KR101108540B1 - Method for the fabrication of organic electric device by patternable brush printing process - Google Patents

Abstract

The present invention is a method of manufacturing a substrate, a first electrode, a hole transport layer, a photoactive layer or a light emitting layer, and a second electrode, by applying a brush coating method capable of patterning all or some layers and the above The present invention relates to an organic electronic device manufactured by the method, and a patterning process, which has not been possible using a conventional brush coating method, can be applied in a relatively simple method. It is possible to continuously manufacture organic electronic devices such as organic light emitting diodes and organic light sensors at a low price.
In addition, when applied to a large area or a flexible substrate, patterning is possible, so that it can be usefully used in roll-to-roll systems, which are commercial systems.

Description

Method for the fabrication of organic electric device by patternable brush printing process}

The present invention relates to a method for manufacturing an organic electronic device to which a brush coating process capable of patterning is applied, and an organic electronic device manufactured by the method, and more particularly, to a substrate, a first electrode, a hole transport layer, a photoactive layer or a light emitting layer, and In the manufacture of an organic electronic device consisting of two electrodes, the present invention relates to a method for manufacturing all layers or a partial layer by applying a brush coating method capable of patterning and to an organic electronic device manufactured by the above method.

Compared to inorganic-based electronic devices, such as silicon (Si) and germanium (Ge), which are expensive and have limited reserves, organic electronic devices have low cost, flexibility in manufacturing process that does not require special vacuum equipment, and flexible due to low temperature process. flexible) Recently, due to the advantages such as the possibility of manufacturing the device has been actively studied.

In particular, a polymer-based organic electronic device that can be manufactured by a solution process such as spin coating, dip coating, doctor blading, and screen printing without requiring a vacuum deposition process has great advantages in terms of manufacturing cost and ease of processing. Has

In general, the manufacturing method of the organic solar cell which reports the highest efficiency includes the formation of the buffer layer and the photoactive layer using spin coating, but in this case, the vacuum chuck necessary for fixing the substrate is used. It has a limitation that it cannot be applied to fabrication of devices using flexible substrates.

In addition, in the case of dip coating, the film is formed while taking out the substrate from the solution at a constant speed. As the size of the substrate increases, it becomes difficult to obtain a uniform thin film due to the variation in coating thickness, and the uniform film through evaporation of the solvent. Since the substrate must be moved at a slow speed for formation, it takes a long time to produce a thin film.

In order to solve this disadvantage, Korean Patent Registration No. 10-0822356 has proposed a method of forming a thin film using a brush. The patent includes a method of manufacturing an organic-based solar cell through a painting process using a brush in the process of manufacturing one or more layers of an organic electrode layer, a hole transport layer, a photoactive layer and an electrode layer, but the application of the technology It is limited to the manufacture of solar cells.

In addition, the coating methods do not all include a pattern process, and thus there is a problem that it is not applicable to organic electronic devices having various structures and shapes. Particularly, spin coating and dip coating are not only impossible for patterning process due to the process mechanism, but also precisely due to the capillary shape between the mask and the substrate depending on the viscosity of the sample to be coated when the device is manufactured by the method of the process schematic shown in the above patent. Patterning is not possible.

The present invention has been made to solve the above problems, the main object of the present invention is to provide a method for producing an organic electronic device by applying a brush coating process capable of patterning and an organic electronic device manufactured by the method.

In order to achieve the above object, the present invention provides a method for manufacturing an organic electronic device by applying a brush coating process capable of patterning all or some layers of the organic electronic device.

In the present invention, the organic electronic device may include a bulk heterojunction (BHJ) organic photovoltaic cell (OPVs), a polymer light emitting diode (OLED), an organic thin film transistor, an organic light sensor, and the like. The mask used for the patterning is characterized in that the stainless steel (Stainless steal, STS) having a thickness of 0.05 ~ 0.2 mm.

In addition, the mask is sprayed with a repositionable adhesive after cleaning to increase the adhesive properties and dried for 10 minutes to 1 hour at room temperature ~ 50 ℃ to completely remove the residual solvent, It is characterized by surface modification by fixing on one electrode.

The present invention also provides an organic electronic device manufactured by the above method.

The present invention can be applied to the patterning process, which was impossible with the conventional brush coating method, in a relatively simple manner, and through the above method, organic thin film transistors, organic light emitting diodes, organic light sensors, as well as organic solar cells having various areas, structures, and shapes. It is possible to continuously manufacture organic electronic devices such as these at low prices.

In addition, when applied to a large area or a flexible substrate, patterning is possible, so that it can be usefully used in roll-to-roll systems, which are commercial systems.

Figure 1a is a structure of an organic solar cell according to the present invention, Figure 1b is a structure of a polymer light emitting diode according to the present invention.
2 is a structure of a metal mask according to the present invention.
3 is a schematic diagram of a brush coating process capable of patterning according to the present invention.
4A and 4B are graphs showing current density-voltage (JV) characteristics of an organic solar cell manufactured according to an embodiment of the present invention.
5a and 5b is an IPCE graph of an organic solar cell manufactured according to an embodiment of the present invention.
6 is a graph illustrating luminance-voltage (LV) characteristics of a polymer light emitting diode manufactured according to an embodiment of the present invention.
7 is a graph showing current density-voltage (JV) characteristics of a polymer light emitting diode manufactured according to an embodiment of the present invention.

Hereinafter, the present invention will be described in detail.

The present invention provides a method for manufacturing an organic electronic device by applying a patterning brush coating process.

Specifically, the present invention provides a bulk heterojunction (BHJ) organic photovoltaic cell (OPVs) or / and a polymer light emitting diode (polymer) using a brush coating method capable of patterning all or some layers of an organic electronic device. It provides a method of manufacturing a light emitting diode).

1A and 1B are schematic structures of an organic solar cell and a polymer light emitting diode manufactured according to an embodiment of the present invention. The organic solar cell according to the present invention includes a substrate 110, a first electrode 120, The hole transport layer 130, the photoactive layer 140, and the second electrode 150 has a stacked structure, the polymer light emitting diode substrate 110, the first electrode 120, the hole transport layer 130, The light emitting layer 141 and the second electrode 150 have a stacked structure.

In the present invention, a mask used in the patterning process may be used in a variety of materials, in particular, it is preferable that the metal having a chemical resistance or film such as stainless steel (stainless steal, STS) or the like. In addition, any material may be applied as long as it is stable in an organic solvent, an acid and a base, and in the present invention, an STS 304 material is used.

At this time, the thickness of the stainless steal 304 is preferably in the range of 0.05 ~ 0.2 mm, more preferably 0.1 mm. In addition, the effective areas of the mask for manufacturing the organic solar cell and the polymer light emitting diode are preferably 1 cm 2 (1 cm × 1 cm) and 4 mm 2 (2 mm × 2 mm), respectively.

In addition, the mask is washed sequentially with a detergent, acetone, isopropanol (IPA) and then dried for 1 to 30 minutes at 100 ~ 150 ℃, preferably at 110 ℃ for 10 minutes in a heating plate to remove the water and thoroughly cleaned. .

In addition, the mask cleaned as described above is preferably sprayed with a repositionable adhesive and dried for 10 minutes to 1 hour at room temperature to 50 ° C, preferably at 40 ° C for 30 minutes to completely remove the residual solvent. Do. Through the above process, the adhesive property can be increased, and the adhesive serves to enable repeated detachment between the metal mask and the substrate, and at the same time, to prevent the capillary phenomenon caused by the gap between the two substrates during brush coating. Role to enable patterning in the shape of a mask.

The substrate 110 includes polyethylene terephthalate (PET), polyethylene naphthelate (PEN), polypropylene (PP), polyimide (PI), polycarbonate (PC), polystylene (PS), polyoxyethylene (PS), AS resin, and ABS. Not only flexible and transparent materials such as plastics such as resins and triacetyl cellulose (TAC) but also glass, quartz plates and the like can be produced.

The first electrode 120 is applied to one surface of the substrate or in the form of a film using sputtering, E-Beam, thermal evaporation, spin coating, screen printing, inkjet printing, doctor blade or gravure printing, or the like. It is an electrode formed by coating. The first electrode 120 serves as an anode, and any material having transparency and conductivity as a material having a larger work function than the second electrode 150 to be described later may be used. For example, indium tin oxide (ITO) ), Gold, silver, fluorine doped tin oxide (FTO), aluminum doped zink oxide (AZO), indium zink oxide (IZO), ZnO-Ga ₂ O ₃ , There are inorganic compounds such as ZnO-Al ₂ O ₃ and antimony tin oxide (ATO) and organic conductive polymers such as PEDOT: PSS and carbon nanotubes, but it is preferable to use ITO.

In addition, the patterned ITO substrate is preferably washed sequentially with a detergent, acetone, isopropanol (IPA), and then dried in the same manner as the mask on a heating plate to completely remove the water to remove moisture.

In order to stack the hole transport layer 130 on the cleaned first electrode 120, the STS 304 mask coated with an adhesive is fixed on the first electrode and then surface modified. Through surface modification, the bonding surface potential can be maintained at a level suitable for the surface potential of the hole injection layer. When the modification is performed, the formation of the polymer thin film on the substrate is facilitated and the quality of the thin film is improved.

Pretreatment techniques for this include a) surface oxidation using parallel planar discharges, b) oxidizing the surface with ozone generated using UV ultraviolet light in a vacuum state, and c) oxygen radicals generated by plasma. There is a method of oxidizing by using, and depending on the state of the substrate, one of the above methods is selected. Whichever method is used, the effect of pretreatment should be prevented in general by preventing oxygen escape from the surface of the substrate and restraining the residual of moisture and organic matter. You can expect.

In the present invention, a method of oxidizing the surface through ozone generated by using UV, and after ultrasonic cleaning, the patterned substrate is baked on a heating plate, dried well, then put into a chamber, and a UV lamp is operated to operate an oxygen gas. Reacts with the UV light to clean the substrate patterned by ozone.

However, the method of modifying the patterned ITO substrate surface in the present invention does not need to be particularly limited, and any method may be used as long as the substrate is oxidized.

As the hole transport layer 130 formed on the modified ITO substrate, it is preferable to use poly (3,4-ethylenedioxythiophene) / poly (4-styrenesulfonate) [PEDOT: PSS], and brush the hole transport layer. The coating introduces a hole transport layer having a thickness of 20 to 60 nm.

As the electron acceptor for forming the photoactive layer of the organic solar cell, (6,6) -phenyl-C ₆₁ -butyl acid methyl ester (PCBM) is commonly used. It is a C ₆₀ derivative modified to enable solution processing and is known as the best performing electron acceptor. In addition, as the electron donor, poly-3-hexylthiophene (P3HT) or a CT type polymer and derivatives thereof are used, and the electron donor is blended with the electron donor undergoing a process of absorbing light and forming an exciton to form a photoactive layer. .

In the present invention, the photoactive layer 140 preferably uses P3HT as the electron donor and PCBM as the electron acceptor. In this case, the ratio of P3HT and PCBM is 1: 0.5 to 1: 2, preferably 1: 0.6 to 1: It is mix | blended and used at the weight ratio of 1.0. The materials are dissolved in an organic solvent. Preferably, the solution is dissolved in ortho-dichlorobenzene (ODCB) at a concentration of 1.5 to 6.0 wt% to brush-coat the solution to introduce a photoactive layer having a thickness of 150 to 300 nm. do. The coated thin film may be annealed at 80 to 180 ° C., preferably at 100 to 160 ° C. to increase the crystallinity of the thin film.

On the other hand, the light emitting layer 141 of the polymer light emitting diode is at least one selected from poly (1,4-phenylenevinylene) [PPV], polyalkylfluorine [PAF], poly (para-phenylene) [PPP], and the like. It is preferable to use, in the present invention using an orange light emitting polymer] (Super NRS-03, Covion, Germany) in the organic solvent chlorobenzene (chlorobenzene, CB) dissolved in a concentration of 0.5 to 2.0% by weight and then brush The coating introduces a light emitting layer with a thickness of 120 to 210 nm. In addition, the coated thin film may be heat treated at 80 to 150 ° C., preferably 80 to 120 ° C., for annealing to improve the morphology of the thin film.

The second electrode 150 is deposited inside the thermal evaporator exhibiting a vacuum degree of 5 × 10 ⁻⁷ torr or less when the photoactive layer 140 or the light emitting layer 141 is introduced. Available electrode materials include lithium fluoride / aluminum, lithium fluoride / calcium / aluminum, calcium / aluminum, barium fluoride / aluminum, barium fluoride / barium / aluminum, barium / aluminum, aluminum, gold, silver, magnesium: silver, or lithium It may be selected from aluminum, and it is preferable to use an electrode made of a structure of barium fluoride / barium / aluminum.

The present invention also relates to an organic solvent comprising a bulk heterojunction (BHJ) organic photovoltaic cell (OPVs), a polymer light emitting diode, an organic thin film transistor, an organic light sensor, and the like, manufactured by the above method. Provides an electronic device.

Hereinafter, the present invention will be described in more detail with reference to Examples. It is to be understood by those skilled in the art that these examples are for illustrative purposes only and that the scope of the present invention is not construed as being limited by these examples.

Example 1 Patterned ITO PET Substrate Cleaning

Patterned ITO PET with surface area of 10 × 10 mm (1.0 cm2 for organic solar cells) and 2 × 2 mm (4 mm2 for polymer light emitting diodes) (surface resistance: ~ 100 μs / sq ² ; Donga Chem Tech, Korea ) Ultrasonic cleaning is performed on the surface of the substrate in the order of detergents (Alconox, Aldrich, USA), acetone, and isopropanol (IPA) for 20 minutes, and then completely blown with nitrogen and then heated at 110 ° C for 10 minutes on a hot plate. Dry to remove moisture.

Once the patterned ITO PET substrate was thoroughly cleaned, the surface was hydrophilicly modified for 10 minutes in a UVO cleaner (UVO cleaner, Ahtech LTS, Korea).

Example 2 Fabrication of Organic Solar Cell Applying Brush Patterning Process

As shown in Fig. 2, a thickness of 0.1 mm and a mask made of STS 304 material (effective area: 10 × 10 mm) were prepared and washed in the same manner as in Example 1.

Spray-type repositionable adhesive (3M-75, 3M, USA) was applied on the cleaned metal mask for 3 seconds, and then heated in a heating plate at 40 ° C. for 30 minutes to remove the residual solvent in order to improve adhesive properties. .

The ITO PET substrate masked with a metal mask was placed in a UVO cleaner (UVO cleaner, Ahtech LTS, Korea) for 15 minutes, and the exposed surface of the ITO PET substrate was hydrophilically modified and the modified substrate was replaced with a nitrogen-substituted glove box. The plate was transferred to a heating plate preheated to 50 ° C. and heated for 10 minutes.

Brush the PEDOT: PSS, a hole transporting layer, once or three times using a general art brush (Pyeong Brush No. 4, Hwaheung Industry, Korea) on the surface of a sufficiently heated substrate to adjust the thickness of the thin film to 20 to 60 nm, and at 120 ° C. Heat treatment was carried out for 20 minutes.

In the photoactive layer, the ratio of electron donor P3HT and electron acceptor PCBM is 1: 0.6 (w / w), and the organic solvent ortho-deichlorobenzene (ODCB) is blended at a concentration of 1.5% by weight to 50 on the hole total layer. After brushing 1 to 3 times on a heating plate preheated to ℃ and introduced to a thickness of 150 ~ 300 ㎚, heat treatment at 120 ℃ for 10 minutes to improve the crystallinity of the polymer.

When the heat treatment is completed, the barium fluoride (BaF 2) is removed at a rate of 0.1 Å / s in a thermal evaporator showing a vacuum degree of 5 × 10 ⁻⁷ torr or less by removing the metal mask covering the ITO PET substrate to form an electrode. Nm, barium (Ba) was deposited at 2 nm at a rate of 0.2 kW / s, and aluminum (Al) was deposited at 100 nm at a rate of 5 kW / s to fabricate an organic solar cell.

Example 3 Organic Solar Cell Production (2)

An organic solar cell was manufactured in the same manner except for changing the concentration of the photoactive layer in Example 2 to 3.0 wt%.

Example 4 Organic Solar Cell Production (3)

An organic solar cell was manufactured by the same method except that the concentration of the photoactive layer in Example 2 was changed to 6.0 wt%.

Example 5 Organic Solar Cell Manufacturing (4)

An organic solar cell was manufactured in the same manner except that the heat treatment temperature of the photoactive layer in Example 3 was changed to 100 ° C.

Example 6 Organic Solar Cell Production (5)

An organic solar cell was manufactured in the same manner except that the heat treatment temperature of the photoactive layer in Example 3 was changed to 140 ° C.

Example 7 Organic Solar Cell Production (6)

An organic solar cell was manufactured in the same manner except for changing the heat treatment temperature of the photoactive layer in Example 3 to 160 ° C.

Comparative Example 1. Fabrication of Organic Solar Cell Applying Spin Coating Method

As a comparative example of the organic solar cell applying the brush patterning process of the present invention, a PEDOT: PSS having a thickness of about 40 nm using a spin coater by transferring a pretreated ITO PET substrate as in Example 1 to a glove box substituted with nitrogen. After the hole transport layer was introduced, heat treatment was performed on a heating plate at 120 ° C. for 20 minutes. The ratio of electron donor and electron acceptor was 1: 0.6 (w / w) and the concentration of 1.5 wt% in organic solvent ortho-dichlorobenzene (ODCB). The blended sample was spin-coated on the hole transport layer to obtain a 120 nm thick thin film, followed by heat treatment at 120 ° C. for 10 minutes to increase the crystallinity of the polymer.

To form the electrode in the heat-treated positive hole transport layer, 5 × 10 ^-7 barium fluoride (BaF2) In the internal heat evaporator showing a degree of vacuum of 2 torr or lower ㎚ at a rate of 0.1 Å / s, barium (Ba) is 0.2 Å / An organic solar cell was fabricated by depositing 2 nm at a speed of s and 100 nm of aluminum (Al) at a rate of 5 mA / s.

Example 8. Fabrication of Polymer Light Emitting Diode by Brush Patterning Process

The polymer light emitting diode to which the process of patterning of the present invention is applied is manufactured in the same manner as in the organic solar cell of Example 2, but the light emitting layer is a sample blended at a concentration of 0.5% by weight with an organic solvent of chlorobenzene (CB). Was brushed one to three times on a heating plate preheated to 50 ° C. on the hole transport layer and introduced at a thickness of 120 to 210 nm, followed by heat treatment at 90 ° C. for 30 minutes to increase the morphology of the thin film.

When the heat treatment is complete, barium fluoride (BaF2) In the internal heat evaporator showing a vacuum degree of less than 5 × 10 ^-7 torr to remove the metal mask covering the ITO PET substrate 2 ㎚ at a rate of 0.1 Å / s, barium (Ba ) Was deposited at 2 nm at a rate of 0.2 mA / s, and 200 nm at aluminum (Al) at a rate of 5 mA / s to produce a polymer light emitting diode.

Example 9 Preparation of Polymer Light-Emitting Diode (2)

A polymer light emitting diode was manufactured according to the same method as the concentration of the light emitting layer in Example 8 was changed to 0.75 wt%.

Example 10. Manufacture of Polymer Light Emitting Diode (3)

A polymer light emitting diode was manufactured according to the same method as the concentration of light emitting layer in Example 8, except that 1.0 wt% was changed.

Example 11 Preparation of Polymer Light-Emitting Diode (4)

A polymer light emitting diode was manufactured according to the same method as the concentration of light emitting layer in Example 8, except that the concentration was changed to 2.0 wt%.

Comparative Example 2. Fabrication of Polymer Light Emitting Diode by Spin Coating

As a comparative example of the polymer light emitting diode to which the brush patterning process of the present invention is applied, PEDOT: PSS having a thickness of about 40 nm using a spin coater by transferring a pre-treated ITO PET substrate as in Example 1 to a glove box substituted with nitrogen. After the hole transport layer was introduced, heat treatment was performed for 20 minutes on a 120 ° C. heating plate. A thin film having a thickness of 100 nm was obtained by spin-coating a sample obtained by blending an orange light-emitting polymer in an organic solvent chlorobenzene (CB) at a concentration of 0.5% by weight on the hole transport layer. After obtaining the heat treatment for 30 minutes at 90 ℃ to increase the morphology of the thin film.

To form an electrode on the heat-treated positive hole transport layer, 5 × 10 ^-7 barium fluoride (BaF2) In the internal heat evaporator showing a degree of vacuum of 2 torr or lower ㎚ at a rate of 0.1 Å / s, barium (Ba) is 0.2 Å / 2 nm and aluminum (Al) were deposited at a rate of 5 nm / s at a speed of 5 s / s to produce a polymer light emitting diode.

Experimental Example 1. Evaluation of Characteristics of Organic Solar Cell

In order to evaluate the electro-optical characteristics of the organic solar cells prepared in Examples 2 to 7 and Comparative Example 1, Keithley 2400 sourcemeter (Keithley, USA) and a solar simulator (Oriel 150W solar simulator) , newport, USA) using the standard conditions (AM 1.5G (Air Mass 1.5 Global, 100 Mass / ㎠, 25 ℃) to measure the current-voltage density, the optical short-circuit current density (Jsc) of the organic solar cells, Photo-opening voltage (Voc), Fill Factor (FF) and energy conversion efficiency are shown in Table 1 below.

At this time, Fill Factor (FF) is the voltage value Vmax × current density Jmax / (Voc × Jsc) at the maximum power point, and the energy conversion efficiency is FF × (Jsc × Voc) / Pin, Pin = 100 [㎽㎠ ].

Optical short circuit current density
Jsc (㎃ / ㎠) Photo-opening voltage
Voc (V) Fill factor
(%) Energy conversion efficiency
(%) Example 2 7.4 0.616 43.8 2.1 Example 3 8.5 0.636 48.8 2.6 Example 4 6.9 0.616 38.6 1.6 Example 5 5.2 0.595 26.6 0.83 Example 6 7.4 0.636 43.5 2.1 Example 7 7.3 0.616 40.7 1.8 Comparative Example 1 7.7 0.616 38.0 1.8

In addition, FIG. 4 shows the current density-voltage (JV) characteristics of the organic solar cells, and FIG. 5 shows the result of measuring the incident photon-to-current conversion efficiencem IPCE of the particle photons of the organic solar cells. Indicated.

As shown in Table 1 and FIG. 4, the energy conversion efficiency of the organic solar cell (see Comparative Example 1) using the spin coating method is 1.8%, whereas in the organic solar cell of the present invention (see Example 3), the energy ring The conversion efficiency was 2.6%, up to 45%. These values are higher than the highest efficiency of the recently reported flexible organic solar cell, and it is considered that the practical use of the organic solar cell may be accelerated by using the manufacturing method of the organic solar cell applying the brush patterning process of the present invention.

Experimental Example 2 Evaluation of Characteristics of Polymer Light-Emitting Diode

In order to evaluate the electro-optical properties of the polymer light emitting diodes prepared in Examples 8 to 11 and Comparative Example 2, Keithley 2400 (keithley 2400, Keithley, USA) and Photo-Research 670, Photo Research INC , United States) to measure the turn-on voltage (V), maximum brightness (cd / m 2), maximum efficiency (cd / A) and color coordinates and the results are shown in Table 2.

6 shows the results of measuring the luminance-voltage (L-V) of the polymer light emitting diodes, and FIG. 7 shows the results of measuring the current density-voltage (J-V) of the polymer light emitting diodes.

Turn-on voltage
(V) Brightness
(cd / ㎡) Efficiency
(cd / A) Color coordinates Example 8 3 76.8 0.62 (0.57, 0.42) Example 9 3 5554 1.2 (0.57, 0.42) Example 10 3 3438 0.59 (0.55, 0.44) Example 11 3 1193 0.59 (0.55, 0.44) Comparative Example 2 3 2927 0.46 (0.55, 0.44)

As shown in Table 2 and FIGS. 6 and 7, the maximum luminance and the maximum efficiency of the polymer light emitting diode (see Comparative Example 2) using the spin coating method are 2927 cd / m 2 and 0.46 cd / A, respectively. In the polymer light emitting diode (see Example 9), the maximum luminance and the maximum efficiency were 5554 cd / m 2 and 1.2 cd / A, respectively, increasing by 89% and 260%.

As with the organic solar cell, the polymer light emitting diode to which the brush patterning process of the present invention is applied has an improved result compared to the polymer light emitting diode manufactured by the conventional spin coating method.

Therefore, if the brush patterning process of the present invention is applied to an organic electronic device, it is expected to be easily and quickly produced in large quantities.

As described above, specific portions of the contents of the present invention have been described in detail, and for those skilled in the art, these specific techniques are merely preferred embodiments, and the scope of the present invention is not limited thereto. Will be obvious. Thus, the substantial scope of the present invention will be defined by the appended claims and their equivalents.

110: substrate 120: first electrode
130: hole transport layer 140: photoactive layer
141: light emitting layer 150: second electrode

Claims (12)

A method of manufacturing an organic electronic device having a structure in which a substrate 110, a first electrode 120, a hole transport layer 130, a photoactive layer 140 or a light emitting layer 141, and a second electrode 150 are stacked. To
A method of manufacturing an organic electronic device, comprising applying a brush coating process using a mask coated with a repositionable adhesive to enable patterning of all or some layers of the organic electronic device. The method of claim 1,
The mask is a method of manufacturing an organic electronic device, characterized in that the stainless steel (Stainless steal, STS). The method of claim 2,
The stainless steel (STS) is a manufacturing method of an organic electronic device, characterized in that STS 304 having a thickness of 0.05 ~ 0.2 mm. The method according to claim 1 or 2,
The mask used for patterning is cleaned and spray-coated with a repositionable adhesive, dried at room temperature to 50 ° C. for 10 to 60 minutes, and then fixed on the first electrode to perform surface modification. Method for producing an organic electronic device characterized in that. The method of claim 1,
The substrate 110 is made of polyethylene terephthalate (PET), polyethylene naphthelate (PEN), polypropylene (PP), polyimide (PI), PC (polycarbonate), PS (polystylene), POM (polyoxyethylene), AS resin, ABS resin, TAC (triacetyl cellulose), glass, or a method for producing an organic electronic device, characterized in that any one selected from a quartz plate. The method of claim 1,
The first electrode 120 is made of indium tin oxide (ITO), gold, silver, or fluorine doped tin oxide (FTO), aluminum doped zink oxide (AZO), or IZO. (indium zink oxide), ZnO-Ga ₂ O ₃ , ZnO-Al ₂ O ₃ , ATO (antimony tin oxide), PEDOT: PSS, or manufacturing an organic electronic device, characterized in that any one selected from carbon nanotubes Way. The method of claim 1,
The hole transport layer 130 is an organic electronic, characterized in that the introduction of a poly (3,4-ethylenedioxythiophene) / poly (4-styrene sulfonate) [PEDOT: PSS] by brush coating to a thickness of 20 ~ 60 nm Method of manufacturing the device. The method of claim 1,
The photoactive layer 140 is mixed with P3HT and PCBM in a weight ratio of 1: 0.5 to 1: 2, dissolved in an organic solvent at a concentration of 1.5 to 6.0% by weight, and then brush-coated to a thickness of 150 to 300 nm and the crystallinity of the thin film. Method for producing an organic electronic device, characterized in that it is introduced by annealing at 80 ~ 180 ℃ to increase the. The method of claim 1,
The light emitting layer 141 may include at least one selected from poly (1,4-phenylenevinylene) [PPV], polyalkylfluorine [PAF], and poly (para-phenylene) [PPP] in an organic solvent. After dissolving at a concentration of 0.5 to 2.0% by weight and brush-coated to a thickness of 120 ~ 210 nm and annealing at 80 ~ 150 ℃ to increase the morphology of the thin film, the manufacturing method of an organic electronic device. The method of claim 1,
The second electrode 150 may be lithium fluoride / aluminum, lithium fluoride / calcium / aluminum, calcium / aluminum, barium fluoride / aluminum, barium fluoride / barium / with the photoactive layer 140 or the light emitting layer 141 introduced therein. Organic, characterized in that the deposition of any one selected from aluminum, barium / aluminum, aluminum, gold, silver, magnesium: silver, or lithium: aluminum inside the thermal evaporator having a vacuum degree of 5 × 10 ^-7 torr or less Method of manufacturing an electronic device. The method of claim 1,
The organic electronic device is a method of manufacturing an organic electronic device, characterized in that the organic solar cell or a polymer light emitting diode. delete

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