KR20140117038A - Anti-reflection film and method for manufacturing same - Google Patents

Abstract

The present invention relates to an anti-reflection film and a manufacturing method thereof. The anti-reflection film includes an anti-reflection layer which comprises: a basic film material; and a nanocolumn pattern formed on one side of the basic material film where nanocolumns with a 1-5 ratio exsits a density of 9x10^7-1.1x10^8 piece/cm^2. The manufacturing method comprises: a step of preparing a mold with an engraved nanoporous pattern corresponding to the nanocolumn pattern; a step of coating active energy ray hardening compositions on one side of the basic material film; a step of aligning the active energy ray hardening compositions coated on the basic material film towards the nanoporous pattern on the mold; a step of advancing the basic material film while forming an anti-reflection layer composed of nanocolumns by pressurizing and touching the basic material film and the mold aligned facing each other in a rolling method using a pair of cylindrical pressurizing rollers; and a step of hardening the anti-reflection layer by radiating the active energy rays on the basic material film having passed the pressurizing roller.

Description

TECHNICAL FIELD [0001] The present invention relates to an antireflection film and an antireflection film,

The present invention relates to an anti-reflection film and a method of manufacturing the same.

In general, various optical functional films are used for a flat panel display (FPD) such as a liquid crystal display (LCD) and a plasma display panel (PDP) in order to improve visibility.

Among them, an anti-reflection film is a film for improving light transmittance and contrast and reducing light reflection. Generally, an anti-reflection film is formed by using destructive interference through phase matching, And the outer refractive index is controlled.

Generally, a method of manufacturing an antireflection film is a method of reducing reflectance by minimizing a refractive index difference between air and a material by laminating materials having various refractive indices with a multilayer thin film so as to be comparable to refractive index of air.

Inorganic inorganic materials and polymeric materials are used as materials having various refractive indexes, and coating processes are repeatedly performed depending on the number of materials used for each layer in order to form a multilayer thin film. Specifically, a dry method in which an inorganic compound is deposited and laminated on a base film, and a wet method in which an organic material is uniformly applied on a base film is used. However, since the above methods require an operation of uniformly coating a material to be laminated on a base film having a thickness of several tens of nanometers (nm), it is difficult to process the film, and only a reflection at a specific wavelength can be removed In order to reduce reflection in a wide wavelength region, it is difficult to form a multilayer coating, thereby complicating the film manufacturing process and increasing the manufacturing cost.

On the other hand, when a pattern of convex microstructure having a conical shape, which is known as a periodic microstructure, for example, a moth-eye structure, is formed on the surface of the antireflection film, the refractive index gradually changes and the antireflection effect is known to be excellent have. In order to produce a film on which the microstructure is formed, a mold having a corresponding structure is required.

Korean Patent Application Laid-Open No. 10-2012-0114975 discloses a method of manufacturing a semiconductor device, comprising: forming an inorganic microstructure pattern on a substrate; And depositing a material capable of adhering to the microstructure pattern on the microstructure pattern by sputtering to form a concavo-convex structure pattern having an upper line width narrower than a lower line width, thereby forming a mold. The resin mold produced using the mold is used for producing an antireflection film having a concave-convex structure pattern corresponding to the mold by hot stamping, UV-stamping or roll embossing. However, this method has limitations in realizing the exact aspect ratio of the nanostructure since the material is irregularly deposited on a single surface during the sputtering deposition process. In addition, when the deposition is performed in a large amount, the aspect ratio of the nanostructure is lowered and the nanostructure is formed in a flattening direction.

SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide an antireflection film capable of exhibiting an antireflection effect as a single layer and a method for efficiently producing the antireflection film.

According to an aspect of the present invention,

An antireflection film comprising a base film and an antireflection layer having a nano pillar pattern formed on one surface of the base film with a density of 9 x 10 ⁷ to 1.1 x 10 ⁸ / cm ² of nanopillar having an aspect ratio of 1 to 5, to provide.

According to a preferred embodiment of the present invention, the height of the nanopillar may be 150 nm to 500 nm.

The present invention also relates to a method for producing the antireflection film,

Preparing a mold having a nano-pore pattern corresponding to the nano-pillar pattern;

Applying an active energy ray curable composition to one side of the base film;

Aligning the active energy ray-curable composition applied on the base film so as to face the nano pores of the mold; And

Pressing the substrate film and the oppositely aligned substrate film in a rolling manner using a pair of cylindrical pressure rollers, thereby advancing the substrate film while forming an antireflection layer made of nano columns;

And irradiating an active energy ray to the base film which has passed through the pressure roller to cure the reflection ring layer.

According to a preferred embodiment of the present invention, the mold is a roll-shaped metal hard mold, and the nanopattern may be formed by anodization.

According to a preferred embodiment of the present invention, the mold comprises a soft mold (hereinafter referred to as a " mold sheet ") formed by applying an active energy ray-curable resin composition to a master mold having a nanopillar pattern, Quot;).

According to a preferred embodiment of the present invention, the active energy ray-curable resin composition comprises 30 to 80% by weight of an active energy ray curable compound, 1 to 40% by weight of an active energy ray curable resin, 1 to 10% by weight of a photoinitiator, And 10 to 30% by weight of slip.

The present invention also provides a resin composition comprising 30 to 80% by weight of an active energy ray curable compound, 1 to 40% by weight of an active energy ray curable resin, 1 to 10% by weight of a photoinitiator and 10 to 30% There is provided a molded sheet characterized in that a depressed angle of a desired pattern is formed as a cured product of the composition.

According to a preferred embodiment of the present invention, the pattern is a nano pillar pattern formed by forming nano pillars having an aspect ratio of 1 to 5 at a density of 9 x 10 ⁷ to 1.1 x 10 ⁸ / cm ² .

According to a preferred embodiment of the present invention, the active energy ray-curable compound may be a mixture of a bifunctional methacrylate monomer, a trifunctional methacrylate monomer and a pentafunctional methacrylate monomer.

According to a preferred embodiment of the present invention, the active energy curable compound comprises 20 to 60% by weight of a bifunctional methacrylate monomer, 5 to 40% by weight of a trifunctional methacrylate monomer, And 1 to 40% by weight of a methacrylate monomer.

INDUSTRIAL APPLICABILITY According to the present invention, it is possible to efficiently produce an antireflection film having a high transmittance characteristic even in a single layer structure by a continuous process.

1 is a plane SEM photograph of the antireflection film produced in Example 1. Fig.
2 is a conceptual diagram of an aluminum anode oxidation method.
3 is a schematic view of a roll-to-roll process utilizing a hard mold.
4 is a process diagram showing a process of manufacturing a mold resin.
5 is a schematic view of a roll-to-roll process utilizing a soft mold.
6 is a plane SEM photograph of the antireflection film produced in Comparative Example 1. Fig.
Fig. 7 shows the results of measurement of the transmittance of the antireflection film produced in Example 1 and Comparative Example 2. Fig.

Hereinafter, the present invention will be described in more detail.

The reflective coated film according to the present invention minimizes the gap between the air and the refractive index of the substrate by forming a nanopillar pattern on the film surface.

1 is a plan view of a nano-pillar-formed anti-reflection film according to a preferred embodiment of the present invention.

In the antireflection film according to the present invention having the above-described structure, the specific gravity of the air is 50% and the specific gravity of the nano pores is 50% when the area specific gravity at the end with the nano pillar is calculated. This structural condition reduces the diffuse reflection at the moment the light passes through the substrate and forms a relatively low reflectance compared to the 100% single-surface thin film layer.

In the present invention, an active energy ray-curable resin composition is coated on a base film, a nano pillar pattern is formed using a mold, and an active energy ray is irradiated to cure the antireflection film.

Therefore, in order to produce a nanopillar using a mold, a reverse phase pattern, that is, a nanopore, is required. In the present invention, the intaglio type nano pore master roll can be used as a core component of the roll-to-roll process, thereby enhancing the continuity of the antireflection film manufacturing process.

According to the present invention, the engraved nano pore master roll can utilize two methods. First, a roll (hard roll) is manufactured using an aluminum cathode oxidation processing method. Second, a resin mold (soft roll) is manufactured using a master mold manufactured by an aluminum cathode oxidation processing method.

aluminum Cathodic oxidation  Processing method

First, a nano-pore roll (hard roll) manufactured by using an aluminum cathode oxidation processing method on an aluminum metal roll will be described.

In order to produce anodized aluminum porous master, a high purity aluminum metal is firstly required. The size of the pores is mainly determined by the pH of the electrolyte to be supported. In the present invention, sulfuric acid is mainly used because nano pillars having a space distance of about 100 nm or less are required. However, the present invention is not limited thereto. In order to form the pores, a voltage is applied to the aluminum metal material and the reference electrode (carbon electrode) in addition to the acidic pH condition of the supported electrolyte to carry out the electrical reaction together with the supporting electrode to form the self-assembled honeycomb-shaped nano pores. If the time to be carried by the acidic electrolyte is short, the depth of the nanopillar growing into the aluminum is shortened due to oxidation, and the length of the nanopillar is long when the deposition time is long (see FIG. 2).

The primary anodization uses an acidic aqueous solution, such as an aqueous solution of sulfuric acid, to form pores with a nanometer spacing of about 100 nanometers. The voltage is maintained at 20 to 60 V, preferably about 40 V, and the temperature during the electrochemical reaction is maintained at 5 to 25 캜, preferably about 15 캜, because a uniform reaction product can be obtained. The result of this reaction is the formation of nano pillars, the component of which is aluminum oxide.

However, when only the first anodization is carried out, the entrance of the column is narrow and the space of the inner chamber of the lower part is wide, and it tends to be difficult to replicate with the ultraviolet curable liquid. In order to solve this difficulty, it is preferable to carry out an artificially inadequately formed alumina nano pillars by carrying aluminum oxide formed by primary anodization in a mixed aqueous solution of chromium oxide and phosphoric acid (etching step) In this case, as the electrochemical reaction proceeds at the lower part of the nano pillar of the primary anodization, the hemispherical reaction proceeds to the inside of the aluminum surface. The hemispherical shape is exposed on the surface and the same method as the first anodization And anodization proceeds to form a flat anode aluminum oxide.

3 is a schematic view of a roll-to-roll process using a hard roll. After the active energy ray-curable resin composition is coated on the base film, the nano pores are cured by an active energy ray such as ultraviolet rays passing between the master roll and the sub-roll where the nano pores are formed.

Mold sheet  Method

In addition to roll-shaped aluminum metal, plate-type high-purity aluminum foil can be used as a master.

Generally, aluminum foil has a lot of micro-sized scratches on its surface, and it shows rough surface roughness. Therefore, it is preferable to first carry out the task of flattening such roughness as much as possible. Surface planarization is carried out through electropolishing in an electrolytic solution. The electrolytic solution used is an acidic solution such as perchloric acid, and a voltage of 10 to 50 V, preferably about 20 V is applied to electrochemically planarize the surface. After the electrolytic polishing process, the aluminum foil exposes a pure aluminum metal surface rather than an aluminum oxide. Thereafter, a primary anodization operation, an etching operation, and a secondary anodization operation as described above can be performed.

As described above, a resin mold (soft mold) is manufactured using an aluminum foil having nano pores formed through anodic aluminum processing as a master mold. For example, Korean Patent Registration No. 568581 can be referred to as a resin mold manufacturing process.

Specifically, referring to FIG. 4, a nano pore 12 is formed in an aluminum foil master mold 10 manufactured through anodic aluminum processing. The active energy ray-curable resin composition is applied thereto, and the active energy ray such as ultraviolet rays is irradiated to cure it. When the cured nanoparticle mold 20 is separated from the master mold 10, a nanopillar mold 20 in which the nanopillar 22 is formed is prepared. The active energy ray-curable resin composition is applied to the nanoparticle mold 20, cured and self-duplicated to produce a soft nano-pore mold 30 having nanopores 32. The nanoporous mold can be laminated on the base film 31 and supported thereon.

5 is a schematic view of a roll-to-roll process utilizing a soft mold.

The soft nano punched mold 30 is continuously attached on a substrate 40 such as a polyethylene terephthalate film and then continuously rotated by the rolls 101a, 102a, The base film 50 coated with the active energy ray curable composition is brought into press contact with the nano pore mold 30 while advancing between the pair of pressure rolls 101a and 101b. At the same time, active energy rays such as ultraviolet rays are irradiated to cure the active energy ray curable composition, and then pass through a pair of cooling rolls 102a and 102b, and thereafter, the substrate 40 to which the nanoporous mold 30 is attached, The nano pillar pattern 60 is formed on the antireflection film base 50 to correspond to the depressed pattern of the nanoporous mold 30. Therefore, an antireflection film having a nano pillar pattern can be continuously obtained.

For more details on the rolling thin film transfer patterning technique, refer to Korean Patent No. 0731736.

Active energy ray  Curable resin composition

The composition used for producing the nano punched mold sheet 30 will be described.

The mold sheet according to the present invention comprises 30 to 80% by weight of an active energy ray curable compound having an unsaturated double bond based on the total weight of the composition, 1 to 40% by weight of an active energy ray curable resin, 1 to 10% by weight of a photoinitiator, And 30% by weight of a cured product of the resin composition.

(1) Active energy ray-curable compound

The active energy ray-curable compound having an unsaturated double bond is at least one selected from the group consisting of a monomer having a vinyl group, a monomer having a (meth) acryloxy group, and a monomer having an allyl group, and is cured by ultraviolet rays, infrared rays, Lt; / RTI >

Examples of the monomer having a vinyl group include cyclohexyl vinyl ether, 2-ethylhexyl vinyl ether, dodecyl vinyl ether, 1,4-butanediol divinyl ether, 1,6-hexanediol divinyl ether, diethylene glycol divinyl Ether, ethylene glycol butyl vinyl ether, ethylene glycol divinyl ether, triethylene glycol methyl vinyl ether, triethylene glycol divinyl ether, trimethylolpropane trivinyl ether, 1,4-cyclohexanedimethanol divinyl ether, vinyl acetate, Vinyl chloroacetate, N-vinylpyrrolidone, N-vinylcarbazole, N-vinylcaprolactam, vinyltoluene, styrene, and alphamethylstyrene.

Examples of the monomer having a (meth) acryloxy group include isobornyl acrylate, 1,6-hexanediol diacrylate, triethylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, tetraethylene glycol di Butanediol diacrylate, 1,4-butanediol dimethacrylate, diethylene glycol diacrylate, neopentyl glycol diacrylate, neopentyl di (meth) acrylate, (Meth) acrylate, polyethylene glycol di (meth) acrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, alkoxylated tetraacrylate, octyldecyl acrylate, isodecyl acrylate, Lauryl acrylate, stearyl acrylate, behenyl acrylate), and the like.

Examples of the monomer having an allyl group include allyl propyl ether, allyl butyl ether, allyl ether, pentaerythritol triallyl ether, diphenic acid diaryl, trimethylol propane diallyl ether, trimethylol propane triallyl ether, diallyl phthalate, Phthalate, triallyl trimellitate and the like.

The content of the total active energy ray-curable compound in the composition is preferably 30 to 80% by weight.

According to a preferred embodiment of the present invention, the active energy ray-curable compound may be a mixture of a bifunctional methacrylate monomer, a trifunctional methacrylate monomer and a pentafunctional methacrylate monomer, Based on the total weight, 20 to 60% by weight of the bifunctional methacrylate monomer, 5 to 40% by weight of the trifunctional methacrylate monomer and 1 to 40% by weight of the pentafunctional methacrylate monomer.

(2) Active energy ray curing resin

The active energy ray-curable resin means an active energy ray-curable resin having at least one functional group selected from a vinyl group, a (meth) acryloxy group, an allyl group and an allyloxy group.

The active energy ray-curable resin is preferably an oligomer or polymer having a molecular weight of 1000 or more. Specific examples thereof include a cycloaliphatic or aromatic urethane acrylate oligomer having at least two reactive functional groups, ) Acrylate, polyether (meth) acrylate, epoxy (meth) acrylate or polycarbonate (meth) acrylate oligomer, or mixtures thereof.

The content of the active energy ray-curable resin having the functional group is preferably 1 to 40% by weight based on the total weight of the composition. If it exceeds this range, the denseness of the cured coating film is lowered, and the glass transition temperature (Tg) of the molded cured product is lowered, thereby deteriorating the heat resistance. In addition, the decolorizing power against chemicals and moisture is lowered, Durability can be significantly reduced.

(3) Photo initiators

The photoinitiator used in the production of the resin mold in the present invention is preferably a compound which generates a free radical or a cation by an active energy ray. Examples of the free radical initiator include benzyl ketaldehyde, benzoin ethers, acetophenone derivatives, ketoxime ethers, benzophenone, benzo or thioxanthone compounds, and the cationic initiators include onium salts, Ferrocenium salts, or diazonium salts.

(4) Slip agent

According to a preferred embodiment of the present invention, the mold sheet composition according to the present invention comprises 10 to 30% by weight, based on the total weight of the composition, of a compound having both a silicon group and a fluorine group or both a silicon group and a fluorine group for control of releasability.

The slip agent content is important for minimizing the surface tension acting at the nanopore inlet and ideally filling the nanopore space. According to a preferred embodiment of the present invention, as shown in FIG. 1, the slip agent content should be as high as 10 to 30% by weight in order to form nano pillars having a diameter of 100 nm or less.

The compound having both the silicon group and the fluorine group, or both the silicon group and the fluorine group may also be an active energy ray curable compound, such as a vinyl group, a (meth) acrylate group or an allyl group, a surfactant or an oil. (Meth) acryloxy group-containing organosiloxane, silicone polyether acrylate, fluoroalkyl group-containing vinyl compound, fluoroalkyl group-containing (meth) acrylate compound, Acrylate compounds, fluoropolyacrylates, polydimethylsiloxanes, fluoropolymers, dimethylsilicone oils and the like.

A composition for producing an antireflection film and a transparent substrate

In order to produce an antireflection film by a roll-to-roll method using a hard mold or a soft mold having nanoporous patterns formed as described above, an active energy ray-curable composition for forming a nano-column on a transparent substrate film (or a transparent substrate) And then press-contacted with the nano-pillar pattern of the mold, followed by a curing process.

The active energy ray-curable composition for forming the nanopillar may be the same as or different from the composition used for the soft mold, and is not particularly limited as long as it can provide an appropriate transmittance when forming a nanopillar pattern.

As the transparent substrate film, those generally used in the technical field to which the present invention belongs may be used, but preferably a transparent substrate film such as polymethyl methacrylate (PMMA), polyethylene terephthalate (PET), polycarbonate (PC), polyvinyl acetate ), Triacetylcellulose (TAC), and polyimide (PI). Particularly, it is more preferable to use the transparent substrate having a small difference in refractive index from the polymer resin composition used for producing a nano-column pattern to improve the antireflection effect.

The thickness of the transparent base film is preferably 50 to 250 占 퐉, but is not particularly limited.

Hereinafter, preferred embodiments and comparative examples are provided to facilitate understanding of the present invention. However, it should be understood that the following examples are intended to illustrate and not limit the present invention.

Example  One

<Manufacture of aluminum foil master mold>

Electrolytic polishing was performed primarily to flatten the surface roughness of the aluminum foil. The surface of the electrolyte was electrochemically flattened by applying a voltage of about 20 V using a perchloric acid solution. Next, the first stage anodization was carried out. The aqueous solution of sulfuric acid was used as the electrolyte, and the voltage was maintained at about 40 V and the reaction temperature was maintained at 15 ° C. The aluminum oxide formed by the first anodization was supported on a mixed aqueous solution of chromium oxide and phosphoric acid to remove artificially ineligible aluminum oxide (Alumina) nano pillars. Then, the second anodization was carried out in the same manner as the first anodization to obtain a master mold in which the nanopores were formed in a flat shape. Specific experimental conditions and results are shown in Tables 1 to 3.

solution solute menstruum Electrolytic polishing Perchloric acid 70ml
(Sigma Aldrich: 311413-500 ml) Ethanol 280ml Sulfuric acid Sulfuric acid 5.801 ml
(Sigma Aldrich: 320501-2.5 L) DIW 350ml Alumina etching Phosphoric acid 40.4ml
Chromium (VI) oxide 18 g (ACROS) DIW 1L

Experimental conditions and results Stage 1
Electrolytic polishing Step 2
1 ^st Anodizing Step 3
Etching Step 4
2 ^nd Anodizing Voltage range 20V H ₂ C ₂ O ₄ - 40 V - H ₂ C ₂ O ₄ - 40 V Electrolyte temperature 4 ℃ H ₂ C ₂ O ₄ - 15 ° C 65 ℃ H ₂ C ₂ O ₄ - 15 ° C Type of electrolyte Ethanol: HClO ₄
4: 1 (volume ratio) H ₂ C ₂ O ₄ (0.3M) _{Chromic acid (0.3M) + H 3} PO 4 (1.2M) H ₂ C ₂ O ₄ (0.3M)

<Manufacture of soft mold>

The master mold having the pattern structure of the antireflection pattern was aligned with the pattern structure side thereof facing upward and the mold composition according to the composition of Production Example 1 of Table 4 was coated. Subsequently, a transparent polyethylene terephthalate film was placed on the coated surface, followed by curing with ultraviolet light of 40 mJ / cm exposure dose using Black Light or the like, and the mold was removed from the master mold to prepare a nano pillar mold sheet having a final thickness of 5 μm. Then, a 10,000 mJ / cm ultraviolet ray was further exposed to a nano-pore shape surface of the mold sheet by using a high-pressure mercury lamp to complete a mold sheet for forming an antireflection pattern.

ingredient matter Production Example 1 Production Example 2 Production Example 3 Production Example 4 Active energy ray-curable compound Bifunctional methacrylate monomer
(1,4-butadiene dimethacrylate) 45 25 35 50 Trifunctional methacrylate monomer
(Trimethylolpropane trimethacrylate) 20 10 10 20 5-functional methacrylate monomer (dipentaerythritol pentaacrylate) 10 5 9 10 Active Energy ray curing resin Urethane acrylate oligomer
(4-function / molecular weight 1100) 5 25 30 9.5 Epoxy acrylate oligomer
(Bifunctional / molecular weight 6000) 0 10 10 5 Photoinitiator Benzyl dimethyl ketal 5 5 5 5 Slip agent Organic modified silicone acrylate
(Silicone polyether acrylate) 15 20 One 0.5

&Lt; Preparation of antireflection film &

The mold sheet thus prepared was mounted on the apparatus as shown in Fig. After the composition of Production Example 1, which is a resin composition for forming an antireflection layer (nano pillar), was coated on the polyethylene terephthalate base film 50, the resin composition was processed in a state of being in press contact with the resin mold by the pressure rolls 101a and 10b, and then cooled by the cooling rolls 102a and 102b and separated from the resin mold to form a film having a height of about 210 mu m and an aspect ratio of about 3 mu m on a base film having a thickness of about 188 mu m An antireflection film having a nano pillar pattern formed at a density of about 1.0 x 10 ⁸ / cm 2 was produced. 1 is a photograph showing the upper surface of the nano pores of the anti-reflection film produced in Example 1. Fig. It can be seen that the end of each nanopillar is composed independently.

Example  2

An antireflection film was prepared in the same manner as in Example 1, except that the composition of Production Example 2 in Table 4 was used.

Comparative Example  One

An antireflection film was prepared in the same manner as in Example 1 except that the composition of Production Example 3 in Table 4 was used. 6 is a photograph showing the upper surface of the nano pores of the anti-reflection film produced in Comparative Example 1. Fig. It can be seen that the end of each nanopillar is not composed independently.

Comparative Example  2

An antireflection film was prepared in the same manner as in Example 1 except that the composition of Production Example 4 in Table 1 was used.

Permeability measurement

The transmittance characteristics of the antireflection films prepared in Example 1 and Comparative Example 1 were measured and shown in Fig. The antireflection film of Example 1 was about 3.5% higher than that of the PET antireflection film which had not been subjected to any treatment, and the permeation improvement effect was about 2.5% higher than that of the film of Comparative Example 1.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is clearly understood that the same is by way of illustration and example only and is not to be construed as limiting the present invention. It will be readily appreciated that variations, modifications and variations are possible.

30: Molded sheet
40: mold sheet base film
50: antireflection base film
60: antireflection layer pattern
101a, 101b: Cylindrical pressure roller
102a, 102b: cylindrical cooling rollers

Claims (10)

An antireflection film comprising a base film and an antireflection layer having a nano pillar pattern formed on one surface of the base film with a density of 9 x 10 ⁷ to 1.1 x 10 ⁸ / cm ² of nanopillar having an aspect ratio of 1 to 5.
The antireflection film according to claim 1, wherein the height of the nanopillar is 150 nm to 500 nm.
A method for producing the antireflection film of claim 1,
Preparing a mold having a nano-pore pattern corresponding to the nano-pillar pattern;
Applying an active energy ray curable composition to one side of the base film;
Aligning the active energy ray-curable composition applied on the base film so as to face the nano pores of the mold; And
Pressing the substrate film and the oppositely aligned substrate film in a rolling manner using a pair of cylindrical pressure rollers, thereby advancing the substrate film while forming an antireflection layer made of nano columns;
And irradiating an active energy ray to the base film having passed through the pressure roller to cure the reflection ring layer.
4. The method of claim 3, wherein the mold is a roll-shaped metal hard mold, and the nanopattern is formed by anodization.
The method according to claim 3, wherein the mold is a soft mold formed by applying an active energy ray-curable resin composition to a master mold having a nano-pillar pattern and then curing and separating the active energy ray, .
The active energy ray-curable resin composition according to claim 5, wherein the active energy ray-curable resin composition comprises 30 to 80% by weight of an active energy ray curable compound, 1 to 40% by weight of an active energy ray curable resin, 1 to 10% by weight of a photoinitiator, And 10 to 30% by weight of the antireflection film.
A cured product of a resin composition comprising 30 to 80% by weight of an active energy ray curable compound, 1 to 40% by weight of an active energy ray curable resin, 1 to 10% by weight of a photoinitiator and 10 to 30% And the engraved pattern of the desired pattern is formed.
8. The mold sheet according to claim 7, wherein the pattern is a nano pillar pattern formed by a nanopillar having an aspect ratio of 1 to 5 at a density of 9 x 10 ⁷ to 1.1 x 10 ⁸ / cm ² .
8. The method of claim 7,
Wherein the active energy ray curable compound is a mixture of a bifunctional methacrylate monomer, a trifunctional methacrylate monomer, and a 5-functional methacrylate monomer.
10. The composition of claim 9, wherein the active energy curable compound comprises 20 to 60% by weight of bifunctional methacrylate monomers, 5 to 40% by weight of trifunctional methacrylate monomers and 5 to 40% And 1 to 40% by weight of a monomer.

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