KR20020061889A - array panel of in plane switching mode liquid crystal display and manufacturing method thereof - Google Patents

Abstract

PURPOSE: An array substrate for a horizontal electric field LCD(Liquid Crystal Display) and a method for manufacturing the same are provided to overlap one of common electrodes with data lines to serve as a black matrix by forming the common electrodes, pixel electrodes and the data lines with curved portions, thereby improving the aperture ratio of the LCD. CONSTITUTION: An array substrate for a horizontal electric field LCD includes gate lines(121) extended on a substrate in a first direction, data lines(161) extended on the substrate in a second direction and having at least one curved portion, a plurality of common electrodes(124-126) extended in the second direction and having at least one curved portion, one of the electrodes being formed of an opaque conductive material and overlapped with the data lines, common lines(123) connected to the common electrodes and extended in the first direction, and a plurality of pixel electrodes(183-185) disposed missing the common electrodes and having at least one curved portion.

Description

Array panel for horizontal field drive type liquid crystal display device and method for manufacturing same {array panel of in plane switching mode liquid crystal display and manufacturing method}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wide viewing angle liquid crystal display device, and more particularly, to an array substrate of a horizontal electric field drive type liquid crystal display device in which first and second electrodes for driving liquid crystal are formed on the same substrate.

In general, a liquid crystal display device is formed by arranging two substrates on which electric field generating electrodes are formed so that the surfaces on which two electrodes are formed face each other, injecting a liquid crystal material between the two substrates, and then applying voltage to the two electrodes. It is a device that expresses an image by the transmittance of light varying accordingly by moving liquid crystal molecules by an electric field.

Liquid crystal displays may be formed in various forms. Currently, an active matrix LCD (AM-LCD) having a thin film transistor and pixel electrodes connected to the thin film transistors arranged in a matrix manner has excellent resolution and video performance. It is most noticed.

The liquid crystal display device has a structure in which a pixel electrode is formed on a lower substrate and a common electrode is formed on an upper substrate, and the liquid crystal molecules are driven by an electric field in a direction perpendicular to the substrate between the two electrodes. This is excellent in characteristics such as transmittance and aperture ratio.

However, such a liquid crystal display has a disadvantage that the viewing angle characteristics are not excellent. Accordingly, various methods have been proposed to overcome these disadvantages, and one example thereof is a horizontal electric field driving method, that is, a liquid crystal display device in an in-plane switching (IPS) mode.

Hereinafter, the liquid crystal display of the IPS mode will be described in detail with reference to the accompanying drawings.

As shown in FIG. 1, the upper substrate 1 and the lower substrate 2 are disposed at a predetermined distance, and the liquid crystal molecules 3 are positioned between the two substrates 1 and 2. Here, the pixel electrode 4 and the common electrode 5 are formed on the same plane of the lower substrate 2, so that when a voltage is applied to the two electrodes 4, 5, between the two electrodes 4, 5. The horizontal electric field 6 is generated and the liquid crystal molecules of the liquid crystal layer 3 are operated by this horizontal electric field 6.

2A and 2B are diagrams illustrating phase shifts of liquid crystal molecules before and after applying a voltage in an IPS mode liquid crystal display, respectively.

As shown in FIG. 2A, the phase shift of the liquid crystal molecules 3 does not occur in a state where no voltage is applied to the pixel electrode 4 or the common electrode 5. Here, the liquid crystal molecules 3 are arranged at a predetermined angle with respect to the horizontal direction of the two electrodes 4 and 5 to control the direction of rotation of the liquid crystal molecules 3 when generating an electric field.

Next, as shown in FIG. 2B, when a voltage is applied to the pixel electrode 4 and the common electrode 5, the liquid crystal molecules 3 form a horizontal electric field 6 generated between the two electrodes 4 and 5. Arranged side by side.

The array substrate for a horizontal electric field type liquid crystal display device will be described with reference to FIG. 3.

3 is a plan view illustrating an example of a thin film transistor array substrate of a conventional horizontal electric field drive type liquid crystal display device.

As shown in the figure, the horizontal gate wiring 21 and the vertical data wiring 31 cross each other to define a pixel area, and the gate wiring 21 is formed at the intersection of the gate wiring 21 and the data wiring 31. And a thin film transistor 41 which is a switching element connected to the data line 31 is formed. The common wiring 51 extending in the horizontal direction is formed in the pixel area, and a plurality of common electrodes 52 connected to the common wiring 51 extend in the vertical direction. In addition, a plurality of pixel electrodes 62 having a vertical direction and staggered with the common electrode 52 at regular intervals are formed, and the pixel electrodes 62 are connected to the thin film transistor 41. One end is connected to the pixel electrode connection line 61. The pixel electrode connection line 61 overlaps the gate line 21 to form a storage capacitor.

Accordingly, in the IPS mode liquid crystal display device using the array substrate, a horizontal electric field is generated between the pixel electrode and the common electrode formed on the same plane, so that the liquid crystal molecules are aligned with the horizontal electric field, thereby widening the viewing angle of the liquid crystal display device. Can be.

However, in the liquid crystal display of the IPS mode, there remains a problem that color shift occurs depending on the viewing angle. Color inversion is related to the direction of rotation of the liquid crystal molecules under an electric field of more than a threshold voltage, and is caused by an increase or decrease of the retardation value of the liquid crystal layer depending on the viewing angle.

An example for solving this color inversion problem is presented in US Patent No. 5,745,207, which is shown in FIG.

As shown in the drawing, the common electrode 52 and the pixel electrode 62 are formed to be bent at a predetermined angle, thereby forming two domains A and B at the boundary of the bent portion. In FIG. 4, domains A and B are formed above and below the pixel region.

Here, when a voltage is applied to the two electrodes 52 and 62, an electric field (not shown) generated between the two electrodes 52 and 62 is used for the liquid crystal molecules 71 and 72 for each of the domains A and B. Are rotated in opposite directions, wherein the liquid crystal molecules 71 of the upper domain A rotate clockwise, and the liquid crystal molecules 72 of the lower domain B rotate counterclockwise. Therefore, since the liquid crystal molecules 71 and 72 of each domain A and B are arranged in different directions, color inversion according to the viewing angle can be effectively compensated.

At this time, the data wiring 31 also has a bent portion and is formed in parallel with the common electrode 52 and the pixel electrode 62, so that the space between the data wiring 31 and the common electrode 52 is reduced, so that the aperture ratio is decreased. It can increase.

However, in order to form the data line 31 having the bent portion as described above, the black matrix formed on the upper substrate of the liquid crystal display should also have the bent portion.

In the horizontal field type liquid crystal display, when the black matrix of the upper substrate is formed of a metal material, the black matrix is formed of resin because the voltage between the common electrode and the pixel electrode may be affected. Can not be formed in a process bent structure. Therefore, the liquid crystal display having the array substrate having the structure as shown in FIG. 4 cannot be realized as the technology at the time, and the technique of FIG. 4 presents an idea lacking specificity.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-described conventional problems, and an object of the present invention is to provide an array substrate for a horizontal field type liquid crystal display device having a wide viewing angle and improved aperture ratio, and a method of manufacturing the same.

1 is a view showing a general horizontal electric field drive type liquid crystal display device.

2A and 2B are diagrams illustrating arrangement states of liquid crystal molecules before and after voltage is applied in a horizontal electric field drive type liquid crystal display device, respectively.

3 and 4 are plan views of a thin film transistor array substrate of a conventional horizontal electric field drive type liquid crystal display device.

5 is a plan view of an array substrate for a horizontal electric field drive type liquid crystal display device according to the present invention;

6 is a cross-sectional view taken along the line VI-VI in FIG. 5.

7A to 7E are cross-sectional views illustrating a method of manufacturing an array substrate according to the present invention.

8 is a plan view of an array substrate according to a second embodiment of the present invention.

FIG. 9 is a cross-sectional view taken along the line VII-VII of FIG. 8. FIG.

10A to 10E are cross-sectional views illustrating a method of manufacturing an array substrate according to a second embodiment of the present invention.

In order to achieve the above object, an array substrate for a horizontal field type liquid crystal display device according to the present invention includes a data line having at least one gate line extending in a first direction and a portion extending and bent in a second direction on the substrate. Formed. In addition, a plurality of common electrodes having at least one portion extending in a second direction and bent, one of the electrodes is made of an opaque conductive material and overlaps the data line, are connected to the plurality of common electrodes The common wiring extended in one direction is formed. In addition, a plurality of pixel electrodes having at least one or more curved portions that are alternately disposed with the common electrode are formed.

The array substrate according to the present invention further includes a thin film transistor connected to the gate line and the data line.

Here, the common electrode and the common wiring may be made of the same material as the gate wiring.

In addition, the pixel electrode may be formed of any one of indium tin oxide and indium zinc oxide, and a plurality of common electrodes other than the common electrode overlapping the data line may be made of the same material as the pixel electrode.

The array substrate according to the present invention may further include a first pixel electrode connection line connecting ends of the plurality of pixel electrodes, and the first pixel electrode connection line may partially overlap the common line.

In this case, the pixel electrode may further include a second pixel electrode connection line connecting the end of the pixel electrode.

The common electrode, the pixel electrode, and the data line may be formed in a zigzag shape.

In the method for manufacturing an array substrate for a horizontal field type liquid crystal display device according to the present invention, a common wiring extending in a first direction and a plurality of common electrodes extending in a second direction and having a zigzag shape are formed on the substrate, and the first direction is formed. The gate wiring and the gate electrode extended to each other are formed. Subsequently, a gate insulating film is formed on the common wiring and the gate wiring, and a semiconductor layer is formed on the gate insulating film, and then extends in the second direction on the semiconductor layer to have a zigzag shape and overlap with one of the plurality of common electrodes. The data wiring is formed, and the source electrode and the drain electrode connected to the data wiring are formed. Next, a passivation layer is formed on the data line and the source and drain electrodes, and extends in the second direction to form a plurality of pixel electrodes staggered with the common electrode.

In another method for manufacturing a horizontal field array substrate according to the present invention, a gate wiring extending in a first direction and a gate electrode connected to the gate wiring are formed on the substrate, and a gate insulating film and a semiconductor layer are sequentially formed thereon. Subsequently, a data line extending in the second direction and having a zigzag shape and a source electrode and a drain electrode connected to the data line are formed on the semiconductor layer. Next, a passivation layer is formed on the data line and the source and drain electrodes, extends in the second direction on the passivation layer, has a zigzag shape, and one of the electrodes is an opaque material, which is wider than the data line and overlaps the data line. A plurality of pixel electrodes having an electrode and a zigzag shape and staggered with the common electrode are formed.

As described above, in the present invention, the common electrode and the pixel electrode are formed to have a zigzag shape on the same substrate, and one of the common electrodes overlaps with the data wiring to serve as a black matrix, thereby improving the aperture ratio of the liquid crystal display device. In addition, by forming the pixel electrode and the common electrode in the same layer with a transparent conductive material, it is possible to further improve the aperture ratio and to prevent problems such as an afterimage.

Hereinafter, with reference to the accompanying drawings will be described in detail an embodiment of the present invention.

5 is a plan view of an array substrate for a horizontal field type liquid crystal display according to the present invention, and FIG. 6 is a cross-sectional view taken along the line VI-VI in FIG. 5.

As shown in FIGS. 5 and 6, the gate wiring 121 and the gate electrode 122 connected to the gate wiring 121 in the horizontal direction are formed on the transparent insulating substrate 110 such as glass. In addition, the first to third common electrodes extending in the vertical direction from the common wiring 123 parallel to the gate wiring 121 and the common wiring 123 between the two gate wirings 121 and having a zigzag shape. 124, 125, and 126 are formed.

The gate wiring 121, the common wiring 123, and the common electrodes 124, 125, and 126 are covered with a gate insulating layer 130 made of a silicon nitride film SiN _x or a silicon oxide film SiO ₂ .

An active layer 141 made of a material such as amorphous silicon is formed on the gate insulating layer 130 on the gate electrode 122, and ohmic contact layers 151 and 152 made of impurity amorphous silicon are formed thereon.

On the ohmic contact layers 151 and 152 and the gate insulating layer 130, the source electrode connected to the data line 161 and the data line 161 in the vertical direction crossing the gate line 121 to define the pixel area ( 162 and a drain electrode 163 facing the source electrode 162 around the gate electrode 122 is formed.

Here, the data line 161 has a zigzag shape and overlaps the first common electrode 124.

The data line 161, the source electrode 162, and the drain electrode 163 may also be made of a material such as metal, similar to the gate line 121.

The data line 161, the source electrode 162, and the drain electrode 163 are covered with the passivation layer 170, and the passivation layer 170 has a contact hole 171 exposing the drain electrode 163. Here, the passivation layer 170 may be formed of a silicon nitride layer or a silicon oxide layer similarly to the gate insulating layer 130, or may be formed of an organic material.

First to third pixel electrodes 183, 184, and 185 are formed in the pixel area above the passivation layer 170. The first to third pixel electrodes 183, 184, and 185 extend in a vertical direction and are zigzag. It has a shape and is spaced apart from each corresponding common electrode 124, 125, 126 by a predetermined interval horizontally. First and second pixel electrode connection lines 181 and 182 connecting them are formed at both ends of the first to third pixel electrodes 183, 184, and 185, respectively, and the first pixel electrode connection line 181 is common. The storage capacitor is overlapped with the wiring 123, and the second pixel electrode connection line 182 is connected to the drain electrode 163 through the contact hole 171.

Although the common electrode, the pixel electrode, and the data wiring are formed in a zigzag shape, the common electrode, the pixel electrode, and the data wiring may be formed to be bent only once as in the related art.

A method of manufacturing the array substrate will be described in detail with reference to FIGS. 7A to 7E.

First, as shown in FIG. 7A, a metal-like material is deposited and patterned on a transparent insulating substrate 110 such as glass to form a gate wiring 121, a gate electrode 122, a common wiring 123, and the first to the first to second substrates. Third common electrodes 124, 125, and 126 are formed.

The gate wiring 121 and the common wiring 123 extend in the horizontal direction, and one end of the common electrode 124, 125, and 126 is connected to the common wiring 123 and extends in the vertical direction, and has a zigzag shape. . Here, the number of common electrodes 124, 125, and 126 is described as three, but the number of common electrodes 124, 125, and 126 may vary depending on the distance between the electrodes and the inclination angle of the electrodes.

The gate wiring 121, the common wiring 123, and the common electrodes 124, 125, and 126 may be made of an opaque material such as metal, and include chromium (Cr), aluminum (Al), aluminum alloy, and molybdenum (Mo). For example, tantalum (Ta), tungsten (W), antimony (Sb), or alloys or bilayers thereof.

Subsequently, as illustrated in FIG. 7B, the gate insulating layer 130, the amorphous silicon layer, and the amorphous silicon layer doped with impurities are disposed on the gate wiring 121, the common wiring 123, and the common electrodes 124, 125, and 126. Are deposited and patterned sequentially to form the active layer 141 and the impurity semiconductor layer 153. Here, the gate insulating film 130 may be formed of a silicon oxide film or a silicon nitride film, or may be formed of an organic material.

Next, as shown in FIG. 7C, a material such as a metal is deposited and patterned to form data lines 161 and source and drain electrodes 162 and 163. The data line 161 crosses the gate line 121 to define a pixel area, and the source and drain electrodes 162 and 163 face each other with respect to the gate electrode 122.

Here, the data line 161 has a zigzag shape and overlaps the first common electrode 124.

Next, as shown in FIG. 7D, the protective film 170 is formed by depositing a silicon nitride film, a silicon oxide film, or an organic material, and then patterning the contact hole 171 to partially expose the drain electrode 163.

Next, as shown in FIG. 7E, a transparent conductive material such as indium-tin-oxide (ITO) or indium-zinc-oxide (IZO) is deposited and patterned to form a first layer. To third pixel electrodes 183, 184, and 185 and first and second pixel electrode connection lines 181 and 182. Here, the first to third pixel electrodes 183, 184, and 185 extend in the vertical direction, have a zigzag shape, and are spaced apart from each corresponding common electrode 124, 125, and 126 at predetermined intervals. Like the common electrodes 124, 125, and 126, the number of pixel electrodes 183, 184, and 185 may vary depending on conditions.

Here, the pixel electrode connection lines 181 and 182 and the pixel electrodes 183, 184 and 185 are formed of a transparent conductive material such as ITO or IZO, but may be formed of an opaque conductive material such as metal in some cases.

In such an IPS mode liquid crystal display array substrate, the first common electrode 124 is formed to overlap with the data line 161 so that the first common electrode 124 serves as a black matrix. Therefore, the data line 161 can be formed to have a bent portion like a zigzag shape, and the portion adjacent to the data line 161 also becomes an image display area, thereby improving the aperture ratio.

In the exemplary embodiment of the present invention, the common electrodes 124, 125, and 126 may be formed on the gate insulating layer 130.

Although not shown, a lower alignment layer is formed on the pixel electrodes 183, 184, and 185, and a color filter, a black matrix, and an upper alignment layer are formed on the color filter substrate disposed to face the array substrate. In this case, the black matrix is preferably formed of a resin for the voltage problem of the liquid crystal display.

According to the exemplary embodiment of the present invention, the data lines may be zigzag-shaped regardless of the shape of the black matrix of the upper substrate.

When the array substrate and the color filter substrate formed as described above are bonded to each other and liquid crystal is injected therebetween, the horizontal electric field driving type liquid crystal display device is completed. As the alignment layer, polyimide, polyamide, photoalignment layer, or the like is formed. In addition, in order to prevent static electricity generated when the polarizer is attached to the outside of the liquid crystal display or the substrate, or static electricity generated when the module is attached, the transparent conductive film may be formed outside the substrate. The transparent conductive film may be formed above or below the polarizer.

8 and 9 show a second embodiment of the present invention in which the aperture ratio is further improved.

8 is a plan view of an array substrate according to a second exemplary embodiment of the present invention, and FIG. 9 is a cross-sectional view taken along the line VII-VII of FIG. 8. Here, the same names and symbols as those in the first embodiment described above are used for the respective parts.

8 and 9, the gate wiring 121 and the gate electrode 122 connected to the gate wiring 121 in the horizontal direction are formed on the substrate 110.

The gate wiring 121 and the gate electrode 122 are covered with a gate insulating film 130 made of a silicon nitride film or a silicon oxide film. In addition, the gate insulating layer 130 may be formed of benzocyclobutene (hereinafter referred to as BCB), an acrylate, or polyimide, which is an organic material.

An active layer 141 made of a material such as amorphous silicon is formed on the gate insulating layer 130 on the gate electrode 122, and ohmic contact layers 151 and 152 made of impurity amorphous silicon are formed thereon.

On the ohmic contact layers 151 and 152 and the gate insulating layer 130, the source electrode connected to the data line 161 and the data line 161 in the vertical direction crossing the gate line 121 to define the pixel area ( 162 and a drain electrode 163 facing the source electrode 162 around the gate electrode 122 is formed. Here, the data line 161 has a zigzag shape.

Next, the data line 161, the source electrode 162, and the drain electrode 163 are covered with the passivation layer 170, and the passivation layer 170 has a contact hole 171 partially exposing the drain electrode 163.

Here, the passivation layer 170 may be formed of a silicon nitride layer or a silicon oxide layer similarly to the gate insulating layer 130, or may be made of an organic material such as BCB, acrylate, polyimide, or the like having a relatively small dielectric constant.

First to third pixel electrodes 183, 184, and 185, pixel electrode connection lines 182, and first to third common electrodes 124, 125, and 126, and a common wiring 123 are formed on the passivation layer 170. It is. Here, the first to third pixel electrodes 183, 184, and 185 and the first to third common electrodes 124, 125, and 126 extend in the vertical direction, have a zigzag shape, and are arranged to correspond to each other. The first common electrode 124 covers the data line 161 and extends to neighboring upper and lower pixels.

The pixel electrode connection line 182 connects the first to third pixel electrodes 183, 184, and 185, and is in contact with the drain electrode 163 through the contact hole 171, and the common wire 123 is connected to the pixel electrode connection line 182. It is connected to one end of the second and third common electrodes 125 and 126 and is in contact with the first common electrode 124.

In the present invention, the first common electrode 124 is formed of an opaque conductive material such as metal, and includes the second and third common electrodes 125 and 126, the common wiring 123, and the first to third pixel electrodes ( 183, 184, and 185 and the pixel electrode connection line 182 are formed of a transparent conductive material such as ITO or IZO.

As described above, in the second exemplary embodiment of the present invention, since the common electrode and the pixel electrode of the pixel region are formed of a transparent conductive material, the transmittance is increased to further increase the aperture ratio, and the pixel electrode and the common electrode are formed on the same layer, thereby eliminating the problem You can prevent it.

Hereinafter, a method of manufacturing an array substrate according to a second exemplary embodiment of the present invention will be described with reference to FIGS. 10A to 10E.

First, as shown in FIG. 10A, a gate electrode 121 and a gate electrode 122 are formed by depositing and patterning a material such as a metal on an insulating substrate 110 that is transparent, such as glass.

Next, as illustrated in FIG. 10B, the gate insulating layer 130, the amorphous silicon layer, and the amorphous silicon layer doped with impurities are sequentially deposited and patterned on the gate wiring 121 and the gate electrode 122 to form an active layer ( 141 and the impurity semiconductor layer 153 are formed.

Next, as shown in FIG. 10C, a material such as a metal is deposited and patterned to form data lines 161 and source and drain electrodes 162 and 163. Here, the data line 161 has a zigzag shape and crosses the gate line 121 to define a pixel area, and the source and drain electrodes 162 and 163 face each other with respect to the gate electrode 122.

Next, as shown in FIG. 10D, the protective layer 170 is formed by depositing a silicon nitride layer, a silicon oxide layer, or an organic material, and then patterning the contact hole 171 to partially expose the drain electrode 163. At this time, when the protective film 170 is formed of an organic material having a low dielectric constant such as BCB, acrylate, polyimide, or the like, the first common electrode 124 and the data wiring 161 formed in a subsequent step overlap the data. The voltage of the first common electrode 124 may be minimized by the voltage of the wiring 161.

Next, as illustrated in FIG. 10E, a transparent conductive material such as ITO or IZO is deposited and patterned to form the first to third pixel electrodes 183, 184, and 185, the pixel electrode connection line 182, and the second and second electrodes. The three common electrodes 125 and 126 and the common wiring 123 are formed. Subsequently, a conductive material such as metal is deposited and patterned to form a first common electrode 124 overlapping the data line 161 and contacting the common line 123.

In addition, the first common electrode 124 is formed together with the gate electrode 122 by depositing and patterning a material such as metal to simplify the process, and the first to third pixel electrodes 183, 184 and 185 and the second and third common electrodes 125 and 126 may be formed by depositing transparent conductive materials such as ITO and IZO.

As mentioned above, the first to third pixel electrodes 183, 184, and 185 and the first to third common electrodes 124, 125, and 126 extend in the longitudinal direction and have a zigzag shape, respectively. They are staggered.

Here, the first to third pixel electrodes 183, 184, and 185 and the second and third common electrodes 125 and 126 made of a transparent conductive material are formed first and the first common electrode 124 is formed. The common electrode 124 may be formed first.

Although not shown, a lower alignment layer is formed on the pixel electrodes 183, 184, and 185, and a color filter, a black matrix, and an upper alignment layer are formed on the color filter substrate disposed to face the array substrate. The black matrix is preferably formed using a resin, and in the above-described embodiment, the common electrode, the pixel electrode, and the data wiring may be formed in a zigzag shape regardless of the shape of the black matrix.

When the array substrate and the color filter substrate formed as described above are bonded to each other and liquid crystal is injected therebetween, the horizontal electric field driving type liquid crystal display device is completed. It forms using said polyimide, polyamide, a photo-alignment film, etc. as said orientation film. The photo-alignment layer may be applied as long as it is a material suitable for optical alignment, such as polysiloxane cinnamate, polyvinyl cinnamate, or cellulose cinnamate. The light may be irradiated at least once using the light or the like to determine the alignment direction and / or the pretilt angle of the liquid crystal. In addition, a transparent conductive film may be formed outside the substrate in order to prevent static electricity generated when the polarizer is attached to the outside of the liquid crystal display or the outside of the substrate, or static electricity generated when the module is attached. The transparent conductive film may be formed above or below the polarizer.

The present invention is not limited to the above embodiments, and various changes and modifications can be made without departing from the spirit of the present invention.

In the present invention, the common electrode and the pixel electrode are formed on the same substrate in order to widen the viewing angle of the liquid crystal display, and the common electrode, the pixel electrode, and the data wiring are formed to have bent portions regardless of the structure of the black matrix. By opening one of the electrodes with the data wiring to serve as a black matrix, the aperture ratio of the liquid crystal display device is improved.

In addition, by forming the pixel electrode and the common electrode on the same layer with a transparent conductive material, the aperture ratio is further improved, and problems such as afterimages are prevented.

Claims (11)

Board; A gate wiring extending in a first direction on the substrate; A data line extending in the second direction on the substrate and having at least one bent portion; A plurality of common electrodes extending in the second direction and having at least one bent portion, one of the electrodes being made of an opaque conductive material and overlapping the data line; A common wiring connected to the plurality of common electrodes and extending in the first direction; A plurality of pixel electrodes having at least one curved portion intersected with the common electrode; Array substrate for a horizontal field type liquid crystal display device comprising a. The method of claim 1, And a thin film transistor connected to the gate line and the data line. The method of claim 1, And the common electrode and the common wiring are made of the same material as the gate wiring. The method of claim 1, The pixel electrode is one of an indium tin oxide and an indium zinc oxide array substrate for a liquid crystal display device. The method of claim 4, wherein And a plurality of common electrodes other than the common electrode overlapping the data line are formed of the same material as the pixel electrode. The method of claim 1, And a first pixel electrode connection line connecting one end of the plurality of pixel electrodes. The method of claim 6, And the first pixel electrode connection line partially overlaps the common line. The method of claim 7, wherein And a second pixel electrode connection line connecting the other end of the pixel electrode. The method of claim 1, And the common electrode, the pixel electrode, and the data line have a zigzag shape. Forming a common wiring extending in a first direction and a plurality of common electrodes extending in a second direction and having a zigzag shape, a gate wiring extending in the first direction, and a gate electrode on a substrate; Forming a gate insulating layer on the common wiring and the gate wiring; Forming a semiconductor layer on the gate insulating layer; Forming a data line extending in the second direction on the semiconductor layer to have a zigzag shape and overlapping with one of the plurality of common electrodes, and a source electrode and a drain electrode connected to the data line; Forming a passivation layer on the data line and the source and drain electrodes; Forming a plurality of pixel electrodes extending in a second direction on the passivation layer to have a zigzag shape and staggered with the common electrode; Method of manufacturing an array substrate for a horizontal field type liquid crystal display device comprising a. Forming a gate wiring extending in a first direction on the substrate and a gate electrode connected to the gate wiring; Forming a gate insulating film on the gate wiring; Forming a semiconductor layer on the gate insulating layer; Forming a data line extending in the second direction and having a zigzag shape on the semiconductor layer, and a source electrode and a drain electrode connected to the data line; Forming a passivation layer on the data line and the source and drain electrodes; A common electrode extending in the second direction and having a zigzag shape on the passivation layer, one of the electrodes being an opaque material, having a wider width than the data wire, and overlapping the data wire, and having a zigzag shape and staggered with the common electrode; Forming a plurality of pixel electrodes Method of manufacturing an array substrate for a horizontal field type liquid crystal display device comprising a.