KR20150104953A - Touch window - Google Patents

Abstract

A touch window according to an embodiment of the present invention includes: a substrate; a sensing electrode which is disposed on the substrate and senses a location; an antireflective layer which is disposed on the sensing electrode. The reflectivity of the antireflective layer is 0-20 %.

Description

Touch window {TOUCH WINDOW}

The present disclosure relates to a touch window.

2. Description of the Related Art In recent years, a touch panel has been applied to an image displayed on a display device in various electronic products by a method of touching an input device such as a finger or a stylus.

The touch panel is typically divided into a resistive touch panel and a capacitive touch panel. The resistance film type touch panel senses that the resistance changes according to the connection between the electrodes when the pressure is applied to the input device, and the position is detected. A capacitance type touch panel senses a change in electrostatic capacitance between electrodes when a finger touches them, thereby detecting the position. Considering the convenience of the manufacturing method and the sensing power, recently, in a small model, the electrostatic capacity method has attracted attention.

Indium tin oxide (ITO), which is most widely used as a transparent electrode of a touch panel, is expensive and is physically easily hit by bending and warping of the substrate, thereby deteriorating the characteristics of the electrode. As a result, flexible) devices. In addition, when applied to a large size touch panel, a problem arises due to high resistance.

In order to solve such problems, active researches on alternative electrodes are under way. In particular, a metal material is formed in an electrode shape to replace ITO. However, in the case of a metal, a visibility may increase due to light reflection, thereby causing a problem of a transparent electrode pattern being visible.

Embodiments provide a touch window with improved visibility.

      A touch window according to an embodiment of the present invention includes a substrate; A sensing electrode disposed on the substrate and sensing a position; And an antireflective layer disposed on the sensing electrode, wherein the reflectance of the antireflective layer is greater than 0% and less than or equal to 20%.

The anti-reflection layer of the touch window according to an embodiment of the present invention includes a bottom anti-spinning layer disposed on the back surface of the sensing electrode and an upper anti-spinning layer disposed on the top surface of the sensing electrode.

The touch window further comprises a mesh-shaped electrode portion disposed on the substrate of the touch window according to an embodiment of the present invention.

The touch window of the touch window according to an embodiment of the present invention includes first and second sub patterns and the sensing electrode, and the sensing electrode is disposed on the first sub pattern.

The substrate of the touch window according to an embodiment of the present invention includes an embossed portion disposed between the engraved portion and the engraved portion, and the sensing electrode is disposed in the engraved portion.

The antireflection layer of the touch window according to an exemplary embodiment of the present invention may be formed of at least one selected from the group consisting of Cu, Au, Ag, Al, Ti, Ni, (Pd) or an alloy thereof.

The touch window of the touch window according to the embodiment of the present invention is disposed on both sides of the substrate.

Wherein the top anti-reflective layer and the bottom anti-reflective layer of the touch window according to the exemplary embodiment of the present invention include different materials.

A method of manufacturing a touch window according to an embodiment of the present invention includes: forming a sensing electrode on a substrate; And forming an antireflection layer on the sensing electrode, wherein the reflectance of the antireflection layer is greater than 0% and less than or equal to 20%.

The method of manufacturing a touch window according to an embodiment of the present invention includes depositing the antireflection layer by reactive sputtering.

The method of manufacturing a touch window according to an embodiment of the present invention includes depositing the anti-reflection layer with at least one reactive gas selected from the group consisting of an inert gas, oxygen (O 2), nitrogen (N 2), and carbon dioxide (CO 2) gas.

The inert gas in the method of manufacturing a touch window according to an embodiment of the present invention is an argon (Ar) gas and the ratio of the argon (Ar), oxygen (O2) and nitrogen (N2) gas is 1: 0.4-0.5: / RTI >

The inert gas in the method of manufacturing a touch window according to an embodiment of the present invention is an argon (Ar) gas and the ratio of the argon (Ar), oxygen (O2) and nitrogen (N2) / RTI >

The touch window according to an embodiment includes an anti-reflection layer disposed on the sensing electrode, and the area of the upper surface of the anti-reflection layer is larger than the area of the upper surface of the sensing electrode. Through the antireflection layer, it is possible to prevent an increase in visibility due to light reflection of the sensing electrode including a metallic material. In particular, the antireflection layer can lower the reflectance of not only the top surface but also the side surface of the sensing electrode, which is advantageous for visibility. Further, visibility can be improved even at a wide viewing angle. Therefore, the optical characteristics of the sensing electrode can be improved. Also, the anti-reflection layer may be deposited by a reactive sputtering method to form an anti-reflection layer even when the metal thickness is very thin, and the reflectance of the anti-reflection layer can be controlled by controlling the ratio of the reaction gas.

1 is a plan view of a touch window according to the first embodiment.
2 is a cross-sectional view taken along the line A-A 'in Fig.
3 is a sectional view of the touch window according to the second embodiment.
4 is a cross-sectional view of a touch window according to the third embodiment.
5 is a plan view of a touch window according to the fourth embodiment.
6 is a cross-sectional view showing a section cut along the line B-B 'in FIG.
7 to 15 are sectional views of a touch window according to another embodiment.
17 to 20 are a plan view and a cross-sectional view of a touch window according to another embodiment of the present invention.
FIGS. 21 and 23 are cross-sectional views illustrating a method of manufacturing a touch window according to an embodiment.
24 is a cross-sectional view illustrating a display device in which a touch window according to an embodiment is disposed on a display panel.
25 is a diagram illustrating a touch window according to an embodiment applied to navigation of a vehicle.

In the description of the embodiments, it is to be understood that each layer (film), area, pattern or structure may be referred to as being "on" or "under / under" Quot; includes all that is formed directly or through another layer. The criteria for top / bottom or bottom / bottom of each layer are described with reference to the drawings.

The thickness or the size of each layer (film), region, pattern or structure in the drawings may be modified for clarity and convenience of explanation, and thus does not entirely reflect the actual size.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

First, a touch window according to an embodiment will be described in detail with reference to FIGS. 1 and 2. FIG. 1 is a plan view of a touch window according to an embodiment. 2 is a cross-sectional view taken along the line A-A 'in Fig.

1, the touch window 10 according to the embodiment includes a valid area AA for sensing the position of an input device (e.g., a finger or the like), and a non-valid area AA disposed around the valid area AA And a substrate 100 on which a region UA is defined.

Here, the sensing electrode 200 may be formed in the effective area AA to sense the input device. A wiring 300 electrically connecting the sensing electrode 200 may be formed in the non-effective area UA. An external circuit or the like connected to the wiring 300 may be located in the ineffective area UA.

When an input device such as a finger is brought into contact with such a touch window, a capacitance difference occurs at a portion where the input device is contacted, and a portion where such a difference occurs can be detected as the contact position.

The touch window will be described in more detail as follows.

The substrate 100 may be formed of various materials capable of supporting the sensing electrode 200, the wiring 300, and the circuit board formed thereon. The substrate 100 may be a glass substrate or a plastic substrate, for example.

An outer dummy layer is formed in the ineffective area UA of the substrate 100. [ The outer dummy layer may be formed by applying a material having a predetermined color so that the wiring 300 and a printed circuit board connecting the wiring 300 to an external circuit can not be seen from the outside. The outer dummy layer may have a color suitable for a desired appearance, for example, a black color including black pigment and the like. A desired logo can be formed on the outer dummy layer by various methods. Such an outer dummy layer can be formed by vapor deposition, printing, wet coating or the like.

The sensing electrode 200 may be formed on the substrate 100. The sensing electrode 200 may sense whether an input device such as a finger is in contact. In FIG. 1, the sensing electrode 200 extends in one direction on the substrate, but the embodiment is not limited thereto. Therefore, the sensing electrode 200 may extend in the other direction crossing the one direction. In addition, the sensing electrode 200 may include two types of sensing electrodes having a shape extending in one direction and a shape extending in another direction.

The sensing electrode 200 may include a metal material having excellent electrical conductivity. For example, the sensing electrode 200 may include at least one of Cu, Au, Ag, Al, Ti, Ni, or an alloy thereof. Accordingly, the electrical characteristics of the touch window to which the sensing electrode 200 is applied can be improved.

Referring to FIG. 2, an anti-reflection layer 400 is disposed on the sensing electrode 200. The anti-reflection layer 400 may be disposed on the upper surface 200a of the sensing electrode 200. [

The antireflection layer 400 may include at least one selected from the group consisting of copper (Cu), gold (Au), silver (Ag), aluminum (Al), titanium (Ti), nickel (Ni), chromium (Cr) Or the like.

The area of the upper surface 400a of the antireflection layer 400 is larger than the area of the upper surface 200a of the sensing electrode 200. Therefore, the anti-reflection layer 400 may cover the upper surface 200a of the sensing electrode 200 as a whole.

In addition, the line width L2 of the anti-reflection layer 400 is wider than the line width L1 of the sensing electrode 200. That is, the length L2 of one end surface of the antireflection layer 400 is longer than the length L1 of the one end surface of the sensing electrode 200. Specifically, the ratio of the line width L1 of the sensing electrode 200 to the line width L2 of the antireflection layer 400 may be 1: 1.3 to 1: 2. When the ratio of the line width L1 of the sensing electrode 200 to the line width L2 of the antireflection layer 400 is less than 1: 1.3, the antireflection layer 400 is formed on the upper surface 200a of the sensing electrode 200, It is difficult to sufficiently prevent the reflection. In addition, the ratio of the line width L1 of the sensing electrode 200 to the line width L2 of the anti-reflection layer 400 may be less than 1: 2 in the manufacturing process.

Meanwhile, a part of the antireflection layer 400 may be disposed apart from the sensing electrode 200. That is, a part of the antireflection layer 400 may be spaced a predetermined distance D from the sensing electrode 200.

Specifically, the anti-reflection layer 400 includes a first anti-reflection portion 410 and a second anti-reflection portion 420. The second anti-reflection unit 420 may surround the first anti-reflection unit 410. The second anti-reflection unit 420 may be disposed outside the first anti-reflection unit 410. The first antireflection portion 410 is disposed on the upper surface 200a of the sensing electrode 200. FIG. The second antireflection portion 420 extends from the first antireflection portion 410 and is disposed on the side surface 200e of the sensing electrode 200. [ The second anti-reflection unit 420 may be spaced apart from the side surface 200e of the sensing electrode 200. Referring to FIG. That is, the second antireflection portion 420 may be spaced apart from the side surface 200e of the sensing electrode 200 by a predetermined distance D without contacting the side surface 200e.

 The second antireflection portion 420 may be bent from the first antireflection portion 410 toward the substrate 100. That is, the second antireflection portion 420 may be bent or bent downward from the first antireflection portion 410. The end 400e of the antireflection layer 400 may be disposed lower than the height 200aH of the upper surface 200a of the sensing electrode 200. [ Accordingly, the second anti-reflection unit 420 may surround the side surface 200e of the sensing electrode 200. [ Therefore, the second antireflection portion 420 can lower the reflectance of the side surface 200e of the sensing electrode 200 and improve the visibility even at a wide viewing angle.

The anti-reflection layer 400 may include at least one of a metal oxide, a metal nitride, and a metal oxynitride. In addition, when the sensing electrode 200 includes a first metal, the anti-reflection layer 400 may include an oxide including the first metal. The antireflection layer 400 may be a blackening layer.

Through the antireflection layer 400, it is possible to prevent an increase in visibility due to light reflection of the sensing electrode 200 including a metal material. In particular, as described above, the antireflection layer 400 can lower the reflectance as well as the upper surface of the sensing electrode 200, which is advantageous for visibility. Further, visibility can be improved even at a wide viewing angle. Therefore, the optical characteristics of the sensing electrode 200 can be improved.

Subsequently, the wiring 300 is formed in the ineffective area UA. The wiring 300 may apply an electrical signal to the sensing electrode 200. The wiring 300 may be formed in the ineffective area UA so as not to be seen.

Meanwhile, although not shown in the drawing, a circuit board connected to the wiring 300 may further be positioned. As the circuit board, various types of printed circuit boards can be applied. For example, a flexible printed circuit board (FPCB) or the like can be applied.

Hereinafter, a touch window according to the second embodiment will be described with reference to FIG. For the sake of clarity and conciseness, the same or similar parts as those described above will not be described in detail.

3 is a sectional view of the touch window according to the second embodiment. The touch window according to the second embodiment includes an antireflection layer 400 and the antireflection layer 400 includes an upper antireflection layer 401 and a lower antireflection layer 402.

The upper surface antireflection layer 401 is disposed on the upper surface 200a of the sensing electrode 200. The upper surface antireflection layer 401 is the same as or similar to the antireflection layer 400 included in the touch window according to the first embodiment described above.

The anti-reflection layer 402 is disposed on the lower surface 200b of the sensing electrode 200. [ The upper surface of the antireflection layer 402 is wider than the lower surface of the sensing electrode 200. Therefore, the anti-reflection layer 402 may cover the lower surface of the sensing electrode 200 as a whole.

In addition, the line width L3 of the anti-reflection layer 402 is wider than the line width L1 of the sensing electrode 200. That is, the length L3 of one end face of the anti-reflection layer 402 is longer than the length L1 of one end face of the sensing electrode 200. [ Specifically, the ratio of the line width L1 of the sensing electrode 200 to the line width L3 of the lower surface antireflection layer 402 may be 1: 1.1 to 1: 1.3. If the ratio of the line width L1 of the sensing electrode 200 to the line width L3 of the lower surface antireflection layer 402 is less than 1: 1.1, the lower surface antireflection layer 402 may contact the lower surface of the sensing electrode 200 It is difficult to sufficiently prevent the reflection, and thus it may be difficult to prevent the reflection. Also, the ratio of the line width L1 of the sensing electrode 200 to the line width L3 of the lower surface antireflection layer 402 may be less than 1: 1.3 in the manufacturing process.

Through the antireflection layer 402, an increase in visibility can be prevented not only in the upper portion but also in the lower portion of the touch window. Therefore, the overall visibility of the touch window can be improved.

Hereinafter, a touch window according to the third embodiment will be described with reference to FIG. 4 is a cross-sectional view of a touch window according to the third embodiment.

4, the touch window according to the third embodiment includes an anti-reflection layer 400, and the anti-reflection layer 400 includes a first anti-reflection portion 410, a second anti-reflection portion 420, 3 antireflection portion 430 as shown in FIG.

The first anti-reflection portion 410 is disposed on the upper surface of the sensing electrode 200.

The second antireflection portion 420 is bent from the first antireflection portion 410 and disposed on the side surface 200e of the sensing electrode 200. [ The length (420 L) of the second anti-reflection unit 420 may be longer than or at least equal to the height (200 H) of the sensing electrode 200. Therefore, the second antireflection portion 420 can completely cover the side surface 200e of the sensing electrode 200. [0053] FIG.

The third antireflection portion 430 extends from the second antireflection portion 420 and is bent and disposed on the side surface 200e of the sensing electrode 200. [ The third anti-reflection unit 430 may be disposed apart from the substrate 100.

5 and 6, the touch window according to the fourth embodiment will be described.

5 is a plan view of a touch window according to the fourth embodiment. 6 is a cross-sectional view showing a section cut along the line B-B 'in FIG.

5 and 6, the touch window 20 according to the fourth embodiment includes an electrode unit 201, and the electrode unit 201 may be disposed in a mesh shape.

Specifically, the electrode unit 201 may include a mesh opening OA and a mesh line LA. At this time, the line width of the mesh line portion LA may be 0.1 mu m to 10 mu m. The mesh line portion LA having a line width of 0.1 mu m or less may not be possible in the manufacturing process. When the line width is 10 占 퐉 or less, the pattern of the electrode unit 201 can be made invisible. Preferably, the line width of the mesh line portion LA may be between 1 탆 and 5 탆.

Meanwhile, as shown in FIG. 5, the mesh opening OA may have a rectangular shape. However, the embodiment is not limited thereto, and the mesh opening OA may have various shapes such as a diamond shape, a pentagon, a hexagonal polygonal shape, or a circular shape.

Since the electrode unit 201 has a mesh shape, the pattern of the electrode unit 201 on the effective area AA can be made invisible. That is, even if the electrode unit 201 is formed of metal, the pattern can be made invisible. Also, even if the electrode unit 201 is applied to a touch window of a large size, the resistance of the touch window can be lowered.

6, the electrode unit 201 includes a first sub pattern 110, a second sub pattern 120, an electrode layer 210, a top anti-reflective layer 412, and a bottom anti-reflective layer 411 .

The first subpattern 110 is disposed on the substrate 100. The first sub pattern 110 is disposed on the mesh line portion LA. Accordingly, the first sub patterns 110 are arranged in a mesh shape. The first sub-pattern 110 may be embossed.

Meanwhile, the second sub pattern 120 is disposed adjacent to the first sub pattern 110. The second sub pattern 120 is disposed on the substrate 100. The second sub pattern 120 is disposed in the mesh opening OA. Accordingly, the second sub-patterns 120 may be disposed between the first sub-patterns 110. The second sub-pattern 120 may be embossed.

The first and second sub patterns 110 and 120 may include a resin or a polymer.

The electrode layer 210 is disposed on the first sub pattern 110. Therefore, the electrode layer 210 is disposed on the mesh line portion LA, and the electrode layer 210 is disposed on the mesh. The electrode layer 210 may include various metals having excellent electrical conductivity. For example, the electrode layer 210 may include copper (Cu), gold (Au), silver (Ag), aluminum (Al), titanium (Ti), nickel (Ni)

The side surface of the electrode layer 210 may be curved toward the inside of the sensing electrode 200. This is a shape caused when the electrode layer 210 is formed by a deposition and etching process.

The top anti-reflective layer 412 is disposed on the first sub-pattern 110. The upper surface antireflection layer 412 is disposed on the upper surface of the electrode layer 210. Therefore, the upper surface antireflection layer 412 is disposed on the mesh line portion LA, and the upper surface antireflection layer 412 is disposed in a mesh shape.

The anti-reflection layer 411 is disposed on the first sub pattern 110. The anti-reflection layer 411 is disposed on the lower surface of the electrode layer 210. Therefore, the anti-reflection layer 411 is disposed on the mesh line LA and the anti-reflection layer 411 is disposed on the mesh.

The upper surface antireflection layer 412 and the lower surface antireflection layer 411 may include at least one of a metal oxide, a metal nitride, and a metal oxynitride. At this time, the upper surface antireflection layer 412 and the lower surface antireflection layer 411 may include different metals. Specifically, the top anti-reflective layer 412 and the bottom anti-reflective layer 411 may include other materials so as to react with different etchants. That is, the top anti-reflective layer 412 and the bottom anti-reflective layer 411 may be selectively etched.

Hereinafter, a touch window according to another embodiment will be described with reference to FIGS. 7 to 15. FIG. 7 to 15 are sectional views of a touch window according to another embodiment.

Referring to FIG. 7, an anti-reflection layer 400 according to another embodiment includes a first anti-reflection portion 410 and a second anti-reflection portion 420. The second antireflection portion 420 is disposed on the side surface 200e of the sensing electrode 200. [ At this time, the second anti-reflection unit 420 may be disposed in direct contact with the side surface 200e of the sensing electrode 200. The second anti-reflection unit 420 may be disposed in direct contact with a part of the side surface 200e of the sensing electrode 200. [

Referring to FIG. 8, the anti-reflection layer 400 according to another embodiment includes a top anti-reflective layer 401 and a bottom anti-reflective layer 402. The upper surface antireflection layer 401 includes a first antireflection portion 410 and a second antireflection portion 420. The second antireflection portion 420 includes a side surface 200e of the sensing electrode 200, . At this time, the second anti-reflection unit 420 may be disposed in direct contact with the side surface 200e of the sensing electrode 200. The second anti-reflection unit 420 may be disposed in direct contact with a part of the side surface 200e of the sensing electrode 200. [

9, the anti-reflection layer 400 according to another embodiment includes a first anti-reflection portion 410, a second anti-reflection portion 420, and a third anti-reflection portion 430, The anti-reflection portion 430 is disposed on the upper surface of the substrate 100. At this time, the third anti-reflection unit 430 may be disposed in direct contact with the upper surface of the substrate 100.

Referring to FIG. 10, the anti-reflection layer 400 according to another embodiment includes a top anti-reflective layer 401 and a bottom anti-reflective layer 402. The top anti-reflection layer 401 includes a first anti-reflection portion 410, a second anti-reflection portion 420, and a third anti-reflection portion 430, Antireflection layer 402 as shown in FIG. At this time, the third antireflection portion 430 may be disposed in direct contact with the upper surface of the lower surface antireflection layer 402.

Referring to FIG. 11, the third antireflection portion 430 may be disposed on the top and side surfaces of the bottom anti-reflective layer 402. That is, the third anti-reflection unit 430 may be disposed to surround the bottom anti-reflective layer 402.

12, the electrode layer 210 and the antireflection layer 400 are disposed on the first subpattern 110, and the antireflection layer 400 includes a first antireflection portion 410 and a second antireflection portion 420). The second antireflection portion 420 is disposed on the side surface 210e of the electrode layer 210. [ At this time, the second antireflection portion 420 may be disposed in direct contact with the side surface 210e of the electrode layer 210. The second anti-reflection unit 420 may be disposed in direct contact with a part of the side surface 210e of the sensing electrode 200. [

Referring to FIG. 13, the bottom anti-reflection layer 411 may be disposed on the lower surface of the electrode layer 210 in the touch window structure shown in FIG.

14, the second antireflection portion 420 may be disposed along the side surface 210e of the electrode layer 210 and the side surface 110e of the first subpattern 110. Referring to FIG. The second antireflection portion 420 may directly contact the side surface 210e of the electrode layer 210 and the side surface 110e of the first subpattern 110. [

15, a bottom surface antireflection layer 411 disposed on the lower surface of the electrode layer 210 in the touch window structure as shown in FIG. 14 is further included. The side surface 210e of the electrode layer 210, the bottom surface antireflection layer 411, The side surface 411e of the first sub-pattern 110 and the side surface 110e of the first sub-pattern 110 may be disposed. The antireflection layer 411 may directly contact the side surface 210e of the electrode layer 210, the side surface 411e of the lower surface antireflection layer 411, and the side surface 110e of the first subpattern 110. [ .

17 to 20 are a plan view and a cross-sectional view of a touch window according to another embodiment of the present invention.

17 and 18, the touch window 10 includes a cover substrate 500 for protecting structures disposed below, a first substrate 101, a first sensing electrode 105 formed on the substrate 101, And may include a first wiring 301 and a first pad portion 302.

A second substrate 111 is disposed under the first substrate 101 and a second substrate 112 is disposed on the second substrate 111. On the second substrate 112, A recessed portion 113 on the substrate 111, a second sensing electrode 115, a second wiring 311, and a second pad portion 312 may be disposed.

The second sensing electrode 115 may be formed to cross the first sensing electrode 105.

The first substrate 102 may be disposed on the first substrate 101. The first substrate 102 may include engraved portions 103 and embossed portions 104. The engraved portions 103 may be formed by an imprinting process. That is, the engraved portions 103 can be formed by placing a mold on a resin and imprinting the mold on the resin.

Next, a first sensing electrode 105 is disposed in the effective area AA of the first substrate 101. The first sensing electrode 105 may sense the position of the input device.

The first sensing electrode 105 may extend in a second direction. In FIG. 17, the first sensing electrode 105 is shown as a bar, but the embodiment is not limited thereto. Therefore, the first sensing electrode 105 may be formed in various shapes to detect whether or not an input device such as a finger is contacted.

The first sensing electrode 105 may be disposed in the recessed portions 103. That is, the first sensing electrode 105 may be formed by filling sensing electrode materials in the recessed portions 103. Therefore, the number of processes, the process time, and the process cost can be reduced as compared with the conventional deposition and photolithography processes.

The embossed portions 104 may be disposed between the engraved portions 103. The embossed portions 104 are inevitably generated when the engraved portions 103 are formed.

The embossed portions 104 may include a round portion 104e in which a round is formed. The round portion 104e may be disposed adjacent to the engraved portion 110. [ That is, the round portion 104e may be disposed at the edge of the embossed portion 104. [ Therefore, the round portion 104e may be disposed at the end of the embossed portion 104. [ In addition, the round portion 104e may be disposed entirely on the upper surface of the embossed portion 104.

The round portion 104e can be formed by subjecting the embossed portion 104 to surface treatment. For example, the round portion 104e may be formed by exposing the embossed portion 104 to the etchant for a predetermined time.

The width P of the embossed portion 104 may be between 1 탆 and 3,000 탆. Accordingly, the touch sensitivity of the sensing electrode disposed in the engraved portions 103 can be improved, and the noise can be reduced. At this time, the width P of the embossed portion 104 is the width including the round portion 104e.

An under surface antireflection layer 411 and a top surface antireflection layer 412 may be disposed in the recessed portions 103 and 113 on the first and second substrates 101 and 111.

The antireflection layer 411 may be disposed on the rear surface of the first and second sensing electrodes 105 and 115 and the top surface antireflection layer 412 may be disposed on the rear surface of the first and second sensing electrodes 105 and 115, Can be disposed on the upper surface.

Although the first and second sensing electrodes 105 and 115 formed on the first and second substrates 101 and 111 are described above, the first sensing electrode 105 and the second sensing electrode 105 may be formed on one substrate, And a second sensing electrode 115 may be formed on the back surface.

19 and 20, the first and second sensing electrodes 105 and 115 may be arranged in a mesh shape. At this time, the mesh shape can be formed at random to prevent moire phenomenon. Moire phenomenon is a pattern caused by superimposing periodic stripes. It is a phenomenon in which neighboring stripes are overlapped and the thickness of the stripes becomes thicker than other stripes. Therefore, in order to prevent such a moire phenomenon, the conductive pattern shape may be variously arranged.

At least one of the lower surface antireflection layer 411 and the upper surface antireflection layer 412 may be disposed in the recessed portions 103 and 113 on the first and second substrates 101 and 111.

The antireflection layer 411 may be disposed on the rear surface of the first and second sensing electrodes 105 and 115 and the top surface antireflection layer 412 may be disposed on the rear surface of the first and second sensing electrodes 105 and 115, Can be disposed on the upper surface.

Hereinafter, a manufacturing method of a touch window according to an embodiment will be described with reference to FIGS. 21 and 22. FIG.

First, referring to FIG. 21, a mold M having a pattern formed on a resin 100 'may be positioned and imprinted.

Referring to FIG. 22, a substrate 100 including a first sub pattern 110 and a second sub pattern 120 may be formed through the imprinting process, and the first sub pattern 110 and the second sub pattern 110 may be formed. The bottom anti-reflective layer material 411 'may be formed on the second sub pattern 120. The anti-reflective layer material 411 'may be formed by a deposition process, and an electrode material 210' may be formed on the lower anti-reflective layer material 411 '. The electrode material 210 'may be formed by a deposition process.

Also, a top anti-reflective layer material 412 'may be formed on the electrode material 210'. The top anti-reflective layer material 412 'may be formed by a deposition process.

As a method of depositing the antireflection layer material 411 'and the upper surface antireflection layer material 412' at all times, there is reactive sputtering.

In the sputtering deposition method, a metal material separated from a target is oxidized to a product having a different chemical structure to induce deposition.

When the thickness of the metal is very thin such as the thickness of the metal is 1um or less, it is preferable to perform the deposition using the reactive sputtering instead of the wet etching method.

Sputtering begins with a collision between the gas supplied into the chamber and the electrons generated in the cathode (target). In the process, electrons emitted from the cathode collide with atoms of the inert gas to ionize the inert gas while putting an inert gas into the vacuum chamber and applying a voltage to the cathode. When the inert gas is ionized, electrons are released to release energy. At this time, the inert ions in the plasma are accelerated toward the cathode due to a large potential difference, and when they collide with the surface of the cathode, neutral cathode atoms protrude to form a thin film on the substrate 100 can do.

In the reactive sputtering, the characteristics of the under surface antireflection layer material 411 'and the top surface antireflection layer material 412' may vary depending on the ratio of the gas used and the partial pressure.

For example, when the oxygen partial pressure is too low in the used gas, the metal material is not sufficiently oxidized on the substrate 100, so that the desired antireflection layer material 411 'and the top surface antireflection layer material 412' can not be obtained. When the partial pressure is too high, there is a problem that the deposition rate is lowered due to oxidation on the surface of the target.

In addition, the reflectance of the antireflection layer material 411 'and the antireflection layer material 412' may vary depending on the ratio of the gas used and the partial pressure.

Table 1 is a table showing changes in the reflectance of the lower surface antireflection layer material 411 'and the upper surface antireflection layer material 412' according to the ratio of the gas used in the reactive sputtering. The reflectance is an average reflectance in a range of 380 nm to 780 nm which is the wavelength of the entire visible light.

Referring to Table 1, the metal used is nitrogen (Ni), the pressure is 5 mTorr, the power used is 1000 W, and the reactive gases are argon (Ar), oxygen (O 2) and nitrogen (N 2).

The reflectance of the bottom anti-reflective layer material 411 'and the top anti-reflective layer material 412', which are formed through the deposition process with different ratios of oxygen and nitrogen, The reflectance is 7% when the ratio is 1: 0.4: 0.1, and the reflectance is 6% when the ratio of argon to oxygen and nitrogen is 1: 0.5: 0.1. In addition, when the ratio of argon to oxygen and nitrogen is 1: 0.1: 0.3 to 0.4, the reflectance is 8 to 9%.

That is, when reactive sputtering is performed through the ratios shown in Table 1, the bottom anti-reflective layer material 411 'and the top anti-reflective layer material 412' having a reflectance of 20% or less can be obtained. It can be seen that the antireflection effect is excellent when the antireflection layer material 411 'and the antireflection layer material 412' are deposited according to the values given above.

The antireflection layer 400 may be formed of a material such as copper (Cu), gold (Au), silver (Ag), aluminum (Al), titanium (Ti), nickel (Ni), chromium (Cr) Or a material formed by oxidizing an alloy thereof. These metal materials are generally considered to have high reflectance.

Specifically, when the antireflection layer 400 is formed of silver (Ag), aluminum (Al) and gold (Au) as an example of a metal substituting for ITO, , Reflectance is 90% or more in the visible light region (380 to 810 nm), and when the metal is gold (Au), the reflectance is 38% or more. However, the reflectivity of the antireflection layer 400 can be controlled to be greater than 0% and less than 20% through the deposition method according to the above-described embodiment.

Considering that it is difficult to apply it to a high cost and flexible which is a problem of existing ITO, it is possible to use a suitable metal as the antireflection layer 400, and it can be generated by using a metal as the antireflection layer 400 The phenomenon of high reflectivity can also be improved through the deposition method described above, and thus the touch window according to the embodiment of the present invention has a remarkable effect.

(Ar), oxygen (O2), and nitrogen (N2) are exemplified in the experiment of the present invention. However, in the experiment of the present invention, the reflection prevention layer material 411 'and the top surface reflection prevention layer material 412' including carbon dioxide Or may be deposited.

The method of forming the bottom anti-reflective layer material 411 'and the top anti-reflective layer material 412' described above is not limited to forming the bottom anti-reflective layer material 411 'and the top anti-reflective layer material 412' , The anti-reflection layer can be formed in the same manner in other embodiments.

Referring to FIG. 23, the bottom anti-reflective layer material 411 'and the electrode material 210' may be etched. At this time, the bottom anti-reflective layer material 411 'and the electrode material 210' may be etched in one step. That is, the anti-reflection layer material 411 'and the electrode material 210' may be etched with one etching solution. At this time, the etchant may not etch the upper surface antireflection layer material 412 '. In other words, the upper surface antireflection layer material 412 'includes a material that reacts with an etchant different from the surface antireflection layer material 411' and the electrode material 210 ', thereby selectively etching.

A difference in etching area arises due to the difference in the bonding area between the structure of the first sub pattern 110 and the second sub pattern 120 and the electrode material 210 '. That is, since the bonding area of the first sub pattern 110 and the electrode material 210 'is larger than the bonding area of the second sub pattern 120 and the electrode material 210' So that the etching of the electrode material 210 'formed on the sub pattern 110 occurs little. That is, according to the same etch rate, the electrode material 210 'formed on the first subpattern 110 remains and the electrode material 210' formed on the second subpattern 120 is etched away do. Accordingly, the top anti-reflective layer material 412 'and the bottom anti-reflective layer material 411' formed on the second sub pattern 120 can also be lifted off and removed. Therefore, the antireflection layer 411, the electrode layer 210, and the top surface antireflection layer 412 may be formed only on the first sub pattern 110, and the electrode layer 210 may be arranged in a mesh shape. As described above, since the upper surface antireflection layer 412 'is not etched, the line width of the upper surface antireflection layer 412 is wider than the line width of the electrode layer 210 or the lower surface antireflection layer 411 .

 Referring to FIG. 24, the touch window 10 may be disposed on the display panel 20 as a driving unit. The touch window 10 and the display panel 20 are bonded together to form a display device.

The display panel 20 has a display area for outputting an image. The display panel applied to such a display device may generally include an upper substrate 21 and a lower substrate 22. [ A data line, a gate line, a thin film transistor (TFT), or the like may be formed on the lower substrate 22. The upper substrate 21 may be bonded to the lower substrate 22 to protect components disposed on the lower substrate 22. [

The display panel 20 may be formed in various forms depending on what type of display device the display device according to the present invention is. That is, the display device according to the present invention includes a liquid crystal display (LCD), a field emission display, a plasma display panel (PDP), an organic light emitting display (OLED), and an electrophoretic display So that the display panel 20 can be configured in various forms.

The touch window 10 and the display panel may be joined together to form a display device, and such a display device may be a mobile terminal.

In particular, the touch window 10 according to the embodiment may include a curved touch window. Accordingly, the display device including the same may be a curved display device.

The touch window 10 may include a flexible touch window that is curved. Accordingly, the display device including the same may be a flexible display device. Therefore, the user can bend or bend by hand.

25 is a diagram illustrating a touch window according to an embodiment applied to navigation of a vehicle.

Referring to FIG. 25, the touch window 10 can be applied not only to a display device such as a mobile terminal but also to a vehicle. In the drawings, automobile navigation is shown, but the embodiment is not limited thereto. Therefore, not only PND (Personal Navigation Display) but also dashboard can be applied to implement CID (Center Information Display). However, the embodiment is not limited thereto, and it goes without saying that such a display device can be used in various electronic products.

The features, structures, effects and the like described in the foregoing embodiments are included in at least one embodiment of the present invention and are not necessarily limited to one embodiment. Further, the features, structures, effects, and the like illustrated in the embodiments may be combined or modified in other embodiments by those skilled in the art to which the embodiments belong. Therefore, it should be understood that the present invention is not limited to these combinations and modifications.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is clearly understood that the same is by way of illustration and example only and is not to be construed as limiting the scope of the present invention. It can be seen that various modifications and applications are possible. For example, each component specifically shown in the embodiments may be modified and implemented. It is to be understood that the present invention may be embodied in many other specific forms without departing from the spirit or essential characteristics thereof.

10 touch window
20 Display panel
21 upper substrate
22 Lower substrate
100 substrate
101 first substrate
102 First Item
103 engraved part
104 embossed portion
104e round section
105 first sensing electrode
110 first sub pattern
110e side of the sub pattern
111 second substrate
112 second substrate
113 engraved part
115 second sensing electrode
120 second subpattern
200 sensing electrode
200a upper surface of the sensing electrode
The lower surface of the 200b sensing electrode
Side of 200e sensing electrode
200h height of sensing electrode
201 electrode portion
210 electrode layer
Side of the electrode layer 210e
210 'electrode material
300 wiring
301 first wiring
302 first pad portion
311 Second Wiring
312 second pad portion
400 antireflection layer
The upper surface of the antireflection layer 400a
The edge of the 400e antireflection layer
401 Top anti-reflective layer
402,
410 first anti-
411,
411e, the side surface of the antireflection layer
411 ', the anti-reflection layer material
412 Top anti-reflection layer
412 'Top anti-reflective layer material
420 second anti-
430 Third anti-
500 cover substrate

Claims (13)

Board;
A sensing electrode disposed on the substrate and sensing a position; And
And an anti-reflection layer disposed on the sensing electrode,
Wherein the reflectance of the antireflection layer is greater than 0% and less than or equal to 20%. The method according to claim 1,
Wherein the anti-reflection layer comprises a bottom anti-radiation layer disposed on a back surface of the sensing electrode, and an upper anti-radiation layer disposed on an upper surface of the sensing electrode. The method according to claim 1,
Further comprising an electrode portion disposed on the substrate and having a mesh shape. The method of claim 3,
Wherein the electrode unit includes first and second sub patterns and the sensing electrode,
Wherein the sensing electrode is disposed on the first subpattern. The method according to claim 1,
Wherein the substrate includes an embossed portion disposed between the engraved portion and the engraved portion,
Wherein the sensing electrode is disposed in the engraved portion. The method according to claim 1,
The antireflection layer is formed by oxidizing copper (Cu), gold (Au), silver (Ag), aluminum (Al), titanium (Ti), nickel (Ni), chromium (Cr) and lead (Pd) Touch window formed. The method according to claim 1,
Wherein the sensing electrodes are disposed on both sides of the substrate. 3. The method of claim 2,
Wherein the top anti-reflective layer and the bottom anti-reflective layer comprise different materials. Forming a sensing electrode on the substrate; And
And forming an anti-reflection layer on the sensing electrode,
Wherein the reflectance of the antireflection layer is greater than 0% and less than or equal to 20%. 10. The method of claim 9,
Wherein the anti-reflection layer is deposited by reactive sputtering. 11. The method of claim 10,
Wherein the antireflection layer is deposited with at least one of a reactive gas, oxygen (O 2), nitrogen (N 2), and carbon dioxide (CO 2) gas. 12. The method of claim 11,
The inert gas is an argon (Ar) gas,
Wherein a ratio of the argon (Ar), oxygen (O2), and nitrogen (N2) gases is 1: 0.4 to 0.5: 0.1. 12. The method of claim 11,
The inert gas is an argon (Ar) gas,
Wherein a ratio of the argon (Ar), oxygen (O2), and nitrogen (N2) gases is 1: 0.1: 0.3 to 0.4.

Images