KR101407287B1 - Liquid crystal display device and method for repairing the same - Google Patents

Liquid crystal display device and method for repairing the same Download PDF

Info

Publication number
KR101407287B1
KR101407287B1 KR1020060129856A KR20060129856A KR101407287B1 KR 101407287 B1 KR101407287 B1 KR 101407287B1 KR 1020060129856 A KR1020060129856 A KR 1020060129856A KR 20060129856 A KR20060129856 A KR 20060129856A KR 101407287 B1 KR101407287 B1 KR 101407287B1
Authority
KR
South Korea
Prior art keywords
pixel
formed
electrode
pixel electrode
pixel region
Prior art date
Application number
KR1020060129856A
Other languages
Korean (ko)
Other versions
KR20080056830A (en
Inventor
류호진
Original Assignee
엘지디스플레이 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지디스플레이 주식회사 filed Critical 엘지디스플레이 주식회사
Priority to KR1020060129856A priority Critical patent/KR101407287B1/en
Publication of KR20080056830A publication Critical patent/KR20080056830A/en
Application granted granted Critical
Publication of KR101407287B1 publication Critical patent/KR101407287B1/en

Links

Images

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306Details
    • G02F1/1309Repairing; Testing
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/50Protective arrangements
    • G02F2201/506Repairing, e.g. with redundant arrangement against defective part

Abstract

The present invention relates to a liquid crystal display device and a repair method thereof, and more particularly to a liquid crystal display device which includes a first substrate and a second substrate which define a plurality of pixel regions each having upper and lower sub-pixels, A gate line formed across an upper pixel and a lower pixel of each pixel region on a substrate; a data line formed so as to intersect with the gate line; A first pixel electrode and a second pixel electrode which are respectively connected to the first thin film transistor and the second thin film transistor and formed in the upper pixel and the lower pixel, One pixel electrode and the second pixel electrode are connected to each other, a connection pattern formed integrally with the one pixel electrode and the second pixel electrode, A first dummy pattern formed to overlap the upper pixel of the pixel region and the lower pixel of the pixel region adjacent to the pixel region, a second dummy pattern formed to overlap the lower pixel of the pixel region and the upper pixel of the pixel region adjacent thereto, And a liquid crystal layer formed between the first substrate and the second substrate.
Repair, Spark Repair, Laser Cutting, Laser Welding, Large Panel

Description

TECHNICAL FIELD [0001] The present invention relates to a liquid crystal display device and a method of repairing the same,

FIG. 1 is a plan view showing a conventional liquid crystal display

2 is a circuit diagram showing a liquid crystal display device according to the present invention.

3 is a plan view showing an enlarged view of a portion A in Fig.

4 is a cross-sectional view taken along the line I-I 'of Fig. 3

5 is a plan view showing an enlarged view of a portion B in Fig.

6 is a cross-sectional view taken along line II-II 'of FIG. 5

Fig. 7 is a plan view showing an enlarged view of a portion C in Fig.

8 is a cross-sectional view taken along the line III-III 'in Fig. 7

DESCRIPTION OF THE RELATED ART [0002]

100: substrate 110: first thin film transistor

112: second thin film transistor 120: first pixel electrode

122: second pixel electrode 121: connection pattern

130: gate line 136: data line

150: home 160: dummy pattern

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display and a repair method thereof, and more particularly, to a liquid crystal display and a repair method thereof for preventing charging characteristics from being degraded in a pixel after a repair process.

In recent years, there has been a demand for a display device in accordance with the development of an information society, and in recent years, a display device such as a liquid crystal display (LCD), a plasma display panel (PDP), an electro luminescent display (ELD), a vacuum fluorescent display ) Have been studied, and some of them have already been used as display devices in various devices.

Among them, liquid crystal display devices are mostly used while substituting CRT (Cathode Ray Tube) for the purpose of a portable image display device because of their excellent image quality, light weight, thinness and low power consumption. A television receiving and displaying a broadcast signal, a monitor of a computer, and the like.

In order for liquid crystal display devices to be used in various parts as a general screen display device, it is important to develop high-quality images such as high definition, high brightness and large area while maintaining the features of light weight, thinness and low power consumption can do.

Hereinafter, a conventional liquid crystal display device and a repair method thereof will be described.

1 is a plan view showing a conventional liquid crystal display device.

The conventional liquid crystal display has a plurality of gate lines GL in a predetermined direction and a predetermined distance on a first substrate and a plurality of data lines DL at predetermined intervals in a direction perpendicular to the gate lines GL So as to define a pixel region. A pixel electrode 20 is formed in the pixel region and a thin film transistor 10 is formed in a portion where the gate line GL and the data line DL cross each other. At this time, a data signal of the data line DL is transmitted to each pixel electrode 20 according to a signal applied to the gate line GL. Thus, the first substrate on which the thin film transistor and the pixel electrode are formed is referred to as a thin film transistor array substrate.

Although not shown in the drawings, the second substrate facing the first substrate includes a black matrix layer for blocking light in a portion excluding the pixel region, an R, G, and B color filter layers for expressing color hues, A common electrode is formed. The second substrate on which such a color filter layer is formed is referred to as a color filter array substrate.

The thin film transistor array substrate and the color filter array substrate are bonded together, and a liquid crystal layer is formed therebetween. The liquid crystal of the liquid crystal layer formed between the both substrates is oriented by the electric field between the pixel electrode and the common electrode, and an image is displayed by adjusting the amount of light transmitted through the liquid crystal layer according to the degree of orientation.

When the thin film transistor is formed, patterning of the source / drain electrodes is not normally performed, so that the source / drain electrodes are not separated, or a conductive foreign material remains in the thin film transistor region, , In a black state, a bright spot may occur.

Next, referring to FIG. 1, a repair method in the case where a defect occurs in the thin film transistor 10 formed at the intersection of the n-th gate line GLn and the data line DL of the liquid crystal display device will be described.

As shown in FIG. 1, a repair method of a conventional liquid crystal display device includes a thin film transistor 10 formed at a portion where an nth gate line GL n and a data line DL intersect with each other, The electrode 20 is cut. At this time, a portion where the drain electrode of the thin film transistor 10 is formed is irradiated with laser and cut.

The pixel electrode 20 formed in the pixel region at the intersection of the n-th gate line GL n and the data line DL and the n + 1-th gate line GL n + 1 and the data line DL, And the pixel electrode 20 formed in the pixel region of the intersection is welded by irradiating a laser.

Therefore, the n-th gate lines (GL n) and a data line (DL) crossing the pixel electrode 20 and the n + 1-th gate line formed on the pixel region of the portion (GL n +1) and a data line (DL) crossing the The pixel electrode 20 formed in the pixel region of the portion where the n + 1th gate line GL n +1 and the data line DL intersect is electrically connected, And is driven by the transistor 10.

However, since the amount of charge that one thin film transistor needs to be charged per unit time increases, a problem of degradation of the charging characteristic arises. Therefore, in the case of a pixel having undergone the repair process, the luminance is lower than the surrounding pixels.

In the case of a large panel, since the size of one pixel area is larger than that of a small panel, the liquid crystal capacitance of the unit pixel becomes larger, which has a greater influence on the problem of the degradation of the charging characteristics as described above.

It is an object of the present invention to provide a liquid crystal display device and a repair method thereof for preventing charging characteristics from being degraded in a pixel after a repair process.

According to another aspect of the present invention, there is provided a liquid crystal display device including a first substrate and a second substrate opposing each other and defining a plurality of pixel regions each having upper and lower sub-pixels, A gate line formed across an upper pixel and a lower pixel of a pixel region, a data line formed so as to intersect with the gate line, and a plurality of data lines intersecting the gate line and the data line, A first pixel electrode and a second pixel electrode which are connected to the first and second thin film transistors and are formed in the upper pixel and the lower pixel, respectively, the first pixel electrode and the second pixel electrode in the same pixel region, A connection pattern formed integrally with the two pixel electrodes, a groove formed in the gate line under the connection pattern, A first dummy pattern formed to overlap the upper pixel of the pixel region and the lower pixel of the pixel region adjacent thereto, a second dummy pattern formed to overlap the lower pixel of the pixel region and the upper pixel of the pixel region adjacent thereto, And a liquid crystal layer formed between the first substrate and the second substrate.

In accordance with another aspect of the present invention, there is provided a repair method for a liquid crystal display device, comprising: a first and a second pixel electrodes of a pixel region where a bright spot is generated; Cutting a connecting portion of the second thin film transistor, cutting a connecting pattern connecting the first pixel electrode and the second pixel electrode of the pixel region in which the bright spot is generated, And electrically connecting the second pixel electrode of the pixel region where the bright dot is generated to the first pixel electrode of the pixel region adjacent to the bright pixel, .

When two or more thin film transistors are provided in a large panel and one pixel region is driven, if a bright spot occurs in a specific pixel region, the adjacent pixel region and the defective pixel region are electrically connected and repaired. In this case, one pixel region is driven by at least two thin film transistors to secure the liquid crystal capacitance, but the repaired pixel region takes charge of the liquid crystal capacitance twice as much, and the drop of the charge characteristic becomes serious.

The liquid crystal display of the present invention can reduce the amount of liquid crystal capacitance burdened by the repaired pixel region in the upper and lower portions of the pixel region where defective pixels are generated in such a large panel, can do.

Hereinafter, a liquid crystal display according to an embodiment of the present invention and a repair method thereof will be described in detail with reference to the accompanying drawings.

3 is a cross-sectional view taken along the line I-I 'in FIG. 3, and FIG. 5 is a cross-sectional view taken along the line I- And FIG. 6 is a cross-sectional view taken along the line II-II 'of FIG. 5. As shown in FIG. 7 is an enlarged plan view of portion C of Fig. 2, and Fig. 8 is a cross-sectional view taken along line III-III 'of Fig.

As shown in FIG. 2, the liquid crystal display according to the present invention defines a plurality of pixel regions P each having upper and lower sub-pixels, and includes a first substrate and a second substrate (not shown) A gate line GL formed across the upper pixel and the lower pixel of each pixel region P on the first substrate; a data line DL formed so as to cross the gate line GL; A first thin film transistor 110 and a second thin film transistor 112 for driving upper and lower pixels respectively at the intersections of the gate lines GL and the data lines DL, A first pixel electrode 120 and a second pixel electrode 122 connected to the first and second pixel electrodes 110 and 112 and formed in the upper pixel and the lower pixel, And the second pixel electrode 122 are connected to each other and a connection pattern (150 in FIG. 5) formed in the gate line GL under the connection pattern 121 and the upper pixel of the pixel region P and the lower pixel of the pixel region P adjacent thereto And a formed dummy pattern (160 in Fig. 7).

As described above, in the embodiment of the present invention, a plurality of gate lines GL and a plurality of data lines DL are formed so as to intersect each other on a first substrate, and the gate lines GL are formed on upper and lower portions Pixels are divided so that two thin film transistors are formed at the respective intersections to control upper and lower pixels of one pixel region. This is because the capacitance of the unit pixel region becomes larger as the size of one pixel region becomes larger as the size of the liquid crystal display device becomes larger and it is difficult to sufficiently charge the thin film transistor in one pixel region for a unit time, Accordingly, one pixel region is charged using two thin film transistors.

In Figure 2 a vertical cross-section of the n th data line (DL) and n-1 th gate line (GL n -1), n-th gate line (GL n), n + 1-th gate line (GL n +1) each of the upper pixel and the lower pixel consisting of n-1-th pixel area (P n -1), n-th pixel area (P n), n + 1-th pixel area (P n +1) is shown.

Fig. 3 is an enlarged view of a portion A in Fig. 2, and Fig. 4 is a sectional view taken along a line I-I '. The first and second thin film transistors 110 and 112 formed at upper and lower portions of the nth gate line GL n and the nth data line DL will be described in more detail.

The first thin film transistor 110 includes a gate line 130 formed in one direction on the first substrate 100 and a first gate electrode 130a protruding upward from the gate line 130. The first thin film transistor 110 is formed to cross the gate line 130 A first source electrode 136a protruding from the data line 136 and an upper portion of the first gate electrode 130a and a first drain electrode 138a formed apart from the first source electrode 136a .

The second thin film transistor 112 includes a gate line 130 formed in one direction on the first substrate 100 and a second gate electrode 130b protruding downwardly from the gate line 130, A second source electrode 136b protruding from the data line 136 to the upper portion of the second gate electrode 130b and a second drain electrode 138b formed away from the second source electrode 136b Consists of.

The first substrate 100 including the first and second gate electrodes 130a and 130b, the first and second source electrodes 136a and 136b and the first and second drain electrodes 138a and 138b may be formed with an organic A passivation layer 142 made of an inorganic insulating material is formed and first and second contact holes 140a and 140b are formed in the passivation layer 142 above the first and second drain electrodes 138a and 138b.

The first and second thin film transistors 110 and 112 are connected to the first and second contact holes 140a and 140b through the first and second contact holes 140a and 140b so that the first and second pixel electrodes 120 and 120, (Not shown).

A reference numeral 132, which is not described, is a gate insulating film, and 134 is a semiconductor layer.

5 is an enlarged view of a portion B in FIG. 2, and FIG. 6 is a sectional view taken along a line II-II 'in FIG. The connecting portions of the first pixel electrode 120 and the second pixel electrode 122 formed in the upper pixel and the lower pixel in the nth pixel region P n will be described in more detail.

A gate line 130 is formed across the upper pixel and the lower pixel of the nth pixel region P n on the first substrate 100 and a gate insulating film 132 and a protective film 142 are formed. Then, the first and second pixel electrodes (120, 122 in each of the upper pixel and the lower pixel has a first pixel electrode 120 and the second pixel electrode, and 122 is formed, n-th pixel area (P n) The connection pattern 121 is integrally formed with the connecting pattern 121. [

At this time, the connecting pattern 121 and the gate line 130 are overlapped with each other, and a groove 150 having a width larger than the width of the connecting pattern 121 is formed on the gate line 130 of the connecting pattern 121 and the gate line 130 have. The grooves formed in the gate lines 130 are formed together when the gate lines 130 are patterned.

Next, FIG. 7 is an enlarged view of a portion C in FIG. 2, and FIG. 8 is a sectional view taken along line III-III '. This explains the adjacent portion of the n-th pixel area of the upper pixel and the lower pixel n-1-th pixel area (P n -1) a (P n) in more detail.

a first pixel electrode formed on the upper pixels of the n-th pixel area an upper pixel and the n-1 th pixel area adjacent the lower portion of the pixel is an n-th pixel area (P n) of the (P n -1) a (P n) ( A second pixel electrode 118 formed on a lower pixel of the (n-1) th pixel region P n -1 and a second pixel electrode 118 formed on a lower portion thereof to overlap the two pixel electrodes 118 and 120. ).

A gate insulating layer 132 is interposed between the first substrate 100 and the dummy pattern 160. A protective layer 142 is interposed between the dummy pattern 160 and the two pixel electrodes 118 and 120 And is insulated.

Since the dummy pattern 160 is formed in the pixel region P, the size of the dummy pattern 160 is formed to be as small as possible because it can affect the reduction of the aperture ratio.

The dummy patterns 160 are formed on the data lines (136 in FIG. 3), the first and second source electrodes 136a and 136b, the first and second drain electrodes 136a and 136b of the first and second thin film transistors 110 and 112, Are formed on the same layer with the same metal as the electrodes 138a and 138b. In other words, patterning can be performed simultaneously using one mask.

Alternatively, the dummy patterns 160 may be formed by the same metal as the gate lines (130 in FIG. 3) and the first and second gate electrodes 130a and 130b of the first and second thin film transistors 110 and 112 Layer.

The first substrate 100 on which the thin film transistor and the pixel electrode are formed as described above is referred to as a thin film transistor array substrate.

Although not shown in the drawings, the second substrate facing the first substrate includes a black matrix layer for blocking light in a portion excluding the pixel region, an R, G, and B color filter layers for expressing color hues, A common electrode is formed. The second substrate on which such a color filter layer is formed is referred to as a color filter array substrate.

The thin film transistor array substrate and the color filter array substrate are bonded together, and a liquid crystal layer is formed therebetween. The liquid crystal of the liquid crystal layer formed between the both substrates is oriented by the electric field between the pixel electrode and the common electrode, and an image is displayed by adjusting the amount of light transmitted through the liquid crystal layer according to the degree of orientation.

A liquid crystal display device in which a pixel electrode and a common electrode are formed on different substrates and an electric field is formed between the two electrodes is referred to as a TN (Twisted Nematic mode) liquid crystal display device.

Although the present invention has been described with reference to the TN type liquid crystal display device in the embodiments, the pixel electrodes and the common electrodes are alternately formed in the pixel region on the first substrate so that a horizontal electric field (horizontal electric field) is formed between the two electrodes The present invention is also applicable to an in-plane switching (IPS) mode liquid crystal display device.

Next, a repair method of a liquid crystal display according to an embodiment of the present invention will be described with reference to FIGS. 2 to 8. FIG.

After the first substrate on which the thin film transistor array is formed and the second substrate on which the color filter array is formed are attached to each other, a check is made to see if the operation of each pixel is properly performed before being released.

At this time, the pixel which is relatively bright compared to the other pixel region is determined as the bright spot, and the pixel is repaired. The reason why the bright spot is generated is that the patterning of the source / drain electrodes is not normally performed when the thin film transistor is formed, the source / drain electrodes are not separated, or a conductive foreign matter remains in the thin film transistor region, , A bright spot may occur in a black state.

when a luminescent spot occurs only in the upper pixel of the n-th pixel region P n , when the connection portion of the first thin film transistor 110 and the first pixel electrode 120 is cut, And the second pixel electrode 122 are electrically connected to each other by the connection pattern 121, the second thin film transistor 112 is driven. In the case where a bright spot occurs only in the lower pixel of the n-th pixel region P n , similarly, when the connecting portion of the second thin film transistor 112 and the second pixel electrode 122 is cut, Since the first pixel electrode 122 and the first pixel electrode 120 are electrically connected to each other by the connection pattern 121, the first thin film transistor 112 is driven.

However, when a bright spot occurs in both the upper and lower pixels of the n-th pixel region P n , the repair can not be performed in the same manner as described above.

The first thin film transistor 110 and the first pixel electrode 120 formed in the upper pixel of the nth pixel region P n are cut and the second thin film transistor 112 and n A connecting pattern for connecting the first pixel electrode 120 and the second pixel electrode 122 is formed by cutting a connecting portion of the second pixel electrode 122 formed on a lower pixel of the first pixel region P n , 121 are cut.

Following, n-th pixel area (P n), the first pixel electrode 120 and the n-1 th pixel area (P n -1) a second electrically the pixel electrode 118 to each other formed at the bottom of the pixel formed on the pixel of a first pixel electrode 124 is connected to, and formed in the n-th pixel area, the second pixel electrode 122 and the upper n + 1 pixels of the first pixel region (P n +1) formed at the bottom of the pixel (P n) by They are electrically connected to each other.

After the cutting and connecting process, the first and second thin film transistors 110 and 112 formed at the intersection of the data line DL and the n-th gate line GL n are connected to the n- P n ) of the first and second pixel electrodes 120 and 122.

And the second pixel electrode 118 formed on the first pixel electrode 120 and the n-1 th pixel area (P n -1) formed in the n-th pixel area (P n) are electrically connected to each other data line (DL ) And the (n-1) -th gate line GL n -1 . Further, n-th pixel area (P n), the second pixel electrode 122 and the n + 1-th pixel area, the data line is the first pixel electrode 124 is electrically connected to each other formed on the (n +1 P) formed in the (DL) and the (n + 1) th gate line (GL n +1 ).

Next, referring to FIGS. 3 and 4, a process of cutting the connecting portions of the first and second pixel electrodes 120 and 122 formed in the first and second thin film transistors 110 and the nth pixel region P n .

A laser is irradiated from the lower portion of the first substrate 100 in a state where the first substrate 100 and the second substrate (not shown) are bonded together and a liquid crystal layer is formed therebetween to complete the liquid crystal display device. And cut. At this time, when the laser is irradiated from the bottom of the first and second drain electrodes 138a and 138b connecting the first and second thin film transistors 110 and 112 and the first and second pixel electrodes 120 and 122, 1 and the second drain electrodes 138a and 138b are melted and disconnected from each other.

The reason why the laser is irradiated from the lower part of the first substrate 100 is that since the black matrix and the color filter layer are formed on the second substrate in the case of the second substrate, the laser passes through the black matrix, It is difficult to reach the drain electrodes 138a and 138b.

Next, a process of cutting the connection pattern 121 connecting the first pixel electrode 120 and the second pixel electrode 122 will be described with reference to FIGS. 5 and 6. FIG.

When the laser is irradiated from the lower portion of the first substrate 100 corresponding to the groove 150 of the gate line 132 formed under the connection pattern 121, the first pixel electrode 120 and the second pixel electrode 122, And the connection pattern 121 connecting the connection pattern 121 is melted and broken.

The reason why the groove 150 is formed in the gate line 132 is that when the laser is irradiated to cut the connection pattern 121 from the bottom of the first substrate 100, (121).

Next the second pixel electrode 118 is formed on the Figure 7 and the first pixel electrode 120 and the n-1 th pixel area (P n -1) are formed in reference to the n-th pixel area (P n) to Figure 8 A process of electrically connecting each other will be described.

when a laser is irradiated from the lower portion of the first substrate 100 corresponding to a portion where the first pixel electrode 120 formed in the nth pixel region P n and the dummy pattern 160 formed at the lower portion overlap each other, The first pixel electrode 120 and the dummy pattern 160 formed in the first pixel region P n are melted and welded to each other.

a laser is formed in the lower portion of the first substrate 100 corresponding to a portion where the second pixel electrode 118 formed in the (n-1) -th pixel region P n -1 and the dummy pattern 160 formed at the lower portion overlap each other The second pixel electrode 118 and the dummy pattern 160 formed in the (n-1) th pixel region P n -1 are melted and welded to each other.

Therefore, the second pixel electrode 118 formed on the first pixel electrode 120 and the n-1 th pixel area (P n -1) formed in the n-th pixel area (P n) by the dummy pattern 160 is electrically to each other Lt; / RTI >

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is clearly understood that the same is by way of illustration and example only and is not to be taken by way of limitation, Will be apparent to those of ordinary skill in the art.

The liquid crystal display device and the repairing method according to the present invention as described above have the following effects.

It is possible to prevent degradation of the charging characteristic of the pixel where the repair process is performed in the liquid crystal display device.

That is, in a liquid crystal display device in which two thin film transistors are formed in a region where a gate line and a data line cross each other and two pixel electrodes connected to each other are formed in one pixel region, In the case where the connection portions of the respective thin film transistors and the pixel electrodes are cut and the pixel electrodes of the upper pixel or the lower pixel are connected to the pixel electrodes of the other pixel regions and are repaired in the case where all of the pixels appear as bright spots, The liquid crystal capacitances are twice as large as those before the repair.

On the other hand, in the present invention, the connecting portions of the thin film transistors and the pixel electrodes are cut, the connection portions between two pixel electrodes in one pixel are cut, and the pixel electrodes of the upper and lower pixels are connected to the pixel electrodes Thus, it is possible to prevent the charging characteristic from being degraded as compared with the above case by taking charge of the liquid crystal capacitance 1.5 times as compared with that before the repair in the pixel region where the repair process is performed.

Claims (12)

  1. A first substrate and a second substrate which define a plurality of pixel regions each having upper and lower sub-pixels, and are arranged to face each other;
    A gate line formed on the first substrate so as to cross an upper pixel and a lower pixel of each pixel region;
    A data line formed to cross the gate line;
    A first thin film transistor and a second thin film transistor for driving the upper pixel and the lower pixel at the intersections of the gate lines and the data lines, respectively;
    A first pixel electrode and a second pixel electrode connected to the first and second thin film transistors and formed in the upper pixel and the lower pixel, respectively;
    A connection pattern connecting the first pixel electrode and the second pixel electrode in the same pixel region and formed integrally with the first pixel electrode and the second pixel electrode;
    A groove formed in the gate line under the connection pattern;
    A first dummy pattern formed to overlap the upper pixel of the pixel region and the lower pixel of the pixel region adjacent thereto;
    A second dummy pattern formed to overlap the lower pixel of the pixel region and the upper pixel of the pixel region adjacent thereto; And
    And a liquid crystal layer formed between the first substrate and the second substrate.
  2. The method according to claim 1,
    And the groove formed in the gate line is larger than the width of the connection pattern.
  3. The method according to claim 1,
    Wherein the first and second dummy patterns are formed in the same layer as the gate line or the data line.
  4. The method according to claim 1,
    Wherein the first and second dummy patterns are formed in island shapes.
  5. The method of claim 1, wherein the first thin film transistor
    A gate line formed on the first substrate in one direction;
    A first gate electrode protruding upward from the gate line;
    A data line formed to cross the gate line;
    A first source electrode protruding from the data line to an upper portion of the first gate electrode;
    And a first drain electrode spaced apart from the first source electrode.
  6. The thin film transistor according to claim 5,
    A second gate electrode protruding downward from the gate line;
    A second source electrode protruding from the data line to an upper portion of the second gate electrode;
    And a second drain electrode spaced apart from the second source electrode.
  7. The repair method for a liquid crystal display device according to any one of claims 1 to 6,
    Cutting the connection portions of the first and second thin film transistors connected to the first and second pixel electrodes of the pixel region where the bright spots are generated, respectively;
    Cutting a connection pattern connecting the first pixel electrode and the second pixel electrode in the pixel region in which the bright spot is generated;
    Electrically connecting a first pixel electrode of the pixel region where the bright spot is generated and a second pixel electrode of another pixel region adjacent thereto; And
    And electrically connecting the second pixel electrode of the pixel region in which the bright spot is generated to the first pixel electrode of the pixel region adjacent thereto. [5] The method of claim 1,
  8. 8. The method of claim 7,
    Wherein the cutting step or the electrically connecting step is cut or electrically connected by using a laser.
  9. 9. The method of claim 8,
    Wherein the cutting or electrically connecting step irradiates a laser at a lower portion of the first substrate.
  10. 8. The method of claim 7,
    The step of cutting the connection portions of the first and second thin film transistors connected to the first and second pixel electrodes of the pixel region in which the bright spots are generated may include:
    Wherein a laser is irradiated to a lower portion of the first substrate corresponding to the first and second drain electrodes of each of the first and second thin film transistors, thereby cutting the liquid crystal display device.
  11. 8. The method of claim 7,
    Wherein cutting the connection pattern connecting the first pixel electrode and the second pixel electrode of the pixel region in which the bright spots are generated comprises:
    And a laser is irradiated to the lower portion of the first substrate corresponding to the groove formed in the gate line under the connection pattern to cut the liquid crystal display device.
  12. 8. The method of claim 7,
    Wherein the step of electrically connecting the first pixel electrode of the pixel region in which the bright spot is generated and the second pixel electrode of the pixel region adjacent thereto,
    The first dummy pattern is irradiated with a laser beam at a portion overlapping the first pixel electrode and the first dummy pattern and a portion overlapping the second pixel electrode of the adjacent pixel region and the first dummy pattern, Wherein the first pixel electrode and the second pixel electrode are electrically connected to each other.
KR1020060129856A 2006-12-19 2006-12-19 Liquid crystal display device and method for repairing the same KR101407287B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020060129856A KR101407287B1 (en) 2006-12-19 2006-12-19 Liquid crystal display device and method for repairing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060129856A KR101407287B1 (en) 2006-12-19 2006-12-19 Liquid crystal display device and method for repairing the same

Publications (2)

Publication Number Publication Date
KR20080056830A KR20080056830A (en) 2008-06-24
KR101407287B1 true KR101407287B1 (en) 2014-06-16

Family

ID=39802851

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060129856A KR101407287B1 (en) 2006-12-19 2006-12-19 Liquid crystal display device and method for repairing the same

Country Status (1)

Country Link
KR (1) KR101407287B1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101225444B1 (en) * 2009-12-08 2013-01-22 엘지디스플레이 주식회사 Liquid crystal display device and Method for manufacturing the same and Method for Repairing the same
CN107703657A (en) * 2017-11-23 2018-02-16 武汉华星光电半导体显示技术有限公司 Array base palte defect mending method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0324524A (en) * 1989-06-21 1991-02-01 Sharp Corp Active matrix display device
JPH05333376A (en) * 1992-06-02 1993-12-17 Fujitsu Ltd Liquid crystal display device and driving method therefor
KR19990014721A (en) * 1996-03-12 1999-02-25 야스카와히데아키 A liquid crystal display device
KR20060020474A (en) * 2004-08-31 2006-03-06 엘지.필립스 엘시디 주식회사 Liquid crystal dislay panel having redunancy structure and method thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0324524A (en) * 1989-06-21 1991-02-01 Sharp Corp Active matrix display device
JPH05333376A (en) * 1992-06-02 1993-12-17 Fujitsu Ltd Liquid crystal display device and driving method therefor
KR19990014721A (en) * 1996-03-12 1999-02-25 야스카와히데아키 A liquid crystal display device
KR20060020474A (en) * 2004-08-31 2006-03-06 엘지.필립스 엘시디 주식회사 Liquid crystal dislay panel having redunancy structure and method thereof

Also Published As

Publication number Publication date
KR20080056830A (en) 2008-06-24

Similar Documents

Publication Publication Date Title
US5737041A (en) TFT, method of making and matrix displays incorporating the TFT
US7081770B2 (en) Multiple testing bars for testing liquid crystal display and method thereof
JP5140999B2 (en) Liquid crystal display
TW565734B (en) In plane switching liquid crystal display device
US9299877B2 (en) Active matrix substrate, display device, method for inspecting the active matrix substrate, and method for inspecting the display device
JP4920117B2 (en) Defect correction method for liquid crystal display device
US8330691B2 (en) Display panel including dummy pixels and display device having the panel
US7129923B2 (en) Active matrix display device
US6104449A (en) Liquid crystal display device having DTFTs connected to a short ring
CN100374949C (en) Liquid crystal display device and manufacturing method thereof
KR100698047B1 (en) In-Plane Switching Mode Liquid Crystal Display Device and the Method for Manufacturing the same
KR100947273B1 (en) Array substrate for In-plane switching mode liquid crystal display device
JP4305486B2 (en) LCD panel
US7973871B2 (en) Active matrix substrate, method for correcting a pixel deffect therein and manufacturing method thereof
US6825911B2 (en) Array testing system on array substrate having multiple cells
US6906766B2 (en) TFT-LCD comprising test pixels, black matrix elements, common voltage line formed within particular dummy region
JP2011133897A (en) Display
US5668032A (en) Active matrix ESD protection and testing scheme
KR100808747B1 (en) Active matrix substrate, display device, and pixel defect correcting method
CN102956672B (en) Display device and fabrication method thereof
US7847577B2 (en) Active matrix substrate, display device, and active matrix substrate inspecting method
EP2023195B1 (en) Liquid crystal display device
US7098989B2 (en) Liquid crystal display element with a defect repairing function
US7557886B2 (en) Liquid crystal display device and method of fabricating the same
US7330222B2 (en) Display device and method for fabricating the same

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20180515

Year of fee payment: 5

FPAY Annual fee payment

Payment date: 20190515

Year of fee payment: 6