KR20100119368A - 증착 장치 - Google Patents
증착 장치 Download PDFInfo
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- KR20100119368A KR20100119368A KR1020090038450A KR20090038450A KR20100119368A KR 20100119368 A KR20100119368 A KR 20100119368A KR 1020090038450 A KR1020090038450 A KR 1020090038450A KR 20090038450 A KR20090038450 A KR 20090038450A KR 20100119368 A KR20100119368 A KR 20100119368A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/52—Means for observation of the coating process
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/14—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
Abstract
Description
Claims (21)
- 피처리체에 증착 물질을 증착시키는 증착 장치에 있어서,상기 증착 물질을 상기 피처리체에 증착시키는 증착원;상기 피처리체와 이격되어 배치되며, 일면 상에 상기 증착원이 배치되는 베이스;상기 베이스 상에 배치되는 증착원; 및상기 선형 증착원과 상기 피처리체 사이에 위치하는 제1 보정부 및 제2 보정부;를 구비하며,상기 제1 보정부와 상기 제2 보정부는 서로 대향하도록 상기 증착원의 외곽부에 각각 배치되고,상기 제1 보정부와 상기 제2 보정부는 각각 회전하면서 상기 피처리체에 증착되는 상기 증착 물질의 두께를 조절하는 것을 특징으로 하는 증착 장치.
- 제1항에 있어서,상기 증착원은 적어도 하나 이상의 선형 증착원으로 이루어지는 것을 특징으로 하는 증착 장치.
- 제2항에 있어서,상기 제1 보정부는 상기 선형 증착원의 길이 방향의 일 외측부 일부를 가리 도록 배치되는 것을 특징으로 하는 증착 장치.
- 제3항에 있어서,상기 제1 보정부는 상기 선형 증착원과 평행한 상태에서 회전할 수 있는 것을 특징으로 하는 증착 장치.
- 제3항에 있어서,상기 제1 보정부는 상기 선형 증착원에 대하여 패닝(panning)하는 것을 특징으로 하는 증착 장치.
- 제3항에 있어서,상기 제2 보정부는 상기 선형 증착원의 길이 방향의 타 외측부 일부를 가리도록 배치되는 것을 특징으로 하는 증착 장치.
- 제6항에 있어서,상기 제2 보정부는 상기 선형 증착원과 평행한 상태에서 회전할 수 있는 것을 특징으로 하는 증착 장치.
- 제6항에 있어서,상기 제2 보정부는 상기 선형 증착원에 대하여 패닝(panning)하는 것을 특징 으로 하는 증착 장치.
- 제1항에 있어서,상기 제1 보정부와 상기 제2 보정부 각각은 상기 피처리체의 양 외곽부에서 증착되는 상기 증착물질의 두께를 균일하게 보정하기 위해 상기 피처리체와 평행한 상태로 패닝하는 것을 특징으로 하는 증착 장치.
- 제1항에 있어서,상기 피처리체에 증착되는 증착 물질의 두께를 측정하는 막두께 측정부를 더 구비하는 것을 특징으로 하는 증착 장치.
- 제1항에 있어서,상기 제1 보정부 및 상기 제2 보정부 각각은 상기 증착원의 길이 방향을 따라 배치되는 것을 특징으로 하는 증착 장치.
- 제2항에 있어서,상기 제1 보정부는,상기 선형 증착원과 상기 피처리체 사이에 위치하며, 그 길이 방향의 일측부가 상기 선형 증착원의 길이 방향의 일 외측부의 일부를 가리도록 배치되는 제1 보정판;일단이 상기 제1 보정판과 결합하며, 타단이 상기 베이스와 결합하도록 배치되며, 상기 제1 보정판을 회전시키는 제1 회전봉;상기 제1 회전봉을 그 길이 방향의 축을 중심으로 회전시키는 제1 구동부;를 구비하는 것을 특징으로 하는 증착 장치.
- 제12항에 있어서,상기 제1 보정판은 그 일면이 상기 피처리체를 향하도록 배치되는 것을 특징으로 하는 증착 장치.
- 제13항에 있어서,상기 제1 보정판은 상기 선형 증착원의 길이 방향을 따라 배치되는 것을 특징으로 하는 증착 장치.
- 제14항에 있어서,상기 제1 보정판은 상기 제1 회전봉이 그 중심축을 중심으로 시계 방향 또는 반시계 방향으로 회전함에 따라 시계 방향 또는 반시계 방향으로 패닝하는 것을 특징으로 하는 증착 장치.
- 제15항에 있어서,상기 제1 보정판은 상기 피처리체와 평행한 상태에서 시계 방향 또는 반시계 방향으로 패닝하는 것을 특징으로 하는 증착 장치.
- 제12항에 있어서,상기 제2 보정부는,상기 선형 증착원과 상기 피처리체 사이에 위치하며, 그 길이 방향의 일측부가 상기 선형 증착원의 길이 방향의 타 외측부의 일부를 가리도록 배치되는 제2 보정판;일단이 상기 제2 보정판과 결합하며, 타단이 상기 베이스와 결합하도록 배치되며, 상기 제2 보정판을 회전시키는 제2 회전봉;상기 제2 회전봉을 그 길이 방향의 축을 중심으로 회전시키는 제2 구동부;를 구비하는 것을 특징으로 하는 증착 장치.
- 제17항에 있어서,상기 제2 보정판은 그 일면이 상기 피처리체를 향하도록 배치되는 것을 특징으로 하는 증착 장치.
- 제18항에 있어서,상기 제2 보정판은 상기 선형 증착원의 길이 방향을 따라 배치되는 것을 특징으로 하는 증착 장치.
- 제19항에 있어서,상기 제2 보정판은 상기 제2 회전봉이 그 중심축을 중심으로 시계 방향 또는 반시계 방향으로 회전함에 따라 시계 방향 또는 반시계 방향으로 패닝하는 것을 특징으로 하는 증착 장치.
- 제20항에 있어서,상기 제2 보정판은 상기 피처리체와 평행한 상태에서 시계 방향 또는 반시계 방향으로 패닝하는 것을 특징으로 하는 증착 장치.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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KR1020090038450A KR101108151B1 (ko) | 2009-04-30 | 2009-04-30 | 증착 장치 |
JP2010062241A JP5197663B2 (ja) | 2009-04-30 | 2010-03-18 | 蒸着装置 |
US12/659,987 US8961692B2 (en) | 2009-04-30 | 2010-03-26 | Evaporating apparatus |
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KR1020090038450A KR101108151B1 (ko) | 2009-04-30 | 2009-04-30 | 증착 장치 |
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KR20100119368A true KR20100119368A (ko) | 2010-11-09 |
KR101108151B1 KR101108151B1 (ko) | 2012-01-31 |
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KR1020090038450A KR101108151B1 (ko) | 2009-04-30 | 2009-04-30 | 증착 장치 |
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US (1) | US8961692B2 (ko) |
JP (1) | JP5197663B2 (ko) |
KR (1) | KR101108151B1 (ko) |
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US8859043B2 (en) | 2011-05-25 | 2014-10-14 | Samsung Display Co., Ltd. | Organic layer deposition apparatus and method of manufacturing organic light-emitting display device by using the same |
US8859325B2 (en) | 2010-01-14 | 2014-10-14 | Samsung Display Co., Ltd. | Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method |
US8865252B2 (en) | 2010-04-06 | 2014-10-21 | Samsung Display Co., Ltd. | Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same |
US8871542B2 (en) | 2010-10-22 | 2014-10-28 | Samsung Display Co., Ltd. | Method of manufacturing organic light emitting display apparatus, and organic light emitting display apparatus manufactured by using the method |
US8876975B2 (en) | 2009-10-19 | 2014-11-04 | Samsung Display Co., Ltd. | Thin film deposition apparatus |
US8882922B2 (en) | 2010-11-01 | 2014-11-11 | Samsung Display Co., Ltd. | Organic layer deposition apparatus |
US8882556B2 (en) | 2010-02-01 | 2014-11-11 | Samsung Display Co., Ltd. | Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method |
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Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3519481A (en) * | 1966-10-14 | 1970-07-07 | Gen Electric | Method for forming thin films having superconductive contacts |
US5418348A (en) * | 1992-10-29 | 1995-05-23 | Mdc Vacuum Products, Inc. | Electron beam source assembly |
JPH1026698A (ja) | 1996-07-12 | 1998-01-27 | Nikon Corp | 真空薄膜形成装置及び反射鏡の製造方法 |
JP3861329B2 (ja) | 1996-07-17 | 2006-12-20 | 株式会社ニコン | 真空薄膜形成装置及び反射鏡の製造方法 |
JP2001172762A (ja) * | 1999-12-13 | 2001-06-26 | Toyobo Co Ltd | 真空蒸着装置 |
JP2003113466A (ja) * | 2001-07-31 | 2003-04-18 | Fuji Photo Film Co Ltd | 真空蒸着装置 |
TW591202B (en) | 2001-10-26 | 2004-06-11 | Hermosa Thin Film Co Ltd | Dynamic film thickness control device/method and ITS coating method |
TWI242602B (en) | 2001-11-02 | 2005-11-01 | Ulvac Inc | Thin film forming apparatus and method |
JP2004238663A (ja) | 2003-02-05 | 2004-08-26 | Sony Corp | 蒸着装置 |
JP2005126821A (ja) * | 2003-09-30 | 2005-05-19 | Fuji Photo Film Co Ltd | 真空蒸着装置および真空蒸着の前処理方法 |
JP2005113159A (ja) * | 2003-10-02 | 2005-04-28 | Pioneer Electronic Corp | 蒸着装置 |
US20050189228A1 (en) | 2004-02-27 | 2005-09-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Electroplating apparatus |
JP2006312765A (ja) | 2005-05-09 | 2006-11-16 | Fujinon Sano Kk | 真空蒸着装置 |
JP4728143B2 (ja) * | 2006-02-27 | 2011-07-20 | 株式会社シンクロン | 薄膜形成装置 |
US7803229B2 (en) | 2007-02-15 | 2010-09-28 | Himax Display, Inc. | Apparatus and method for compensating uniformity of film thickness |
JP4909152B2 (ja) | 2007-03-30 | 2012-04-04 | キヤノン株式会社 | 蒸着装置及び蒸着方法 |
-
2009
- 2009-04-30 KR KR1020090038450A patent/KR101108151B1/ko active IP Right Grant
-
2010
- 2010-03-18 JP JP2010062241A patent/JP5197663B2/ja active Active
- 2010-03-26 US US12/659,987 patent/US8961692B2/en active Active
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Also Published As
Publication number | Publication date |
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JP5197663B2 (ja) | 2013-05-15 |
US8961692B2 (en) | 2015-02-24 |
KR101108151B1 (ko) | 2012-01-31 |
JP2010261100A (ja) | 2010-11-18 |
US20100275842A1 (en) | 2010-11-04 |
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