KR100901745B1 - The manufacturing method of thin-film photovoltaic cells and module - Google Patents

Abstract

A thin film solar cell and a method for manufacturing a module are provided to make a compact mass production line by reducing the length of a cleaner by replacing a wet cleaning process with a dry cleaning process in the mass production line. An insulating substrate is drily cleaned by using an organic material removing unit and a particle removing unit(S10). A transparent electrode is separately patterned with a predetermined interval on the insulating substrate(S20). The patterned transparent electrode is drily cleaned by using the particle removing unit(S30). A semiconductor layer is formed in a surface of the transparent electrode(S40). A metal electrode is patterned on the semiconductor layer(S50). The metal electrode is drily cleaned.

Description

Thin film solar cell and module manufacturing method {THE MANUFACTURING METHOD OF THIN-FILM PHOTOVOLTAIC CELLS AND MODULE}

The present invention relates to a method for manufacturing a thin film solar cell and a module, and more particularly, to manufacture a thin film solar cell and a module which can reduce production cost by replacing the wet cleaning process with dry cleaning in a thin film solar cell mass production line. It is about a method.

A solar cell is a semiconductor device that directly converts solar energy into electricity, and may be classified into silicon, compound, and organic materials according to materials used therein.

Silicon-based solar cells are classified into single crystalline silicon, polycrystalline silicon, and amorphous silicon solar cells according to the phase of the semiconductor.

In addition, solar cells are classified into bulk (substrate) type solar cells and thin film type solar cells according to the thickness of the semiconductor. Thin film type solar cells are solar cells having a thickness of a semiconductor layer of several tens to several micrometers or less.

In silicon-based solar cells, monocrystalline and polycrystalline silicon solar cells belong to the bulk type, and amorphous silicon solar cells belong to the thin film type.

On the other hand, compound-based solar cells are bulk type such as GaAs (Gallium Arsenide) and InP (Indium Phosphide) of Group III-V and CdTe (Cadmium Telluride) of Group II-VI and CuInSe ₂ (CIS; Group I-III-VI); It is classified into thin film type such as Copper Indium Diselenide), and the organic material solar cell is classified into organic molecular type and organic / inorganic complex type. In addition, there are dye-sensitized solar cells, all of which belong to the thin film type.

As such, a bulk silicon solar cell having a relatively high energy conversion efficiency has been widely used for ground power.

However, in recent years, as the demand for bulk silicon solar cells has soared, the price is on the rise due to the shortage of raw materials. In order to reduce the cost and mass-produce technology of solar cell for ground power, it is urgently needed to develop a thin-film solar cell that can significantly reduce silicon raw materials.

In general, a wet cleaning method using deionized water is widely used in mass production lines of thin film solar cells.

Particularly, in the current mass production of solar cells, low iron tempered glass, soda lime glass or low iron tempered glass in which transparent electrodes such as indium tin oxide (ITO) or tin oxide (SnO ₂ ) are patterned is mainly used.

In addition, inexpensive and lightweight flexible substrates such as polyimide, polyethylen terephthalate (PET), PEN, Al foil, and stainless steel are also used.

When the substrate is contaminated with an organic material, peeling off of the substrate is likely to occur during the formation of the solar cell, and the organic material may diffuse into the light receiving layer to reduce the photoelectric conversion efficiency of the solar cell.

Particles generated during the unit process are transferred to a conveyor or a robot in an in-line mass production line, and can be transferred to other substrates. Pin holes may be generated during the formation, and when the conductive dust remains in the laser patterning line, it may interfere with the insulation between neighboring unit cells, thereby decreasing the yield and efficiency of the solar cell module.

Therefore, in order to achieve high efficiency and high yield in solar cell mass production line, multi-step cleaning is essential, such as initial cleaning, patterned transparent electrode cleaning, and cleaning after edge exclusion.

Here, in the case of initial cleaning, a pure water cleaner using an alkaline detergent (detergent) is mainly used to remove organic matter and particles formed on the surface of the substrate.

In addition, the transparent electrode cleaning is mainly used as a pure water cleaner to remove the fine particles formed on the surface when the transparent electrode formed on the substrate is patterned by a laser scriber (laser scriber).

After cleaning the transparent electrode, a full-scale solar cell formation process is developed as follows.

A semiconductor layer is formed on a transparent electrode formed on a substrate to be patterned by a laser patterning method, and a metal electrode pattern is formed to form an internally connected solar cell structure. Since conductive fines are generated during metal electrode patterning, a cleaning process using a pure water cleaner may be performed immediately.

After that, the edges are chamfered and the solar cell module is completed by forming a bus bar and assembling the module.

Here, since the Al frame is inserted in assembling the solar cell module, insulation of corners is essential. In order to insulate the edges, before the busbars are formed, the edge chamfering process is performed to remove semiconductor and conductor thin films formed on the substrate at the edge portion with a predetermined width. This is the usual way.

Pure water scrubbers used in the conventional thin film solar cell mass production line have high cleaning and dust removal effects, but have the following disadvantages in terms of maintenance.

In general, a pure water scrubber is composed of a unit that sufficiently flows pure water or detergent mixture to the surface, a roll brush unit, a unit that rinses with pure water, an air knife unit that removes water, and the like. Because of the length of the equipment, it helps to increase the area occupied by the entire solar cell mass production line.

In addition, the maintenance cost for producing a large amount of pure water and managing the resistance value above a certain amount, and because a large amount of waste water is generated, the processing cost is large, there is a disadvantage in that the running cost as a whole.

Accordingly, in order to solve the above problems, the present invention replaces all of the wet cleaning processes using pure scrubbers used in the thin film solar cell mass production line with dry cleaning to reduce the initial investment cost of the thin film solar cell mass production line, It is an object of the present invention to provide a method for manufacturing a thin film solar cell and a module that can reduce running costs.

According to an aspect of the present invention, there is provided a method of manufacturing a thin film solar cell and a module, the method comprising: patterning transparent electrodes to be spaced apart from each other at predetermined intervals on an insulating substrate; Forming a semiconductor layer on a surface of the transparent electrode; And patterning a metal electrode on the semiconductor layer, wherein the dry substrate is dry-cleaned using the organic material removing unit and the dust removing unit prior to the patterning of the transparent electrode. Stage 1; And a second step of dry cleaning the patterned transparent electrode using the dust removal unit after the step of patterning the transparent electrode.

The first step includes the process of removing the organics by the organics removing unit using nitrogen (N2) and cooling dry air (CDA); And it is preferable that the dust removal unit includes a process of removing the dust using the cooling dry air.

The process of removing the organic material may be performed by generating ozone by using an atmospheric pressure plasma, an ultraviolet lamp, or a combination of an atmospheric pressure plasma and an ultraviolet lamp. It is desirable to remove.

The dust removing process may include: floating the dust on the substrate by using the cooling air for cooling the dust removing unit; And it is preferable to include a process for sucking the dust in the vicinity using a suction head (suction head).

In the second step, the dust removal unit floats the dust on the transparent electrode using cooling dry air; And it is preferable to include a process for sucking the dust in the vicinity using a suction head (suction head).

In another embodiment, the method may further include: patterning transparent electrodes to be spaced apart from each other by a predetermined interval on an insulating substrate; Forming a semiconductor layer on a surface of the transparent electrode; And patterning a metal electrode on the semiconductor layer, wherein the dry substrate is dry-cleaned using the organic material removing unit and the dust removing unit prior to the patterning of the transparent electrode. Stage 1; A second step of dry cleaning the patterned transparent electrode using the dust removal unit after the step of patterning the transparent electrode; And a third step of dry cleaning the patterned metal electrode using the dust removal unit after the patterning of the metal electrode.

The first step may include the process of removing the organics by the organics removing unit using nitrogen (N 2) and cooling dry air; And it is preferable that the dust removal unit includes a process of removing the dust using the cooling dry air.

The process of removing the organic material may be performed by generating ozone by using an atmospheric pressure plasma, an ultraviolet lamp, or a combination of an atmospheric pressure plasma and an ultraviolet lamp. It is desirable to remove.

The dust removing process may include: floating the dust on the substrate by using the cooling air for cooling the dust removing unit; And it is preferable to include the suction head (Suction head) using the suction process around.

The second and third steps may include: floating the dust on the transparent electrode and the metal electrode by the dust removing unit using cooling dry air; And it is preferable to include a process for sucking the dust in the vicinity using a suction head (suction head).

In another embodiment, the method may further include: patterning transparent electrodes to be spaced apart from each other by a predetermined interval on an insulating substrate; Forming a semiconductor layer on a surface of the transparent electrode; Patterning a metal electrode on the semiconductor layer; And an edge chamfering step of removing the transparent electrode, the semiconductor layer, and the metal electrode formed on the substrate at the corner portion with a predetermined width, wherein the insulating substrate is formed before the step of patterning the transparent electrode. Dry cleaning using the organic matter removing unit and the dust removing unit; A second step of dry cleaning the patterned transparent electrode using the dust removal unit after the step of patterning the transparent electrode; And a third step of dry cleaning using the dust removal unit after the edge chamfering step.

The first step may include the process of removing the organics by the organics removing unit using nitrogen (N 2) and cooling dry air; And it is preferable that the dust removal unit includes a process of removing the dust using the cooling dry air.

The process of removing the organic material may be performed by generating ozone by using an atmospheric pressure plasma, an ultraviolet lamp, or a combination of an atmospheric pressure plasma and an ultraviolet lamp. It is desirable to remove.

The dust removing process may include: floating the dust on the substrate by using the cooling air for cooling the dust removing unit; And it is preferable to include a process for sucking the dust in the vicinity using a suction head (suction head).

The second and third steps may include: floating the dust on the transparent electrode and the corner by the dust removing unit using cooling dry air; And it is preferable to include a process for sucking the dust in the vicinity using a suction head (suction head).

In another embodiment, the method may further include: patterning transparent electrodes to be spaced apart from each other by a predetermined interval on an insulating substrate; Forming a semiconductor layer on a surface of the transparent electrode; Patterning a metal electrode on the semiconductor layer; And an edge chamfering step of removing the transparent electrode, the semiconductor layer, and the metal electrode formed on the substrate at the corner portion with a predetermined width, wherein the insulating substrate is formed before the step of patterning the transparent electrode. Dry cleaning using the organic matter removing unit and the dust removing unit; A second step of dry cleaning the patterned transparent electrode using the dust removal unit after the step of patterning the transparent electrode; A third step of dry cleaning the patterned metal electrode after the step of patterning the metal electrode using a dust removal unit; And a fourth step of dry cleaning using the dust removal unit after the edge chamfering step.

The first step may include the process of removing the organics by the organics removing unit using nitrogen (N 2) and cooling dry air; And it is preferable that the dust removal unit includes a process of removing the dust using the cooling dry air.

The process of removing the organic material may be performed by generating ozone by using an atmospheric pressure plasma, an ultraviolet lamp, or a combination of an atmospheric pressure plasma and an ultraviolet lamp. It is desirable to remove.

The dust removing process may include: floating the dust on the substrate by using the cooling air for cooling the dust removing unit; And it is preferable to include a process for sucking the dust in the vicinity using a suction head (suction head).

The second to fourth steps may include: floating the dust on the transparent electrode, the metal electrode, and the edge by the dust removing unit using cooling dry air; And it is preferable to include a process for sucking the dust in the vicinity using a suction head (suction head).

As described above, according to the method for manufacturing a thin film solar cell and a module according to the present invention, the dry cleaning method proposed by replacing the wet cleaning method in the thin film solar cell mass production line is 1/3 of the pure water cleaner whose length occupied by the cleaner is wet cleaning. Hereinafter, there is an effect that can be configured in a compact production line (compact).

In addition, the price of equipment is also cheaper than pure scrubbers, there is no need for pure water generating equipment and management equipment, there is an effect that can significantly lower the initial investment.

In addition, since low-purity nitrogen (N ₂ ) gas and cooling dry air are used instead of pure water, the utility fee is low and no waste water is generated so that no waste water treatment cost is generated. There is a significant savings.

Hereinafter, a thin film solar cell and a method for manufacturing a module configured as described above will be described in detail with reference to the accompanying drawings.

1 is a cross-sectional view showing the structure of a thin film solar cell manufactured by the thin film solar cell and the module manufacturing method according to the first embodiment of the present invention.

As shown in FIG. 1, the thin film solar cell 1 has a structure in which a plurality of unit cells 20 are electrically connected in series on a glass substrate or a transparent plastic substrate 10 (hereinafter, referred to as a “transparent substrate”). .

Accordingly, the thin film solar cell 1 includes a transparent electrode 22 formed in a band shape that is disconnected (insulated) from an upper portion of the transparent substrate 10, which is an insulator, and a unit sun formed in a band shape covering the transparent electrode 22. It is composed of a cell (semiconductor) layer 24, a metal electrode layer 26 formed in a band shape covering the solar cell layer 24, a plurality of cut (insulated) unit cells 20 are electrically connected in series It is.

In addition, the back protective film layer 30 made of resin is formed by covering the metal electrode with the metal electrode to prevent electrical short-circuit and protection of the solar cell.

In order to manufacture the integrated thin film solar cell 1 having such a structure, a laser patterning method, a chemical vaporization machining (CVM) method, a mechanical scribing method using a metal needle, etc. may be used. It is commonly used.

The laser patterning method mainly uses a YAG laser beam to etch the transparent electrode 22, the solar cell (semiconductor) layer 24, the metal electrode layer 26, and the like.

Then, as shown in FIG. 1, the solar cell (semiconductor) layer 24 and the metal electrode layer 26 are sequentially stacked on the transparent electrode 22, and the thin film is covered with the back protective layer 30 thereon. The solar cell 1 can be manufactured.

In the mass production line of the thin film solar cell 1 configured as described above, when the substrate is contaminated with organic matter and fine particles occur during the unit process, the yield and efficiency of the solar cell module are reduced.

Therefore, in order to achieve high efficiency and high yield simultaneously in the thin film solar cell mass production line according to the present invention, the initial cleaning, the patterned transparent electrode cleaning, the patterned metal electrode cleaning, the edge exclusion cleaning after dry cleaning give.

This will be described in detail with reference to FIGS. 2 to 5.

Hereinafter, a thin film solar cell and a module control method according to an embodiment of the present invention configured as described above will be described in detail with reference to FIGS. 2 and 5.

FIG. 2 is a flowchart illustrating a method of manufacturing a thin film solar cell according to a second embodiment of the present invention, FIG. 3 is a flowchart illustrating a procedure of a method of manufacturing a thin film solar cell according to a third embodiment of the present invention. 5 is a flowchart showing a procedure of a method of manufacturing a thin film solar cell module according to a fourth embodiment of the present invention, and FIG. 5 is a flowchart showing a procedure of a method of manufacturing a thin film solar cell module according to a fifth embodiment of the present invention.

On the other hand, the method for manufacturing a thin film solar cell, the step of patterning the transparent electrodes so as to be spaced apart from each other on the insulating substrate at a predetermined interval (S20), forming a semiconductor layer on the surface of the transparent electrode (S40), and Patterning a metal electrode on the semiconductor layer (S50) is commonly included.

As shown in FIG. 2, in the method of manufacturing the thin film solar cell according to the second embodiment of the present invention, the insulating substrate is dried with low purity nitrogen (N 2) and cooling prior to the step (S20) of patterning the transparent electrode. A first step (S10) of dry cleaning with air, and a second step (S30) of dry cleaning the patterned transparent electrode with cooling dry air after the step of patterning the transparent electrode.

On the other hand, the dry cleaning method includes a cleaning method using an atmospheric plasma (AP Plasma), EUV (Eximer Ultra-Violet) and USC (Ultra Sonic Cleaner).

Here, atmospheric pressure plasma (atmosphere pressure plasma) cleaning using low-purity nitrogen and cooling air, low-purity nitrogen is a plasma atmosphere gas of about 2N purity is sufficient, and cooling dried air (CDA) O radical is generated as a reactive gas by the plasma and reacts with O2 in the atmosphere to generate ozone. The ozone reacts with organic matter, converts into volatile CO and CO2, and is exhausted to remove organic matter.

In addition, the cleaning method using EUV is a method of generating ozone in the atmosphere by using an excimer laser as an ultraviolet light source, reacting with organic matter, converting it into volatile CO / CO2, and removing the organic matter.

In the cleaning method using USC, the CDA is purified by passing through a hepa filter, and then blown onto the substrate at a predetermined period (frequency) with a blow unit, and ultrasonic waves are generated. It absorbs suspended dust and collects it in a pre-filter.

Referring to the thin film solar cell manufacturing method according to the present invention using the dry cleaning method as described above in detail, the first step (S10) is to remove organic matter and particles formed on the surface of the substrate, low-purity nitrogen (N2) ) And a unit for removing organic matter using cooling dry air, and a unit for removing dust using cooling dry air, and a process of removing organic matter and removing dust by transporting a substrate through a horizontal conveyor drive. You will go through the process.

The unit for removing the organic material is to remove the organic material using an atmosphere plasma (UV), an ultraviolet lamp (UV), or a combination of the atmospheric plasma (UV) and ultraviolet lamp (UV) method. Both methods use the principle of removing ozone from the surface to remove organic matter from the atmosphere, and the cleaning effect is similar.

In addition, the dust removal unit located in the latter part is composed of a suction head which blows the cooling dry air to blow the dust on the substrate and sucks it around. sonic cleaner). Utilities required are electricity, low purity nitrogen gas, cooling dry air and general exhaust.

On the other hand, when using a zinc oxide (ZnO) thin film as a transparent electrode, there is a side advantage that the electron mobility (mobility) is increased by the ozone treatment to reduce the resistivity (resistivity).

In addition, the second step (S30) is dry cleaning using a USC (ultra sonic cleaner), a cleaning step of removing the fine particles generated after patterning the transparent electrode with a laser patterning equipment.

The substrate is transported through a horizontal conveyor drive, and the cooling air is blown to float the dust on the substrate, and the suction head is sucked in to remove the dust from the surroundings [often USC (ultra sonic cleaner). )]. Utilities required are dry air for electricity and cooling, and general exhaust is required.

In addition, when using a zinc oxide (ZnO) thin film as a transparent electrode, the UV lamp at the back of the dust removal device is advantageous because it has an additional advantage that the mobility is increased by ozone treatment and the resistivity is reduced. You can also install At this time, the generated ozone is harmful to the human body, so the ozone exhaust device must be included.

Therefore, organic matter or fine particles adhered when forming an insulating substrate or a substrate coated with a transparent electrode are removed by dry cleaning the surfaces of the insulating substrate and the transparent electrode, and after a clean surface is obtained, the surface from the surface of the transparent electrode to the metal electrode is removed. It is possible to obtain a laminated structure that is sequentially overlapped.

As shown in FIG. 3, in the method of manufacturing the thin film solar cell according to the third embodiment of the present invention, the insulating substrate is made of low purity nitrogen (N 2) and cooling dry air before the step of patterning the transparent electrode (S20). First step (S10) of dry cleaning with a step, patterning the transparent electrode after the second step (S30) of dry cleaning the patterned transparent electrode with cooling dry air after the step (S20), and patterning the metal electrode And a third step (S60) of dry cleaning the patterned metal electrode after the step (S50) with cooling dry air.

Here, the third step (S60) is for removing the dust after forming the metal electrode pattern, it can be used USC method. This is the same as the USC method used in the second step of FIG. 2 and description thereof will be omitted.

On the other hand, the method of manufacturing a thin film solar cell having a step of dry cleaning in the step before and after the transparent electrode patterned on the insulating substrate has been described, the manufacturing method of the present invention is not only in this case, but also the transparent electrode is patterned The same applies to those having a dry cleaning step on the substrate.

Meanwhile, a method of manufacturing a thin film solar cell module includes: patterning transparent electrodes so as to be spaced apart from each other at predetermined intervals on an insulating substrate in common (S200), and forming a semiconductor layer on a surface of the transparent electrode (S400). And a step (S500) of patterning the metal electrode on the semiconductor layer, and an edge chamfering step (S600) of removing the transparent electrode, the semiconductor layer, and the metal electrode formed on the substrate of the corner portion to a predetermined width.

As shown in FIG. 4, in the method of manufacturing the thin film solar cell module according to the fourth embodiment of the present invention, the insulating substrate is dried with low purity nitrogen (N 2) and cooling before the step of patterning the transparent electrode (S200). First step (S100) of dry cleaning with air, a second step (S300) of dry cleaning the patterned transparent electrode with cooling dry air after the step of patterning the transparent electrode (S200), and edge chamfering step ( After step S600) is configured to include a third step (S700) of dry cleaning with cooling dry air.

The first step S100 of FIG. 4 is the same as the first step S10 of FIG. 2, and the second and third steps S200 and S300 are the same as the second step S20 of FIG. 2. Since this is the same, description thereof will be omitted.

After constructing the thin film solar cell as shown in FIGS. 1 and 2, the edges of the thin film solar cell are chamfered (S600), and thereafter, bus bar formation (S800) and module assembly (S900) are performed. Through the solar cell module will be completed.

Here, since the Al frame is inserted in assembling the solar cell module, insulation of corners is essential.

In order to insulate the edges, the bus bar is formed before the bus bar formation (S800), and the edge chamfering step (S600) for removing a predetermined width of the semiconductor and conductor thin films formed on the substrate of the edge portion is performed. Dry cleaning (S700) to clean the dust.

As in the step of dry cleaning the patterned transparent electrode (S200), first, the suction head transfers the substrate by driving a horizontal conveyor, blows the dry air for cooling, blows the dust on the substrate, and sucks in the surroundings ( Suction is removed using a suction head (commonly called USC (ultra sonic cleaner)). Utilities required are dry air for electricity and cooling, and general exhaust is required.

As shown in FIG. 5, in the method of manufacturing the thin film solar cell module according to the fifth embodiment of the present invention, the insulating substrate is dried with low purity nitrogen (N 2) and cooling before the step of patterning the transparent electrode (S200). The first step (S100) of dry cleaning with air, the second step (S300) of dry cleaning the patterned transparent electrode with dry air for cooling after the step of patterning the transparent electrode (S200), and patterning the metal electrode A third step (S650) of dry cleaning the patterned metal electrode after cooling (S500) after the step (S500) and a fourth step of dry cleaning with the drying air for cooling after the edge chamfering (S600) ( S700) is configured to include.

Therefore, the method of manufacturing a thin film solar cell and a module according to the present invention as described above has a long solar cell manufacturing equipment by a pure water scrubber, so that the entire solar cell mass production line occupies a large area and produces a large amount of pure water and has a constant resistance value. The maintenance cost for the above management is large, and dry cleaning is performed by using a dry cleaning unit instead of the pure water cleaner where a large amount of waste water has been generated, thereby reducing the initial investment cost in the thin film solar cell and module mass production line, and running cost. Can be reduced.

As described above, those skilled in the art will appreciate that the present invention can be implemented in other specific forms without changing the technical spirit or essential features. Therefore, the exemplary embodiments described above are to be understood as illustrative and not restrictive in all respects, and the scope of the present invention is indicated by the following claims rather than the detailed description, and the meaning and scope of the claims and All changes or modifications derived from the equivalent concept should be interpreted as being included in the scope of the present invention.

1 is a cross-sectional view showing the structure of a thin film solar cell manufactured by a thin film solar cell and a module manufacturing method according to a first embodiment of the present invention.

2 is a flowchart illustrating a procedure of a method of manufacturing a thin film solar cell according to a second embodiment of the present invention.

3 is a flowchart illustrating a procedure of a method of manufacturing a thin film solar cell according to a third embodiment of the present invention.

4 is a flowchart illustrating a procedure of a method of manufacturing a thin film solar cell module according to a fourth embodiment of the present invention.

5 is a flowchart illustrating a procedure of a method of manufacturing a thin film solar cell module according to a fifth embodiment of the present invention.

Claims (20)

Patterning the transparent electrodes so as to be spaced apart from each other at predetermined intervals on the insulating substrate; Forming a semiconductor layer on a surface of the transparent electrode; And In the thin film solar cell manufacturing method comprising the step of patterning a metal electrode on the semiconductor layer, A first step of dry cleaning the insulating substrate using the organic material removing unit and the dust removing unit prior to the step of patterning the transparent electrode; And A second step of dry cleaning the patterned transparent electrode using the dust removal unit after the step of patterning the transparent electrode, The first step, Removing the organics by the organics removing unit using nitrogen (N 2) and cooling dry air; And The dust removal unit includes a process of removing the dust using the cooling dry air, The process of removing the organic material is to remove the organic material by generating ozone by a method using a combination of an atmospheric pressure plasma and an ultraviolet lamp (UV), Thin film solar cell manufacturing method. delete delete The method of claim 1, The process of removing the dust, Allowing the dust removal unit to float the dust on the substrate using cooling dry air; And sucking the dust in the vicinity by using a suction head. The method of claim 1, The second step, Allowing the dust removal unit to float the dust on the transparent electrode using cooling dry air; And sucking the dust in the vicinity by using a suction head. Patterning the transparent electrodes so as to be spaced apart from each other at predetermined intervals on the insulating substrate; Forming a semiconductor layer on a surface of the transparent electrode; And In the thin film solar cell manufacturing method comprising the step of patterning a metal electrode on the semiconductor layer, A first step of dry cleaning the insulating substrate using the organic material removing unit and the dust removing unit prior to the step of patterning the transparent electrode; A second step of dry cleaning the patterned transparent electrode using the dust removal unit after the step of patterning the transparent electrode; And A third step of dry cleaning the patterned metal electrode using a dust removal unit after the patterning of the metal electrode, The first step, Removing the organics by the organics removing unit using nitrogen (N 2) and cooling dry air; And The dust removal unit includes a process of removing the dust using the cooling dry air, The process of removing the organic material is to remove the organic material by generating ozone by a method using a combination of an atmospheric pressure plasma and an ultraviolet lamp (UV), Thin film solar cell manufacturing method. delete delete The method of claim 6, The process of removing the dust, Allowing the dust removal unit to float the dust on the substrate using cooling dry air; And sucking the dust in the vicinity by using a suction head. The method of claim 6, The second step and the third step, Allowing the dust removal unit to float dust on the transparent electrode and the metal electrode, respectively, by using cooling air; And sucking the dust in the vicinity by using a suction head. Patterning the transparent electrodes so as to be spaced apart from each other at predetermined intervals on the insulating substrate; Forming a semiconductor layer on a surface of the transparent electrode; Patterning a metal electrode on the semiconductor layer; And In the thin film solar cell module manufacturing method comprising the edge chamfering step of removing the transparent electrode and the semiconductor layer and the metal electrode formed on the substrate of the corner portion to a predetermined width, A first step of dry cleaning the insulating substrate using the organic material removing unit and the dust removing unit prior to the step of patterning the transparent electrode; A second step of dry cleaning the patterned transparent electrode using the dust removal unit after the step of patterning the transparent electrode; And A third step of dry cleaning using the dust removal unit after the edge chamfering step, The first step, Removing the organics by the organics removing unit using nitrogen (N 2) and cooling dry air; And The dust removal unit includes a process of removing the dust using the cooling dry air, The process of removing the organic material, a method using a combination of an atmospheric pressure plasma (atmosphere pressure plasma) and an ultraviolet lamp (UV) to generate the ozone (ozone), to remove the organic material, a thin film solar cell module manufacturing method. delete delete The method of claim 11, The process of removing the dust, Allowing the dust removal unit to float the dust on the substrate using cooling dry air; And sucking the dust from the periphery using a suction head. The method of claim 11, The second step and the third step, Allowing the dust removal unit to float the dust on the transparent electrode and the corner by using cooling air for cooling; And sucking the dust from the periphery using a suction head. Patterning the transparent electrodes so as to be spaced apart from each other at predetermined intervals on the insulating substrate; Forming a semiconductor layer on a surface of the transparent electrode; Patterning a metal electrode on the semiconductor layer; And In the thin film solar cell module manufacturing method comprising the edge chamfering step of removing the transparent electrode and the semiconductor layer and the metal electrode formed on the substrate of the corner portion to a predetermined width, A first step of dry cleaning the insulating substrate using the organic material removing unit and the dust removing unit prior to the step of patterning the transparent electrode; A second step of dry cleaning the patterned transparent electrode using the dust removal unit after the step of patterning the transparent electrode; A third step of dry cleaning the patterned metal electrode after the step of patterning the metal electrode using a dust removal unit; And A fourth step of dry cleaning using the dust removal unit after the edge chamfering step, The first step, Removing the organics by the organics removing unit using nitrogen (N 2) and cooling dry air; And The dust removal unit includes a process of removing the dust using the cooling dry air, The process of removing the organic material is to remove the organic material by generating ozone by a method using a combination of an atmospheric pressure plasma and an ultraviolet lamp (UV), Thin film solar cell module manufacturing method. delete delete The method of claim 16, The process of removing the dust, Allowing the dust removal unit to float the dust on the substrate using cooling dry air; And sucking the dust from the periphery using a suction head. The method of claim 16, The second to fourth steps, Allowing the dust removal unit to float the dust on the transparent electrode, the metal electrode and the corner portion by using the cooling dry air; And sucking the dust from the periphery using a suction head.

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