KR101980236B1 - 착색 조성물, 컬러 필터, 표시 소자 및 안료 분산액 - Google Patents

착색 조성물, 컬러 필터, 표시 소자 및 안료 분산액 Download PDF

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Publication number
KR101980236B1
KR101980236B1 KR1020130029183A KR20130029183A KR101980236B1 KR 101980236 B1 KR101980236 B1 KR 101980236B1 KR 1020130029183 A KR1020130029183 A KR 1020130029183A KR 20130029183 A KR20130029183 A KR 20130029183A KR 101980236 B1 KR101980236 B1 KR 101980236B1
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KR
South Korea
Prior art keywords
group
pigment
meth
mass
copolymer
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KR1020130029183A
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English (en)
Korean (ko)
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KR20130110038A (ko
Inventor
쿄우이치로우 류우
코우지 이타노
쇼우 마츠모토
요시키 이마무라
히데노리 나루세
츠카사 도요시마
요시키 노노야마
Original Assignee
제이에스알 가부시끼가이샤
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Publication of KR20130110038A publication Critical patent/KR20130110038A/ko
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Publication of KR101980236B1 publication Critical patent/KR101980236B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • G03F7/2039—X-ray radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Optical Filters (AREA)
KR1020130029183A 2012-03-28 2013-03-19 착색 조성물, 컬러 필터, 표시 소자 및 안료 분산액 KR101980236B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2012074080 2012-03-28
JPJP-P-2012-074080 2012-03-28
JPJP-P-2012-094879 2012-04-18
JP2012094879 2012-04-18

Publications (2)

Publication Number Publication Date
KR20130110038A KR20130110038A (ko) 2013-10-08
KR101980236B1 true KR101980236B1 (ko) 2019-05-20

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130029183A KR101980236B1 (ko) 2012-03-28 2013-03-19 착색 조성물, 컬러 필터, 표시 소자 및 안료 분산액

Country Status (3)

Country Link
KR (1) KR101980236B1 (zh)
CN (1) CN103365081B (zh)
TW (1) TWI570193B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
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KR20170041708A (ko) * 2014-08-11 2017-04-17 제이에스알 가부시끼가이샤 착색 조성물, 착색 경화막 및 고체 촬상 소자

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EP3150643B1 (en) * 2014-05-30 2017-12-27 Wako Pure Chemical Industries, Ltd. Triphenylmethane-based colored composition
JP6733280B2 (ja) * 2015-04-28 2020-07-29 Jsr株式会社 着色剤分散液及びその製造方法、着色組成物及びその製造方法、着色硬化膜、表示素子並びに固体撮像素子
KR102363457B1 (ko) * 2015-12-29 2022-02-15 동우 화인켐 주식회사 착색 감광성 수지 조성물 및 이를 포함하는 컬럼 스페이서
JP6931575B2 (ja) * 2016-11-16 2021-09-08 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色組成物、着色硬化性樹脂組成物、カラーフィルタ及び液晶表示装置
EP3805820B1 (en) * 2018-05-31 2024-04-17 Toppan Printing Co., Ltd. Coloring composition and method for producing color filter for use in solid-state imaging element
CN110054741B (zh) * 2019-04-02 2020-10-30 深圳市华星光电技术有限公司 颜料分散液的制备方法

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JP2011090147A (ja) * 2009-10-22 2011-05-06 Toyo Ink Mfg Co Ltd カラーフィルタ用着色組成物およびカラーフィルタ
JP2011093856A (ja) 2009-10-30 2011-05-12 Fujifilm Corp 組成物、レジスト膜、パターン形成方法、及びインクジェット記録方法
JP2011202025A (ja) 2010-03-25 2011-10-13 Fujifilm Corp 固体分散液、着色感光性組成物、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、表示装置、並びに金属錯体化合物及びその互変異性体
JP2011252052A (ja) * 2010-06-01 2011-12-15 Dainichiseika Color & Chem Mfg Co Ltd 加工顔料の製造方法、加工顔料、および顔料分散体

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JPH0812292B2 (ja) 1989-07-20 1996-02-07 凸版印刷株式会社 耐熱性カラーフィルターおよびその製造方法
JPH0635188A (ja) 1992-07-15 1994-02-10 Nippon Kayaku Co Ltd カラーフィルター用光重合組成物及びカラーフィルター
JP3940523B2 (ja) 1999-04-27 2007-07-04 セイコーエプソン株式会社 インクジェット方式カラーフィルタ用樹脂組成物、カラーフィルタおよびカラーフィルタの製造方法
JP2007052147A (ja) * 2005-08-17 2007-03-01 Chisso Corp ポジ型感光性組成物およびそれを用いた表示素子
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JP5668539B2 (ja) * 2010-04-14 2015-02-12 Jsr株式会社 カラーフィルタ用着色組成物、カラーフィルタ及びカラー液晶表示素子
JP5625542B2 (ja) 2010-06-28 2014-11-19 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、およびカラーフィルタ

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011090147A (ja) * 2009-10-22 2011-05-06 Toyo Ink Mfg Co Ltd カラーフィルタ用着色組成物およびカラーフィルタ
JP2011093856A (ja) 2009-10-30 2011-05-12 Fujifilm Corp 組成物、レジスト膜、パターン形成方法、及びインクジェット記録方法
JP2011202025A (ja) 2010-03-25 2011-10-13 Fujifilm Corp 固体分散液、着色感光性組成物、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、表示装置、並びに金属錯体化合物及びその互変異性体
JP2011252052A (ja) * 2010-06-01 2011-12-15 Dainichiseika Color & Chem Mfg Co Ltd 加工顔料の製造方法、加工顔料、および顔料分散体

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170041708A (ko) * 2014-08-11 2017-04-17 제이에스알 가부시끼가이샤 착색 조성물, 착색 경화막 및 고체 촬상 소자
KR102480103B1 (ko) 2014-08-11 2022-12-21 제이에스알 가부시끼가이샤 착색 조성물, 착색 경화막 및 고체 촬상 소자

Also Published As

Publication number Publication date
TWI570193B (zh) 2017-02-11
TW201339252A (zh) 2013-10-01
CN103365081B (zh) 2018-06-15
CN103365081A (zh) 2013-10-23
KR20130110038A (ko) 2013-10-08

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