KR20080110989A - 이온성 액체를 사용하여 금속을 전착시키는 방법 - Google Patents

이온성 액체를 사용하여 금속을 전착시키는 방법 Download PDF

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Publication number
KR20080110989A
KR20080110989A KR1020087019466A KR20087019466A KR20080110989A KR 20080110989 A KR20080110989 A KR 20080110989A KR 1020087019466 A KR1020087019466 A KR 1020087019466A KR 20087019466 A KR20087019466 A KR 20087019466A KR 20080110989 A KR20080110989 A KR 20080110989A
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KR
South Korea
Prior art keywords
ammonium chloride
group
metal
alkyl
ionic liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
KR1020087019466A
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English (en)
Korean (ko)
Inventor
보리스 쿠즈마노비크
스트리엔 코르넬리스 조한네스 고바르두스 반
콜린 에릭 바텔
미카엘 자이틀러
조한나 크리스티나 스필만
Original Assignee
아크조 노벨 엔.브이.
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Publication date
Application filed by 아크조 노벨 엔.브이. filed Critical 아크조 노벨 엔.브이.
Publication of KR20080110989A publication Critical patent/KR20080110989A/ko
Abandoned legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/66—Electroplating: Baths therefor from melts
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/66—Electroplating: Baths therefor from melts
    • C25D3/665—Electroplating: Baths therefor from melts from ionic liquids

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
KR1020087019466A 2006-02-15 2007-02-12 이온성 액체를 사용하여 금속을 전착시키는 방법 Abandoned KR20080110989A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP06101714 2006-02-15
EP06101714.1 2006-02-15
US77897106P 2006-03-06 2006-03-06
US60/778,971 2006-03-06

Publications (1)

Publication Number Publication Date
KR20080110989A true KR20080110989A (ko) 2008-12-22

Family

ID=37909719

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087019466A Abandoned KR20080110989A (ko) 2006-02-15 2007-02-12 이온성 액체를 사용하여 금속을 전착시키는 방법

Country Status (6)

Country Link
US (1) US8361300B2 (https=)
EP (1) EP1984541A2 (https=)
JP (1) JP5134553B2 (https=)
KR (1) KR20080110989A (https=)
CA (1) CA2642427C (https=)
WO (1) WO2007093574A2 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013173008A1 (en) * 2012-05-14 2013-11-21 United Technologies Corporation Surface cleaning and activation for electrodeposition in ionic liquids

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3008074B2 (ja) 1995-05-24 2000-02-14 株式会社トキメック ジャイロ装置及びその製造方法
JP5134553B2 (ja) 2006-02-15 2013-01-30 アクゾ ノーベル ナムローゼ フェンノートシャップ イオン液体を用いる金属電着法
EP1983079A1 (en) * 2007-04-17 2008-10-22 Nederlandse Organisatie voor Toegepast-Natuuurwetenschappelijk Onderzoek TNO Barrier layer and method for making the same
ES2358967T3 (es) * 2007-08-02 2011-05-17 Akzo Nobel N.V. Método para electrodepositar metales usando líquidos iónicos en presencia de un aditivo.
US9267214B2 (en) * 2008-02-11 2016-02-23 Board Of Trustees Of The University Of Alabama Aluminum recovery process
ATE531835T1 (de) * 2008-02-26 2011-11-15 Doerken Ewald Ag Beschichtungsverfahren für ein werkstück
WO2010052123A1 (en) * 2008-11-05 2010-05-14 Henkel Ag & Co. Kgaa Ionic liquid composition for the removal of oxide scale
GB0905894D0 (en) * 2009-04-06 2009-05-20 Univ Belfast Ionic liquids solvents for metals and metal compounds
GB2473285A (en) * 2009-09-08 2011-03-09 Astron Advanced Materials Ltd Low temperature joining process
JP5581523B2 (ja) * 2009-10-19 2014-09-03 ディップソール株式会社 アルミニウムまたはアルミニウム合金バレル電気めっき方法
JP2012116802A (ja) * 2010-12-02 2012-06-21 Nitto Boseki Co Ltd イオン液体及びその製造方法
US8778164B2 (en) 2010-12-16 2014-07-15 Honeywell International Inc. Methods for producing a high temperature oxidation resistant coating on superalloy substrates and the coated superalloy substrates thereby produced
GB201104096D0 (en) 2011-03-10 2011-04-27 Univ Manchester Production of graphene
US8187489B1 (en) * 2011-03-23 2012-05-29 The United States Of America As Represented By The Secretary Of The Navy Biodegradable ionic liquids for aircraft deicing
US8778163B2 (en) * 2011-09-22 2014-07-15 Sikorsky Aircraft Corporation Protection of magnesium alloys by aluminum plating from ionic liquids
US9771661B2 (en) 2012-02-06 2017-09-26 Honeywell International Inc. Methods for producing a high temperature oxidation resistant MCrAlX coating on superalloy substrates
GB201204279D0 (en) 2012-03-09 2012-04-25 Univ Manchester Production of graphene
DK2859138T3 (en) 2012-06-08 2017-02-27 Onderzoekscentrum Voor Aanwending Van Staal N V Process for making a metal coating
CN102936738A (zh) * 2012-10-24 2013-02-20 彩虹集团公司 一种利用离子液体低温电沉积钴的方法
US9803087B2 (en) 2013-07-09 2017-10-31 Dic Corporation Aqueous coating agent and article using same
GB2516919B (en) 2013-08-06 2019-06-26 Univ Manchester Production of graphene and graphane
WO2015157441A1 (en) 2014-04-09 2015-10-15 Nulwala Hunaid B Ionic liquid solvent for electroplating process
JP2016027190A (ja) * 2014-06-24 2016-02-18 住友電気工業株式会社 アルミニウムめっき液、アルミニウム膜の製造方法、及びアルミニウム多孔体
WO2016004189A1 (en) 2014-07-03 2016-01-07 Nulwala Hunaid B Selected compositions for aluminum processes and devices
GB2534883A (en) 2015-02-03 2016-08-10 Univ Leicester Electrolyte for electroplating
US10087540B2 (en) 2015-02-17 2018-10-02 Honeywell International Inc. Surface modifiers for ionic liquid aluminum electroplating solutions, processes for electroplating aluminum therefrom, and methods for producing an aluminum coating using the same
CN105821453A (zh) * 2016-04-27 2016-08-03 昆明理工大学 一种低共熔溶剂电沉积亮铬镀层的方法
TWI633213B (zh) * 2017-07-18 2018-08-21 明志科技大學 無污染電鍍液及其製備方法
JP2020094009A (ja) 2018-12-14 2020-06-18 日清紡ホールディングス株式会社 サッカリンアニオンを有するアンモニウム塩

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01132571A (ja) 1987-11-18 1989-05-25 Aguro Kanesho Kk 農園芸用殺菌剤
US5074973A (en) 1989-05-23 1991-12-24 Nisshin Steel Co. Ltd. Non-aqueous electrolytic aluminum plating bath composition
JPH04193976A (ja) 1990-11-28 1992-07-14 Nisshin Steel Co Ltd 溶融塩浴を用いた電気アルミニウムめっき方法
GB0023706D0 (en) * 2000-09-27 2000-11-08 Scionix Ltd Ionic liquids
GB0023708D0 (en) 2000-09-27 2000-11-08 Scionix Ltd Hydrated salt mixtures
JP2002371397A (ja) 2001-06-14 2002-12-26 Kuniaki Murase 常温溶融塩を用いた金属の電析方法
US6552843B1 (en) 2002-01-31 2003-04-22 Innovative Technology Licensing Llc Reversible electrodeposition device with ionic liquid electrolyte
US6721080B1 (en) 2002-09-27 2004-04-13 D Morgan Tench Optimum switching of a reversible electrochemical mirror device
US6798556B2 (en) 2003-01-31 2004-09-28 Rockwell Scientific Licensing, Llc. Locally-switched reversible electrodeposition optical modulator
WO2006074523A1 (en) 2005-01-13 2006-07-20 Commonwealth Scientific And Industrial Research Organisation Recovery of metals
JP2007070698A (ja) * 2005-09-07 2007-03-22 Kyoto Univ 金属の電析方法
JP5134553B2 (ja) 2006-02-15 2013-01-30 アクゾ ノーベル ナムローゼ フェンノートシャップ イオン液体を用いる金属電着法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013173008A1 (en) * 2012-05-14 2013-11-21 United Technologies Corporation Surface cleaning and activation for electrodeposition in ionic liquids

Also Published As

Publication number Publication date
WO2007093574A3 (en) 2007-12-06
US8361300B2 (en) 2013-01-29
JP2009526910A (ja) 2009-07-23
HK1126256A1 (en) 2009-08-28
EP1984541A2 (en) 2008-10-29
US20090236227A1 (en) 2009-09-24
CA2642427C (en) 2014-03-25
CA2642427A1 (en) 2007-08-23
JP5134553B2 (ja) 2013-01-30
WO2007093574A2 (en) 2007-08-23

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