KR102697703B1 - 원격 플라즈마 공급원을 위한 라디칼 출력 모니터 및 사용 방법 - Google Patents

원격 플라즈마 공급원을 위한 라디칼 출력 모니터 및 사용 방법 Download PDF

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KR102697703B1
KR102697703B1 KR1020217001013A KR20217001013A KR102697703B1 KR 102697703 B1 KR102697703 B1 KR 102697703B1 KR 1020217001013 A KR1020217001013 A KR 1020217001013A KR 20217001013 A KR20217001013 A KR 20217001013A KR 102697703 B1 KR102697703 B1 KR 102697703B1
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plasma source
passage
gas
plasma
temperature
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KR20210009428A (ko
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마이클 해리스
치우-잉 타이
아툴 굽타
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엠케이에스 인스트루먼츠 인코포레이티드
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32954—Electron temperature measurement
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0068—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature by thermal means

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
KR1020217001013A 2018-06-14 2019-06-12 원격 플라즈마 공급원을 위한 라디칼 출력 모니터 및 사용 방법 Active KR102697703B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862684820P 2018-06-14 2018-06-14
US62/684,820 2018-06-14
PCT/US2019/036796 WO2019241405A1 (en) 2018-06-14 2019-06-12 Radical output monitor for a remote plasma source and method of use

Publications (2)

Publication Number Publication Date
KR20210009428A KR20210009428A (ko) 2021-01-26
KR102697703B1 true KR102697703B1 (ko) 2024-08-23

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Country Status (8)

Country Link
US (1) US11114287B2 (enExample)
EP (1) EP3785494B8 (enExample)
JP (1) JP7301075B2 (enExample)
KR (1) KR102697703B1 (enExample)
CN (1) CN112335342B (enExample)
SG (1) SG11202011069RA (enExample)
TW (1) TWI809122B (enExample)
WO (1) WO2019241405A1 (enExample)

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PL3648554T3 (pl) 2017-06-27 2021-11-22 Canon Anelva Corporation Urządzenie do przetwarzania plazmowego
CN114666965B (zh) 2017-06-27 2025-08-01 佳能安内华股份有限公司 等离子体处理装置
EP4017223B1 (en) 2017-06-27 2025-10-15 Canon Anelva Corporation Plasma processing apparatus
EP3648550B1 (en) 2017-06-27 2021-06-02 Canon Anelva Corporation Plasma treatment device
PL3817517T3 (pl) * 2018-06-26 2024-10-28 Canon Anelva Corporation Urządzenie do obróbki plazmą, sposób obróbki plazmą, program oraz nośnik pamięci
CN115900990A (zh) * 2023-01-03 2023-04-04 大连理工大学 用于七通道级联弧等离子体源的温度监测系统
CN120264567B (zh) * 2025-04-29 2026-04-21 江苏神州半导体科技股份有限公司 一种远程等离子发生器
CN120870230A (zh) * 2025-09-24 2025-10-31 江苏神州半导体科技有限公司 一种远程等离子体源解离率监测装置及监测方法

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Also Published As

Publication number Publication date
TW202017074A (zh) 2020-05-01
EP3785494A4 (en) 2022-01-26
KR20210009428A (ko) 2021-01-26
US11114287B2 (en) 2021-09-07
US20190385829A1 (en) 2019-12-19
EP3785494B1 (en) 2026-02-18
EP3785494A1 (en) 2021-03-03
CN112335342A (zh) 2021-02-05
TWI809122B (zh) 2023-07-21
WO2019241405A1 (en) 2019-12-19
JP7301075B2 (ja) 2023-06-30
EP3785494B8 (en) 2026-04-01
SG11202011069RA (en) 2020-12-30
JP2021530076A (ja) 2021-11-04
CN112335342B (zh) 2023-07-14

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