KR20080069553A - Curable composition for photo nano-imprint lithography and pattern forming method using the same - Google Patents

Curable composition for photo nano-imprint lithography and pattern forming method using the same Download PDF

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Publication number
KR20080069553A
KR20080069553A KR1020080007253A KR20080007253A KR20080069553A KR 20080069553 A KR20080069553 A KR 20080069553A KR 1020080007253 A KR1020080007253 A KR 1020080007253A KR 20080007253 A KR20080007253 A KR 20080007253A KR 20080069553 A KR20080069553 A KR 20080069553A
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KR
South Korea
Prior art keywords
group
composition
mass
polymerizable unsaturated
represents
Prior art date
Application number
KR1020080007253A
Other languages
Korean (ko)
Inventor
히로키 사사키
쿄헤이 사키타
야스마사 카와베
타카시 타카야나기
Original Assignee
후지필름 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JPJP-P-2007-00012556 priority Critical
Priority to JP2007012556 priority
Priority to JPJP-P-2007-00242717 priority
Priority to JP2007242717A priority patent/JP2008202022A/en
Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤
Publication of KR20080069553A publication Critical patent/KR20080069553A/en

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