KR102675832B1 - 네가티브형 감광성 수지 조성물, 이것을 사용한 경화막의 제조 방법 및 터치패널 - Google Patents

네가티브형 감광성 수지 조성물, 이것을 사용한 경화막의 제조 방법 및 터치패널 Download PDF

Info

Publication number
KR102675832B1
KR102675832B1 KR1020217023351A KR20217023351A KR102675832B1 KR 102675832 B1 KR102675832 B1 KR 102675832B1 KR 1020217023351 A KR1020217023351 A KR 1020217023351A KR 20217023351 A KR20217023351 A KR 20217023351A KR 102675832 B1 KR102675832 B1 KR 102675832B1
Authority
KR
South Korea
Prior art keywords
resin composition
photosensitive resin
negative photosensitive
cured film
group
Prior art date
Application number
KR1020217023351A
Other languages
English (en)
Korean (ko)
Other versions
KR20210135217A (ko
Inventor
유스케 후쿠자키
마사히데 세노오
Original Assignee
도레이 카부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도레이 카부시키가이샤 filed Critical 도레이 카부시키가이샤
Publication of KR20210135217A publication Critical patent/KR20210135217A/ko
Application granted granted Critical
Publication of KR102675832B1 publication Critical patent/KR102675832B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/068—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Human Computer Interaction (AREA)
  • Materials For Photolithography (AREA)
KR1020217023351A 2019-03-05 2020-03-02 네가티브형 감광성 수지 조성물, 이것을 사용한 경화막의 제조 방법 및 터치패널 KR102675832B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2019-039268 2019-03-05
JP2019039268 2019-03-05
PCT/JP2020/008738 WO2020179744A1 (ja) 2019-03-05 2020-03-02 ネガ型感光性樹脂組成物、それを用いた硬化膜の製造方法およびタッチパネル

Publications (2)

Publication Number Publication Date
KR20210135217A KR20210135217A (ko) 2021-11-12
KR102675832B1 true KR102675832B1 (ko) 2024-06-14

Family

ID=72338710

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020217023351A KR102675832B1 (ko) 2019-03-05 2020-03-02 네가티브형 감광성 수지 조성물, 이것을 사용한 경화막의 제조 방법 및 터치패널

Country Status (5)

Country Link
JP (1) JP7405075B2 (zh)
KR (1) KR102675832B1 (zh)
CN (1) CN113474730A (zh)
TW (1) TWI837317B (zh)
WO (1) WO2020179744A1 (zh)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017003995A (ja) 2015-06-15 2017-01-05 株式会社Ｄｎｐファインケミカル カラーフィルタ用色材分散液、カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、及び表示装置
JP2018146958A (ja) 2017-03-02 2018-09-20 東レ株式会社 ネガ型感光性樹脂組成物およびそれを用いた硬化膜

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007071497A1 (en) 2005-12-20 2007-06-28 Ciba Holding Inc. Oxime ester photoinitiators
WO2012159213A1 (en) 2011-05-25 2012-11-29 American Dye Source, Inc. Compounds with oxime ester and/or acyl groups
TWI612101B (zh) 2013-05-15 2018-01-21 Ｒａｓａ工業股份有限公司 絕緣材料用組成物
CN110941142B (zh) 2014-03-17 2021-05-25 旭化成株式会社 感光性树脂组合物、固化浮雕图案的制造方法、以及半导体装置
US20210198416A1 (en) 2015-12-25 2021-07-01 Toray Industries, Inc. Photosensitive resin composition, cured film, laminate, member for touch panel, and method for manufacturing cured film
JP6617201B2 (ja) * 2016-07-29 2019-12-11 富士フイルム株式会社 着色組成物、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置
WO2018105532A1 (ja) 2016-12-05 2018-06-14 旭化成株式会社 感光性樹脂組成物、感光性樹脂積層体、樹脂パターンの製造方法及び硬化膜パターン製造方法
CN110869847B (zh) * 2017-08-10 2024-03-08 Dnp精细化工股份有限公司 感光性着色树脂组合物及其固化物、滤色器和显示装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017003995A (ja) 2015-06-15 2017-01-05 株式会社Ｄｎｐファインケミカル カラーフィルタ用色材分散液、カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、及び表示装置
JP2018146958A (ja) 2017-03-02 2018-09-20 東レ株式会社 ネガ型感光性樹脂組成物およびそれを用いた硬化膜

Also Published As

Publication number Publication date
KR20210135217A (ko) 2021-11-12
TWI837317B (zh) 2024-04-01
TW202035471A (zh) 2020-10-01
JP7405075B2 (ja) 2023-12-26
JPWO2020179744A1 (zh) 2020-09-10
CN113474730A (zh) 2021-10-01
WO2020179744A1 (ja) 2020-09-10

Similar Documents

Publication Publication Date Title
US9651865B2 (en) Negative-type photosensitive coloring composition, cured film, light-shielding pattern for touch panel, and touch panel manufacturing method
JP5504689B2 (ja) ネガ型感光性樹脂組成物およびそれを用いたタッチパネル用材料
JP5765235B2 (ja) 感光性組成物、それから形成された硬化膜および硬化膜を有する素子
JP5459315B2 (ja) シランカップリング剤、ネガ型感光性樹脂組成物、硬化膜、およびタッチパネル用部材
JP5867083B2 (ja) ネガ型感光性樹脂組成物およびそれを用いた保護膜
CN105122137B (zh) 感光性树脂组合物、保护膜或绝缘膜、触摸面板及其制造方法
JP5327345B2 (ja) ネガ型感光性樹脂組成物、硬化膜、およびタッチパネル用部材。
WO2011129312A1 (ja) ネガ型感光性樹脂組成物、硬化膜、およびタッチパネル用部材
US20090191386A1 (en) Positive photosensitive polymer composition
JP2006045316A (ja) シルセスキオキサン含有化合物及びその製造方法
WO2017057616A1 (ja) ドライフィルムレジスト、回路配線の製造方法、回路配線、入力装置および表示装置
TWI712857B (zh) 感光性樹脂組成物、硬化膜、積層體、觸控面板用構件及硬化膜之製造方法
KR102675832B1 (ko) 네가티브형 감광성 수지 조성물, 이것을 사용한 경화막의 제조 방법 및 터치패널
JP2018120069A (ja) ネガ型感光性樹脂組成物、硬化膜およびタッチパネル部材
US20220350244A1 (en) Photosensitive resin composition, cured film, and display device
JP2022064302A (ja) ネガ型シロキサン樹脂組成物、硬化膜および素子
JP2020100819A (ja) 樹脂組成物、硬化膜およびその製造方法
TWI805927B (zh) 附有導電層之基板及觸控面板用構件
JP2023136705A (ja) 感光性樹脂組成物、硬化膜およびタッチパネル
JP2023137277A (ja) 感光性樹脂組成物および硬化膜
KR20240072125A (ko) 감광성 수지 조성물, 마이크로 렌즈

Legal Events

Date Code Title Description
E701 Decision to grant or registration of patent right
GRNT Written decision to grant