KR20180077743A - 네가티브 감광성 수지 조성물 - Google Patents

네가티브 감광성 수지 조성물 Download PDF

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Publication number
KR20180077743A
KR20180077743A KR1020160182393A KR20160182393A KR20180077743A KR 20180077743 A KR20180077743 A KR 20180077743A KR 1020160182393 A KR1020160182393 A KR 1020160182393A KR 20160182393 A KR20160182393 A KR 20160182393A KR 20180077743 A KR20180077743 A KR 20180077743A
Authority
KR
South Korea
Prior art keywords
weight
resin composition
photosensitive resin
negative photosensitive
parts
Prior art date
Application number
KR1020160182393A
Other languages
English (en)
Korean (ko)
Inventor
황현민
윤혁민
윤주표
정종호
변정현
Original Assignee
주식회사 동진쎄미켐
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 동진쎄미켐 filed Critical 주식회사 동진쎄미켐
Priority to KR1020160182393A priority Critical patent/KR20180077743A/ko
Priority to TW106146311A priority patent/TWI771355B/zh
Priority to CN201711460405.3A priority patent/CN108255017B/zh
Publication of KR20180077743A publication Critical patent/KR20180077743A/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020160182393A 2016-12-29 2016-12-29 네가티브 감광성 수지 조성물 KR20180077743A (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020160182393A KR20180077743A (ko) 2016-12-29 2016-12-29 네가티브 감광성 수지 조성물
TW106146311A TWI771355B (zh) 2016-12-29 2017-12-28 負型感光性樹脂組合物
CN201711460405.3A CN108255017B (zh) 2016-12-29 2017-12-28 负型感光性树脂组合物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020160182393A KR20180077743A (ko) 2016-12-29 2016-12-29 네가티브 감광성 수지 조성물

Publications (1)

Publication Number Publication Date
KR20180077743A true KR20180077743A (ko) 2018-07-09

Family

ID=62724283

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020160182393A KR20180077743A (ko) 2016-12-29 2016-12-29 네가티브 감광성 수지 조성물

Country Status (3)

Country Link
KR (1) KR20180077743A (zh)
CN (1) CN108255017B (zh)
TW (1) TWI771355B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022145795A1 (ko) * 2020-12-31 2022-07-07 주식회사 동진쎄미켐 저온 경화가 가능하며 굴절률이 낮은 네가티브 감광성 수지 조성물

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108957955B (zh) * 2018-08-13 2021-06-04 深圳市华星光电半导体显示技术有限公司 白色色阻及其制备方法、阵列基板

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100568097C (zh) * 2005-10-05 2009-12-09 旭化成电子材料株式会社 感光性树脂组合物及层压体
JP4816917B2 (ja) * 2006-03-17 2011-11-16 Ｊｓｒ株式会社 感放射線性樹脂組成物、液晶表示パネル用スペーサー、液晶表示パネル用スペーサーの形成方法、および液晶表示パネル
KR20090082240A (ko) * 2007-02-02 2009-07-29 아사히 가세이 이-매터리얼즈 가부시키가이샤 감광성 수지 조성물 및 적층체
WO2009078380A1 (ja) * 2007-12-18 2009-06-25 Asahi Kasei E-Materials Corporation ネガ型感光性樹脂積層体を用いたレジスト硬化物の製造方法、ネガ型感光性樹脂積層体、及びネガ型感光性樹脂積層体の使用方法
JP5078648B2 (ja) * 2008-02-08 2012-11-21 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
JP2009229720A (ja) * 2008-03-21 2009-10-08 Fujifilm Corp 感光性樹脂組成物、フォトスペーサー及びその形成方法、保護膜、着色パターン、表示装置用基板、並びに表示装置
KR102019580B1 (ko) * 2010-12-24 2019-09-06 아사히 가세이 이-매터리얼즈 가부시키가이샤 감광성 수지 조성물
TWI513685B (zh) * 2014-04-28 2015-12-21 Daxin Materials Corp 具有羥基的芴系化合物、感光性組成物及透明膜

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022145795A1 (ko) * 2020-12-31 2022-07-07 주식회사 동진쎄미켐 저온 경화가 가능하며 굴절률이 낮은 네가티브 감광성 수지 조성물

Also Published As

Publication number Publication date
CN108255017B (zh) 2023-03-31
CN108255017A (zh) 2018-07-06
TWI771355B (zh) 2022-07-21
TW201832008A (zh) 2018-09-01

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