KR101846051B1 - 계측 장치, 리소그래피 장치 및 물품 제조 방법 - Google Patents

계측 장치, 리소그래피 장치 및 물품 제조 방법 Download PDF

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Publication number
KR101846051B1
KR101846051B1 KR1020150089588A KR20150089588A KR101846051B1 KR 101846051 B1 KR101846051 B1 KR 101846051B1 KR 1020150089588 A KR1020150089588 A KR 1020150089588A KR 20150089588 A KR20150089588 A KR 20150089588A KR 101846051 B1 KR101846051 B1 KR 101846051B1
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KR
South Korea
Prior art keywords
stage
mark
substrate
imaging device
relative position
Prior art date
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Expired - Fee Related
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KR1020150089588A
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English (en)
Korean (ko)
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KR20160000866A (ko
Inventor
아키히토 하시모토
사토시 마루야마
Original Assignee
캐논 가부시끼가이샤
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Publication of KR20160000866A publication Critical patent/KR20160000866A/ko
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    • H01L21/0274—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • H01L21/67242—
    • H01L21/681—
    • H01L22/12—
    • H01L23/544—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7019—Calibration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020150089588A 2014-06-25 2015-06-24 계측 장치, 리소그래피 장치 및 물품 제조 방법 Expired - Fee Related KR101846051B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2014-130687 2014-06-25
JP2014130687A JP6422246B2 (ja) 2014-06-25 2014-06-25 計測装置、リソグラフィ装置、および物品の製造方法

Publications (2)

Publication Number Publication Date
KR20160000866A KR20160000866A (ko) 2016-01-05
KR101846051B1 true KR101846051B1 (ko) 2018-04-05

Family

ID=54930345

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150089588A Expired - Fee Related KR101846051B1 (ko) 2014-06-25 2015-06-24 계측 장치, 리소그래피 장치 및 물품 제조 방법

Country Status (4)

Country Link
US (1) US9733578B2 (https=)
JP (1) JP6422246B2 (https=)
KR (1) KR101846051B1 (https=)
CN (1) CN105319864B (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10008364B2 (en) * 2015-02-27 2018-06-26 Kla-Tencor Corporation Alignment of multi-beam patterning tool
JP2019015527A (ja) * 2017-07-04 2019-01-31 株式会社ミツトヨ 画像測定装置及びプログラム
JP6881188B2 (ja) * 2017-09-27 2021-06-02 オムロン株式会社 位置検出装置およびプログラム
KR102625260B1 (ko) * 2018-09-20 2024-01-16 삼성디스플레이 주식회사 마스크 기판 검사 시스템
JP2022117091A (ja) * 2021-01-29 2022-08-10 キヤノン株式会社 計測装置、リソグラフィ装置及び物品の製造方法
CN113128499B (zh) * 2021-03-23 2024-02-20 苏州华兴源创科技股份有限公司 视觉成像设备的震动测试方法、计算机设备及存储介质

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4780617A (en) 1984-08-09 1988-10-25 Nippon Kogaku K.K. Method for successive alignment of chip patterns on a substrate
US5745242A (en) 1994-10-28 1998-04-28 Canon Kabushiki Kaisha Position detecting system and exposure apparatus having the same
US20030053058A1 (en) 2001-09-17 2003-03-20 Canon Kabushiki Kaisha Alignment mark, alignment apparatus and method, exposure apparatus, and device manufacturing method
US20120050709A1 (en) * 2010-08-25 2012-03-01 Asml Netherlands B.V. Stage apparatus, lithographic apparatus and method of positioning an object table

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001066111A (ja) * 1999-08-26 2001-03-16 Nikon Corp 位置計測方法及び位置計測装置、並びに露光方法及び露光装置
JP2009206458A (ja) * 2008-02-29 2009-09-10 Canon Inc 検出装置、露光装置およびデバイス製造方法
CN102540735A (zh) 2010-12-08 2012-07-04 无锡华润上华科技有限公司 光刻版图形位置偏差检查方法
CN102566338B (zh) 2010-12-28 2013-11-13 上海微电子装备有限公司 光刻对准系统中对对准位置进行修正的方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4780617A (en) 1984-08-09 1988-10-25 Nippon Kogaku K.K. Method for successive alignment of chip patterns on a substrate
US5745242A (en) 1994-10-28 1998-04-28 Canon Kabushiki Kaisha Position detecting system and exposure apparatus having the same
US20030053058A1 (en) 2001-09-17 2003-03-20 Canon Kabushiki Kaisha Alignment mark, alignment apparatus and method, exposure apparatus, and device manufacturing method
US20120050709A1 (en) * 2010-08-25 2012-03-01 Asml Netherlands B.V. Stage apparatus, lithographic apparatus and method of positioning an object table

Also Published As

Publication number Publication date
CN105319864A (zh) 2016-02-10
US20150378265A1 (en) 2015-12-31
US9733578B2 (en) 2017-08-15
JP6422246B2 (ja) 2018-11-14
JP2016008924A (ja) 2016-01-18
KR20160000866A (ko) 2016-01-05
CN105319864B (zh) 2018-10-19

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