KR100948084B1 - Coating method - Google Patents

Coating method Download PDF

Info

Publication number
KR100948084B1
KR100948084B1 KR1020070117949A KR20070117949A KR100948084B1 KR 100948084 B1 KR100948084 B1 KR 100948084B1 KR 1020070117949 A KR1020070117949 A KR 1020070117949A KR 20070117949 A KR20070117949 A KR 20070117949A KR 100948084 B1 KR100948084 B1 KR 100948084B1
Authority
KR
South Korea
Prior art keywords
substrate
coating
unit
processing equipment
application
Prior art date
Application number
KR1020070117949A
Other languages
Korean (ko)
Other versions
KR20090051517A (en
Inventor
장재영
전광복
Original Assignee
세메스 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 세메스 주식회사 filed Critical 세메스 주식회사
Priority to KR1020070117949A priority Critical patent/KR100948084B1/en
Publication of KR20090051517A publication Critical patent/KR20090051517A/en
Application granted granted Critical
Publication of KR100948084B1 publication Critical patent/KR100948084B1/en

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/26Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C13/00Means for manipulating or holding work, e.g. for separate articles
    • B05C13/02Means for manipulating or holding work, e.g. for separate articles for particular articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work

Abstract

In the coating apparatus and the coating method using the same, the coating apparatus is connected to the pre-processing equipment and the post-processing equipment to receive a substrate from the pre-processing equipment, and is provided with a transfer roller for conveying the substrate to the post-processing equipment after the coating process. When the substrate is introduced through the transfer roller, the substrate is introduced using the alignment unit, and silicon is applied onto the aligned substrate using the coating unit. Thus, it is possible to eliminate the loader and unloader equipment for loading and unloading the substrate with the application apparatus, and as a result reduce the overall size of the in-line installation with the application apparatus.

Description

Coating method {COATING METHOD}

The present invention relates to a coating apparatus and a coating method using the same, and more particularly, to a coating apparatus and a coating method using the same can reduce the size of the equipment, the process time.

Among the flat panel display manufacturing apparatuses, the coating apparatus is a device for applying silicon onto a glass substrate for flat panel display manufacturing. A general coating device is provided on an upper portion of a substrate and includes an application unit made of an application gun for applying silicon on the surface of the substrate while moving in one direction.

A general application process involves loading a substrate from the outside onto a road unit side, applying silicon to the surface of the substrate while moving the application gun at a constant speed from the top of the substrate, and externally removing the substrate from the application unit. And unloading the furnace.

The coating device loads the substrate for performing the coating process using the loader hander provided at the front of the coating unit, and unloads the substrate on which the coating process is completed by using the unloader hander provided at the rear end of the coating unit.

As described above, since the loader hander and the unloader hander are used to transfer the substrate, the coating device requires space in which the loader hander and the unloader hander are provided in addition to the coating unit in which the coating process is performed, and as a result, the application The overall size of the inline installation with the device also increases.

In addition, since the loading process must be preceded for the coating process and the unloading process is performed after the coating process, the overall time required for the coating process is increased, and as a result, the productivity of the flat panel display is reduced.

Accordingly, it is an object of the present invention to provide an application apparatus which can reduce the size of the equipment and can shorten the process time.

Another object of the present invention is to provide a coating method using the coating device described above.

The coating apparatus according to an aspect of the present invention receives a substrate from a pre-processing equipment to transfer the substrate to the post-processing equipment after the coating process, an alignment for detecting the alignment state of the substrate provided from the pre-processing equipment Unit, and an application unit for applying a treatment liquid onto the substrate.

In one embodiment of the present invention, the coating device is further provided on the lower portion of the conveying roller, and further comprises a support unit for supporting the substrate is conveyed through the conveying roller to the upper portion of the conveying roller. The support unit includes a plurality of support rods for directly supporting the substrate to move the substrate up and down, and a driver for moving the support rods up and down.

In one embodiment of the present invention, the alignment units are located at both lower sides of the transfer roller, and when the substrate is supported by the support unit, the alignment unit is raised to detect an alignment state of the substrate. The alignment unit may include an alignment camera for photographing the substrate.

In one embodiment of the present invention, the application unit includes an application gun for applying the treatment liquid onto the substrate when the substrate is supported by the support unit.

According to the application method according to another aspect of the present invention, the substrate is input from the preprocessing equipment via the transfer roller. When the transfer is complete, the substrate provided from the preprocessing equipment is aligned. The treatment liquid is applied onto the aligned substrate. The substrate on which the treatment liquid is applied is conveyed to the post-processing equipment by using the transfer roller.

In one embodiment of the present invention, the process of raising and then supporting the substrate to the upper portion of the transfer roller by using a support unit before aligning the transferred substrate may be preceded.

In one embodiment of the present invention, the step of aligning the substrate, if the substrate is supported by the support unit, the alignment unit provided below the transfer roller is raised to detect the alignment state of the substrate It includes.

In one embodiment of the present invention, in the step of applying the treatment liquid onto the substrate, the treatment liquid is applied onto the substrate while being supported by the support unit. Thereafter, when the application is completed, the supporting unit may be lowered to further seat the substrate on the transfer roller.

According to such a coating apparatus and a coating method using the same, the transfer roller is connected to the pre-processing equipment and post-processing equipment in the coating apparatus and receives the substrate from the pre-processing equipment, and conveys the substrate to the post-processing equipment after the coating process. By providing a, it is possible to remove the loader and unloader equipment for loading and unloading the substrate with the application device, and as a result, to reduce the overall size of the in-line equipment having the application device.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the invention is not limited to the embodiments described herein but may be embodied in other forms. Rather, the embodiments introduced herein are provided so that the disclosure will be thorough and complete, and will fully convey the spirit of the invention to those skilled in the art. In addition, in the present embodiment, a device for applying silicon to a glass substrate for manufacturing a flat panel display has been described as an example, but the present invention may be used for various types of substrates such as wafers, flexible substrates for film liquid crystals, photomask substrates, and color filter substrates. It can be applied to any apparatus for applying a treatment liquid to a substrate.

1 is a view schematically showing a coating apparatus according to an embodiment of the present invention.

Referring to FIG. 1, the coating apparatus 100 according to an exemplary embodiment of the present invention is a device for applying silicon onto a substrate 10 and includes a transfer roller 110 therein. Therefore, the coating device 100 receives the substrate 10 from the pre-processing equipment 30 through the feed roller 110, and after the coating process is completed, the post-processing equipment 50 through the feed roller 110 again. The substrate 10 is conveyed.

As such, the substrate 10 may be supplied and conveyed using the transfer roller 110 provided in the coating apparatus 100 so as to be connected to the pre / post process equipment 30 and 50, thereby, the coating apparatus 100 may be conventionally applied. A loader hand for loading the substrate from the pre-process equipment 30 before and after and the unloader hand for unloading the substrate 10 with the post-process equipment 50 are unnecessary, resulting in a reduction in the overall size of the inline equipment. Can be.

In addition, since the loading and unloading process is not performed before and after the coating process, the overall processing time can be shortened, and as a result, productivity of the flat panel display employing the substrate 10 can be improved.

Hereinafter, the internal structure of the coating apparatus 100 according to an embodiment of the present invention will be described in detail with reference to FIGS. 2 and 3.

2 and 3 are side views showing the internal structure of the coating device shown in FIG.

2 and 3, the application apparatus 100 includes a transfer roller 110, a base body 120, a support unit 130, an alignment unit 140, and an application unit 150.

The conveying roller 110 is rotated in a predetermined direction to receive the substrate 10 from the preprocessing equipment 30 (shown in FIG. 1). The transfer roller 110 is spaced apart from the upper surface of the base body 120 at a predetermined interval and is provided on the upper portion of the base body 120, and the transfer roller 110 supports the upper surface of the base body 120. Supported by the member 111.

The base body 120 is provided with a protrusion 121 protruding from the upper surface of the base body 120, the support unit 130 is seated on the protrusion 121, the lower portion of the transfer roller 110 It is provided. The support unit 130 includes a plurality of support rods 131 moving up and down and a driving unit 132 for moving up and down the support rods 131.

Specifically, when the transfer of the substrate 10 from the pre-process equipment 30 to the coating device 100 is completed, the plurality of support rods 131 is raised by the drive unit 132 is transferred to the substrate 10 ) To the upper portion of the conveying roller 110 to space the conveying roller 110 and the substrate 10, and to support the substrate 10 in the state. After the application process is completed, the plurality of support rods 131 descends to mount the substrate 10 coated with the silicon 11 on the transfer roller 110 again.

On the other hand, the alignment unit 140 is provided on both lower sides of the transfer roller 110. The alignment unit 140 includes an alignment camera 141 for detecting an alignment state of the substrate 10 while the substrate 10 is supported by the support unit 130. In detail, when the substrate 10 is supported by the support unit 130, the alignment camera 410 photographs the substrate 10 supported at a predetermined position, and is photographed from the alignment camera 410. The controller (not shown) receiving the image determines the alignment state of the substrate 10 using the image. That is, if the alignment state of the substrate 10 is satisfactory, it is instructed to perform the next process (that is, an application process). If the alignment state of the substrate 10 is poor, the support unit 130 is controlled to control the substrate 10. To align).

An application unit 150 is provided on the substrate 10 and has an application gun for supplying silicon 11 on the surface of the substrate 10. The applicator is applied to the silicon 11 on the surface of the substrate 10 while moving at a constant speed in a predetermined direction. In particular, the silicon coating process is performed in a state where the substrate 10 is supported by the support unit 130. As such, the substrate 10 on which the silicon coating process is completed is then conveyed to the post-process equipment 50 through the transfer roller 110.

4 is a flowchart illustrating an application process using the application apparatus illustrated in FIGS. 2 and 3.

2 to 4, the coating apparatus 100 receives a substrate from the preprocessing equipment 30 through the transfer roller 110 to perform the coating process (S210).

When the transfer of the substrate 10 is completed, the plurality of support rods 131 of the support unit 130 are raised to lift the substrate 10 to the upper portion of the transfer roller 110 to support the substrate 10 ( S220).

Next, the alignment unit 140 provided at both lower sides of the transfer roller 110 is raised to check the alignment state of the substrate 10 in a state in which the substrate 10 is supported by the support unit 130. (S230). That is, the substrate may be photographed using the alignment camera, the substrate may be aligned based on the photographed image, and then the support unit may be adjusted to align the substrate.

When the alignment process as described above is completed, the silicon 11 is coated on the surface of the substrate 10 through the application unit 150 (S240). The silicon coating step is preferably performed while the substrate 10 is still supported by the support unit 130.

Subsequently, when the silicon coating process is completed, the plurality of support rods 131 of the support unit 130 are lowered to seat the substrate 10 coated with the silicon 11 on the transfer roller 110. Therefore, the board | substrate 10 to which the silicon 11 was apply | coated is conveyed to the post process equipment through the feed roller 110 (S250).

1 is a view schematically showing a coating apparatus according to an embodiment of the present invention.

2 and 3 are side views showing the internal structure of the coating device shown in FIG.

4 is a flowchart illustrating an application process using the application apparatus illustrated in FIGS. 2 and 3.

* Description of the symbols for the main parts of the drawings *

10 substrate 11 silicon

30: preprocessing equipment 50: postprocessing equipment

100: coating device 110: feed roller

120: base substrate 130: support unit

140: alignment unit 150: application unit

Claims (10)

  1. delete
  2. delete
  3. delete
  4. delete
  5. delete
  6. delete
  7. Receiving a substrate from a preprocessing device through transfer rollers;
    Raising the substrate placed on the conveying rollers from the conveying rollers by a supporting unit having support rods which are lowered and lowered under the conveying rollers;
    Applying a processing liquid onto the substrate placed on the support unit while the substrate is raised from the transfer rollers; And
    Placing the substrate on the transfer rollers by simultaneously lowering the support rods after application is complete; And
    And conveying the substrate on which the treatment liquid is applied to a post-processing equipment by using the transfer rollers.
  8. The method of claim 7, wherein
    And aligning the substrate placed on the support unit.
  9. The method of claim 8,
    Aligning the substrate includes applying an alignment unit disposed below the transfer rollers so as to approach the bottom surface of the substrate while the substrate is raised on the transfer rollers. Way.
  10. delete
KR1020070117949A 2007-11-19 2007-11-19 Coating method KR100948084B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020070117949A KR100948084B1 (en) 2007-11-19 2007-11-19 Coating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020070117949A KR100948084B1 (en) 2007-11-19 2007-11-19 Coating method

Publications (2)

Publication Number Publication Date
KR20090051517A KR20090051517A (en) 2009-05-22
KR100948084B1 true KR100948084B1 (en) 2010-03-16

Family

ID=40859577

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070117949A KR100948084B1 (en) 2007-11-19 2007-11-19 Coating method

Country Status (1)

Country Link
KR (1) KR100948084B1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101009120B1 (en) * 2008-10-20 2011-01-18 (주) 청호열처리 Pump drive hub cementation agent automatic application system
KR101016719B1 (en) * 2010-07-27 2011-02-25 한국기계연구원 Universal coating apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100367963B1 (en) 1996-08-30 2003-02-19 동경 엘렉트론 주식회사 Coating apparatus for semiconductor process
KR20070058978A (en) * 2005-12-05 2007-06-11 동경 엘렉트론 주식회사 Substrate conveying system, substrate conveying device and substrate treatment device
JP2007150280A (en) * 2005-11-04 2007-06-14 Dainippon Printing Co Ltd Substrate supporting apparatus, substrate supporting method, substrate processing apparatus, substrate processing method, and method of manufacturing display apparatus constitutional member
KR100766115B1 (en) 2006-02-15 2007-10-11 엘지전자 주식회사 Coating apparatus for substrate of flat panel display

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100367963B1 (en) 1996-08-30 2003-02-19 동경 엘렉트론 주식회사 Coating apparatus for semiconductor process
JP2007150280A (en) * 2005-11-04 2007-06-14 Dainippon Printing Co Ltd Substrate supporting apparatus, substrate supporting method, substrate processing apparatus, substrate processing method, and method of manufacturing display apparatus constitutional member
KR20070058978A (en) * 2005-12-05 2007-06-11 동경 엘렉트론 주식회사 Substrate conveying system, substrate conveying device and substrate treatment device
KR100766115B1 (en) 2006-02-15 2007-10-11 엘지전자 주식회사 Coating apparatus for substrate of flat panel display

Also Published As

Publication number Publication date
KR20090051517A (en) 2009-05-22

Similar Documents

Publication Publication Date Title
CN100407367C (en) The substrate processing apparatus, a substrate processing method
CN100401312C (en) Automatic optical inspection system and method
JP2006199483A (en) Stage device and coating device
JP4049751B2 (en) Coating film forming device
CN1646400A (en) Substrate conveying device
CN101098760B (en) Apparatus and method for applying photocuring resin
CN1433265A (en) Base board operation result checking device and method and electric circuit producing system and method
JPH11111800A (en) Method and apparatus for transporting substrates
CN101431008B (en) Substrate treatment device, coating device and coating method
JP2006222398A (en) Coating and developing apparatus and coating and developing method
CN1818542B (en) Inspection method and apparatus for mounted electronic components
CN100528562C (en) Method and apparatus for supporting and clamping a substrate
TW200304189A (en) Electronic component mounting apparatus and electronic component mounting method
CN101489791A (en) Position matching method and screen printer
CN1812071B (en) Substrates treating device
TW201431768A (en) Detaching apparatus and detaching method
CN101727009A (en) Liquid processing apparatus and liquid processing method
CN101479108B (en) Printing device
KR101274391B1 (en) Bonding sheet sticking equipment and method
JP2013077639A (en) Wafer treatment apparatus and wafer treatment method
KR20090030231A (en) Normal pressure drying device, substrate processing apparatus and substrate processing method
JP3828808B2 (en) Component mounting apparatus and component mounting method
KR20120015172A (en) Apparatus and method of inspecting display device
US8707893B2 (en) Substrate treatment system, substrate treatment method, and non-transitory computer storage medium
JP4673801B2 (en) Liquid crystal display device and manufacturing method thereof

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
AMND Amendment
E601 Decision to refuse application
J201 Request for trial against refusal decision
AMND Amendment
A107 Divisional application of patent
B601 Maintenance of original decision after re-examination before a trial
S901 Examination by remand of revocation
GRNO Decision to grant (after opposition)
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20130305

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20140311

Year of fee payment: 5

LAPS Lapse due to unpaid annual fee