KR101998158B1 - Dual Head Plasma Device Providing Micro Current - Google Patents

Abstract

A dual head plasma device having a microcurrent supplying function according to the present invention comprises: a first head (10) including a first head electrode (11) to which high voltage for forming plasma is applied and which has at least a semispherical part, and a first dielectric layer (12) covering the semispherical part of the first head electrode (11); and a second head (20) including a second head electrode (21) to which high voltage for forming plasma is applied and which has a semispherical part, and a second dielectric layer (22) covering the semispherical part of the second head electrode (21). The first head (10) and the second head (20) are coupled to a housing (40) and separated in a neighboring position. Accordingly, a large amount of microcurrent can be supplied to the skin.

Description

Technical Field [0001] The present invention relates to a dual head plasma device having a micro current supplying function,

The present invention relates to a beauty device and a treatment device having a micro-current supply function, and also relates to a beauty device and a treatment device that generate plasma using the principle of dielectric barrier discharge.

The way to manage the skin beauty and pain by stimulating the body has been introduced in various types of products, and the low frequency and galvanic products have become the treatment or beauty device which can be easily purchased and used in the market.

The micro-bio current generated from the human body is no longer produced two days after the trauma or injury of the body, but the treatment (beauty) device has tens of micro amperes (μA) to several hundreds of micro Ampere (μA) of micro-current.

When the micro current is energized in the human body, it replenishes the body current in the human body, thereby increasing the amount of current in the injured tissue, thereby healing wounds in the injured area, alleviating the pain, And is known to affect metabolic changes and blood vessel changes.

On the other hand, plasma jets are widely used for sterilization and sterilization purposes. Plasma containing oxygen radicals has been used for tooth whitening, pathogen destruction, and blood coagulation. The major issues in the biomedical field of plasma are the miniaturization of the device, the ease of control, and the safety of the human body.

Among them, securing safety against electric shock is the most important problem to be directly applied to living cells and human body. In order to ensure safety, electrodes of high voltage should not come in direct contact with the sample and the human body. The driving voltage to which the electrodes are applied is set to a low level, and the plasma current is controlled to a small value, for example, about 1 to 2 mA, so that no electrical shock to the living body occurs. The minimum current that the human body can detect is about 1mA for adult men at 60Hz commercial frequency alternating current, 7 to 8mA for pain, and higher currents are electrically and thermally hazardous.

In a conventional plasma apparatus, a ground electrode is provided on one side (mainly a side surface) of a head and a device for generating plasma, and an AC voltage is applied between the head and the ground electrode. The electrode of the head is appropriately brought close to the skin of the treatment site, and a human body path is formed to [the ground electrode - the hand - arm - the shoulder - (the body of the user) - the skin of the treatment area].

However, such a plasma device and a microcurrent supply device are produced and sold as separate products, respectively. In this situation, the Applicant has studied to implement a single device having both a plasma generating function and a microcurrent supply. Implementing the above two functions in a single product has been subject to various trial and error due to various problems and obstacles that accompany it.

The plasma device and the microcurrent supply device have different electrical characteristics and requirements, and when one of the functions is focused, the performance of the other is unsatisfactory.

For example, if the function as the plasma device is focused, the microcurrent supply function is not satisfactory, and if the microcurrent supply function is focused, the plasma generation function is not satisfactory.

While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments.

Korean Registered Patent No. 10-1929360, registered on Dec. 10, 2018, "Skin beauty device incorporating skin diagnosis and treatment"

SUMMARY OF THE INVENTION An object of the present invention is to provide a plasma device having a microcurrent supply function capable of simultaneously realizing a microcurrent supply function and a plasma generation function in a single device, while satisfying performance in both functions.

A dual head plasma apparatus having a fine current supplying function according to an aspect of the present invention includes a first head electrode 11 to which a high voltage for plasma formation is applied and at least a hemispherical portion, And a first dielectric layer (12) surrounding the hemispherical portion of the first dielectric layer (12). And a second dielectric layer (22) surrounding the hemispherical portion of the second head electrode (21), the second head electrode (21) having at least a hemispherical portion to which a high voltage for plasma formation is applied, 2 head 20 and the first head 10 and the second head 20 are coupled to the housing 40 and are separated from each other at a position adjacent to each other.

The center axis of the first head 10 and the center axis of the second head 20 form an angle of 'V' shape with respect to the housing 40 ). ≪ / RTI >

In the dual head plasma apparatus having the micro-current supplying function, the head 41 of the housing 40 is provided with a first circular end 41a to which the first head 10 is coupled, The second circular end portions 41b to which the first and second circular end portions 41 and 41 are coupled.

In the dual head plasma apparatus having the fine current supplying function described above, the ground electrode 30 facing the user's hand may be formed at the position where the user's hand is gripped in the handle portion 41 of the housing 40 have.

In the dual head plasma apparatus having the fine current supplying function, the electrostatic capacitance between the first head electrode 11 and the skin is made smaller than the electrostatic capacitance between the ground electrode 30 and the hand, The electrostatic capacitance between the head electrode 21 and the skin can be made smaller than the electrostatic capacitance between the ground electrode 30 and the hand.

In the dual head plasma apparatus having the fine current supplying function, when the first output voltage (OUT1) applied to the first head electrode (11) is a peak, the first head electrode (11) The fine current flowing between the head electrodes 21 is larger than the fine current flowing between the first head electrode 11 and the ground electrode and the second output voltage OUT2 applied to the second head electrode 21 A fine current flowing between the second head electrode 21 and the first head electrode 21 may be larger than a fine current flowing between the second head electrode 11 and the ground electrode.

In the dual head plasma apparatus having the micro-current supplying function, the first output voltage OUT1 applied to the first head electrode 11 and the second output voltage V applied to the second head electrode 21 OUT2 may be high voltage of the AC type having the same or similar waveform and phase difference from each other.

In the dual head plasma apparatus having the micro-current supplying function, the first output voltage OUT1 applied to the first head electrode 11 and the second output voltage V applied to the second head electrode 21 OUT2 may have the same or similar waveforms and high alternating current voltage, and the peak of the first output voltage OUT1 and the peak of the second output voltage OUT2 may alternately appear.

In the dual head plasma apparatus having the fine current supplying function, a first high voltage generating unit (first high voltage generating unit) generating a first output voltage OUT1 controlled by the first control pulse and applying the first output voltage OUT1 to the first head electrode 11 61); And a second high voltage generator (62) for generating a second output voltage (OUT2) controlled by the second control pulse and applying the second output voltage (OUT2) to the second head electrode (21) The second control pulse may not become HIGH at the same time.

In the dual head plasma apparatus having the fine current supplying function, the first high voltage generating unit 60 includes a first high voltage generating unit 60 and a second high voltage generating unit 60. The first high voltage generating unit 60 includes a first high voltage generating unit 60, 1 switching driver (61); And a first transformer (T1) for boosting a voltage change between the fixed high voltage supply terminal and the first output node (N1) and outputting the voltage change to the first head electrode (11), and the second high voltage generating section ) Comprises: a second switching driver (71) for switching a connection between the second output node (N2) and the ground in accordance with the second control pulse; And a second transformer T2 boosting a voltage change between the fixed high voltage supply terminal and the second output node N2 and outputting the voltage to the second head electrode 21. [

A dual head plasma apparatus having the micro-current supplying function, comprising: a first capacitor (CL1) connected between the first output node (N1) and ground; And a second capacitor CL2 connected between the second output node N2 and ground.

In a dual head plasma apparatus having a fine current supplying function according to an aspect of the present invention, a high voltage generating unit (a transformer, a switching driver, etc.) is separately provided for the first head electrode and the second head electrode, It is possible to supply a larger amount of fine current to the skin while having a good plasma generating function.

The dual head plasma apparatus according to one aspect of the present invention can simultaneously realize the beauty function of the micro current effect and the beauty function by the skin stimulation of the plasma effect.

The plasma device according to an aspect of the present invention can reduce the cost by integrating the electrode of the micro current generator and the plasma electrode, and the two effects can be obtained by one operation. Particularly, the micro-current supplying function and the plasma generating function are simultaneously realized in a single device, but both of the functions are provided with satisfactory performance.

FIG. 1 is a view showing the appearance of a dual head plasma apparatus having a micro current supply function according to an embodiment of the present invention.
Fig. 2 is a view showing an electrode module including a first head 10 and a second head 20, and Figs. 2 (A) and 2 (B) are sectional views thereof.
3 is a circuit block diagram illustrating a high voltage generator in a plasma apparatus according to an embodiment of the present invention.
4 is a graph showing an example of an input voltage and an output voltage of a high voltage generating unit in a plasma apparatus according to an embodiment of the present invention.
5 is a circuit diagram modeling a human body part which can be interposed between the first head, the second head and the ground electrode in a state where the first head and the second head are in contact with the skin.

BRIEF DESCRIPTION OF THE DRAWINGS The above and other features and advantages of the present invention will become more apparent by describing in detail exemplary embodiments thereof with reference to the attached drawings in which: FIG. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. In order to clearly illustrate the present invention in the drawings, parts not related to the description are omitted, and similar names and reference numerals are used for similar parts throughout the specification.

FIG. 1 is a view showing the appearance of a dual head plasma apparatus (hereinafter simply referred to as a 'dual head plasma apparatus' or a 'plasma apparatus') having a micro current supply function according to an embodiment of the present invention. 1 (A) and 2 (B) are cross-sectional views of the electrode module including the first head 10 and the second head 20. FIG.

A plasma apparatus having a fine current supplying function according to an embodiment of the present invention includes an electrode module having a first head 10 and a second head 20, a housing 40, a power switch 51, a ground electrode 30, a power supply unit, a boost unit, and a control unit (not shown).

The housing 40 is largely composed of a head portion 41 and a handle portion 42. The head portion 41 is coupled to the first head 10 and the second head 20, Switches for operating the power switch 51 and the like, an LED for display, and a ground electrode 30 are formed in the light source 42. The first circular end portion 41a to which the first head 10 is coupled and the second circular end portion 41b to which the second head 20 is coupled are separately formed in the head portion 41 of the housing 40.

The housing 40 is coupled to the electrode module, the power switch 51, the ground electrode 30, and the like so as to be wholly or partially exposed. The power switch 51 is an input means for inputting a command for operating the plasma apparatus. The ground electrode 30 is formed on the handle portion 41 of the housing 40 and is formed to face the user's hand at a position where the user's hand using the plasma device is held, And is formed laterally on the left and right sides of the handle 51.

Although the housing 40 is described as two parts of the head 41 and the handle 42 for convenience, the housing 40 may be integrally formed or may be detachable along the longitudinal direction of the plasma apparatus, such as the front cover and the rear cover. The housing 40 may include a high voltage generating unit (see FIG. 3) 60 and 70, a power supply unit, a boosting unit, and a control unit (not shown).

The first head 10 and the second head 20 are coupled to the housing 40 and are separated from each other at a neighboring position. The central axis of the first head 10 and the central axis of the second head 20 are coupled to the housing 40 at an angle to each other in a V shape (see FIG. 1 (b)).

The first head 10 and the second head 20 may be configured so as to constitute an infrared (far-infrared) source therein and transmit infrared rays (far-infrared rays) from the inside to the outside.

The first head 10 includes a first head electrode 11 to which a high voltage for plasma formation is applied and at least a hemispherical portion and a first dielectric layer 12 surrounding the hemispherical portion of the first head electrode 11, And a first connecting rod (13) for providing an electrical path to the first head electrode (11).

The second head 20 includes a second head electrode 21 having a hemispherical portion to which a high voltage for plasma formation is applied, a second dielectric layer 22 surrounding the hemispherical portion of the second head electrode 21, And a second connecting rod (23) for providing an electrical path to the second head electrode (21).

The first connecting rod 13 transfers the output of the first high voltage generating part 60 to the first head electrode 11 and the first head electrode 11 (not shown) by using a screw (not shown) ) And the first dielectric layer 12 to the head portion 41 of the housing 40. [0035]

The second connecting rod 23 transfers the output of the second high voltage generator 70 to the second head electrode 21 and the second head electrode 21 (not shown) by using a screw And the second dielectric layer 22 to the head portion 41 of the housing 40 as shown in FIG.

The first dielectric layer 12 and the second dielectric layer 22 are preferably formed of a dielectric material formed by sintering and processing a material having a dielectric constant of 7 or more, but are preferably formed by sintering and processing zirconia. Zirconia is safe enough to be commonly used in human teeth and provides a comfortable feeling that metal or other injection materials do not have on contact with the skin.

The capacitance between the first head electrode 11 and the skin is set to be smaller than the capacitance between the ground electrode 30 and the hand while the thickness between the second head electrode 21 and the skin The capacitance between the ground electrode 30 and the hand is made smaller than the capacitance between the ground electrode 30 and the hand.

The thickness of the dielectric layer in contact with the skin is determined by the dielectric constant and the output strength of the AC voltage and is preferably between 0.8 mm and 5.0 mm.

Like the head electrodes 11 and 21, the dielectric layers 12 and 22 include hemispherical portions. When the plasma apparatus is used, some regions are in contact with the skin and some regions are not. In light pressure contact with the skin, the first dielectric layer 12 and the second dielectric layer 22 usually come into contact with the skin at different points (regions) of the skin, respectively. The part that comes into contact with the skin usually takes the form of a circle with a cross-sectional area.

A minute current flows in the skin 100 between the two circular contact areas to supply a certain range of gap between the dielectric layers 12 and 22 and the skin 100 (see 'B' in FIG. 2A) (See 'A' in FIG. 2 (B)).

The head electrodes 11 and 21 are formed on at least a part or all of the inner surfaces of the dielectric layers 12 and 22 and are formed by bonding a conductive material or a conductive material formed by a method such as molding to the dielectric layers 12 and 22 , And the dielectric layers 12 and 22 may be formed by coating the formed head electrodes 11 and 21.

It is preferable that the dielectric layers 12 and 22 are formed of zirconia and the head electrodes 11 and 21 for performing the function of the electrodes are formed inside the dielectric layer. And there is no problem that the dielectric layer is damaged due to external impact, scratch, or the like.

In the plasma apparatus according to the embodiment of the present invention, the electrode module is physically separated into two heads, and plasma is formed at the head even if only one head touches the skin. Further, a fine current flows between the first head 10 and the second head 20 and is supplied. Particularly, the hemispherical head is optimized for the bending shape of the face, which is useful for the treatment of a deeply bent part such as the under the head, the nose, the nose, etc., The twin head is also optimized for the treatment of the chin line.

FIG. 3 is a circuit block diagram showing a high voltage generating unit in a plasma apparatus according to an embodiment of the present invention. FIG. 4 is a graph showing an input voltage and an output voltage of a high voltage generating unit in the plasma apparatus according to an embodiment of the present invention to be.

The plasma apparatus according to an embodiment of the present invention may further include a power supply unit, a voltage booster unit, and a control unit, which are not shown. For example, the power supply unit may include a rechargeable battery, a charge / discharge circuit, And supplies the DC power supply to the fixed high voltage supply terminal (V _HIGH ) of the high voltage generating units (60, 70) by boosting the power supplied from the power supply unit to the high voltage. The control unit receives an operation command of the plasma apparatus from the power switch 51 and controls the high voltage generating units 60 and 70, the power supply unit, the voltage raising unit, and the like.

In particular, the control unit provides the control pulses PWM1 and PWM2, which are two pulse signals for controlling the output voltage output from the high voltage generating units 60 and 70, to the high voltage generating unit (see FIG. 4). The pulse signal uses a square wave that can control the duty ratio at the output voltage to each head electrode. The control pulses PWM1 and PWM2 are signals for pulse width modulation and have a system voltage provided by the power supply unit, for example, a voltage having a peak ( _Vcc ) such as 3.3V or 5V.

A ground is connected to the ground electrode 30 and the first output voltage OUT1 applied to the first head electrode 11 and the second output voltage OUT2 applied to the second head electrode 21 are the same or similar (D) waveform (see Fig. 4).

It is preferable that the peak of the first output voltage OUT1 and the peak of the second output voltage OUT2 appear alternately. For example, the second output voltage OUT1 may have a peak of the second output voltage OUT2, So that the peak of the output signal OUT2 is positioned.

This sets the relationship between the first control pulse PWM1 and the second control pulse PWM2 that are inputted to the high voltage generating units 60 and 70 otherwise. It is preferable that the high signal of the first control pulse PWM1 and the high signal of the second control pulse PWM2 appear alternately. For example, in the first control pulse PWM1, So that the high signal of the control pulse PWM2 is located.

The peak of the first output voltage OUT1 and the peak of the second output voltage OUT2 may be 2 to 8 KV and the fine current transmitted to the skin through the head electrode is determined by the controller, 600μA may be preferred and a frequency of 10-100 KHz may be preferred at high voltages in alternating current form.

The first high voltage generating unit 61 generates the first output voltage OUT1 controlled by the first control pulse PWM1 provided by the controller and applies the first output voltage OUT1 to the first head electrode 11, The controller 62 generates a second output voltage OUT2 controlled by the second control pulse PWM2 provided by the controller and applies the second output voltage OUT2 to the second head electrode 21. [ At this time, the first control pulse and the second control pulse do not become HIGH at the same time, and the HIGHs of the two control pulses appear alternately.

The first high voltage generating unit 60 includes a first switching driver 61, a first transformer T1, and a first capacitor CL1. The first capacitor CL1 is connected between the first output node N1 of the first switching driver 61 and ground. When the first switching driver 61 switches the connection between the first output node N1 and the ground in accordance with the first control pulse, the first switching driver 61 discharges the charge charged in the first capacitor CL1 to the ground, The first output node N1 is left open. The first transformer T1 _boosts the voltage change according to the voltage change between the fixed high-voltage supply terminal (V _HIGH ) and the first output node (N1) and outputs the voltage change to one head electrode (11).

The second high voltage generating unit 70 includes a second switching driver 71, a second transformer T2, and a second capacitor CL2. The second capacitor CL2 is connected between the second output node N2 of the second switching driver 71 and ground. The second switching driver 71 switches the connection between the second output node N2 and the ground in accordance with the second control pulse, and discharges the charge charged in the second capacitor CL2 to the ground, The second output node N2 is left open. The second transformer T2 _boosts the voltage change according to the voltage change between the fixed high voltage supply terminal (V _HIGH ) and the second output node (N2) and outputs the voltage change to the second head electrode (21).

Each of the switching drivers 61 and 71 may include a DC-DC converter and a power transistor. A pulse obtained by boosting the control pulses PWM1 and PWM2 by a DC-DC converter and a boosted pulse as a gating signal of the power transistor to drive the power transistor connected between the output nodes N1 and N2 and the ground have.

The voltage supplied from the battery of the power supply unit can be boosted to the two stages by the boost unit (not shown) and the transformers T1 and T2.

The operation of the dual head plasma apparatus according to one embodiment of the present invention will now be briefly described with reference to FIG. 5 and the preceding figures.

FIG. 5 includes a circuit modeling a human body part that can be interposed between the first head, the second head, and the ground electrode in a state in which the first head and the second head are in contact with the skin for the sake of understanding.

Capacitor C1 modeled the capacitance between the first head electrode and skin, capacitor C2 modeled the capacitance between the second head electrode and skin, and capacitor C3 modeled the capacitance between the ground electrode and the hand .

Resistors R1 and R2 are models of skin resistance located between the first and second heads, and resistor R3 is modeled to the resistance to the hand facing the position rotor ground electrode where they are in contact.

As the output voltages OUT1 and OUT2 are supplied, an electrostatic capacitance is formed between the dielectric layer and the skin at the skin portion that is in direct contact with the dielectric layers 12 and 22. The supplied high voltage of the AC type flows through the respective capacitors have.

A high voltage is applied between the first head electrode 11 and the skin layer or between the second head electrode 21 and the skin layer at a skin region where a gap of a certain range is generated between the skin 100 and the dielectric layers 12 and 22, Dielectric interactions cause dielectric barrier discharge and generate plasma (A).

In particular, even if one of the two heads is separated from the skin, for example, in order to perform the operation on the nose, the under head, or the under head, even if only one head is in contact with the skin, Not all skin contact is a prerequisite.

However, the present invention can provide a good micro current supply function by using two heads. In the plasma device according to an embodiment of the present invention, a weak current of less than 1,000 μA, preferably 10 to 600 μA is supplied, and a microcurrent flowing in an appropriate amount to the human body increases ATP (Adenosine Triphosphate) And promotes DNA synthesis and T-lymphocyte activity.

However, the conventional plasma apparatus has a very weak micro current supply function. The path of the human body located in the path between the head and the ground (ground electrode-hand-arm-shoulder- body-skin-head) is too long and the resistance R3 of these paths is too large to flow, + i23) is limited.

In the present invention, a high voltage generating unit (a transformer, a switching driver, etc.) is separately provided for the first head electrode and the second head electrode, and an output voltage having a phase difference is applied as shown in FIG. 4 . Accordingly, the fine current i12 flowing through the skin between the two heads becomes a larger amount than the amount through the ground electrode, so that the fine current supply function to the skin can be practically performed.

In the present invention, when the first output voltage OUT1 applied to the first head electrode 11 is a peak, a minute current flowing between the first head electrode 11 and the second head electrode 21 flows through the first head electrode 11, When the second output voltage OUT2 applied to the second head electrode 21 is a peak, the second head electrode 21 and the first head electrode 21 21 is much larger than the fine current flowing between the second head electrode 11 and the ground electrode.

The plasma apparatus according to an aspect of the present invention can simultaneously realize a cosmetic function of a micro current effect and a cosmetic function of a skin stimulation of a plasma effect, thereby providing a safe and quick effect. It also helps skin care treatments absorb the dermal layer through the epidermis.

The plasma device according to an aspect of the present invention can reduce the cost by integrating the electrode of the micro current generator and the plasma electrode, and the two effects can be obtained by one operation. Particularly, the micro-current supplying function and the plasma generating function are simultaneously realized in a single device, but both of the functions are provided with satisfactory performance.

10: first head 11: first head electrode
12: first dielectric layer 13: first connecting rod
20: second head 21: second head electrode
22: second dielectric layer 23: second connecting rod
30: ground electrode 40: housing
51: power switch 60: first high voltage generator
61: first switching driver 70: second high voltage generating part
71: Second switching driver

Claims (11)

delete delete delete delete A first head electrode (11) having a hemispherical portion to which a high voltage for plasma formation is applied, and a first dielectric layer (12) surrounding the hemispherical portion of the first head electrode (11) 1 head 10; And
(2) comprising a second head electrode (21) having a hemispherical portion to which a high voltage is applied for plasma formation, and a second dielectric layer (22) surrounding the hemispherical portion of the second head electrode And a head (20)
The first head 10 and the second head 20 are coupled to the housing 40 and are separated from each other at a neighboring position,
A ground electrode 30 is formed on the handle portion 41 of the housing 40 so as to face the user's hand at a position where the user's hand is gripped,
The electrostatic capacity between the first head electrode 11 and the skin is made smaller than the electrostatic capacity between the ground electrode 30 and the hand,
The capacitance between the second head electrode 21 and the skin is also made smaller than the capacitance between the ground electrode 30 and the hand,
Dual head plasma device with fine current supply capability. A first head electrode (11) having a hemispherical portion to which a high voltage for plasma formation is applied, and a first dielectric layer (12) surrounding the hemispherical portion of the first head electrode (11) 1 head 10; And
(2) comprising a second head electrode (21) having a hemispherical portion to which a high voltage is applied for plasma formation, and a second dielectric layer (22) surrounding the hemispherical portion of the second head electrode And a head (20)
The first head 10 and the second head 20 are coupled to the housing 40 and are separated from each other at a neighboring position,
A ground electrode 30 is formed on the handle portion 41 of the housing 40 so as to face the user's hand at a position where the user's hand is gripped,
When the first output voltage OUT1 applied to the first head electrode 11 is a peak, a minute current flowing between the first head electrode 11 and the second head electrode 21 flows to the first head electrode 11, Is larger than a minute current flowing between the electrode (11) and the ground electrode,
When the second output voltage (OUT2) applied to the second head electrode (21) is a peak, a minute current flowing between the second head electrode (21) and the first head electrode (21) Is larger than a minute current flowing between the electrode (11) and the ground electrode.
Dual head plasma device with fine current supply capability. A first head electrode (11) having a hemispherical portion to which a high voltage for plasma formation is applied, and a first dielectric layer (12) surrounding the hemispherical portion of the first head electrode (11) 1 head 10; And
(2) comprising a second head electrode (21) having a hemispherical portion to which a high voltage is applied for plasma formation, and a second dielectric layer (22) surrounding the hemispherical portion of the second head electrode And a head (20)
The first head 10 and the second head 20 are coupled to the housing 40 and are separated from each other at a neighboring position,
A ground electrode 30 is formed on the handle portion 41 of the housing 40 so as to face the user's hand at a position where the user's hand is gripped,
The first output voltage OUT1 applied to the first head electrode 11 and the second output voltage OUT2 applied to the second head electrode 21 are of the same or similar waveforms, Characterized in that the high-
Dual head plasma device with fine current supply capability. A first head electrode (11) having a hemispherical portion to which a high voltage for plasma formation is applied, and a first dielectric layer (12) surrounding the hemispherical portion of the first head electrode (11) 1 head 10; And
(2) comprising a second head electrode (21) having a hemispherical portion to which a high voltage is applied for plasma formation, and a second dielectric layer (22) surrounding the hemispherical portion of the second head electrode And a head (20)
The first head 10 and the second head 20 are coupled to the housing 40 and are separated from each other at a neighboring position,
A ground electrode 30 is formed on the handle portion 41 of the housing 40 so as to face the user's hand at a position where the user's hand is gripped,
The first output voltage OUT1 applied to the first head electrode 11 and the second output voltage OUT2 applied to the second head electrode 21 have the same or similar waveforms and have a high AC voltage,
Wherein a peak of the first output voltage (OUT1) and a peak of the second output voltage (OUT2) appear alternately.
Dual head plasma device with fine current supply capability. A first head electrode (11) having a hemispherical portion to which a high voltage for plasma formation is applied, and a first dielectric layer (12) surrounding the hemispherical portion of the first head electrode (11) 1 head 10; And
(2) comprising a second head electrode (21) having a hemispherical portion to which a high voltage is applied for plasma formation, and a second dielectric layer (22) surrounding the hemispherical portion of the second head electrode And a head (20)
The first head 10 and the second head 20 are coupled to the housing 40 and are separated from each other at a neighboring position,
A ground electrode 30 is formed on the handle portion 41 of the housing 40 so as to face the user's hand at a position where the user's hand is gripped,
A first high voltage generator 61 for generating a first output voltage OUT1 controlled by the first control pulse and applying the first output voltage OUT1 to the first head electrode 11; And
And a second high voltage generator (62) generating a second output voltage (OUT2) controlled by the second control pulse and applying the second output voltage (OUT2) to the second head electrode (21)
Wherein the first control pulse and the second control pulse do not become HIGH at the same time.
Dual head plasma device with fine current supply capability. The method of claim 9,
The first high voltage generating unit (60)
A first switching driver (61) for switching a connection between the first output node (N1) and the ground in accordance with the first control pulse; And
And a first transformer (T1) for boosting a voltage change between the fixed high voltage supply terminal and the first output node (N1) and outputting the voltage change to the first head electrode (11)
The second high voltage generating unit (70)
A second switching driver (71) for switching a connection between the second output node (N2) and the ground in accordance with the second control pulse; And
And a second transformer (T2) for boosting a voltage change between the fixed high voltage supply terminal and the second output node (N2) and outputting the voltage change to the second head electrode (21)
Dual head plasma device with fine current supply capability. The method of claim 10,
A first capacitor CL1 connected between the first output node N1 and ground; And
And a second capacitor (CL2) coupled between the second output node (N2) and ground,
Dual head plasma device with fine current supply capability.

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