KR20000021351A - Liquid crystal display - Google Patents
Liquid crystal display Download PDFInfo
- Publication number
- KR20000021351A KR20000021351A KR1019980040373A KR19980040373A KR20000021351A KR 20000021351 A KR20000021351 A KR 20000021351A KR 1019980040373 A KR1019980040373 A KR 1019980040373A KR 19980040373 A KR19980040373 A KR 19980040373A KR 20000021351 A KR20000021351 A KR 20000021351A
- Authority
- KR
- South Korea
- Prior art keywords
- bus lines
- gate bus
- pixel electrode
- unit pixel
- gate
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136204—Arrangements to prevent high voltage or static electricity failures
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
본 발명은 액정 표시 장치에 관한 것으로, 보다 구체적으로는 오정렬 발생시에도 킥백(kick-back) 전압의 급변을 방지할 수 있는 액정 표시 장치에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a liquid crystal display device which can prevent a sudden change in kick-back voltage even when misalignment occurs.
일반적으로, 액정 표시 장치는 도 1에서와 같이, 게이트 버스 라인(1)과 데이터 버스 라인(2)은 유리 기판(10)상에 교차 배열되어, 단위 화소 공간을 한정한다. 이때, 게이트 버스 라인(1)과 데이터 버스 라인(2) 사이에는 게이트 절연막(도시되지 않음)이 개재되어 있다. 게이트 버스 라인(1)은 단위 화소 공간 당 하나씩 돌출된 돌출부(1a)를 포함한다. 여기서, 돌출부(1a)는 박막 트랜지스터의 게이트 전극이 된다. 여기서, 본 도면에서는 스토리지 온 게이트 방식(storage on gate) 방식을 나타낸 것으로서, 스토리지 전극이 전단 게이트 버스 라인과 일체로 되어 있는 구조이다.In general, in the liquid crystal display, as shown in FIG. 1, the gate bus lines 1 and the data bus lines 2 are arranged on the glass substrate 10 to define a unit pixel space. At this time, a gate insulating film (not shown) is interposed between the gate bus line 1 and the data bus line 2. The gate bus line 1 includes protrusions 1a protruding one per unit pixel space. Here, the protrusion 1a becomes a gate electrode of the thin film transistor. Here, the storage on gate method is illustrated in this drawing, in which the storage electrode is integrated with the front gate bus line.
돌출부(1a) 즉, 게이트 전극(1a) 상부에는 채널층(도시되지 않음)이 배치된다.A channel layer (not shown) is disposed on the protrusion 1a, that is, the gate electrode 1a.
데이터 버스 라인(2)은 게이트 전극(1a)상의 채널층과 소정 부분과 오버랩될 수 있도록, 소정 부분 돌출되어 있으며, 이 부분이 박막 트랜지스터의 소오스 전극(2a)이 된다. 그리고, 소오스 전극(2a)과 대칭되는 부분에는 채널층과 오버랩되도록 드레인 전극(3)이 배치된다.The data bus line 2 protrudes a predetermined portion so as to overlap the predetermined portion with the channel layer on the gate electrode 1a, and this portion becomes the source electrode 2a of the thin film transistor. The drain electrode 3 is disposed at a portion symmetrical with the source electrode 2a so as to overlap the channel layer.
각각의 단위 화소 공간에는 화소 전극(4)이 각각 배치된다. 이때, 화소 전극(4)은 게이트 전극(1a)과 소정 부분 오버랩되는 드레인 전극(3)과 콘택된다. 여기서, 화소 전극(4)과 전단 게이트 버스 라인과 오버랩되어, 스토리지 캐패시턴스(Cst)를 형성한다. 여기서, 화소 전극(4)과 스토리지 전극(1b) 사이에는 게이트 절연막(도시되지 않음)이 개재되어 있다.Pixel electrodes 4 are disposed in respective unit pixel spaces. In this case, the pixel electrode 4 is in contact with the drain electrode 3 overlapping the gate electrode 1a by a predetermined portion. Here, the pixel electrode 4 overlaps the front gate bus line to form a storage capacitance Cst. Here, a gate insulating film (not shown) is interposed between the pixel electrode 4 and the storage electrode 1b.
일반적으로 액정 표시 장치의 화질 특성은 액정 표시 장치에서 형성되는 캐패시턴스들에 의하여 결정된다.In general, image quality characteristics of the liquid crystal display are determined by capacitances formed in the liquid crystal display.
즉, 화면에서 깜박거림과 같은 플리커 현상에 영향을 주는 킥백 전압(kick-back voltage:ΔVp)은 아래의 식 1과 같이, 캐패시턴스의 함수로 나타내어 진다.That is, the kick-back voltage (ΔVp) affecting the flicker phenomenon such as flickering on the screen is expressed as a function of capacitance, as shown in Equation 1 below.
ΔVp = ΔVgCgs/(Cst+CLC+Cgs)ΔVp = ΔVgCgs / (Cst + C LC + Cgs)
ΔVg: 게이트 전압의 변화분ΔVg: change in gate voltage
Cgs: 박막 트랜지스터에서 게이트 전극과 소오스 전극사이의 캐패시턴스Cgs: capacitance between gate electrode and source electrode in thin film transistor
Cst: 스토리지 캐패시턴스Cst: storage capacitance
CLC: 액정 캐패시턴스C LC : Liquid Crystal Capacitance
이러한 킥백 전압은 작은 값을 갖는 것이 바람직하고, 이 킥백 전압값이 증가되면, 플리커 현상이 발생된다.It is preferable that such kickback voltage has a small value, and if this kickback voltage value is increased, flicker occurs.
그러나, 액정 표시 장치를 제조하는데 있어서, 여러번의 샷 공정으로 인한 오정렬로, 샷과 샷 사이의 캐패시턴스가 변화될 수 있다. 특히, 전단 게이트 라인 방식을 이용한 액정 표시 장치의 경우, 화소 전극의 형성시, 약간의 오정렬이 발생되더라도, 전단 게이트 버스 라인과 오버랩되는 면적이 크게 변화되므로, 스토리지 캐패시턴스(Cst)의 변화가 크다.However, in manufacturing a liquid crystal display device, due to misalignment due to several shot processes, the capacitance between the shot and the shot may be changed. In particular, in the case of the liquid crystal display using the front gate line method, even when a slight misalignment occurs in the formation of the pixel electrode, the area overlapping with the front gate bus line is greatly changed, so the change in the storage capacitance Cst is large.
이와같이, 샷과 샷 사이에 캐패시턴스 차이가 발생되면, 샷 경계면에서 무라가 발생된다.As such, when a capacitance difference occurs between the shot and the shot, mura is generated at the shot boundary.
여기서, 도 1의 셀 1은 제 1 샷 공정으로 형성된 셀이고, 셀 2는 제 2 샷 공정으로 형성된 셀이다. 도면에서와 같이 셀1과 셀 2의 스토리지 캐패시턴스(Cst)가 차이가 나므로, 셀1과 셀2의 경계면에는 무라가 발생된다.Here, cell 1 of FIG. 1 is a cell formed by the first shot process, and cell 2 is a cell formed by the second shot process. As shown in the figure, since the storage capacitance Cst of the cell 1 and the cell 2 is different, mura occurs at the interface between the cell 1 and the cell 2.
따라서, 본 발명은 상기한 종래의 문제점을 해결하기 위한 것으로, 약간의 오정렬이 발생되더라도, 스토리지 캐패시턴스가 급변하는 것을 방지하여, 킥백 전압의 변동을 최소화시킬 수 있는 액정 표시 장치를 제공하는 것을 목적으로 한다.Accordingly, an object of the present invention is to provide a liquid crystal display device capable of minimizing a change in kickback voltage by preventing a sudden change in storage capacitance even when slight misalignment occurs. do.
도 1은 일반적인 액정 표시 장치의 평면도.1 is a plan view of a general liquid crystal display device.
도 2는 본 발명에 따른 액정 표시 장치의 평면도.2 is a plan view of a liquid crystal display device according to the present invention;
(도면의 주요 부분에 대한 부호의 설명)(Explanation of symbols for the main parts of the drawing)
11a,11b - 게이트 버스 라인 12a,12b - 데이터 버스 라인11a, 11b-gate bus lines 12a, 12b-data bus lines
15 - 화소 전극15-pixel electrode
상기한 본 발명의 목적을 달성하기 위하여, 본 발명의 일 견지에 따르면, 본 발명은 하부 기판상에 제 1 방향으로 배치된 수개의 게이트 버스 라인과, 상기 제 1 방향과 실질적으로 수직인 제 2 방향으로 배치되어 단위 화소 공간을 한정하는 수개의 데이터 버스 라인과, 상기 게이트 버스 라인과 데이터 버스 라인의 교차점 부근에 각각 배치되는 박막 트랜지스터과, 상기 게이트 버스 라인 및 데이터 버스 라인 사이를 절연시키는 게이트 절연막과, 상기 단위 화소 공간에 해당 박막 트랜지스터와 콘택되도록 형성되는 화소 전극을 포함하며, 상기 화소 전극은 단위 화소 공간의 해당 박막 트랜지스터를 선택하는 게이트 버스 라인 인접하게 배열되는 게이트 버스 라인과 오버랩되면서, 동일열 전단의 단위 화소 공간의 소정 부분까지 연장되도록 배치되며, 상기 동일열 전단 단위 화소 공간에 형성되는 화소 전극과는 소정거리를 두고 이격 배치되는 것을 특징으로 한다.In order to achieve the above object of the present invention, according to one aspect of the present invention, the present invention provides a plurality of gate bus lines arranged in a first direction on a lower substrate, and a second substantially perpendicular to the first direction. A plurality of data bus lines arranged in a direction to define a unit pixel space, thin film transistors disposed near intersections of the gate bus lines and the data bus lines, a gate insulating film insulated between the gate bus lines and the data bus lines; And a pixel electrode formed to contact the thin film transistor in the unit pixel space, wherein the pixel electrode is overlapped with a gate bus line arranged adjacent to a gate bus line for selecting the thin film transistor in the unit pixel space. It is arranged to extend to a predetermined portion of the unit pixel space of the front end, The pixel electrodes formed in the same column front end unit pixel space may be spaced apart from each other by a predetermined distance.
본 발명에 의하면, 화소 전극을 전단 게이트 버스 라인과 오버랩되면서, 동일열의 전단 단위 화소 공간에 배치되도록 형성한다. 이때, 동일열 전단 단위 화소 공간의 화소 전극과는 소정거리 이격되도록 형성한다.According to the present invention, the pixel electrodes are formed to overlap the front gate bus lines and to be arranged in the front unit pixel spaces in the same column. In this case, the pixel electrodes of the same column front end unit pixel space are formed to be spaced apart from each other by a predetermined distance.
이에따라, 약간의 오정렬이 발생되어도, 화소 전극과 전단 게이트 버스 라인과 오버랩되는 면적은 변화되지 않으므로, 킥백 전압이 거의 변화되지 않는다.Accordingly, even if some misalignment occurs, the area overlapping with the pixel electrode and the front gate bus line does not change, and therefore the kickback voltage hardly changes.
따라서, 샷무라가 발생되지 않는다.Therefore, shot mura does not occur.
(실시예)(Example)
이하 첨부한 도면에 의거하여 본 발명의 바람직한 실시예를 자세히 설명하도록 한다.Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.
첨부한 도면 도 2는 본 발명에 따른 액정 표시 장치의 평면도이다.2 is a plan view of the liquid crystal display according to the present invention.
먼저, 도 2에 도시된 바와 같이, 게이트 버스 라인(11a,11b)과 데이터 버스 라인(12a,12b)이 유리 기판(20)상에 교차 배열되어, 단위 화소 공간을 한정한다. 이때, 게이트 버스 라인(11a,11b)과 데이터 버스 라인(12a,12b)사이에는 게이트 절연막(도시되지 않음)이 개재되어 있다.First, as shown in FIG. 2, the gate bus lines 11a and 11b and the data bus lines 12a and 12b are alternately arranged on the glass substrate 20 to define a unit pixel space. At this time, a gate insulating film (not shown) is interposed between the gate bus lines 11a and 11b and the data bus lines 12a and 12b.
여기서, 영역 1은 제 1 샷 공정으로 형성되는 부분이고, 영역 2는 제 2 샷 공정으로 형성되는 부분이다.Here, region 1 is a portion formed by the first shot process, and region 2 is a portion formed by the second shot process.
게이트 버스 라인(11a,12b)과 데이터 버스 라인(12a,12b)의 교차점 부근에는 공지의 방식으로 박막 트랜지스터(TFT)가 구비되어 있다.The thin film transistor TFT is provided in a known manner near the intersection point of the gate bus lines 11a and 12b and the data bus lines 12a and 12b.
각각의 단위 화소 공간에는 해당 단위 화소 공간내에 형성된 박막 트랜지스터(TFT)와 접속되도록 화소 전극(15a,15b)이 배치된다. 이때, 예를들어, 화소 전극(15b)은 전단 게이트 버스 라인(11a)과 오버랩되면서 스토리지 캐패시턴스를 형성한다. 그러면서, 화소 전극(15b)은 동일열 전단의 단위화소 공간에 형성되는 화소 전극(15a)과는 소정 거리만큼 이격되도록 배치된다.In each unit pixel space, pixel electrodes 15a and 15b are disposed to be connected to the thin film transistor TFT formed in the corresponding unit pixel space. In this case, for example, the pixel electrode 15b overlaps the front gate bus line 11a to form a storage capacitance. In the meantime, the pixel electrodes 15b are arranged to be spaced apart from the pixel electrodes 15a formed in the unit pixel spaces of the same column front end by a predetermined distance.
그러면, 도면에서와 같이 영역 1과 영역 2 사이에 샷간 오정렬로 인하여, 화소 전극(15a,15b)이 오정렬되어, 화소 전극(15b)과 전단 게이트 버스 라인(11a)과 오버랩되는 면적은 변화되지 않는다. 따라서, 스토리지 캐패시턴스가 변화되지 않는다.Then, as shown in the drawing, due to the misalignment between shots between the region 1 and the region 2, the pixel electrodes 15a and 15b are misaligned, and the area overlapping the pixel electrode 15b and the front gate bus line 11a is not changed. . Thus, storage capacitance does not change.
이상에서 자세히 설명된 바와 같이, 본 발명에 의하면, 화소 전극을 전단 게이트 버스 라인과 오버랩되면서, 동일열의 전단 단위 화소 공간에 배치되도록 형성한다. 이때, 동일열 전단 단위 화소 공간의 화소 전극과는 소정거리 이격되도록 형성한다.As described in detail above, according to the present invention, the pixel electrode is formed to be disposed in the same unit of front end unit pixel space while overlapping the front end gate bus line. In this case, the pixel electrodes of the same column front end unit pixel space are formed to be spaced apart from each other by a predetermined distance.
이에따라, 약간의 오정렬이 발생되어도, 화소 전극과 전단 게이트 버스 라인과 오버랩되는 면적은 변화되지 않으므로, 킥백 전압이 거의 변화되지 않는다.Accordingly, even if some misalignment occurs, the area overlapping with the pixel electrode and the front gate bus line does not change, and therefore the kickback voltage hardly changes.
따라서, 샷무라가 발생되지 않는다.Therefore, shot mura does not occur.
기타, 본 발명은 그 요지를 일탈하지 않는 범위에서 다양하게 변경하여 실시할 수 있다.In addition, this invention can be implemented in various changes within the range which does not deviate from the summary.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019980040373A KR20000021351A (en) | 1998-09-28 | 1998-09-28 | Liquid crystal display |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019980040373A KR20000021351A (en) | 1998-09-28 | 1998-09-28 | Liquid crystal display |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20000021351A true KR20000021351A (en) | 2000-04-25 |
Family
ID=19552265
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019980040373A KR20000021351A (en) | 1998-09-28 | 1998-09-28 | Liquid crystal display |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR20000021351A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6797982B2 (en) | 2000-08-28 | 2004-09-28 | Sharp Kabushiki Kaisha | Active matrix substrate and display device |
KR102286887B1 (en) * | 2020-12-03 | 2021-08-06 | 주식회사 에코윈드 | Dehumidifier |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0527266A (en) * | 1990-11-09 | 1993-02-05 | Seiko Epson Corp | Active matrix substrate |
JPH09113930A (en) * | 1995-10-16 | 1997-05-02 | Sharp Corp | Active matrix type liquid crystal display device and method for correcting its disconnection |
JPH1073833A (en) * | 1996-09-02 | 1998-03-17 | Sharp Corp | Reflection type liquid crystal display device |
KR100260359B1 (en) * | 1997-04-18 | 2000-07-01 | 김영환 | Lcd and method for manufacturing the same |
-
1998
- 1998-09-28 KR KR1019980040373A patent/KR20000021351A/en not_active Application Discontinuation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0527266A (en) * | 1990-11-09 | 1993-02-05 | Seiko Epson Corp | Active matrix substrate |
JPH09113930A (en) * | 1995-10-16 | 1997-05-02 | Sharp Corp | Active matrix type liquid crystal display device and method for correcting its disconnection |
JPH1073833A (en) * | 1996-09-02 | 1998-03-17 | Sharp Corp | Reflection type liquid crystal display device |
KR100260359B1 (en) * | 1997-04-18 | 2000-07-01 | 김영환 | Lcd and method for manufacturing the same |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6797982B2 (en) | 2000-08-28 | 2004-09-28 | Sharp Kabushiki Kaisha | Active matrix substrate and display device |
KR100470890B1 (en) * | 2000-08-28 | 2005-03-08 | 샤프 가부시키가이샤 | Thin film transistor, active matrix substrate, method of making the substrate, and display device |
US7126157B2 (en) | 2000-08-28 | 2006-10-24 | Sharp Kabushiki Kaisha | Active matrix substrate, method of making the substrate, and display device |
US7459723B2 (en) | 2000-08-28 | 2008-12-02 | Sharp Kabushiki Kaisha | Active matrix substrate, method of making the substrate, and display device |
US7696516B2 (en) | 2000-08-28 | 2010-04-13 | Sharp Kabushiki Kaisha | Active matrix substrate, method of making the substrate, and display device |
US7829391B2 (en) | 2000-08-28 | 2010-11-09 | Sharp Kabushiki Kaisha | Active matrix substrate, method of making the substrate, and display device |
US8304297B2 (en) | 2000-08-28 | 2012-11-06 | Sharp Kabushiki Kaisha | Active matrix substrate, method of making the substrate, and display device |
KR102286887B1 (en) * | 2020-12-03 | 2021-08-06 | 주식회사 에코윈드 | Dehumidifier |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9995976B2 (en) | Array substrate and manufacturing method thereof, display panel and display device | |
KR100535531B1 (en) | Tft-lcd device | |
KR100336884B1 (en) | Thin Film Transistor Liquid Crystal Display Device | |
KR20000045309A (en) | Thin film transistor liquid crystal display element | |
US5654731A (en) | Shielded pixel structure for liquid crystal displays | |
KR100333179B1 (en) | Thin film transistor liquid crystal display device and manufacturing method thereof | |
KR20040017923A (en) | Tft-lcd panel | |
KR100531388B1 (en) | Display device | |
US6198516B1 (en) | LCD having TFT formed at an intersection of data and capacitor lines | |
JP2003066488A (en) | Liquid crystal display device | |
JPWO2009125532A1 (en) | Active matrix substrate and liquid crystal display device | |
KR100476623B1 (en) | LCD Display | |
KR19990003282A (en) | Planar drive type substrate for liquid crystal display | |
KR100493380B1 (en) | Method for manufacturing liquid crystal display device | |
US11537012B2 (en) | Substrate for display device and display device | |
KR20000021351A (en) | Liquid crystal display | |
KR20020002516A (en) | Method for forming gate electrode in liquid crystal display device | |
KR100569271B1 (en) | Thin film transistor liquid crystal display | |
KR100336885B1 (en) | Thin Film Transistor Liquid Crystal Display Device | |
KR20040022287A (en) | Horizontal electric field mode liquid crystal display device | |
KR19990056771A (en) | Liquid crystal display | |
KR100488925B1 (en) | Liquid crystal display | |
KR100542300B1 (en) | Liquid crystal display | |
KR200380682Y1 (en) | Tft-lcd device | |
KR100466393B1 (en) | Thin film transistor liquid crystal display |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
N231 | Notification of change of applicant | ||
N231 | Notification of change of applicant | ||
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |