KR20090059692A - Apparatus of cleaning a substrate - Google Patents

Abstract

An apparatus for cleaning a substrate is provided to improve efficiency of a cleaning process by preventing the cleaning solution and mist from being outputted to the outside through a blocking unit. A chamber(200) includes a cylindrical form of a hexahedron with an inner space. The chamber includes a side wall(210) for providing the space. The chamber includes an inlet port for receiving the substrate and an outlet port for delivering the substrate to the outside. A spraying unit(240) is arranged in the upper part in the chamber. A blocking unit(300) is arranged adjacently to the inlet port. The blocking unit divides the inner space of the chamber into a process section(250) and an exhaust section(260).

Description

Substrate cleaning device {APPARATUS OF CLEANING A SUBSTRATE}

The present invention relates to a substrate cleaning apparatus, and more particularly, to a substrate cleaning apparatus for cleaning a substrate using a cleaning liquid.

Recently, information processing devices have been rapidly developed to have various types of functions and faster information processing speeds. This information processing apparatus has a display device for displaying the operated information. Until now, a cathode ray tube monitor has been mainly used. However, with the rapid development of semiconductor technology, the use of a flat display device that is light and occupies a small space is increasing rapidly. There are various kinds of such flat panel displays, and among them, a liquid crystal display having a low power consumption and a small volume, and a low voltage driving type is widely used.

Various processes are performed to manufacture a liquid crystal display, and these processes are continuously performed in a plurality of chambers.

For example, in the cleaning process for removing foreign matter on the substrate, a rinse process for cleaning the substrate using deionized water and deionized water attached to the substrate by spraying air The drying process to remove is carried out continuously. In the case of the washing step, the cleaning liquid containing deionized water is sprayed onto the substrate while transferring the substrate transferred from the outside into the chamber in one direction.

At this time, when deionized water is injected into the substrate which has begun to be introduced into the chamber, the deionized water may flow out of the chamber or flow along the surface of the substrate. In addition, when the washing process using deionized water is performed several times, mist and the like may occur, and the mist and the like may leak to the outside of the chamber. This causes a problem that the neighboring chamber and the external equipment is damaged by the leaked deionized water and / or mist.

An object of the present invention is to provide a substrate cleaning apparatus for blocking the cleaning liquid used to clean the substrate to flow out of the chamber.

The substrate cleaning apparatus according to the embodiments of the present invention for achieving the above object includes a chamber, a blocking portion and a roller portion. The chamber provides a space for cleaning the substrate using a cleaning liquid, and has an inlet for receiving the substrate from the outside and an outlet for discharging the substrate to be disposed opposite to the inlet. The blocking portion is disposed adjacent to the inlet, and formed in a barrier rib shape in an upper region of the substrate to be loaded. In addition, the blocking unit distinguishes between a process section in which the cleaning process using the cleaning solution proceeds and an exhaust section blocking the cleaning solution from flowing out through the inlet. The roller unit transfers the substrate from the inlet to the outlet while supporting the substrate from below. The roller parts may be spaced apart from each other by a first interval in the process section, and the plurality of parallel rollers may be spaced apart from each other by a second interval smaller than the first interval in the exhaust section. A second roller part is provided.

According to embodiments of the present invention, the second roller portion has the same diameter and a plurality of rollers having a cylindrical shape are spaced apart from each other by the second interval.

According to the present invention described above, when the substrate is cleaned using the cleaning liquid in the chamber, the blocking portion blocks the cleaning liquid, the mist, and the like from flowing out. In addition, the plurality of roller parts disposed in an area adjacent to the blocking part and spaced apart by a relatively small interval may prevent the mist or the like from flowing out. Therefore, it is possible to prevent the cleaning liquid from flowing out of the chamber, thereby improving the efficiency of the cleaning process. In addition, since the roller unit serves as a blocking unit, the facility is simple and simple, so that the maintenance of the substrate cleaning apparatus can be efficiently performed.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described herein and may be embodied in other forms. Rather, the embodiments introduced herein are provided to ensure that the disclosed subject matter is thorough and complete, and that the scope of the invention to those skilled in the art will fully convey. In the drawings, chambers, rollers, shafts, partitions, etc., are exaggerated for clarity. It is apparent that the substrate cleaning apparatus described below can be applied to any apparatus in which a series of processes for a substrate can be performed.

1 is a schematic side view as viewed from the side to explain a substrate cleaning apparatus according to embodiments of the present invention, Figure 2 is a plan view from above of an example of the roller portion shown in FIG.

1 and 2, the substrate cleaning apparatus 100 according to the embodiments of the present invention includes a chamber 200, a blocking unit 300, and a roller unit 400.

The chamber 200 provides a space in which a series of processes are performed on the substrate 110 received from the outside. For example, the chamber 200 may have a hexahedral cylindrical shape having a space therein. Alternatively, the chamber 200 may be formed in various shapes having a space therein. The chamber 200 includes sidewalls 210 for providing the space.

The chamber 200 includes an inlet 220 for receiving the substrate 110 from the outside and an outlet 230 for delivering the substrate 110 to the outside. For example, the outlet 230 may be disposed opposite the inlet 220. In addition, the inlet 220 and the outlet 230 may be formed at the same height relative to the bottom of the chamber 200. This is because the transfer path of the substrate 110 that extends from the inlet 220 to the outlet 230 is straight so that efficiency of the process can be achieved. For example, the inlet 220 and the outlet 230 are formed by cutting a portion of the sidewall 210 of the chamber 200. That is, the inlet 220 and the outlet 230 may be formed by cutting a portion of the side wall 210 so that the substrate 110 can pass through.

In addition, the injection unit 240 may be disposed above the inner side of the chamber 200. The injection unit 240 receives a cleaning liquid for cleaning the substrate from the outside and sprays the upper surface of the substrate 110. For example, the cleaning liquid includes deionized water. A plurality of sprayers 240 may be uniformly disposed in a direction perpendicular to the moving direction of the substrate 110 to cover the entire upper surface of the substrate 110. The spraying unit 240 may be disposed so that the portion to which the cleaning liquid is sprayed toward the inlet 220 in order to spray the cleaning liquid sufficiently and efficiently to the moving substrate 110. In addition, the sprayer 240 may spray the cleaning liquid onto the substrate 110 while moving or rotating in the left, right, and left directions.

The blocking unit 300 is disposed adjacent to the inlet 220. For example, the blocking unit 300 is disposed in the upper region of the substrate 110 carried into the chamber 200 through the inlet 220.

In the embodiments of the present invention, the blocking part 300 is disposed in the form of a partition wall in the upper region of the moving substrate 110. For example, the blocking part 300 extends from the upper sidewall 210 of the inlet 220, and the extended portion has a shape bent downward. That is, the blocking unit 300 may have a '-' shape. Unlike this, the blocking part 300 may have a shape that is bent downward from the upper sidewall 210 of the inlet 200. For example, the blocking part 300 may have a curved shape similar to a part of a circle. As such, the blocking part 300 may be a partition wall having various shapes protruding from the side wall 210 so as to separate a predetermined space in the chamber 200. Therefore, the blocking unit 300 will not be limited to the scope of the present invention by the shape shown in FIG.

Accordingly, the blocking unit 300 may divide the internal space of the chamber 200 into a process section 250, which is a section where the process is performed, and an exhaust section 260 for blocking the cleaning solution. For example, when the blocking part 300 is formed in the form of a partition wall in an area adjacent to the inlet 200, the process chamber 200 is the process space 250 and the exhaust section 260 based on the blocking part 300. Divided by. Here, the process section 250 corresponds to the space between the blocking unit 300 and the outlet port 230, and the exhaust section 260 corresponds to the space between the blocking unit 300 and the inlet port 220.

Therefore, when the cleaning process using the cleaning solution is performed in the process section 250, the blocking unit 300 blocks the cleaning solution from entering the exhaust section 260. In this case, since the inflow of the cleaning solution is blocked in the exhaust section 260, the cleaning solution cannot reach the substrate 110 passing through the exhaust section 260. That is, in view of the substrate 110, the exhaust section 260 is a kind of buffer section and may be a standby area. Furthermore, since the blocking unit 300 blocks the inflow of the cleaning liquid, the cleaning liquid may be prevented from leaking out of the chamber 200 through the inlet 220.

At this time, when the blocking unit 300 is disposed above the moving substrate 110, the blocking unit 300 is formed in the cleaning liquid sprayed from the upper portion of the substrate 110 or the upper region of the substrate 110. (mist), foreign matters, etc. can block the outflow through the inlet 220 to the outside. However, the blocking unit 300 may not effectively prevent the mist, foreign substances, etc. generated in the lower portion of the substrate 110 from leaking out through the inlet 220.

A plurality of rollers 400 are disposed in parallel between the inlet port 220 and the outlet port 230. Accordingly, the roller 400 includes a plurality of rollers disposed along the transport direction of the substrate 110. Accordingly, the roller unit 400 is transported in one direction while supporting the substrate 110 at the lower portion of the substrate 110.

The roller portion 400 includes a first roller portion 410 disposed in the process section 250 and a second roller portion 420 disposed in the exhaust section 260.

A plurality of first rollers 410 are disposed in parallel in the process section 250 defined by the blocking unit 300. For example, the plurality of first roller parts 410 may be arranged in parallel to be spaced apart from the neighboring first roller parts 410 by a first distance d1.

The first roller portion 410 includes a first shaft 412 and the first roller 414.

For example, each end of the first shaft 412 is fixed to both sidewalls 210 of the chamber 200 facing each other in a direction perpendicular to the traveling direction of the substrate 110. Meanwhile, the first shaft 412 may be disposed at various positions in consideration of the size of the chamber 200, the type, the size, the weight of the substrate 110, and the like, and may be formed of various sizes and materials.

A plurality of first rollers 414 are disposed on the first shaft 412. For example, the first roller 414 is fitted to the first shaft 412 and is formed to be rotatable. That is, the first roller 414 may have a toroidal shape fitted to the outer surface of the first shaft 412. Therefore, when the lower surface of the substrate 110 is seated on the first roller 414, the first roller 414 is rotated to transfer the substrate 110 in one direction. The first roller 414 may be arranged in various numbers at various locations in consideration of the type, size, weight, etc. of the substrate 110, and may be formed of various sizes and materials.

A plurality of second rollers 420 are disposed in parallel in the exhaust section 260 defined by the blocking unit 300. For example, the second roller part 420 has the same diameter and includes a plurality of rollers having a cylindrical shape. That is, the second roller part 420 may be a cylindrical roller. The diameter of the second roller unit 420 may have various values in consideration of the type, size, weight, and the like of the substrate 110.

The rollers of the second roller part 420 may be arranged in parallel with a plurality of rollers spaced apart from the neighboring rollers by a second distance d2. At this time, the second interval d2 is smaller than the first interval d1. In particular, the second interval d2 is the minimum interval such that neighboring rollers can rotate without collision and / or friction with each other. Accordingly, the second roller part 420 may have almost no gap between neighboring rollers. Therefore, the second roller unit 420 having a plurality of rollers arranged in parallel at minimum intervals prevents mist, foreign substances, etc. formed from the lower portion thereof from leaking out of the chamber 200.

As such, the substrate cleaning apparatus 100 may block foreign substances, mist, and the like, which are generated while cleaning the substrate 110 by spraying the cleaning liquid containing pure water on the substrate 110, to the outside of the chamber 200. Specifically, the leakage of the mist generated in the upper portion based on the moving substrate 110 is blocked by the blocking unit 300, the leakage of the mist generated in the lower portion is blocked by the second roller portion 420. do. Therefore, the cleaning liquid may be prevented from leaking to the outside and adversely affecting the neighboring chamber or the external device.

3 is a plan view of another example of the roller shown in FIG.

Referring to FIG. 3, the second roller part 430 according to another example of the present invention includes a second shaft 432 and a second roller 434.

The second shaft 432 is disposed in parallel with the first shaft 412. Therefore, like the first shaft 412, the second shaft 432 is disposed in a direction perpendicular to the traveling direction of the substrate 110. For example, a plurality of second shafts 432 may be spaced apart from each other by a predetermined interval. In addition, the second shaft 432 may have a larger diameter than the first shaft 412.

A plurality of second rollers 434 are disposed on the second shaft 432. For example, the second roller 434 has a donut shape fitted to the second shaft 432 and is formed to be rotatable. In addition, the second roller 434 may also have a larger diameter than the first roller 414.

In embodiments of the present invention, the second roller 430 is disposed to be offset from the neighboring second roller 434. That is, in the second roller part 430, the second shaft 432 and the second roller 434 having the same size are arranged to be offset from each other, so that the distance between the neighboring second roller parts 434 is relatively minimized. . That is, the second roller parts 434 may be disposed to be engaged with each other while being offset to each other so that the distance between the second roller parts 434 and the neighboring second roller parts 434 may be minimized.

Therefore, the mist and the like generated from the lower portion is blocked from moving upward through the plurality of second roller portion 430. That is, the second roller part 430 disposed to be displaced and engaged with each other is densely and closely arranged with the neighboring second roller part 430, so that mist, foreign substances, etc. formed from the lower part flow out of the chamber 200. You can block.

4 is a plan view of another example of the roller shown in FIG.

Referring to FIG. 4, the second roller part 440 according to another example of the present invention is disposed in parallel with the first roller part 410. For example, a plurality of second rollers 440 may be disposed in a direction perpendicular to the advancing direction of the substrate 110. For example, a plurality of second shafts 432 may be spaced apart from each other by a predetermined interval.

The second roller part 440 includes a plurality of rollers. For example, each of the rollers is formed in the shape of a long pillar whose cross section is caused. At this time, one roller is composed of pillars having cross sections of different sizes. For example, the cross section of one portion of the roller and the cross section of the remaining portion may be circles having different diameters. That is, the second roller part 440 may have a bulging pillar shape having circular cross sections having different sizes.

Accordingly, the second roller part 440 is disposed to be shifted from the neighboring second roller part 440. That is, the second roller portion 440 having a bulging shape may be disposed to mesh with the neighboring second roller portions 440. Therefore, the gap between the second roller portion 440 and the neighboring second roller portion 440 is minimized.

Therefore, the mist or the like generated from the bottom is blocked from moving upward through the second roller portion 440. That is, the second roller part 440 may be disposed to be engaged with the neighboring second roller part 440 to prevent the mist, foreign substances, etc. formed from the lower side from leaking out of the chamber 200.

According to the present invention, the blocking portion blocks the outflow of the mist and foreign matter generated in the cleaning liquid and / or the upper portion of the substrate, and the roller portion prevents the outflow of the mist generated in the lower portion of the substrate. Block it. Therefore, the cleaning liquid may be prevented from flowing into the adjacent chamber or the mist or the like outward, and the cleaning efficiency of the substrate may be improved.

In addition, in the case where the roller portion disposed close to the neighboring roller portion blocks outflow of mist or the like, it is not necessary to configure a separate blocking portion, and the structure thereof can be simplified and simplified. Therefore, the cost and time required for the maintenance of the substrate cleaning apparatus can be reduced, and the efficiency of the overall process of processing the substrate can be improved.

As described above, although described with reference to preferred embodiments of the present invention, those skilled in the art will be variously modified without departing from the spirit and scope of the invention described in the claims below. And can be changed.

1 is a schematic side view as viewed from the side to explain a substrate cleaning apparatus according to embodiments of the present invention.

FIG. 2 is a plan view of an example of the roller unit shown in FIG.

3 is a plan view of another example of the roller shown in FIG.

4 is a plan view of another example of the roller shown in FIG.

<Description of the symbols for the main parts of the drawings>

100 substrate cleaning apparatus 110 substrate

200: chamber 210: side wall

220: carrying out 230: carrying out

250: process section 260: exhaust section

300: breaker 400: roller

410: first roller portion

420, 430, 440: second roller portion

Claims (2)

A chamber providing a space for cleaning the substrate using a cleaning liquid, the chamber having an inlet for receiving the substrate from the outside and an outlet for discharging the substrate to the outside; Disposed adjacent to the inlet, formed in the upper region of the incoming substrate in the form of a partition wall, a process section in which the cleaning process using the cleaning solution proceeds, and an exhaust section blocking the outflow of the cleaning solution through the inlet opening Blocking unit for distinguishing; And The substrate is transferred from the inlet to the outlet while the substrate is supported from below, and the first roller is disposed in parallel with the first roller and spaced apart from each other by a first interval in the process section. And a roller portion having a plurality of second roller portions disposed in parallel with each other by a second interval smaller than one interval. The substrate cleaning apparatus of claim 1, wherein the second roller unit has the same diameter and a plurality of rollers having a cylindrical shape are spaced apart from each other by the second interval.

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