KR101693168B1 - Mobile apparatus, power transmission apparatus, exposure apparatus, and device manufacturing method - Google Patents

Mobile apparatus, power transmission apparatus, exposure apparatus, and device manufacturing method Download PDF

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Publication number
KR101693168B1
KR101693168B1 KR1020117029995A KR20117029995A KR101693168B1 KR 101693168 B1 KR101693168 B1 KR 101693168B1 KR 1020117029995 A KR1020117029995 A KR 1020117029995A KR 20117029995 A KR20117029995 A KR 20117029995A KR 101693168 B1 KR101693168 B1 KR 101693168B1
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South Korea
Prior art keywords
axis
moving body
moving
direction parallel
stage
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KR1020117029995A
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Korean (ko)
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KR20120041177A (en
Inventor
야스오 아오키
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가부시키가이샤 니콘
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Priority to JPJP-P-2009-118197 priority Critical
Priority to JPJP-P-2009-118199 priority
Priority to JP2009118202 priority
Priority to JP2009118203 priority
Priority to JPJP-P-2009-118203 priority
Priority to JPJP-P-2009-118202 priority
Priority to JP2009118197 priority
Priority to JP2009118199 priority
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Priority to PCT/JP2010/003284 priority patent/WO2010131485A1/en
Publication of KR20120041177A publication Critical patent/KR20120041177A/en
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    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274Photolithographic processes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/062Easels, stands or shelves, e.g. castor-shelves, supporting means on vehicles
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/707Chucks, e.g. chucking or un-chucking operations
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • G03F7/70725Stages control
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70758Drive means, e.g. actuator, motor
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682Mask-wafer alignment

Abstract

The sub stages 50 and 70 capable of moving in a long stroke in the scanning direction X axis direction are arranged on the + Y side and the -Y side of the main stage 40 holding the mask M, respectively. A voice coil motor consisting of a Y mover 44 including a magnet unit formed on the main stage 40 and a Y stator 88 including a coil unit formed on the sub stage 50 is used as the main stage 40 ) In the Y-axis direction which is the cross-scan direction with respect to the sub-stages 50 and 70. [ On the other hand, the main stage 40 is connected to each of the sub-stages 50, 70 in contact (or non-contact) state by using the lock devices 100a to 100d. The main stage 40 is moved in the X-axis direction only by driving the sub-stages 50 and 70.

Description

TECHNICAL FIELD [0001] The present invention relates to a mobile device, a power transmission device, an exposure device, and a device manufacturing method,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a moving object apparatus, a power transmission apparatus, an exposure apparatus, and a device manufacturing method, and more particularly to a moving object apparatus having a moving object moving along a predetermined two- A power transmission device used for power transmission, an exposure apparatus having the moving body, and a device manufacturing method using the exposure apparatus.

Conventionally, in a lithography process for manufacturing electronic devices (microdevices) such as liquid crystal display devices and semiconductor devices (integrated circuits, etc.), a mask or a reticle (hereinafter collectively referred to as a " mask ") and an object such as a glass plate or wafer Scan type scanning projection exposure system in which a pattern formed on a mask is transferred onto a substrate through a projection optical system while synchronously moving a substrate (hereinafter referred to as a substrate) (hereinafter referred to as a substrate) in a predetermined scanning direction (A so-called scanning stepper (also called a scanner)) is used.

It is known that this type of scanning exposure apparatus has a mask stage apparatus which moves in the scanning direction (scanning direction) while holding the mask, and a substrate stage apparatus which holds the substrate and moves in the scanning direction (for example, Patent Document 1). The mask stage apparatus included in the scanning type exposure apparatus described in Patent Document 1 is characterized in that the mask stage is driven by a long stroke in the scanning direction by a linear motor including a stator extending in the scanning direction and a mover fixed to the mask stage do. At this time, for example, in order to follow the substrate stage, the mask stage is slightly driven in a direction perpendicular to the scan direction (cross scan direction) within the horizontal plane in accordance with the scan direction.

However, in the mask stage apparatus described in Patent Document 1, when the mask stage is driven in the cross scan direction, the relative positions of the stator and the mover in the cross scan direction of the linear motor for driving the mask stage in the scan direction change, There is a possibility that the driving force in the direction of the vehicle is lowered. For this reason, it has been necessary to take countermeasures such as enlarging the size of the stator of the linear motor. In the mask stage apparatus described in Patent Document 1, the amount of movement of the mask stage in the cross scan direction is limited to a small amount. Therefore, a mask stage apparatus capable of driving the mask stage in the cross scan direction with a larger stroke has been desired.

In the mask stage apparatus described in Patent Document 1, in order to prevent transmission of vibration (disturbance) from the outside, a configuration in which the mask stage is lifted and supported on a predetermined guide member has been employed. In addition, the stator and the mover of the above-described linear motor are in a non-contact state. For this reason, in the conventional mask stage apparatus, there is no guide for guiding the mask stage in the moving plane, and it is difficult to guide the mask stage to a desired position, for example, at the time of starting the apparatus of the exposure apparatus. Further, for example, when the power supply to the stator of the linear motor is urgently stopped, the mask stage can not be stopped suddenly due to its inertia, and the probability that the mask stage continues to move on the guide member is high.

In the exposure apparatus described in Patent Document 1, a cable for supplying various kinds of power, for example, electric power, from the outside is connected to the mask stage device or the substrate stage device. Therefore, when the mask stage device or the substrate stage device moves, dust or vibration may occur due to sliding between the cable and a support member for supporting the cable horizontally.

Japanese Patent Application Laid-Open No. 2004-14915

According to a first aspect of the present invention, there is provided a mobile robot comprising: a first mobile body movable along a two-dimensional plane including a first axis and a second axis orthogonal to each other; A second moving body disposed on one side of the first moving body with respect to a direction parallel to the first axis and movable at a predetermined stroke in at least a direction parallel to the second axis; A third moving body disposed on the other side of the first moving body with respect to a direction parallel to the first axis and movable at least by a predetermined stroke in a direction parallel to the second axis; A first driving system for driving the second and third moving bodies together in a direction parallel to the second axis; And a state setting device for switching setting between a first state in which the first to third moving bodies can be integrally driven and a second state in which the first to third moving bodies can not be integrally driven, do.

According to this, when the first state is set by the state setting apparatus, when the second and third moving bodies are driven together by the first driving system in a direction parallel to the second axis, 3 moving integrally with the moving body in a direction parallel to the second axis. That is, the first to third moving bodies integrally move in a direction parallel to the second axis. Therefore, the first to third moving bodies can be driven in a direction parallel to the second axis by using the first driving system.

According to a second aspect of the present invention, there is provided a mobile terminal comprising: a first mobile body movable along a two-dimensional plane including first and second axes orthogonal to each other; A second moving body disposed on one side of the first moving body with respect to a direction parallel to the first axis and movable at a predetermined stroke in at least a direction parallel to the second axis; A third moving body disposed on the other side of the first moving body with respect to a direction parallel to the first axis and movable at least by a predetermined stroke in a direction parallel to the second axis; A first driving system for driving the second and third moving bodies together in a direction parallel to the second axis; A connecting device for connecting the first moving body to each of the second and third moving bodies in a non-contact state; A first position for restricting a relative movable range of the first moving body and the second and third moving bodies to a predetermined range and a second position for limiting a relative movement exceeding the predetermined range of the first moving body and the second and third moving bodies And a restricting device having a movable member movable between a first position and a second position in which the second movable body is movable in the second position.

According to this, when the second and third moving bodies are driven together by the first driving system in a direction parallel to the second axis, the first moving body connected by the connecting device is moved integrally with the second and third moving bodies, As shown in Fig. Here, when the movable member of the limiting device is located at the first position, since the relative movable range of the first movable body and the second movable body and the third movable body is limited to a predetermined range, even if the first drive system becomes uncontrollable, The first movable body is prevented from being separated from the second and third movable bodies beyond the relative movable range. On the other hand, when the movable member of the limiting device is located at the second position, the first moving body and the second and third moving bodies can be separated from each other.

According to a third aspect of the present invention, there is provided an exposure apparatus for transferring an image of an object through a pattern by an energy beam to transfer the pattern to the object, wherein one side of the pattern holding body having the pattern, Either of the first and second moving object apparatuses of the present invention held in the first and second moving object apparatuses; There is provided a first exposure apparatus comprising a pattern holding body and a holding device for holding the other of the object.

According to a fourth aspect of the present invention, there is provided an exposure apparatus for transferring an object to an object by exposing the object with an energy beam through a pattern, the apparatus comprising: a pattern holding body having the pattern; A main stage movable along a two-dimensional plane including a first axis and a second axis orthogonal to each other; A pair of sub-stages arranged at one side and the other side of the main stage with respect to a direction parallel to the first axis and movable at least in a direction parallel to the second axis; A first driving system for driving the pair of sub-stages in a direction parallel to the second axis; A state setting device for switching between a first state in which the main stage and the pair of sub stages are integrally driven and a second state in which the main stage and the pair of sub stages are integrally incapable of driving; There is provided a second exposure apparatus comprising a pattern holding body and a holding device for holding the other of the object.

According to this configuration, when the first state is set by the state setting apparatus, when the pair of sub-stages are driven together by the first driving system in the direction parallel to the second axis, the main stage is driven by the pair of sub- And moves integrally in a direction parallel to the second axis. That is, the main stage and the pair of sub-stages move integrally in a direction parallel to the second axis. Therefore, the main stage and the pair of sub-stages can be driven in a direction parallel to the second axis by using the first driving system.

According to a fifth aspect of the present invention, there is provided an exposure apparatus for transferring an object to an object by exposing the object with an energy beam through a pattern, the method comprising: holding one side of the pattern holding body having the pattern and the object, A main stage movable along a two-dimensional plane including a first axis and a second axis orthogonal to each other; A pair of sub-stages arranged at one side and the other side of the main stage with respect to a direction parallel to the first axis and movable at least in a direction parallel to the second axis; A first driving system for driving the pair of sub-stages in a direction parallel to the second axis; A coupling device for connecting the main stage to each of the pair of sub-stages in a non-contact state; A first position in which the main stage is brought into contact with each of the pair of sub stages to limit the relative movable range of the main stage and the pair of sub stages to a predetermined range, A restricting device having a movable member movable between a second position for permitting relative movement of the sub-stage exceeding the predetermined range; There is provided a third exposure apparatus including a pattern holding body and a holding device for holding the other of the object.

According to this structure, when the pair of sub-stages is driven in the direction parallel to the second axis by the first driving system, the main stage connected by the connecting device is integrally formed with the pair of sub-stages in a direction parallel to the second axis Move. Here, when the movable member of the limiting device is located at the first position, since the relative movable range of the main stage and the pair of sub-stages is limited to a predetermined range, even if the first driving system becomes uncontrollable, The main stage is prevented from being separated from the pair of sub-stages beyond the movable range. On the other hand, when the movable member of the limiting device is located at the second position, the main stage and the pair of sub-stages can be separated from each other.

According to the sixth aspect of the present invention, there is provided an exposure method for exposing an object placed on a second surface with an enlarged image of the pattern formed through a projection optical system having an enlargement ratio by irradiating an energy beam onto a pattern disposed on the first surface An apparatus comprising: a main stage which holds a patterned mask and is movable along a two-dimensional plane including a first axis and a second axis orthogonal to each other; A pair of sub-stages arranged on one side and the other side of the main stage with respect to a direction parallel to the first axis, the sub stages being integrally movable with the main stage; And a projection optical system having a plurality of enlargement magnifications in which projection areas of the pattern image are arranged at predetermined intervals with respect to a direction parallel to the first axis.

According to this, a pair of sub-stages arranged on one side and the other side of the main stage with respect to the direction parallel to the first axis are integrally movable with the main stage. Therefore, by appropriately moving the main stage integrally with the pair of sub stages in a predetermined stroke with respect to the direction parallel to the first axis, and using the projection optical system having a plurality of magnifications, It is possible to form the pattern formed on the mask on the object without unnecessary superposition and defect.

According to a seventh aspect of the present invention, there is provided a power transmission device for transmitting power between an external device and a moving body moving in a direction parallel to the first axis in a two-dimensional plane including first and second axes orthogonal to each other, A flexible member having one end connected to the moving body and the other end connected to the external device and having a long length to form the transmission path of the power; A first rotary member fixed to a first intermediate portion at the other end side in the longitudinal direction of the flexible member and capable of rotating at least in a predetermined range around a first axis parallel to the second axis; A second intermediate portion at one end in the longitudinal direction of the flexible member is fixed and is formed so as to be movable toward and away from the first rotating member by moving in a direction parallel to the first axis together with the moving member And a second rotatable member rotatable at least in a predetermined range around a second axis parallel to the second axis.

Here, the power means a certain energy, object, etc. (electric power, electric signal, pressurized gas, vacuum suction force, refrigerant, etc.) used in the moving body, and the transmission of power between the moving body and the external apparatus means that, (Supply of electric power, transmission / reception of electric signals, supply and recovery of refrigerant, etc.) between the devices. In this specification, the term power is used in this sense.

According to this, when the moving body moves in the direction parallel to the first axis, the second rotating body moves together with the moving body in the direction parallel to the first axis, and approaches and leaves the first rotating body. The flexible member having different intermediate portions fixed to each of the first and second rotary members may be bent or parallel to the first axis in accordance with the approaching and separating operation of the first and second rotary members, It is stretched in one direction. At this time, since the first and second rotary motion members are rotated, generation of dust or vibration caused by sliding of the flexible member and the first and second rotary motion members (or other members) is suppressed. Further, since each of the first and second rotary motion members is rotated, a large bending stress is prevented from acting on the flexible member.

According to an eighth aspect of the present invention, there is provided an exposure apparatus for transferring an object to an object by exposing the object with an energy beam through a pattern holding body having a predetermined pattern, the moving body comprising: A power transmitting device of the present invention for guiding in a direction parallel to one axis; And an object holding device holding the object and guiding the object in a direction parallel to the first axis.

According to a ninth aspect of the present invention, there is provided an exposure method comprising: exposing an object using any one of the first through fifth exposure apparatuses of the present invention; There is provided a device manufacturing method including developing the exposed object.

Here, by using a substrate for a flat panel display as a substrate, a manufacturing method for manufacturing a flat panel display as a device is provided. The substrate for a flat panel display includes a film-like member in addition to a glass substrate.

BRIEF DESCRIPTION OF DRAWINGS FIG. 1 is a view showing a schematic configuration of a liquid crystal exposure apparatus according to a first embodiment. FIG.
Fig. 2 is a plan view of the mask stage apparatus of the liquid crystal exposure apparatus of Fig. 1;
3 is a side view of the mask stage device viewed in the + X direction.
Figs. 4A and 4B are views showing states before and after movement when the main stage of the mask stage apparatus moves in the cross-scan direction, respectively. Fig.
Figs. 5A and 5B are views showing a state before and after a main stage is positioned by a pair of positioning devices, respectively. Fig.
6 is a plan view of the mask stage device according to the second embodiment.
7 is a cross-sectional view taken along line AA of the mask stage device of FIG.
8 is a view partially showing a schematic configuration of the liquid crystal exposure apparatus according to the first modification.
FIG. 9 is a perspective view showing a part of the mask stage apparatus according to the second modification. FIG.
10 is a plan view of the mask stage apparatus of the liquid crystal exposure apparatus of the third embodiment.
11 is a side view of the mask stage apparatus of FIG. 10 viewed in the + X direction.
12A and 12B are views showing a schematic configuration of a lock device and a stopper device. Fig. 12A shows a state in which a main stage and a sub-stage are connected by a lock device, Fig. 12B ) Indicates a state in which the connection is released.
Fig. 13 is a view showing a schematic configuration of a lock device and a stopper device provided at positions different from the lock device and the stopper device shown in Figs. 12 (A) and 12 (B).
14 is a view showing a schematic configuration of a lock device and a stopper device according to a modified example.
15 is a plan view of the mask stage apparatus of the liquid crystal exposure apparatus of the fourth embodiment.
Figs. 16A and 16B are views showing a state before and after a main stage is positioned by a pair of positioning apparatuses, respectively. Fig.
17A and 17B are views showing a schematic configuration of a locking device and a stopper device. Fig. 17A shows a state in which no connection is made by a locking device, Fig. And a state in which the main stage and the sub-stage are connected by the apparatus.
Fig. 18 is a view showing a schematic configuration of a lock device and a stopper device provided at positions different from the lock device and the stopper device shown in Figs. 17 (A) and 17 (B).
19 is a diagram showing a state in which the stopper device is released.
20 is a plan view of the mask stage apparatus according to the fifth embodiment.
Fig. 21 is a sectional view taken along the line BB of the mask stage device of Fig. 20;
22 is a diagram (No. 1) for explaining the operation of the mask loader apparatus of the mask stage apparatus according to the fifth embodiment;
Figs. 23A and 23B are views (No. 2 and No. 3) for explaining the operation of the mask loader apparatus of the mask stage apparatus according to the fifth embodiment.
24 is a plan view of the mask stage device according to the sixth embodiment.
Fig. 25 is a diagram (No. 1) for explaining the operation of the mask loader apparatus of the mask stage apparatus according to the sixth embodiment. Fig.
26A and 26B are views (No. 2 and No. 3) for explaining the operation of the mask loader apparatus according to the sixth embodiment.
FIG. 27 is a diagram (No. 4) for explaining the operation of the mask loader apparatus according to the sixth embodiment. FIG.
28 is a diagram showing a schematic configuration of a liquid crystal exposure apparatus according to the seventh embodiment.
29 is a side view of a cable unit included in the mask stage apparatus.
30 is a cross-sectional view taken along line CC of Fig. 29;
31 is a view for explaining the operation of the cable unit.
32 is a side view of the cable unit according to the eighth embodiment.
33 is a view for explaining the operation of the cable unit according to the eighth embodiment.
34 is a side view of the cable unit according to the ninth embodiment.
35 is a diagram for explaining the operation of the cable unit according to the ninth embodiment.
36 is a view showing a part of a cable unit according to a modification of the seventh embodiment.

&Quot; First embodiment "

Hereinafter, a first embodiment of the present invention will be described with reference to Figs. 1 to 5 (B).

Fig. 1 shows a schematic configuration of a liquid crystal exposure apparatus 10 according to the first embodiment. The liquid crystal exposure apparatus 10 is a step-and-scan type projection exposure apparatus, a so-called scanner.

1, the liquid crystal exposure apparatus 10 includes an illumination system IOP, a mask stage apparatus MST including a main stage 40 for holding a mask M, a projection optical system PL, A body BD on which the device MST and the projection optical system PL are mounted, a substrate stage device PST including a fine movement stage 21 for holding the substrate P movably along the XY plane, And the like. Hereinafter, the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system PL at the time of exposure is referred to as the X-axis direction, and the direction orthogonal to the direction in the horizontal plane (XY plane) Axis direction, the direction orthogonal to the X-axis direction and the Y-axis direction is the Z-axis direction, and the directions of rotation (inclination) around the X-axis, Y-axis, and Z-axis are the directions of? X,? Y, and? Z, respectively. This also applies to the second to ninth embodiments described later.

The illumination system (IOP) is constructed in the same manner as the illumination system disclosed in, for example, U.S. Patent No. 6,552,775. That is, the illumination system IOP is a system in which light emitted from a mercury lamp (not shown) is converted into illumination light (illumination light) IL for exposure through a reflector, a dichroic mirror, a shutter, a wavelength selection filter, And the mask M is irradiated. As the illumination light IL, light (or synthetic light of i line, g line, and h line) such as i line (wavelength 365 nm), g line (wavelength 436 nm), h line (wavelength 405 nm) Is used. In addition, the wavelength of the illumination light IL can be appropriately changed according to the required resolution by the wavelength selection filter. The light source is not limited to an ultra-high pressure mercury lamp, and for example, a pulse laser light source such as an excimer laser, a solid laser device, or the like may be used.

The mask stage apparatus MST includes a main stage 40 disposed above a barrel base plate 31 which is a part of a body BD to be described later and a main stage 40 arranged on one side (-Y side) of the main stage 40 in the Y- Substages 50 and 70 are arranged on the other side (+ Y side) in a state of being separated from the main stage 40 in a vibration state (in a noncontact state or a contact state in which vibration does not reach even if they are in contact with each other) Stage guides 37a and 37b for supporting the stages 50 and 70 on the floor surface F. [ The main stage 40 is supported on a pair of main stage guides 35 composed of a quadrangular columnar member whose longitudinal direction is the X axis direction integrally fixed to the upper surface of the barrel base plate 31 . A mask M in which a circuit pattern (hereinafter also referred to as a mask pattern as appropriate) or the like is formed on the pattern surface (lower surface in Fig. 1) is fixed to the main stage 40 by, for example, vacuum adsorption. Each of the sub-stages 50 and 70 is movable on the sub-stage guides 37a and 37b in a predetermined stroke in the X-axis direction (the direction perpendicular to the paper in Fig. 1). When the sub-stages 50 and 70 move in the X-axis direction, the main stage 40 is guided to move in the X-axis direction. Details of the mask stage device MST, including the main configuration of the main stage 40, the sub-stages 50 and 70, the sub-stage guides 37a and 37b, and the driving system, the measuring system, do.

The projection optical system PL is supported by the barrel base plate 31 below the mask stage device MST in Fig. The projection optical system PL of the present embodiment has the same configuration as the projection optical system disclosed in, for example, U.S. Patent No. 6,552,775. That is, the projection optical system PL includes a plurality of projection optical systems (also referred to as a multi-lens projection optical system) in which the projection areas of the pattern images of the mask M are arranged at predetermined intervals along the Y-axis direction, Functioning as a projection optical system having a single image field of a rectangular shape whose axial direction is the longitudinal direction. In the present embodiment, for each of a plurality of projection optical systems, for example, an erecting normal image is formed by a bilateral telecentric expanding system. Hereinafter, a plurality of projection areas arranged along the Y-axis direction are collectively referred to as an exposure area.

Therefore, when the illumination area on the mask M is illuminated by the illumination light IL from the illumination system IOP, a mask (not shown) which is arranged so that the first surface (object surface) of the projection optical system PL is substantially aligned with the pattern surface The projection image (partial shaping phase) of the circuit pattern of the mask M in the illumination area is projected through the projection optical system PL by the illumination light IL passing through the projection optical system PL (Exposure area) of the illumination light IL that is conjugate to the illumination area on the substrate P coated with the resist (sensitizer) on the surface, The mask M is relatively moved in the scanning direction (X-axis direction) with respect to the illumination area (illumination light IL) by the synchronous drive of the mask stage device MST and the substrate stage device PST, Scanning exposure of one shot area (partition area) on the substrate P is performed by relatively moving the substrate P in the scanning direction (X-axis direction) with respect to the exposure area (illumination light IL) The pattern of the mask M (mask pattern) is transferred. That is, in the present embodiment, the pattern of the mask M is generated on the substrate P by the illumination system IOP and the projection optical system PL, and the sensitive layer on the substrate P by the illumination light IL The pattern is formed on the substrate P by the exposure.

The body BD includes a substrate stage mount 33 and a pair of substrate stage mounts 33 fixed on the substrate stage mount 33, as disclosed in, for example, U.S. Patent Application Publication No. 2008/0030702 And a barrel support base 31 supported horizontally by a support member 32 of the barrel support 32. The substrate stage mount 33 is supported by a plurality of dustproof devices 34 provided on the floor surface F and is separated from the floor surface F in an oscillatory manner.

The substrate stage apparatus PST includes a base 12 fixed on the substrate stage mount 33, an X coarse movement stage 23X, and an X coarse movement stage 23X mounted on the X coarse movement stage 23X, A fine moving stage 21 disposed on the + Z side (upper side) of the Y coarse moving stage 23Y and a fine moving stage 21 disposed on the moving direction of the fine moving stage 21 on the basis of the weight of the fine moving stage 21 And a self-weight canceling device 26 for supporting the self-weight (self-weight).

The surface plate 12 is, for example, a rectangular plate-like member viewed from the plane formed by the stone (viewed from the + Z side), and the upper surface thereof is finished to have a very high level of flatness.

The X coarse movement stage 23X is made up of a rectangular plate-like (or rectangular parallelepiped) member in plan view, and has a Y-axis direction in the longitudinal direction at the center of a plane parallel to the XY plane, An opening (not shown) having a hole shape is formed. The X coarse movement stage 23X is mounted on a plurality of X linear guide members (not shown) suspended above the platen 12 and includes an X coarse stage driving system (not shown) including, for example, a linear motor, Axis direction on the plurality of X linear guide members.

The Y coarsening stage 23Y is made of a rectangular plate-shaped (or rectangular parallelepiped) member viewed from a plane having a smaller dimension in the Y axis direction than the X coarse movement stage 23X, and a Z axis (Not shown) extending in the direction indicated by the arrow. The Y coarsening stage 23Y is mounted on a plurality of Y linear guide members (not shown) fixed on the upper surface of the X coarse moving stage 23X and is mounted on a Y coarse stage driving system (not shown) including, for example, a linear motor Axis direction on the X coarse movement stage 23X. The drive system for driving the X coarse movement stage 23X and the Y coarse movement stage 23Y in the X axis direction and the Y axis direction may be, for example, a drive system using a feed screw or a belt drive system.

The fine movement stage 21 is a substantially square plate-shaped (or rectangular parallelepiped) member in plan view, and holds the substrate P on its upper surface via a substrate holder PH. The substrate holder PH has, for example, at least a part of a vacuum adsorption apparatus (or an electrostatic adsorption apparatus) not shown, and adsorbs and holds the substrate P on the upper surface thereof.

On the -Y side surface of the fine movement stage 21, a Y movable mirror (bar mirror) 22Y having a reflecting surface is fixed to the -Y side via the fixing member 24Y. Although not shown in FIG. 1, the same moving piece (hereinafter referred to as X moving piece) is fixed to the -X side surface of the fine moving stage 21. The position information in the XY plane of the fine movement stage 21 is obtained by the laser interferometer system 28 which irradiates the Y movable mirror 22Y and the X movable mirror with a spot beam and receives the reflected light, Nm in resolution. Actually, the laser interferometer system has an X-ray interferometer and a Y-laser interferometer corresponding to each of the Y movable mirror 22Y and the X movable mirror. In FIG. 1, the Y interferometer system is represented as a laser interferometer system 28 have.

The fine movement stage 21 includes a not shown stator (for example, a coil unit) fixed on the Y coarse movement stage 23Y, for example, a Y coarse movement stage 23Y, (X axis, Y axis, Z axis,? X,? Y, and? Z directions) by a fine moving stage driving system including a voice coil motor including a voice coil motor . Thereby, the substrate stage apparatus PST is capable of driving (coarsening) the substrate P with a long stroke in the X and Y axis directions and finely driving (fine moving) in the six degrees of freedom direction.

The dead weight canceling device 26 detects the dead weight of the table 12 including the fine movement stage 21 (specifically, the system including the fine movement stage 21, the substrate holder PH, and the substrate P) Which is a columnar member extending in the Z-axis direction to be supported on a support shaft (not shown). The dead weight canceling device 26 is inserted into the opening of the X coarse moving stage 23X and the opening of the Y coarse moving stage 23Y. The dead weight canceling device 26 is lifted and supported on the base 12 by a gas static pressure bearing (not shown), for example, an air bearing. The self-weight canceling device 26 is connected to the Y coarse movement stage 23Y via a not shown flexible device, and moves in the X-axis direction and the Y-axis direction integrally with the Y coarse movement stage 23Y. A leveling device 27 is disposed between the dead weight canceling device 26 and the fine motion stage 21. [ The fine movement stage 21 is supported in a tilt-free (rocking-free) state in the? X direction and the? Y direction with respect to the weightless weight canceling device 26 via the leveling device 27. Details of the configuration of the substrate stage device (PST) including the above-described self-weight cancellation device 26, leveling device 27, and flexor device and the like are described in, for example, International Publication No. 2008/129762 Japanese Patent Application Laid-Open No. 2010/0018950).

Here, the liquid crystal exposure apparatus 10 of the present embodiment is a liquid crystal exposure apparatus in which a plurality of projection images formed on a substrate P through a plurality of enlargement projection optical systems constituting the projection optical system PL are combined, (A part of the pattern) is generated on the substrate P, a plurality of points separated by a predetermined distance in the Y axis direction are illuminated to the illumination system IOP at the same time on the pattern surface of the mask M. [ That is, on the mask M, a plurality of illumination regions separated at predetermined intervals in the Y-axis direction are formed. On the pattern surface of the mask M, a plurality of strip-shaped (long rectangular) regions extending in the scanning direction (X-axis direction) are formed at predetermined intervals in the Y-axis direction. A plurality of strip-shaped regions are set in the Y-axis direction so as to be illuminated one by one by the illumination system IOP. A plurality of band-shaped regions are provided with a mask pattern for forming a specific pattern (hereinafter referred to as a pattern A) on the substrate P and a pattern different from the pattern A (Hereinafter referred to as mask pattern B) are alternately formed in the Y-axis direction (the illustration of each mask pattern is omitted).

Therefore, in the liquid crystal exposure apparatus 10 of the present embodiment, a plurality of strip-shaped regions having at least a part of the mask pattern for forming the pattern A on the substrate P are illuminated in the illumination system IOP The pattern A can be formed on the substrate P and the pattern B can be formed on the substrate P by executing the scanning exposure in the state in which the mask M is positioned with respect to the Y axis direction A scanning exposure is performed in a state in which the mask M is positioned with respect to the Y-axis direction so that the strip-shaped area having at least a part of the mask pattern for the pattern B ) Can be formed. Further, the mask M may have only one of the different patterns A and B.

In the mask stage apparatus MST of the present embodiment, in order to enable positioning of the mask M with respect to the Y-axis direction described above, the main stage 40 holding the mask M is defined as a Y- Direction (cross-scan direction) by a predetermined stroke. Hereinafter, the configuration of the mask stage device MST will be described. 2 is a plan view of the mask stage device MST. 3 is a side view of the mask stage apparatus MST viewed from the + X side.

As shown in Fig. 2, the main stage 40 has a body portion 41 which is a plate-like member parallel to the XY plane in which the Y-axis direction is the longitudinal direction. The main body portion 41 is formed by obliquely cutting each of the end portions (corner portions) on the + Y side and the + Y side and the end portions (corner portions) on the + Y side and the -X side of the rectangular plate- (Hexagonal shape). A rectangular opening 41a penetrating in the Z-axis direction is formed in the central portion of the body portion 41, and the mask M is accommodated in the opening 41a. The main body portion 41 includes a chuck unit (not shown) including a plurality of electrostatic chucks (or vacuum chucks or mechanical chucks) fixed on each of the + X side and the -X side wall surface 42). The mask (M) is held by the chuck unit (42). The opening 41a may have a stepped shape with a rectangular opening at its center, and the chuck unit 42 may be mounted on the inner peripheral portion of the stepped portion.

The main body portion 41 is supported from below by the -Y side main stage guide 35 on the -Y side portion from the opening 41a and the + Y side portion (region) from the opening portion 41a on the + Y side And is supported by the main stage guide 35 from below. Each of the pair of main stage guides 35 is formed of, for example, stone, and the upper surface thereof is finished to have a very high level of flatness. Two air bearings 43a and 43b and a positive Y bearing main stage guide 35 having a bearing surface opposite to the upper surface of the -Y side main stage guide 35 are provided on the lower surface of the main body portion 41, For example, an air bearing 43c, is mounted on the upper surface of the support shaft 35, which faces the bearing surface. The air bearings 43a and 43b are disposed apart from each other in the X-axis direction, and the three air bearings 43a to 43c are disposed at three points that are not on the same straight line. Each of the air bearings 43a, 43b and 43c ejects a high pressure (pressurized) gas (for example, air) supplied from a gas supply unit (not shown) on the upper surface of the opposed main stage guide 35, (41) floats on the pair of main stage guides (35). The number of the air bearings is not limited to this. For example, a plurality of (for example, two) air bearings may be arranged to face each of the pair of main stage guides 35, respectively.

As shown in Figs. 2 and 3, a concave portion 41b that is opened to the + Y side is formed in the center portion of the upper surface on the + Y side of the main body portion 41 and a concave portion 41b that is disposed apart from the bottom portion of the concave portion 41b in the Z axis direction A Y-movable member 44 composed of a pair of plate members is fixed via a fixing member 44a. The pair of plate members constituting the Y mover 44 has a magnet unit (not shown) including a plurality of magnets on each of a pair of opposing surfaces facing each other. The X movable members 45 and 46 having a U-shaped cross section are provided on the + Y side lower surface (that is, the lower side of the Y movable member 44) and the -Y side upper surface central portion of the body portion 41, Shaped fixing members 45a and 46a. Each of the X movable members 45 and 46 has a magnet unit (not shown) including a plurality of magnets on each of a pair of opposed surfaces opposed to each other.

2, a pair of X movable mirrors (bar mirrors) 48x are fixed on the -X side surface of the main body portion 41 so as to face each reflection surface in a direction substantially perpendicular to the X axis have. The position information about the X axis direction (and the z direction) of the main stage 40 is obtained by a pair of X laser interferometers (Xx, Xz) for irradiating each of the pair of X moving mirrors 48x with a spot length beam Lx parallel to the X axis 98x), for example, with a resolution of about 0.5 to 1 nm.

3, a Y movable mirror (bar mirror) 48y whose X axis direction is the longitudinal direction is provided on the -Y side surface of the main body portion 41 with its reflection surface in a direction substantially perpendicular to the Y axis As shown in Fig. The laser interferometer system together with the pair of X-ray interferometers 98x described above is constituted by the barrel support base 31 and the Y interferometer system And a laser interferometer 98y is fixed. The position information about the Y axis direction of the main stage 40 is always measured by the Y laser interferometer 98y with a resolution of about 0.5 to 1 nm, for example. The reflecting surfaces of each of the pair of X moving axes 48x and the Y moving axes 48y are arranged such that the center in the Z axis direction of each of them is an XY plane substantially equal to the lower surface (pattern surface) of the mask M Quot;). That is, each of the X-ray laser interferometer 98x and the Y-ray interferometer 98y irradiates the moving beams 48a to 48c with the measurement beams Lx and Ly on the measurement reference plane, In the XY plane on the measurement reference plane without so-called Abbe error.

The sub-stages 50 and 70 are mounted on the sub-stage guides 37a and 37b, respectively, as shown in Fig. The sub-stage guide 37a is disposed on the -Y side of the body BD and the sub-stage guide 37b is positioned on the + Y side of the body BD and on the floor surface F in a state of being separated from the body BD. Is installed. The sub-stage guide 37a includes a guide portion 38a (see Fig. 2) which is a plate-like member parallel to the XY plane in the X axis direction and a guide portion 38a which supports the guide portion 38a on the floor surface F A plurality of, for example, four leg portions 39a (two leg portions 39a on the -X side in Fig. 1 are covered inside the ground). The sub-stage guide 37b also has a guide portion 38b having the same configuration and a plurality of leg portions 39b. However, the guide portion 38a of the sub-stage guide 37a is disposed at a position (+ Z side) higher than the guide portion 38b of the sub-stage guide 37b (39b).

Stages 39a and 39b of the sub-stage guides 37a and 37b are respectively provided with support members 36a and 36b for supporting the cable chains 89a and 89b (also referred to as cable carriers and cable bearers) , 36b are fixed. The cable chain 89a is connected to the sub-stage 50 (or to the main stage 40 via the sub-stage 50) and the cable chain 89b to the sub-stage 70 (or through the sub- (For example, a vacuum suction force, a pressurized gas, a cooling liquid, and the like) for supplying electric power to each of them.

As shown in Fig. 2, a pair of X linear guides 51 are fixed on the upper surface of the guide portion 38a. The pair of X linear guides 51 are arranged at predetermined intervals in the Y-axis direction with the X-axis direction being the longitudinal direction. A magnet unit 52 including a plurality of magnets arranged along the X-axis direction is fixed between the pair of X linear guides 51 on the upper surface of the guide portion 38a. On the -Y side surface of the guide portion 38a, an X scale 53 composed of a plate member parallel to the XZ plane in which the X axis direction is the longitudinal direction is fixed. On the surface of the X-scale 53, a one-dimensional grating in which the X-axis direction is the periodic direction is formed. The guide portion 38b has the same configuration as the guide portion 38a. That is, a pair of X linear guides 71 and a magnet unit 72 are fixed on the upper surface of the guide portion 38b, and an X scale 73 is fixed on the -Y side surface of the guide portion 38b have.

3, the sub-stage 50 includes an X stage 54 movable on the guide portion 38a of the sub-stage guide 37a in the X-axis direction, And a Y stage 55 which is movable in the Y-axis direction on the X stage 54.

The X stage 54 is formed of a rectangular plate-like member in a plan view in the X-axis direction as a longitudinal direction (see Fig. 2), and four rolling bearings (not shown) (In Fig. 3, only two of the + X side are shown and two of the -X side are covered inside the drawing). The two sliders 56 on the + Y side are engaged with the + Y side X linear guide 51 and the two sliders 56 on the -Y side are slidably engaged with the -Y side X linear guide 51 . A coil unit 57 including a coil is fixed to the lower center portion of the X stage 54 so as to face the magnet unit 52. The coil unit 57 constitutes an X linear motor for driving the X stage 54 together with the magnet unit 52 on the pair of X linear guides 51 in the X axis direction. The magnitude and direction of the current supplied to the coils constituting the coil unit 57 are controlled by a not shown main controller.

2 and 3, on the -X side and -Y side of the lower surface of the X stage 54, together with the above-described X scale 53, positional information on the X axis direction of the X stage 54 The X head 58 constituting the X linear encoder system is fixed via a predetermined fixing member. The measurement value of the X head 58 is supplied to a main controller which is not shown and the main controller controls the X linear motor based on the measurement value of the X head 58 to measure the X- Control the position.

A coil unit 60 including a coil is fixed to the center of the upper surface of the X stage 54 as shown in Fig. The magnitude and direction of the current supplied to the coils constituting the coil unit 60 are controlled by a not shown main controller. A slider 61 having a U-shaped cross section including a rolling bearing (not shown) (for example, a ball, a roller, etc.) is fixed in the vicinity of the four corners of the upper surface of the X stage 54 Only two of the + X sides are shown, and two of the -X sides are hidden inside the drawing).

The Y stage 55 is made up of a rectangular plate-like member having a longitudinal direction in the X-axis direction as viewed from the plane (see Fig. 2), and a magnet unit (62) is fixed. The magnet unit 62 together with the coil unit 60 constitutes a Y linear motor which drives the Y stage 55 in the Y axis direction. The Y linear motor may be a moving coil system in which the arrangement relationship of the coil unit and the magnet unit is opposite to that in the above case (moving magnet system).

A Y linear guide 63 is fixed on the + X side and the -X side of the magnet unit 62 on the lower surface of the Y stage 55 in the Y axis direction as a longitudinal direction Y linear guide is hidden inside the drawing). Each of the pair of Y linear guides 63 is engaged with the slider 61 fixed on the upper surface of the X stage 54 so as to be slidable and the Y axis of the Y stage 55 on the X stage 54 The movement of the Y stage 55 in the X axis direction on the X stage 54 is restricted while guiding the linear movement in the X axis direction. The arrangement relationship of the Y linear guide and the slider may be reversed from the above-described case.

On the + X side surface of the Y stage 55, as shown in Fig. 2, a Y scale 64 composed of a plate member parallel to the YZ plane whose longitudinal direction is the Y axis direction is fixed. On the surface of the Y scale 64, a one-dimensional grating in which the Y axis direction is a periodic direction is formed. A Y linear encoder system for measuring positional information about the Y-axis direction of the Y-stage 55 together with the Y-scale 64 is formed at the + X side central portion of the upper surface of the X- The Y head 59 is fixed via a predetermined fixing member. The measurement value of the Y head 59 is supplied to a main controller which is not shown and the main controller controls the Y linear motor on the basis of the measurement value of the Y head 59, Control the position. 1 and Fig. 3, the Y head 59 and the Y scale 64 are not shown in order to avoid confusion in the drawings.

The X stator 65 is fixed to the + Y side central portion of the upper surface of the Y stage 55 via an L-shaped mounting member 65a (see Fig. 3) having an end face. The X stator 65 has a coil unit (not shown) including a plurality of coils. When the sub-stage 50 moves in the X axis direction, the X stator 46 fixed to the main stage 40, (Lorentz force) in the X-axis direction by the electronic interaction between the main stage 40 and the sub-stage 50 in the X-axis direction, (Hereinafter, abbreviated as XVCM1 (see Fig. 3)) for guiding the X-axis coil in the X-axis direction. That is, when the sub-stage 50 is driven in the X-axis direction by the above-described X linear motor, the main stage 40 is driven integrally with the sub-stage 50 by generating the driving force by the XVCM1.

Relative positional information of the main stage 40 and the sub-stage 50 with respect to the X-axis and Y-axis directions is obtained as shown in Fig. 2, which is fixed to the sub-stage 50 via a predetermined fixing member. (The gap sensor 66 for measuring in the X-axis direction and the gap sensor 67 for measuring in the Y-axis direction) including a displacement sensor of an electromotive force type (or electrostatic capacitance type) (The X-axis direction measurement target 49a and the Y-axis direction measurement target 49b) composed of a metal plate fixed via a predetermined fixing member. That is, the gap sensors 66 and 67 measure the gaps with the targets 49a and 49b, respectively, so that the relative positional information of the main stage 40 and the sub-stage 50 in the X- and Y- do.

3, the sub-stage 70 includes a driving system and a measuring system, except that the position of the X stator 85 to be described later is different and the Y stator 88 to be described later is provided, (50). That is, the sub-stage 70 has an X stage 74 and a Y stage 75. The X stage 74 is mounted on the X linear guide 71 via a slider 76 fixed to the lower surface thereof and has a coil unit 77 fixed to the lower surface thereof and an X And is driven in the X-axis direction on the X linear guide 71 by the linear motor. The Y stage 75 is mounted on a slider 81 fixed on the X stage 74 via a Y linear guide 83 fixed to the lower surface thereof and has a magnet unit 82 fixed to the lower surface thereof, Axis direction on the X stage 74 by a Y linear motor constituted by a coil unit 80 fixed on the upper surface of the X stage 74 and a coil unit 80 fixed on the upper surface of the X stage 74. [

2 and 3, the position information of the X stage 74 in the X axis direction includes an X head 78 fixed to the X stage 74 via a predetermined fixing member, And an X linear scale 73 fixed to the X linear encoder system. The positional information of the Y stage 75 in the Y axis direction is obtained by a Y head 79 fixed to the X stage 74 via a predetermined fixing member and a Y linear scale 84 in the Y-axis direction.

3, the X stator 85 is fixed to the upper surface of the Y stage 75 via a fixing member 85a having an L-shaped cross section. The X stator 85 generates a driving force for driving the main stage 40 in the X-axis direction with respect to the sub-stage 70 by electronic interaction with the X-movable element 45 fixed to the main stage 40 (Hereinafter, abbreviated as XVCM2). When the sub-stages 50 and 70 are synchronously driven in the X-axis direction by using a pair of X linear motors (the magnet units 52 and 72 and the coil units 57 and 77) The main stage 40 and the sub-stages 50 and 70 are driven by driving the main stage 40 in the same direction as the sub-stages 50 and 70 with respect to the sub-stages 50 and 70 using the XVCM1 and XVCM2 together And moves integrally in the X-axis direction. In addition, the main controller 40 slightly drives the main stage 40 in the &thetas; z direction by making different driving forces by XVCM1 and XVCM2.

A Y stator 88 is fixed to the fixing member 85a above the X stator 85. As shown in Fig. The Y stator 88 has a coil unit (not shown) including a plurality of coils. The Y stator 88 has a Y stage in which the main stage 40 is slightly driven in the Y axis direction with respect to the sub stage 70 by the electronic interaction with the Y mover 44 fixed to the main stage 40, Coil motor (hereinafter, abbreviated as YVCM).

The positional information of the main stage 40 and the sub-stage 70 relative to the X-axis direction is transmitted to a gap sensor 86 fixed to the X stage 74 via a predetermined fixing member Is measured through a target 49c fixed to the main stage 40 via a predetermined fixing member and the relative positional information of the main stage 40 and the sub-stage 70 in the Y-axis direction is measured by the Y stage 75 through a predetermined fixed member and a gap sensor 87 fixed via a predetermined fixing member to the main stage 40 via a predetermined fixed member.

Here, as an example, an operation (Y step operation) when the main stage 40 moves, for example, in a predetermined stroke in the + Y direction will be described with reference to Figs. 4A and 4B. 4 (A) and 4 (B), the legs of each of the sub-stage guides 37a and 37b, and the illustration of the body are omitted.

In Fig. 4 (A), the main stage 40 is positioned in the vicinity of the -Y side end portion of the movable range with respect to the Y-axis direction. When the main stage 40 is driven in the + Y direction from the state shown in Fig. 4A, the main controller (not shown) controls the Y linear motors of the sub stages 50 and 70 to drive the Y stages 55, 75 are driven in the + Y direction on the X stages 54, 74 (see Fig. 4 (B)). In addition, since the main stage 40 and the sub-stages 50 and 70 are in a non-contact state, the main control device is also based on the output of the above-described optical interferometer system (Y laser interferometer 98y (see FIG. 3) The main stage 40 is driven in the Y-axis direction by driving the main stage 40 in the + Y direction with respect to the sub-stage 70 by controlling the YVCM to control the YVCM ). Thereby, the main stage 40 and the sub-stages 50 and 70 integrally move in the + Y direction. The main controller also performs the same control when driving the main stage 40 in the -Y direction. Here, the moving strokes of the sub-stages 50 and 70 in the Y-axis direction are the same as the moving strokes in the Y-axis direction on the wafer W in the adjacent two projection regions among the plurality of projection regions of the mask pattern image As shown in Fig. As described above, on the pattern surface of the mask M, a plurality of strip-shaped (long rectangular) regions extending in the scanning direction (X-axis direction) are formed at predetermined intervals in the Y-axis direction, When a part of the mask pattern of the pattern A and a part of the mask pattern of the pattern B are alternately formed in the Y-axis direction on the substrate P, the sub-stage 50 , And 70 in the Y-axis direction is set equal to or larger than the interval of adjacent band-shaped regions among the plurality of band-shaped regions. As a result, the mask stage apparatus MST is capable of positioning the mask M in the Y-axis direction described above.

When the main stage 40 is driven in the X-axis direction, the main controller controls the pair of X linear motors to move the X-stages 54 and 74 of the sub-stages 50 and 70 in the X-axis direction Synchronous drive. The main controller also controls the XVCM1 and XVCM2 based on the output of the optical interferometer system (a pair of X laser interferometers 98x (see Fig. 2)) to move the main stage 40 to the sub-stages 50 and 70 In the X-axis direction, thereby guiding the main stage 40 in the X-axis direction. Thereby, the main stage 40 and the sub-stages 50 and 70 integrally move in the X-axis direction.

When the main stage 40 is driven with a long stroke in the X-axis direction (scanning direction) by using the sub-stages 50 and 70 at the time of exposure or the like, for example, the main control unit drives the XVCM1 and XVCM2 together with the YVCM To move the main stage 40 in the Y-axis direction in order to follow the movement of the substrate P (see Fig. 1) driven by the substrate stage device PST (see Fig. 1) (Fine drive in the cross scan direction during the scan operation).

Here, the arrangement of XVCM1, XVCM2, and YVCM in the Z-axis direction will be described. XVCM1 and XVCM2 are disposed on the upper surface side and the lower surface side of the main stage 40 so as to independently apply force to the main stage 40 in the X axis direction Since the thrusts when XVCM1 and XVCM2 drive the main stage 40 in the X axis direction are substantially the same force (magnitude and direction of force), respectively, the thrust generating position by XVCM1 and the thrust generating position by XVCM2 Acting on the main stage 40 at the midpoint of the thrust generating position. The XVCM1 and XVCM2 are arranged equidistantly with respect to the Z-axis direction from the XY plane including the center of gravity position CG of the main stage 40, respectively. Therefore, XVCM1 and XVCM2 exert thrust in the X-axis direction on the main stage 40 in the XY plane including the center of gravity position CG of the main stage 40. [ Likewise, the YVCM is arranged such that the thrust is applied to the main stage 40 in a plane parallel to the XY plane including the center of gravity CG of the main stage 40, . Therefore, when the main stage 40 is driven in the X-axis direction and / or the Y-axis direction using XVCM1, XVCM2, and YVCM with respect to the sub-stages 50 and 70, The moment (pitching moment) does not act on the main stage 40, and the main stage 40 can be driven along the XY plane with good precision.

In addition, the mask stage device MST has a pair of positioning devices 90 for positioning the main stage 40 at a specific position in the XY plane as shown in Fig. A pair of positioning apparatus 90 includes a pair of positioning members 91 (refer to FIG. 2) fixed to the + X side surface of the main body portion 41 of the main stage 40 in the Y- And a pair of positioning cylinders 95 fixed to the upper surface of the barrel base plate 31 at substantially the same interval as the pair of positioning members 91. [ On the lower surface of the pair of positioning members 91, a conical recess 92 opened downward (-Z side) is formed. Each of the pair of positioning cylinders 95 includes a cylinder case 95a extending in the Z-axis direction and a rod 95b having one end inserted into the cylinder case 95a, A hydraulic cylinder, or an electric single-shaft driving device). A ball 96 is attached to the other end of the rod 95b.

The pair of positioning cylinders 95 are used to position the main stage 40 by the laser interferometer system such as when the liquid crystal exposure apparatus 10 is used for the first time or after the maintenance of the liquid crystal exposure apparatus 10 The main stage 40 is used to position the measurement position of the main stage 40 to the measurement origin position (hereinafter, abbreviated as measurement origin position) of the laser interferometer system when the measurement is performed for the first time or when the stopped measurement is resumed.

The pair of positioning cylinders 95 are arranged in the same plane as the main stage 40 so as not to contact the main stage 40 when the main stage 40 is not positioned (for example, , The rod 95b is in a state of being accommodated in the cylinder case 95a (an accommodated state), as shown in Fig.

When the main stage 40 is positioned at the measurement origin position, first, the positions of the pair of positioning members 91 and the pair of positioning cylinders 95 in the X-axis direction and the Y-axis direction are made to coincide , The position of the main stage 40 is adjusted. This adjustment may be performed manually by the operator of the liquid crystal exposure apparatus 10 or may be controlled so that the position is automatically adjusted based on the outputs of the gap sensors 66, 67, 86, and 87 You can. 5B, the rod 95b is projected from the cylinder case 95a so that the ball 96 is fitted into the recess 92 and the ball 95 is inserted into the cylinder case 95a, It is tailored. Since the main stage 40 is not constrained in the X axis direction and the Y axis direction with respect to the sub stages 50 and 70 and is lifted and supported on the pair of main stage guides 35, The surface of the ball 96 and the surface (tapered surface) forming the recess 92 of the positioning member 91 slide so that the center axis of the cylinder 95 and the concave portion 92 The main stage 40 is guided to a position where the central axes of the portions 92 coincide with each other. Therefore, the main stage 40 can be always positioned at the same position with high accuracy. Since the outer circumferential surface of the ball 96 and the tapered surface forming the concave portion 92 are in contact with each other without a gap in a state in which the pair of balls 96 are fitted to each of the pair of recesses 92, The backlash is prevented in a state in which the base plate 40 is positioned.

5B, in the state where the pair of balls 96 are fitted in the pair of recesses 92, the X axis direction, the Y axis direction, and the? Z direction of the main stage 40 Is limited. Each of the pair of movable mirrors 48x and the movable mirror 48y (see Fig. 2) is placed in a state in which the main stage 40 is positioned by the pair of positioning devices 90, And 98y is vertically incident on the reflecting surface of the main body portion 41 is adjusted. In the liquid crystal exposure apparatus 10, the main stage 40 is positioned at the measurement origin position by using the pair of positioning apparatuses 90. For example, when exposure is performed, The position of the main stage 40 in the XY plane is controlled based on the measured values of the laser interferometer system. In the liquid crystal exposure apparatus 10, the main stage 40 is positioned using the pair of positioning apparatuses 90, and the gap sensors 66, 67, 86, and 87, the positional relationship between the main stage 40 and each of the sub-stages 50 and 70 is stored. Thereby, when the pair of balls 96 and the pair of recesses 92 are released from each other, the main stage 40 is supported on the non-contact portion (that is, there is no member for restricting the position in the horizontal plane) So that it is prevented that measurement by the laser interferometer system can not be performed. Further, in the pair of positioning apparatuses, the arrangement relationship of the ball and the positioning member (concave portion) may be reversed (the positioning member having the concave portion is fixed to the cylinder and the ball is fixed to the main stage).

In the liquid crystal exposure apparatus 10 (see Fig. 1) configured as described above, under the control of a main controller for the mask (not shown), a mask M is held on a mask stage device MST by a mask loader And a load of the substrate P onto the substrate stage device PST by the substrate loader (not shown) is performed. Thereafter, alignment measurement is performed using an alignment detection system (not shown) by the main controller, and a step-and-scan type exposure operation is performed after completion of the alignment measurement. This exposure operation is the same as that of the conventional step-and-scan method, so that a description thereof will be omitted.

As described above, the mask stage apparatus MST of the liquid crystal exposure apparatus 10 according to the present embodiment is configured such that the Y stator 88 of the sub-stage 70 and the Y mover 44 (Y-axis direction) with respect to the sub-stages 50 and 70 (on the sub-stages 50 and 70) by the YVCM consisting of the main stage 40 and the main stage 40 The magnet unit 52 and the coil unit 57 constituting the X linear motor for driving each of the sub-stages 50 and 70 in the X-axis direction and the magnet unit 72 ) And the coil unit 77 are not changed in the cross scan direction respectively so that the main stage 40 is always kept constant in the scanning direction (magnification) without increasing the size of the stators (the magnet units 52 and 72) of the X linear motor, to It can move.

In the liquid crystal exposure apparatus 10 of the present embodiment, the main stage 40 holding the mask M is connected to a pair of Y linear motors (each of the magnet unit 62 and the coil unit 60 (Including the magnet unit 82 and the coil unit 80), and can also be driven with a long stroke in the Y-axis direction. Therefore, by appropriately positioning the position of the main stage 40 in the Y-axis direction, the pattern A and the pattern B can be selectively transferred onto the substrate P without replacing the mask M . Thereby, for example, the exposure operation for transferring the pattern A is performed on one shot area on the substrate P, and then the exposure operation for transferring the pattern B repeatedly on the pattern A is performed by exchanging the mask It can be carried out continuously without carrying out. In the case of performing the exposure operation for transferring the pattern B to the remaining substrate after performing the exposure operation for transferring the pattern A to the predetermined number of substrates for the first time when the exposure is performed successively on the plurality of substrates, , It is not necessary to perform mask exchange. When an exposure operation is performed on a single substrate, an exposure operation for transferring the pattern A to a short region of a plurality of shot regions is performed, and an exposure operation for transferring the pattern B to the remaining shot regions is performed It is not necessary to perform mask replacement.

Since the main stage 40 and the sub-stages 50 and 70 are not in contact with each other, vibration (disturbance) from the outside through the sub-stages 50 and 70 is prevented from being transmitted to the main stage 40. XVCM1, XVCM2, and YVCM for guiding the main stage 40 in the X-axis direction and the Y-axis direction respectively are moving magnet type voice coil motors, and the main stage 40 is provided with a Y- It is not necessary to connect a cable or the like for supplying electric power to the main stage 40 because the magnet 44 and the X movable members 45 and 46 need to be formed. Therefore, vibration (disturbance) from the outside through the cable or the like can be prevented from being transmitted to the main stage. In addition, the tension of the cable does not make it difficult to control the position of the main stage.

&Quot; Second Embodiment &

Next, the liquid crystal exposure apparatus of the second embodiment will be described. The liquid crystal exposure apparatus of the second embodiment is the same as the liquid crystal exposure apparatus 10 of the first embodiment except that a masking blade apparatus (masking system) for shielding a part of the mask from illumination light is formed in the mask stage apparatus. The configuration of the mask stage device will be described below. Components identical or equivalent to those of the first embodiment are denoted by the same reference numerals as those of the first embodiment, and a description thereof will be omitted.

6 is a plan view of the mask stage apparatus MSTa according to the second embodiment. 7 is a sectional view taken along the line A-A in Fig. 6 and 7, a gap sensor formed on the sub-stages 50 and 70 and a target formed on the main stage 40 are not shown in order to avoid confusion in the drawings, Is the same as the embodiment.

6, the masking blade unit MB includes a pair of blade main bodies 110 installed between the sub-stages 50 and 70, and a pair of blade main bodies 110 in the X-axis direction And a pair of blade driving devices 140 for driving the plurality of blade driving devices. 7, except that one of the pair of blade main bodies 110 is arranged on the -X side of the other blade main body 110. Hereinafter, the one blade main body 110 shown in Fig. Will be described.

7, the blade main body 110 includes a shielding portion 111, a pair of driven portions 112, a shielding portion 111 and a pair of driven portions 112 And has a pair of connection portions 113. The light shielding portion 111 is a rectangular plate-shaped member having a Y-axis direction disposed in parallel with the XY plane in the longitudinal direction, and the dimension in the longitudinal direction is set to be longer than the dimension in the longitudinal direction of the mask M. The light shielding portion 111 is accommodated in the opening 41a of the stage main body 41 of the main stage 40 and its lower surface is opposed to the upper surface of the mask M through a predetermined clearance.

Each of the pair of driven portions 112 is formed of a rectangular plate-like member whose longitudinal direction is the Y-axis direction arranged parallel to the XY plane. The pair of driven portions 112 are disposed apart from each other at a predetermined interval with respect to the Y-axis direction. -Y side driven portion 112 is located above the -Y side end portion of the shielding portion 111 and the + Y side driven portion 112 is located above the shielding portion 111 And is disposed above the + Y side end portion.

Each of the pair of connection portions 113 is a plate-like member extending in the Z-axis direction. The one-side connecting portion 113 connects the -Y side end portion of the shielding portion 111 and the + Y side end portion of the -Y side driven portion 112 and the other connecting portion 113 connects the -Y side end portion of the shielding portion 111 The Y side end portion and the -Y side end portion of the + Y side driven portion 112 are connected. The blade main body 110 is not in contact with the main stage 40.

Each of the pair of blade driving devices 140 is a member which moves in the X axis direction in the longitudinal direction and one of which is connected to the sub stage 50 and the other is connected to the sub stage 70, And is mounted through a fixing member 141. Further, the configuration of the pair of blade driving apparatuses 140 is the same. The pair of blade driving apparatuses 140 support the ends of the pair of blade bodies 110 on the + Y side and the -Y side, respectively, from the upper surface thereof. The blade drive device 140 has a coil unit (not shown) including a plurality of coils, for example, and the coil unit and the + Y side and -Y side of the pair of blade bodies 110 The pair of blade bodies 110 are independently driven in the X-axis direction by a linear motor constituted by a magnet unit (not shown) fixed to each of the end portions. Further, a guide member for linearly guiding the pair of blade main bodies 110 in the X-axis direction may be formed. If the pair of blade main bodies 110 can be driven on the pair of sub-stages 50 and 70, the driving method is not limited to this, and for example, a feed screw or the like may be used.

The masking blade apparatus MB is configured such that when the mask M is loaded into the main stage 40 and when the mask M is unloaded from the main stage 40, And are driven away from each other by the pair of blade driving devices 140, thereby being retracted from the movement path of the mask M at the time of loading and unloading. During exposure, the pair of blade main bodies 110 are driven by the pair of blade driving devices 140 in directions approaching each other, and are appropriately positioned at arbitrary positions on the mask M, Shields an arbitrary position on the mask M from the illumination light with respect to the X-axis direction. As a result, the illumination area on the mask M illuminated by the illumination light is limited. A masking blade apparatus (not shown) having a pair of light shielding members movable in the Y-axis direction with respect to the mask M and shielding an arbitrary position on the mask M from the illumination light with respect to the Y- For example, between the mask stage device MSTa and the illumination system IOP (see FIG. 1) or below the projection optical system PL.

In the liquid crystal exposure apparatus of the second embodiment described above, in addition to the effect obtained by the liquid crystal exposure apparatus 10 of the first embodiment, an arbitrary position of the mask M is irradiated from the illumination light by using the masking blade apparatus MB Only an arbitrary position pattern on the mask M can be reliably transferred to the substrate P.

Since the masking blade unit MB is disposed in a state of being skipped over the sub-stages 50 and 70 to make no contact with the main stage 40, the weight of the masking blade unit MB does not act on the main stage 40 Do not. Thereby, deformation of the main stage 40 and the mask M held by the main stage 40 can be prevented. In addition, since the masking blade apparatus MB and the main stage 40 are separated by vibration, the resonance phenomenon is prevented from occurring between them, and the position of the main stage 40 can be controlled with high accuracy. Further, since the main stage is not heavy compared with, for example, a case where the masking blade apparatus (not shown) having the same function as the masking blade apparatus MB is mounted on, for example, the main stage, . Therefore, the actuator (the voice coil motor in the above embodiment) that drives the main stage can be downsized.

The configuration of the mask stage device included in the liquid crystal exposure apparatus of the first and second embodiments is merely an example. Modified examples of the mask stage apparatus included in the liquid crystal exposure apparatus of the above embodiment will be described below. In the following modified examples, the same or similar components to those of the first embodiment are denoted by the same or similar reference numerals as those of the first embodiment, and the description thereof is omitted for simplicity and ease of illustration.

&Quot; First Modified Example &

In Fig. 8, the liquid crystal exposure apparatus 10a according to the first modification is partially omitted and partially shown in a cross-sectional view. The liquid crystal exposure apparatus 10a has a mask stage apparatus MSTb, a body BDa, a substrate stage apparatus (not shown) (see FIG. 1) and the like accommodated in a chamber 200 provided on a floor surface have. In the mask stage device MSTb related to the first modification, the guide portions 38a and 38b for supporting the sub-stages 50 and 70 are provided on the ceiling of the chamber 200, respectively, with misting members 239a and 239b And the second embodiment is different from the first and second embodiments. The guide portion 38b is accommodated in the concave portion 231 formed in the upper surface of the barrel-shaped table 31a in the upward direction (+ Z direction). Although not shown in Fig. 8, a pair of the misting members 239a and 239b are separated from each other in the X-axis direction, and both end portions of the guide portions 38a and 38b in the X- Hanging on the ceiling is supported.

In the mask stage device MSTb according to the first modified example, since the sub-stage guides are not arranged on both sides of the body BDa, the body BDa (and the substrate stage device ) Can be increased. A masking blade apparatus mounted on the mask stage apparatus of the second embodiment may be mounted on the mask stage apparatus MSTb of the first modification shown in Fig.

&Quot; Second Modified Example &

Next, a second modification of the first and second embodiments will be described. FIG. 9 shows a partially omitted perspective view of the mask stage apparatus MSTc according to the second modification. The mask stage device MSTc shown in Fig. 9 is different from the first and second embodiments in the position of the pair of X moving lenses 48x fixed to the main stage 340. [ On the lower surface of the main body portion 341 of the main stage 340, a pair of recesses 347 opened toward the -X side are formed in the Y axis direction. Each of the pair of X moving pieces 48x is accommodated in each of the pair of concave portions 347 and fixed to the body portion 341. [ In the mask stage device MSTc according to the second modification, since the pair of X moving mirrors 48x are arranged on the inner side of the main body portion 341, for example, when the main body portion 341 is rotated in the? Y direction It is possible to control the position of the main stage 340 with high accuracy because the angle change of the reflecting surface can be suppressed. Furthermore, since the rigidity of the mounting position can be enhanced more than the X-moving-device mounting position of the first and second embodiments, the natural frequency of the X-moving neck portion can be increased to improve the control performance.

&Quot; Third Embodiment &

Next, a liquid crystal exposure apparatus according to the third embodiment will be described with reference to Figs. 10 to 13. Fig. Components identical or equivalent to those of the first embodiment described above are denoted by the same or similar reference numerals, and the description thereof will be simplified or omitted.

Fig. 10 shows a plan view of the mask stage apparatus MSTd of the liquid crystal exposure apparatus 1000 according to the third embodiment, and Fig. 11 shows a side view of the mask stage apparatus MSTd in the + X direction. The liquid crystal exposure apparatus 1000 according to the third embodiment differs from the liquid crystal exposure apparatus 10 of the first embodiment described above except that the liquid crystal exposure apparatus 1000 has the mask stage apparatus MSTd instead of the mask stage apparatus MST And has the same configuration. Hereinafter, only the configuration of the mask stage apparatus MSTd will be described.

The mask stage apparatus MSTd according to the third embodiment is constructed in the same manner as the mask stage apparatus MST according to the first embodiment as a whole, as is apparent from a comparison between Figs. 10 and 2, for example. However, Some configurations are different. Hereinafter, the third embodiment will be described with the focus on these differences.

In the mask stage device MSTd, the lock devices 100a and 100b for connecting the main stage 40 and the sub-stage 50 shown in Fig. 10, and the lock devices 100a and 100b for connecting the main stage 40 and the sub- And locking devices 100c and 100d for connecting the stage 40 and the sub-stage 70. [ Here, the lock device 100a and the lock device 100b have substantially the same configuration. The lock device 100c and the lock device 100d have substantially the same configuration.

12A schematically shows the configuration of the lock device 100a on the -Y side and the + X side of the main stage 40 on behalf of the lock devices 100a and 100b.

12A, the lock device 100a includes a lock portion 101 fixed on the + Y side end portion of the upper surface of the Y stage 55 via a fixing member 102 having an L-shaped cross section I have. In the present embodiment, the above-described Y-axis direction measuring gap sensor 67 is fixed to the fixing member 102 via a mounting member 67a having an L-shaped cross section.

The lock portion 101 has a shaft 103 extending in the Z-axis direction and movable in the Z-axis direction. A method of driving the shaft 103 in the Z-axis direction is not particularly limited, and it can be driven by, for example, an air cylinder device, a solenoid, or the like. A ball 104 is fixed to the lower end of the shaft 103. On the other hand, on the -Y side end of the upper surface of the main body portion 41 of the main stage 40, a flat support member 105 is fixed. The above-described target 49b, which is the object to measure the gap by the gap sensor 67, is fixed to the upper surface of the support member 105. [

One end of a supporting member 106, which is a plate-shaped member having an L-shaped cross section, is fixed to the bottom surface of the -Y side end of the supporting member 105. An engaging member 107 (hereinafter referred to as an engaging member) 107 made of a disk-shaped (low-columnar) member is provided on the upper surface of the other end (-Y side end) of the support member 106 Is fixed. On the upper surface of the engaging member 107, a conical recess 107a opened upward (+ Z side) is formed.

As shown in Fig. 12 (A), in a state in which the shaft 103 is disposed at the + Z side end of the movable range with respect to the Z axis direction and the ball 104 and the engaging member 107 are separated from each other, (40) is not constrained to the sub-stage (50). On the other hand, as shown in Fig. 12 (B), when the shaft 103 is moved in the -Z direction and the ball 104 is fitted into the concave portion 107a, the main stage 40 and the sub- And the relative movement within the XY plane is restricted. Since the lock device 100a (and the lock device 100b) is configured to fit the ball 104 into the conical recess 107a, the lock device 100a (and the lock device 100b) Stage 50, the relative positional relationship between the main stage 40 and the sub-stage 50 is always the same.

10, the X-axis directional measurement gap sensor 66 is fixed to the X stage 54 via a predetermined fixing member and the gap sensor 66 is fixed to the X stage 54 by a gap sensor 66, Described target 49a to be measured is fixed on the upper surface of the support member fixed to the main stage 40. [ Each of the gap sensor 66 and the target 49a is fixed to the fixing member and the support member toward the side where the measurement direction of the gap is the X axis direction.

13 schematically shows the configuration of the locking device 100c on the + Y side and the + X side of the main stage 40 as a representative of the locking devices 100c and 100d. As shown in Fig. 13, the lock device 100c has a structure in which the lock device 100a shown in Fig. 12 (A) is turned upside down. That is, the lock device 100c has a lock portion 101 fixed to the Y stage 75 via a fixing member 102. The lock portion 101 is movable up and down, And has a fixed shaft 103. The aforesaid Y-axis direction measuring gap sensor 87 is fixed to the fixing member 102. [ On the other hand, the main stage 40 is fixed with an engaging member 107 having a concave portion 107a shaped like a cone and opening downward through the support members 105 and 106. [ The above-described target 49d, which is the object to which the gap is measured by the gap sensor 87, is fixed to the support member 106. [ The lock device 100c connects the main stage 40 and the sub-stage 70 by fitting the ball 104 into the concave portion 107a in the same manner as the lock device 100a, Thereby restricting the relative movement in the second direction.

10, on the side of the other locking device 100d, the X-axis direction measuring gap sensor 86 is fixed to the fixing member 102, and the gap sensor 86 is used to measure the gap 49c are fixed on the upper surface of the support member 105. Each of the gap sensor 86 and the target 49c is fixed to the fixing member 102 and the supporting member 105 in such a manner that the measurement direction of the gap is the X- Is fixed to the member (105).

10, in a state in which the main stage 40 is connected to each of the sub-stages 50 and 70 by using the lock devices 100a to 100d, the X linear motors are used to drive the X stages 54 and 74 It is possible to drive the main stage 40 in the X-axis direction without using XVCM1 and XVCM2 (see FIG. 11) to accelerate to the target speed at the time of exposure, or to accelerate the main stage 40 It can be decelerated. Therefore, it is not necessary to use the XVCM1 and XVCM2 capable of generating a large thrust, and the XVCM1 and XVCM2 can be miniaturized. Likewise, when driving the Y stages 55 and 75 in the Y axis direction using the Y linear motor, the main stage 40 can be driven in the Y axis direction without using the YVCM (see FIG. 11).

In the liquid crystal exposure apparatus 1000 according to the third embodiment, since the absolute position of the main stage 40 can not be measured by the laser interferometer system during operation of the apparatus, for example, 40 need to be positioned at a predetermined measurement origin position (not shown). At this time, a main controller, not shown, connects the sub-stages 50 and 70 to the main stage 40 using the lock devices 100a to 100d, (40) to the measurement origin position. The main controller then releases the connection by the lock devices 100a to 100d after positioning the main stage 40 at the position of the measurement origin point so that the gap sensors 66, 67, 86, and 87 10), while the positional deviation is monitored based on the output of the interferometer system.

In each of the lock devices 100a to 100d, the contact surfaces of the outer circumferential surface of each ball 104 and the tapered surface forming each concave portion 107a, as shown in FIG. 12B, The positions of the engaging members 107 are set so that they are arranged on a plane parallel to the XY plane including the center of gravity position CG of each of the engaging members. Therefore, the sub-stages 50 and 70 are moved in the X-axis direction and / or the Y-axis direction together with the sub-stages 50 and 70 and the main stage 40 connected to each other using the lock devices 100a to 100d The pressing force by which the sub stages 50 and 70 press the main stage 40 acts in a plane parallel to the XY plane including the center of gravity position CG of the main stage 40. [ Therefore, when the main stage 40 is driven in the X-axis direction and / or the Y-axis direction, a moment (pitching moment) around the axis orthogonal to the driving direction does not act on the main stage 40, 40 can be stably guided along the XY plane. In the lock devices 100a to 100d, since the outer peripheral surface of the ball 104 and the tapered surface forming the recess 107a are in contact with each other without a gap, the main stage 40 is pressed against each of the sub- A large pressing force can be applied.

10, the mask stage device MSTd according to the third embodiment includes stopper devices 120a and 120b for limiting the relative movement range of the main stage 40 and the sub-stage 50, And stopper devices 120c and 120d for limiting the relative movement range of the main stage 40 and the sub-stage 70. [ Here, the stopper device 120a and the stopper device 120b have substantially the same configuration. The stopper device 120c and the stopper device 120d have substantially the same configuration. 12A shows the structure of the stopper device 120a on the -Y side and the + X side of the main stage 40 as a representative of the four stopper devices.

As shown in Fig. 12 (A), a stopper member 121 is attached to the lower end of the fixing member 102 described above. The stopper member 121 is formed in a rectangular frame shape (a shape having a rectangular outer shape and a rectangular opening portion (through hole) at the central portion) as viewed in plan. The above-described support member 106 is accommodated in the opening of the stopper member 121. A cushioning pad 123 formed of, for example, a rubber material is formed on the surface of the support member 106 opposite to the stopper member 121 (that is, on the + X side, the -X side, the + Y side, (The -X side buffer pad is not shown) is fixed. A predetermined clearance is formed between the stopper member 121 and each of the buffer pads 123 fixed to the + X side, the -X side, the + Y side, and the -Y side of the support member 106.

In the state shown in Fig. 12 (A), the main stage 40 and the sub-stage 50 are moved in the X-axis direction and / or the Y-axis direction with respect to the sub-stage 50, The relative movement amount (relative permissible range) in each of the -X, + Y and -Y directions (i.e., within the horizontal plane) is smaller than the clearance formed between the stopper member 121 and the support member 106 (buffer pads 123) As shown in FIG. 13 schematically shows the structure of the stopper device 120c. Like the stopper device 120a, the stopper device 120c is formed in a rectangular frame shape fixed to the fixing member 102 and has a stopper member 121 accommodating the support member 106 in the opening thereof, The relative movable range of the stage 40 and the sub-stage 70 is limited by the width of the clearance between the stopper member 121 and the support member 106 (buffer pad 123).

Thereby, in the state in which the lock devices 100a to 100d do not connect the main stage 40 and the sub stages 50 and 70 (see Fig. 12 (A)), the sub stages 50 and 70 are used When the main stage 40 is driven with a predetermined stroke in the X-axis direction and / or the Y-axis direction, for example, the sub-stages 50 and 70 are urgently stopped and the main stage 40 is rotated by its inertia The four stopper members 121 come into contact with the respective buffer pads 123 on the four peripheral surfaces of the corresponding support member 106 so that the main stage 40 can be moved in the X axis direction and / Is prevented from moving away from the sub-stages (50, 70).

The configuration of the other parts of the liquid crystal exposure apparatus 1000 is the same as that of the liquid crystal exposure apparatus 10 of the first embodiment described above and performs the same exposure operation.

As described above, the liquid crystal exposure apparatus 1000 according to the third embodiment is the same as the liquid crystal exposure apparatus 10 according to the first embodiment described above, except for the configuration of a part of the mask stage apparatus MSTd The same effect can be obtained. In addition, in the liquid crystal exposure apparatus 1000 (the mask stage apparatus MSTd included in the third embodiment), the lock apparatuses 100a to 100d are used to move the center of gravity of the main stage 40 The main stage 40 and the sub-stages 50 and 70 can be connected in the plane including the main stage 40 and the main stage 40 and the main stage 40 in the X-axis direction and the sub- And / or the Y-axis direction. Accordingly, a small-sized XVCM1, XVCM2, and YVCM with small thrust can be used, whereby power consumption can be suppressed, so that cost reduction can be achieved. In addition, the lock devices 100a to 100d are simple in structure, have fewer failures, and are smooth in operation, so that the cost can be reduced and the maintenance is also excellent.

In the mask stage device MSTd according to the third embodiment, the main stage 40 and the sub-stage 50 are provided at two positions using the lock devices 100a and 100b, Since the stage 70 is connected at two points (four points in total) using the lock devices 100c and 100d, the main stage 40 does not rotate in the? Z direction. Since the lock apparatuses 100a to 100d move the shaft 103 in the Z axis direction, the main stage 40 and the sub-stages 50 and 70 can be quickly connected to each other, The stiffness with respect to the axial direction is high. The locking device may be configured such that the movable shaft is fixed to the main stage and the engaging member to which the ball fixed to the shaft is fitted is formed on the sub-stage side, as opposed to the above case. However, it is advantageous to form the shaft, which is the movable member, on the sub-stage as described above because the weight of the main stage can be reduced.

Since the mask stage device MSTd has the stopper devices 120a to 120d that limit the relative movable range of the main stage 40 and the sub-stages 50 and 70, respectively, for example, It is possible to prevent the main stage 40 from falling off from the sub-stages 50 and 70 due to its inertia even when the stoppers 50 and 70 stop urgently. Since the buffer pads 123 are formed on the contact surfaces of the main stage 40 and the sub-stages 50 and 70, the impact at the time of the collision is mitigated.

The configuration of the mask stage device included in the liquid crystal exposure apparatus of the third embodiment is merely an example. Modified examples of the mask stage apparatus included in the liquid crystal exposure apparatus of the third embodiment will be described below. In the following modified examples, the same reference numerals are used for the same or equivalent constituent parts for the sake of simplicity of explanation and convenience of illustration, and the description thereof is omitted.

Fig. 14 shows a schematic configuration of the lock device 200a and the stopper device 220a of the mask stage device (MSTe) of the modified example. 4, two lock devices and two stoppers are provided on the -Y side and the + Y side of the main stage 40 in the same manner as in the above embodiment, (The lock device 200a and the stopper device 220a on the -Y side and the + X side of the lock mechanism 40) are representatively shown.

The stopper device 200a of the mask stage device MSTe of the modified example is configured such that the contact surface between the stopper member 121 and the support member 106 (buffer pads 123) is located at the center of gravity CG of the main stage 40, As shown in Fig. Therefore, when the support member 106 (the buffer pad 123) and the stopper member 122 come into contact with each other and the relative movement of the main stage 40 and each of the sub-stages 50 and 70 is restricted, And the support member 106 abut (collide) in a plane including the center of gravity position CG of the main stage 40 so that the moment on the main stage 40 around the axis orthogonal to the moving direction (Pitching moment) does not act. Therefore, even if the stopper member 121 and the support member 106 collide with each other, the posture of the main stage 40 is prevented from being significantly disturbed. In the mask stage device (MSTe) of the present modification, the connection positions of the main stage 40 and the sub-stages 50, 70 by the lock device 200a are set so that the center positions CG of the main stage 40 And the distance from the plane including the center of gravity position CG of the main stage 40 is a small amount and that the distance between the main stage 40 and the main stage 40 at four points in the XY plane Since the stages 50 and 70 are connected to each other, the main stage 40 can be driven along the XY plane with good precision substantially as in the above embodiment. For example, the connecting positions of the main stage and the pair of sub-stages by the lock device and the abutting positions of the main stage and the pair of sub-stages set by the stopper device are respectively set to Dimensional plane including the center-of-gravity position CG of the main stage. The lock devices are formed at four positions in total, two at both sides of the main stage. However, the lock devices are not limited to this, and three positions may be provided if they are not on the same straight line. In addition, the member in contact with the ball may not be a cone part, or may have a groove shape extending in a uniaxial direction (for example, an X axis direction or a Y axis direction).

In the third embodiment, the pair of sub-stages may be movable only in the scanning direction. In the first to third embodiments described above, the main stage and the pair of sub stages are integrally formed by at least one of the YVCM and the pair of XVCM1 and XVCM2 and / or the locking devices 100a to 100d And the second state in which the main stage and the pair of sub stages can not be integrally driven are switched and switched. However, the present invention is not limited to the case where the main stage and the pair of sub stages are integrally driven 1 state and the second state in which the main stage and the pair of sub-stages can not be integrally driven can be switched.

&Quot; Fourth Embodiment &

Next, an exposure apparatus according to the fourth embodiment will be described with reference to Figs. 15 to 19. Fig.

Components identical or equivalent to those of the first and third embodiments described above are denoted by the same or similar reference numerals, and the description thereof will be simplified or omitted.

Fig. 15 shows a plan view of the mask stage apparatus of the liquid crystal exposure apparatus 2000 of the fourth embodiment. The liquid crystal exposure apparatus 2000 according to the third embodiment differs from the liquid crystal exposure apparatus 10 according to the first embodiment described above except that the liquid crystal exposure apparatus 2000 has the mask stage apparatus MSTf instead of the mask stage apparatus MST And has the same configuration. Hereinafter, only the configuration of the mask stage device MSTf will be described.

The mask stage apparatus MSTf according to the fourth embodiment is constructed in the same manner as the mask stage apparatus MST according to the first embodiment as a whole, as is obvious from comparison between Fig. 15 and Fig. 2, Some configurations are different. Hereinafter, the fourth embodiment will be described with the focus on these differences.

15, the mask stage device MSTf includes lock devices 100a and 100b for connecting the main stage 40 and the sub-stage 50, and lock devices 100a and 100b for connecting the main stage 40 and the sub- And has locking devices 100c and 100d to be connected together with a pair of positioning devices 90. [ The lock device 100a and the lock device 100b have substantially the same configuration. The lock device 100c and the lock device 100d have substantially the same configuration. 16A schematically shows the configuration of the locking device 100a on the -Y side and the + X side of the main stage 40 on behalf of the locking devices 100a and 100b. As is clear from comparison between Figs. 16A and 12A, the lock devices 100a and 100b are configured in the same way as the lock devices 100a and 100b of the third embodiment described above.

Therefore, as shown in Fig. 17A, when the shaft 103 is disposed on the + Z side of the movable range with respect to the Z-axis direction and the ball 104 and the engaging member 107 are separated from each other, The stage 40 is not constrained to the sub-stage 50. On the other hand, as shown in Fig. 17B, when the shaft 103 is moved in the -Z direction and the ball 104 is fitted into the concave portion 107a, the main stage 40 and the sub- And the relative movement within the XY plane is restricted. Since the lock device 100a (and the lock device 100b) is configured to fit the ball 104 into the conical recess 107a, the lock device 100a (and the lock device 100b) The relative positional relationship between the main stage 40 and the sub-stage 50 is always the same as in the case of the positioning device 90 described above.

18 schematically shows the configuration of the locking device 100c on the + Y side and the + X side of the main stage 40 on behalf of the locking devices 100c and 100d. 18 and 13, the lock devices 100c and 100d are configured in the same way as the lock devices 100c and 100d of the third embodiment described above. The lock device 100c connects the main stage 40 and the sub-stage 70 by fitting the ball 104 into the concave portion 107a in the same manner as the lock device 100a, Thereby restricting the relative movement in the second direction.

15, in a state where the main stage 40 is connected to each of the sub-stages 50 and 70 by using the lock devices 100a to 100d, the X linear motors are used to drive the X stages 54 and 74 It is possible to drive the main stage 40 in the X axis direction without using XVCM1 and XVCM2 to accelerate the main stage 40 to the target speed at the time of exposure or to decelerate the main stage 40. [ Therefore, it is not necessary to use the XVCM1 and XVCM2 capable of generating a large thrust, and the XVCM1 and XVCM2 can be miniaturized. Likewise, when driving the Y stages 55 and 75 in the Y axis direction using the Y linear motor, the main stage 40 can be driven in the Y axis direction without using the YVCM. In the lock devices 100a to 100d, since the outer peripheral surface of the ball 104 and the tapered surface forming the recess 107a are in contact with each other without a gap, the main stage 40 is pressed against each of the sub- A large pressing force can be applied. Each of the lock devices 100a to 100d can be moved in the vicinity of the measurement origin position (the ball 96 and the concave portion 92 correspond to each other) by using the pair of positioning devices 90 described above (For example, see Fig. 16 (A)).

15, the mask stage device MSTf according to the fourth embodiment includes stopper devices 120a 'and 120b' for limiting relative movement ranges of the main stage 40 and the sub-stage 50, And stopper devices 120c 'and 120d' for limiting the relative movement range of the main stage 40 and the sub-stage 70. [ Further, the stopper device 120a 'and the stopper device 120b' have substantially the same configuration. The stopper device 120c 'and the stopper device 120d' have substantially the same configuration. 17A shows the structure of the stopper device 120a 'on the -Y side and the + X side of the main stage 40 as a representative of the four stopper devices.

As shown in Fig. 17 (A), at the lower end of the above-described fixing member 102, a rotation shaft 122 whose axial direction is the X-axis direction is formed. A member 124 is mounted on the lower end of the fixing member 102 so as to be rotatable (reciprocally rotatable) around the rotation axis 122. An end of the member 124 is provided with a rectangular frame- The stopper member 121 is integrally fixed. In this case, the member 124 and the stopper member 121 have an L-shaped shape when viewed from the + X side.

The stopper member 121 is rotated around the rotating shaft 122 by an actuator (not shown). As shown in Fig. 17 (A), the above-mentioned support member 106 is accommodated in the opening of the stopper member 121. Fig. A cushioning pad 123 formed of, for example, a rubber material is formed on the surface of the support member 106 opposite to the stopper member 121 (that is, on the + X side, the -X side, the + Y side, (The -X side buffer pad is not shown) is fixed. A predetermined clearance is formed between the stopper member 121 and each of the buffer pads 123 fixed to the + X side, the -X side, the + Y side, and the -Y side of the support member 106.

In the state shown in Fig. 17A, the main stage 40 and the sub-stage 50 are moved in the X-axis direction and / or the Y-axis direction with respect to the sub-stage 50, The relative movement amount (relative permissible range) in each of the -X, + Y and -Y directions (i.e., within the horizontal plane) is smaller than the clearance formed between the stopper member 121 and the support member 106 (buffer pads 123) As shown in FIG. 18 schematically shows the structure of the stopper device 120c '. Similar to the stopper device 120a ', the stopper device 120c' also has a stopper member 121 mounted on the stationary member 102 so as to be rotatable integrally with the member 124 around the rotary shaft 122 , The relative movable range of the main stage 40 and the sub-stage 70 is limited according to the clearance width between the stopper member 121 and the support member 106 (buffer 123).

Thereby, in the state in which the lock devices 100a to 100d do not connect the main stage 40 and the sub-stages 50 and 70 (see Fig. 17A), the sub-stages 50 and 70 are used When the main stage 40 is driven with a predetermined stroke in the X-axis direction and / or the Y-axis direction, for example, the sub-stages 50 and 70 are urgently stopped and the main stage 40 is rotated by its inertia The main stage 40 is moved away from the sub-stages 50 and 70 by moving the four stopper members 121 against the corresponding support members 106, even if they move in the X-axis direction and / or the Y- (Overrun) is prevented.

In the respective stopper devices 120a 'to 120d', the abutment surfaces of the respective stopper members 121 and the respective support members 106 are, for example, as shown in Figs. 17 (A) and 18 The positions of the respective stopper members 121 and the respective support members 106 are set so that they are disposed on a plane parallel to the XY plane including the center of gravity position CG of the main stage 40 as shown in Fig. Therefore, when stopping the movement of the main stage 40 by using the respective stopper devices 120a 'to 120d', that is, by abutting the respective stopper members 121 and the support members 106, the main stage 40 (Pitching moment) orthogonal to the moving direction is not applied to the main stage 40, and the posture of the main stage 40 can be prevented from being significantly disturbed.

19 shows a state in which the stopper member 121 is rotated around the rotation shaft 122 by an actuator (not shown) and separated from the support member 106. [ In the state shown in Fig. 19, the sub-stages 50 and 70 can move on the sub-stage guides 37a and 37b in the X-axis direction away from the main stage 40, respectively. At this time, the main stage 40 is stopped on the pair of main stage guides 35 by using the pair of positioning devices 90 (see Figs. 16A and 16B) You can leave it. 15, since the gap sensors 66 and 86 are arranged on the -X side with respect to the corresponding targets 49a and 49c, respectively, the sub-stage 50 and 70 can move away from the main stage 40 only in the -X direction with respect to the main stage 40. [ The case where the sub-stages 50 and 70 are separated from the main stage 40 can be exemplified by the maintenance of the sub-stages 50 and 70, for example.

The other parts of the structure of the liquid crystal exposure apparatus 2000 are the same as those of the liquid crystal exposure apparatus 10 of the first embodiment described above and perform the same exposure operation.

As described above, the liquid crystal exposure apparatus 2000 according to the fourth embodiment is the same as the liquid crystal exposure apparatus 10 according to the first embodiment described above except for the configuration of a part of the mask stage apparatus (MSTf) The same effect can be obtained. In addition, since the liquid crystal exposure apparatus 2000 of the fourth embodiment is provided with the lock apparatuses 100a to 100d having the same configuration as the liquid crystal exposure apparatus 1000 of the third embodiment described above, The main stage 40 may be properly driven in the X-axis direction and / or the Y-axis direction without using XVCM1, XVCM2, and YVCM in the same manner as in the first embodiment. Accordingly, XVCM1, XVCM2, and YVCM, which are small in thrust, can be used. As a result, the power consumption can be suppressed, and the cost can be reduced. In the liquid crystal exposure apparatus 2000 according to the fourth embodiment, the main stage 40 and the sub-stage 50 are fixed to the main stage 40 and the sub-stage 50 at two points using the lock devices 100a and 100b. The main stage 40 is not rotated in the? Z direction because the main stage 40 is connected at two points (four points in total) using the lock devices 100c and 100d. The lock apparatuses 100a to 100d can move the main stage 40 and the sub-stages 50 and 70 quickly as the shaft 103 moves in the Z-axis direction.

The mask stage device MSTf according to the fourth embodiment has stopper devices 120a 'to 120d' for limiting the relative movable range of each of the main stage 40 and the sub-stages 50 and 70 The main stage 40 can be moved in the vertical direction by the inertia of the main stage 40 in the same manner as in the liquid crystal exposure apparatus 1000 according to the third embodiment described above, (50, 70). Since the buffer pads 123 are formed on the contact surfaces of the main stage 40 and the sub-stages 50 and 70, the impact at the time of the collision is mitigated.

Unlike the above-described stopper devices 120a to 120d, each of the stopper devices 120a 'to 120d' is not fixed to the stopper member 121, and the main stage 40 and the sub-stages 50 and 70 (Restricting position) for restricting the relative movement of the relative position (non-restricting position), and a position (restricting position) for restricting the relative movement. Therefore, the main stage 40 and the sub-stages 50 and 70 can be separated by disposing the stopper member 121 at the release position. In addition, in the stopper devices 120a 'to 120d', as opposed to the case described above, movable stopper members may be formed on the main stage, and members abutting against the stopper members may be formed on the sub-stage side. However, it is advantageous to form the stopper member, which is the movable member, on the substage as described above because the main stage can be lightened.

&Quot; Fifth Embodiment &

Next, the liquid crystal exposure apparatus of the fifth embodiment will be described. The liquid crystal exposure apparatus of the fifth embodiment is different from the liquid immersion exposure apparatus of the first embodiment in that a mask loader apparatus for carrying out transfer of a mask to and from a main stage is formed in a mask stage apparatus and a pair of guides Has the same configuration as the liquid crystal exposure apparatus 2000 according to the fourth embodiment except for points that are longer in the X-axis direction than the fourth embodiment (and the first to third embodiments). Only the configuration of the mask loader device will be described below. For the sake of simplicity and ease of illustration, constituent elements which are the same as or equivalent to those of the first and fourth embodiments are denoted by the same reference numerals and the description thereof will be omitted.

20 is a plan view of the mask stage device MSTg according to the fifth embodiment. The lock devices 100a to 100d, the stopper devices 120a 'to 120d', the gap sensors 66, 67, 86 and 87 and the targets 49a to 49d And the like are omitted.

The mask loader device ML is provided with a pair of mask holding devices 130. One of the pair of mask holding devices 130 is mounted on the upper surface of the Y stage 55 of the sub stage 50 and the other is mounted on the upper surface of the Y stage 75 of the sub stage 70. The configuration of the pair of mask holding devices 130 is substantially the same except that the pair of mask holding devices 130 are arranged symmetrically (horizontally and symmetrically) with respect to the X axis. Hereinafter, the mask holding apparatus 130 mounted on the sub-stage 50 (-Y side) will be described.

Fig. 21 is a sectional view taken along the line B-B in Fig. 21, the mask holding apparatus 130 includes a movable member 131 and a support member 135. The movable member 131 is a movable member. The movable member 131 is made of a rectangular plate member parallel to the XZ plane (see Fig. 20). At the lower end of the movable member 131, a pair of claw members 132 disposed apart from each other in the X-axis direction are fixed. The mask loader ML is configured such that the -Y side mask holding device 130 supports the -Y side of the mask M (or the mask holder, not shown) from below by a pair of claw members 132, Side mask holding device 130 supports the + Y side of the mask M from below with a pair of claw members 132. [ The movable member 131 is fixed in a state in which a pair of Z linear guide members 133 extending in the Z axial direction are separated from each other on the -Y side in the X axis direction (see FIG. 20).

20, the support member 135 is formed of a rectangular plate-shaped member parallel to the XZ plane, which faces the -Y side surface of the movable member 131. In Fig. A slide member 136 having a U-shaped cross section is fixed to the four corners of the + Y side surface of the support member 135 (see FIG. 21). Two of the four slide members 136 are engaged with the + X side Z linear guide member 133 and the two sides of the -X side are engaged with the -X side Z linear guide member 133 . Between the movable member 131 and the support member 135, a drive unit 134 including a feed screw unit is formed, for example. The movable member 131 is moved upward and downward (in the + Z direction or the -Z direction) with respect to the support member 135 through the drive unit 134. The support member 135 is fixed on the Y stage 55 via a pair of fixing members 137 having an L-shaped cross section and a pair of connection members 138 parallel to the XY plane. The pair of connecting members 138 are connected by a rectangular plate-like reinforcing member 139 whose longitudinal direction is the X-axis direction. Since the sub-stage 70 is located on the -Z side with respect to the sub-stage 50, the dimension of the -Y side fixing member 137 in the Z axis direction is longer than that of the + Y side fixing member 137 The same reference numerals are used for convenience).

22, in the mask stage device MSTg according to the fifth embodiment, the lengths of the guide portions 338a and 338b in the X-axis direction are set longer than those in the fourth embodiment, Each of the masks 50 and 70 can transport the mask M held by the mask loader device ML to a predetermined mask exchange position. In the fifth embodiment, the mask exchange position is arranged on the -X side with respect to the region where the main stage 40 moves, for example, during scanning exposure. 19, when the mask M is transported to the mask exchange position using the sub-stages 50 and 70, the stoppers 120a 'to 120d' (see Fig. 15) The respective balls 104 of the lock devices 100a to 100d (see Figs. 15 and 17 (A)) are separated from the support members 106, State. The main stage 40 is stopped on the pair of main stage guides 35 by using the pair of positioning devices 90 (see Figs. 16A and 16B) .

Next, a transfer operation of the mask M between the mask loader device ML and the main stage 40 will be described. The transfer operation of the mask M to be described below is performed under the control of a main controller (not shown). The main control unit drives each of the sub-stages 50 and 70 in the -X direction to position the mask loader device ML at the mask exchange position as shown in Fig. In the mask loader device ML, a mask (not shown) for holding the mask loader ML is exchanged at a mask exchange position, for example, by a mask transfer device (not shown). At this time, the new mask M is placed on the claw member 132. The mask loader ML holding the new mask M is positioned above the main stage 40 by driving the sub-stages 50 and 70 in the X-axis direction (see Fig. 20). At this time, the movable member 131 is positioned on the + Z side of the movable range in the Z-axis direction so as not to contact the main stage 40 (see FIG. 21).

23A, a pair of movable members 131 holding the mask M are driven in the -Z direction by the driving device 134 (see Fig. 20) (the movable member 131 (See arrows in Fig. 23 (A)). Thereby, the mask M is placed on the chuck unit 42. At this time, all members constituting the mask loader device ML such as the movable member 131 and the Z linear guide member 133 are not in contact with the main stage 40 at all. 23 (B), the main controller may drive the movable member 131 in the -Z direction to move the claw member 132 and the movable member 131 in the -Z direction even after the mask M is placed on the chuck unit 42 The mask M is separated. In this state, since the movable member 131 and the claw member 132 are not in contact with the mask M, the mask M is held from the outside through the sub-stages 50 and 70, the mask loader device ML, Vibration is prevented from being transmitted. The main control apparatus performs the exposure processing operation in a state shown in Fig. 23 (B), that is, in a state in which the mask loader ML is not in contact with any of the mask M and the main stage 40. When the mask M held by the main stage 40 is transferred to the mask loader device ML, the operation opposite to the above case is performed.

The mask stage apparatus MSTg according to the fifth embodiment can move the sub-stages 50 and 70 on which the mask loader apparatus ML is mounted to the mask stage to be moved away from the main stage 40, The length (dimension) in the X-axis direction of the main stage guide 35 for guiding the movement of the main stage 40 can be shortened as compared with the case where the main stage 40 itself is moved to the mask exchange position, for example .

&Quot; Sixth Embodiment &

Next, the liquid crystal exposure apparatus of the sixth embodiment will be described. The liquid crystal exposure apparatus of the sixth embodiment differs from the liquid crystal exposure apparatus of the sixth embodiment in that the structure of the mask loader apparatus provided in the mask stage apparatus is different and that the guide section for supporting the pair of sub- And has the same configuration as the liquid crystal exposure apparatus of the fifth embodiment. Hereinafter, the configuration of the mask loader device will be described. The same reference numerals as those of the fourth and fifth embodiments are given to those having the same configurations as those of the fourth and fifth embodiments, and a description thereof will be omitted.

24 is a plan view of the mask stage apparatus MSTh of the sixth embodiment. The mask loader device MLb includes a transporting stage 250 mounted on the guide portion 438a together with the sub-stage 50 and a transporting stage 250 mounted on the guide portion 438b together with the sub- A stage 270, and a pair of mask holding devices 130. [

The transporting stage 250 is disposed on the -X side of the sub-stage 50. The transporting stage 250 has the same structure except that the dimension in the X axis direction is set slightly shorter and the X stator 65 and the gap sensors 66 and 67 (see Fig. 15, respectively) Stage 50 including the driving system and the measuring system. That is, the carrying stage 250 has an X stage 254 that moves on the guide portion 438a in the X axis direction and a Y stage 255 that moves in the Y axis direction on the X stage 254 . The positional information about the X-axis direction of the X-stage 254 is measured by the X-head 258 constituting the X-linear encoder together with the X-scale 53, and the position of the Y- Information is measured by the Y head 259 constituting the Y linear encoder together with the Y scale 264. [ The position of the carrying stage 250 is controlled on the guide portion 438a independently of the sub-stage 50 by a main controller (not shown).

The transporting stage 270 is disposed on the -X side of the sub-stage 70. The conveying stage 270 has a structure in which the dimension in the X-axis direction is set to be slightly shorter and the dimension of the X stator 85, the Y stator 88, and the gap sensors 86 and 87 Stage 70 including the driving system and the measuring system except the point. The transporting stage 270 has an X stage 274 for moving on the guide portion 438b in the X axis direction and a Y stage 275 for moving on the X stage 274 in the Y axis direction . The positional information of the X stage 274 in the X axis direction is measured by the X head 278 constituting the X linear encoder together with the X scale 73 and the position of the Y stage 275 in the Y axis direction Information is measured by the Y head 279 constituting the X linear encoder together with the Y scale 284. [ The position of the carrying stage 270 is controlled on the guide portion 438b independently of the sub-stage 70 by a main controller (not shown).

One of the pair of mask holding devices 130 is fixed to the upper surface of the Y stage 255 and the other is fixed to the upper surface of the Y stage 275. The configuration of the pair of mask holding apparatuses 130 is substantially the same as that of the above-described fifth embodiment, and a description thereof will be omitted. 24, in the mask stage device MSTh, the guide portions 438a and 438b are elongated in the + X and -X directions, respectively, than the guide portion of the fifth embodiment.

Next, the transfer operation of the mask M between the main stage 40 and the mask loader device MLb in the mask stage apparatus MSTh of the sixth embodiment will be described. The transfer operation of the mask M is performed under the control of a main controller (not shown).

When the mask M is transferred to the main stage 40, the main controller moves the mask loader MLb holding the mask M to the mask exchange position as shown in Fig. In the mask loader device MLb, the holding mask is exchanged at a mask exchange position, for example, by a mask transfer device (not shown). Further, the main controller makes the sub-stages 50 and 70 away from the main stage 40 and places them on the + X side with respect to the main stage 40. In the sixth embodiment, a gap sensor and a target (not shown), which are used for measuring the intervals in the X-axis and Y-axis directions of the main stage 40 and the sub-stages 50 and 70, respectively, Is disposed on the + X side of the corresponding target (not shown), contrary to the fourth embodiment (see Fig. 15). Thereby, the sub-stages 50 and 70 can move in the + X direction away from the main stage 40. [

25, the main controller controls the X linear motor to drive the mask loader MLb holding the mask M in the + X direction to move the mask M to the main stage 40 . Subsequently, as shown in Figs. 23A and 23B, the movable member 131 of the mask loader MLb is moved downward, and the mask M is moved downward To the chuck unit (42).

Thereafter, as shown in Fig. 26A, the main controller moves the Y stage 255 to the -Y direction and the Y stage 275 to the + Y direction by controlling the Y linear motor, thereby moving the movable member 131 (The claw member 132) from the mask M (see the arrow in Fig. 26 (A)). Subsequently, the main controller controls the driving device 134 (refer to Fig. 24) so that each of the pair of movable members 131 is pivoted to the bottom of the claw member 132 as shown in Fig. 26 (B) (+ Z direction) up to a position above the upper surface of the stage 40 (see arrows in FIG. 26 (B)).

27, the main controller moves the mask loader device MLb in the -X direction by controlling the X linear motor to position the mask stage at the mask exchange position and sets each of the sub stages 50, X direction, and is positioned on the -Y side and the + Y side of the main stage 40 so as to be replaced with the mask loader device MLb. Thereafter, the main stage 40 and the sub-stages 50 and 70 are connected to each other in a non-contact state (electronically) or in a contact state (mechanically), and the sub- 40 are driven in the X-axis direction, scanning exposure operation is performed. When the main stage 40 moves within the moving range during scanning exposure, each of the sub-stages 50 and 70 is brought into contact with each of the transporting stages 250 and 270 of the mask loader device MLb The lengths of the guide portions 438a and 438b are set.

According to the mask stage apparatus MSTh of the sixth embodiment described above, in addition to the effect obtained by the mask stage apparatus MSTg of the fifth embodiment, the pair of mask holding apparatuses 130 of the mask loader apparatus MLb Stage sub-stages 50 and 70 are driven in the X-axis direction by the carrying stages 250 and 270 which are members different from the sub-stages 50 and 70, respectively, The load of the linear motor for driving the stages 50 and 70 can be reduced. 26A, the pair of mask holding apparatuses 130 of the mask loader apparatus MLb in the mask stage apparatus MSTh according to the sixth embodiment includes the sub stages 50 and 70 But the present invention is not limited to this. For example, the transfer stage may be configured to be movable only in the X-axis direction, and the transfer stage The mask holding device 130 may be configured to be capable of expanding and contracting the connecting member 138 (see Fig. 24) of the holding device 130 in the Y axis direction, or on the stage movable only in the X axis direction, Direction may be driven.

&Quot; Seventh Embodiment &

Next, the seventh embodiment will be described with reference to Figs. 28 to 31. Fig. Here, the constituent parts which are the same as or equivalent to those of the above-described first embodiment are denoted by the same or similar reference numerals as those of the first embodiment, and the description thereof will be simplified or omitted.

28 schematically shows the configuration of the liquid crystal exposure apparatus 3000 of the seventh embodiment. The liquid crystal exposure apparatus 3000 is a step-and-scan type projection exposure apparatus, or a so-called scanner. The liquid crystal exposure apparatus 3000 according to the seventh embodiment is characterized in that the mask stage apparatus MSTi is provided with a cable unit to be described later which is used to supply or supply a pair of sub- The liquid crystal exposure apparatus 10 of the first embodiment differs from the liquid crystal exposure apparatus 10 of the first embodiment in the structure of the other parts. Therefore, the following description will focus on the differences.

In the liquid crystal exposure apparatus 3000 according to the seventh embodiment, as shown in Fig. 28, the sub-stage guides 37a and 37b provided in the mask stage apparatus MSTi are provided with sub- Tubes, etc. (hereinafter collectively referred to as cables 99) or sub-stages 50 and 70 for supplying power, e.g., power, high-pressure gas (for example, compressed air) And a cable unit 300 having the same configuration including cables for transmitting and receiving electric signals between the main controller units is formed.

29 is a side view of the cable unit, and Fig. 30 is a sectional view taken along the line C-C in Fig. 30, the cable unit 300 has a support portion 201 made of a plate-like member having a U-shaped cross section fixed to the X stage 54 of the sub-stage 50. As shown in Fig. A bearing portion 202 formed of a pair of plate members spaced apart in the Y axis direction is fixed to the lower surface of the support portion 201. The bearing portion 202 is formed with a plurality of A pair of rollers 203 are rotatably supported via a pair of rotary shafts 204, each of which is in the Y-axis direction as an axial direction. The cable unit 300 is rotatable on a shaft 205 fixed between a pair of leg portions 39a (each of the + Y side leg portions is covered inside the ground) on the + X side and the -X side And a roller 206 that is supported to be supported by a shaft.

The cable unit 300 includes a cable bundle 99a composed of a plurality of cables 99 disposed on the + X side of the sub-stage 50 and a plurality of cable bundles 99a disposed on the -X side of the sub- And a cable bundle 99b made up of a cable bundle 99. The cable bundles 99a and 99b constituting each of the cable bundles 99a and 99b are arranged apart from each other in the Y axis direction as shown in Fig. As shown in Fig. The cable bundle may be the same as a fused cable in which adjacent cable types are coupled to each other. Each of the plurality of cable bundles 99 constituting the cable bundles 99a and 99b is connected to the Y stage 55 of the sub stage 50 at one end and connected to an external device A main control unit, a gas supply unit, and the like. Although not shown in Figs. 29 and 30, a plurality of cable streams 99 connected to the Y stage 55 are branched on the sub-stage 50, and a part thereof is connected to the X stage 54, And is connected to the main stage 40 (see Fig. 28).

As shown in Fig. 29, the + X side cable bundle 99a is fixed to the + X side leg portion 39a by the fixing member 220 at the middle portion of the other end side (external device side). The cable bundle 99a is fixed to the outer peripheral surface of the roller 206 by a fixing member 220 at an intermediate portion on one end side of the portion fixed to the leg portion 39a. The cable bundle 99a has an intermediate portion on one end side of the portion fixed to the roller 206 to a plurality of fixing members 220 on the outer circumferential surface of the + X side roller 203 out of the pair of rollers 203 Respectively. The area between the portion of the cable bundle 99a fixed to the roller 206 and the portion fixed to the roller 203 is set such that the sub-stage 50 shown in Fig. And is bent downward (stretched by gravity).

30, a region of the cable bundle 99a fixed to the roller 203 is curved in a U-shape as shown in Fig. 30, and the area of the inside of the opening 201a formed in the support portion 201 (One end) thereof is connected to the Y stage 55 through a space. As shown in Fig. 30, a region of the cable bundle 99a at one end side than the portion fixed to the roller 203 is fixed to the supporting portion 201 by the fixing member 220. [ Each of the fixing members 220 is made up of a plurality of members corresponding to the plurality of cables 99 constituting the cable bundle 99a, as shown typically in Fig. Similarly, the -X-side cable bundle 99b is fixed to each of the rollers 203 and 206 at an intermediate portion at two points in the longitudinal direction thereof.

Next, an example of the operation of the cable unit 300 will be described when the sub-stage 50 is moved from the position (central position) shown in FIG. 29 to the + X side. 31, when the sub-stage 50 is moved in the + X direction, the support portion 201 and the bearing portion 202 fixed to the X stage 54 integrally move in the + X direction, The cable bundle 99b having its intermediate portion fixed to the X-side roller 203 is pulled toward the + X side. On the other hand, the + X side cable bundle 99a is further bent down (gravitated by gravity) as the + X side roller 203 and the + X side roller 206 approach each other. At this time, each of the pair of rollers 203 and the pair of rollers 206 is pivoted (rotated by a predetermined amount in the? Y direction) so that the cable bundles 99 constituting the cable bundles 99a and 99b are subjected to large bending Thereby preventing stress from acting. When the sub-stage 50 moves in the -X direction, contrary to the case shown in Fig. 31, the cable bundle 99b is bent downward, and the cable bundle 99a is pulled in the -X direction.

The other parts of the structure of the liquid crystal exposure apparatus 3000 are the same as those of the liquid crystal exposure apparatus 10 of the first embodiment described above and perform the same exposure operation.

As described above, the liquid crystal exposure apparatus 3000 of the seventh embodiment is the same as the liquid crystal exposure apparatus 3000 of the first embodiment described above, except that the cable unit 300 is formed on the mask stage apparatus MSTi. (10), an equivalent effect can be obtained. In addition, in the mask stage apparatus MSTi included in the liquid crystal exposure apparatus 3000 of the seventh embodiment, the cable system 99 for transferring the power between the sub-stages 50, Each of the cable bundles 99a and 99b including the bundles 99a and 99b is configured such that the area between the parts fixed to the rollers 203 and 206 is bent downward by the action of gravity in accordance with the movement of the sub stages 50 and 70, It is possible to prevent generation of dust or vibration due to sliding of the cable 99 with other members. Therefore, the cable unit 300 according to the seventh embodiment can be applied to a device used in a clean room or a device which requires position control of a moving object with high precision, such as a liquid crystal exposure apparatus 3000 (see Fig. 28) . When the cable bundles 99a and 99b are bent downward or are pulled in the horizontal direction, the rollers 203 and 206 rotate so that the cables 99 constituting the cable bundles 99a and 99b It is possible to avoid the trouble that the tube is bent and the tube is closed, for example. The cable unit 300 according to the seventh embodiment is lightweight because it does not have a member for supporting the middle portion of the cable 99, and maintenance such as replacement work of the cable 99 is easy.

&Quot; Eighth embodiment "

Next, the mask stage apparatus of the liquid crystal exposure apparatus of the eighth embodiment will be described. The liquid crystal exposure apparatus of the eighth embodiment differs from the seventh embodiment only in the structure of the mask stage apparatus, and therefore only the structure of the mask stage apparatus will be described below. 32 is a side view of the mask stage apparatus MSTj according to the eighth embodiment viewed from the -Y side. The mask stage device MSTj according to the eighth embodiment differs from the mask stage device MSTi according to the seventh embodiment in the configuration of the cable unit. For the sake of simplicity and ease of illustration, constituent parts which are the same as or equivalent to those of the seventh embodiment are denoted by the same reference numerals as those of the first embodiment, and the description thereof is omitted.

In the cable unit 300a according to the eighth embodiment, a pair of X linear guide members 93 spaced in the Y axial direction are fixed to the lower surface of the guide portion 38a with the X axial direction being the longitudinal direction (The + Y side X linear guide member is hidden inside the ground). On the downward (-Z side) of the guide portion 38a, a movable portion 210 made of a plate-like member parallel to the XY plane in which the X-axis direction is the longitudinal direction is disposed. At the four corners of the upper surface of the movable portion 210, a slider 211 having a U-shaped cross section is fixed (two sliders on the + Y side are hidden inside the ground). The two sliders 211 on the + Y side are slidably engaged with the -Y side X linear guide member 93 and the two sliders 211 on the + Y side are engaged with the + Y side X linear guide member 93, As shown in Fig.

A bearing portion 212 (a + Y side plate-shaped member is hidden inside the drawing), which is a pair of plate members separated in the Y-axis direction, is fixed to the lower surface of the end portion on the + X side of the movable portion 210, , The roller 213 is rotatably supported via a rotation shaft 214 whose axial direction is the Y axis direction. The substantially central portion of the area between the portion of the cable bundle 99a fixed to the roller 203 and the portion fixed to the roller 206 is fixed to the roller 213 via the fixing member 220 . A bearing portion 212 is similarly fixed to a lower end of the movable portion 210 on the -X side and a roller 213 is rotatably supported on the bearing portion 212 via a rotation shaft 214. [ The cable bundle 99b is fixed to the roller 213 via a fixing member 220 at a substantially central portion of a region between a portion fixed to the roller 203 and a portion fixed to the roller 206. [ Therefore, the pair of rollers 213 move integrally in the X-axis direction.

Each of the pair of bearing portions 212 is rotatably supported by a pulley 216 through a rotary shaft 215 whose axial direction is the Y-axis direction. A rope 217 is wound around the -X side pulley 216. One end of the rope 217 is fixed to the + X side leg portion 39a and the other end thereof is fixed to the -X side end portion of the bearing portion 202. [ 32, the rope 218 is wound around the + X side pulley 216 in the same manner as in the drawing. One end of the rope 218 is fixed to the -X side leg portion 39a and the other end is fixed to the + X side end portion of the bearing portion 202. [

33, when the sub-stage 50 is moved in the + X direction, the bearing portion 212 for supporting the -X side sheave 216 on which the rope 217 is wound is supported by the cable unit 300a, It is pulled by the rope 217 and moves in the + X direction. At this time, the pulley 216 functions as a movable sheave, and the bearing portion 212 follows the sub-stage 50 at the half speed of the sub-stage 50. Further, the + X side bearing portion 212 also moves to the + X side at the half speed of the sub-stage 50. Similarly to the cable unit 300 according to the seventh embodiment, in the cable unit 300a according to the eighth embodiment, the middle portion of the cable bundles 99a and 99b moves downward as the sub-stage 50 moves (Stretched) or stretched in the horizontal direction, the same effect as in the cable unit according to the seventh embodiment can be obtained.

Here, in the cable unit 300a, since the cable bundles 99a and 99b are in a state in which the middle portion thereof is stretched, the cable bundles 99a and 99b constituting the cable bundles 99a and 99b Tension is applied by. Since the horizontal component of the tension acting on the cable flow 99 tries to move the sub-stage 50 in the X-axis direction, there is a possibility that the position control with respect to the X-axis direction of the sub-stage 50 becomes difficult. More specifically, as shown in FIG. 33, when the sub-stage 50 is located on the + X side of the guide portion 38a, the tension acting on the + X side cable bundle 99a is substantially in the Z axis direction The force to move the horizontal component, that is, the sub-stage 50 in the + X direction is small. On the other hand, since the -X side cable bundle 99b is substantially parallel to the X axis, the horizontal component of the tension due to its own weight becomes larger than the horizontal component of the tension acting on the cable bundle 99a. Due to the difference in horizontal component of the tension, a force for moving the sub-stage 50 in the -X direction acts. However, in the cable unit 300a according to the eighth embodiment, the cable bundles 99a and 99b are supported by three points (rollers 203, 206 and 213), respectively, and the rollers 203 and 213 The length of the cable bundles 99a and 99b between the roller 213 and the roller 206 is short and the horizontal component of the tension is also small as the weight of the cable bundles 99a and 99b becomes smaller. Therefore, the influence on the position control of the sub-stage 50 in the X-axis direction can be reduced.

Since the bearing portion 212 for rotatably supporting each of the pair of rollers 213 follows the sub-stage 50 at half the speed of the sub-stage 50, 203 and the roller 206. In this case, Further, since the bearing portion 212 follows the sub-stage 50 by using the pulley 216 and the ropes 217 and 218, the structure is simple. Further, since the amount of bending (amount of sagging due to gravity) of the cable bundle downward can be made smaller than that of the seventh embodiment, the space in the Z-axis direction can be reduced and the space of the apparatus can be saved (the legs can be short) .

&Quot; Ninth embodiment "

Next, the mask stage apparatus MSTk according to the ninth embodiment will be described. 34 is a side view of the mask stage apparatus MSTk according to the ninth embodiment viewed from the -Y side. The mask stage device MSTk according to the ninth embodiment differs from the mask stage device MSTj according to the eighth embodiment in the support structure of the pair of rollers 213. [ For the sake of simplicity and ease of illustration, the same reference numerals as those of the seventh and eighth embodiments are used for the same or equivalent components as those of the seventh and eighth embodiments, and the description thereof is omitted.

In the cable unit 300b of the mask stage device MSTk according to the ninth embodiment, each of the pair of rollers 213 has a bearing portion 212b (a pair of plate members) And the Y-side plate-shaped member is covered inside the ground). Each of the pair of bearing portions 212b is connected to each of the pair of movable members 221 disposed above the guide portion 38a. A pair of movable members 221 are formed on the + X side and the -X side of the sub-stage 50, respectively. A pair of movable sliders 222 each having an inverted U-shaped cross section engageable with a pair of X linear guide members 51 fixed to the guide portion 38a in a slidable manner are provided on the lower surface of each of the pair of movable members 221 (The + Y side X linear guide member and the slider are not shown). The pair of bearing portions 212b are connected by a connecting member 223 and move integrally with respect to the X-axis direction.

A pulley 216 is mounted on each of the pair of bearing portions 212b through a rotary shaft 215 as in the eighth embodiment. A rope 224 is wound around each of the pair of pulleys 216. Each of the pair of ropes 224 has one end fixed to the lower center portion of the guide portion 38a and the other end fixed to the support portion 201. [

35, similarly to the eighth embodiment, when the sub-stage 50 is driven in the X-axis direction, the cable unit 300b according to the ninth embodiment also has a pair of bearing portions 212b Is trained by the rope 224 and moves following the sub-stage 50 at a moving speed of half the sub-stage 50. The cable unit 300b according to the ninth embodiment includes a pair of bearing portions 212b using an X linear guide member 51 for guiding the X stage 54 of the sub- The amount of movement of the sub-stage 50 in the X direction is limited as compared with the cable unit 300a according to the eighth embodiment.

The configuration of the cable unit according to each of the seventh to ninth embodiments is merely an example. For example, in the cable units in each of the seventh to ninth embodiments, the middle portion of the cable flow is fixed to the outer peripheral surface of the roller made of a cylindrical member, but the member in which the cable flow is fixed (Swinging) around the rotation axis at a predetermined angle,? Y direction, respectively, so that it does not have to be a cylindrical member. 36 shows a modification of the cable unit of the seventh embodiment. 36, the cable bundle 99b includes a support member 230 including a plate-like member having a circular arc shape and rotatably supported around the rotation axis 205, (In Fig. 36, the -Y side plate member among the pair of plate members constituting the -Y side leg portion 39a and the bearing portion 202 is omitted). It is also possible to use the support member 230 shown in Fig. 36 instead of the rollers 213 (see Figs. 32 and 34, respectively) of the eighth and ninth embodiments.

In the eighth and ninth embodiments, the bearing portions 212 and 212b (see Figs. 32 and 34, respectively) are pulled by the support portion 201 (i.e., the sub-stage 50) However, the method of moving the bearing portions 212 and 212b in the X-axis direction is not limited to this. For example, a method of driving a feed screw, But may be driven independently of the sub-stage by a driving method such as linear motor driving and belt driving.

In the eighth and ninth embodiments, the bearing portions 212 and 212b (see Figs. 32 and 34, respectively) are each formed on the + X side and the -X side of the substage, But may be formed on each of the + X side and the -X side of the sub-stage, for example, two or more, depending on the length of the X guide (that is, the moving stroke of the sub-stage).

The above-described first to ninth embodiments may be appropriately combined, except for cases where it is unreasonable to combine them in terms of their properties. For example, the fourth to ninth embodiments may be combined with the second embodiment described above. That is, in the fourth to ninth embodiments, a masking blade apparatus (masking system) may be formed.

In each of the first to ninth embodiments described above (hereinafter, referred to as each embodiment), the pair of XVCM and YVCM is of the moving magnet type, but the present invention is not limited to this, and it may be a moving coil type. The linear motors included in the exposure apparatus of each of the above-described embodiments may be either a moving magnet type or a moving coil type, and the driving method thereof is not limited to the Lorentz force driving type, It may be out of the way. In the above-described embodiments, the pair of sub-stages is driven by the linear motor. However, the method (actuator) for driving the pair of sub-stages is not limited to this. For example, Belt drive or the like.

In each of the above-described embodiments, the pair of sub-stages is an XY two-dimensional stage device having two stages of an X stage and a Y stage mounted on an X stage, but the present invention is not limited thereto, Each of the sub stages may be a single stage driven in the XY two-dimensional direction by, for example, a plane motor or the like.

In the above-described embodiments, the case where the mask stage device for holding the light-transmitting mask is a mobile device has been described. However, the present invention is not limited thereto. For example, the substrate (or wafer) The stage device guiding the stage may be a mobile device.

In each of the above embodiments, the illumination light is an ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum laser light such as F 2 laser light (wavelength 157 nm) External light may be used. As the illumination light, for example, a single-wavelength laser light oscillated from a DFB semiconductor laser or a fiber laser or an ultraviolet or visible laser light is amplified by a fiber amplifier doped with, for example, erbium (or erbium and ytterbium) And harmonics converted into ultraviolet light by using nonlinear optical crystals may be used. Further, a solid laser (wavelength: 355 nm, 266 nm) or the like may be used.

In the above-described embodiment, the case where the projection optical system PL is a multi-lens type projection optical system having a plurality of optical systems has been described. However, the number of projection optical systems is not limited to this. In addition, the present invention is not limited to a projection optical system of a multi-lens type, and may be, for example, a projection optical system using an opener type large-size mirror.

In the above-described embodiment, the case where the projection magnification is the enlargement magnification is used as the projection optical system PL. However, the present invention is not limited to this, and the projection optical system may be either an equi-magnification system or a reduction magnification system.

The exposure apparatus according to each of the above embodiments exposes a large substrate for a flat panel display (FPD) such as a substrate having a size (including at least one of outer diameter, diagonal line, and one side) of 500 mm or more, It is particularly effective to apply the present invention to an exposure apparatus that performs exposure. This is because the exposure apparatus of each of the above-described embodiments is configured to cope with the enlargement of the substrate.

In the above embodiments, the description has been given of a case where the present invention is applied to a projection exposure apparatus that performs scanning exposure with a step-and-scan operation of a plate. However, the present invention is not limited to this, Or a proximity type exposure apparatus that does not use a projection optical system. The exposure apparatus of each of the above embodiments may be a step-and-repeat exposure apparatus (so-called stepper) or a step-and-stitch exposure apparatus.

In each of the above embodiments, a light-transmitting mask in which a predetermined light-shielding pattern (or a phase pattern / light-shielding pattern) is formed on a light-permeable mask substrate is used. Instead of this mask, for example, US Pat. No. 6,778,257 (Variable mold mask) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed, for example, a non-light emission type image display element A variable shape mask using a DMD (Digital Micro-mirror Device), which is a type of a spatial light modulator (also called a spatial light modulator), may be used.

The use of the exposure apparatus is not limited to a liquid crystal exposure apparatus that transfers a liquid crystal display element pattern to a rectangular glass plate. For example, an exposure apparatus for semiconductor manufacturing, a thin film magnetic head, a micromachine, a DNA chip, The present invention can be widely applied to exposure apparatuses. In order to manufacture masks or reticles used in not only microdevices such as semiconductor devices but also optical exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, and electron beam exposure apparatuses, a circuit pattern is transferred onto a glass substrate or a silicon wafer It is also applicable to an exposure apparatus. Further, the object to be exposed is not limited to the glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or a mask blank, for example.

As an exposure apparatus for transferring a circuit pattern to a silicon wafer or the like, for example, an immersion type exposure apparatus filled with a liquid between a projection optical system and a wafer, as disclosed in U.S. Patent Application Publication No. 2005/0259234, etc., may be used.

Also, as disclosed in, for example, International Publication No. 2001/035168, it is possible to apply to an exposure apparatus (lithography system) that forms a line-and-space pattern on a wafer by forming an interference fringe on the wafer have.

The mobile device according to each of the above-described embodiments is not limited to the exposure device, and may be applied to an element manufacturing apparatus provided with, for example, an ink jet type functional liquid applying device.

In addition, all of the publications relating to the exposure apparatus and the like cited in the foregoing description, the international publication publication, the United States patent application publication specification and the United States patent specification publication are referred to as a part of the description herein.

&Quot; Device manufacturing method &

Next, a manufacturing method of a microdevice using the exposure apparatus of each of the above embodiments in the lithography process will be described. In the exposure apparatus of each of the above embodiments, a liquid crystal display element as a microdevice can be obtained by forming a predetermined pattern (a circuit pattern, an electrode pattern, or the like) on a plate (glass substrate).

<Pattern Forming Step>

First, a so-called photolithography process is performed by using the exposure apparatus of each of the above-described embodiments to form a pattern image on a photosensitive substrate (e.g., a glass substrate coated with a resist). By this photolithography process, a predetermined pattern including a plurality of electrodes or the like is formed on the photosensitive substrate. Thereafter, the exposed substrate is subjected to respective steps such as a developing step, an etching step, a resist removing step, and the like, so that a predetermined pattern is formed on the substrate.

&Lt; Color filter forming step &

Next, a plurality of three dot sets corresponding to R (Red), G (Green) and B (Blue) are arrayed in a matrix, or three sets of stripes of R, G and B are arranged in a plurality of horizontal scanning line directions To form a color filter.

<Cell assembly process>

Subsequently, a liquid crystal panel (liquid crystal cell) is assembled by using a substrate having a predetermined pattern obtained in the pattern forming step, and a color filter or the like obtained in the color filter forming step. For example, a liquid crystal panel (liquid crystal cell) is manufactured by injecting liquid crystal between a substrate having a predetermined pattern obtained in a pattern forming process and a color filter obtained in a color filter forming process.

<Module assembly process>

Thereafter, each component such as an electric circuit and a backlight for performing the display operation of the assembled liquid crystal panel (liquid crystal cell) is mounted to complete the liquid crystal display device.

In this case, in the pattern forming step, the exposure of the plate is performed with high accuracy and high throughput by using the exposure apparatus of each of the embodiments, and consequently, the productivity of the liquid crystal display element can be improved as a result.

Industrial availability

INDUSTRIAL APPLICABILITY As described above, the mobile device of the present invention is suitable for moving a moving body along a predetermined two-dimensional plane. In addition, the power transmission device of the present invention is suitable for carrying power transmission between a moving body and an external device along a predetermined two-dimensional plane. Further, the exposure apparatus of the present invention is suitable for forming a pattern on an object by exposure. Further, the device manufacturing method of the present invention is suitable for producing micro devices.

Claims (93)

  1. A first moving body movable along a two-dimensional plane including a first axis and a second axis orthogonal to each other;
    A second moving body disposed on one side of the first moving body with respect to a direction parallel to the first axis and movable at a predetermined stroke in at least a direction parallel to the second axis;
    A third moving body disposed on the other side of the first moving body with respect to a direction parallel to the first axis and movable at least by a predetermined stroke in a direction parallel to the second axis;
    A first driving system for driving the second and third moving bodies together in a direction parallel to the second axis;
    And a state setting device for switching setting between a first state in which the first to third moving bodies are integrally driven and a second state in which the first to third moving bodies are integrally unusable.
  2. The method according to claim 1,
    Wherein the state setting device includes a connecting device for connecting the first mobile body to each of the second and third mobile bodies in a noncontact state.
  3. 3. The method of claim 2,
    And a non-contact driving system that drives the first moving body in a non-contact state with respect to the second and third moving bodies in a direction parallel to the first axis.
  4. The method of claim 3,
    And the non-contact driving system guides the first moving body in the same direction as the second and third moving bodies.
  5. 5. The method of claim 4,
    And a second driving system for driving the second and third moving bodies together in a direction parallel to the first axis.
  6. 6. The method according to any one of claims 3 to 5,
    Wherein the non-contact driving system includes a stator formed in the second moving body, and a mover formed in the first moving body, and generates a driving force in a direction parallel to the first axis by an electromagnetic force, A mobile device having an electronic actuator.
  7. The method according to claim 6,
    The first electromagnetic actuator has a coil unit in which the stator includes a coil, and the movable element has a magnet unit including a magnet.
  8. The method according to claim 6,
    The first electromagnetic actuator applies a driving force to the first moving body in a plane parallel to the two-dimensional plane including the center-of-gravity position of the first moving body.
  9. 6. The method according to any one of claims 3 to 5,
    The connecting device includes a stator formed on each of the second and third moving bodies, and a second electromagnetic actuator having a mover formed on the first moving body, and generates a driving force in a direction parallel to the second axis by an electromagnetic force And guides the first moving body in a direction parallel to the second axis.
  10. 10. The method of claim 9,
    The second electromagnetic actuator has a coil unit in which the stator includes a coil, and the movable element has a magnet unit including a magnet.
  11. 10. The method of claim 9,
    The second electromagnetic actuator applies a driving force to the first moving body in a plane parallel to the two-dimensional plane including the center-of-gravity position of the first moving body.
  12. 3. The method of claim 2,
    Each of the second and third moving bodies is movable in a predetermined stroke in a direction parallel to the first axis,
    And a second driving system for driving the second and third moving bodies together in a direction parallel to the first axis.
  13. 13. The method of claim 12,
    The connecting device includes a stator formed on each of the second and third moving bodies and a mover formed on the first moving body and generates a driving force in a direction parallel to the first and second shafts by an electromagnetic force And an electromagnetic actuator for guiding the first moving body in a direction parallel to the first and second axes.
  14. 14. The method of claim 13,
    Wherein the electromagnetic actuator has a coil unit in which the stator includes a coil, and the movable element has a magnet unit including a magnet.
  15. 14. The method of claim 13,
    Wherein the electromagnetic actuator applies a driving force to the first moving body in a plane parallel to the two-dimensional plane including a center-of-gravity position about a direction orthogonal to the two-dimensional plane of the first moving body.
  16. 16. The method according to any one of claims 13 to 15,
    Wherein the electromagnetic actuator is configured to move the first moving body in the direction parallel to the first axis with respect to the second and third moving bodies using a driving force in a direction parallel to the first axis generated by the electromagnetic actuator Contact driving system that is driven in a state that the movable body is in a state of being moved.
  17. The method according to claim 1,
    The state setting device includes a connecting device having a movable member movable between a first position for connecting the first to third moving bodies and a second position for bringing the first to third moving bodies into a noncontact state with each other , A mobile device.
  18. 18. The method of claim 17,
    Wherein said state setting device further comprises a connecting device for connecting said first mobile body to each of said second and third mobile bodies in a non-contact state.
  19. 19. The method of claim 18,
    The connecting device includes a stator formed on each of the second and third moving bodies and a mover formed on the first moving body and generates a driving force in a direction parallel to the second axis by an electromagnetic force, And an electromagnetic actuator for guiding the movable member in a direction parallel to the second axis.
  20. 20. The method of claim 19,
    Wherein the electromagnetic actuator applies a driving force to the first moving body in a plane parallel to the two-dimensional plane including the center-of-gravity position of the first moving body.
  21. 21. The method according to any one of claims 17 to 20,
    Wherein the connection device connects the first to third moving bodies in a plane parallel to the two-dimensional plane including a center-of-gravity position of the first moving body.
  22. 21. The method according to any one of claims 17 to 20,
    And the movable member moves in a direction orthogonal to the two-dimensional plane.
  23. 21. The method according to any one of claims 17 to 20,
    Wherein the connecting device has an engaging member including a spherical member and a recess having a tapered surface and the spherical member and the engaging member are brought close to each other through the movable member so that the spherical member is fitted to the recessed portion And the first to third moving bodies are connected to each other so that the spherical member and the engaging member are separated from each other through the movable member so that the first to third moving bodies can move relatively.
  24. 21. The method according to any one of claims 17 to 20,
    The connection device connects the first moving body and the second moving body at a plurality of points and connects the first moving body and the third moving body at a plurality of points.
  25. 21. The method according to any one of claims 17 to 20,
    And the movable member is formed on each of the second and third moving bodies.
  26. 21. The method according to any one of claims 17 to 20,
    And a second driving system for driving the second and third moving bodies together in a direction parallel to the first axis.
  27. 21. The method according to any one of claims 17 to 20,
    And a non-contact driving system that drives the first moving body in a non-contact state with respect to the second and third moving bodies in a direction parallel to the first axis.
  28. 21. The method according to any one of claims 17 to 20,
    Further comprising a restriction device for restricting a relative movable range of the first movable body with respect to the second movable body and the third movable body by causing the first movable body to abut on the second movable body and the third movable body, .
  29. 29. The method of claim 28,
    Wherein the restriction device brings the first moving body into contact with each of the second moving body and the third moving body in a plane parallel to the two-dimensional plane including the center-of-gravity position of the first moving body.
  30. 29. The method of claim 28,
    Wherein the restriction device has a buffer member on an abutment surface of each of the first moving body and the second moving body and the third moving body.
  31. A first moving body movable along a two-dimensional plane including first and second axes orthogonal to each other;
    A second moving body disposed on one side of the first moving body with respect to a direction parallel to the first axis and movable at a predetermined stroke in at least a direction parallel to the second axis;
    A third moving body disposed on the other side of the first moving body with respect to a direction parallel to the first axis and movable at least by a predetermined stroke in a direction parallel to the second axis;
    A first driving system for driving the second and third moving bodies together in a direction parallel to the second axis;
    A connecting device for connecting the first moving body to each of the second and third moving bodies in a non-contact state;
    A first position for restricting a relative movable range of the first moving body and the second and third moving bodies to a predetermined range and a second position for limiting a relative movement exceeding the predetermined range of the first moving body and the second and third moving bodies And a second position permitting movement of the movable member.
  32. 32. The method of claim 31,
    Wherein the restriction device brings the first moving body into contact with each of the second moving body and the third moving body in a plane parallel to the two-dimensional plane including the center-of-gravity position of the first moving body.
  33. 33. The method of claim 32,
    Wherein the restriction device has a buffer member on an abutment surface of each of the first moving body and the second moving body and the third moving body.
  34. 34. The method according to any one of claims 31 to 33,
    And the movable member is formed on each of the second and third moving bodies.
  35. 34. The method according to any one of claims 31 to 33,
    Wherein the connecting device includes a stator formed on each of the second and third moving bodies and a mover formed on the first moving body and generates a driving force in a direction parallel to the second axis by an electromagnetic force, And an electromagnetic actuator for guiding the movable member in a direction parallel to the second axis.
  36. 36. The method of claim 35,
    Wherein the electromagnetic actuator applies a driving force to the first moving body in a plane parallel to the two-dimensional plane including the center-of-gravity position of the first moving body.
  37. 34. The method according to any one of claims 31 to 33,
    And a non-contact driving system that drives the first moving body in a non-contact state with respect to the second and third moving bodies in a direction parallel to the first axis.
  38. 39. The method of claim 37,
    And a second driving system for driving the second and third moving bodies together in a direction parallel to the first axis,
    Wherein the non-contact driving system guides the first moving body in the same direction as the second and third moving bodies when the second and third moving bodies are driven in a direction parallel to the first axis by the second driving system , A mobile device.
  39. 34. The method according to any one of claims 31 to 33,
    Further comprising a connecting device having a movable member movable between a third position for connecting the first to third moving bodies and a fourth position for bringing the first to third moving bodies into noncontact state with each other.
  40. 34. The method according to any one of claims 1 to 5 and 31 to 33,
    A first sensor for measuring information about an interval between the first moving body and the second moving body;
    Further comprising a second sensor for measuring information about an interval between the first mobile body and the third mobile body,
    Wherein the first moving body is controlled in position with respect to the second and third moving bodies based on the measurement values of the first and second sensors.
  41. 34. The method according to any one of claims 1 to 5 and 31 to 33,
    Wherein each of the second and third moving bodies has a scale that makes a direction parallel to each of the first and second axes in a periodic direction and a position in the two dimensional plane of each of the second and third moving bodies using the scale Wherein a position in the two-dimensional plane is controlled based on a measurement value of a first measuring device including a head for measuring a position of the first measuring device.
  42. 42. The method of claim 41,
    Wherein the first measuring device includes the scale disposed on one side of each of the second and third moving bodies and the outside of the second and third moving bodies and the scale disposed on one side of each of the second and third moving bodies, And the head disposed on the other side with respect to the outside of the third moving body.
  43. 43. The method of claim 42,
    Wherein the scale is formed in each of the second and third moving bodies,
    And the head is formed outside the second and third moving bodies.
  44. 34. The method according to any one of claims 1 to 5 and 31 to 33,
    Wherein the first moving body is non-contact-supported on a guide member having a guide surface parallel to the two-dimensional plane.
  45. 34. The method according to any one of claims 1 to 5 and 31 to 33,
    A second measuring device for irradiating a reflecting surface formed on the first moving body with a spot beam and measuring position information in the two-dimensional plane of the first moving body separately from the second and third moving bodies based on the reflected beam, Further,
    Wherein the reflecting surface is formed on the inner side of the outer surface of the first moving body.
  46. 46. The method of claim 45,
    Wherein the second measuring device includes a laser interferometer system.
  47. 47. The method of claim 46,
    Wherein the first moving body has an opening portion opened to the outer side surface,
    Wherein the reflecting surface is formed in the opening of the first moving body,
    And the measurement beam is irradiated to the reflecting surface through the opening.
  48. 47. The method of claim 46,
    Further comprising a positioning device for positioning the first moving body at a measurement origin position of the laser interferometer system.
  49. 49. The method of claim 48,
    Wherein the positioning device comprises: a positioning member including a concave portion having a tapered surface formed on one side of the first moving body and the predetermined fixing member; and a positioning member formed on the other side of the first moving body and the fixing member, And a spherical portion that is formed to be movable in a direction to approach and separate from the positioning member and guides the first moving member to the position by sliding on the tapered surface when approaching the positioning member.
  50. 50. The method of claim 49,
    Wherein at least two positioning apparatuses are provided.
  51. An exposure apparatus for exposing an object with an energy beam through a pattern and transferring the pattern to the object,
    A moving body device according to any one of claims 1 to 5 and 31 to 33 wherein one of the pattern holding body having the pattern and the object is held by the first moving body;
    And a holding device for holding the pattern holding body and the other of the object.
  52. 52. The method of claim 51,
    Wherein the pattern holding body is held by the first moving body,
    Wherein the object is held in the holding device.
  53. 53. The method of claim 52,
    A light shielding member interposed between the second and third moving bodies for shielding a part of the energy beam irradiated on the pattern retention member to restrict a range of irradiation of the energy beam on the pattern surface of the pattern retention member; The exposure apparatus further comprising:
  54. 54. The method of claim 53,
    And the light shielding member is movable in a direction parallel to the second axis on the second and third moving bodies.
  55. 54. The method of claim 53,
    Wherein a plurality of the light shielding members are formed so as to be spaced apart in a direction parallel to the second axis.
  56. 53. The method of claim 52,
    And the second and third moving bodies move on a pair of supporting members separate from the structural member that supports the holding device.
  57. 57. The method of claim 56,
    Wherein the pair of support members is fixed to a member disposed above the structural member.
  58. 53. The method of claim 52,
    Further comprising a transfer device mounted on at least one of said second and third moving bodies for transferring the pattern holding bodies to and from each other with respect to said first moving body.
  59. 59. The method of claim 58,
    The transfer device includes a first holding device mounted on the second moving body and holding one side of the pattern holding body in a direction parallel to the first axis, and a second holding device mounted on the three moving bodies, And a second holding device for holding the other side in a direction parallel to the first axis.
  60. 59. The method of claim 58,
    And the second and third moving bodies are located at an exchange position where the first driving system moves away from the first moving body and is driven in the second axial direction to thereby exchange the pattern holding body to be held.
  61. 59. The method of claim 58,
    Wherein the transfer device is formed in a non-contact state with the first moving body.
  62. 53. The method of claim 52,
    A first guide member for guiding movement of the second moving body in a direction parallel to the second axis;
    A second guide member for guiding movement of the third moving body in a direction parallel to the second axis;
    A fourth moving body disposed on one side of the first guide member in a direction parallel to the second axis with respect to the second moving member and movable in a direction parallel to the second axis on the first guide member;
    A second guide member disposed on one side in a direction parallel to the second axis with respect to the third moving member on the second guide member and movable in a direction parallel to the second axis on the second guide member, A fifth moving body that is driven independently of the second and third moving bodies in a direction parallel to the second axis together with the fourth moving body;
    A first holding device mounted on the fourth moving body and holding one side of the pattern holding body in a direction parallel to the first axis, and a second holding device mounted on the fifth moving body and parallel to the first axis of the pattern holding body And a second holding device for holding the other side in one direction, and further comprising a transfer device for transferring the pattern holding bodies to / from each other with respect to the first moving body.
  63. An exposure apparatus for exposing an object with an energy beam through a pattern and transferring the pattern to the object,
    A moving body device according to any one of claims 31 to 33, wherein a pattern holding body having the pattern and one side of the object are held by the first moving body;
    A holding device for holding the pattern holding body and the other of the object;
    A first guide member for guiding movement of the second moving body in a direction parallel to the second axis;
    A second guide member for guiding movement of the third moving body in a direction parallel to the second axis;
    A fourth moving member disposed on one side of the first guide member in a direction parallel to the second axis with respect to the second moving member, the first moving member being movable in a direction parallel to the second axis;
    The second guide member being disposed on one side of the second guide member in a direction parallel to the second axis with respect to the third moving member and being movable in a direction parallel to the second axis, A fifth moving body that is driven independently of the second and third moving bodies in a direction parallel to the second axis together with the fourth moving body;
    A first holding device mounted on the fourth moving body and holding one side of the pattern holding body in a direction parallel to the first axis, and a second holding device mounted on the fifth moving body and parallel to the first axis of the pattern holding body And a second holding device for holding the other side in one direction, and a transfer device for transferring the pattern holding bodies to / from each other with respect to the first moving body,
    Wherein the first driving system drives the second and third moving bodies to position the first moving body on the other side in a direction parallel to the second axis in a state where the movable member is located at the second position And drives the fourth and fifth moving bodies to the other side in a direction parallel to the second axis to position the first moving body and the pattern holding body at a position where the transfer is performed.
  64. An exposure apparatus for exposing an object with an energy beam through a pattern and transferring the pattern to the object,
    A main stage capable of holding a pattern holding body having the pattern and moving along a two-dimensional plane including a first axis and a second axis orthogonal to each other while holding one side of the object;
    A pair of sub-stages arranged at one side and the other side of the main stage with respect to a direction parallel to the first axis and movable at least in a direction parallel to the second axis;
    A first driving system for driving the pair of sub-stages in a direction parallel to the second axis;
    A state setting device for switching and setting a first state in which the main stage and the pair of sub stages are integrally driven and a second state in which the main stage and the pair of sub stages are incapable of being integrally driven;
    And a holding device for holding the pattern holding body and the other of the object.
  65. 65. The method of claim 64,
    The pattern holding body is held on the main stage,
    Wherein the object is held in the holding device.
  66. 66. The method of claim 65,
    Wherein the state setting device includes a coupling device for connecting the main stage to each of the pair of sub-stages in a non-contact state.
  67. 67. The method of claim 66,
    And a non-contact driving system for driving the main stage in a non-contact state with respect to the pair of sub-stages in a direction parallel to the first axis.
  68. 66. The method of claim 65,
    Wherein said state setting device comprises a movable member movable between a first position for connecting said main stage and said pair of sub-stages and a second position for bringing said main stage and said pair of sub- And a connecting device having a light emitting element.
  69. 69. The method of claim 68,
    Wherein said state setting device further comprises a connecting device for connecting said main stage to each of said pair of sub-stages in a non-contact state.
  70. 71. The method according to any one of claims 64 to 69,
    A light shielding member sandwiched between the pair of sub stages and shielding a part of the energy beam irradiated to the pattern retention member to limit a range in which the energy beam is irradiated on the pattern surface of the pattern retention member Further comprising:
  71. 71. The method according to any one of claims 64 to 69,
    Further comprising a transfer device mounted on at least one of the pair of sub-stages, for transferring the pattern holding body to / from the main stage.
  72. An exposure apparatus for exposing an object with an energy beam through a pattern and transferring the pattern to the object,
    A main stage capable of holding a pattern holding body having the pattern and moving along a two-dimensional plane including a first axis and a second axis orthogonal to each other while holding one side of the object;
    A pair of sub-stages arranged at one side and the other side of the main stage with respect to a direction parallel to the first axis and movable at least in a direction parallel to the second axis;
    A first driving system for driving the pair of sub-stages in a direction parallel to the second axis;
    A coupling device for connecting the main stage to each of the pair of sub-stages in a non-contact state;
    A first position for restricting a relative movable range of the main stage and the pair of sub-stages to a predetermined range and a second position for permitting a relative movement of the main stage and the pair of sub- A restriction device having a movable member movable between positions;
    And a holding device for holding the pattern holding body and the other of the object.
  73. 73. The method of claim 72,
    The pattern holding body is held on the main stage,
    Wherein the object is held in the holding device.
  74. 73. The method of claim 72 or 73,
    A light shielding member sandwiched between the pair of sub stages and shielding a part of the energy beam irradiated to the pattern retention member to limit a range in which the energy beam is irradiated on the pattern surface of the pattern retention member Further comprising:
  75. 73. The method of claim 72 or 73,
    Further comprising a transfer device mounted on at least one of the pair of sub-stages, for transferring the pattern holding body to / from the main stage.
  76. An exposure apparatus for exposing an object placed on a second surface with an enlarged image of the pattern formed through a projection optical system having an enlargement magnification by irradiating an energy beam to a pattern disposed on the first surface,
    A main stage which holds the patterned mask and is movable along a two-dimensional plane including a first axis and a second axis orthogonal to each other;
    A pair of sub-stages arranged on one side and the other side of the main stage with respect to a direction parallel to the first axis, the sub stages being integrally movable with the main stage;
    A projection optical system having a plurality of enlargement magnifications in which projection areas of enlarged images of the pattern are arranged at predetermined intervals with respect to a direction parallel to the first axis;
    And a light shielding member sandwiched between the pair of sub-stages and shielding a part of the energy beam irradiated to the mask so as to limit a range in which the energy beam is irradiated on the pattern surface of the mask, Device.
  77. 80. The method of claim 76,
    Wherein the pair of sub stages moves integrally with the main stage with respect to a direction parallel to the first axis by a distance corresponding to an interval between two adjacent projection areas of the plurality of projection areas on the object, Exposure apparatus.
  78. 78. The method of claim 76 or claim 77,
    A plurality of band-shaped regions extending in a direction parallel to the second axis are formed at predetermined intervals in a direction parallel to the first axis on the pattern surface of the mask, and the plurality of band- A part of a mask pattern for forming a first pattern on the object and a part of a mask pattern for forming a second pattern different from the first pattern on the object are arranged in a direction parallel to the first axis Respectively,
    Wherein the pair of sub-stages moves integrally with the main stage with respect to a direction parallel to the first axis equal to or greater than an interval between adjacent ones of the plurality of band-shaped regions.
  79. 78. The method of claim 76 or claim 77,
    Further comprising a transfer device mounted on at least one of the pair of sub-stages, for transferring the mask to / from the main stage.
  80. 53. The method of claim 52,
    Wherein the object is a substrate having a size of 500 mm or more.
  81. The method of any one of claims 64 to 69, 72, 73, 76, and 77,
    Wherein the object is a substrate having a size of 500 mm or more.
  82. delete
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KR1020117029995A 2009-05-15 2010-05-14 Mobile apparatus, power transmission apparatus, exposure apparatus, and device manufacturing method KR101693168B1 (en)

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KR101869463B1 (en) 2018-06-20
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KR20180067737A (en) 2018-06-20
JP2015057833A (en) 2015-03-26
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JP5626206B2 (en) 2014-11-19
JP2018110271A (en) 2018-07-12

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