KR101233900B1 - 마이크로미러 구동 방법 및 장치 - Google Patents

마이크로미러 구동 방법 및 장치 Download PDF

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Publication number
KR101233900B1
KR101233900B1 KR1020117010412A KR20117010412A KR101233900B1 KR 101233900 B1 KR101233900 B1 KR 101233900B1 KR 1020117010412 A KR1020117010412 A KR 1020117010412A KR 20117010412 A KR20117010412 A KR 20117010412A KR 101233900 B1 KR101233900 B1 KR 101233900B1
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South Korea
Prior art keywords
micromirror
control
inclination
actuators
assigned
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Korean (ko)
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KR20110067156A (ko
Inventor
얀 호른
크리스티안 캠프터
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칼 짜이스 에스엠테 게엠베하
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Micromachines (AREA)
KR1020117010412A 2008-10-08 2009-10-06 마이크로미러 구동 방법 및 장치 Active KR101233900B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10369108P 2008-10-08 2008-10-08
DE102008050446.7 2008-10-08
US61/103,691 2008-10-08
DE102008050446A DE102008050446B4 (de) 2008-10-08 2008-10-08 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln
PCT/EP2009/007175 WO2010040506A1 (en) 2008-10-08 2009-10-06 Methods and devices for driving micromirrors

Publications (2)

Publication Number Publication Date
KR20110067156A KR20110067156A (ko) 2011-06-21
KR101233900B1 true KR101233900B1 (ko) 2013-02-15

Family

ID=41821122

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Application Number Title Priority Date Filing Date
KR1020117010412A Active KR101233900B1 (ko) 2008-10-08 2009-10-06 마이크로미러 구동 방법 및 장치

Country Status (8)

Country Link
US (2) US8345224B2 (https=)
EP (2) EP3193203B1 (https=)
JP (1) JP5325301B2 (https=)
KR (1) KR101233900B1 (https=)
CN (2) CN102177460A (https=)
DE (1) DE102008050446B4 (https=)
TW (1) TWI502282B (https=)
WO (1) WO2010040506A1 (https=)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008050446B4 (de) 2008-10-08 2011-07-28 Carl Zeiss SMT GmbH, 73447 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln
JP5587917B2 (ja) 2009-03-13 2014-09-10 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置
DE102010062720B4 (de) 2010-12-09 2012-07-12 Carl Zeiss Smt Gmbh EUV-Lithographiesystem
US9599905B2 (en) 2011-06-07 2017-03-21 Nikon Corporation Illumination optical system, exposure apparatus, device production method, and light polarization unit
TWI557432B (zh) 2011-06-13 2016-11-11 尼康股份有限公司 照明方法、曝光方法、元件製造方法、照明光學系統、以及曝光裝置
CN107390477B (zh) 2011-10-24 2020-02-14 株式会社尼康 照明系统、曝光装置及制造、图像形成、照明与曝光方法
US9732934B2 (en) 2011-10-28 2017-08-15 Nikon Corporation Illumination device for optimizing polarization in an illumination pupil
WO2013071940A1 (en) 2011-11-15 2013-05-23 Carl Zeiss Smt Gmbh Light modulator and illumination system of a microlithographic projection exposure apparatus
DE102013201506A1 (de) 2012-02-17 2013-08-22 Carl Zeiss Smt Gmbh Optisches Bauelement
DE102013201509A1 (de) 2012-02-17 2013-08-22 Carl Zeiss Smt Gmbh Optisches Bauelement
KR102170864B1 (ko) 2012-05-02 2020-10-28 가부시키가이샤 니콘 동공 휘도 분포의 평가 방법 및 개선 방법, 조명 광학계 및 그 조정 방법, 노광 장치, 노광 방법, 및 디바이스 제조 방법
DE102012011202A1 (de) * 2012-06-06 2013-09-12 Carl Zeiss Smt Gmbh Projektor und Verfahren zum Erzeugen eines Bildes
WO2014187599A1 (en) * 2013-05-22 2014-11-27 Carl Zeiss Smt Gmbh Optical component comprising an optical device and means for reducing radiation-induced influences on said optical device
DE102013212613B4 (de) * 2013-06-28 2015-07-23 Carl Zeiss Sms Gmbh Beleuchtungsoptik für ein Metrologiesystem sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik
JP6273109B2 (ja) * 2013-08-28 2018-01-31 株式会社ミツトヨ 光干渉測定装置
DE102014203188A1 (de) 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Verfahren zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage
CN104111592B (zh) * 2014-08-06 2016-06-08 中国科学院光电技术研究所 一种基于微反射镜阵列实现可变自由照明光瞳的方法
CN105573061B (zh) * 2014-10-16 2018-03-06 中芯国际集成电路制造(上海)有限公司 Euv光源和曝光装置
DE102017217164B4 (de) 2017-09-27 2020-10-15 Continental Automotive Gmbh Projektionsvorrichtung zum Erzeugen eines pixelbasierten Beleuchtungsmusters
DE102018202421B3 (de) 2018-02-16 2019-07-11 Carl Zeiss Microscopy Gmbh Vielstrahl-Teilchenstrahlsystem
DE102018216344A1 (de) * 2018-09-25 2020-03-26 Carl Zeiss Smt Gmbh Abstützung eines optischen elements
CN110347082B (zh) * 2019-07-12 2021-07-27 中国科学院上海微系统与信息技术研究所 一种驱动电路、驱动方法及微反射镜阵列
CN110954142B (zh) * 2019-12-10 2021-12-28 京东方科技集团股份有限公司 一种光学微电机传感器、基板及电子设备
CN114660880A (zh) * 2022-04-11 2022-06-24 长沙沃默科技有限公司 一种反射式投影成像装置及其设计方法
CN116698367A (zh) * 2023-05-23 2023-09-05 上海镭望光学科技有限公司 微反射镜阵列反射光光斑位置标定方法、装置及标定设备
DE102023207368A1 (de) * 2023-08-01 2025-02-06 Carl Zeiss Smt Gmbh Ansteuervorrichtung, optisches system und lithographieanlage

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100332888B1 (ko) 2000-08-25 2002-04-15 이형도 마이크로 미러를 이용한 광 픽업 액츄에이터
WO2003076977A2 (en) 2002-03-06 2003-09-18 Glimmerglass Networks, Inc. Method and apparatus for actuation of a two-axis mems device using three actuation elements
KR20040043609A (ko) * 2002-11-19 2004-05-24 삼성전자주식회사 마이크로미러 액츄에이터 및 그 제조방법
KR100716946B1 (ko) 2000-07-20 2007-05-10 삼성전자주식회사 마이크로미러 액추에이터를 이용한 광결합 구조체

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6312134B1 (en) * 1996-07-25 2001-11-06 Anvik Corporation Seamless, maskless lithography system using spatial light modulator
JP2863502B2 (ja) * 1996-10-23 1999-03-03 防衛庁技術研究本部長 マルチディザー方式補償光学装置
US7006595B2 (en) * 1998-05-05 2006-02-28 Carl Zeiss Semiconductor Manufacturing Technologies Ag Illumination system particularly for microlithography
US6300665B1 (en) * 2000-09-28 2001-10-09 Xerox Corporation Structure for an optical switch on a silicon on insulator substrate
JP2002189176A (ja) * 2000-12-20 2002-07-05 Mitsubishi Electric Corp ミラー駆動装置
KR100389865B1 (ko) * 2001-03-02 2003-07-04 삼성전자주식회사 마이크로미러 디바이스 및 이를 채용한 프로젝터
US6735004B1 (en) * 2001-03-15 2004-05-11 Nanogear, Inc. Rotatable counterbalanced actuator
JP3724432B2 (ja) * 2001-04-19 2005-12-07 株式会社ニコン 薄膜弾性構造体及びその製造方法並びにこれを用いたミラーデバイス及び光スイッチ
JP3908503B2 (ja) * 2001-10-30 2007-04-25 富士通株式会社 光スイッチ
US6643053B2 (en) * 2002-02-20 2003-11-04 The Regents Of The University Of California Piecewise linear spatial phase modulator using dual-mode micromirror arrays for temporal and diffractive fourier optics
US6707534B2 (en) * 2002-05-10 2004-03-16 Anvik Corporation Maskless conformable lithography
EP1367446A1 (en) * 2002-05-31 2003-12-03 ASML Netherlands B.V. Lithographic apparatus
US6906848B2 (en) * 2003-02-24 2005-06-14 Exajoule, Llc Micromirror systems with concealed multi-piece hinge structures
JP4244156B2 (ja) * 2003-05-07 2009-03-25 富士フイルム株式会社 投影露光装置
JP4357317B2 (ja) * 2003-05-13 2009-11-04 富士通株式会社 ティルトミラーの制御装置及び制御方法
DE10343333A1 (de) * 2003-09-12 2005-04-14 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
JP4717813B2 (ja) * 2003-09-12 2011-07-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光設備のための照明系
US7304783B2 (en) * 2003-11-01 2007-12-04 Fusao Ishii Control of micromirrors with intermediate states
US7646528B2 (en) * 2006-12-26 2010-01-12 Silicon Quest Kabushiki-Kaisha Deformable mirror device with oscillating states
CN100528735C (zh) * 2004-03-08 2009-08-19 松下电器产业株式会社 微致动器以及具有微致动器的装置
US7855825B2 (en) * 2005-04-15 2010-12-21 Panasonic Corporation Micromachine structure system and method for manufacturing same
JP2007264305A (ja) * 2006-03-28 2007-10-11 Fujitsu Ltd 光スイッチシステム
DE102006020734A1 (de) * 2006-05-04 2007-11-15 Carl Zeiss Smt Ag Beleuchtungssystem für die EUV-Lithographie sowie erstes und zweites optisches Element zum Einsatz in einem derartigen Beleuchtungssystem
US9250536B2 (en) * 2007-03-30 2016-02-02 Asml Netherlands B.V. Lithographic apparatus and method
WO2009026947A1 (en) * 2007-08-30 2009-03-05 Carl Zeiss Smt Ag Illumination system for illuminating a mask in a microlithographic projection exposure apparatus
WO2009080310A1 (en) * 2007-12-21 2009-07-02 Carl Zeiss Smt Ag Illumination system for a microlithographic projection exposure apparatus
DE102008050446B4 (de) 2008-10-08 2011-07-28 Carl Zeiss SMT GmbH, 73447 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100716946B1 (ko) 2000-07-20 2007-05-10 삼성전자주식회사 마이크로미러 액추에이터를 이용한 광결합 구조체
KR100332888B1 (ko) 2000-08-25 2002-04-15 이형도 마이크로 미러를 이용한 광 픽업 액츄에이터
WO2003076977A2 (en) 2002-03-06 2003-09-18 Glimmerglass Networks, Inc. Method and apparatus for actuation of a two-axis mems device using three actuation elements
KR20040043609A (ko) * 2002-11-19 2004-05-24 삼성전자주식회사 마이크로미러 액츄에이터 및 그 제조방법

Also Published As

Publication number Publication date
TW201019051A (en) 2010-05-16
CN104267495B (zh) 2016-12-07
EP3193203B1 (en) 2018-08-29
US20130088698A1 (en) 2013-04-11
DE102008050446A1 (de) 2010-04-15
JP2012505533A (ja) 2012-03-01
US10061202B2 (en) 2018-08-28
CN104267495A (zh) 2015-01-07
JP5325301B2 (ja) 2013-10-23
DE102008050446B4 (de) 2011-07-28
US8345224B2 (en) 2013-01-01
US20110188017A1 (en) 2011-08-04
EP2340456B1 (en) 2017-04-05
EP3193203A1 (en) 2017-07-19
CN102177460A (zh) 2011-09-07
WO2010040506A1 (en) 2010-04-15
TWI502282B (zh) 2015-10-01
KR20110067156A (ko) 2011-06-21
EP2340456A1 (en) 2011-07-06

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