KR100756310B1 - 입자형 다결정실리콘 제조용 고압 유동층반응기 - Google Patents

입자형 다결정실리콘 제조용 고압 유동층반응기 Download PDF

Info

Publication number
KR100756310B1
KR100756310B1 KR1020060011493A KR20060011493A KR100756310B1 KR 100756310 B1 KR100756310 B1 KR 100756310B1 KR 1020060011493 A KR1020060011493 A KR 1020060011493A KR 20060011493 A KR20060011493 A KR 20060011493A KR 100756310 B1 KR100756310 B1 KR 100756310B1
Authority
KR
South Korea
Prior art keywords
pressure
fluidized bed
silicon
bed reactor
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020060011493A
Other languages
English (en)
Korean (ko)
Other versions
KR20070080306A (ko
Inventor
김희영
윤경구
박용기
최원춘
Original Assignee
한국화학연구원
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to KR1020060011493A priority Critical patent/KR100756310B1/ko
Application filed by 한국화학연구원 filed Critical 한국화학연구원
Priority to US12/093,513 priority patent/US7972562B2/en
Priority to EP07708807.8A priority patent/EP1984297B1/en
Priority to RU2008132506/15A priority patent/RU2397952C2/ru
Priority to PCT/KR2007/000657 priority patent/WO2007091834A1/en
Priority to ES07708807.8T priority patent/ES2436770T3/es
Priority to CN2007800044671A priority patent/CN101378989B/zh
Priority to JP2008554132A priority patent/JP4955706B2/ja
Publication of KR20070080306A publication Critical patent/KR20070080306A/ko
Application granted granted Critical
Publication of KR100756310B1 publication Critical patent/KR100756310B1/ko
Priority to US12/609,364 priority patent/US8114352B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J37/00—Baking; Roasting; Grilling; Frying
    • A47J37/06—Roasters; Grills; Sandwich grills
    • A47J37/067—Horizontally disposed broiling griddles
    • A47J37/0682—Horizontally disposed broiling griddles gas-heated
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/04—Pressure vessels, e.g. autoclaves
    • B01J3/046—Pressure-balanced vessels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1818—Feeding of the fluidising gas
    • B01J8/1827—Feeding of the fluidising gas the fluidising gas being a reactant
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1836—Heating and cooling the reactor
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/029—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J37/00—Baking; Roasting; Grilling; Frying
    • A47J37/06—Roasters; Grills; Sandwich grills
    • A47J37/07—Roasting devices for outdoor use; Barbecues
    • A47J37/0786—Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00389—Controlling the temperature using electric heating or cooling elements
    • B01J2208/00398—Controlling the temperature using electric heating or cooling elements inside the reactor bed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00389—Controlling the temperature using electric heating or cooling elements
    • B01J2208/00407—Controlling the temperature using electric heating or cooling elements outside the reactor bed

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Food Science & Technology (AREA)
  • Silicon Compounds (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
KR1020060011493A 2006-02-07 2006-02-07 입자형 다결정실리콘 제조용 고압 유동층반응기 Expired - Fee Related KR100756310B1 (ko)

Priority Applications (9)

Application Number Priority Date Filing Date Title
KR1020060011493A KR100756310B1 (ko) 2006-02-07 2006-02-07 입자형 다결정실리콘 제조용 고압 유동층반응기
EP07708807.8A EP1984297B1 (en) 2006-02-07 2007-02-07 High-pressure fluidized bed reactor for preparing granular polycrystalline silicon
RU2008132506/15A RU2397952C2 (ru) 2006-02-07 2007-02-07 Реактор высокого давления с псевдоожиженным слоем для получения гранулированного поликристаллического кремния
PCT/KR2007/000657 WO2007091834A1 (en) 2006-02-07 2007-02-07 High-pressure fluidized bed reactor for preparing granular polycrystalline silicon
US12/093,513 US7972562B2 (en) 2006-02-07 2007-02-07 High-pressure fluidized bed reactor for preparing granular polycrystalline silicon
ES07708807.8T ES2436770T3 (es) 2006-02-07 2007-02-07 Reactor de lecho fluidizado de alta presión para preparar silicio policristalino granular
CN2007800044671A CN101378989B (zh) 2006-02-07 2007-02-07 用于制备粒状多晶硅的高压流化床反应器
JP2008554132A JP4955706B2 (ja) 2006-02-07 2007-02-07 粒状多結晶シリコン製造用流動層反応器
US12/609,364 US8114352B2 (en) 2006-02-07 2009-10-30 High-pressure fluidized bed reactor for preparing granular polycrystalline silicon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060011493A KR100756310B1 (ko) 2006-02-07 2006-02-07 입자형 다결정실리콘 제조용 고압 유동층반응기

Publications (2)

Publication Number Publication Date
KR20070080306A KR20070080306A (ko) 2007-08-10
KR100756310B1 true KR100756310B1 (ko) 2007-09-07

Family

ID=38345388

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060011493A Expired - Fee Related KR100756310B1 (ko) 2006-02-07 2006-02-07 입자형 다결정실리콘 제조용 고압 유동층반응기

Country Status (8)

Country Link
US (2) US7972562B2 (https=)
EP (1) EP1984297B1 (https=)
JP (1) JP4955706B2 (https=)
KR (1) KR100756310B1 (https=)
CN (1) CN101378989B (https=)
ES (1) ES2436770T3 (https=)
RU (1) RU2397952C2 (https=)
WO (1) WO2007091834A1 (https=)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130053693A (ko) * 2011-11-16 2013-05-24 주식회사 실리콘밸류 유동층 반응기
US8580203B2 (en) 2010-10-01 2013-11-12 Siliconvalue Llc Fluidized bed reactor
US8580204B2 (en) 2011-04-20 2013-11-12 Siliconvalue Llc Fluidized bed reactor
KR101329032B1 (ko) * 2011-04-20 2013-11-14 주식회사 실리콘밸류 다결정 실리콘 제조장치 및 이를 이용한 다결정 실리콘의 제조방법
KR101329033B1 (ko) * 2011-04-20 2013-11-14 주식회사 실리콘밸류 유동층 반응기
KR101356391B1 (ko) * 2011-04-20 2014-02-03 주식회사 실리콘밸류 다결정 실리콘 제조장치
US10569247B1 (en) 2019-03-11 2020-02-25 Korea Institute Of Energy Research Installation and operation method of dual control valves in a high pressure fluidized bed system
KR20220047967A (ko) * 2019-06-26 2022-04-19 엑스-에너지 엘엘씨 진행 반응 중에 입자 샘플링을 허용하는 유동화 베드 반응기 시스템

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100756310B1 (ko) * 2006-02-07 2007-09-07 한국화학연구원 입자형 다결정실리콘 제조용 고압 유동층반응기
KR100783667B1 (ko) * 2006-08-10 2007-12-07 한국화학연구원 입자형 다결정 실리콘의 제조방법 및 제조장치
DE102007021003A1 (de) 2007-05-04 2008-11-06 Wacker Chemie Ag Verfahren zur kontinuierlichen Herstellung von polykristallinem hochreinen Siliciumgranulat
US8790782B2 (en) * 2008-07-02 2014-07-29 E I Du Pont De Nemours And Company Method for making glass frit powders using aerosol decomposition
CN101318654B (zh) * 2008-07-04 2010-06-02 清华大学 一种流化床制备高纯度多晶硅颗粒的方法及流化床反应器
CN103058194B (zh) 2008-09-16 2015-02-25 储晞 生产高纯颗粒硅的反应器
DE102009043947B4 (de) 2009-09-04 2011-07-07 G+R Technology Group AG, 93128 Anlage zur Herstellung von polykristallinem Silizium mit Vorrichtung zum Ausleiten gasförmiger Messproben
US9023425B2 (en) 2009-11-18 2015-05-05 Rec Silicon Inc Fluid bed reactor
JP5637013B2 (ja) * 2010-03-04 2014-12-10 三菱マテリアル株式会社 トリクロロシラン製造装置及び製造方法
US8404199B2 (en) 2010-08-06 2013-03-26 Empire Technology Development Llc Fluorine based vanadium boride nanoparticle synthesis
KR101057101B1 (ko) * 2010-10-12 2011-08-17 (주)기술과가치 입자형 다결정실리콘 제조용 유동층 반응기 및 이를 이용한 다결정 실리콘 제조방법
US20120100061A1 (en) 2010-10-22 2012-04-26 Memc Electronic Materials, Inc. Production of Polycrystalline Silicon in Substantially Closed-loop Processes
US8449848B2 (en) 2010-10-22 2013-05-28 Memc Electronic Materials, Inc. Production of polycrystalline silicon in substantially closed-loop systems
US9156705B2 (en) 2010-12-23 2015-10-13 Sunedison, Inc. Production of polycrystalline silicon by the thermal decomposition of dichlorosilane in a fluidized bed reactor
US8849584B2 (en) * 2010-12-29 2014-09-30 Sunedison, Inc. Systems and methods for particle size determination and control in a fluidized bed reactor for use with thermally decomposable silicon-containing gas
US8452547B2 (en) 2010-12-29 2013-05-28 Memc Electronic Materials, Inc. Systems and methods for particle size determination and control in a fluidized bed reactor
US20120183686A1 (en) * 2011-01-19 2012-07-19 Rec Silicon Inc. Reactor system and method of polycrystalline silicon production therewith
US20130129570A1 (en) * 2011-04-20 2013-05-23 Siliconvalue Llc. Polycrystal silicon manufacturing apparatus
TW201304864A (zh) * 2011-06-10 2013-02-01 Rec Silicon Inc 高純度矽塗佈顆粒之製造
JP5897851B2 (ja) * 2011-09-12 2016-04-06 東洋炭素株式会社 粉体処理装置および粉体処理方法
WO2013049325A1 (en) 2011-09-30 2013-04-04 Memc Electronic Materials, Inc. Production of polycrystalline silicon by the thermal decomposition of silane in a fluidized bed reactor
WO2013049314A2 (en) 2011-09-30 2013-04-04 Memc Electronic Materials, Inc. Production of polycrystalline silicon by the thermal decomposition of silane in a fluidized bed reactor
KR101432896B1 (ko) * 2012-10-29 2014-08-21 웅진에너지 주식회사 폴리실리콘 제조용 유동층 반응기
US9212421B2 (en) 2013-07-10 2015-12-15 Rec Silicon Inc Method and apparatus to reduce contamination of particles in a fluidized bed reactor
US9587993B2 (en) 2012-11-06 2017-03-07 Rec Silicon Inc Probe assembly for a fluid bed reactor
KR20150082349A (ko) * 2012-11-06 2015-07-15 알이씨 실리콘 인코포레이티드 유동상 반응기 내의 입자들의 오염을 감소시키는 방법 및 장치
WO2014099502A1 (en) * 2012-12-21 2014-06-26 Rec Silicon Inc High-temperature grade steel for fluidized bed reactor equipment
CN107364869A (zh) * 2013-04-16 2017-11-21 江苏中能硅业科技发展有限公司 流化床反应器及其用于制备高纯粒状多晶硅的方法
CN103449442B (zh) * 2013-09-03 2015-03-18 浙江精功新材料技术有限公司 一种流化床多晶硅颗粒的制备系统及利用该系统制备多晶硅的工艺
US20150104369A1 (en) * 2013-10-11 2015-04-16 Rec Silicon Inc Polysilicon transportation device and a reactor system and method of polycrystalline silicon production therewith
DE102014212049A1 (de) 2014-06-24 2015-12-24 Wacker Chemie Ag Wirbelschichtreaktor und Verfahren zur Herstellung von polykristallinem Siliciumgranulat
US9446367B2 (en) * 2014-08-15 2016-09-20 Rec Silicon Inc Joint design for segmented silicon carbide liner in a fluidized bed reactor
US9238211B1 (en) * 2014-08-15 2016-01-19 Rec Silicon Inc Segmented silicon carbide liner
US9662628B2 (en) 2014-08-15 2017-05-30 Rec Silicon Inc Non-contaminating bonding material for segmented silicon carbide liner in a fluidized bed reactor
DE102014221928A1 (de) * 2014-10-28 2016-04-28 Wacker Chemie Ag Wirbelschichtreaktor und Verfahren zur Herstellung von polykristallinem Siliciumgranulat
KR20170101985A (ko) * 2014-12-31 2017-09-06 알이씨 실리콘 인코포레이티드 하부 밀봉 장치를 갖는 실리콘 증착 반응기
US10837106B2 (en) 2015-05-12 2020-11-17 Corner Star Limited Clamping assembly for a reactor system
DE102015224120A1 (de) * 2015-12-02 2017-06-08 Wacker Chemie Ag Wirbelschichtreaktor und Verfahren zur Herstellung von polykristallinem Siliciumgranulat
RU2691344C1 (ru) * 2018-09-10 2019-06-11 Вадим Георгиевич Кузьмин Способ очистки зерен кварца и зерно кварца, полученное согласно способу
FR3112148B1 (fr) 2020-07-01 2022-07-15 Safran Ceram Dispositif pour le dépôt chimique en phase vapeur en lit fluidisé
CN115078450A (zh) * 2021-03-11 2022-09-20 中国科学院过程工程研究所 一种热转化反应的分析装置及其分析方法
CN113501794A (zh) * 2021-07-28 2021-10-15 南京硕达生物科技有限公司 一种2-氨基-5-巯基-1,3,4-噻二唑的制备方法
CN115007066A (zh) * 2022-08-05 2022-09-06 山西阳煤化工机械（集团）有限公司 一种冷氢化反应器
KR102712596B1 (ko) * 2022-08-29 2024-09-30 오씨아이 주식회사 실리콘 마이크로 입자의 제조방법 및 이에 의해 제조된 실리콘 마이크로 입자

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05178688A (ja) * 1991-12-27 1993-07-20 Komatsu Denshi Kinzoku Kk 単結晶の引上げ方法及び引上げ装置
JPH06120150A (ja) * 1992-01-29 1994-04-28 Toshiba Corp 薄膜の処理方法
JPH06224183A (ja) * 1991-12-18 1994-08-12 I N R Kenkyusho:Kk プラズマ利用装置
JP2001214271A (ja) 2000-01-31 2001-08-07 Seiko Epson Corp 成膜装置
KR20020059172A (ko) * 2001-01-03 2002-07-12 김충섭 다결정실리콘의 제조방법과 그 장치

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR880000618B1 (ko) * 1985-12-28 1988-04-18 재단법인 한국화학연구소 초단파 가열 유동상 반응에 의한 고순도 다결정 실리콘의 제조 방법
DE3839705A1 (de) * 1987-11-25 1989-06-08 Union Carbide Corp Beheizter wirbelschichtreaktor
CA1332782C (en) * 1988-03-31 1994-11-01 Richard Andrew Van Slooten Annular heated fluidized bed reactor
US5165908A (en) * 1988-03-31 1992-11-24 Advanced Silicon Materials, Inc. Annular heated fluidized bed reactor
JPH0694367B2 (ja) * 1990-01-19 1994-11-24 大阪チタニウム製造株式会社 多結晶シリコンの製造方法
US5382412A (en) * 1992-10-16 1995-01-17 Korea Research Institute Of Chemical Technology Fluidized bed reactor heated by microwaves
US5810934A (en) * 1995-06-07 1998-09-22 Advanced Silicon Materials, Inc. Silicon deposition reactor apparatus
EP0832312B1 (en) 1995-06-07 2003-01-08 Advanced Silicon Materials LLC Method and apparatus for silicon deposition in a fluidized-bed reactor
DE19948395A1 (de) 1999-10-06 2001-05-03 Wacker Chemie Gmbh Strahlungsbeheizter Fliessbettreaktor
DE102005042753A1 (de) * 2005-09-08 2007-03-15 Wacker Chemie Ag Verfahren und Vorrichtung zur Herstellung von granulatförmigem polykristallinem Silicium in einem Wirbelschichtreaktor
KR100756310B1 (ko) * 2006-02-07 2007-09-07 한국화학연구원 입자형 다결정실리콘 제조용 고압 유동층반응기
KR100661284B1 (ko) * 2006-02-14 2006-12-27 한국화학연구원 유동층 반응기를 이용한 다결정실리콘 제조 방법
KR100783667B1 (ko) * 2006-08-10 2007-12-07 한국화학연구원 입자형 다결정 실리콘의 제조방법 및 제조장치

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06224183A (ja) * 1991-12-18 1994-08-12 I N R Kenkyusho:Kk プラズマ利用装置
JPH05178688A (ja) * 1991-12-27 1993-07-20 Komatsu Denshi Kinzoku Kk 単結晶の引上げ方法及び引上げ装置
JPH06120150A (ja) * 1992-01-29 1994-04-28 Toshiba Corp 薄膜の処理方法
JP2001214271A (ja) 2000-01-31 2001-08-07 Seiko Epson Corp 成膜装置
KR20020059172A (ko) * 2001-01-03 2002-07-12 김충섭 다결정실리콘의 제조방법과 그 장치

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8580203B2 (en) 2010-10-01 2013-11-12 Siliconvalue Llc Fluidized bed reactor
KR101329030B1 (ko) * 2010-10-01 2013-11-13 주식회사 실리콘밸류 유동층 반응기
US8580204B2 (en) 2011-04-20 2013-11-12 Siliconvalue Llc Fluidized bed reactor
KR101329035B1 (ko) 2011-04-20 2013-11-13 주식회사 실리콘밸류 유동층 반응기
KR101329032B1 (ko) * 2011-04-20 2013-11-14 주식회사 실리콘밸류 다결정 실리콘 제조장치 및 이를 이용한 다결정 실리콘의 제조방법
KR101329033B1 (ko) * 2011-04-20 2013-11-14 주식회사 실리콘밸류 유동층 반응기
KR101356391B1 (ko) * 2011-04-20 2014-02-03 주식회사 실리콘밸류 다결정 실리콘 제조장치
KR20130053693A (ko) * 2011-11-16 2013-05-24 주식회사 실리콘밸류 유동층 반응기
US10569247B1 (en) 2019-03-11 2020-02-25 Korea Institute Of Energy Research Installation and operation method of dual control valves in a high pressure fluidized bed system
KR20220047967A (ko) * 2019-06-26 2022-04-19 엑스-에너지 엘엘씨 진행 반응 중에 입자 샘플링을 허용하는 유동화 베드 반응기 시스템
KR102419304B1 (ko) 2019-06-26 2022-07-11 엑스 에너지, 엘엘씨 진행 반응 중에 입자 샘플링을 허용하는 유동화 베드 반응기 시스템

Also Published As

Publication number Publication date
CN101378989A (zh) 2009-03-04
RU2397952C2 (ru) 2010-08-27
ES2436770T3 (es) 2014-01-07
JP4955706B2 (ja) 2012-06-20
CN101378989B (zh) 2012-09-05
US20080267834A1 (en) 2008-10-30
WO2007091834A1 (en) 2007-08-16
US20100047136A1 (en) 2010-02-25
EP1984297A1 (en) 2008-10-29
EP1984297A4 (en) 2012-10-10
RU2008132506A (ru) 2010-02-20
US7972562B2 (en) 2011-07-05
US8114352B2 (en) 2012-02-14
JP2009525937A (ja) 2009-07-16
KR20070080306A (ko) 2007-08-10
EP1984297B1 (en) 2013-10-30

Similar Documents

Publication Publication Date Title
KR100756310B1 (ko) 입자형 다결정실리콘 제조용 고압 유동층반응기
KR100661284B1 (ko) 유동층 반응기를 이용한 다결정실리콘 제조 방법
KR100813131B1 (ko) 유동층 반응기를 이용한 다결정 실리콘의 지속 가능한제조방법
JP2009526734A5 (https=)
JP2009525937A5 (https=)
JP2009536915A5 (https=)
US8377208B2 (en) System and method for manufacturing polycrystal silicon
JP2010500274A (ja) 粒状の多結晶シリコンの形成方法及び形成装置

Legal Events

Date Code Title Description
A201 Request for examination
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20130625

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

FPAY Annual fee payment

Payment date: 20140701

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

FPAY Annual fee payment

Payment date: 20150710

Year of fee payment: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

FPAY Annual fee payment

Payment date: 20160607

Year of fee payment: 10

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

FPAY Annual fee payment

Payment date: 20170816

Year of fee payment: 11

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 11

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

FPAY Annual fee payment

Payment date: 20180627

Year of fee payment: 12

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 12

FPAY Annual fee payment

Payment date: 20190711

Year of fee payment: 13

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 13

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20200901

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20200901

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000