KR20090013081A - 무기 분체 함유 수지 조성물, 패턴 형성 방법 및 평판디스플레이용 전극의 제조 방법 - Google Patents

무기 분체 함유 수지 조성물, 패턴 형성 방법 및 평판디스플레이용 전극의 제조 방법 Download PDF

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Publication number
KR20090013081A
KR20090013081A KR1020080074048A KR20080074048A KR20090013081A KR 20090013081 A KR20090013081 A KR 20090013081A KR 1020080074048 A KR1020080074048 A KR 1020080074048A KR 20080074048 A KR20080074048 A KR 20080074048A KR 20090013081 A KR20090013081 A KR 20090013081A
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KR
South Korea
Prior art keywords
inorganic powder
containing resin
resin composition
pattern
glass
Prior art date
Application number
KR1020080074048A
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English (en)
Korean (ko)
Inventor
히데아끼 마스꼬
나미꼬 고또
후미에 곤도
Original Assignee
제이에스알 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 제이에스알 가부시끼가이샤 filed Critical 제이에스알 가부시끼가이샤
Publication of KR20090013081A publication Critical patent/KR20090013081A/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00—Use of ingredients characterised by shape
    • C08K7/16—Solid spheres
    • C08K7/18—Solid spheres inorganic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00—Use of ingredients characterised by shape
    • C08K7/16—Solid spheres
    • C08K7/18—Solid spheres inorganic
    • C08K7/20—Glass
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Glass Compositions (AREA)
  • Graft Or Block Polymers (AREA)
  • Conductive Materials (AREA)
  • Polymerisation Methods In General (AREA)
KR1020080074048A 2007-07-30 2008-07-29 무기 분체 함유 수지 조성물, 패턴 형성 방법 및 평판디스플레이용 전극의 제조 방법 KR20090013081A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007198165A JP5104101B2 (ja) 2007-07-30 2007-07-30 無機粉体含有樹脂組成物、パターン形成方法およびフラットパネルディスプレイ用電極の製造方法
JPJP-P-2007-00198165 2007-07-30

Publications (1)

Publication Number Publication Date
KR20090013081A true KR20090013081A (ko) 2009-02-04

Family

ID=40331650

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080074048A KR20090013081A (ko) 2007-07-30 2008-07-29 무기 분체 함유 수지 조성물, 패턴 형성 방법 및 평판디스플레이용 전극의 제조 방법

Country Status (3)

Country Link
JP (1) JP5104101B2 (zh)
KR (1) KR20090013081A (zh)
CN (1) CN101359177A (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5286777B2 (ja) * 2007-12-26 2013-09-11 セントラル硝子株式会社 感光性導電ペースト
CN101938859B (zh) * 2009-06-30 2012-05-09 西安宏星电子浆料科技有限责任公司 发热器用电致热有机电极浆料
JP4891427B2 (ja) * 2010-07-26 2012-03-07 キヤノン株式会社 電子写真感光体、電子写真感光体の製造方法、プロセスカートリッジおよび電子写真装置
JP2012073494A (ja) * 2010-09-29 2012-04-12 Taiyo Holdings Co Ltd 感光性樹脂組成物
JP4762374B1 (ja) * 2011-02-14 2011-08-31 積水化学工業株式会社 感光性組成物及びプリント配線板
KR101104994B1 (ko) 2011-02-14 2012-01-16 세키스이가가쿠 고교가부시키가이샤 감광성 조성물 및 인쇄 배선판
CN102929101B (zh) * 2012-10-12 2016-12-21 昆山维信诺显示技术有限公司 一种导电光刻胶及使用该导电光刻胶的oled电极及制造方法
JP6540711B2 (ja) * 2014-11-13 2019-07-10 株式会社村田製作所 感光性導電ペースト、および、それを用いた積層型電子部品の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001109145A (ja) * 1999-10-01 2001-04-20 Toray Ind Inc パターン形成用ペースト、ディスプレイ用部材、およびディスプレイ
JP2001154345A (ja) * 1999-11-25 2001-06-08 Dainippon Printing Co Ltd 感光性導電ペーストおよびそれを用いた感光性導電層転写シート
JP2002311582A (ja) * 2001-04-16 2002-10-23 Sumitomo Bakelite Co Ltd 感光性銀ペースト及びそれを用いた画像表示装置
JP2002311583A (ja) * 2001-04-18 2002-10-23 Daicel Chem Ind Ltd 感光性ペースト及びそれを用いたディスプレイ用部材の製造方法

Also Published As

Publication number Publication date
JP5104101B2 (ja) 2012-12-19
CN101359177A (zh) 2009-02-04
JP2009031693A (ja) 2009-02-12

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