KR101629555B1 - Dermatophytosis treatment device using plasma source - Google Patents

Abstract

The present invention is intended to treat athlete's foot using plasma.
By constructing an electrically and thermally safe plasma source, plasma treatment of athlete's foot is used to produce a variety of active radicals, which produce a large amount of free radicals in the cells of anthracobacteria, thereby killing the athlete's foot.
According to the present invention, the athlete's foot can be cured by eradicating the athlete's foot in a very short time of about 30 minutes, unlike the athlete's footwear medicinal product or ointment which is difficult to be cured even by long-term use.

Description

TECHNICAL FIELD [0001] The present invention relates to a device for treating anemia with a plasma source,

The present invention relates to an anemia therapeutic apparatus using an atmospheric pressure plasma source.

Plasma has been widely used for the surface treatment of semiconductors, display devices, and various parts, and has expanded its applicability to become a fusion technology field for biotechnology research, medical use, air cleaning, and incinerator. Particularly, in the case of lasers conventionally used for medical purposes such as tooth whitening, cancer cell death, and blood coagulation speed promotion, since they act in a spot form, the treatment efficiency is low when the treatment area is wide, It is possible to generate a large area, thereby improving the processing efficiency.

On the other hand, treatment for diseases with a high recurrence such as athlete's foot disease is a limitation of the existing treatment methods in that the treatment period is long and the recurrence is frequent without treatment even though the treatment period is long and the cost is high. According to Korean Patent Laid-Open No. 10-2006-0102455, it is possible to attempt treatment of athlete's foot with ionized water caused by underwater plasma discharge, but it is difficult to confirm the effect because there is no substantial experimental result. In addition, treatment such as ionized water washing can not kill the mold, which is the cause of athlete's foot, so it is necessary to find a more active treatment method. As described above, it is expected that the treatment of athlete's foot using plasma will be possible if the fungus causing athlete's foot is capable of killing in view of the effect of plasma cancer killing and the like. Therefore, it is necessary to develop a plasma source having sufficient energy to kill athlete's fungus in addition to safe operation.

In the case of a DBD (Dielectric Barrier Discharge) plasma, a plasma source of a surface discharge structure is constituted, and a voltage of about 2 kV is applied and it is tested for medical use. In the case of the DBD plasma source used up to now, the structure is composed of an X electrode / dielectric / Y electrode, and a Y electrode is manufactured by attaching a mesh electrode to a dielectric (see FIG. 1). Accordingly, since the discharge portion is the side surface of the Y electrode when the voltage is applied, there is a problem that the amount of plasma that is radiated directly to the object to be processed with plasma is small.

Therefore, an object of the present invention is to provide a new type of ancobacterial treatment device capable of curing athlete's foot a little more reliably while allowing short-term treatment.

Further, in accordance with the above object, the present invention provides a novel floating DBD plasma source designed for medical use.

That is, an object of the present invention is to provide a floating DBD plasma source having practicality by allowing the generation position of the plasma to more reliably approach the skin side, lowering the applied voltage as much as possible, .

It is still another object of the present invention to provide an anemia treatment device using a plasma source which can be more easily observed and transmitted through the naked eye or the skin sensation to a patient undergoing plasma treatment.

According to the above object, the present invention provides a plasma athlete's foot treatment apparatus which can discharge a plasma to a lesion causing athlete's foot to kill a mold, which is a causative organism of athlete's foot, and cure athlete's foot in a short time.

Therefore, the present invention can produce various atmospheric pressure plasma sources capable of discharging plasma with a nuclese treatment device.

That is,

A method of treating an athlete's foot comprising the step of treating athlete's foot with a plasma discharged by supplying at least one of air, inert gas and molecular gas to a plasma discharge gas to treat athlete's foot.

Further, according to the present invention,

Hollow glass tube with one side blocked by a dielectric;

A cylindrical inner electrode having a cooling hole inserted in the discharge tube; And

And a dielectric hose coupled to the discharge tube,

An X electrode of an AC power source is applied to the internal electrode, a Y electrode is grounded,

A floating plasma jet source configured to form a branch in the dielectric hose and supply a plasma carrier gas through a branch to cause a floating plasma jet to be radiated from an end of the hose to be subjected to plasma processing on the object to be processed, The present invention provides an anemia treatment apparatus.

Further, according to the present invention,

A glass substrate;

A labyrinth electrode having an electrical contact point located on the front surface of the glass substrate and having a plurality of vertexes formed on a back surface of the glass substrate;

An AC power source applied to the labyrinth electrode;

A dielectric layer surrounding the labyrinth electrode; And

And an anti-hydration layer surrounding the dielectric layer,

And a human body or cells to be used serve as opposing electrodes for the labyrinth electrode.

Further, the present invention provides a method of using an anemia treatment device using a floating DBD plasma source, wherein the floating DBD plasma source is used for treatment of athlete's foot treatment, and the skin is used as an electrode facing the labyrinthine electrode do.

Further, according to the present invention,

Board;

An X electrode and a Y electrode formed on one surface of the substrate with an interval therebetween;

A dielectric surrounding the X electrode and the Y electrode; And

And an anti-hydration layer surrounding the dielectric body. The anisotropic plasma source comprises an atmospheric pressure plasma source.

According to the present invention, by providing an anorexigenic therapeutic apparatus that can be cured by treating athlete's foot with plasma for several minutes to several tens of minutes, it is possible to treat the athlete's foot quickly and inexpensively.

The plasma jet aneutralizer according to the present invention is more efficient because it has a high electrical and thermal stability and can apply a relatively low voltage.

Particularly, the plasma discharged by the plasma source of the present invention forms various kinds of active radicals such as OH-, O-, N-, O ₂ -, and the radicals generate active oxygen in the cells of the fungus, By generating a large amount of cells, the cells are killed in a short period of time, thereby enabling reliable cure.

In addition, the floating DBD plasma source constituting the therapeutic device of the present invention is excellent in the effect of plasma acting on the skin because the human body itself subjected to the plasma treatment becomes a discharge electrode, and moreover, The discharged plasma can be observed with the naked eye, so that the certainty of the action can be intuitively confirmed, and the therapeutic effect can be further enhanced by the so-called placebo effect.

1 is a cross-sectional view showing a configuration of a conventional atmospheric pressure plasma source.
2A and 2B are cross-sectional views showing a configuration of a plasma source of the present invention.
2a is a DBD plasma source, and 2b is a constitution of a floating plasma jet.
FIG. 3 is a photograph showing experimental conditions and experimental results of treatment with two types of fungus ( Trichophyton mentagrophytes (hereinafter referred to as T. mentagrophytes ) and Trichophyton rubrum (hereinafter referred to as T. rubrum )) spores using the DBD plasma source of the present invention.
4 is a graph showing the results of experiments in which a floating plasma jet source of the present invention was treated with two kinds of fungus ( T. mentagrophytes and T. rubrum ) cultured in a potato dextrose agar (hereinafter, referred to as PDA) medium and a Sabouraud agar It is a photograph showing conditions and experiment results.
FIG. 5 is a photograph showing experimental conditions and experimental results of treating the mycelium of two kinds of athletes ( T. mentagrophytes and T. rubrum ) cultured for 3 days in the PDA medium and the SDA medium, respectively, of the floating plasma jet source of the present invention to be.
FIG. 6 is a graph showing the results of an experiment in which viable cell counts were measured after treating with a liquid containing two species of fungus ( T. mentagrophytes and T. rubrum ) using a floating plasma jet source of the present invention.
Figure 7 shows a micrograph of mycelia of T. mentagrophytes after 24 hours of treatment with a floating plasma jet on a mycelium of T. mentagrophytes grown in a PDA medium for 3 days.
FIG. 8 shows fluorescence microscopy photographs of mycelium fluorescence stained with floating plasma jets on mycelia of T. mentagrophytes grown in the PDA medium for 3 days.
FIG. 9 is a photograph of a confocal fluorescence microscope photographed with live spores and dead spores before and after the plasma treatment by mixing and fusing spores of T. mentagrophytes in the PDA medium.
10 is a confocal fluorescence microscope photograph showing viable bacteria and dead bacteria before and after plasma treatment of mycelium cultured after culturing T. mentagrophytes in a PDA medium for 3 days.
11 is a plan view of an electrode applied to the floating DBD plasma source of the present invention.
12 is a sectional view showing that the floating DBD plasma source of the present invention further includes a gas injection path.
FIGS. 13 to 14 are examples of a plasma source that can be applied to a baclofen treatment, and FIG. 15 is a plan view showing an example of the electrode configuration of FIG. 2A.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

First, a plasma source is constituted, and plasma discharged by operating such a plasma source is treated with a fungus bacterium, which is a causative agent of athymosomal bacilli, to observe the progress, thereby confirming the effect of plasma treatment on the treatment of athlete's foot.

The plasma source may be configured in various ways. It is sufficient that a pair of electrodes for applying a voltage to cause a plasma discharge, a gas passage for supplying a discharge gas between the electrodes, and a discharge port for discharging plasma to be irradiated to the fungal culture are provided. Accordingly, various plasma sources can be applied, but more preferably, they can be safely used without danger of electric shock, and heat radiation must be maintained so as not to overheat in order to enable direct treatment to the human body.

Accordingly, embodiments of the present invention provide the following plasma source configuration.

2 (b) shows the structure of a flexible plasma jet source according to the present invention.

The internal electrode 100 is inserted into a discharge tube 200 which is hollow and has a bottom surface formed of a dielectric 250 and sealed. The discharge tube 200 is assembled to the dielectric hose 300 and the dielectric hose 300 has a branch 400 for gas inflow. An AC power source is applied to the internal electrode 100 to supply power required for plasma discharge. A discharge occurs at the surface of the dielectric 250 due to the injection of the inert gas and the application of electric power and the generated floating plasma is moved downward through the dielectric hose 300 by the inert gas introduced through the branch 400. The plasma is discharged at the end of the dielectric hose 300 and the plasma treatment can be performed on the object placed under the end of the hose 300. The dielectric hose 300 can be made of a flexible material. In this case, the dielectric hose 300 can be inserted into the human body to perform plasma treatment on tissue in the human body requiring treatment or treatment. Therefore, when treatment is performed against the outside of the human body, it is not necessarily required to be flexible, and it can be configured to have a strength in a state of easy handling or to be flexible.

The plasma jet source can dissipate heat inside the discharge tube 200 by circulating external air through the cooling holes 150 formed in the electrodes even if the electrode 100 generates heat, The heat of the plasma inside the dielectric hose 300 is naturally dissipated by the inert gas and there is no thermal damage problem in the subject to be plasma-treated.

Meanwhile, the branch 400 acts as a gas inlet for injecting an inert gas such as N ₂ , Ar, Ne, or He. The positioning of the end where the branch 400 contacts the hose 300 has a technically important meaning. That is, the point at which the branch 400 is started needs to be later than the surface of the dielectric 250 on which the plasma is generated. Otherwise, not only a large amount of plasma charge is generated but also the charge is concentrated and there is a risk of electric shock to the human body. In fact, it is preferable that the starting point of the branch 400 is located at a distance of about 1 to 3 cm from the bottom surface of the discharge tube 200.

The cause of such a branch 400 positioning can be described as follows.

The plasma discharged from the surface of the dielectric 250 is moved under the dielectric hose 300 along the gas flow entering the branch 400. Therefore, the introduced gas generates a plasma floating on the surface of the dielectric 250 near the inner electrode 100, and acts as a carrier simply as it moves away from the electrode 100. Therefore, when the branch 400 starts at the discharge end near the electrode 100 or before the electrode 100, the gas introduced from the branch 400 acts as a plasma discharge gas to have an excessive charge amount. Since the human body is a conductor, it interacts electrically with the plasma charge (pulls the plasma charge), and the excessive amount of charge ultimately acts as a risk of electric shock to the human body.

Preferably, the cylindrical electrode 100 of the plasma jet source has a hollow cylindrical shape with an inner diameter of 1 to 5 mm and the end of the electrode 100 is in contact with the inner surface of the dielectric 250.

In this embodiment, the wall surface of the discharge tube 200 has a thickness of about 1 mm and the dielectric 250 is made thicker. That is, the dielectric 250 has a thickness of 2 to 3 mm, which is advantageous for plasma discharge and can reduce the risk of electric shock.

In the case of the dielectric hose 300, silicone rubber is used in this embodiment. However, the present invention is not limited thereto. The length of the hose 300 correlates with the applied voltage as well as the plasma processing capability. In this embodiment, the effectiveness of the plasma jet radiated through the hose 300 having a length of 30 cm was confirmed.

The dielectric constant of the dielectric discharge tube 200, the thickness of the bottom surface of the discharge tube 200, and the applied voltage are controlled in combination with each other to optimize the plasma discharge smoothness and the prevention of electric shock. In this embodiment, the dielectric constant ε is about 5.0 or more, and it may be composed of glass, quartz, ceramics, or the like.

The greater the dielectric constant of the dielectric 250, the lower the electric shock risk and the lower the heat dissipation. Thus, the discharge efficiency can be increased by increasing the applied electric power, and the thicker the dielectric 250, the thicker it is,

In this embodiment, dielectric 250 is applied with an AC voltage of 1 to 3 kV when the thickness of the dielectric 250 is 2 to 3 mm and the dielectric constant of the discharge tube is 5.0. At this time, the length of the silicone rubber hose was 30 cm, and a biological sample treated with a plasma jet source radiated from the end of the silicone rubber hose was placed in a petri dish. However, the dimensions are exemplary and can be varied as needed, flexible to the hose, convenient to handle, and equipped with a more rigid dielectric cap at the end, which adds to the ease of handling .

Further, athlete's foot can be treated with a plasma jet for discharging the atmospheric plasma as shown in FIG. 2 (b).

Referring to FIG. 2B, a hollow internal electrode 110, a corresponding external electrode 120, and a quartz tube 130 surrounding the internal electrode 110 are shown. The quartz tube 130 may be replaced with a ceramic or polymer dielectric tube.

It is possible to inject and supply the discharge gas through the hollow inner electrode 110. The external electrodes 120 are exposed to the air and serve as a case. The quartz tube 130 prevents a short circuit between the external electrode 120 and the internal electrode 110 as a dielectric and prevents a discharge or an arc discharge to cause a stable discharge. A dielectric material made of a metal oxide such as porous ceramic such as alumina (Al ₂ O ₃ ) is filled in the outer electrode 120 and used as a buffer 140. When the buffer 140 generates heat during plasma discharge Absorbs heat to create a room temperature plasma. Such a plasma jet source can be used to treat athlete's foot.

The following is a description of experimental results of the treatment of a bacteriobacteria using the DBD plasma and the floating plasma jet source.

First, it is the experimental result using the DBD plasma. Prepare fungi that cause athlete's foot and pre-cultivate them in culture medium. In this example, T. mentagrophytes and T. rubrum conidia were collected and applied to a culture PDA medium, treated with DBD plasma for 30 minutes at the treatment condition shown in FIG. 3, and then observed for 7 days . As a result, it was confirmed that the growth of two kinds of anthracnose was inhibited in the group treated for 10 minutes, 20 minutes and 30 minutes. FIG. 3 shows the effect of inhibiting the growth of anthracnose by the DBD plasma treatment time.

The following is a description of the experimental results of the treatment of aceobacteria using a floating plasma jet source.

First, the experiment results using spores. Prepare fungi that cause athlete's foot and pre-cultivate them in culture medium. In the case of this example, T. mentagrophytes and T. rubrum spores were collected and applied thinly on the PDA medium for culture and on the surface of the SDA medium after mixing with the medium. Considering that the actual athlete's foot grows in the epidermis of the skin, the medium was prepared so as to be close to the actual skin condition. Under the condition shown in FIG. 4, the floating plasma was treated for 5 minutes in each of the culture media for a maximum of 10 minutes, followed by culturing for 7 days. From the results of the experiment, it was confirmed that the growth of two kinds of anthracnose was inhibited in the region treated with plasma from the group treated for 3 minutes regardless of the culture medium. Fig. 4 shows the killing effect of fowl spores according to the floating plasma treatment conditions and treatment time.

The following are experimental results using mycelium. In the case of this example, T. mentagrophytes and T. rubrum spores were collected and applied thinly on the PDA medium for culture and on the surface of the SDA medium after mixing with the medium. After culturing for 3 days, the medium was prepared so as to be close to a skin condition similar to that of actual athlete's foot. Under the conditions shown in FIG. 5, the floating plasma was treated for 5 minutes in each of the culture media for a maximum of 10 minutes, followed by culturing for 7 days. As a result, it was confirmed that the growth of two kinds of anthracnose was inhibited in the region treated with plasma from the group treated for 3 minutes, regardless of the culture medium. Fig. 5 shows the killing effect of athlete's foot hypha depending on the conditions of the floating plasma treatment and the treatment time.

Further, spores of T. mentagrophytes (left in FIG. 6) and T. rubrum (right in FIG. 6) on the liquid medium were subjected to plasma treatment for a maximum of 30 minutes using the above plasma jet source. As a result, And 30 minutes, respectively. These results suggest that the athlete's foot can be cured immediately by plasma treatment for 30 minutes.

Figure 7 is a micrograph of the plasma of T. mentagrophytes before and 24 hours after treatment. Microscopic photographs confirm that T. mentagrophytes mycelium was killed by plasma treatment for 10 minutes. FIG. 8 shows fluorescence staining of plasma treated with T. mentagrophytes hyphae to clearly observe living mycelium and dead mycelium.

Fig. 9 also shows that the spores are killed due to the plasma treatment for 30 minutes against T. mentagrophytes , and in Fig. 10, the whole treated area is red due to the death of mycelium.

From these experimental results, it can be confirmed that the treatment of athlete's foot, which is hard to be cured by the plasma treatment, can be cured in the short term.

Next, we introduce several kinds of plasma sources that can constitute the anemia treatment device.

11 and 12 show the construction of a floating DBD plasma source which can constitute the athlete's foot treatment apparatus of the present invention.

In the present invention, the substrate 101 is made of glass and the electrode 201 is formed on the back surface of the glass substrate 101 of FIG. The electrode 201 can be formed of a polygon, a closed loop type, a maze type, or the like having a large number of vertices by using lithography.

The electrode 201 is surrounded by the dielectric layer 301 and the dielectric layer is surrounded by the protective layer 401 and the protective layer 401 is surrounded by the moisture barrier film 501 to improve the durability of the plasma source. The dielectric layer 301, the protective layer 401, and the moisture barrier film 501 may each be formed to a thickness of 20 to 50 mu m.

The electrode 201 shown in the upper part of FIG. 11 shows a closed loop type using a lithography technique and having a plurality of horizontal protruding lines like a fork shape.

In the lower part of FIG. 11, the electrode structure is further modified to provide a plurality of recessed and projected portions on the plurality of transverse protruding lines themselves, thereby narrowing the gap between the opposite recessed and protruded portions, thereby further improving the discharge efficiency. have.

FIG. 12 is a cross-sectional view illustrating a structure in which the floating DBD plasma source of the present invention is assembled to the housing 601. FIG.

A hole is formed in the glass substrate 101 so that a part of the electrode 201 passes through the floating DBD plasma source to the glass substrate 101 and is exposed to the front surface (which may be viewed as an upper surface). The electrode 201 has a short-circuited structure, and the short-circuited linear portion is drawn to the front surface through the hole of the glass substrate 101, so that the power source is connected thereto.

Further, additional gas holes may be further processed in the glass substrate 101 to further inject the plasma discharge gas outside the atmosphere.

The floating DBD plasma source of the present invention applies AC power to the electrode 201, uses the object to be subjected to the plasma treatment as an opposite electrode, and discharges the plasma using the atmosphere as a discharge gas. For example, when AC power is applied to the electrode 201 of the plasma source and approaches the surface of the human skin, a plasma discharge occurs at a point where the distance between the electrode 201 and the surface of the skin acting as a conductor is appropriate. Therefore, energy can be applied to the surface of the skin, thereby directly exhibiting the effect of the treatment. In addition, the skin cell wall may be made porous by the plasma energy discharged to the surface of the skin. Thus, the plasma discharge may be performed to improve the effect immediately after the plasma discharge procedure, or to apply the chemical solution to be applied to the skin or apply the chemical solution .

The electrode 201 of the present invention is not connected to both ends of the power source but has a shape like a short circuit so that only one electrical contact point is provided. One end of the power source is connected to the one electrical contact point and the other end is grounded. Therefore, the electrode 201 is in a floating state as a whole.

In the present invention, the structure of the electrode 201 has many vertexes at right angles, and the plasma discharge can be intensified at such vertexes. That is, due to the electrode structure having such a shape, a plasma discharge having a desired level can be obtained even if a relatively low voltage is applied. Generally, when the electrode has a planar structure for plasma discharge necessary for making the cell wall of a human skin porous, a high voltage of 3 to 5 kV is required. However, in the case of forming a shape having many vertices as in the present invention, 1 to 3 kV is sufficient. Therefore, more secure and stable operation becomes possible.

11, an inert gas such as argon may be injected into a plasma source that is seated in a housing 601 made of an insulator, such as argon, to generate a more active discharge. This injection of the discharge gas gives the patient receiving the treatment a sensual conviction according to the procedure, thereby enhancing the satisfaction of the patient.

13 is a cross-sectional view of a plasma source according to another embodiment of the present invention.

An X electrode 302 and a Y electrode 352 are formed on one surface of the substrate 102 and the periphery of the pair of electrodes is surrounded by the dielectric material 202 and then the surface of the dielectric material 202 is covered with the secondary electron generation layer 402, And then the surface of the secondary electron generating layer 402 is coated with the anti-hydration layer 502 to constitute a plasma source. The secondary electron generating layer 402 plays a role of regenerating more electric charges from the generated plasma, but it is not necessarily constituted, and the dielectric 202 may be directly surrounded by the moisture barrier 502.

The plasma source configured as described above applies AC power to the X electrode 302 and the Y electrode 352 to discharge the plasma. A plasma discharge occurs in the space between the two electrodes, (402) to the outside of the hydration preventing film (502). Accordingly, since the plasma distribution is around the surface of the moisture barrier 500, the plasma can be directly applied to the object to be processed, and a sufficient plasma processing effect can be expected. Such a structure can cause a large-area discharge, thereby improving the treatment efficiency.

The electrode of the plasma source may be formed in a mesh shape, and is preferably formed by photolithography instead of attaching a conventional mesh. The photolithography technique is a well-known technique and its detailed description will be omitted. The advantage of the electrode formation using photosensitivity is that the electrodes can be precisely arranged at a fine level. Density plasma discharge can be expected even if the gap between the electrodes is low and the applied voltage is low and the geometric shape of the mesh electrode can be freely designed to induce a high density plasma discharge with a lower power.

The present inventors constructed a mesh with a variety of deformed shapes including the shape of Fig. 15 to narrow the gap between electrodes and to increase the number of electrode arrangements per unit area, thereby forming a dense electrode, thereby obtaining a low-power high-density plasma. The plasma source manufactured according to the photolithography technique may have about 100 to 1000 discharge cells per unit area of 1 cm x 1 cm. In this embodiment, 400 discharge cells are provided. The high-density plasma discharge can be caused by applying a voltage of 100 V to 1 kV to the mesh electrode. In this embodiment, a sufficient high-density plasma discharge is obtained by application of a voltage of 300 V.

The surrounding of the formed electrode with the dielectric 202 can be performed by various coating methods. For example, screen printing, spin coating, dip coating and the like can be applied, and screen printing is used in this embodiment. The thickness of the dielectric layer 202 and the dielectric constant are related to each other so that the thickness of the dielectric layer is decreased as the dielectric constant is larger and the thickness of the dielectric layer is increased as the dielectric constant is smaller. It is possible to discharge the high-density plasma without causing dielectric breakdown with respect to the voltage. In the case of this embodiment, a dielectric layer 202 having a thickness of 20 to 30 탆 was formed using a dielectric constant of 5 to 10.

The secondary electron generation layer 402 for inducing generation of secondary electrons, which causes more electrons to be generated by the plasma generated in the space of the dielectric 202, is preferably composed of MgO, MgSrO, MgCaO, In this embodiment, MgO is used. The secondary electron generating layer 402 made of MgO may be formed by various lamination methods, and is formed by electron beam evaporation in this embodiment. The thickness of the secondary electron generating layer 400 is preferably 1 mu m or less, and is preferably 7000 ANGSTROM or so in this embodiment. In the case of a plasma source closed with the secondary electron generation layer 402, the plasma discharge can be generated at a low power high density, but after one discharge, the secondary electron generation layer 402 is hydrated by moisture in the atmosphere, The secondary electron generation function can not be exerted and the life of the plasma source can be shortened, so that it can not be used for practical treatment. Accordingly, the present inventors have formed an anti-hydration film 502 that can prevent hydration of the secondary electron generating layer 402. The moisture barrier layer 502 can be used as long as it has relatively good secondary dielectric properties and can easily be coated, and Al ₂ O ₃ is used in the present embodiment. The coating method is also not limited, and the thickness is preferably 1 μm or less, and in this embodiment, the coating is performed by electron beam evaporation to a thickness of about 7000 Å.

In addition, the plasma source for the treatment of athlete's foot may be applied to the plasma source shown in Figs. 1 and 2 or the plasma source shown in Figs.

It is to be understood that the invention is not limited to the disclosed embodiment, but is capable of many modifications and variations within the scope of the appended claims. It is self-evident.

10, 100, 110: internal electrodes
120: external electrode
140: buffer
150: Heat dissipation hole
20, 200: discharge tube
250: Dielectric
300: Hose
400: Branch
130: quartz tube
140: buffer

Claims (15)

delete A hollow discharge tube with one end blocked with a dielectric;
A cylindrical inner electrode having a cooling hole inserted in the discharge tube; And
And a dielectric hose coupled to the discharge tube,
An X electrode of an AC power source is applied to the internal electrode, a Y electrode is grounded,
A floating plasma jet source configured to supply a carrier gas carrying plasma discharged from the discharge tube through a branch to form a branch in the dielectric hose and to allow a floating plasma jet to be radiated from the end of the hose to perform plasma processing on the object to be processed; Wherein the anemia treatment is performed to treat athlete's foot. 3. The anemia treatment device according to claim 2, wherein the discharge tube is hollow, a cooling hole is provided, and a bottom surface is covered with a dielectric. 4. The anemia treatment device according to claim 3, wherein the cylindrical inner electrode is disposed in contact with the bottom surface of the discharge tube. [Claim 3] The ancillary treatment device according to claim 2, wherein the branch and hose body joint are formed at a rear end of the plasma discharge end. 3. The anemia treatment device according to claim 2, wherein the dielectric constant of the hose, the thickness of the dielectric, and the applied electric power are adjusted to optimize the prevention of electric shock by the discharged plasma. A glass substrate;
A labyrinth electrode having an electrical contact point located on the front surface of the glass substrate and having a plurality of vertexes formed on a back surface of the glass substrate;
An AC power source applied to the labyrinth electrode;
A dielectric layer surrounding the labyrinth electrode; And
And an anti-hydration layer surrounding the dielectric layer,
The labyrinthine electrode has a plurality of protruding lines to form a single fork. The protruding line includes a plurality of protrusions to improve discharge efficiency,
Further comprising a gas injection path in the plasma source housing by forming a hole for the gas passage in the glass substrate,
Wherein the human body or cells to be used serve as counter electrodes for the labyrinthine electrode. 8. The anemia treatment device according to claim 7, wherein the labyrinthine electrode is formed of a line forming a closed loop so that a plasma discharge is more actively generated at a plurality of vertexes.

delete delete A method for treating athlete's foot comprising a floating DBD plasma source according to any one of claims 7 to 8 for use in athlete's foot treatment, wherein the skin is used as an electrode facing the labyrinthine electrode. How to use.

delete delete delete delete

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