KR101897460B1 - Replaceable electron gun for electron microscope and electron microscope comprising the same - Google Patents
Replaceable electron gun for electron microscope and electron microscope comprising the same Download PDFInfo
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- KR101897460B1 KR101897460B1 KR1020160152501A KR20160152501A KR101897460B1 KR 101897460 B1 KR101897460 B1 KR 101897460B1 KR 1020160152501 A KR1020160152501 A KR 1020160152501A KR 20160152501 A KR20160152501 A KR 20160152501A KR 101897460 B1 KR101897460 B1 KR 101897460B1
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- South Korea
- Prior art keywords
- electron
- electron beam
- electron gun
- gun
- vacuum
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- 238000010894 electron beam technology Methods 0.000 claims abstract description 97
- 239000010409 thin film Substances 0.000 claims description 25
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 9
- 229910052721 tungsten Inorganic materials 0.000 claims description 9
- 239000010937 tungsten Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 6
- 229910052684 Cerium Inorganic materials 0.000 claims description 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical group N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 238000007789 sealing Methods 0.000 abstract description 6
- 230000003287 optical effect Effects 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000001493 electron microscopy Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- -1 (oxide) Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- DIVGJYVPMOCBKD-UHFFFAOYSA-N [V].[Zr] Chemical compound [V].[Zr] DIVGJYVPMOCBKD-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/028—Replacing parts of the gun; Relative adjustment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The present invention relates to an electron gun capable of maintaining a vacuum by sealing a vacuum exhaust line connection portion after vacuum evacuation and incorporating a getter into the electron gun, and an electron microscope including the vacuum electron gun, The electron gun can be easily removed from the electron beam column, the electron microscope can be constructed together with the electron beam optical system, or it can be used as a substitute for the electron gun of the conventional electron microscope, to be.
Description
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron gun and an electron microscope employing the same. More particularly, the present invention relates to an electron gun and a vacuum electron gun capable of maintaining vacuum and containing a getter in an electron gun by sealing a vacuum exhaust line connecting portion after vacuum evacuation, will be.
Scanning Electron Microscope (SEM) scans the electron beam two-dimensionally to the sample and detects secondary electrons from the sample and images it. It is composed of a light source, a converging lens, and an objective lens, and is similar to an optical microscope that produces an image using light reflected from a sample surface. An electron gun corresponding to a light source of an optical microscope serves to generate and accelerate electrons and supplies a group of electrons used in the form of electron beams.
Since electrons in an atom have a constant energy in a specific energy orbit due to the action of an electric force with an atomic nucleus, electrons rarely radiate out of the atom unless energy is externally applied. However, the energy barrier (work function) When energy is given, it will pop out. That is, when a metal such as tungsten used as the filament of the electron gun is heated to a high temperature, the electrons bound to the atoms on the surface are released from the bond of the nucleus and released into the vacuum.
The electron gun of the electron microscope can be divided into a thermionic electron gun and a field emission electron gun. Filaments used as cathodes in thermal emission are bent into a V-shaped hairpin with a tungsten line and a diameter of about 100 μm. Tungsten is used as a filament because its work function value is not as large as 4.5 eV and its melting point is very high at 3,650 K. It is heated to about 2,200 K by applying a direct current to the filament. In advanced electron microscopy, LaB 6 (lanthanium hexaboride) is used to increase the electron density generated and heated to 1800K. Since LaB 6 has a problem that the electron emission is remarkably lowered when the atom is adsorbed on the surface, high vacuum should be maintained. The electron gun is to be maintained inside the vacuum so that the flow of the electron beam is not disturbed by collision with the inner body, a scanning electron gun nations (thermionic electron gun), and is from about 10 -3 Pa requires a high vacuum of about 10 -5 Pa, a high-resolution electron The field emission electron gun, which emits a high density electron beam (high brightness) required for a microscope, operates at an ultrahigh vacuum of about 10 -6 Pa or less than a thermal electron gun. Among the field emission type electron gun, a cold field emission electron gun requires a vacuum degree of 10 -7 Pa or less.
The electron gun has a filament on the upper part, a Wehnelt cylinder around the filament, and an anode plate on the lower side serving as an accelerating electrode. In the Wehnelt cylinder, a voltage having a negative value is formed by a bias voltage that is more negative than a negative filament, whereby the electrons emitted from the filament are repulsively focused and focused. The electrons emitted from the filament are accelerated by the voltage difference between the cathode filament and the anode plate, and are emitted in a downward direction to form an electron beam.
The field emission electron gun consists of a negative electrode tip, a primary anode and a secondary anode. The point source is tapered to have a radius of curvature of about 600-2000 A so that when the strong electric field is applied, the thickness of the potential barrier is reduced so that electrons can easily protrude from the tungsten surface to the tunneling phenomenon . Since the electron beam of uniform energy is obtained from the point source of the field emission type electron gun, a very high electron beam brightness and a small intersection point can be formed and a high resolution can be obtained. The primary anode has a high voltage of several kV to emit electrons from the tip, and the secondary anode accelerates electrons. An acceleration voltage of several tens kV is applied between the secondary anode and the tip. The field emission type can be divided into a heat-free cold cathode field emitter (CFE), a thermally assisted field emitter (TFE), and a schottky field emitter (SE).
In a heat-radiated electron gun, a filament block and a bipolar plate including a filament and a Wehnelt cylinder are used. In a field emission type electron gun, a central axis of an electron beam emitted from an electron beam emitting portion including a point source and a primary anode, Should be aligned with the center axis of the focusing lens. When these axes are shifted from each other, not only the electron beam alignment problem but also the number of electrons reaching the sample is reduced, and aberration is generated in the magnetic field lens and the resolution of the sample observation is deteriorated. In the prior art, an electron gun and an electron beam path are integrated, and a vacuum pump and a vacuum exhaust line are connected together. Therefore, when the electron gun is exchanged or disassembled or assembled, a metal gasket for sealing is used, and the beam alignment process is also complicated.
U.S. Pat. No. 8,492,716 discloses a vacuum apparatus and a scanning electron microscope, which are related to an electron gun and a detector-integrated apparatus which are detachable from a magnetic lens barrel. However, the invention disclosed in the above patent is merely an electron gun connected to a vacuum pump and including a detector, which makes the electron beam travel path detachable from the electromagnetic lens structure.
SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned problems, and it is an object of the present invention to provide an electron gun capable of easily exchanging an electron gun, having a thin film electron beam exit, sealing a vacuum exhaust line connection after vacuum evacuation, An electron gun and a scanning electron microscope using the electron gun are provided.
The present invention relates to an electron gun for an electron microscope which can be exchanged, wherein the electron gun includes a tubular side portion including a getter for holding a vacuum in an inner space and having an exhaust pipe for vacuum exhausting; A top surface flat plate integrally or hermetically connected to the top of the tubular side surface portion; An electron beam generator positioned below the upper surface plate and emitting an electron beam; A feedthrough which passes through the top surface flat plate and is electrically connected at one end to the electron beam generating unit and at the other end to an external wiring unit; And a lower surface flat plate integrally or sealingly connected to the tubular side surface portion and having an electron beam passing thin film at a position facing the electron emitting direction of the electron beam generating portion, the vacuum exhausting tube being sealed after vacuum evacuation, An exchangeable electron gun for an electron microscope is provided.
The present invention also provides an electron gun for an electron microscope capable of being exchanged, wherein the electron gun includes a tubular side portion including a getter for maintaining vacuum in an inner space and having an exhaust pipe for vacuum exhaust; An upper surface side flat plate integrally or sealingly connected to the upper portion of the tubular side surface portion; A lower surface flat plate integrally or sealingly connected to the tubular side surface portion and having an electron beam passing thin film; An electron beam generator positioned above the bottom plate and emitting an electron beam to a position opposite to the electron beam passing thin film; And a feedthrough which passes through the lower surface flat plate and is electrically connected to the electron beam generating part at one end and connected to the external wiring part at the other end, and the exhaust pipe for vacuum exhaust is sealed after vacuum exhaust, An exchangeable electron gun for an electron microscope is provided.
Further, the present invention is characterized in that the electron beam generating portion is a heat radiating electron source in which the material is tungsten, LaB 6 (lanthanium hexaboride) or CeB 6 (Cerium hexaboride); A field emission electron source; Or a cold field emission electron source, and an electron gun for an exchangeable electron microscope.
The present invention also provides an electron gun for an exchangeable electron microscope, wherein the getter is located on the inner wall of the tubular side portion.
The present invention also provides an electron gun for an electron microscope capable of exchange, wherein the electron beam passing thin film is silicon nitride (Si 3 N 4 ) and the thickness is 20 to 200 nm.
The present invention also provides an exchangeable electron gun microscope electron gun, wherein the electron beam passing thin film is located at the center of the bottom portion.
The present invention is also an electron microscope having an exchangeable electron gun, wherein the electron microscope comprises the electron gun of claim 1; An electron beam tube bar having an incident hole on an upper surface of which an electron beam that has passed through the through thin film of the electron gun bottom surface is incident; A sample chamber into which an electron beam passing through the barrel is incident; A vacuum pump for evacuating the barrel and the sample chamber; And an interconnection portion connected to a feedthrough exposed in an upper surface of the electron gun, wherein the lower surface flat plate of the electron gun and the upper surface of the electron beam tube are fastened to each other through a fastening portion, and an electron microscope to provide.
The present invention is also an electron microscope having an exchangeable electron gun, wherein the electron microscope is the electron gun of claim 2; An electron beam tube bar having an incident hole on an upper surface of which an electron beam that has passed through the through thin film of the electron gun bottom surface is incident; A sample chamber into which an electron beam passing through the barrel is incident; A vacuum pump for evacuating the barrel and the sample chamber; And an interchangeable electron gun including a wiring portion connected to a feedthrough exposed in a bottom portion of the electron gun, the upper portion including a lower surface flat plate and the upper surface of the electron beam tube bar being fastened to each other through a fastening portion Electron microscope.
The present invention also provides an electron microscope having an exchangeable electron gun, wherein the fastening part is at least one of a concave-convex structure, a fastening rivet, a fastening screw, and a fastening member including a fastening ring.
The present invention relates to an electron microscope capable of easily separating an electron gun for an electron microscope from an electron beam column by sealing a vacuum exhaust line connection portion after vacuum evacuation and incorporating a getter inside the electron gun, Or it can be used as an electron gun replacement device of an existing electron microscope, which is economical.
1 is a conceptual view of an electron gun having an electron beam generating unit provided below a top surface flat plate according to an embodiment of the present invention.
FIG. 2 is a conceptual diagram of an electron gun having an electron beam generating unit provided on a lower surface of a lower plate according to an embodiment of the present invention.
3 (a) is a conceptual diagram of a state in which an electron gun provided in an electron beam generating portion below a top surface flat plate is separated.
3 (b) is a conceptual diagram of a state in which the electron gun provided above the sub-plate is separated from the electron beam generator.
4 is a conceptual view of an electron microscope having an electron gun provided below an upper surface flat plate of the electron beam generating unit.
5 is a conceptual diagram of an electron microscope having an electron gun provided on an upper surface of a lower surface of an electron beam generating unit.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. Prior to the detailed description of the present invention, terms and words used in the present specification and claims should not be construed as limited to ordinary or dictionary terms. Therefore, the embodiments described in this specification and the configurations shown in the drawings are merely the most preferred embodiments of the present invention and do not represent all the technical ideas of the present invention. Therefore, It is to be understood that equivalents and modifications are possible.
FIG. 1 is a conceptual view of an electron gun in which an electron
The electron gun includes a getter for holding a vacuum in an inner space and has a tubular
The
2 is a conceptual diagram of an electron gun provided with an electron
In another aspect, the present invention provides an electron gun for an electron microscope, wherein the electron gun includes a getter for holding a vacuum in an inner space, and includes a tubular
The
In one embodiment of the present invention, the electron
Also, in one embodiment of the present invention, the
FIG. 3 is a conceptual diagram of a state in which an electron gun is separated from an electron microscope according to an embodiment of the present invention. 3 (a) is a conceptual view of a state in which the electron gun provided at the lower side of the upper surface side
When the replaceable electron gun of the present invention is separated from the electron microscope, the
4 is a conceptual diagram of an electron microscope having an electron gun provided with an electron
In still another aspect, the present invention is an electron microscope having an exchangeable electron gun, wherein the electron microscope is the electron gun of claim 1; An electron beam column having an incident hole on an upper surface of which an electron beam passing through the passage thin film (50) of the electron gun bottom surface plate (80) is incident; A
The electron beam barrel includes a focusing
The rotary pump is generally used in a low vacuum in a laboratory. The rotary pump is a pump which is mainly used for a suction (A) compression (B, C) exhaust (D) by a stator, a rotator and a vane Lt; / RTI > When the pressure of the gas compressed by the vane and the rotor becomes high enough to open the discharge valve, the valve opens and the gas is discharged. The scroll pump has two fixed and rotating scrolls. When the orbiting scroll moves, a space is created in the inlet of the pump to suck the gas, and the gas is compressed and discharged as the rotor moves. In the turbo pump, momentum transfer occurs to molecules due to the rotation of the blades. At this time, the molecules are ejected in a desired direction and exhausted.
FIG. 5 is a conceptual diagram of an electron microscope having an electron gun provided above the lower surface
In still another aspect, the present invention is an electron microscope having an exchangeable electron gun, wherein the electron microscope is the electron gun of the second aspect; An electron beam column having an incident hole on an upper surface of which an electron beam passing through the passage thin film (50) of the electron gun bottom surface plate (80) is incident; A
The electron beam barrel includes a focusing
The lower surface of the electron gun and the upper surface of the electron beam barrel are fastened to each other through the fastening portion, and the fastening portion is at least one of a fastening structure including a concave-convex structure, a fixing rivet, a fastening screw and a fastening ring, Do.
The present invention can be easily replaced by disposing an electron gun for an electron microscope in an electron beam column and sealing the connection of the vacuum exhaust line after vacuum evacuation and keeping the vacuum by including the
While the present invention has been described in connection with what is presently considered to be the preferred embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, .
All technical terms used in the present invention are used in the sense that they are generally understood by those of ordinary skill in the relevant field of the present invention unless otherwise defined. The contents of all publications referred to herein are incorporated herein by reference.
10.
30.
50. electron beam passing
70. Top surface
90.
120.
140.
160. Sample
Claims (9)
The electron microscope includes a tubular side portion including a getter for maintaining vacuum in an inner space and having an evacuation pipe for vacuum evacuation; A top surface flat plate integrally or hermetically connected to the top of the tubular side surface portion; An electron beam generator positioned below the upper surface plate and emitting an electron beam; A feedthrough which passes through the top surface flat plate and is electrically connected at one end to the electron beam generating unit and at the other end to an external wiring unit; And a lower surface flat plate integrally or sealingly connected to the tubular side surface portion and having an electron beam passing thin film at a position opposite to the electron emitting direction of the electron beam generating portion, wherein the exhaust pipe for vacuum exhausting comprises: ;
An electron beam tube bar having an incident hole on an upper surface of which an electron beam that has passed through the through thin film of the electron gun bottom surface is incident;
A sample chamber into which an electron beam passing through the barrel is incident;
A vacuum pump for evacuating the barrel and the sample chamber; And
And a wiring portion connected to a feedthrough exposed in an upper surface of the electron gun,
Wherein the lower surface flat plate of the electron gun and the upper surface of the electron beam tube barrel are fastened to each other through a fastening portion,
An electron microscope having an exchangeable electron gun.
In the electron microscope, the electron gun may include a tubular side portion including a getter for maintaining vacuum in an inner space, and having an exhaust pipe for evacuation; An upper surface side flat plate integrally or sealingly connected to the upper portion of the tubular side surface portion; A lower surface flat plate integrally or sealingly connected to the tubular side surface portion and having an electron beam passing thin film; An electron beam generator positioned above the bottom plate and emitting an electron beam to a position opposite to the electron beam passing thin film; And a feedthrough having one end thereof electrically connected to the electron beam generating portion and the other end connected to an external wiring portion through the lower surface flat plate and the vacuum exhaust pipe is sealed after vacuum exhaust, Electron gun;
An electron beam tube bar having an incident hole on an upper surface of which an electron beam that has passed through the through thin film of the electron gun bottom surface is incident;
A sample chamber into which an electron beam passing through the barrel is incident;
A vacuum pump for evacuating the barrel and the sample chamber; And
And a wiring portion connected to a feedthrough exposed on the lower surface of the electron gun,
Wherein the lower surface flat plate of the electron gun and the upper surface of the electron beam tube barrel are fastened to each other through a fastening portion,
An electron microscope having an exchangeable electron gun.
Wherein the electron beam generating unit is a heat radiating electron source in which the material is tungsten, LaB 6 (lanthanium hexaboride), or CeB 6 (Cerium hexaboride);
A field emission electron source; or
Cold field emission electron causes,
An electron microscope having an exchangeable electron gun.
Wherein the getter is located on an inner wall of the tubular side portion,
An electron microscope having an exchangeable electron gun.
Wherein the electron beam passing thin film is silicon nitride (Si 3 N 4 ) and has a thickness of 20 to 200 nm,
An electron microscope having an exchangeable electron gun.
Wherein the electron beam passing thin film is positioned at the center of the lower surface portion,
An electron microscope having an exchangeable electron gun.
Wherein the fastening portion is at least one of a concave-convex structure, a fastening rivet, a fastening screw, and a fastening member including a fastening hook,
An electron microscope having an exchangeable electron gun.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020160152501A KR101897460B1 (en) | 2016-11-16 | 2016-11-16 | Replaceable electron gun for electron microscope and electron microscope comprising the same |
| PCT/KR2017/012981 WO2018093157A1 (en) | 2016-11-16 | 2017-11-16 | Exchangeable electron gun for electron microscope and electron microscope comprising same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020160152501A KR101897460B1 (en) | 2016-11-16 | 2016-11-16 | Replaceable electron gun for electron microscope and electron microscope comprising the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20180055097A KR20180055097A (en) | 2018-05-25 |
| KR101897460B1 true KR101897460B1 (en) | 2018-09-12 |
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| Application Number | Title | Priority Date | Filing Date |
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| KR1020160152501A KR101897460B1 (en) | 2016-11-16 | 2016-11-16 | Replaceable electron gun for electron microscope and electron microscope comprising the same |
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| Country | Link |
|---|---|
| KR (1) | KR101897460B1 (en) |
| WO (1) | WO2018093157A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20200141331A (en) | 2019-06-10 | 2020-12-18 | 한국원자력연구원 | Ultrafast electron microscope |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006294481A (en) * | 2005-04-13 | 2006-10-26 | Hitachi High-Technologies Corp | Charged particle beam device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN100583374C (en) * | 2004-09-01 | 2010-01-20 | 电子线技术院株式会社 | Portable electron microscope using micro-column |
| KR100994516B1 (en) * | 2006-02-02 | 2010-11-15 | 전자빔기술센터 주식회사 | Device for sustaining differential vacuum degrees for electron column |
| JP2012503856A (en) | 2008-09-28 | 2012-02-09 | ビー−ナノ リミテッド | Vacuumed device and scanning electron microscope |
| JP6302702B2 (en) * | 2014-02-27 | 2018-03-28 | 株式会社日立ハイテクノロジーズ | Scanning electron microscope and image generation method |
| KR101623949B1 (en) * | 2014-05-19 | 2016-05-25 | (주)코셈 | Compact Electron Microscope |
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2016
- 2016-11-16 KR KR1020160152501A patent/KR101897460B1/en active IP Right Grant
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006294481A (en) * | 2005-04-13 | 2006-10-26 | Hitachi High-Technologies Corp | Charged particle beam device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20200141331A (en) | 2019-06-10 | 2020-12-18 | 한국원자력연구원 | Ultrafast electron microscope |
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| Publication number | Publication date |
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| WO2018093157A1 (en) | 2018-05-24 |
| KR20180055097A (en) | 2018-05-25 |
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