KR20180071108A - Black metal steel sheet and method for manufacturing the same - Google Patents

Black metal steel sheet and method for manufacturing the same Download PDF

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KR20180071108A
KR20180071108A KR1020160173927A KR20160173927A KR20180071108A KR 20180071108 A KR20180071108 A KR 20180071108A KR 1020160173927 A KR1020160173927 A KR 1020160173927A KR 20160173927 A KR20160173927 A KR 20160173927A KR 20180071108 A KR20180071108 A KR 20180071108A
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black metal
coating
titanium
metal plate
titanium substrate
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Korean (ko)
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최미선
이고기
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주식회사 포스코
재단법인 포항산업과학연구원
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Priority to KR1020160173927A priority Critical patent/KR20180071108A/en
Priority to PCT/KR2017/014955 priority patent/WO2018117570A1/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/16Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C14/00Alloys based on titanium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58After-treatment
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58After-treatment
    • C23C14/5846Reactive treatment
    • C23C14/5853Oxidation
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52Controlling or regulating the coating process
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56After-treatment

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Abstract

The present invention relates to a black metal steel sheet and a manufacturing method thereof. The black metal steel sheet comprises: a titanium substrate; and a Ti-Zn alloy layer located on the titanium substrate, wherein the Ti-Zn alloy layer includes TiZn_2.

Description

흑색 금속 강판 및 이의 제조방법 {BLACK METAL STEEL SHEET AND METHOD FOR MANUFACTURING THE SAME}TECHNICAL FIELD [0001] The present invention relates to a black metal sheet,

본 발명은 흑색 금속 강판 및 이의 제조방법에 관한 것이다.The present invention relates to a black metal sheet and a method of producing the same.

프리미엄 가전시장에서 시각적, 기능적 관점으로부터 흑색 금속 강판의 요구가 높아지고 있다. In the premium consumer electronics market, there is a growing demand for black metal plates from a visual and functional point of view.

강판의 표면을 흑색화하는 방법으로서는, 강판의 표면에 흑색 도료를 도포하여 흑색 도막(塗膜)을 형성하는 방법이 있다. 그렇지만, 상기 분야에는, 내식성의 관점에서 용융 Zn 도금이나 용융 Al 함유 Zn 도금, 용융 Al, Mg 함유 Zn 도금 등의 도금을 실시한 도금 강판이 사용되는 것이 많고, 이러한 도금 강판의 표면은 금속 광택이 있는 은백색의 색조를 가지고 있다. 따라서, 흑색 도료의 도포에 의해 의장성 높은 흑색 외관을 얻기 위해서는, 도막을 두껍게 하여 베이스 색을 은폐하지 않으면 안되어, 도장 코스트가 비싸게 되어 버린다. 또, 이와 같이 도막을 두껍게 하면, 스폿 용접 등의 저항용접을 행할 수 없게 되어버린다는 문제도 있다.As a method of blackening the surface of the steel sheet, there is a method of forming a black coat (coating film) by applying a black coat on the surface of the steel sheet. However, from the viewpoint of corrosion resistance, plated steel sheets plated with molten Zn plating, molten Al-containing Zn plating, molten Al, Mg-containing Zn plating, etc. are often used in the above-mentioned fields. It has silver-white hue. Therefore, in order to obtain a black appearance with high decorative effect by application of a black paint, the coating color must be thickened to conceal the base color, and the coating cost becomes expensive. In addition, if the coating film is made thick as described above, resistance welding such as spot welding becomes impossible.

즉, 종래의 티타늄 발색 기술은 양극산화법으로 티타늄 표면의 산화막 두께를 변화시키거나 질화막을 생성시켜 표면 발색을 유도하였다. 특히, 흑화 처리 방법으로 티타늄을 불화수소산 수용액에 침지해 흑색 피막을 형성하는 방법(일본 특허 제1190252호), 티타늄 표면에 구리를 석출시켜 흑색화 하는 방법(일본 특소공 58-23469호 공보) 등이 있다. 이들 방법은 흑색 피막이 박리한다든가, 명도를 낮추기 위해 가열 처리를 실시하지 않으면 안 된다고 한 문제가 있다.That is, in the conventional titanium coloring technology, anodic oxidation method is used to change the thickness of the oxide film on the titanium surface or generate a nitride film to induce surface color development. In particular, a method of immersing titanium in an aqueous solution of hydrofluoric acid to form a black coating (Japanese Patent No. 1190252), a method of precipitating copper on the surface of titanium by blackening (Japanese Examined Patent Publication No. 58-23469), etc. . These methods have a problem that the black coating must be peeled off or the heat treatment must be carried out to lower the brightness.

반면, 용융아연계도금강판에서는 내식성 향상을 위해 도금한 도금층에서 스팟성 흑변화가 발생하여 이를 억제하기 위한 연구가 1980년대 이전부터 진행되었다. 아연계도금강판의 도금층은 Al 또는 Mg을 미량 함유한 Zn 합금층으로, 표면 산화 시 Al 또는 Mg이 우선 산화함에 따라 Zn이 불완전 산화하고 또한, 산화막에 수산화물질이 생성되어 흑변화가 발생하는데, 이 때 피막이 박리되는 문제가 있다. On the other hand, in the case of hot dip galvanized steel sheets, researches were carried out in the 1980s to suppress the occurrence of spot blackness in the plated layer to improve the corrosion resistance. The plated layer of zinc-plated steel sheet is a Zn alloy layer containing a small amount of Al or Mg. When Al or Mg is oxidized at the time of surface oxidation, Zn is incompletely oxidized and hydroxide is generated in the oxide film, At this time, there is a problem that the film peels off.

이에, 상기와 같은 문제를 해결하기 위한 연구가 시급한 실정이다.Therefore, research for solving the above problems is urgent.

본 발명의 일 구현예는, 강판 상에 희생방식형 합금 피막을 형성하여, 얇은 두께에서도 고내식성 특성을 갖는 합금 코팅 강판 및 이의 제조방법을 제공하고자 한다.An embodiment of the present invention is to provide an alloy coated steel sheet having a sacrificial type alloy coating on a steel sheet and having high corrosion resistance even at a thin thickness and a method for manufacturing the same.

본 발명의 일 구현예는, 티타늄 기판; 및 상기 티타늄 기판 상에 위치하는 Ti-Zn 합금층;을 포함하고, 상기 Ti-Zn 합금층은 TiZn2를 포함하는 흑색 금속 강판을 제공한다.One embodiment of the present invention is a semiconductor device comprising: a titanium substrate; And a Ti-Zn alloy layer positioned on the titanium substrate, wherein the Ti-Zn alloy layer comprises TiZn 2 .

상기 Ti-Zn 합금층은 1㎛ 이하의 두께를 가질 수 있다.The Ti-Zn alloy layer may have a thickness of 1 탆 or less.

상기 흑색 금속 강판의 명도는 L*값으로 30 이하일 수 있다.The lightness of the black metal sheet may be 30 or less in L * value.

본 발명의 다른 일 구현예는, 티타늄 기판을 준비하는 단계; 상기 티타늄 기판 상에 Ti 및 Zn을 포함하는 화합물을 피막화시켜 Ti-Zn 피막을 생성시키는 단계; 상기 Ti-Zn 피막이 생성된 티타늄 기판을 밀폐 용기 안에서 수증기와 접촉시켜, 수증기 산화시키는 단계;를 포함하는 흑색 금속 강판의 제조방법을 제공한다.Another embodiment of the present invention is a method of manufacturing a semiconductor device, comprising: preparing a titanium substrate; Forming a Ti-Zn coating on the titanium substrate by coating a compound containing Ti and Zn on the titanium substrate; And subjecting the titanium substrate, on which the Ti-Zn coating is formed, to water vapor in contact with water vapor in a closed container, thereby producing a black metal sheet.

상기 Ti-Zn 피막을 생성시키는 단계는, 1.0 x 10-3 Pa 내지 2.0 x 10-3 Pa의 작업 진공도 및 50W 내지 200W의 DC 파워 조건 하에서 실시할 수 있다.The step of forming the Ti-Zn coating may be performed under a working vacuum of 1.0 x 10-3 Pa to 2.0 x 10-3 Pa and a DC power of 50W to 200W.

상기 Ti-Zn 피막을 생성시키는 단계는, 건식도금법으로 실시할 수 있다.The step of forming the Ti-Zn coating film may be performed by a dry plating method.

상기 건식도금법은 화학적 증착법(CVD; Chemical Vapor Deposition) 또는 물리적 증착법(PVD; Physical Vapor Deposition)일 수 있다.The dry plating method may be a chemical vapor deposition (CVD) method or a physical vapor deposition (PVD) method.

상기 Ti-Zn 피막은 1㎛ 이하의 두께를 가질 수 있다.The Ti-Zn coating may have a thickness of 1 탆 or less.

상기 수증기 산화시키는 단계는, 90% 내지 99%의 습도 및 100℃ 내지 200℃의 온도 조건 하에서 실시할 수 있다.The steam oxidation step may be carried out at a humidity of 90% to 99% and at a temperature of 100 ° C to 200 ° C.

본 발명의 일 구현예는, 티타늄 기판 상에 Ti-Zn 피막을 생성시키고, 수증기 산화 공정을 통해 Zn의 불완전 산화를 유도함으로써, 명도가 낮고 피막 밀착성이 우수한 흑색 티타늄을 간단하게 제조할 수 있다.An embodiment of the present invention can produce a Ti-Zn film on a titanium substrate and induce incomplete oxidation of Zn through a steam oxidation process, thereby easily producing black titanium having a low lightness and excellent film adhesion.

도 1은 코팅 시간에 따른 실시예 1의 흑색 티타늄 강판의 명도값을 나타낸 그래프이다.
도 2는 티타늄의 격자구조를 나타낸 모식도이다.
도 3은 MgZn2의 격자구조를 나타낸 모식도이다.
도 4는 TiZn2의 격자구조를 나타낸 모식도이다.
도 5 및 도 6은 각각 독립적으로 Zn-Mg 합금의 온도에 따른 상안정성을 나타낸 그래프이다.
도 7 및 도 8은 각각 독립적으로 Zn-Ti 합금의 온도에 따른 상안정성을 나타낸 그래프이다.
1, The brightness values of the black titanium steel sheet of Example 1 as a function of coating time Graph.
2 is a schematic view showing a lattice structure of titanium.
3 is a schematic diagram showing the lattice structure of MgZn 2 .
4 is a schematic diagram showing the lattice structure of TiZn 2 .
FIGS. 5 and 6 are graphs showing phase stability of Zn-Mg alloy according to temperature, respectively.
7 and 8 are graphs showing phase stability of Zn-Ti alloy according to temperature, respectively.

이하, 본 발명의 구현예를 상세히 설명하기로 한다. 다만, 이는 예시로서 제시되는 것으로, 이에 의해 본 발명이 제한되지는 않으며 본 발명은 후술할 청구범위의 범주에 의해 정의될 뿐이다.Hereinafter, embodiments of the present invention will be described in detail. However, it should be understood that the present invention is not limited thereto, and the present invention is only defined by the scope of the following claims.

다른 정의가 없다면 본 명세서에서 사용되는 모든 용어(기술 및 과학적 용어를 포함)는 본 발명이 속하는 기술분야에서 통상의 지식을 가진 자에게 공통적으로 이해될 수 있는 의미로 사용될 수 있을 것이다. 명세서 전체에서 어떤 부분이 어떤 구성요소를 "포함"한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다. 또한 단수형은 문구에서 특별히 언급하지 않는 한 복수형도 포함한다. Unless defined otherwise, all terms (including technical and scientific terms) used herein may be used in a sense commonly understood by one of ordinary skill in the art to which this invention belongs. Whenever a component is referred to as " including " an element throughout the specification, it is to be understood that the element may include other elements, not the exclusion of any other element, unless the context clearly dictates otherwise. Also, singular forms include plural forms unless the context clearly dictates otherwise.

또한, 도면에서 나타난 각 구성의 크기 및 두께는 설명의 편의를 위해 임의로 나타내었으므로, 본 발명이 반드시 도시된 바에 한정되지 않는다.In addition, since the sizes and thicknesses of the respective components shown in the drawings are arbitrarily shown for convenience of explanation, the present invention is not necessarily limited to those shown in the drawings.

명세서 전체에서, 층, 막, 영역, 판 등의 부분이 다른 부분의 "상부"에 있다고 하거나, "~상"에 있다고 할 때, 이는 다른 부분 “바로 위에” 있는 경우뿐 아니라 그 중간에 또 다른 부분이 있는 경우도 포함한다. It is to be understood that throughout the specification, if a section such as a layer, film, region, plate, or the like is referred to as being "on top" Including the case where there is a part.

명세서 전체에서, 층, 막, 영역, 판 등의 부분이 다른 부분의 "상부"에 있다고 하거나, "~상"에 있다고 할 때, 이는 대상 부분의 위 또는 아래에 위치함을 의미하는 것이며, 반드시 중력 방향을 기준으로 상 측에 위치하는 것을 의미하는 것은 아니다.It is to be understood that throughout the specification, when a portion of a layer, film, region, plate, or the like is referred to as being "on top" or "on" But does not mean that it is located on the upper side with respect to the gravitational direction.

명세서 전체에서, 별다른 정의가 없는 한, "A-B합금층"은, 해당 층이 A-B합금만으로 이루어진 경우뿐만 아니라, A-B합금을 포함하는 경우도 포함한다.Throughout the specification, unless otherwise defined, the term "A-B alloy layer" includes not only the case where the layer is composed of the A-B alloy but also the case including the A-B alloy.

명세서 전체에서, 별다른 정의가 없는 한, "A-B-C합금층"은, 해당 층이 A-B-C합금만으로 이루어진 경우뿐만 아니라, A-B-C합금을 포함하는 경우도 포함한다.Throughout the specification, unless otherwise defined, the term "A-B-C alloy layer" encompasses not only the case where the layer is made of only the A-B-C alloy but also the case where the layer includes the A-B-C alloy.

일 구현예는 흑색화된 티타늄 강판을 제공하며, 상기 흑색화된 티타늄 강판은 티타늄 기판; 및 상기 티타늄 기판 상에 위치하는 Ti-Zn 합금층;을 포함하고, 상기 Ti-Zn 합금층은 TiZn2를 포함한다.One embodiment provides a blackened titanium steel sheet, wherein the blackened titanium steel sheet comprises a titanium substrate; And a Ti-Zn alloy layer positioned on the titanium substrate, wherein the Ti-Zn alloy layer comprises TiZn 2 .

도 2 내지 도 4에서 보는 바와 같이, 상기 TiZn2를 포함하는 Ti-Zn 합금층은 모재인 티타늄 기판과의 격자 정합성이 높아, 종래 문제점인 박리 현상 등을 해결할 수 있다.As shown in FIGS. 2 to 4, the Ti-Zn alloy layer containing TiZn 2 has high lattice matching with the titanium substrate, which is a base material, and can solve the peeling phenomenon which is a conventional problem.

예컨대, 상기 Ti-Zn 합금층은 1㎛ 이하의 두께를 가질 수 있다.For example, the Ti-Zn alloy layer may have a thickness of 1 탆 or less.

상기 Ti-Zn 합금층의 두께가 1㎛ 초과일 경우 모재인 티타늄 기판과의 결합력이 약화되어, Ti-Zn 합금층의 탈락 현상이 발생할 수 있다.If the thickness of the Ti-Zn alloy layer exceeds 1 탆, the bonding strength with the titanium substrate, which is a base material, is weakened, and the Ti-Zn alloy layer may be detached.

상기 흑색 금속 강판의 명도는 L*값으로 30 이하일 수 있다.The lightness of the black metal sheet may be 30 or less in L * value.

다른 일 구현예는 흑색화된 티타늄 강판의 제조방법을 제공한다.Another embodiment provides a method for producing a blackened titanium steel sheet.

상기 흑색화된 티타늄 강판의 제조방법은, 티타늄 기판을 준비하는 단계; 상기 티타늄 기판 상에 Ti 및 Zn을 포함하는 화합물을 피막화시켜 Ti-Zn 피막을 생성시키는 단계; 상기 Ti-Zn 피막이 생성된 티타늄 기판을 밀폐 용기 안에서 수증기와 접촉시켜, 수증기 산화시키는 단계;를 포함한다.The method for producing a blackened titanium steel sheet includes the steps of: preparing a titanium substrate; Forming a Ti-Zn coating on the titanium substrate by coating a compound containing Ti and Zn on the titanium substrate; And a step of subjecting the titanium substrate on which the Ti-Zn coating is formed to steam oxidation in contact with water vapor in a closed container.

상기 흑색화된 티타늄 강판의 제조방법은, 종래의 양극산화법으로 흑색화 하기 어려운 티타늄의 표면에 격자 결합력이 높고 내식성 확보가 가능한 물질 피막을 생성시키고 수증기 산화하여 흑색화하는 방법이다. The method of producing the blackened titanium steel sheet is a method of blackening the surface of titanium which is difficult to be blackened by the conventional anodic oxidation method, by forming a material film having high lattice bonding force and ensuring corrosion resistance and by steam oxidation.

일 구현예에 따른 제조방법은 종래 제조방법과 비교하여, 티타늄 표면에 티타늄을 함유한 아연 화합물을 건식 처리하여 피막화한 후, 수증기 산화하여 아연의 불완전산화를 유도하는 것을 특징으로 하기 때문에, 표면 밀착성이 우수하고, 제조 제정성 및 재현성 또한 보다 우수하다.The method according to an embodiment of the present invention is characterized in that, compared with the conventional manufacturing method, the zinc compound containing titanium on the surface of titanium is dry-treated to form a film, and then steam oxidation is performed to induce incomplete oxidation of zinc. Adhesion is excellent, manufacturing stability and reproducibility are also excellent.

용융아연계 도금강판에서 발생하는 스팟성 흑변은 용융아연계 도금강판을 산화 분위기에 노출시키면 Zn에 함유된 Al 또는 Mg이 우선 산화되면서 Zn이 불완전 산화됨에 기인한다. 상변화에 대한 열역학적 고찰을 해보면, 산화 시 Mg은 MgO, 또는 MgOH가 상안정성을 나타내며, Zn는 ZnO 상이 안정하다. Spots that occur in hot dip galvanized steel sheets are caused by the incomplete oxidation of Zn as a result of the oxidation of Al or Mg contained in Zn if the galvanized steel sheet is exposed to an oxidizing atmosphere. Thermodynamic considerations for phase change show that Mg is MgO or MgOH phase stable at the time of oxidation and ZnO phase is stable.

티타늄 또한 산화 또는 수산화물질을 표면에 잘 생성시키는 금속으로 알려져 있다. 같은 원리로 열역학적 상안정성을 고찰해보면 티타늄 또한 TiO 또는 TiH4 상이 안정하며 Zn보다 우선 산화하여 티타늄 산화물 또는 티타늄 수화물을 만들어 Zn의 불완전 산화를 유도한다. (도 5 내지 도 8 참조)Titanium is also known as a metal that produces oxidation or hydroxide on the surface well. Considering thermodynamic stability with the same principle, titanium also contains TiO 2 or TiH 4 Phase is stable and oxidizes preferentially to Zn to make titanium oxide or titanium hydrate to induce incomplete oxidation of Zn. (See Figs. 5 to 8)

또한, Al 또는 Mg을 함유한 용융아연계 도금강판은 응고 시 MgZn2 화합물을 생성시키며, 이 화합물의 격자상수는 a = 0.52234 nm, b = 0.52234 nm, c = 0.85562 nm, α = 90 °, β = 90 °, γ = 120 ° 이다. Further, the molten zinc plated steel sheet containing Al or Mg produces MgZn 2 compound upon solidification, and the lattice constants of this compound are a = 0.52234 nm, b = 0.52234 nm, c = 0.85562 nm, = 90 [deg.], And [gamma] = 120 [deg.].

한편, 티타늄은 격자상수가 a = 0.328 nm, b = 0.328 nm, c = 0.328 nm, α = 90 °, β = 90 °, γ = 90 ° 으로 용융아연계 도금으로 티타늄의 흑색화를 유도한다면 MgZn2 화합물의 모재와의 격자 부정합성으로 기존 공정의 문제점인 박리현상이 발생할 가능성이 높다. On the other hand, if the lattice constant of titanium is induced by blackening of the titanium by molten zinc plating at a = 0.328 nm, b = 0.328 nm, c = 0.328 nm, α = 90 °, 2 compound with the parent material, there is a high possibility of peeling phenomenon which is a problem of the existing process.

반면, 같은 원리로 Ti-Zn 피막은 TiZn2 화합물을 생성시키며, 이 화합물의 격자상수는 a = 0.304 nm, b = 0.304 nm, c = 1.068 nm, α = 90 °, β = 90 °, γ = 90 ° 로 티타늄의 격자상수와 매우 유사하다. 따라서, 모재인 티타늄 기판과의 격자 정합성이 높은 Ti-Zn 피막을 생성시키면 박리 현상 문제를 해결할 수 있다.On the other hand, on the same principle, the Ti-Zn coating produces a TiZn 2 compound with a lattice constant a = 0.304 nm, b = 0.304 nm, c = 1.068 nm, α = 90 °, 90 ° and is very similar to the lattice constant of titanium. Therefore, if a Ti-Zn coating having high lattice matching with a titanium substrate as a base material is produced, the problem of peeling can be solved.

즉, 종래에는 용융 Al, Mg 함유 Zn 도금 강판 등을 밀폐 용기 속에서 수증기와 접촉시켜 MgZn2 화합물을 생성시켰는데, 이는 모재인 티타늄 기판과의 격자 부정합성으로 인해 박리 현상이 발생하였으나, 일 구현예에 따르면 TiZn2 화합물을 생성시켜, 궁극적으로 모재인 티타늄 기판과의 격자 정합성이 높은 Ti-Zn 피막을 형성함으로써, 박리 현상 문제를 해결할 수 있다.In other words, conventionally, MgZn 2 compounds were produced by contacting molten Al, Mg-containing Zn-coated steel sheets, etc. with water vapor in a closed vessel, which resulted in peeling due to lattice mismatch with the base substrate, According to the example, the problem of peeling can be solved by forming a TiZn 2 compound and ultimately forming a Ti-Zn coating with high lattice matching with a titanium substrate as a base material.

상기 Ti-Zn 피막을 생성시키는 단계는, 1.0 x 10-3 Pa 내지 2.0 x 10-3 Pa의 작업 진공도 및 50W 내지 200W의 DC 파워 조건 하에서 실시할 수 있다. 상기 범위의 작업 진공도를 가질 경우 방출 입자들의 mean free path가 길어지고 모재의 산화를 방지할 수 있어, 티타늄 기판(모재) 및 Ti-Zn 합급층 간 결합력을 향상시킬 수 있고, 상기 범위의 DC 파워를 가질 경우 짧은 시간에 고밀도의 피막을 증착시킬 수 있어 작업시간 소요로 인한 비경제성을 제거할 수 있다.The step of forming the Ti-Zn coating may be performed under a working vacuum of 1.0 x 10-3 Pa to 2.0 x 10-3 Pa and a DC power of 50W to 200W. When the working vacuum degree is in the above range, the mean free path of the emitting particles is increased and the oxidation of the base material can be prevented, so that the bonding force between the titanium substrate (base material) and the Ti-Zn alloy layer can be improved, It is possible to deposit a high-density film in a short time, thereby eliminating the non-economical efficiency due to the operation time.

상기 Ti-Zn 피막을 생성시키는 단계는 건식도금법으로 실시하는 단계일 수 있다.The step of forming the Ti-Zn coating may be carried out by a dry plating method.

예컨대, 상기 건식도금법은 화학적 증착법(CVD; Chemical Vapor Deposition) 또는 물리적 증착법(PVD; Physical Vapor Deposition)일 수 있다.For example, the dry plating method may be a chemical vapor deposition (CVD) method or a physical vapor deposition (PVD) method.

예컨대, 상기 건식도금법을 이용하면, 높은 에너지를 가진 입자들을 Target(Ti, Zn)에 충돌시켜, 상기 목적화하는 원자들이 방출되어 나오면, 이를 기판에 증착시킬 수 있다.For example, when the dry plating method is used, high energy particles collide with a target (Ti, Zn), and when the targeted atoms are emitted, they can be deposited on a substrate.

전술한 바와 같이, 상기 Ti-Zn 피막은 1㎛ 이하의 두께를 가질 수 있다.As described above, the Ti-Zn coating may have a thickness of 1 탆 or less.

상기 수증기 산화시키는 단계는, 90% 내지 99%의 습도 및 100℃ 내지 200℃의 온도 조건 하에서 실시할 수 있다. 상기 수증기 산화시키는 단계에서의 습도 및 온도 조건이 상기 범위를 벗어날 경우, 흑색화가 어려울 수 있다.The steam oxidation step may be carried out at a humidity of 90% to 99% and at a temperature of 100 ° C to 200 ° C. If the humidity and temperature conditions in the steam oxidation step are out of the above ranges, blackening may be difficult.

이하 본 발명의 바람직한 실시예 및 비교예를 기재한다. 그러나 하기 실시예는 본 발명의 바람직한 일 실시예일뿐 본 발명이 하기 실시예에 한정되는 것은 아니다.Hereinafter, preferred embodiments and comparative examples of the present invention will be described. However, the following examples are only a preferred embodiment of the present invention, and the present invention is not limited to the following examples.

실시예Example :  : 흑색화된Blackened 티타늄 강판의 제조 Manufacture of titanium steel sheet

실시예Example 1 One

건식도금법으로 Ti 기판 위에 수십 ㎛의 Ti-Zn 피막을 생성시킨다. 이 때, 작업 진공도는 1.5x10-3 Pa 이고, DC 파워는 100W로 한다. Ti-Zn 피막이 생성된 Ti은 95% humidity, 150℃의 조건에서 수증기 산화 공정을 거쳐 산화를 유도하여, 흑색화된 티타늄 강판을 제조하였다.A Ti-Zn film of several tens of micrometers is formed on the Ti substrate by a dry plating method. At this time, the working vacuum degree is 1.5 × 10 -3 Pa and the DC power is 100 W. Titanium produced with Ti-Zn coating was subjected to steam oxidation at 95% humidity and 150 ℃ to induce oxidation, and blackened titanium steel sheet was produced.

비교예Comparative Example 1 One

Ti-Zn 피막 대신 용융 Al, Mg 함유 Zn 도금 피막을 생성시킨 것을 제외하고는, 실시예 1과 동일하게 하여, 흑색화된 티타늄 강판을 제조하였다.A blackened titanium steel sheet was produced in the same manner as in Example 1, except that molten Al and Mg-containing Zn plating films were formed in place of the Ti-Zn coatings.

상기 실시예 1 및 비교예 1에서 제조된 시편들에 대한 정보를 하기 도 1에 정리하였다.Information about the specimens prepared in Example 1 and Comparative Example 1 is summarized in FIG.

하기 도 1로부터, 실시예 1의 흑색화된 티타늄 강판은 피막의 격자 구조가 모재와 유사하여, 비교예 1의 흑색화된 티타늄 강판보다 내구성이 높고, 명도가 낮고 피막 밀착성이 좋음을 확인할 수 있다. 1, the blackened titanium steel sheet of Example 1 has a lattice structure similar to that of the base metal, so that the blackened titanium steel sheet of Comparative Example 1 has higher durability, lower brightness and better film adhesion property .

본 발명은 상기 실시예들에 한정되는 것이 아니라 서로 다른 다양한 형태로 제조될 수 있으며, 본 발명이 속하는 기술분야에서 통상의 지식을 가진 자는 본 발명의 기술적 사상이나 필수적인 특징을 변경하지 않고서 다른 구체적인 형태로 실시될 수 있다는 것을 이해할 수 있을 것이다. 그러므로 이상에서 기술한 실시예들은 모든 면에서 예시적인 것이며 한정적이 아닌 것으로 이해해야만 한다.It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the present invention as defined by the following claims. As will be understood by those skilled in the art. It is therefore to be understood that the above-described embodiments are illustrative in all aspects and not restrictive.

Claims (9)

티타늄 기판; 및
상기 티타늄 기판 상에 위치하는 Ti-Zn 합금층;
을 포함하고,
상기 Ti-Zn 합금층은 TiZn2를 포함하는
흑색 금속 강판.
Titanium substrate; And
A Ti-Zn alloy layer positioned on the titanium substrate;
/ RTI >
Wherein the Ti-Zn alloy layer comprises TiZn 2
Black metal plate.
제1항에서,
상기 Ti-Zn 합금층은 1㎛ 이하의 두께를 가지는,
흑색 금속 강판의 제조방법.
The method of claim 1,
The Ti-Zn alloy layer has a thickness of 1 mu m or less,
A method for producing a black metal plate.
제1항에서,
상기 흑색 금속 강판의 명도는 L*값으로 30 이하인
흑색 금속 강판.
The method of claim 1,
The lightness of the black metal sheet is L * value of 30 or less
Black metal plate.
티타늄 기판을 준비하는 단계;
상기 티타늄 기판 상에 Ti 및 Zn을 포함하는 화합물을 피막화시켜 Ti-Zn 피막을 생성시키는 단계;
상기 Ti-Zn 피막이 생성된 티타늄 기판을 밀폐 용기 안에서 수증기와 접촉시켜, 수증기 산화시키는 단계;
를 포함하는
흑색 금속 강판의 제조방법.
Preparing a titanium substrate;
Forming a Ti-Zn coating on the titanium substrate by coating a compound containing Ti and Zn on the titanium substrate;
Contacting the titanium substrate on which the Ti-Zn coating is formed with water vapor in a closed vessel to steam-oxidize the titanium substrate;
Containing
A method for producing a black metal plate.
제4항에서,
상기 Ti-Zn 피막을 생성시키는 단계는,
1.0 x 10-3 Pa 내지 2.0 x 10-3 Pa의 작업 진공도 및 50W 내지 200W의 DC 파워 조건 하에서 실시하는,
흑색 금속 강판의 제조방법.
5. The method of claim 4,
The step of forming the Ti-Zn coating includes:
1.0 x 10 -3 Pa to about 2.0 x 10 -3 Pa for the operation carried out under vacuum and 50W to 200W DC power condition,
A method for producing a black metal plate.
제4항에서,
상기 Ti-Zn 피막을 생성시키는 단계는,
건식도금법으로 실시하는,
흑색 금속 강판의 제조방법.
5. The method of claim 4,
The step of forming the Ti-Zn coating includes:
The dry-plating method,
A method for producing a black metal plate.
제6항에서,
상기 건식도금법은 화학적 증착법(CVD; Chemical Vapor Deposition) 또는 물리적 증착법(PVD; Physical Vapor Deposition)인,
흑색 금속 강판의 제조방법.
The method of claim 6,
The dry plating method may be a chemical vapor deposition (CVD) method or a physical vapor deposition (PVD) method,
A method for producing a black metal plate.
제4항에서,
상기 Ti-Zn 피막은 1㎛ 이하의 두께를 가지는,
흑색 금속 강판의 제조방법.
5. The method of claim 4,
The Ti-Zn coating has a thickness of 1 mu m or less,
A method for producing a black metal plate.
제4항에서,
상기 수증기 산화시키는 단계는,
90% 내지 99%의 습도 및 100℃ 내지 200℃의 온도 조건 하에서 실시하는,
흑색 금속 강판의 제조방법.
5. The method of claim 4,
Wherein the steam oxidation step comprises:
, A humidity of 90% to 99% and a temperature of 100 ° C to 200 ° C.
A method for producing a black metal plate.
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Publication number Priority date Publication date Assignee Title
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