KR200198418Y1 - 웨이퍼 척테이블의 이물제거장치 - Google Patents
웨이퍼 척테이블의 이물제거장치 Download PDFInfo
- Publication number
- KR200198418Y1 KR200198418Y1 KR2019950003311U KR19950003311U KR200198418Y1 KR 200198418 Y1 KR200198418 Y1 KR 200198418Y1 KR 2019950003311 U KR2019950003311 U KR 2019950003311U KR 19950003311 U KR19950003311 U KR 19950003311U KR 200198418 Y1 KR200198418 Y1 KR 200198418Y1
- Authority
- KR
- South Korea
- Prior art keywords
- foreign material
- material removal
- removal member
- roller
- chuck table
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0028—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by adhesive surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
Claims (2)
- 척테이블의 일측에 설치되어 롤상의 이물제거부재를 풀어내면서 공급하기 위한 이물제거부재 공급롤러와, 상기 이물제거부재 공급롤러와 이격된 위치에 설치되어 이물제거부재를 감아들여 회수하는 이물제거부재 회수롤러와, 상기 이물제거부재 공급롤러와 이물제거부재 회수롤러의 사이에 설치되어 이물제거부재를 반전시키며 상기 척테이블 상에서 좌우이동하는 이물제거부재 접착롤러와, 상기 이물제거부재 공급롤러와 이물제거부재 접착롤러의 사이에 설치되어 이물제거부재의 공급측 장력을 제어하는 공급장력 제어롤러와, 상기 이물제거부재 회수롤러와 이물제거부재 접착롤러의 사이에 설치되어 이물제거부재의 회수측 장력을 제어하는 회수장력 제어롤러를 포함하여 구성됨을 특징으로 하는 웨이퍼 척테이블의 이물제거장치.
- 제1항에 있어서, 상기 이물제거부재는 테이프임을 특징으로 하는 웨이퍼 척테이블의 이물제거장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950003311U KR200198418Y1 (ko) | 1995-02-27 | 1995-02-27 | 웨이퍼 척테이블의 이물제거장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950003311U KR200198418Y1 (ko) | 1995-02-27 | 1995-02-27 | 웨이퍼 척테이블의 이물제거장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960029732U KR960029732U (ko) | 1996-09-17 |
KR200198418Y1 true KR200198418Y1 (ko) | 2000-10-02 |
Family
ID=19408499
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019950003311U Expired - Lifetime KR200198418Y1 (ko) | 1995-02-27 | 1995-02-27 | 웨이퍼 척테이블의 이물제거장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR200198418Y1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180069388A (ko) * | 2016-12-15 | 2018-06-25 | 주식회사 엘지화학 | 전극 건조장치 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100417684B1 (ko) * | 2001-05-07 | 2004-02-11 | 아남반도체 주식회사 | 반도체 제조장비의 척 표면 이물질 제거장치 |
-
1995
- 1995-02-27 KR KR2019950003311U patent/KR200198418Y1/ko not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180069388A (ko) * | 2016-12-15 | 2018-06-25 | 주식회사 엘지화학 | 전극 건조장치 |
KR102208454B1 (ko) * | 2016-12-15 | 2021-01-27 | 주식회사 엘지화학 | 전극 건조장치 |
Also Published As
Publication number | Publication date |
---|---|
KR960029732U (ko) | 1996-09-17 |
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