KR20130110392A - Liquid crystal display device and method for manufacturing the same - Google Patents

Liquid crystal display device and method for manufacturing the same Download PDF

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Publication number
KR20130110392A
KR20130110392A KR1020120032333A KR20120032333A KR20130110392A KR 20130110392 A KR20130110392 A KR 20130110392A KR 1020120032333 A KR1020120032333 A KR 1020120032333A KR 20120032333 A KR20120032333 A KR 20120032333A KR 20130110392 A KR20130110392 A KR 20130110392A
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South Korea
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formed
common electrode
line
sensing
sensing line
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KR1020120032333A
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Korean (ko)
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KR101466556B1 (en
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이선정
송인혁
신희선
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엘지디스플레이 주식회사
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    • GPHYSICS
    • G06COMPUTING; CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/13338Input devices, e.g. touch-panels
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • GPHYSICS
    • G06COMPUTING; CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412Digitisers structurally integrated in a display
    • GPHYSICS
    • G06COMPUTING; CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/208Touch screens
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • G02F1/134309Electrodes characterised by their geometrical arrangement
    • G02F2001/134372Electrodes characterised by their geometrical arrangement for fringe field switching [FFS] where the common electrode is not patterned, e.g. planar
    • GPHYSICS
    • G06COMPUTING; CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Abstract

PURPOSE: A liquid crystal display device and a method for manufacturing the same are provided to reduce thickness by forming a sensing electrode in a liquid crystal panel. CONSTITUTION: A pixel electrode is formed in each pixel. Common electrode blocks (180) form a pattern for sensing the touch of a user. Pad parts (163) have thicker line widths compared to sensing lines. A contact part (165) electrically connects the sensing lines and the common electrode blocks. The contact part is in contact with at least one pad part.

Description

Liquid crystal display device and method for manufacturing the same

The present invention relates to a liquid crystal display device, and more particularly, to a liquid crystal display device having a sensing electrode for sensing a user's touch.

Liquid crystal display devices have a wide variety of applications ranging from notebook computers, monitors, spacecrafts and aircraft to the advantages of low power consumption and low power consumption and being portable.

The liquid crystal display device includes a lower substrate, an upper substrate, and a liquid crystal layer formed between the two substrates. The arrangement of the liquid crystal layers is adjusted according to whether an electric field is applied or not, .

Such a liquid crystal display device is generally a mouse or a keyboard as an input means, but in the case of navigation, portable terminals, and home appliances, a touch screen for directly inputting information using a finger or a pen is applied. have.

Hereinafter, a conventional liquid crystal display device to which a touch screen is applied will be described in detail.

1 is a schematic cross-sectional view of a conventional liquid crystal display device.

As can be seen in FIG. 1, a conventional liquid crystal display device includes a liquid crystal panel 10 and a touch screen 20.

The liquid crystal panel 10 displays an image, and includes a liquid crystal layer 16 formed between the lower substrate 12, the upper substrate 14, and both substrates 12 and 14.

The touch screen 20 is formed on the upper surface of the liquid crystal panel 10 to sense a user's touch, the touch substrate 22, the first sensing electrode 24 formed on the lower surface of the touch substrate 22, And a second sensing electrode 26 formed on the upper surface of the touch substrate 22.

The first sensing electrode 24 is arranged in the horizontal direction on the lower surface of the touch substrate 22, and the second sensing electrode 26 is arranged in the vertical direction on the upper surface of the touch substrate 22. Therefore, when the user touches a predetermined position, the capacitance between the first sensing electrode 24 and the second sensing electrode 26 is changed at the touched position, and finally, by sensing the position where the capacitance is changed. The touch position of the user can be sensed.

However, since the conventional liquid crystal display device has a structure in which a separate touch screen 20 is formed on the upper surface of the liquid crystal panel 10, the overall thickness is increased due to the touch screen 20, and the manufacturing process is complicated. In addition, there is a disadvantage that the manufacturing cost is increased.

The present invention has been devised to solve the above-mentioned conventional problems, and the present invention has a need for configuring a separate touch screen on the upper surface of the liquid crystal panel by incorporating a sensing electrode inside the liquid crystal panel for sensing a user's touch. It is an object of the present invention to provide a liquid crystal display device and a method of manufacturing the same, which can reduce the thickness, simplify the manufacturing process, and reduce the manufacturing cost.

According to an aspect of the present invention, there is provided an electronic device including: a gate line and a data line intersecting each other on a lower substrate to define a plurality of pixels; A pixel electrode formed on each of the plurality of pixels; A plurality of common electrode blocks patterned to form an electric field together with the pixel electrodes and sense a user's touch; A plurality of sensing lines electrically connected to one of the common electrode blocks and electrically insulated from the other common electrode blocks; A plurality of pad portions spaced apart from each other at predetermined intervals along the sensing line and having a line width larger than that of the sensing line; And a contact portion formed between the pad portion and the common electrode block and electrically connecting the sensing line and the common electrode block, wherein the contact portion is included in the sensing line electrically connected to one of the plurality of common electrode blocks Wherein the plurality of pad portions are formed in contact with at least one of the plurality of pad portions.

In addition, the present invention comprises the steps of sequentially forming a gate electrode, a gate insulating film, a semiconductor layer, a source electrode, a drain electrode, the first protective layer on the lower substrate to achieve the above object; A pixel electrode electrically connected to the drain electrode; a plurality of common electrode blocks patterned to form an electric field together with the pixel electrode to sense a touch of a user; and a common electrode block electrically connected to one of the common electrode blocks A plurality of sensing lines which are electrically insulated from the electrode blocks, a plurality of pad portions spaced apart from the sensing lines by a predetermined interval and formed to have a larger line width than the sensing lines, And forming a contact portion electrically connected to the sensing line and the common electrode block, wherein the contact portion includes at least one of the plurality of pad portions formed in the region overlapping the common electrode block and the sensing line electrically connected to each other Being formed in contact with at least one pad portion The present invention also provides a method of manufacturing a liquid crystal display device.

According to the present invention as described above, the following effects can be obtained.

The present invention utilizes a common electrode (or a common electrode block) used for forming an electric field for liquid crystal driving as a sensing electrode for sensing a user's touch, thereby forming a separate touch screen on the upper surface of the liquid crystal panel The thickness is reduced, the manufacturing process is simplified, and the manufacturing cost is also reduced.

Further, according to the present invention, the touch position of the user can be detected on the XY plane only by the sensing line formed extending only in one direction of the lower substrate, so that the liquid crystal display device forms the sensing line in two directions of X and Y axes. Compared to this, the structure is simple and the cost can be reduced.

In addition, according to the present invention, the number of wiring lines of the sensing line input to the sensing circuit unit may be reduced by using the multiplexer, thereby reducing the width of the bezel or increasing the aperture ratio of the outer portion.

In addition, according to the present invention, there is an effect of improving the unevenness of the surface of the display panel by forming a sensing line including a pad portion having a constant line width irrespective of the contact portion.

1 is a schematic cross-sectional view of a conventional liquid crystal display device.
2 is a schematic plan view of a liquid crystal display device according to the present invention.
3 is a view for explaining a principle of sensing a touch position of a user in a sensing line of a liquid crystal display device according to the present invention.
4 is a view showing an embodiment of a liquid crystal display device according to the present invention.
5 is a view according to the first embodiment corresponding to the cross section of line AA in FIG.
6 is a view according to the first embodiment corresponding to the cross section of line BB of FIG.
FIG. 7 is a view according to the second embodiment corresponding to the cross section of line AA in FIG.
8 is a view according to the second embodiment corresponding to the cross section of line BB of FIG.
FIG. 9 is a view according to the third embodiment corresponding to the cross section of line AA in FIG.
10 is a view according to the third embodiment corresponding to the cross section of line BB of FIG.
11A to 11C are cross-sectional views illustrating a method of manufacturing a liquid crystal display device according to an embodiment of the present invention.
12A to 12D are cross-sectional views illustrating a method of manufacturing a liquid crystal display device according to another embodiment of the present invention.

Hereinafter, a liquid crystal display and a method of manufacturing the same according to the present invention will be described in detail with reference to the accompanying drawings.

In describing an embodiment of the present invention, when it is stated that a structure is formed "on" or "under" another structure, such a substrate is not limited to the case where these structures are in contact with each other, The present invention is not limited thereto.

<LCD display device>

3 is a view for explaining a principle of sensing a touch position of a user in a sensing line of a liquid crystal display device according to the present invention, and FIG. 4 is a view 1 is a diagram showing an embodiment of a liquid crystal display device according to the invention.

2 to 4, the liquid crystal display according to the present invention includes a lower substrate 100, a gate line 102, a data line 104, a gate electrode 110, a semiconductor layer 130, The pixel electrode 150, the sensing line 160, the pad portion 163, the contact portion 165, the common electrode block 180, the slit 190, the upper substrate 200 A multiplexer 300, and a sensing circuit portion 400. [

The lower substrate 100 may be made of glass or transparent plastic.

The gate line 102 is arranged in the horizontal direction on the lower substrate 100, the data line 104 is arranged in the vertical direction on the lower substrate 100, and the gate line 102 and the data line ( 104 is arranged to cross each other to define a plurality of pixels.

The gate line 102 is arranged in a straight line shape, and the data line 104 is also shown in a straight line shape, but is not necessarily limited thereto. For example, the data lines 104 may be arranged in a curved straight line shape.

On the other hand, a thin film transistor is formed in each of the plurality of pixels as a switching element. The thin film transistor includes a gate electrode 110, a semiconductor layer 130, a source electrode 135, and a drain electrode 137. The thin film transistor may have a bottom gate structure in which the gate electrode 110 is positioned below the semiconductor layer 130, and a top gate in which the gate electrode 110 is positioned on the semiconductor layer 130. It may be made of a structure.

The pixel electrode 150 is formed in each of the pixels, and particularly, has a shape corresponding to the shape of the pixel.

The sensing line 160 includes a pad portion 163 and serves to apply an electrical signal to the common electrode block 180. The sensing line 160 is electrically connected to the common electrode block 180 and the sensing circuit unit 400 is connected to the sensing line 160. When the user touches the common electrode block 180, A signal is applied to the sensing circuit unit 400 through the sensing line 160 to sense the touch position of the user.

When the sensing line 160 is electrically connected to one of the common electrode blocks 180, the sensing line 160 is electrically insulated from the other common electrode blocks 180 to detect the touch position of the user.

3, four common electrode blocks 180, A, B, C, and D and four sensing lines 160 through L4 are shown in FIG.

3, the sensing line 160 is electrically connected to the common electrode block 180 A through the contact portion 165 and electrically isolated from the other common electrode blocks 180, B, C, and D. As shown in FIG. . Therefore, when the user touches the common electrode block 180 A, the signal is transmitted to the sensing line 160 L1, thereby detecting the touch position of the user.

In the same manner, the sensing line 160 is connected to the common electrode block 180 B through the contact portion 165 and electrically insulated from the other common electrode blocks 180, A, C, and D. Therefore, when the user touches the common electrode block 180 B, the signal is transmitted to the sensing line 160 L2, thereby detecting the touch position of the user.

The sensing line 160 L3 is connected to the common electrode block 180 through the contact portion 165 and electrically insulated from the other common electrode blocks 180, Therefore, when the user touches the common electrode block 180 C, the signal is transmitted to the sensing line 160 L3, thereby detecting the touch position of the user.

The sensing line 160 L4 is connected to the common electrode block 180 through the contact portion 165 and electrically insulated from the other common electrode blocks 180, Therefore, when the user touches the common electrode block 180 D, the signal is transmitted to the sensing line 160 L4, thereby detecting the touch position of the user.

Using the structures of the common electrode block 180 and the sensing line 160 as described above, the touch position of the user is detected on the XY plane only by the sensing line 160 formed extending only in one direction of the lower substrate 100. It can work.

Therefore, the structure is simpler and the cost can be reduced compared to the liquid crystal display device in which the sensing line 160 is formed in two directions of the X axis and the Y axis.

Meanwhile, the sensing line 160 may apply an electrical signal to the common electrode block 180 and reduce the resistance of the common electrode.

The common electrode block 180 generally uses a transparent conductive material such as ITO, but such a transparent conductive material has a large resistance. Accordingly, the resistance of the common electrode block 180 may be reduced by connecting the sensing line 160 made of a metal material having excellent conductivity to the common electrode block 180. For example, the sensing line 160 may be formed of one selected from molybdenum (Mo), aluminum (Al), and copper (Cu) or an alloy including the same.

The sensing line 160 may be formed in one of directions parallel to the gate line 102 and directions parallel to the data line 104. According to the present invention, the sensing line 160 may detect a user's touch position on the XY coordinate plane even if the sensing line 160 is formed in one of directions parallel to the gate line 102 or parallel to the data line 104. .

However, at this time, it is necessary to prevent the opening ratio from decreasing due to the sensing line 160, and the sensing line 160 formed in parallel with the data line 104 may be formed to overlap the data line 104. desirable. In addition, the sensing line 160 formed in parallel with the gate line 102 may be formed to overlap the gate line 102.

A plurality of pad portions 163 are formed along the sensing line 160 at predetermined intervals. The pad portion 163 may be formed to have a larger line width than the sensing line 160. That is, the sensing line 160 is electrically connected to the common electrode block 180 through the contact portion 165 formed in contact with the pad portion 163. To facilitate this, the sensing line 160 is connected to the sensing line 160, And a pad portion 163 having a line width larger than the line width of the pad portion 160.

At this time, the pad portion 163 may be formed with a constant line width irrespective of whether the pad portion 163 is connected to the contact portion 165 or not. That is, the pad portion 163 is formed on the sensing line 160 for connecting the sensing line 160 and the common electrode block 180. However, the pad portion 163 may be formed on (or below) 165 are formed.

For example, as shown in FIG. 3, four pad portions 163 are formed along a sensing line 160 L1 at a predetermined interval in a region overlapping the common electrode block 180A. The contact portions 165 are formed in only one of the four pad portions 163, but they are all formed to have the same line width.

The plurality of pad portions 163 are spaced apart from each other along the sensing line 160 at regular intervals. As can be seen in FIG. 3, the pad portions 163 may be spaced apart from each other and formed one per pixel. 4, the pad portion 163 may be formed immediately below the gate line 102. [0064] In the above embodiment, the number and position of the pad portions 163 are formed just under the gate line 102, one per pixel. However, the pad portion 163 of the liquid crystal display device according to the present invention But the present invention is not limited thereto.

One sensing line 160 includes a plurality of pad portions 163 spaced apart from one another by a predetermined distance. The plurality of pad portions 163 may include a plurality of pad portions 163 included in adjacent sensing lines 160, (163).

3, the plurality of pad portions 163 included in the sensing line 160 may include a plurality of pad portions 163 included in the neighboring sensing line 160 L2, As shown in Fig. That is, the first pad portion 163 of the sensing line 160 and the first pad portion 163 of the sensing line 160 are formed in a straight line in a direction perpendicular to the longitudinal direction of the sensing line 160.

The pad portion 163 may be formed only on the sensing line 160 corresponding to the position where the contact portion 165 is formed or the pad portion 163 may be formed on a position symmetrical to the pad portion 163 of the adjacent sensing line 160. [ There is a problem that unevenness occurs on the surface of the display panel during image reproduction depending on the line width of the sensing line 160 which is not uniform. Such unevenness may occur because the parasitic capacitance is unevenly distributed depending on the influence of the pad portion 163 located near the pixel electrode 150, and may take various forms such as a flag shape.

However, if a plurality of pad portions 163 spaced apart from each other at regular intervals along the sensing line 160 are formed at symmetrical positions with the pad portions 163 of the adjacent sensing lines 160, parasitic capacitance, So that it is possible to prevent surface unevenness of the display panel during image reproduction.

The contact portion 165 is formed between the pad portion 163 and the common electrode block 180 to electrically connect the sensing line 160 and the common electrode block 180.

The sensing line 160 has a plurality of pad portions 163 spaced apart from one another at regular intervals and the contact portion 165 is formed on at least one pad portion 163 of the plurality of pad portions 163 And electrically connects the sensing line 160 and the common electrode block 180 to each other.

Since one sensing line 160 is electrically connected to one common electrode block 180 as described above, the contact portion 165 must be electrically isolated from the other common electrode blocks 180. Therefore, Are not simultaneously formed on different common electrode blocks 180 on the basis of the sensing line 160 of FIG.

3, when one sensing line 160 is electrically connected to the common electrode block 180 through the contact portion 165, the other common electrode blocks 180, B, C, D is overlapped with the sensing line 160, the contact portion 165 is not formed.

The contact portion 165 may be formed on at least one of the pad portions 163 of the plurality of pad portions 163 included in the sensing line 160 electrically connected to one of the plurality of common electrode blocks 180 And can be formed in contact with each other.

3, the sensing line 160 is electrically connected to the common electrode block 180 through one contact portion 165. However, in the common electrode block 180, A total of four pad portions 163 are formed in a region where the sensing lines 160 and the sensing lines 160 are overlapped with each other so that the contact portion 165 is in contact with at least one pad portion 163 of the four pad portions 163 .

The formation position of the contact portion 165 can be formed in the non-transmissive region to prevent the aperture ratio from being reduced. The non-transmissive region is a portion excluding a portion where light exits from the pixel, for example, an area where the data line 104 and the gate line 102 are formed.

4, the contact portion 165 is formed adjacent to the gate line 102. However, the contact portion 165 may be formed adjacent to the data line 104 and the source electrode 135 .

The common electrode block 180 is formed on a different layer from the pixel electrode 150 to form an electric field together with the pixel electrode 150 to drive the liquid crystal and to sense a user's touch position. Play a role.

In order to use the common electrode block 180 as a sensing electrode, the common electrode block 180 is formed of a plurality of blocks spaced apart from each other by a predetermined pattern. The plurality of common electrode blocks 180 may be formed to have a size corresponding to one or more pixels, and how many pixels are formed to correspond to the touch resolution of the liquid crystal display.

That is, when the region corresponding to the large number of pixels is formed of one common electrode block 180, the touch resolution is reduced accordingly. On the other hand, if a region corresponding to too small number of pixels is formed with one common electrode block 180, the touch resolution is increased, but the number of sensing lines 160 is increased accordingly.

At least one slit 190 may be formed in the pixel electrode 150 or the common electrode block 180.

As such, when the slit 190 is provided inside the pixel electrode 150 or the common electrode block 180, a fringe field is formed between the pixel electrode 150 and the common electrode block 180 through the slit 190. (fringe field) is formed, and the liquid crystal can be driven by the fringe field. That is, a fringe field switching mode liquid crystal display device may be implemented.

The common electrode block 180 is formed on the pixel electrode 150 with the second passivation layer 170 interposed therebetween when the slits 190 are provided in the common electrode block 180 7).

On the contrary, when the slit 190 is provided inside the pixel electrode 150, the pixel electrode 150 is formed on the common electrode block 180 with the second protective layer 170 interposed therebetween (see FIG. 5). ).

The upper substrate 200 is bonded to the lower substrate 100, and a liquid crystal layer is formed between the upper substrate 200 and the lower substrate 100.

Although not shown, a high-resistance conductive layer (not shown) may be formed on the rear surface of the upper substrate 200. The high-resistance conductive layer is a transparent material for optically transmitting light emitted from the liquid crystal panel, and the charge formed by static electricity on the panel is electrically grounded by a ground pad (not shown) formed on the lower substrate 100 to a ground ). &Lt; / RTI &gt; The high-resistance conductive layer is formed to have a high resistance (for example, 50 M? / Sqr to 5 G? / Sqr) to improve the touch detection performance of the user.

The high-resistance conductive layer allows the charge formed on the liquid crystal panel to escape to the ground (GND), thereby improving the ESD shielding performance of the liquid crystal display device having the touch electrode.

That is, as described above, the high-resistance conductive layer is formed of a high-resistance material having a resistance value of 50 M? / Sqr to 5 G? / Sqr to prevent the effect of shielding the influence of the user's finger, The touch detection performance of the display device can be improved.

A multiplexer 300 may be coupled between the sensing line 160 and the sensing circuit 400 to reduce the number of wires of the sensing line 160 input to the sensing circuit 400.

In FIG. 2, a 4: 1 multiplexer 300 is shown as one embodiment. However, the present invention is not limited thereto and various combinations of multiplexers 300 such as 8: 1 or 16: 1 may be used.

When the multiplexer 300 is used, the number of wires of the sensing line 160 input to the sensing circuit unit 400 may be reduced, thereby reducing the width of the bezel or increasing the aperture ratio of the outer portion. It works.

The multiplexer 300 may be formed on the lower substrate 100 on which the sensing line 160 is formed, embedded in the drive IC, or formed as a separate multiplexer 300 chip.

The sensing circuit unit 400 is directly connected to the sensing line 160 or connected to the common electrode block 180 through the multiplexer 300. When the user touches the common electrode block 180, And its position.

Hereinafter, various embodiments of the present invention will be described in detail with reference to FIGS. 5 to 10 showing a cross-sectional structure of a liquid crystal display device according to the present invention.

FIG. 5 is a cross-sectional view taken along the line A-A of FIG. 4, and FIG. 6 is a cross-sectional view taken along the line B-B of FIG.

5 and 6, a liquid crystal display according to a first embodiment of the present invention includes a lower substrate 100, a gate electrode 110, a gate insulating layer 120, a semiconductor layer 130, an etch stopper The source electrode 135, the drain electrode 137, the first passivation layer 140, the pixel electrode 150, the sensing line 160 (see FIG. 4), the pad portion 163, the contact portion 165, A second passivation layer 170 and a common electrode block 180 and the pixel electrode 150 is formed on the common electrode block 180. [

The lower substrate 100 may be formed of glass or transparent plastic.

The gate electrode 110 is formed on the lower substrate 100 by branching from the gate line 102 and is made of a conductive material.

The gate insulating layer 120 is formed on the gate electrode and may be formed of a silicon oxide layer (SiOx) or a silicon nitride layer (SiNx).

The semiconductor layer 130 is formed on a corresponding portion on the gate electrode 110 on the gate insulating layer 120. When a gate voltage is applied to the gate electrode 110, the source electrode 135 and the drain electrode 137. To form a channel through which current can flow. The semiconductor layer 130 may be an oxide or an amorphous semiconductor.

An etch stopper 133 is formed on the semiconductor layer 130 to protect the semiconductor layer 130, and may be formed of a silicon oxide film (SiOx) or a silicon nitride film (SiNx). However, in some cases, the etch stopper 133 may be omitted.

The source electrode 135 is formed to extend from the data line 104 and is formed of a conductor having low resistance in order to minimize an operation delay of the thin film transistor due to a panel load.

The drain electrode 137 is formed to be spaced apart from the source electrode 135 on the semiconductor layer 130 and formed of a conductor. The conductor may be a transparent conductor such as indium tin oxide (ITO).

The first passivation layer 140 is formed on the source electrode 135 and the drain electrode 137 and may be formed of a silicon oxide film (SiOx) or a silicon nitride film (SiNx).

The common electrode block 180 is formed on the first passivation layer 140. In this case, the common electrode block 180 may be spaced apart from each other at predetermined intervals in order to prevent electrical short with the pixel electrode 150 at the position of the pixel electrode contact hole 155.

The second passivation layer 170 is formed on the common electrode block 180 and may be formed of a silicon oxide film (SiOx) or a silicon nitride film (SiNx).

4), the pad portion 163 and the contact portion 165 are formed on the second passivation layer 170 and are electrically connected to the pad portion (see FIG. 4) included in the sensing line 160 163 and the common electrode block 180 are electrically connected to each other through the contact portion 165.

5, which is a cross-sectional view taken along the line AA of FIG. 4, the contact portion 165 is formed under the pad portion 163, but the contact portion 165 is not formed in FIG. 6, . As described above, when one sensing line is electrically connected to one common electrode block 180, it must be electrically insulated from the other common electrode block 180. Therefore, the contact portion 165 is formed under all the pad portions 163, Is not formed.

On the other hand, the line widths D1 and D2 of the pad portion 163 can be formed to have the same line width regardless of whether the contact portion 165 is formed or not. This is because, as described above, if the pad portion 163 formed along the sensing line is not in a symmetrical position or the line width thereof is different, a smear may be formed on the display panel.

The pixel electrode 150 is formed on the second passivation layer 170 and is spaced apart from the pad portion 163. The pixel electrode 150 is electrically connected to the drain electrode 137 through the pixel electrode contact hole 155.

In this case, the pixel electrode 150 includes a slit 190 therein, and a fringe field is formed between the pixel electrode 150 and the common electrode block 180 through the slit 190. The liquid crystal may be driven by the fringe field. That is, a fringe field switching mode liquid crystal display device may be implemented.

7 is a cross-sectional view taken along line A-A of FIG. 4, and FIG. 8 is a cross-sectional view taken along line B-B of FIG. 4 according to a second embodiment of the present invention.

7 and 8, the liquid crystal display according to the present invention includes a lower substrate 100, a gate electrode 110, a gate insulating layer 120, a semiconductor layer 130, an etch stopper 133, The pixel electrode 150, the sensing line 160 (see FIG. 4), the pad portion 163, the contact portion 165, the second passivation layer 140, the first passivation layer 135, the drain electrode 137, the first passivation layer 140, A common electrode block 180 including a common electrode block 170 and a common electrode block 180 and a common electrode block 180 formed on the pixel electrode 150. 7 and 8 are the same as the embodiments of FIGS. 5 and 6 except that the common electrode block 180 has a top structure, and a duplicate description will be omitted.

The pixel electrode 150 is formed on the first protective layer 140 and may be formed of a transparent conductor such as indium tin oxide (ITO). The pixel electrode 150 is electrically connected to the drain electrode 137 through the pixel electrode contact hole 155 formed in the first passivation layer 140.

The pad portion 163 is spaced apart from the pixel electrode 150 in the same layer as the pixel electrode 150 and is formed of any one selected from molybdenum (Mo), aluminum (Al), and copper (Cu) Alloy.

The second passivation layer 170 is formed on the pixel electrode 150 and the pad portion 163 and may be formed of a silicon oxide film (SiOx) or a silicon nitride film (SiNx).

The common electrode block 180 may be formed on the second protective layer 170, and may be formed of a transparent conductor such as indium tin oxide (ITO). The common electrode block 180 is electrically connected to the pad portion 163 through the contact portion 165.

7, the contact portion 165 is formed on the pad portion 163, but the contact portion 165 is not formed in FIG. As described above, when one sensing line is electrically connected to one common electrode block 180, it must be electrically insulated from the other common electrode block 180, so that the contact portion 165 is formed on all the pad portions 163, Is not formed.

On the other hand, the line widths D3 and D4 of the pad portion 163 can be formed to have the same line width regardless of whether the contact portion 165 is formed or not. This is because, as described above, if the pad portion 163 formed along the sensing line is not in a symmetrical position or the line width thereof is different, a smear may be formed on the display panel.

The common electrode block 180 includes a slit 190 therein, and a fringe field is formed between the pixel electrode 150 and the common electrode block 180 through the slit 190. The liquid crystal may be driven by the fringe field. That is, a fringe field switching mode liquid crystal display device may be implemented.

FIG. 9 is a cross-sectional view taken along the line A-A of FIG. 4, and FIG. 10 is a cross-sectional view taken along the line B-B of FIG.

9 and 10, the liquid crystal display according to the present invention includes a lower substrate 100, a gate electrode 110, a gate insulating layer 120, a semiconductor layer 130, an etch stopper 133, The pixel electrode 150, the sensing line 160 (see FIG. 4), the pad portion 163, the contact portion 165, the second passivation layer 140, the first passivation layer 135, the drain electrode 137, the first passivation layer 140, A common electrode block 180 including a common electrode block 170 and a common electrode block 180 and a common electrode block 180 formed on the pixel electrode 150. 9 and 10 are the same except for the vertical structure of the pixel electrode 150 and the pad portion 163, and the overlapping description will be omitted.

Under the pad portion 163, a pixel electrode 150 is formed. The pixel electrode 150 formed on the pixel electrode 150 and overlapped with the pad portion 163 is electrically connected to the pixel electrode 150 electrically connected to the drain electrode 137. [ Keeps insulation.

This structure can be realized by forming the pixel electrode 150 by a photolithography process and then forming the sensing line 160 (see FIG. 4) and the pad portion 163 by a photolithography process in a separate photolithography process. However, And can be efficiently implemented using a mask process.

That is, when the pixel electrode 150 and the sensing line 160 are simultaneously formed by one photolithography process using the halftone mask process, a two-mask process is performed to form the pixel electrode 150 and the sensing line 160 The one used can be simplified to one mask process.

Accordingly, the two exposure steps can be performed in one exposure step, thereby reducing the tact time and reducing the material cost required for the exposure step.

<Manufacturing Method of Liquid Crystal Display Device>

11A through 11C are cross-sectional views illustrating a process of manufacturing a lower substrate for a liquid crystal display according to an exemplary embodiment of the present invention.

First, as shown in FIG. 11A, the gate electrode 110, the gate insulating layer 120, the semiconductor layer 130, the etch stopper 133, the source electrode 135, and the drain electrode 137 are disposed on the lower substrate 100. ), The first protective layer 140 is formed in sequence. Although not shown, a gate line 102 and a data line 104 are formed on the lower substrate 100.

Next, as shown in FIG. 11B, the pixel electrode contact hole 155 is formed on the first protective layer 140, and then the pixel electrode 150 is formed to be electrically connected to the drain electrode 137. In addition, the sensing line 160 is formed at a predetermined position.

The sensing line 160 may be formed in any direction parallel to the gate line 102 or in a direction parallel to the data line 104. According to the present invention, the sensing line 160 may detect a user's touch position on the XY coordinate plane even if the sensing line 160 is formed in one of directions parallel to the gate line 102 or parallel to the data line 104. .

In this case, it is necessary to prevent the opening ratio from being reduced due to the sensing line 160. The sensing line 160 formed in parallel with the data line 104 may be formed to overlap the data line 104. . In addition, the sensing line 160 formed in parallel with the gate line 102 may be formed to overlap the gate line 102.

The sensing lines 160 are formed so as to include a plurality of pad portions 163 (see FIG. 3) spaced apart at regular intervals and having a line width larger than the line width of the sensing line 160.

11C, after the second passivation layer 170 is formed on the pixel electrode 150 and the sensing line 160, the sensing line 160 and the common electrode block 180 are electrically connected to each other The contact portion 165 is formed.

At this time, when the sensing line 160 is electrically connected to one of the common electrode blocks 180, it is required to maintain electrical insulation from the other common electrode blocks 180. The contact portion 165 includes one sensing line The first electrode layer 160 is electrically connected to one common electrode block.

A common electrode block 180 is formed on the second passivation layer 170 to electrically connect the sensing line 160 and the common electrode block 180.

The common electrode block 180 is used as a sensing electrode, and a plurality of the common electrode blocks 180 are formed in a predetermined pattern. The common electrode block 180 may be formed to have a size corresponding to one or more pixels, and a size corresponding to a number of pixels may be associated with a touch resolution of the liquid crystal display device.

<Manufacturing Method of Liquid Crystal Display Device Formed Using Halftone Mask>

12A to 12D are cross-sectional views illustrating a process of manufacturing a lower substrate for a liquid crystal display according to another exemplary embodiment of the present invention. Hereinafter, description will be given based on contents not overlapping with FIGS. 11A to 11C.

First, as shown in FIG. 12A, the gate electrode 110, the gate insulating layer 120, the semiconductor layer 130, the etch stopper 133, the source electrode 135, and the drain electrode 137 are disposed on the lower substrate 100. ), The first protective layer 140 is formed in order, and the pixel electrode contact hole 155 is formed on the first protective layer 140.

Next, as shown in FIG. 12B, the pixel electrode layer 150a and the sensing line layer 140a are sequentially stacked on the first protective layer 140.

A photoresist is stacked on the pixel electrode layer 150a and the sensing line layer 140a and irradiated with light using a half tone mask 700. In this case, the halftone mask includes a non-transmissive region 710 through which light does not transmit, a semi-transmissive region 720 through which only part of the light passes, and transmission regions 730a, 730b, and 730c through which all of the light passes.

Thereafter, the photoresist is developed to form a photoresist pattern. In the photoresist pattern, the photoresist layer corresponding to the non-transmissive region 710 of the halftone mask 700 remains as it is, and the photoresist layer corresponding to the semi-transmissive region 720 of the halftone mask 700 is Only part of the photoresist layer remains, and the photoresist layer corresponding to the transmission regions 730a, 730b, and 730c of the halftone mask 700 is removed.

Next, as shown in FIG. 12C, the pixel electrode layer 150a and the sensing line layer 140a are etched using the photoresist pattern as a mask. After ashing the photoresist pattern, the etching process is performed again, and finally the photoresist pattern is removed.

When the pixel electrode 150 and the sensing line 160 are formed in this manner, the process of irradiating light can be completed at once without performing the light irradiation process twice, thereby saving manufacturing time and cost. .

Next, as shown in FIG. 12D, a second protective layer 170 is formed on the pixel electrode 150 and the sensing line 160, and the common electrode block 180 is formed on the second protective layer 170. Form patterns.

It will be understood by those skilled in the art that the present invention can be embodied in other specific forms without departing from the spirit or essential characteristics thereof.

Therefore, it should be understood that the above-described embodiments are illustrative in all aspects and not restrictive. The scope of the present invention is defined by the appended claims rather than the detailed description and all changes or modifications derived from the meaning and scope of the claims and from the equivalent concept are to be construed as being included in the scope of the present invention .

100-Bottom substrate 102-Gate line
104-data line 110-gate electrode
130-semiconductor layer 135-source electrode
137Drain electrode 140 First protective layer
145-Third Protection Layer 150-Pixel Electrode
160 - sensing line 163 - pad part
165 - contact portion 170 - second protective layer
180 - common electrode block 190 - slit
200 - upper substrate 300 - multiplexer
400 - sensing circuit

Claims (10)

  1. A gate line and a data line intersecting each other on the lower substrate to define a plurality of pixels;
    A pixel electrode formed on each of the plurality of pixels;
    A plurality of common electrode blocks patterned to form an electric field together with the pixel electrodes and sense a user's touch;
    A plurality of sensing lines electrically connected to one of the common electrode blocks and electrically insulated from the other common electrode blocks;
    A plurality of pad portions spaced apart from each other at predetermined intervals along the sensing line and having a line width larger than that of the sensing line; And
    And a contact portion formed between the pad portion and the common electrode block and electrically connecting the sensing line and the common electrode block,
    Wherein the contact portion is formed in contact with at least one pad portion of the plurality of pad portions included in the sensing line electrically connected to one of the plurality of common electrode blocks.
  2. The method of claim 1,
    Wherein the pad portion formed on the sensing line is formed at a position symmetrical to the pad portion formed on the adjacent sensing line.
  3. The method of claim 1,
    And the sensing line is formed to overlap on the data line or the gate line.
  4. The method of claim 1,
    And the sensing line is formed in one of a direction parallel to the gate line and a direction parallel to the data line.
  5. The method of claim 1,
    And the pad portion has a predetermined line width regardless of whether the pad portion is electrically connected to the contact portion.
  6. The method of claim 1,
    Wherein the contact portion is formed in a non-transmissive region to prevent the aperture ratio from being reduced.
  7. The method of claim 1,
    Wherein the plurality of common electrode blocks are formed on the pixel electrode with a second protective layer interposed therebetween, and at least one slit is formed in the common electrode block.
  8. The method of claim 1,
    Wherein the pixel electrode is formed on the common electrode block with a second protective layer interposed therebetween, and at least one slit is provided in the pixel electrode.
  9. The method of claim 1,
    Wherein a terminal of the sensing line is connected to a multiplexer (MUX).
  10. Sequentially forming a gate electrode, a gate insulating film, a semiconductor layer, a source electrode, a drain electrode, and a first protective layer on the lower substrate; And
    A pixel electrode electrically connected to the drain electrode, a plurality of common electrode blocks patterned to form an electric field together with the pixel electrodes, and to sense a user's touch, and another common electrode when electrically connected to one of the common electrode blocks A plurality of sensing lines electrically insulating from the block, a plurality of pads spaced at predetermined intervals from the sensing lines, and having a line width thicker than that of the sensing lines, and between the pad unit and the common electrode block. Forming a contact portion formed to electrically connect the sensing line and the common electrode block;
    Wherein the contact portion is formed in contact with at least one of the plurality of pad portions formed in an area overlapping the common electrode block and the sensing line electrically connected to each other.
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US13/727,271 US9098134B2 (en) 2012-03-29 2012-12-26 Liquid crystal display device and method of manufacturing the same

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KR20160142382A (en) * 2015-01-29 2016-12-12 보에 테크놀로지 그룹 컴퍼니 리미티드 In-cell touch screen panel and display device

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US9098134B2 (en) 2015-08-04
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CN103364983A (en) 2013-10-23

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