3) for explaining the operation of the mask loader device according to the sixth embodiment.
27 is a diagram (4) for illustrating the operation of the mask loader device according to the sixth embodiment.
It is a figure which shows schematic structure of the liquid crystal exposure apparatus of 7th Embodiment.
It is a side view of the cable unit which a mask stage apparatus has.
30 is a cross-sectional view taken along the line CC of FIG. 29.
31 is a diagram for explaining the operation of the cable unit.
32 is a side view of the cable unit according to the eighth embodiment.
33 is a diagram for explaining the operation of the cable unit according to the eighth embodiment.
34 is a side view of the cable unit according to the ninth embodiment.
35 is a diagram for explaining the operation of the cable unit according to the ninth embodiment.
36 is a diagram illustrating a part of a cable unit according to a modification of the seventh embodiment.

<< first embodiment >>

EMBODIMENT OF THE INVENTION Hereinafter, 1st Embodiment of this invention is described based on FIG. 1 thru | or FIG. 5 (B).

The schematic structure of the liquid crystal exposure apparatus 10 which concerns on 1st Embodiment is shown by FIG. The liquid crystal exposure apparatus 10 is a projection exposure apparatus of a step-and-scan method, what is called a scanner.

As shown in FIG. 1, the liquid crystal exposure apparatus 10 includes a mask stage device MST, a projection optical system PL, and a mask stage including an illumination system IOP and a main stage 40 holding the mask M. As shown in FIG. A substrate stage device PST including a body BD on which the device MST and the projection optical system PL and the like are mounted, a fine movement stage 21 for holding the substrate P to be movable along the XY plane, and these Control system and the like. In the following, the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system PL at the time of exposure is set as the X-axis direction, and the direction orthogonal to this in the horizontal plane (XY plane) is Y. The directions orthogonal to the axial direction, the X axis, and the Y axis direction are set as the Z axis direction, and the rotation (tilt) directions around the X axis, the Y axis, and the Z axis are described as the θx, θy, and θz directions, respectively. The same applies to the second to ninth embodiments described later.

The illumination system IOP is comprised similarly to the illumination system disclosed, for example in the specification of US patent 6,552,775. That is, the illumination system IOP is used as the exposure illumination light (illumination light) IL through the light emitted from the mercury lamp, not shown, through a reflector, a dichroic mirror, a shutter, a wavelength selective filter, various lenses, and the like, respectively. The mask M is irradiated. As illumination light IL, the light (or synthetic light of i line | wire, g line | wire, h line | wire), such as i line | wire (wavelength 365nm), g line | wire (wavelength 436nm), h line | wire (wavelength 405nm), etc., for example This is used. Moreover, the wavelength of illumination light IL can be switched suitably according to the resolution requested | required by a wavelength selection filter. In addition, it is not limited to an ultrahigh pressure mercury lamp as a light source, For example, pulse laser light sources, such as an excimer laser, a solid state laser device, etc. can also be used.

The mask stage device MST includes a main stage 40 disposed above the barrel surface plate 31 that is a part of the body BD described later, one side (-Y side) of the main stage 40 in the Y axis direction, and Sub-stages 50 and 70 arranged on the other side (+ Y side) in a state in which the main stage 40 is vibratively separated (non-contact state or contact state where vibration is not transmitted even when contacted), and the sub It has the substage guides 37a and 37b which support the stages 50 and 70 on the floor surface F. As shown in FIG. The main stage 40 is supported on a pair of main stage guides 35 made of a square columnar member whose longitudinal direction is the X axis direction which is integrally fixed to the upper surface of the barrel surface plate 31. . In the main stage 40, a mask M formed with a circuit pattern (hereinafter, also appropriately referred to as a mask pattern) on the pattern surface (lower surface in FIG. 1) is fixed by, for example, vacuum suction. Each of the sub-stages 50 and 70 can move on the sub-stage guides 37a and 37b in a predetermined stroke in the X-axis direction (plane orthogonal direction in FIG. 1). When the sub stages 50 and 70 move in the X axis direction, the main stage 40 is guided to them and moves in the X axis direction. Details of the mask stage device MST will be described later in detail, including specific configurations such as the main stage 40, the substages 50 and 70, the substage guides 37a and 37b, and the drive system and the measurement system. do.

The projection optical system PL is supported by the barrel base plate 31 under the mask stage apparatus MST in FIG. 1. The projection optical system PL of this embodiment has the same structure as the projection optical system disclosed by the specification of US patent 6,552,775, for example. That is, the projection optical system PL includes a plurality of projection optical systems (also called multi-lens projection optical systems) in which the projection regions of the pattern images of the mask M are arranged at predetermined intervals along the Y axis direction, for example, Y It functions equivalently to projection optics having a single image field of rectangular shape with the axial direction as the longitudinal direction. In this embodiment, as each of the plurality of projection optical systems, forming an upright image with, for example, a bilateral telecentric magnification system is used. In the following description, a plurality of projection areas arranged along the Y axis direction are collectively referred to as an exposure area.

For this reason, when the illumination area | region on the mask M is illuminated by the illumination light IL from the illumination system IOP, the mask by which the 1st surface (object surface) of the projection optical system PL and the pattern surface are substantially corresponded and arrange | positioned ( By the illumination light IL passing through M, the projection image (partial upright image) of the circuit pattern of the mask M in the illumination region via the projection optical system PL causes the second surface of the projection optical system PL ( It is formed in the irradiation area (exposure area) of illumination light IL which is conjugated to the illumination area on the board | substrate P with which the resist (sensitizer) was apply | coated to the surface arrange | positioned at the image surface side. The mask M is moved relative to the illumination region (illumination light IL) in the scanning direction (X axis direction) by synchronous driving of the mask stage apparatus MST and the substrate stage apparatus PST, By relatively moving the substrate P in the scanning direction (X axis direction) with respect to the exposure area (illumination light IL), scanning exposure of one shot region (compartment region) on the substrate P is performed, and the shot region The pattern (mask pattern) of the mask M is transferred to it. That is, in this embodiment, the pattern of the mask M is produced | generated on the board | substrate P by the illumination system IOP and the projection optical system PL, and the sensitive layer on the board | substrate P by illumination light IL (resist layer) The pattern is formed on the substrate P by exposure to the substrate.

The body BD is a pair fixed to the substrate stage mount 33 and the substrate stage mount 33 as disclosed, for example, in US Patent Application Publication No. 2008/0030702. It has the barrel surface plate 31 supported horizontally through the support member 32 of the. The board | substrate stage mount 33 is supported by the some dustproof apparatus 34 provided on the floor surface F, and is isolate | separated vibrally with respect to the floor surface F. As shown in FIG.

The board | substrate stage apparatus PST is mounted on the surface plate 12 fixed on the board | substrate stage mount 33, the X coarse motion stage 23X, the X coarse motion stage 23X, and the X coarse motion stage 23X, The Y coarse motion stage 23Y constituting the XY two-dimensional stage apparatus together, the fine motion stage 21 arranged on the + Z side (upper side) of the Y coarse motion stage 23Y, and the magnetic weight of the fine motion stage 21 on the surface plate 12. A self-weight canceling device 26 supporting self weight is provided.

The surface plate 12 is a rectangular plate-like member (viewed from the + Z side) in plan view formed of stone, for example, and its upper surface is finished with very high flatness.

The X coarse motion stage 23X consists of a rectangular plate-shaped (or cuboidal shape) member viewed in plan view, and has a Y-axis direction as the longitudinal direction at the center of the surface parallel to the XY plane, and penetrates in the Z-axis direction. A hole-shaped opening (not shown) is formed. The X coarse motion stage 23X is mounted on a plurality of non-illustrated X linear guide members that are hypothesized above the surface plate 12, for example, an X coarse motion stage drive system including a linear motor (not shown). By this, it is driven in the X-axis direction on the said some X linear guide member.

The Y coarse motion stage 23Y is made of a rectangular plate-shaped (or cuboidal) member as seen in a plane having a shorter dimension in the Y axis direction than the X coarse motion stage 23X, and has a Z axis in the center of the plane parallel to the XY plane. An opening (not shown) penetrating in the direction is formed. The Y coarse motion stage 23Y is mounted on a plurality of non-illustrated Y linear guide members fixed to an upper surface of the X coarse motion stage 23X, and is, for example, mounted on a Y coarse motion stage drive system (not shown) including a linear motor. By this, it is driven in the Y-axis direction on the X coarse motion stage 23X. In addition, the drive system which drives the X coarse motion stage 23X and the Y coarse motion stage 23Y to an X-axis direction and a Y-axis direction, respectively, for example, the drive system by a feed screw, or a belt drive system may be sufficient.

The fine motion stage 21 consists of a substantially square plate-shaped (or cuboidal shape) member by planar view, and hold | maintains the board | substrate P on the upper surface through the substrate holder PH. The substrate holder PH has at least one part of the vacuum adsorption apparatus (or electrostatic adsorption apparatus) which is not shown, for example, and adsorb | sucks and hold | maintains the board | substrate P on the upper surface.

The Y moving mirror (bar mirror) 22Y having a reflective surface on the -Y side is fixed to the -Y side surface of the fine movement stage 21 via the fixing member 24Y. In addition, although illustration is abbreviate | omitted in FIG. 1, the same moving mirror (henceforth an X moving mirror) is being fixed to the side surface of the fine movement stage 21 at -X side. The positional information in the XY plane of the fine motion stage 21 is, for example, 0.5 to 1 by the laser interferometer system 28 which irradiates the side beams to each of the Y moving mirror 22Y and the X moving mirror and receives the reflected light. It is always detected with a resolution of about nm. In addition, the laser interferometer system actually has a Y moving mirror 22Y, an X laser interferometer and a Y laser interferometer corresponding to each of the X moving mirrors, but in Fig. 1, a Y laser interferometer is typically represented as the laser interferometer system 28. have.

The fine motion stage 21 is an illustration not fixed to the stator (for example, a coil unit) which is fixed to the Y coarse motion stage 23Y, for example on the Y coarse motion stage 23Y, and is shown to be fixed to the fine motion stage 21. Fine in 6 degrees of freedom (X, Y, Z, θx, θy, θz directions) by a fine motion stage drive system comprising a voice coil motor comprising an unmovable mover (for example, a magnet unit). Driven. Thereby, the board | substrate stage apparatus PST can drive (coarse) the board | substrate P with a long stroke in an XY biaxial direction, and can also micro drive (fine motion) in 6 degrees of freedom.

The self-weight canceling device 26 carries out the self-weight of the system including the micro-movement stage 21 (specifically, a system composed of the micro-movement stage 21, the substrate holder PH, the substrate P, and the like). It is a columnar member extended in the Z-axis direction supported by the phase, also called a pontoon. The self-weight canceling device 26 is inserted into an opening of the X coarse motion stage 23X and an opening of the Y coarse motion stage 23Y. The self-weight canceling device 26 is lifted and supported on the surface plate 12 by a gas static pressure bearing, for example, an air bearing, not shown. The self-weight canceling device 26 is connected to the Y coarse motion stage 23Y via a flexure device (not shown), and moves in the X axis direction and the Y axis direction integrally with the Y coarse motion stage 23Y. The leveling device 27 is disposed between the self-weight canceling device 26 and the fine motion stage 21. The fine motion stage 21 is supported by the self-weight canceling device 26 via the leveling device 27 in a tilt-free (swing-free) state in the θx direction and the θy direction. Details of the substrate stage device (PST) configuration, including the above-mentioned self-weighting cancel device 26, leveling device 27, and flexure device, are described, for example, in International Publication No. 2008/129762 (corresponding US patent). Patent Application Publication No. 2010/0018950) and the like.

Here, the liquid crystal exposure apparatus 10 of this embodiment is one pattern by combining the several projection image formed on the board | substrate P through each of the several magnification projection optical systems which comprise the projection optical system PL. Since a part of the pattern is generated on the substrate P, a plurality of points spaced apart at predetermined intervals in the Y-axis direction of the pattern surface of the mask M are simultaneously illuminated by the illumination system IOP. That is, on the mask M, the several illumination area | region separated at predetermined intervals in the Y-axis direction is formed. Moreover, the several strip | belt-shaped area | region (long rectangular shape) extended in the scanning direction (X-axis direction) is formed in the pattern surface of the mask M at predetermined intervals in the Y-axis direction. The space | interval with respect to the Y-axis direction is set so that several strip | belt-shaped area | regions may illuminate every other by illumination system IOP. A part of mask pattern for forming a specific pattern (henceforth called pattern A) on the board | substrate P in these some strip | belt-shaped area | regions, and another pattern different from the said pattern A (henceforth a pattern A part of the mask pattern for forming (called (B)) on the board | substrate is formed alternately with respect to the Y-axis direction (illustration of each mask pattern is abbreviate | omitted).

For this reason, in the liquid crystal exposure apparatus 10 of this embodiment, the some strip | belt-shaped area | region which has at least one part of the mask pattern for forming the pattern A on the board | substrate P is illuminated by the illumination system IOP. By performing scanning exposure in the state which positioned the mask M with respect to the Y-axis direction, the pattern A can be formed on the board | substrate P, and the pattern B is formed on the board | substrate P. The pattern B is placed on the substrate P by scanning exposure with the mask M positioned in the Y-axis direction so that the strip-shaped region having at least a part of the mask pattern for the illumination is illuminated in the illumination system IOP. ) Can be formed. In addition, the mask M may have only one of the different patterns (A) and (B).

And in the mask stage apparatus MST of this embodiment, in order to enable the positioning of the mask M with respect to the Y-axis direction mentioned above, the main stage 40 which hold | maintains the mask M is Y-axis. It can also be moved in a predetermined stroke in the direction (cross scan direction). Hereinafter, the structure of the mask stage apparatus MST is demonstrated. 2, the top view of the mask stage apparatus MST is shown. 3, the side view which looked at the mask stage apparatus MST from the + X side is shown.

As shown in FIG. 2, the main stage 40 has the main-body part 41 which is a plate-shaped member parallel to the XY plane which makes a Y-axis direction the longitudinal direction. The main body part 41 cut | disconnects the + Y side of the rectangular plate-shaped member (edge part) of the rectangular plate-shaped member (edge part), and the + Y side and the edge part (edge part) of the + Y side and -X side obliquely as seen from upper direction (+ Z side). It has an external shape (hexagonal shape) that seems to be broken. The rectangular opening 41a which penetrates in the Z-axis direction is formed in the center part of the main-body part 41, and the mask M is accommodated in the opening 41a. The main body portion 41 includes a chuck unit including a plurality of electrostatic chucks (or vacuum chucks or mechanical chucks) fixed to each of the + X side and -X side wall surface (inner wall surface) forming the opening portion 41a ( 42). The mask M is held by the chuck unit 42. Moreover, you may make the opening part 41a the shape which provided the step | step with which the rectangular opening was formed in the center part, and may attach the chuck unit 42 to the inner peripheral part of the edge part.

The main body portion 41 is supported by the -Y side portion (region) from the lower side than the opening portion 41a by the -Y side main stage guide 35, and the + Y side portion (region) is the + Y side than the opening portion 41a. It is supported by the main stage guide 35 from below. Each of the pair of main stage guides 35 is formed of, for example, a stone, and its upper surface is finished with very high flatness. On the lower surface of the main body portion 41, two static pressure gas bearings, for example, air bearings 43a and 43b, in which the bearing surface faces the upper surface of the -Y side main stage guide 35, and the + Y side main stage guide ( One static pressure gas bearing, for example, an air bearing 43c, on which the bearing surface faces the upper surface of 35) is mounted. The air bearings 43a and 43b are spaced apart from each other in the X-axis direction, and the three air bearings 43a to 43c are arranged at three points not on the same straight line. Each of the air bearings 43a, 43b, 43c blows out the high pressure (pressurized) gas (for example, air) supplied from a gas supply device (not shown) to the upper surface of the main stage guide 35 facing the main body portion. The 41 is floated on the pair of main stage guides 35. In addition, the number of air bearings is not limited to this, For example, you may arrange | position a plurality (for example two) air bearings with respect to each of a pair of main stage guide 35, respectively.

As shown in FIG.2 and FIG.3, the recessed part 41b opened to the + Y side is formed in the + Y side upper surface center part of the main-body part 41, and is spaced apart in the Z-axis direction at the bottom part of the recessed part 41b. The Y movable member 44 composed of a pair of plate members is fixed through the fixing member 44a. The pair of plate-like members constituting the Y mover 44 has a magnet unit (not shown) including a plurality of magnets on each of the pair of opposing surfaces facing each other. Moreover, in the + Y side lower surface center part (namely, below the Y movable body 44) of the main-body part 41, and the -Y side upper surface center part, X movable members 45 and 46 of cross-sectional U shape are respectively L-shaped cross sections, respectively. It is fixed through the fixing members 45a and 46a of a shape. Each of the X movers 45 and 46 has a magnet unit (not shown) including a plurality of magnets on each of the pair of opposing surfaces facing each other.

As shown in FIG. 2, a pair of X moving mirrors (bar mirrors) 48x are fixed to the -X side side surface of the main body portion 41 toward the direction substantially perpendicular to the X axis. have. Position information about the X-axis direction (and θz direction) of the main stage 40 includes a pair of X laser interferometers that irradiate the longitudinal beam Lx parallel to the X axis to each of the pair of X moving mirrors 48x ( 98x), it is always measured by the resolution of about 0.5-1 nm, for example.

In addition, as shown in FIG. 3, the Y-moving mirror (bar mirror) 48y having the X-axis direction in the longitudinal direction is a direction perpendicular to the Y-axis on the -Y side surface of the main body portion 41. It is fixed toward. Further, the barrel surface plate 31 constitutes a laser interferometer system together with the pair of X laser interferometers 98x described above, and Y irradiates the Y-beam 48y with the side beams Ly parallel to the Y axis. The laser interferometer 98y is fixed. The positional information regarding the Y-axis direction of the main stage 40 is always measured by the Y laser interferometer 98y at the resolution of about 0.5-1 nm, for example. The reflective surfaces of each of the pair of X moving mirrors 48x and Y moving mirrors 48y are referred to as XY planes (hereinafter, referred to as measurement reference planes) whose centers in the respective Z axis directions are substantially the same as the lower surface (pattern surface) of the mask M. The height is almost equal to That is, each of the pair of X laser interferometers 98x and Y laser interferometers 98y irradiates the side beams Lx and Ly to the respective moving mirrors 48a to 48c on the measurement reference plane, and thus the main stage 40. The positional information in the XY plane is measured on the measurement reference plane without a so-called Abbe error.

As shown in FIG. 1, the substages 50 and 70 are mounted on the substage guides 37a and 37b, respectively. The substage guide 37a is on the -Y side of the body BD, and the substage guide 37b is on the floor surface F in a state separated from the body BD, respectively, on the + Y side of the body BD. It is installed. The substage guide 37a supports the guide part 38a (refer FIG. 2) which is a plate-shaped member parallel to the XY plane which makes X-axis direction the longitudinal direction, and supports the guide part 38a on the floor surface F. FIG. It has several, for example, four leg parts 39a (in FIG. 1, the two leg parts 39a on the -X side are hidden inside the ground). The substage guide 37b also has the guide part 38b and the some leg part 39b of the same structure. However, the guide part 38a of the substage guide 37a is arrange | positioned in the position (+ Z side) higher than the guide part 38b of the substage guide 37b (that is, the leg part 39a is a leg part). (39b) longer).

Moreover, the support members 36a which respectively support the cable chains 89a and 89b (also called a cable carrier, a cable bear (registered trademark), etc.) on the leg portions 39a and 39b of each of the substage guides 37a and 37b. , 36b) is fixed. Cable chain 89a to substage 50 (or to main stage 40 via substage 50), cable chain 89b to substage 70 (or through substage 70) To the main stage 40), a cable for supplying electric power to each of them, or a tube for supplying electric power (for example, vacuum suction force, pressurized gas, coolant, etc.).

As shown in FIG. 2, a pair of X linear guides 51 are being fixed to the upper surface of the guide part 38a. The pair of X linear guides 51 are respectively arranged at predetermined intervals in the Y-axis direction with the X-axis direction as the longitudinal direction. Moreover, between the pair of X linear guides 51 on the upper surface of the guide portion 38a, a magnet unit 52 including a plurality of magnets arranged along the X axis direction is fixed. Moreover, the X scale 53 which consists of a plate member parallel to the XZ plane which makes the X-axis direction the longitudinal direction is being fixed to the -Y side surface of the guide part 38a. On the surface of the X scale 53, one-dimensional gratings having the X-axis direction as the periodic direction are formed. The guide part 38b has the same structure as the guide part 38a. That is, the pair of X linear guides 71 and the magnet unit 72 are fixed to the upper surface of the guide part 38b, and the X scale 73 is fixed to the -Y side surface of the guide part 38b. have.

As shown in FIG. 3, the sub-stage 50 is mounted on the X stage 54 and the X stage 54 which are movable in the X-axis direction on the guide portion 38a of the sub-stage guide 37a, It has the Y stage 55 movable on the X stage 54 in the Y-axis direction.

The X stage 54 is composed of a rectangular plate-like member viewed in a plane having the X-axis direction in the longitudinal direction (see FIG. 2), and at four corners of the lower surface thereof, rolling bearings (not shown) A slider 56 having a cross-section inverted U-shape including a roller, etc., is fixed (only two of the + X side are shown in FIG. 3, and two of the -X side are hidden inside the drawing). Two sliders 56 on the + Y side are engaged with the + Y side X linear guide 51, and two sliders 56 on the -Y side are slidable to the -Y side X linear guide 51, respectively. . The coil unit 57 containing a coil is fixed to the center part of the lower surface of the X stage 54 in the state which opposes the magnet unit 52. The coil unit 57 constitutes an X linear motor for driving the X stage 54 together with the magnet unit 52 on the pair of X linear guides 51 in the X axis direction. The magnitude and direction of the current supplied to the coils constituting the coil unit 57 are controlled by a main controller not shown.

2 and 3, on the -X side and the -Y side of the lower surface of the X stage 54, the positional information regarding the X axis direction of the X stage 54 together with the above-described X scale 53. The X head 58 constituting the X linear encoder system for measuring the pressure is fixed through a predetermined fixing member. The measured value of the X head 58 is supplied to a main control unit not shown, and the main control unit controls the X linear motor based on the measured value of the X head 58, thereby relating to the X axis direction of the X stage 54. To control the position.

As shown in FIG. 3, the coil unit 60 including the coil is fixed to the center of the upper surface of the X stage 54. The magnitude and direction of the current supplied to the coils constituting the coil unit 60 are controlled by a main controller not shown. Moreover, in the vicinity of the four corners of the upper surface of the X stage 54, a slider 61 having a U-shaped cross section including a rolling bearing (for example, a ball, a roller, etc.) not shown is fixed (in FIG. 3). Only two on the + X side are shown, and two on the -X side are hidden inside the drawing).

The Y stage 55 is composed of a rectangular plate-like member having the X-axis direction in the longitudinal direction in plan view (see FIG. 2), and a magnet unit including a plurality of magnets arranged in the Y-axis direction at the center of the bottom surface thereof. 62 is fixed. The magnet unit 62 constitutes a Y linear motor that drives the Y stage 55 in the Y axis direction together with the coil unit 60. In addition, the Y linear motor may be a moving coil system in which the arrangement relationship between the coil unit and the magnet unit is opposite to the above (moving magnet system).

On each of the + X side and the -X side of the magnet unit 62 on the lower surface of the Y stage 55, a Y linear guide 63 having the Y axis direction in the longitudinal direction is fixed (-X side in FIG. 3). The Y linear guide is hidden inside the drawing). Each of the pair of Y linear guides 63 is engaged with the slider 61 fixed to the upper surface of the X stage 54 in a slidable state, and the Y axis on the X stage 54 of the Y stage 55 is fixed. The movement of the Y stage 55 in the X axis direction on the X stage 54 is restricted while guiding the straight movement in the direction. In addition, the arrangement relationship of a Y linear guide and a slider may be reverse from the case mentioned above.

As shown in FIG. 2, the Y scale 64 which consists of a plate member parallel to the YZ plane which makes Y-axis direction the longitudinal direction is being fixed to the + X side side surface of the Y stage 55. As shown in FIG. On the surface of the Y scale 64, one-dimensional gratings having the Y-axis direction as the periodic direction are formed. The Y linear encoder system which measures the positional information regarding the Y-axis direction of the Y stage 55 with the Y scale 64 in the + X side center part of the X stage 54 upper surface facing the Y scale 64 is comprised. The Y head 59 to be fixed is fixed via a predetermined fixing member. The measured value of the Y head 59 is supplied to the main control unit not shown, and the main control unit controls the Y linear motor based on the measured value of the Y head 59 to thereby control the Y axis direction of the Y stage 55. To control the position. In addition, the illustration of the Y head 59 and the Y scale 64 is abbreviate | omitted in FIGS. 1 and 3 in order to avoid the appearance of drawing.

The X stator 65 is fixed to the + Y side center part on the upper surface of the Y stage 55 via the mounting member 65a (refer FIG. 3) of L-shaped cross section. The X stator 65 has a coil unit (not shown) including a plurality of coils, and the X mover 46 fixed to the main stage 40 when the sub stage 50 moves in the X axis direction. The driving force in the X-axis direction (for example, the electromagnetic force (Lorentz force)) is generated by the electron interaction between and the main stage 40 by driving the main stage 40 in the X-axis direction with respect to the sub-stage 50. ) Is constituted of an X voice coil motor (hereinafter abbreviated as XVCM1 (see Fig. 3)) to guide the X axis direction. In other words, when the sub-stage 50 is driven in the X-axis direction by the above-described X linear motor, the main stage 40 is driven integrally with the sub-stage 50 by XVCM1 generating a driving force.

The relative positional information about the X-axis and Y-axis direction of the main stage 40 and the substage 50 is fixed to the substage 50 via the predetermined | prescribed fixing member as shown in FIG. For example, the main stage 40 is provided by a gap sensor (a gap sensor 66 for measuring in the X-axis direction and a gap sensor 67 for measuring in the Y-axis direction) including a displacement sensor of the eddy current method (or capacitive method) and the like. It measures through the target (the X-axis direction measurement target 49a, and the Y-axis direction measurement target 49b) which consists of a metal plate fixed via the predetermined | prescribed fixing member at. That is, the gap sensors 66 and 67 measure the gaps with the targets 49a and 49b, respectively, so that relative positional information regarding the X and Y axis directions of the main stage 40 and the sub-stage 50 is measured. do.

As shown in FIG. 3, the substage 70 includes a drive system and a measurement system, except that the positions of the X stator 85 described later are different from each other and the Y stator 88 described later is included. It is comprised similarly to 50. That is, the sub stage 70 has the X stage 74 and the Y stage 75. The X stage 74 is mounted on the X linear guide 71 via the slider 76 fixed to the lower surface thereof, and is constituted by the coil unit 77 and the magnet unit 72 fixed to the lower surface thereof. By the linear motor, it is driven on the X linear guide 71 in the X axis direction. Moreover, the Y stage 75 is mounted on the slider 81 fixed on the X stage 74 via the Y linear guide 83 fixed to the lower surface, and the magnet unit 82 fixed to the lower surface. And the Y linear motor constituted by the coil unit 80 fixed to the upper surface of the X stage 74, are driven in the Y axis direction on the X stage 74.

As shown in FIGS. 2 and 3, the position information in the X-axis direction of the X stage 74 includes an X head 78 fixed to the X stage 74 via a predetermined fixing member, and a guide portion 38b. It is measured by the X linear encoder system constituted by the X linear scale 73 fixed to). Moreover, the position information of the Y-axis direction of the Y stage 75 is Y head 79 fixed to the X stage 74 via the predetermined | prescribed fixing member, and the Y linear scale fixed to the Y stage 75 ( 84) is measured by the Y linear encoder system constituted by FIG.

As shown in FIG. 3, the X stator 85 is being fixed to the upper surface of the Y stage 75 via the fixing member 85a of L shape in cross section. The X stator 85 generates a driving force for driving the main stage 40 in the X-axis direction with respect to the sub stage 70 by electronic interaction with the X mover 45 fixed to the main stage 40. The X voice coil motor (hereinafter abbreviated as XVCM2) is constituted. The main control unit, not shown, when the sub-stages 50 and 70 are synchronously driven in the X-axis direction by using a pair of X linear motors (magnet units 52 and 72 and coil units 57 and 77), Together, the main stage 40 and the substages 50 and 70 are driven by driving the main stage 40 in the same direction as the substages 50 and 70 with respect to the substages 50 and 70 using XVCM1 and XVCM2. Integrally move in the X-axis direction. In addition, the main control device micro-drives the main stage 40 appropriately in the (theta) z direction by changing the driving force by XVCM1 and XVCM2.

Moreover, the Y stator 88 is being fixed to the fixing member 85a above the X stator 85. The Y stator 88 has a coil unit (not shown) including a plurality of coils. The Y stator 88 is a Y voice which micro-drives the main stage 40 in the Y axis direction with respect to the sub-stage 70 by electronic interaction with the Y mover 44 fixed to the main stage 40. The coil motor (hereinafter abbreviated as YVCM) is configured.

The relative positional information regarding the X-axis direction of the main stage 40 and the substage 70 is attached to the gap sensor 86 fixed via the predetermined | prescribed fixing member to the X stage 74 as shown in FIG. By means of the target 49c fixed to the main stage 40 via a predetermined fixing member, relative positional information about the Y-axis direction of the main stage 40 and the sub-stage 70 is determined by the Y stage ( It is measured through the target 49d fixed via the predetermined fixing member to the main stage 40 by the gap sensor 87 fixed via the predetermined fixing member to 75).

Here, as an example, the operation (Y step operation) when the main stage 40 moves in a predetermined stroke in the + Y direction, for example, will be described with reference to Figs. 4A and 4B. In addition, illustration of the leg part and the body of each of the substage guides 37a and 37b is abbreviate | omitted in FIG.4 (A) and FIG.4 (B).

In FIG. 4A, the main stage 40 is located near the -Y side end portion of the movable range with respect to the Y axis direction. When the main stage 40 is driven in the + Y direction from the state shown in Fig. 4A, the main controller (not shown) controls the Y linear motor of each of the sub-stages 50, 70, and the Y stage 55, 75) Each is driven in the + Y direction on the X stages 54 and 74 (see Fig. 4B). In addition, since the main stage 40 and the substages 50 and 70 are in a non-contact state, the main controller is based on the output of the above-described optical interferometer system (Y laser interferometer 98y (see FIG. 3)). By controlling the YVCM to drive the main stage 40 in the + Y direction with respect to the sub-stage 70, thereby guiding the main stage 40 in the Y-axis direction (the main stage 40 to the sub-stage 70 through YVCM). Tow). As a result, the main stage 40 and the sub stages 50 and 70 are integrally moved in the + Y direction. The main controller performs the same control even when the main stage 40 is driven in the -Y direction. Here, the movement stroke with respect to the Y-axis direction of the sub-stages 50 and 70 is the space | interval of the Y-axis direction on the wafer W of two adjacent projection area | regions among the several projection area | regions of the mask pattern image mentioned above. Is set to a distance corresponding to. In addition, as described above, a plurality of stripe-shaped (long rectangular) regions extending in the scanning direction (X-axis direction) are formed on the pattern surface of the mask M at predetermined intervals in the Y-axis direction. Subsequently, when a part of the mask pattern of the pattern A and a part of the mask pattern of the pattern B are alternately formed in the Y-axis direction in the band-shaped region of the substrate P, the substage 50 , 70) is set to be equal to or larger than the interval between adjacent strip-shaped regions among the plurality of strip-shaped regions. Thereby, in the mask stage apparatus MST, positioning of the mask M with respect to the Y-axis direction mentioned above is attained.

When the main controller 40 drives the main stage 40 in the X axis direction, the main controller 40 controls a pair of X linear motors to move the X stages 54 and 74 of each of the substages 50 and 70 in the X axis direction. Drive synchronously. The main controller, along with this, controls the XVCM1 and XVCM2 based on the output of the optical interferometer system (a pair of X laser interferometers 98x (see FIG. 2)), and the main stage 40 is controlled by the substages 50, 70. ), The main stage 40 is guided in the X-axis direction by driving in the X-axis direction for each. As a result, the main stage 40 and the sub stages 50 and 70 are integrally moved in the X axis direction.

Also, for example, when the main stage 40 is driven with a long stroke in the X-axis direction (scan direction) by using the sub-stages 50 and 70 at the time of exposure, the main controller is YVCM together with XVCM1 and XVCM2. The main stage 40 in the Y axis direction in order to properly control and follow the movement of the substrate P (see FIG. 1) driven by, for example, the substrate stage apparatus PST (see FIG. 1). Drive (Slight drive in the cross scan direction during the scan operation).

Here, the arrangement regarding the Z axis direction of XVCM1, XVCM2, and YVCM will be described. As shown in Fig. 4B, XVCM1 and XVCM2 are disposed on the upper surface side and the lower surface side of the main stage 40, respectively, so that the thrust in the X axis direction is applied to the main stage 40 independently of each other. Therefore, since the thrust when XVCM1 and XVCM2 drive main stage 40 in the X-axis direction is substantially the same force (magnitude and direction of force), respectively, the thrust generation position by XVCM1 and XVCM2 Acts on the main stage 40 at the midpoint of the thrust generating position. And XVCM1 and XVCM2 are arrange | positioned equidistantly with respect to a Z-axis direction from the XY plane containing the center of gravity position CG of the main stage 40, respectively. Accordingly, XVCM1 and XVCM2 exert thrust in the X axis direction on the main stage 40 in the XY plane including the center of gravity position CG of the main stage 40. In addition, in YVCM, the arrangement position with respect to the Z-axis direction is set so that thrust acts on the main stage 40 in the surface parallel to the XY plane including the center of gravity position CG of the main stage 40. It is. Thus, when the main stage 40 is driven in the X axis direction and / or Y axis direction with respect to the sub stages 50 and 70 using XVCM1, XVCM2, and YVCM, The moment (pitching moment) does not act on the main stage 40, and the main stage 40 can be driven with good precision along the XY plane.

In addition, the mask stage apparatus MST has a pair of positioning apparatus 90 which positions the main stage 40 to a specific position in an XY plane, as shown in FIG. The pair of positioning devices 90 is a pair of positioning members 91 spaced apart in the Y axis direction and fixed to the + X side of the main body portion 41 of the main stage 40 (see FIG. 2). And a pair of positioning cylinders 95 fixed to the upper surface of the barrel surface plate 31 at substantially the same interval as the pair of positioning members 91. On the lower surface of the pair of positioning members 91, conical recesses 92 open downward (-Z side) are formed. Each of the pair of positioning cylinders 95 includes a cylinder case 95a extending in the Z axis direction and a rod 95b having one end inserted into the cylinder case 95a, for example, an air cylinder (or Hydraulic cylinder, or electric one-axis drive device). The ball 96 is attached to the other end of the rod 95b.

The pair of positioning cylinders 95 includes position information of the main stage 40 by the laser interferometer system, for example, when the liquid crystal exposure apparatus 10 is used for the first time or after maintenance of the liquid crystal exposure apparatus 10. It is used when positioning the main stage 40 to the measurement origin position (hereinafter abbreviated to a measurement origin position) of a laser interferometer system, when performing measurement for the first time, or restarting a stopped measurement.

The pair of positioning cylinders 95 are arranged so that the ball 96 does not come into contact with the main stage 40 except at the time of positioning of the main stage 40 (for example, during exposure). ), The rod 95b is in a state (accommodating state) accommodated in the cylinder case 95a.

When positioning the main stage 40 at the measurement origin position, first, the positions of the pair of positioning members 91 and the pair of positioning cylinders 95 in the X-axis direction and the Y-axis direction are approximately coincident with each other. , The position of the main stage 40 is adjusted. In addition, this adjustment may be performed manually by the operator of the liquid crystal exposure apparatus 10, and it controls so that positioning may be adjusted automatically based on the output of the gap sensor 66, 67, 86, 87 (refer FIG. 2). You may also Subsequently, by supplying air or the like into the cylinder case 95a, as shown in FIG. 5B, the rod 95b protrudes from the cylinder case 95a so that the ball 96 is fitted into the recess 92. Fit. Since the main stage 40 is not restrained in the X-axis direction and the Y-axis direction with respect to the sub-stages 50 and 70, and is floated and supported on the pair of main stage guides 35, the ball 96 When fitted to the recessed portion 92, the surface of the ball 96 and the surface (tapered surface) forming the recessed portion 92 of the positioning member 91 slide, so that the center axis of the cylinder 95 is recessed. The main stage 40 is guided to a position where the central axis of the section 92 coincides. Therefore, the main stage 40 can always be positioned in the same position with high precision. In addition, in the state where the pair of balls 96 are fitted to each of the pair of recesses 92, the outer circumferential surface of the ball 96 and the tapered surface forming the recesses 92 contact each other without a gap, so that the main stage The rattling is prevented in the state where 40 was positioned.

And in the state which the pair of balls 96 shown to FIG. 5B fit in each of the pair of recessed parts 92, the X-axis direction, the Y-axis direction, and (theta) z direction of the main stage 40 are shown. Movement is limited. Each of the pair of moving mirrors 48x and the moving mirrors 48y (see FIG. 2) is provided with each laser interferometer 98x corresponding to the main stage 40 being positioned by the pair of positioning devices 90. , The mounting position with respect to the main-body part 41 is adjusted so that the side beams Lx and Ly emitted from 98y may be perpendicularly incident on the reflecting surface. In the liquid crystal exposure apparatus 10, the main stage 40 is positioned at the measurement origin position using the pair of positioning devices 90, and, for example, at the time of exposure, on the basis of the measurement origin position. The position in the XY plane of the main stage 40 is controlled based on the measured value of the laser interferometer system. Moreover, in the liquid crystal exposure apparatus 10, the main sensor 40 which was not shown in the state which positioned the main stage 40 using the pair of positioning apparatus 90, the above-mentioned gap sensor 66, 67, Based on the outputs of 86 and 87, the positional relationship between the main stage 40 and the substages 50 and 70 is stored. Thus, when the engagement of the pair of balls 96 and the pair of recesses 92 is released, the non-contact floating support (i.e., no member constrains its position in the horizontal plane) main stage 40 Flows down, preventing the measurement by the laser interferometer system from being performed. Further, in the pair of positioning devices, the arrangement relationship between the ball and the positioning member (concave portion) may be reversed (the positioning member having the recessed portion in the cylinder may be fixed and the ball may be fixed to the main stage).

In the liquid crystal exposure apparatus 10 (refer FIG. 1) comprised as mentioned above, the mask M with respect to the mask stage apparatus MST by the mask loader of omission of illustration is not managed under the control of the main controller of an omission of illustration. The load and the load of the substrate P on the substrate stage apparatus PST by the substrate loader (not shown) are performed. Subsequently, alignment measurement is performed using an alignment detection system (not shown) by the main controller, and after the completion of the alignment measurement, a step-and-scan exposure operation is performed. Since this exposure operation is the same as the step-and-scan method conventionally performed, the description is omitted.

As described above, the mask stage device MST included in the liquid crystal exposure apparatus 10 of the present embodiment includes the Y mover 44 included in the Y stator 88 and the main stage 40 included in the sub-stage 70. The main stage 40 is configured to drive the main stage 40 in the cross scan direction (Y-axis direction) with respect to the sub-stages 50 and 70 by the YVCM composed of Even if the 40 is micro-driven in the cross scan direction, the magnet unit 52, the coil unit 57, and the magnet unit 72 constituting the X linear motor for driving each of the sub-stages 50, 70 in the X-axis direction. ) And the relative position in the cross scan direction of the coil unit 77 do not change, respectively, so that the main stage 40 is always scanned in a constant thrust without increasing the stator (magnet units 52, 72) of the X linear motor. to It can move.

In the liquid crystal exposure apparatus 10 of the present embodiment, the main stage 40 holding the mask M is connected to a pair of Y linear motors (magnet unit 62 and coil unit 60, respectively) via YVCM. ) And the magnet unit 82 and the coil unit 80) can be driven with a long stroke in the Y-axis direction. For this reason, by appropriately positioning the position of the main-axis 40 in the Y-axis direction, the pattern A and the pattern B can be selectively transferred onto the board | substrate P without replacing the mask M. FIG. . Thereby, for example, after performing the exposure operation | movement which transfers the pattern A with respect to one shot area | region on the board | substrate P, after exchanging a mask, the exposure operation which transfers the pattern B repeatedly to the pattern A is performed. It can be carried out continuously without implementation. Moreover, when performing exposure continuously to several board | substrates, even after performing the exposure operation which transfers the pattern A to the predetermined number of board | substrates for the first time, and performing the exposure operation which transfers the pattern B to the remaining board | substrates, There is no need to perform mask replacement. Moreover, when performing an exposure operation to one board | substrate, the exposure operation | movement which transfers the pattern A to some shot region of a some shot area is performed, and the exposure operation which transfers the pattern B to the other shot region is performed. Even if it does, it is not necessary to perform mask replacement.

In addition, since the main stage 40 and the sub-stages 50 and 70 are each non-contacted with each other, the transmission of vibration (disturbance) from the outside to the main stage 40 through the sub-stages 50 and 70 is prevented. In addition, XVCM1, XVCM2, and YVCM for guiding the main stage 40 in the X-axis direction and the Y-axis direction, respectively, are a moving magnet type voice coil motor, and the main stage 40 includes a Y movable including a magnet unit. Since the ruler 44 and the X movers 45 and 46 may be formed, it is not necessary to connect a cable for supplying power to the main stage 40 or the like. Therefore, it is possible to prevent the vibration (disturbance) from the outside from being transmitted to the main stage through the cable or the like. In addition, the position control of the main stage is not difficult due to the tension of the cable.

<< 2nd embodiment >>

Next, the liquid crystal exposure apparatus of 2nd Embodiment is demonstrated. The liquid crystal exposure apparatus 10 of the first embodiment is the liquid crystal exposure apparatus 10 of the first embodiment except that a masking blade device (masking system) for shielding part of the mask from the illumination light is formed in the mask stage apparatus. Since it has the same structure as, only the structure of a mask stage apparatus is demonstrated below. In addition, about the component part same or equivalent to the said 1st Embodiment, while using the same code | symbol as 1st Embodiment, the description is abbreviate | omitted.

6, the top view of the mask stage apparatus MSTa which concerns on 2nd Embodiment is shown. 7 is a cross-sectional view taken along the line A-A of FIG. In addition, in FIG. 6 and FIG. 7, in order to avoid the appearance of drawing, the gap sensor formed in the sub-stages 50 and 70, the target formed in the main stage 40, etc. are abbreviate | omitted, but the structure is 1st It is the same as embodiment.

As shown in FIG. 6, the masking blade device MB carries a pair of blade bodies 110 hypothesized between the sub-stages 50 and 70 and a pair of blade bodies 110 in the X axis direction. A pair of blade drive device 140 which drives is provided. Here, since the structure is the same except that the pair of blade main body 110 is arrange | positioned on the other -X side, below, one blade main body 110 shown in FIG. The configuration of the unit will be described.

As long as the blade main body 110 connects each of the light shielding part 111, the pair of driven parts 112, the light shielding part 111, and a pair of the driven parts 112, as shown in FIG. It has a pair of connection part 113. The light shielding part 111 is a rectangular plate-shaped member which makes the Y-axis direction parallel to an XY plane the longitudinal direction, The dimension of the longitudinal direction is set longer than the longitudinal dimension of the mask M. As shown in FIG. The light shielding part 111 is accommodated in the opening part 41a of the stage main body 41 of the main stage 40, and the lower surface opposes the upper surface of the mask M through predetermined clearance.

Each of the pair of driven parts 112 is made of a rectangular plate member having a Y-axis direction arranged in parallel with the XY plane as the longitudinal direction. The pair of driven parts 112 are spaced apart from each other at predetermined intervals in the Y axis direction. In the -Y side driven part 112, a + Y side end part is arrange | positioned above the -Y side end part of the light shielding part 111, and the + Y side driven part 112 is a -Y side end part of the light shielding part 111 It is arrange | positioned above the + Y side edge part.

Each of the pair of connecting portions 113 is a plate member extending in the Z axis direction. The one connection part 113 connects the -Y side edge part of the light shielding part 111, and the + Y side edge part of the -Y side driven part 112, and the other connection part 113 of the light shielding part 111 The + Y side end portion and the -Y side end portion of the + Y side driven part 112 are connected. The blade main body 110 is in non-contact with the main stage 40.

The pair of blade drive devices 140 are members having the X-axis direction in the longitudinal direction, respectively, one of which is in the sub-stage 50 and the other in the sub-stage 70. It is mounted via the fixing member 141. In addition, the structure of a pair of blade drive apparatus 140 is the same. Moreover, the pair of blade drive apparatus 140 is supporting the edge part of the + Y side and -Y side of each of a pair of blade main body 110 in the upper surface. The blade drive device 140 has, for example, a coil unit (not shown) including a plurality of coils, the coil unit and the + Y side of each of the pair of blade bodies 110, and an end portion of −Y. Each of the pair of blade bodies 110 is independently driven in the X-axis direction by a linear motor composed of a magnet unit (not shown) fixed to each. In addition, you may provide the guide member which guides a pair of blade main body 110 straight to an X-axis direction. Moreover, if a pair of blade main body 110 can be driven on a pair of sub-stages 50 and 70, the drive system is not limited to this, For example, you may use a feed screw.

In the masking blade device MB, when the mask M is loaded into the main stage 40 and the mask M is unloaded from the main stage 40, the pair of blade main bodies 110 are respectively formed. By being driven in the direction separated from each other by the pair of blade drive devices 140, it is withdrawn from the movement path of the mask M at the time of loading and an unloading. In addition, at the time of exposure, a pair of blade main body 110 is respectively driven by the pair of blade drive apparatus 140 in the direction which approaches each other, and is positioned appropriately in arbitrary positions on the mask M, An arbitrary position on the mask M is shielded from the illumination light with respect to the X axis direction. Thereby, the illumination area on the mask M, which is illuminated by the illumination light, is limited. Moreover, the masking blade apparatus (not shown) which has a pair of light shielding members which are movable in the Y-axis direction with respect to the mask M, and light-shields arbitrary positions on the mask M with respect to the Y-axis direction from illumination light is an example. For example, it may be arrange | positioned between the mask stage apparatus MSTa and the illumination system IOP (refer FIG. 1), or under projection optical system PL.

In the liquid crystal exposure apparatus of 2nd Embodiment demonstrated above, in addition to the effect obtained by the liquid crystal exposure apparatus 10 of 1st Embodiment, arbitrary positions of the mask M are changed from illumination light using masking blade apparatus MB. Since light can be shielded, only an arbitrary position pattern on the mask M can be reliably transferred to the substrate P. FIG.

Moreover, since the masking blade apparatus MB was arrange | positioned across the sub stage 50 and 70 and made into non-contact with the main stage 40, the weight of the masking blade apparatus MB does not act on the main stage 40. FIG. Do not. Thereby, the deformation | transformation of the mask M which the main stage 40 and the main stage 40 hold can be prevented. In addition, since the masking blade device MB and the main stage 40 are separated vibratingly, a resonance phenomenon can be prevented from occurring between them, and the main stage 40 can be accurately controlled in position. In addition, since the main stage is not heavy, for example, when the masking blade device (not shown) having the same function as the masking blade device MB is mounted on the main stage, the main stage can be driven with a small thrust. Can be. Therefore, the actuator (voice coil motor in the said embodiment) which drives a main stage can be miniaturized.

In addition, the structure of the mask stage apparatus with which the liquid crystal exposure apparatus of the said 1st and 2nd embodiment is equipped is only an example. Hereinafter, the modification of the mask stage apparatus which the liquid crystal exposure apparatus of the said embodiment is equipped is demonstrated. In addition, in the following modifications, the same or similar code | symbol as 1st Embodiment is used, and the description is abbreviate | omitted about the component part same or equivalent to the said 1st Embodiment for the convenience of description and illustration convenience.

<< first modification >>

In FIG. 8, the liquid crystal exposure apparatus 10a which concerns on a 1st modification part is abbreviate | omitted and is shown by partial sectional drawing. In the liquid crystal exposure apparatus 10a, a mask stage apparatus MSTb, a body BDa, a substrate stage apparatus (not shown) (see FIG. 1), and the like are accommodated in a chamber 200 provided on a floor surface (see FIG. 1). have. And in the mask stage apparatus MSTb which concerns on a 1st modification, the guide parts 38a and 38b which support each of the sub-stages 50 and 70 are similar to the ceiling of the chamber 200, respectively, 239a and 239b. The point fixed in the suspended state through) is different from the first and second embodiments. In addition, the guide part 38b is accommodated in the recessed part 231 opened to the upper surface (+ Z direction) formed in the upper surface of the barrel surface plate 31a. In addition, although the illustration is abbreviate | omitted in FIG. 8, each of the similar members 239a and 239b is formed in the X-axis direction, and is formed in pair, and the both ends of the guide part 38a, 38b in the X-axis direction are formed. I hang on the ceiling and support it.

In the mask stage device MSTb according to the first modification, the body BDa (and the substrate stage device not shown) are compared with the respective embodiments as long as the sub-stage guides are not disposed on both sides of the body BDa. ) Can be enlarged. In addition, you may mount the masking blade apparatus mounted in the mask stage apparatus of 2nd Embodiment to the mask stage apparatus MSTb of the 1st modification shown in FIG.

<< second modification >>

Next, 2nd modified examples of the said 1st, 2nd embodiment are demonstrated. 9, a partially omitted perspective view of the mask stage device MSTc according to the second modification is shown. In the mask stage apparatus MSTc shown in FIG. 9, the position of the pair of X moving mirrors 48x fixed to the main stage 340 differs from the said 1st, 2nd embodiment. On the lower surface of the main body portion 341 of the main stage 340, a pair of recessed portions 347 opened to the -X side are spaced apart in the Y-axis direction. Each of the pair of X moving mirrors 48x is accommodated in each of the pair of recesses 347 and is fixed to the main body portion 341. In the mask stage device MSTc according to the second modification, since the pair of X moving mirrors 48x is disposed inside the main body portion 341, for example, the main body portion 341 is in the θy direction, for example. Even if it fluctuates, the angle change of the reflection surface can be suppressed, and therefore, the position control of the main stage 340 can be performed with high precision. Moreover, since rigidity of a mounting position can be made higher than the X moving mirror mounting position of the said 1st, 2nd embodiment, the natural frequency of an X moving mirror part can be raised and a control performance can be improved.

<< third embodiment >>

Next, the liquid crystal exposure apparatus of 3rd Embodiment is demonstrated based on FIGS. 10-13. Here, about the same or equivalent component part as 1st Embodiment mentioned above, while using the same or similar code | symbol, the description is abbreviate | omitted or abbreviate | omitted.

The top view of the mask stage apparatus MSTd which the liquid crystal exposure apparatus 1000 of 3rd Embodiment has is shown in FIG. 10, and the side view which looked at the mask stage apparatus MSTd from + X direction is shown in FIG. The liquid crystal exposure apparatus 1000 of the third embodiment is different from the liquid crystal exposure apparatus 10 of the first embodiment described above except that the liquid crystal exposure apparatus 1000 has a mask stage apparatus MSTd instead of the mask stage apparatus MST. It has the same configuration. Below, only the structure of the mask stage apparatus MSTd is demonstrated.

Although the mask stage apparatus MSTd which concerns on 3rd embodiment is comprised similarly to the mask stage apparatus MST which concerns on 1st embodiment as a whole when it is clear comparing FIG. 10 and FIG. 2, for example, Some configurations are different. Hereinafter, 3rd Embodiment is described centering on such a difference.

In the mask stage apparatus MSTd, instead of the pair of positioning apparatuses 90 mentioned above, the locking apparatus 100a, 100b which connects the main stage 40 and the sub stage 50 shown in FIG. The lock apparatus 100c, 100d which connects the stage 40 and the substage 70 is provided. Here, the lock apparatus 100a and the lock apparatus 100b have substantially the same structure. In addition, the lock apparatus 100c and the lock apparatus 100d have substantially the same structure.

In FIG. 12 (A), the configuration of the locking device 100a on the −Y side and the + X side of the main stage 40 is schematically shown on behalf of the locking devices 100a and 100b.

As shown to FIG. 12 (A), the lock apparatus 100a has the lock part 101 fixed to the + Y side edge part of the upper surface of the Y stage 55 via the fixing member 102 of cross section L shape. Have In this embodiment, the above-mentioned gap sensor 67 for Y-axis direction measurement is being fixed to the fixing member 102 via the mounting member 67a of cross-sectional L shape.

The lock portion 101 has a shaft 103 extending in the Z axis direction and movable in the Z axis direction. The method of driving the shaft 103 in the Z axis direction is not particularly limited, and can be driven by, for example, an air cylinder device or a solenoid. The ball 104 is fixed to the lower end of the shaft 103. On the other hand, the plate-like support member 105 is fixed to the −Y side end portion of the upper surface of the main body portion 41 of the main stage 40. The above-mentioned target 49b which is the object which measures a gap with the gap sensor 67 is being fixed to the upper surface of the support member 105. As shown in FIG.

One end of the supporting member 106, which is a plate-shaped member having a cross-sectional L shape, is fixed to the lower surface of the -Y side end of the supporting member 105. On the upper surface of the other end (-Y side end) of the supporting member 106, an engaging member 107 made of a disc-shaped (low-cylindrical cylindrical) member below the shaft 103 (a position facing the ball 104). ) Is fixed. On the upper surface of the engaging member 107, a conical recess 107a opened upward (+ Z side) is formed.

As shown to FIG. 12 (A), in the state in which the shaft 103 is arrange | positioned at the + Z side edge part of the movable range with respect to the Z-axis direction, and the ball 104 and the engagement member 107 are separated, the main stage 40 is not constrained to the substage 50. On the other hand, as shown in FIG. 12 (B), when the shaft 103 moves in the -Z direction and the ball 104 is fitted to the recessed portion 107a, the main stage 40 and the sub stage 50 become The relative movement in the XY plane is limited. Moreover, since the locking device 100a (and the locking device 100b) is a structure which makes the ball 104 fit into the conical recessed part 107a, the main stage 40 shown to FIG. 12 (B) is shown. Is restrained by the sub-stage 50, the relative positional relationship between the main stage 40 and the sub-stage 50 is always the same.

On the other lock apparatus 100b side, as shown in FIG. 10, the gap sensor 66 for X-axis direction measurement is fixed to the X stage 54 via the predetermined | prescribed fixing member, and gap by the gap sensor 66 is carried out. The above-described target 49a which is an object to measure is fixed to the upper surface of the supporting member fixed to the main stage 40. Each of the gap sensor 66 and the target 49a is fixed to the fixing member and the supporting member toward the side where the measurement direction of the gap becomes the X axis direction.

In FIG. 13, the schematic configuration of the lock device 100c on the + Y side and the + X side of the main stage 40 is shown on behalf of the lock devices 100c and 100d. As shown in FIG. 13, the lock apparatus 100c has a structure which flips the lock apparatus 100a shown to FIG. 12A up and down. That is, the lock apparatus 100c has the lock part 101 fixed to the Y stage 75 via the fixing member 102, and the lock part 101 is movable up and down, and the ball 104 is located in the upper end. This fixed shaft 103 is provided. The above-mentioned gap sensor 87 for Y axis direction measurement is being fixed to the fixing member 102. On the other hand, the engagement member 107 which has the conical recessed part 107a opened downward through the support members 105 and 106 is being fixed to the main stage 40. As shown in FIG. The target 49d described above, which is the target for measuring the gap with the gap sensor 87, is fixed to the supporting member 106. The lock device 100c connects the main stage 40 and the sub-stage 70 by fitting the ball 104 to the recess 107a, similarly to the lock device 100a, and in the XY plane. Limit relative movement in.

Returning to FIG. 10, on the other lock apparatus 100d side, the X-axis direction measurement gap sensor 86 is fixed to the fixing member 102, and the above-mentioned target which is an object which measures a gap with the gap sensor 86 ( 49c is fixed to the upper surface of the supporting member 105, but each of the gap sensor 86 and the target 49c supports the fixing member 102 and the side toward the side where the measurement direction of the gap becomes the X-axis direction. It is fixed to the member 105.

As shown in FIG. 10, in the state which connected the main stage 40 to each of the sub-stages 50 and 70 using the lock apparatus 100a-100d, each of the X stages 54 and 74 by X linear motor is carried out. Is driven in the X-axis direction, the main stage 40 is driven in the X-axis direction without using XVCM1 and XVCM2 (see FIG. 11), and the main stage 40 is accelerated to the target speed during exposure, or the main stage 40 is rotated. You can slow it down. For this reason, it is not necessary to use the thing which can generate big thrust as XVCM1 and XVCM2, and XVCM1 and XVCM2 can be miniaturized. Similarly, when driving the Y stages 55 and 75 in the Y axis direction using the Y linear motor, the main stage 40 can be driven in the Y axis direction without using YVCM (see FIG. 11).

Moreover, in the liquid crystal exposure apparatus 1000 of this 3rd Embodiment, since the absolute position of the main stage 40 by a laser interferometer system cannot be measured, for example at the time of operation | movement of an apparatus, the main stage ( It is necessary to position 40 at a predetermined measurement origin position (not shown). At this time, the main control unit (not shown) connects the sub-stages 50 and 70 and the main stage 40 by using the lock devices 100a to 100d, and uses the sub-stages 50 and 70 to form the main stage. Pull 40 to the measurement origin position. Then, after the main controller 40 is positioned at the measurement home position, the main controller 40 releases the connection by the locking devices 100a to 100d, and the aforementioned gap sensors 66, 67, 86, and 87 ( Based on the output of FIG. 10), the interferometer system is preset while monitoring the position shift.

Moreover, in each lock apparatus 100a-100d, the contact surface of the outer peripheral surface of each ball 104 and the taper surface which forms each recessed part 107a is represented by the main stage (B) typically, as shown to FIG. 12 (B). The position of each engagement member 107 is set so that it may be arrange | positioned on the plane parallel to the XY plane containing the center of gravity position CG of 40). Therefore, in a state where the sub-stages 50 and 70 and the main stage 40 are connected by using the locking devices 100a to 100d, the sub-stages 50 and 70 are together in the X-axis direction and / or the Y-axis direction. When it drives, the pressing force which the sub stages 50 and 70 pressurize the main stage 40 acts in the plane parallel to the XY plane containing the center of gravity position CG of the main stage 40. As shown in FIG. Therefore, when driving the main stage 40 in the X-axis direction and / or the Y-axis direction, the moment (pitching moment) about the axis orthogonal to the driving direction does not act on the main stage 40, so that the main stage ( 40) can be stably guided along the XY plane. In the locking devices 100a to 100d, the outer circumferential surface of the ball 104 and the tapered surface forming the concave portion 107a contact without gaps, so that the main stage 40 is pressed against each of the sub-stages 50 and 70. In this case, a large pressing force can be applied.

As shown in FIG. 10, the mask stage device MSTd of the third embodiment includes stopper devices 120a and 120b that limit the relative movement range of the main stage 40 and the sub-stage 50. The stopper apparatus 120c, 120d which limits the relative movement range of the main stage 40 and the substage 70 is provided. Here, the stopper device 120a and the stopper device 120b have substantially the same configuration. In addition, the stopper device 120c and the stopper device 120d have substantially the same configuration. In FIG. 12 (A), the configuration of the stopper device 120a on the -Y side and the + X side of the main stage 40 is represented by representing four stopper devices.

As shown to FIG. 12 (A), the stopper member 121 is attached to the lower end of the fixing member 102 mentioned above. The stopper member 121 is formed in a rectangular frame shape (a shape having a rectangular outer shape and a rectangular opening portion (through hole) in the center) in plan view. And the support member 106 mentioned above is accommodated in the opening part of the stopper member 121. As shown in FIG. The support member 106 has a buffer pad 123 formed on a surface opposite to the stopper member 121 (that is, four sides of the + X side, the -X side, the + Y side, and the -Y side), for example, made of a rubber material. (-X side buffer pad is not shown) is fixed. A predetermined clearance (gap) is formed between each of the buffer pads 123 fixed to the + X side, the -X side, the + Y side, and the -Y side of the support member 106 and the stopper member 121.

In the state shown in FIG. 12 (A), + X of the main stage 40 and the sub-stage 50 when the main stage 40 moves in the X-axis direction and / or the Y-axis direction with respect to the sub-stage 50, Clearances formed between the stopper member 121 and the support member 106 (buffer pad 123) in the relative movement amounts (ie, relative ranges) in the -X, + Y, and -Y directions (ie, in the horizontal plane) Limited by the width of the. Moreover, the schematic structure of the stopper device 120c is shown by FIG. The stopper device 120c also has a stopper member 121 formed in a rectangular frame shape fixed to the fixing member 102 similarly to the stopper device 120a and accommodating the supporting member 106 in the opening. The relative movable range of the stage 40 and the substage 70 is limited in accordance with the width of the clearance between the stopper member 121 and the support member 106 (buffer pad 123).

As a result, the lock devices 100a to 100d are not connected to the main stage 40 and the substages 50 and 70 (see Fig. 12 (A)) to use the substages 50 and 70. When the main stage 40 is driven with a predetermined stroke in the X-axis direction and / or the Y-axis direction, for example, the sub-stages 50 and 70 are urgently stopped, and the main stage 40 is driven by its inertia. Even if it moves in the X-axis direction and / or the Y-axis direction, the four stopper members 121 abut against each of the buffer pads 123 on the four periphery of the corresponding support member 106, whereby the main stage 40 Movement away from the sub stages 50 and 70 is prevented.

The structure of the other part of the liquid crystal exposure apparatus 1000 is the same as that of the liquid crystal exposure apparatus 10 of 1st Embodiment mentioned above, and performs the same exposure operation.

As described above, the liquid crystal exposure apparatus 1000 of the third embodiment is configured in the same manner as the liquid crystal exposure apparatus 10 of the first embodiment described above except for a part of the mask stage apparatus MSTd. The equivalent effect can be obtained. In addition to this, in the liquid crystal exposure apparatus 1000 (the mask stage apparatus MSTd with which it is equipped) of 3rd Embodiment, the center of gravity position of the main stage 40 using the lock apparatus 100a-100d ( Since the main stage 40 and the sub-stages 50 and 70 can be connected to each other in the plane including the CG), the main stage 40 is moved in the X-axis direction and without using XVCM1, XVCM2, and YVCM. / Or drive in the Y-axis direction as appropriate. Therefore, as XVCM1, XVCM2, and YVCM, a small thrust can be used, and since a power consumption can be suppressed by this, cost reduction can be aimed at. In addition, the lock apparatuses 100a to 100d have a simple structure, have a small number of failures, and have a weak operation, and therefore can reduce costs and are excellent in maintainability.

In the mask stage device MSTd according to the third embodiment, the main stage 40 and the sub-stage 50 are locked at two points using the lock devices 100a and 100b. Since the stage 70 is connected at two points (four points in total) using the locking devices 100c and 100d, respectively, the main stage 40 does not rotate in the? Z direction. Moreover, since the lock 103 (100a-100d) moves in the Z-axis direction, the lock apparatus 100a-100d can connect each of the main stage 40 and the substage 50, 70 quickly, and also the X-axis direction and Y Rigidity about the axial direction is high. In addition, as for the lock apparatus, on the contrary, the engaging member to which the movable shaft is fitted in the main stage and the ball fixed to the shaft may be provided in the substage side, respectively. However, as mentioned above, forming the shaft which is a movable member in the substage is advantageous because the main stage can be reduced in weight.

In addition, since the mask stage apparatus MSTd has the stopper apparatus 120a-120d which limits the relative movable range of each of the main stage 40 and the substage 50, 70, for example, a substage Even when the 50 and 70 are emergency stopped, the main stage 40 can be prevented from falling off from the sub stages 50 and 70 due to the inertia. Moreover, since the buffer pad 123 was formed in the contact surface of each of the main stage 40 and the substages 50 and 70, the impact at the time of the collision is alleviated.

In addition, the structure of the mask stage apparatus with which the liquid crystal exposure apparatus of the said 3rd embodiment is equipped is only an example. Hereinafter, the modification of the mask stage apparatus which the liquid crystal exposure apparatus of the said 3rd embodiment is equipped is demonstrated. In addition, in the following modification, the same code | symbol is used about the same or equivalent component part, and description is abbreviate | omitted for the sake of simplicity of description and convenience of illustration.

14, the schematic structure of the lock apparatus 200a of the mask stage apparatus MSTe of the modification, and the stopper apparatus 220a is shown. In addition, similarly to the above embodiment, four lock apparatuses and a stopper apparatus are formed on the -Y side and the + Y side of the main stage 40, respectively, in total of four, and one of them is shown in FIG. 14 (the main stage). The locking device 200a and the stopper device 220a on the -Y side and + X side of 40 are representatively shown.

As for the stopper apparatus 200a of the mask stage apparatus MSTe of a modification, the contact surface of the stopper member 121 and the support member 106 (buffer pad 123) has the center of gravity position CG of the main stage 40. It is disposed on a plane containing. Therefore, when the support member 106 (buffer pad 123) and the stopper member 122 abut and the relative movement of each of the main stage 40 and the substages 50, 70 is restricted, the stopper member 121 ) And the support member 106 abut (collide) in the plane including the center of gravity position CG of the main stage 40, so that the moment around the axis orthogonal to the direction of movement of the main stage 40. (Pitching Moment) does not work. For this reason, even if the stopper member 121 and the support member 106 collide with each other, the attitude of the main stage 40 is largely prevented from being disturbed. In addition, in the mask stage apparatus MSTe of this modification, the connection position of each of the main stage 40 and the substages 50 and 70 by the lock apparatus 200a is the center of gravity position CG of the main stage 40. ) Is the + Z side of the plane including the center, the distance to the plane including the center of gravity position (CG) of the main stage 40 is a small amount, and the main stage 40 and the sub at four points in the XY plane Since each of the stages 50 and 70 is connected, the main stage 40 can be driven with good precision along the XY plane substantially in the same manner as in the above embodiment. In addition, it is not limited to this, For example, the connection position of each main stage by a lock apparatus, a pair of substage, and the contact position of each main stage and a pair of sub-stage set by a stopper apparatus, respectively, It is good also as a two-dimensional plane containing the center-of-gravity position CG of a main stage. Moreover, although the locking device was formed in four points in total, two on both sides of the main stage, it is not limited to this and may be three points, if not on the same straight line. In addition, the member which contacts the ball may not be a cone, but may be a groove-shaped thing extended in one axial direction (for example, X-axis direction or Y-axis direction).

In the third embodiment, the pair of sub-stages may be movable only in the scanning direction. In the first to third embodiments described above, the main stage and the pair of substages are integrally formed by the YVCM and at least one of the pair of XVCM1 and XVCM2, and / or the locking devices 100a to 100d. Although the case where the 1st state which can be driven by the 2nd state and the 2nd state which cannot drive the main stage and a pair of substage integrally was set was switched, the 1st state which can drive the main stage and a pair of substage integrally was explained. The configuration of the state setting device for switching between the first state and the second state in which the main stage and the pair of substages cannot be driven integrally is not limited to these.

<< 4th embodiment >>

Next, the exposure apparatus of 4th Embodiment is demonstrated based on FIGS. 15-19.

Here, about the same or equivalent component part as 1st, 3rd embodiment mentioned above, while using the same or similar code | symbol, the description is abbreviate | omitted or abbreviate | omitted.

15, the top view of the mask stage apparatus which the liquid crystal exposure apparatus 2000 of 4th Embodiment has is shown. The liquid crystal exposure apparatus 2000 of the third embodiment is the liquid crystal exposure apparatus 10 of the first embodiment described above, except that the liquid crystal exposure apparatus 2000 has the mask stage apparatus MSTf instead of the mask stage apparatus MST. It has the same configuration. Below, only the structure of the mask stage apparatus MSTf is demonstrated.

Although the mask stage apparatus MSTf which concerns on 4th embodiment is comprised similarly to the mask stage apparatus MST which concerns on 1st embodiment as a whole when it is clear comparing FIG. 15 and FIG. 2, for example, Some configurations are different. Hereinafter, 4th Embodiment is described centering on such a difference.

As shown in FIG. 15, the mask stage apparatus MSTf connects the lock apparatus 100a, 100b which connects the main stage 40 and the substage 50, and the main stage 40 and the substage 70. FIG. The locking devices 100c and 100d to be connected are included together with the pair of positioning devices 90. In addition, the lock apparatus 100a and the lock apparatus 100b have substantially the same structure. In addition, the lock apparatus 100c and the lock apparatus 100d have substantially the same structure. In FIG. 16A, the configuration of the locking device 100a on the −Y side and the + X side of the main stage 40 is schematically shown on behalf of the locking devices 100a and 100b. As apparent when comparing Fig. 16 (A) with Fig. 12 (A), the locking devices 100a and 100b are configured in the same manner as the locking devices 100a and 100b of the third embodiment described above.

Therefore, as shown to FIG. 17 (A), in the state in which the shaft 103 is arrange | positioned at the + Z side of the movable range with respect to the Z-axis direction, and the ball 104 and the engagement member 107 are separated, Stage 40 is not constrained to substage 50. On the other hand, as shown in FIG. 17 (B), when the shaft 103 moves in the -Z direction and the ball 104 is fitted to the recessed portion 107a, the main stage 40 and the sub-stage 50 become The relative movement in the XY plane is limited. In addition, since the lock apparatus 100a (and the lock apparatus 100b) is a structure which makes the ball 104 fit into the conical recessed part 107a, the main stage 40 shown to FIG. 17 (B). Is restrained by the sub-stage 50, the relative positional relationship between the main stage 40 and the sub-stage 50 is always the same as in the positioning apparatus 90 described above.

In FIG. 18, the schematic configuration of the lock device 100c on the + Y side and the + X side of the main stage 40 is shown on behalf of the lock devices 100c and 100d. As is apparent from FIG. 18 and FIG. 13, the lock devices 100c and 100d are configured in the same manner as the lock devices 100c and 100d of the third embodiment described above. The lock device 100c connects the main stage 40 and the sub-stage 70 by fitting the ball 104 to the recess 107a, similarly to the lock device 100a, and in the XY plane. Limit relative movement in.

Returning to FIG. 15, in the state in which the main stage 40 is connected to each of the sub-stages 50 and 70 using the lock devices 100a to 100d, the X stages 54 and 74 are each formed by the X linear motor. By driving in the X-axis direction, the main stage 40 can be driven in the X-axis direction without using XVCM1 and XVCM2, and the main stage 40 can be accelerated to the target speed during exposure or the main stage 40 can be decelerated. For this reason, it is not necessary to use the thing which can generate big thrust as XVCM1 and XVCM2, and XVCM1 and XVCM2 can be miniaturized. Similarly, when driving the Y stages 55 and 75 in the Y axis direction using the Y linear motor, the main stage 40 can be driven in the Y axis direction without using the YVCM. In the locking devices 100a to 100d, the outer circumferential surface of the ball 104 and the tapered surface forming the concave portion 107a contact without gaps, so that the main stage 40 is pressed against each of the sub-stages 50 and 70. In this case, a large pressing force can be applied. In addition, each of the lock devices 100a to 100d uses the pair of positioning devices 90 described above to operate the main stage 40 near the measurement origin position (the ball 96 and the recess 92 correspond to each other). It is also used when positioning at the position (for example, see FIG. 16 (A)).

In addition, as shown in FIG. 15, the mask stage apparatus MSTf of this 4th Embodiment is the stopper apparatus 120a ', 120b' which limits the relative movement range of the main stage 40 and the substage 50. Moreover, as shown in FIG. And stopper devices 120c 'and 120d' that limit the relative movement range of the main stage 40 and the substage 70. The stopper device 120a 'and the stopper device 120b' have substantially the same configuration. In addition, the stopper device 120c 'and the stopper device 120d' have substantially the same configuration. In FIG. 17A, the configuration of the stopper device 120a 'on the -Y side and the + X side of the main stage 40 is represented by representative of the four stopper devices.

As shown to FIG. 17 (A), the rotating shaft 122 which makes X axis direction an axial direction is formed in the lower end of the above-mentioned fixing member 102. As shown to FIG. At the lower end of the fixing member 102, a member 124 is mounted to enable a rotational movement (reciprocating rotation) about the rotation shaft 122, and one end of the member 124 has a planar rectangular frame shape as described above. Stopper member 121 is fixed integrally. In this case, the member 124 and the stopper member 121 have an L shape when viewed from the + X side.

The stopper member 121 is rotated about the rotating shaft 122 by an actuator (not shown). As shown to FIG. 17 (A), the support member 106 mentioned above is accommodated in the opening part of the stopper member 121. As shown to FIG. The branch member 106 has a buffer pad 123 formed on a surface opposite to the stopper member 121 (that is, four sides of the + X side, the -X side, the + Y side, and the -Y side), for example, made of a rubber material. (-X side buffer pad is not shown) is fixed. A predetermined clearance (gap) is formed between each of the buffer pads 123 fixed to the + X side, the -X side, the + Y side, and the -Y side of the support member 106 and the stopper member 121.

In the state shown in FIG. 17A, when the main stage 40 moves in the X-axis direction and / or the Y-axis direction with respect to the sub-stage 50, + X of the main stage 40 and the sub-stage 50, Clearances formed between the stopper member 121 and the support member 106 (buffer pad 123) in the relative movement amounts (ie, relative ranges) in the -X, + Y, and -Y directions (ie, in the horizontal plane) Limited by the width of the. 18, the schematic structure of the stopper apparatus 120c 'is shown. Like the stopper device 120a ', the stopper device 120c' also has a stopper member 121 that is rotatably mounted to the fixing member 102 around the rotation shaft 122 and integrally with the member 124. The relative movable range of the main stage 40 and the substage 70 is limited according to the clearance width between the stopper member 121 and the support member 106 (buffer 123).

As a result, the lock apparatuses 100a to 100d are not connected to the main stage 40 and the substages 50 and 70 (see Fig. 17A), and the substages 50 and 70 are used. When the main stage 40 is driven with a predetermined stroke in the X-axis direction and / or the Y-axis direction, for example, the sub-stages 50 and 70 are urgently stopped, and the main stage 40 is driven by its inertia. Even if it moves in the X-axis direction and / or the Y-axis direction, the four stopper members 121 abut against each of the corresponding support members 106 so that the main stage 40 moves away from the sub-stages 50, 70. (Overrun) is prevented.

Moreover, in each stopper apparatus 120a '-120d', the contact surface of each stopper member 121 and each support member 106 is representative of FIG. 17 (A) and FIG. 18 (A), for example. As shown, the position of each stopper member 121 and each support member 106 is set so that it may be arrange | positioned on the plane parallel to the XY plane containing the center of gravity position CG of the main stage 40. As shown in FIG. Therefore, when each stopper apparatus 120a'-120d 'is used, ie, the stopper member 121 and each support member 106 abut, the movement of the main stage 40 is stopped, and the main stage 40 is stopped. ) Does not act on the axis (pitching moment) about the axis orthogonal to the moving direction, and the posture of the main stage 40 can be prevented from being greatly disturbed.

In FIG. 19, the state where the stopper member 121 rotated about the rotating shaft 122 with the actuator of illustration not shown, and separated from the support member 106 is shown. In the state shown in FIG. 19, the sub stage 50, 70 can move on the sub stage guide 37a, 37b in the X-axis direction, respectively, away from the main stage 40. FIG. At this time, the main stage 40 is stopped on the pair of main stage guides 35 by using the pair of positioning devices 90 described above (see Figs. 16 (A) and 16 (B)). Just put it. In the case of the fourth embodiment, as shown in FIG. 15, since the gap sensors 66 and 86 are disposed on the -X side with respect to the corresponding targets 49a and 49c, respectively, the sub-stage ( 50 and 70 can move away from the main stage 40 only in the -X direction with respect to the main stage 40. As a case where the sub stages 50 and 70 are separated from the main stage 40, for example, the case where maintenance of the sub stages 50 and 70 is performed is mentioned.

The structure of the other part of the liquid crystal exposure apparatus 2000 is the same as that of the liquid crystal exposure apparatus 10 of 1st Embodiment mentioned above, and performs the same exposure operation.

As described above, the liquid crystal exposure apparatus 2000 of the fourth embodiment is configured in the same manner as the liquid crystal exposure apparatus 10 of the first embodiment described above except for a part of the mask stage apparatus MSTf. The equivalent effect can be obtained. In addition, since the liquid crystal exposure apparatus 2000 of this 4th Embodiment is equipped with lock apparatus 100a-100d of the same structure as the liquid crystal exposure apparatus 1000 of 3rd Embodiment mentioned above, the liquid crystal exposure apparatus is provided. Similarly to 1000, the main stage 40 may be appropriately driven in the X axis direction and / or the Y axis direction without using XVCM1, XVCM2, and YVCM. Therefore, as XVCM1, XVCM2, and YVCM, small thrust can be used, and since it can suppress power consumption, cost can be reduced. In addition, in the liquid crystal exposure apparatus 2000 of the fourth embodiment, the main stage 40 and the substage 50 are locked at two points using the lock apparatuses 100a and 100b. Since 70 is respectively connected at two points (four points in total) using the lock apparatuses 100c and 100d, the main stage 40 does not rotate in the? Z direction. Moreover, since the lock 103 (100a-100d) moves to the Z-axis direction, the lock 103 (100a) can connect each of the main stage 40 and the substage 50, 70 quickly.

Moreover, the mask stage apparatus MSTf which concerns on this 4th Embodiment has the stopper apparatus 120a '-120d' which limits the relative movable range of each of the main stage 40 and the substage 50,70. Therefore, similarly to the liquid crystal exposure apparatus 1000 of the above-described third embodiment, for example, even when the sub-stages 50 and 70 are urgently stopped, for example, the main stage 40 is the sub-stage due to its inertia. Falling from (50, 70) can be prevented. Moreover, since the buffer pad 123 was formed in the contact surface of each of the main stage 40 and the substages 50 and 70, the impact at the time of the collision is alleviated.

In addition, unlike each of the stopper devices 120a to 120d described above, each of the stopper devices 120a 'to 120d' is not fixed to the stopper member 121, but each of the main stage 40 and the substages 50 and 70. It is comprised so that a movement is possible between the position (restriction position) which restricts the relative movement of and the position (release position) which does not restrict the relative movement. For this reason, the main stage 40 and the sub stage 50, 70 can also be isolate | separated by arrange | positioning the stopper member 121 in the said release position. In addition, in the stopper apparatus 120a '-120d', the movable stopper member may be formed in the main stage, and the member which abuts on the stopper member may be provided in the substage side, respectively. However, as mentioned above, forming the stopper member which is a movable member in the substage is advantageous because the main stage can be reduced in weight.

<< 5th embodiment >>

Next, the liquid crystal exposure apparatus of 5th Embodiment is demonstrated. In the liquid crystal exposure apparatus of the fifth embodiment, a pair of guides supporting a point where a mask loader device for exchanging a mask with a main stage is formed in the mask stage device, and a pair of sub-stages, respectively. It has the same structure as the liquid crystal exposure apparatus 2000 of 4th Embodiment except the point which is longer in an X-axis direction than 4th Embodiment (and 1st-3rd embodiment). Hereinafter, only the configuration of the mask loader device will be described. In addition, for the sake of simplicity of explanation and convenience of illustration, the same reference numerals are used for the same or equivalent components as those of the first and fourth embodiments, and the description thereof is omitted.

20, the top view of the mask stage apparatus MSTg which concerns on 5th Embodiment is shown. In addition, from the viewpoint of avoiding the appearance of the drawings, the lock devices 100a to 100d, the stopper devices 120a to 120d, the gap sensors 66, 67, 86 and 87, and the targets 49a to 49d (each of Fig. 15). And the like are omitted.

The mask loader device ML is provided with a pair of mask holding devices 130. One pair of mask holding apparatuses 130 is mounted on the upper surface of the Y stage 55 of the sub-stage 50, and the other is mounted on the upper surface of the Y stage 75 of the sub-stage 70. The pair of mask holding devices 130 is substantially the same in configuration except that the pair of mask holding devices 130 are arranged symmetrically (left-right symmetry) with respect to the X axis. Hereinafter, the mask holding apparatus 130 of (-Y side) mounted in the sub stage 50 is demonstrated.

FIG. 21 is a cross-sectional view taken along the line B-B in FIG. 20. The mask holding apparatus 130 has the movable member 131 and the support member 135, as shown in FIG. The movable member 131 consists of a rectangular plate-like member parallel to the XZ plane (see FIG. 20). At the lower end of the movable member 131, a pair of hook members 132 spaced apart in the X-axis direction are fixed. In the mask loader device ML, the -Y side mask holding device 130 supports the -Y side of the mask M (or mask holder (not shown)) with a pair of hook members 132 from the lower side, and + Y The side mask holding device 130 supports the + Y side of the mask M from below with a pair of hook members 132. The movable member 131 is fixed to a state where the pair of Z linear guide members 133 extending in the Z axis direction are separated in the X axis direction (see FIG. 20) on the −Y side surface.

As shown in FIG. 20, the support member 135 consists of a rectangular plate-like member parallel to the XZ plane which opposes the -Y side surface of the movable member 131. As shown in FIG. On the four corners of the + Y side surface of the support member 135, slide members 136 having a U-shaped cross section are respectively fixed (see Fig. 21). Of the four slide members 136, two on the + X side are engaged with the + X side Z linear guide member 133, and two on the -X side are engaged with the -X side Z linear guide member 133. . In addition, a drive device 134 including a feed screw device is formed between the movable member 131 and the support member 135, for example. The movable member 131 is moved up and down (driven in the + Z direction or the -Z direction) with respect to the support member 135 via the drive device 134. The supporting member 135 is fixed on the Y stage 55 via a pair of fixing members 137 having a cross-sectional L-shape and a pair of connecting members 138 parallel to the XY plane. The pair of connecting members 138 are connected by a rectangular plate reinforcing member 139 having the X axis direction in the longitudinal direction. In addition, since the sub-stage 70 is located on the -Z side than the sub-stage 50, the -Y side fixing member 137 has a larger Z-axis dimension than the + Y side fixing member 137 ( For convenience, the same code is used).

Here, as shown in FIG. 22, in the mask stage apparatus MSTg of 5th Embodiment, the length of the X-axis direction of each of the guide parts 338a and 338b is set longer than 4th Embodiment, and is a substage. Each of 50 and 70 can convey the mask M hold | maintained via the mask loader apparatus ML to a predetermined mask replacement position. In this 5th Embodiment, the mask replacement position is arrange | positioned at the -X side rather than the area | region to which the main stage 40 moves, for example at the time of scanning exposure. In addition, when conveying the mask M to the mask exchange position using the sub-stage 50, 70, as shown in FIG. 19, each stopper member of the stopper apparatus 120a '-120d' (refer FIG. 15). 121 is spaced apart from the supporting member 106, and each ball 104 of the locking devices 100a to 100d (see FIGS. 15 and 17 (A)) is spaced apart from each of the engaging members 107. I leave it in a state. In addition, the main stage 40 is stopped on the pair of main stage guides 35 using the pair of positioning devices 90 (see FIGS. 16A and 16B) described above. .

Next, the exchange operation of the mask M made between the mask loader device ML and the main stage 40 will be described. The exchange operation of the mask M described below is performed under the management of a main controller not shown. The main control device drives each of the sub-stages 50 and 70 in the -X direction to position the mask loader device ML at the mask replacement position as shown in FIG. 22. In the mask loader apparatus ML, the mask (not shown) to hold | maintain is replaced by the mask conveyance apparatus which is not shown in the mask exchange position, for example. At this time, the new mask M is placed on the hook member 132. The mask loader device ML holding the new mask M is located above the main stage 40 by the substages 50 and 70 being driven in the X-axis direction (see FIG. 20). At this time, the movable member 131 is located on the + Z side of the movable range in the Z axis direction so as not to contact the main stage 40 (see FIG. 21).

Next, as shown to FIG. 23 (A), the pair of movable members 131 which hold | maintain the mask M by the drive apparatus 134 (refer FIG. 20) is driven to -Z direction (movable member 131). ) Is lowered (see arrows in FIG. 23 (A)). In this way, the mask M is placed on the chuck unit 42. At this time, each member which comprises the mask loader apparatus ML, such as the movable member 131 and the Z linear guide member 133, is all in non-contact with the main stage 40. As shown in FIG. In addition, as shown in FIG. 23 (B), the main control unit drives the movable member 131 in the -Z direction even after the mask M is placed on the chuck unit 42. The mask M is spaced apart. In this state, since the movable member 131, the hook member 132, and the mask M are not in contact with each other, the mask M is connected to the mask M from the outside through the sub-stages 50 and 70, the mask loader device ML, and the like. Transmission of vibrations is prevented. The main controller performs the exposure processing operation in the state shown in FIG. 23B, that is, in the state where the mask loader device ML is in contact with neither the mask M nor the main stage 40. In addition, when the mask M held by the main stage 40 is transmitted to the mask loader device ML, the operation opposite to the above case is performed.

According to the mask stage device MSTg according to the fifth embodiment, the sub-stages 50 and 70 on which the mask loader device ML is mounted can be moved away from the main stage 40 to the mask replacement position. For example, compared with the case where the main stage 40 itself is moved to a mask exchange position, the length (dimension) of the main stage guide 35 which guides the movement of the main stage 40 can be shortened. .

<< 6th embodiment >>

Next, the liquid crystal exposure apparatus of 6th Embodiment is demonstrated. In the liquid crystal exposure apparatus of the sixth embodiment, the configuration of the mask loader apparatus included in the mask stage apparatus differs, and the guide portion supporting the pair of sub-stages is longer in the X-axis direction than the fifth embodiment. Then, it has the same structure as the liquid crystal exposure apparatus of 5th Embodiment. Hereinafter, the configuration of the mask loader device will be described. In addition, about the thing similar to the said 4th and 5th embodiment, the code | symbol same as the said 4th and 5th embodiment is attached | subjected, and the description is abbreviate | omitted.

24, the top view of the mask stage apparatus MSTh of 6th Embodiment is shown. The mask loader apparatus MLb is a conveyance stage 250 mounted with the sub-stage 50 on the guide part 438a and the sub stage 70 mounted with the sub-stage 70 on the guide part 438b. The stage 270 and the pair of mask holding apparatus 130 are provided.

The conveyance stage 250 is arrange | positioned at the -X side of the sub stage 50. As shown in FIG. The stage 250 for conveyance is except that the dimension in the X-axis direction is set to be slightly shorter, and the point of not having the X stator 65 and the gap sensors 66 and 67 (refer to FIG. 15 respectively). It is comprised similarly to the substage 50 including a drive system and a measurement system. That is, the conveyance stage 250 has the X stage 254 which moves on the guide part 438a in the X-axis direction, and the Y stage 255 which moves on the X stage 254 in the Y-axis direction. . The positional information about the X axis direction of the X stage 254 is measured by the X head 258 constituting the X linear encoder together with the X scale 53, and the position regarding the Y axis direction of the Y stage 255. The information is measured by the Y head 259 constituting the Y linear encoder together with the Y scale 264. The position of the conveyance stage 250 is controlled on the guide part 438a independently of the sub-stage 50 by the main control apparatus which is not shown in figure.

The transport stage 270 is disposed on the -X side of the sub stage 70. The stage 270 for conveyance does not have the point in which the dimension of the X-axis direction is set slightly short, and the X stator 85, the Y stator 88, and the gap sensors 86 and 87 (refer FIG. 15, respectively). Except for the points, the drive system and the measurement system are configured in the same manner as the substage 70. That is, the conveyance stage 270 has the X stage 274 which moves the guide part 438b on the X-axis direction, and the Y stage 275 which moves on the X stage 274 in the Y-axis direction. . The positional information about the X axis direction of the X stage 274 is measured by the X head 278 constituting the X linear encoder together with the X scale 73, and the position regarding the Y axis direction of the Y stage 275. The information is measured by the Y head 279 constituting the X linear encoder together with the Y scale 284. The position of the conveyance stage 270 is controlled on the guide part 438b independently of the sub-stage 70 by the main control apparatus which is not shown in figure.

One pair of mask holding devices 130 is fixed to the upper surface of the Y stage 255, and the other is fixed to the upper surface of the Y stage 275. In addition, since the structure of the pair of mask holding apparatus 130 is substantially the same as the said 5th Embodiment, the description is abbreviate | omitted. Moreover, as shown in FIG. 24, in mask stage apparatus MSTh, guide parts 438a and 438b are formed longer in each of the + X and -X directions than the guide part of the said 5th Embodiment.

Next, the transfer operation of the mask M between the main stage 40 and the mask loader device MLb in the mask stage device MSTh of the sixth embodiment will be described. The exchange operation of the mask M is performed under the management of a main controller not shown.

When sending and receiving the mask M to the main stage 40, the main controller first places the mask loader apparatus MLb which hold | maintained the mask M as shown in FIG. 24 at the mask replacement position. In the mask loader device MLb, the mask to be held is replaced by a mask conveyance device (not shown), for example. In addition, the main controller separates the sub stages 50 and 70 from the main stage 40 and positions them on the + X side of the main stage 40. In addition, in this 6th Embodiment, the gap sensor used for measuring the space | interval regarding the X-axis and Y-axis direction of each of the main stage 40 and the sub-stages 50 and 70, and a target (not shown respectively) In contrast to the fourth embodiment (refer to FIG. 15), the arrangement of the gap sensors is arranged on the + X side of the corresponding target (not shown). As a result, the sub-stages 50 and 70 can move away from the main stage 40 in the + X direction.

Subsequently, as shown in FIG. 25, the main controller controls the X linear motor to drive the mask loader device MLb holding the mask M in the + X direction, thereby driving the mask M of the main stage 40. Position it up. Thereafter, similarly to the fifth embodiment, as shown in FIG. 23A and FIG. 23B, the movable member 131 of the mask loader device MLb is moved downward, and the mask M is moved. It is sent to and received from the chuck unit 42.

Thereafter, as shown in FIG. 26A, the main controller controls the Y linear motor to drive the Y stage 255 in the -Y direction and the Y stage 275 in the + Y direction, respectively, to move the movable member 131. ) (Hook member 132) is separated from mask M (see arrow in Fig. 26 (A)). Subsequently, the main controller controls the drive device 134 (see FIG. 24), and as shown in FIG. 26B, each of the pair of movable members 131 has a lower surface of the hook member 132. It drives upwards (+ Z direction) to the position which becomes higher than the upper surface of the stage 40 (refer the arrow of FIG. 26 (B)).

Subsequently, as shown in FIG. 27, the main controller controls the X linear motor to drive the mask loader device MLb in the -X direction to position the mask replacement position, and to respectively position the sub-stages 50 and 70. It is driven in the X direction and positioned on the −Y side and the + Y side of the main stage 40 so as to be replaced with the mask loader device MLb. Thereafter, the main stage 40 and the sub-stages 50 and 70 are each connected in a non-contact state (electronically) or in a contact state (mechanically), and the main stage ( The scanning exposure operation is performed by driving 40 in the X axis direction. In addition, in the case of scanning exposure, when the main stage 40 moves in the movement range, each of the sub stages 50 and 70 contacts each of the transfer stages 250 and 270 of the mask loader device MLb. The lengths of the guide portions 438a and 438b are set so as not to.

According to the mask stage apparatus MSTh of 6th Embodiment demonstrated above, in addition to the effect acquired by the mask stage apparatus MSTg of the said 5th Embodiment, a pair of mask holding apparatus 130 of the mask loader apparatus MLb is carried out. ) Is configured to be driven in the X-axis direction by the transfer stages 250 and 270, which are members different from the sub stages 50 and 70, respectively, so that the sub stages 50 and 70 can be reduced in weight, respectively. The load of the linear motor which drives the stages 50 and 70 can be reduced. In the mask stage device MSTh of the sixth embodiment, the pair of mask holding devices 130 of the mask loader device MLb is the substages 50 and 70 as shown in FIG. 26 (A). Although the structure was driven in the Y-axis direction by the conveyance stage 250 and 270 of the same structure as (), it is not limited to this, For example, it is set as the structure which can move only a conveyance stage to an X-axis direction, The mask holding device 130 may be configured so that the connecting member 138 (see FIG. 24) of the holding device 130 can be stretched and contracted in the Y axis direction, or on the stage movable only in the X axis direction. It is good also as a structure driven by the direction.

<< seventh embodiment >>

Next, 7th Embodiment is described based on FIGS. 28-31. Here, about the component part same or equivalent to 1st Embodiment mentioned above, while using the code | symbol same or similar to 1st Embodiment, the description is abbreviate | omitted or abbreviate | omitted.

28, the structure of the liquid crystal exposure apparatus 3000 of 7th Embodiment is shown schematically. The liquid crystal exposure apparatus 3000 is a projection exposure apparatus of a step-and-scan method, so-called scanner. In the liquid crystal exposure apparatus 3000 of the seventh embodiment, the above-described cable unit which is used to supply power to a pair of sub-stages is formed in the mask stage apparatus MSTi. Although different from the liquid crystal exposure apparatus 10 of one 1st embodiment, the structure of another part is the same as that of the liquid crystal exposure apparatus 10. FIG. Therefore, below, it demonstrates centering around a difference.

In the liquid crystal exposure apparatus 3000 of the seventh embodiment, as shown in FIG. 28, each of the sub-stage guides 37a and 37b included in the mask stage apparatus MSTi is provided to the sub-stages 50 and 70. Cables, tubes, etc. (hereinafter collectively referred to as cables 99), or substages 50, 70, for supplying power, for example electric power, high pressure gas (e.g. compressed air), etc., and not shown The cable unit 300 of the same structure containing the cables for making an electrical signal transmission and reception between main controllers is formed.

29 is a side view of the cable unit, and FIG. 30 is a cross-sectional view taken along the line C-C of FIG. As shown in FIG. 30, the cable unit 300 has the support part 201 which consists of a cross-sectional U-shaped plate-shaped member fixed to the X stage 54 of the sub stage 50. As shown in FIG. The bearing part 202 which consists of a pair of plate-shaped member spaced apart in the Y-axis direction is fixed to the lower surface of the support part 201, The bearing part 202 is separated by the X-axis direction, as shown in FIG. The pair of rollers 203 are rotatably supported through the pair of rotating shafts 204 each having the Y-axis direction in the axial direction. In addition, the cable unit 300 is rotatable to the shaft 205 fixed between the pair of leg portions 39a (each of the + Y side legs are hidden inside the ground) of the + X side and the -X side. It has a roller 206 supported axially.

In addition, the cable unit 300 includes a cable bundle 99a including a plurality of cables 99 arranged on the + X side of the sub-stage 50, and a plurality of arranged on the −X side of the sub-stage 50. The cable bundle 99b which consists of cables 99 is provided. As shown in FIG. 30, the plurality of cables 99 constituting each of the cable bundles 99a and 99b are spaced apart from each other in the Y-axis direction, and each of the cable bundles 99a and 99b has a long length as a whole. It is formed in a shape. In addition, the cable bundle may be the same as the fusion cable which joined adjacent cables. Each of the plurality of cables 99 constituting the cable bundles 99a and 99b has one end connected to the Y stage 55 of the sub-stage 50 and the other end of which is not shown, for example. It is connected to a switchboard, a main control device, a gas supply device, etc. In addition, although illustration is abbreviate | omitted in FIG. 29 and FIG. 30, the some cable 99 connected to the Y stage 55 is branched on the sub stage 50, and part of it is the X stage 54, or It is connected to the main stage 40 (refer FIG. 28).

As for + X side cable bundle 99a, as shown in FIG. 29, the intermediate part of the other end side (outer side) is being fixed to the + X side leg part 39a by the fixing member 220. As shown in FIG. Moreover, the cable bundle 99a is fixed to the outer peripheral surface of the roller 206 by the fixing member 220 at the intermediate part of one end side rather than the part fixed to the leg part 39a. In addition, the cable bundle 99a has a plurality of fixing members 220 on the outer circumferential surface of the + X side roller 203 of the pair of rollers 203 at one end portion of the cable bundle 99a than the portion fixed to the roller 206. It is fixed by. In the area | region between the part fixed to the roller 206 in the cable bundle 99a, and the part fixed to the roller 203, the substage 50 shown in FIG. 29 is the center of the movement range regarding the X-axis direction. It is bent downward (slanted by gravity) in a state positioned at.

Moreover, as shown in FIG. 30, the area | region at one end side rather than the part fixed to the roller 203 of the cable bundle 99a is bent in a U shape, and the inside of the opening part 201a formed in the support part 201 is shown. The edge part (one end) is connected to the Y stage 55 through space. As shown in FIG. 30, the area | region at one end side rather than the part fixed to the roller 203 of the cable bundle 99a is being fixed to the support part 201 by the fixing member 220. As shown in FIG. Moreover, as shown typically in FIG. 30, each fixing member 220 consists of a some member corresponding to the some cable 99 which comprises the cable bundle 99a. Similarly, in the -X side cable bundle 99b, the middle part of the two points of the longitudinal direction is being fixed to each of the rollers 203 and 206. As shown in FIG.

Next, an example of the operation of the cable unit 300 will be described for the case where the sub-stage 50 moves to the + X side at the position (center position) shown in FIG. 29. As shown in FIG. 31, when the sub stage 50 moves to + X direction, the support part 201 and the bearing part 202 fixed to the X stage 54 move integrally to + X direction, and, accordingly,- The cable bundle 99b having its middle portion fixed to the X-side roller 203 is stretched to the + X side. On the other hand, the + X side cable bundle 99a is further bent downward by the approach of the + X side roller 203 and the + X side roller 206 (stretched by gravity). At this time, each of the pair of rollers 203 and the pair of rollers 206 swings (rotates a predetermined amount in the θy direction), thereby greatly bending the cables 99 that constitute the cable bundles 99a and 99b. Prevents stress from acting In addition, when the sub-stage 50 moves in the -X direction, the cable bundle 99b is bent downward and the cable bundle 99a is stretched in the -X direction as opposed to the case shown in FIG.

The structure of the other part of the liquid crystal exposure apparatus 3000 is the same as that of the liquid crystal exposure apparatus 10 of 1st Embodiment mentioned above, and performs the same exposure operation.

As described above, the liquid crystal exposure apparatus 3000 of the seventh embodiment is the liquid crystal exposure apparatus of the first embodiment described above except that the cable unit 300 is formed in the mask stage apparatus MSTi. Since it is comprised similarly to (10), an equivalent effect can be acquired. In addition, in the mask stage apparatus MSTi included in the liquid crystal exposure apparatus 3000 of the seventh embodiment, the cables 99 for transmitting the force between the sub-stages 50 and 70 and the external apparatus are provided. Each of the included cable bundles 99a and 99b is bent downward by the action of gravity in accordance with the movement of the sub-stages 50 and 70 between the areas fixed to the rollers 203 and 206 or in the horizontal direction. Since the structure is to be tensioned, dust or vibration caused by sliding of the cables 99 and other members is prevented. Accordingly, the cable unit 300 according to the seventh embodiment, like the liquid crystal exposure apparatus 3000 (see FIG. 28), needs to precisely position control the device or the moving body used in the clean room. Particularly suitable for In addition, when the cable bundles 99a and 99b are bent downward or stretched in the horizontal direction, the rollers 203 and 206 each rotate so that the cable bundles 99a and 99b constitute the cable bundles 99a and 99b. Since the bending stress is suppressed from working, it is possible to avoid troubles in which the tube is bent and the channel is blocked, for example. Moreover, since the cable unit 300 which concerns on this 7th Embodiment does not have a member which supports the intermediate part of the cables 99, it is lightweight, and maintenance, such as replacement | exchange operation of the cables 99, is easy.

<< eighth embodiment >>

Next, the mask stage apparatus which the liquid crystal exposure apparatus of 8th Embodiment has is demonstrated. Since the structure of a mask stage apparatus differs from the said 7th embodiment in the liquid crystal exposure apparatus of this eighth embodiment only, the structure of a mask stage apparatus is demonstrated hereafter. 32, the side view which looked at the mask stage apparatus MSTj which concerns on 8th Embodiment from the -Y side. The mask stage device MSTj according to the eighth embodiment has a different configuration than the mask stage device MSTi according to the seventh embodiment. In addition, for the sake of simplicity of description and convenience of illustration, the same or equivalent components as those of the seventh embodiment described above are denoted by the same reference numerals as those of the first embodiment, and the description thereof is omitted.

In the cable unit 300a which concerns on 8th Embodiment, the X-axis direction is made into the longitudinal direction, and the pair of X linear guide members 93 spaced apart in the Y-axis direction are being fixed to the lower surface of the guide part 38a. (The + Y side X linear guide member is hidden inside the ground). Moreover, below the guide part 38a (-Z side), the movable part 210 which consists of a plate member parallel to the XY plane which makes an X-axis direction the longitudinal direction is arrange | positioned. A slider 211 having a U-shaped cross section is fixed to four corners of the upper surface of the movable portion 210 (two sliders on the + Y side are hidden inside the ground). The two sliders 211 on the -Y side are slidably engaged to the -Y side X linear guide member 93, and the two sliders 211 on the + Y side are the + Y side X linear guide member 93. It is slidably fastened to.

The bearing part 212 (the + Y side plate-shaped member is hidden inside drawing) is fixed to the lower surface of the + X side end part of the movable part 210 in the Y-axis direction, and the bearing part 212 is fixed. The roller 213 is rotatably supported by the rotating shaft 214 which makes Y-axis direction the axial direction. And the center part of the area | region between the part fixed to the roller 203 and the part fixed to the roller 206 in the cable bundle 99a is fixed to the roller 213 via the fixing member 220. It is. Moreover, the bearing part 212 is similarly fixed to the lower surface of the -X side end part of the movable part 210, and the roller part 213 is rotatably supported by the bearing part 212 via the rotating shaft 214. The cable bundle 99b is fixed to the roller 213 via the fixing member 220 at the substantially center part of the area | region between the part fixed to the roller 203, and the part fixed to the roller 206. As shown in FIG. Therefore, the pair of rollers 213 integrally move in the X axis direction.

Moreover, the pulley 216 is rotatably supported by each of the pair of bearing parts 212 through the rotating shaft 215 which makes Y-axis direction an axial direction. A rope 217 is wound around the -X side pulley 216. One end of the rope 217 is fixed to the + X side leg portion 39a, and the other end thereof is fixed to the -X side end portion of the bearing portion 202. In addition, although some part is abbreviate | omitted from the viewpoint of avoiding the kind of drawing of FIG. 32, the rope 218 is wound by the + X side pulley 216 similarly. One end of the rope 218 is fixed to the -X side leg portion 39a, and the other end thereof is fixed to the + X side end portion of the bearing portion 202.

In the cable unit 300a, as shown in FIG. 33, when the sub-stage 50 moves in the + X direction, the bearing portion 212 supporting the -X side pulley 216 on which the rope 217 is wound, It is towed by the rope 217 and moves in the + X direction. At this time, the pulley 216 functions as a moving pulley, and the bearing part 212 follows the substage 50 at half the speed of the substage 50. In addition, the + X side bearing part 212 also moves to the + X side at half the speed of the sub-stage 50. In the cable unit 300a according to the eighth embodiment, similarly to the cable unit 300 according to the seventh embodiment, the intermediate portions of the cable bundles 99a and 99b move downward in accordance with the movement of the substage 50. Since the structure is bent (stretched) or stretched in the horizontal direction, similarly to the cable unit according to the seventh embodiment, the effect of preventing dust and vibration can be obtained.

Here, in the cable unit 300a, since the cable bundle 99a, 99b is in the state which the middle part fell, the cable bundle 99 which comprises the cable bundle 99a, 99b has its own weight. Tension acts. Since the horizontal component of the tension acting on the cables 99 tries to move the substage 50 in the X-axis direction, the positional control regarding the X-axis direction of the substage 50 may become difficult. Specifically, as shown in FIG. 33, when the sub-stage 50 is located on the + X side on the guide portion 38a, the tension acting on the + X side cable bundle 99a is generally in the Z axis direction. As a result, the horizontal component, i.e., the force to move the sub-stage 50 in the + X direction is small. On the other hand, since the -X side cable bundle 99b is substantially parallel to the X axis, the horizontal component of the tension due to its own weight becomes larger than the horizontal component of the tension acting on the cable bundle 99a. Due to the difference in the horizontal component of the tension, the force which tries to move in the -X direction acts on the sub-stage 50. However, in the cable unit 300a according to the eighth embodiment, the cable bundles 99a and 99b are supported at three points (rollers 203, 206 and 213), respectively, and the roller 203 and the roller 213 are supported. The lengths of the cable bundles 99a and 99b between the wires) and the lengths of the cable bundles 99a and 99b between the rollers 213 and the rollers 206 are short, respectively. Therefore, the influence on the position control of the sub-stage 50 in the X-axis direction can be reduced.

Moreover, since the bearing part 212 which supports each of the pair of rollers 213 rotatably follows the sub-stage 50 at the speed of half of the sub-stage 50, the roller 213 is always a roller ( 203 and the roller 206 can be positioned in the middle. Moreover, since the bearing part 212 follows the sub-stage 50 using the pulley 216 and the ropes 217 and 218, the structure is simple. Further, since the amount of warpage (the amount of deflection due to gravity) to the lower side of the cable bundle can be made smaller than in the seventh embodiment, the space in the Z-axis direction can be reduced and the space can be saved (the legs may be shorter). .

<< 9th embodiment >>

Next, the mask stage apparatus MSTk which concerns on 9th Embodiment is demonstrated. 34, the side view which looked at the mask stage apparatus MSTk which concerns on 9th Embodiment from the -Y side is shown. The mask stage device MSTk according to the ninth embodiment differs from the support structure of the pair of rollers 213 in comparison with the mask stage device MSTj according to the eighth embodiment. In addition, for simplicity of description and illustration, the same or equivalent components as those of the seventh and eighth embodiments described above are denoted by the same reference numerals as those of the seventh and eighth embodiments, and the description thereof is omitted.

In the cable unit 300b of the mask stage apparatus MSTk according to the ninth embodiment, each of the pair of rollers 213 is formed of a bearing portion 212b composed of a pair of plate members spaced apart in the Y-axis direction ( The + Y side plate-like member is covered by the inside of the ground) so as to be rotatably supported via the rotation shaft 214. Each of the pair of bearing portions 212b is connected to each of the pair of movable members 221 disposed above the guide portion 38a. The pair of movable members 221 are formed on the + X side and the -X side of the sub-stage 50, respectively. On the lower surface of each of the pair of movable members 221, a pair of sliders 222 having a cross-sectional inverted U-shape engaged with the pair of X linear guide members 51 fixed to the guide portion 38a in a slidable state. ) Is fixed (the + Y side X linear guide member and the slider are not shown, respectively). The pair of bearing portions 212b are connected by the connecting member 223 and move integrally with respect to the X axis direction.

Moreover, the pulley 216 is attached to each of the pair of bearing parts 212b via the rotating shaft 215 similarly to the said 8th Embodiment. A rope 224 is wound around each of the pair of pulleys 216. In each of the pair of ropes 224, one end is fixed to the center portion of the lower surface of the guide portion 38a, and the other end is fixed to the support portion 201.

As shown in FIG. 35, the cable unit 300b which concerns on 9th Embodiment also has a pair of bearing part 212b, when the substage 50 is driven in an X-axis direction similarly to the said 8th Embodiment. The rope 224 is towed by the rope 224 and moves at a half speed of the sub stage 50 to follow the sub stage 50. The cable unit 300b according to the ninth embodiment uses a pair of bearing portions 212b using an X linear guide member 51 for guiding the X stage 54 of the sub-stage 50 in the X-axis direction. Is guided in the X-axis direction, so that the number of members is smaller than that of the cable unit 300a according to the eighth embodiment (however, the movable amount in the X direction of the sub-stage 50 is limited).

In addition, the structure of the cable unit which concerns on said 7th-9th embodiment is only an example. For example, in the cable units in each of the seventh to ninth embodiments, the middle portion of the cables is fixed to the outer circumferential surface of the roller made of a cylindrical member, but the members to which the cables are fixed are Since it is only necessary to be able to rotate (swing) the predetermined angle and the θy direction around the rotation axis, respectively, the cylindrical member may not be required. 36, the modification of the cable unit of the said 7th embodiment is shown. As shown in FIG. 36, the cable bundle 99b is the support member 230 which consists of a plate-shaped member of the cross-sectional arc shape rotatably axially supported about the rotating shaft 205, The middle part is fixed member 220 It may be fixed through (In addition, in FIG. 36, illustration of the -Y side plate member is abbreviate | omitted among the pair of plate members which comprise the -Y side leg part 39a and the bearing part 202). In addition, you may use the support member 230 shown in FIG. 36 instead of the roller 213 (refer FIG. 32, FIG. 34 respectively) of 8th, 9th embodiment.

In addition, in the eighth and ninth embodiments, the bearing portions 212 and 212b (refer to FIGS. 32 and 34 respectively) are pulled by the support portion 201 (that is, the sub-stage 50) via the rope. Although it was a structure which moves to the X-axis direction at the half speed | rate of the sub-stage 50, as a system which moves the bearing parts 212 and 212b to an X-axis direction, it is not limited to this, For example, a feed screw drive, You may drive independently from a substage by drive systems, such as a linear motor drive and a belt drive.

In the eighth and ninth embodiments, the bearing portions 212 and 212b (refer to FIGS. 32 and 34, respectively) are formed on the + X side and the -X side of the substage, respectively, but the number of the bearing portions is not limited thereto. It is not limited, Depending on the length of the X guide (that is, the movement stroke of the substage), two or more may be formed, for example, on the + X side and the -X side of the substage.

In addition, you may combine suitably above-mentioned 1st-9th embodiment except the case where it is unreasonable to combine on the property. For example, the fourth to ninth embodiments may be combined with the above-described second embodiment. That is, in the said 4th-9th embodiment, you may form a masking blade apparatus (masking system).

In each of the first to ninth embodiments (hereinafter, each embodiment is described below), the pair of XVCM and YVCM were moving magnet types, but not limited thereto, and may be moving coil types. The linear motor included in the exposure apparatus of each of the above embodiments may be either a moving magnet type or a moving coil type, and the driving method is not limited to the Lorentz force driving method. It may be an external method. Moreover, in each said embodiment, although a pair of sub-stage was driven by the linear motor, the system (actuator) which drives a pair of sub-stage is not limited to this, For example, a feed screw drive, or Belt drive etc. may be sufficient.

In each of the above embodiments, the pair of sub-stages were each an XY two-dimensional stage device having two stages consisting of an X stage and a Y stage mounted on the X stage, but not limited thereto. Each of the sub stages may be a single stage driven in the XY two-dimensional direction by, for example, a planar motor.

Moreover, in each said embodiment, although the case where the mask stage apparatus holding a light transmissive mask was a moving apparatus was demonstrated, it is not limited to this, For example, the board | substrate (or wafer) which is exposure object of an exposure apparatus is made to XY plane, The movable stage apparatus may be a stage apparatus to guide accordingly.

In each of the above embodiments, the illumination light includes ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or a vacuum ruler such as F 2 laser light (wavelength 157 nm). External light may be sufficient. As illumination light, for example, an infrared or visible single wavelength laser light oscillated from a DFB semiconductor laser or a fiber laser is amplified by a fiber amplifier doped with erbium (or both erbium and ytterbium), for example. In addition, harmonics wavelength-converted into ultraviolet light using a nonlinear optical crystal may be used. In addition, a solid laser (wavelength: 355 nm, 266 nm) or the like may be used.

Moreover, in the said embodiment, although the case where the projection optical system PL was the projection optical system of the multi-lens system provided with several optical system was demonstrated, the number of projection optical systems is not limited to this, What is necessary is just one or more. Moreover, it is not limited to the projection optical system of a multi-lens system, For example, the projection optical system etc. which used the opener-type large mirror may be sufficient.

In addition, in the said embodiment, although the case where the projection magnification is an enlargement system was used as projection optical system PL, it is not limited to this, The projection optical system may be any of an equal magnification system and a reduction system.

Moreover, the exposure apparatus of each said embodiment exposes the board | substrate whose size (including at least one of an outer diameter, a diagonal, and one side) is 500 mm or more, for example, large board | substrates for flat panel displays (FPD), such as a liquid crystal display element. It is especially effective to apply to the exposure apparatus. This is because the exposure apparatus of each said embodiment is comprised in order to respond to enlargement of a board | substrate.

In addition, although the said each embodiment demonstrated the case applied to the projection exposure apparatus which performs the scanning type exposure which involves the step-and-scan operation of a plate, it is not limited to this, but of the exposure apparatus of each said embodiment The exposure apparatus may be an exposure apparatus of a proximity system that does not use a projection optical system. Moreover, the exposure apparatus of each said embodiment may be the exposure apparatus of a step and repeat system (so-called stepper), or the exposure apparatus of a step and stitch system.

Moreover, in each said embodiment, although the light transmissive mask which provided the predetermined light shielding pattern (or phase pattern and photosensitive pattern) was used on the light transmissive mask board | substrate, US Patent No. 6,778,257 instead of this mask, for example. As disclosed in the specification, an electronic mask (variable molding mask) for forming a transmission pattern or a reflection pattern or a light emission pattern based on electronic data of a pattern to be exposed, for example, a non-light-emitting image display element You may use the variable shaping mask using DMD (Digital Micro-mirror Device) which is a kind of (also called spatial light modulator).

In addition, the use of the exposure apparatus is not limited to an exposure apparatus for liquid crystal which transfers a liquid crystal display element pattern to a rectangular glass plate, and for example, to manufacture an exposure apparatus for semiconductor manufacturing, a thin film magnetic head, a micromachine, a DNA chip, and the like. It can be applied widely to the exposure apparatus for this. Moreover, in order to manufacture the mask or reticle used for not only microdevices, such as a semiconductor element but an optical exposure apparatus, an EUV exposure apparatus, an X-ray exposure apparatus, an electron beam exposure apparatus, etc., a circuit pattern is transferred to a glass substrate or a silicon wafer etc. It can also be applied to an exposure apparatus. The object to be exposed is not limited to the glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or a mask blank.

Moreover, you may apply to the exposure apparatus which transfers a circuit pattern to a silicon wafer etc., for example, the liquid immersion type exposure apparatus etc. which fill a liquid between a projection optical system and a wafer, etc. which are disclosed in US Patent application publication 2005/0259234 specification etc., for example.

Further, as disclosed in, for example, International Publication No. 2001/035168, by forming an interference fringe on a wafer, the present invention can also be applied to an exposure apparatus (lithography system) for forming a line and space pattern on a wafer. have.

In addition, the movable apparatus which concerns on said each embodiment is not limited to an exposure apparatus, For example, you may apply also to the element manufacturing apparatus provided with the inkjet type functional liquid provision apparatus.

In addition, all the publications, the international publication, the US patent application publication, and the US patent specification regarding the exposure apparatus etc. which were quoted in the above description are used as a part of description of this specification.

<< device manufacturing method >>

Next, the manufacturing method of the microdevice which used the exposure apparatus of each said embodiment in a lithography process is demonstrated. In the exposure apparatus of each said embodiment, the liquid crystal display element as a microdevice can be obtained by forming a predetermined pattern (circuit pattern, electrode pattern, etc.) on a plate (glass substrate).

<Pattern forming process>

First, what is called a photolithography process in which the pattern image is formed in a photosensitive board | substrate (glass substrate etc. to which resist was apply | coated) using the exposure apparatus of each above-mentioned embodiment is performed. By this optical lithography process, a predetermined pattern including a plurality of electrodes and the like is formed on the photosensitive substrate. Thereafter, the exposed substrate is subjected to each step such as a developing step, an etching step, a resist peeling step, and the like, so that a predetermined pattern is formed on the substrate.

<Color filter formation process>

Next, a plurality of three dot sets corresponding to R (Red), G (Green), and B (Blue) are arranged in a matrix, or a filter set of three stripes of R, G, and B is arranged in the plural horizontal scanning line directions. To form a color filter arranged.

<Cell assembly process>

Next, the liquid crystal panel (liquid crystal cell) is assembled using the board | substrate which has a predetermined | prescribed pattern obtained by the pattern formation process, the color filter obtained by the color filter formation process, etc. For example, a liquid crystal is injected between the board | substrate which has a predetermined | prescribed pattern obtained at the pattern formation process, and the color filter obtained at the color filter formation process, and a liquid crystal panel (liquid crystal cell) is manufactured.

<Module assembly process>

Then, each component, such as an electric circuit and a backlight which perform the display operation of the assembled liquid crystal panel (liquid crystal cell), is attached and completed as a liquid crystal display element.

In this case, in the pattern formation step, since the plate is exposed with high throughput and high accuracy using the exposure apparatus of the above embodiments, the productivity of the liquid crystal display element can be improved as a result.

Industrial availability

As described above, the moving device of the present invention is suitable for moving the moving object along a predetermined two-dimensional plane. Moreover, the force transmission device of this invention is suitable for performing a force transmission between a mobile body and an external apparatus along a predetermined two-dimensional plane. Moreover, the exposure apparatus of this invention is suitable for forming a pattern on an object by exposure. Moreover, the device manufacturing method of this invention is suitable for production of a micro device.

Claims (1)

  1. The force transmission device described in the description of the invention.
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