KR101245296B1 - 전기 응답 디바이스 - Google Patents

전기 응답 디바이스 Download PDF

Info

Publication number
KR101245296B1
KR101245296B1 KR1020077022508A KR20077022508A KR101245296B1 KR 101245296 B1 KR101245296 B1 KR 101245296B1 KR 1020077022508 A KR1020077022508 A KR 1020077022508A KR 20077022508 A KR20077022508 A KR 20077022508A KR 101245296 B1 KR101245296 B1 KR 101245296B1
Authority
KR
South Korea
Prior art keywords
electrical response
delete delete
electrode material
electrode
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020077022508A
Other languages
English (en)
Korean (ko)
Other versions
KR20080007552A (ko
Inventor
브렛 피. 마스터스
마이클 에프. 밀러
Original Assignee
바이오스케일, 아이엔씨.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 바이오스케일, 아이엔씨. filed Critical 바이오스케일, 아이엔씨.
Publication of KR20080007552A publication Critical patent/KR20080007552A/ko
Application granted granted Critical
Publication of KR101245296B1 publication Critical patent/KR101245296B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N29/00Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
    • G01N29/02Analysing fluids
    • G01N29/036Analysing fluids by measuring frequency or resonance of acoustic waves
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H3/04Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
    • H03H3/10Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves for obtaining desired frequency or temperature coefficient
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00Indexing codes associated with group G01N29/00
    • G01N2291/02Indexing codes associated with the analysed material
    • G01N2291/025Change of phase or condition
    • G01N2291/0256Adsorption, desorption, surface mass change, e.g. on biosensors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N9/00Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity
    • G01N9/002Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity using variation of the resonant frequency of an element vibrating in contact with the material submitted to analysis

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Micromachines (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
KR1020077022508A 2005-04-06 2006-04-05 전기 응답 디바이스 Expired - Fee Related KR101245296B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US66893305P 2005-04-06 2005-04-06
US60/668,933 2005-04-06
PCT/US2006/012491 WO2006107961A2 (en) 2005-04-06 2006-04-05 Electrically responsive device

Publications (2)

Publication Number Publication Date
KR20080007552A KR20080007552A (ko) 2008-01-22
KR101245296B1 true KR101245296B1 (ko) 2013-03-19

Family

ID=36717063

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077022508A Expired - Fee Related KR101245296B1 (ko) 2005-04-06 2006-04-05 전기 응답 디바이스

Country Status (5)

Country Link
US (1) US8536037B2 (https=)
EP (1) EP1872474A2 (https=)
JP (1) JP5078873B2 (https=)
KR (1) KR101245296B1 (https=)
WO (1) WO2006107961A2 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11626648B2 (en) 2018-08-21 2023-04-11 Lg Energy Solution, Ltd. Battery module including bus bar plate

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10224567B4 (de) * 2002-06-03 2014-10-23 Boehringer Ingelheim Vetmedica Gmbh Sensor-Anordnung und Verfahren zum Betreiben einer Sensor-Anordnung
US7497133B2 (en) * 2004-05-24 2009-03-03 Drexel University All electric piezoelectric finger sensor (PEFS) for soft material stiffness measurement
US7942056B2 (en) * 2006-01-23 2011-05-17 Drexel University Self-exciting, self-sensing piezoelectric cantilever sensor
US8171795B1 (en) 2006-01-23 2012-05-08 Drexel University Self-exciting, self-sensing piezoelectric cantilever sensor for detection of airborne analytes directly in air
US8286486B2 (en) * 2006-05-10 2012-10-16 Drexel University Molecular control of surface coverage
US8481335B2 (en) * 2006-11-27 2013-07-09 Drexel University Specificity and sensitivity enhancement in cantilever sensing
US7992431B2 (en) * 2006-11-28 2011-08-09 Drexel University Piezoelectric microcantilevers and uses in atomic force microscopy
WO2008067386A2 (en) * 2006-11-28 2008-06-05 Drexel University Piezoelectric microcantilever sensors for biosensing
EP2115448A4 (en) 2007-02-01 2013-01-30 Univ Drexel PORTABLE PHASE SHIFT DETECTOR FOR SENSOR APPLICATIONS
US8512947B2 (en) * 2007-02-16 2013-08-20 Drexel University Detection of nucleic acids using a cantilever sensor
WO2008101199A1 (en) 2007-02-16 2008-08-21 Drexel University Enhanced sensitivity of a cantilever sensor via specific bindings
FR2916271B1 (fr) * 2007-05-14 2009-08-28 St Microelectronics Sa Circuit electronique permettant la mesure de masse de materiau biologique et procede de fabrication
US7993854B2 (en) * 2007-05-30 2011-08-09 Drexel University Detection and quantification of biomarkers via a piezoelectric cantilever sensor
US20090120168A1 (en) * 2007-11-08 2009-05-14 Schlumberger Technology Corporation Microfluidic downhole density and viscosity sensor
US8241569B2 (en) 2007-11-23 2012-08-14 Drexel University Lead-free piezoelectric ceramic films and a method for making thereof
US8236508B2 (en) * 2008-01-29 2012-08-07 Drexel University Detecting and measuring live pathogens utilizing a mass detection device
US8741663B2 (en) 2008-03-11 2014-06-03 Drexel University Enhanced detection sensitivity with piezoelectric sensors
WO2009140660A2 (en) 2008-05-16 2009-11-19 Drexel University System and method for evaluating tissue
IT1392736B1 (it) 2008-12-09 2012-03-16 St Microelectronics Rousset Dispositivo a microbilancia torsionale integrata in tecnologia mems e relativo processo di fabbricazione
US8722427B2 (en) * 2009-10-08 2014-05-13 Drexel University Determination of dissociation constants using piezoelectric microcantilevers
US20110086368A1 (en) * 2009-10-08 2011-04-14 Drexel University Method for immune response detection
CN104596906B (zh) * 2015-01-16 2017-08-25 上海大学 多测量头的水氧透气率测量系统
CN106404849B (zh) * 2015-01-22 2019-04-26 江西师范大学 基于纳米材料的传感器检测气体的方法
JP6945357B2 (ja) * 2017-06-08 2021-10-06 東京エレクトロン株式会社 制御装置。
CN109450401B (zh) * 2018-09-20 2022-03-18 天津大学 柔性单晶兰姆波谐振器及其形成方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4278492A (en) 1980-01-21 1981-07-14 Hewlett-Packard Company Frequency trimming of surface acoustic wave devices
US20030020367A1 (en) 2001-01-10 2003-01-30 Yoshio Maeda Surface acoustic wave device and its manufacturing method

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4364016A (en) * 1980-11-03 1982-12-14 Sperry Corporation Method for post fabrication frequency trimming of surface acoustic wave devices
WO1989008336A1 (en) 1988-02-29 1989-09-08 The Regents Of The University Of California Plate-mode ultrasonic sensor
US5189914A (en) 1988-02-29 1993-03-02 The Regents Of The University Of California Plate-mode ultrasonic sensor
US5490034A (en) 1989-01-13 1996-02-06 Kopin Corporation SOI actuators and microsensors
JPH0325343A (ja) * 1989-06-23 1991-02-04 Nec Corp センサ装置
US4952832A (en) * 1989-10-24 1990-08-28 Sumitomo Electric Industries, Ltd. Surface acoustic wave device
JPH0497611A (ja) * 1990-08-15 1992-03-30 Clarion Co Ltd 弾性表面波素子の製造方法
JPH04199906A (ja) * 1990-11-29 1992-07-21 Kokusai Electric Co Ltd 弾性表面波共振子
US5668303A (en) 1992-04-30 1997-09-16 Forschung E.V Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Sensor having a membrane as part of an electromechanical resonance circuit forming receiver and transmitter converter with interdigital structures spaced apart from one another
US5836203A (en) 1996-10-21 1998-11-17 Sandia Corporation Magnetically excited flexural plate wave apparatus
US6091182A (en) 1996-11-07 2000-07-18 Ngk Insulators, Ltd. Piezoelectric/electrostrictive element
JP3470031B2 (ja) * 1997-12-22 2003-11-25 京セラ株式会社 弾性表面波装置の製造方法
US6323580B1 (en) 1999-04-28 2001-11-27 The Charles Stark Draper Laboratory, Inc. Ferroic transducer
WO2001071336A1 (en) 2000-03-20 2001-09-27 The Charles Stark Draper Laboratory, Inc. Flexural plate wave sensor and array
US6455980B1 (en) 2000-08-28 2002-09-24 The Charles Stark Draper Laboratory, Inc. Resonator with preferred oscillation mode
US6506620B1 (en) 2000-11-27 2003-01-14 Microscan Systems Incorporated Process for manufacturing micromechanical and microoptomechanical structures with backside metalization
US6946314B2 (en) 2001-01-02 2005-09-20 The Charles Stark Draper Laboratory, Inc. Method for microfabricating structures using silicon-on-insulator material
CA2433738C (en) 2001-01-02 2012-07-24 The Charles Stark Draper Laboratory, Inc. Method for microfabricating structures using silicon-on-insulator material
US6511915B2 (en) 2001-03-26 2003-01-28 Boston Microsystems, Inc. Electrochemical etching process
EP1423990A2 (en) 2001-08-28 2004-06-02 Michael Thompson Electromagnetic piezoelectric acoustic sensor
JP4281327B2 (ja) * 2002-10-28 2009-06-17 株式会社村田製作所 表面波装置の製造方法
JP4345328B2 (ja) * 2003-03-13 2009-10-14 セイコーエプソン株式会社 弾性表面波デバイス及びその製造方法
US7045407B2 (en) 2003-12-30 2006-05-16 Intel Corporation Amorphous etch stop for the anisotropic etching of substrates

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4278492A (en) 1980-01-21 1981-07-14 Hewlett-Packard Company Frequency trimming of surface acoustic wave devices
US20030020367A1 (en) 2001-01-10 2003-01-30 Yoshio Maeda Surface acoustic wave device and its manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11626648B2 (en) 2018-08-21 2023-04-11 Lg Energy Solution, Ltd. Battery module including bus bar plate

Also Published As

Publication number Publication date
JP2008536395A (ja) 2008-09-04
EP1872474A2 (en) 2008-01-02
JP5078873B2 (ja) 2012-11-21
KR20080007552A (ko) 2008-01-22
US8536037B2 (en) 2013-09-17
US20060228657A1 (en) 2006-10-12
WO2006107961A2 (en) 2006-10-12
WO2006107961A3 (en) 2007-04-12

Similar Documents

Publication Publication Date Title
KR101245296B1 (ko) 전기 응답 디바이스
EP3377886B1 (en) Acoustic resonator with reduced mechanical clamping of an active region for enhanced shear mode response
CN102209890B (zh) 检测传感器、检测传感器的振子
US5668303A (en) Sensor having a membrane as part of an electromechanical resonance circuit forming receiver and transmitter converter with interdigital structures spaced apart from one another
JP5225981B2 (ja) 空中浮遊分析物を空気中で直接検出するための自己励振・自己検出型圧電カンチレバーセンサー
US10352904B2 (en) Acoustic resonator devices and methods providing patterned functionalization areas
US8593155B2 (en) MEMS in-plane resonators
WO2000026636A1 (en) Qcm sensor
US20100207602A1 (en) Resonant sensors and methods of use thereof for the determination of analytes
WO2004038354A2 (en) Resonant sensor and sensing system
WO2007006843A1 (en) Micromechanical sensor, sensor array and method
US9291600B2 (en) Piezoresistive NEMS array network
JP2009236607A (ja) Qcmデバイス
US9164051B2 (en) Electrically responsive device
JP2004093574A (ja) 原子間力顕微鏡用力方位センサ付カンチレバー
JP4803802B2 (ja) 質量測定装置
Jupe et al. Development of a piezoelectric flexural plate-wave (FPW) biomems-sensor for rapid point-of-care diagnostics
JP2006038584A (ja) 化学センサー及び測定装置
Mahdavi Resonant MEMS Piezoelectric Balances and Strain-Gauges
KR100336084B1 (ko) 큐씨엠 센서
US9638616B2 (en) Devices and methods for gravimetric sensing in liquid environments
Guirardel et al. On-chip self-sensing function of 4/spl times/4 matrix micromachined resonating piezoelectric membranes for mass detection applications [biosensor/chemical sensor applications]
HK1260243A1 (en) Acoustic resonator with reduced mechanical clamping of an active region for enhanced shear mode response

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PE0801 Dismissal of amendment

St.27 status event code: A-2-2-P10-P12-nap-PE0801

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

R17-X000 Change to representative recorded

St.27 status event code: A-5-5-R10-R17-oth-X000

FPAY Annual fee payment

Payment date: 20160912

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

FPAY Annual fee payment

Payment date: 20170912

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20180910

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20190314

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20190314