KR100724193B1 - A wafer boat - Google Patents
A wafer boat Download PDFInfo
- Publication number
- KR100724193B1 KR100724193B1 KR1020050132626A KR20050132626A KR100724193B1 KR 100724193 B1 KR100724193 B1 KR 100724193B1 KR 1020050132626 A KR1020050132626 A KR 1020050132626A KR 20050132626 A KR20050132626 A KR 20050132626A KR 100724193 B1 KR100724193 B1 KR 100724193B1
- Authority
- KR
- South Korea
- Prior art keywords
- boat
- wafer
- wafers
- panel
- slots
- Prior art date
Links
- 235000012431 wafers Nutrition 0.000 claims abstract description 60
- 230000000875 corresponding Effects 0.000 claims abstract description 6
- 239000002184 metal Substances 0.000 abstract description 8
- 230000000694 effects Effects 0.000 abstract description 3
- 239000012498 ultrapure water Substances 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000000356 contaminant Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 229910052904 quartz Inorganic materials 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials 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- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67313—Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements
Abstract
본 발명은 웨이퍼 보우트에 관한 것으로서, 보우트(100) 내부에 웨이퍼들에 비례하게 형성되어 웨이퍼들이 각각 동일간격을 유지하며 위치하도록 하는 복수의 슬롯(102)과, 복수의 슬롯(102)들 중앙에 돌출 형성되어 보우트(100)의 파지가 이루어지는 중앙패널(104)과, 탑재되는 웨이퍼의 높이와 상응하는 높이로 하여 보우트(100)의 양단 중앙부에 수직하게 형성되어 상기 웨이퍼와의 접촉을 최소화하는 수직바(106)로 이루어지는 것을 특징으로 한다. 따라서 보우트의 양단에 종래 패널의 면적을 최소화시킨 수직바를 형성시킴으로써, QDR의 진동자로부터 전달되는 진동 파장에 의한 종래의 패널과 웨이퍼간의 마찰을 최소화하는 효과가 있다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wafer boat, wherein the plurality of slots 102 are formed in the boat 100 in proportion to the wafers so that the wafers are positioned at equal intervals, respectively, and in the center of the plurality of slots 102. The center panel 104 is formed to protrude and grips the boat 100, and is formed vertically at both ends of the boat 100 at a height corresponding to the height of the wafer to be mounted to minimize contact with the wafer. It is characterized by consisting of a bar (106). Therefore, by forming a vertical bar that minimizes the area of the conventional panel at both ends of the boat, there is an effect of minimizing the friction between the conventional panel and the wafer due to the vibration wavelength transmitted from the vibrator of the QDR.
보우트, 웨이퍼, 금속공정, QDR, Boats, wafers, metal processing, QDR,
Description
도 1은 종래의 웨이퍼 보우트의 사시도이고,1 is a perspective view of a conventional wafer boat,
도 2는 본 발명에 따른 웨이퍼 보우트의 사시도이다.2 is a perspective view of a wafer boat according to the present invention.
<도면의 주요부분에 대한 부호의 설명><Description of the symbols for the main parts of the drawings>
100 : 보우트 102 : 슬롯(slot)100: boat 102: slot
104 : 중앙 패널(panel) 106 : 수직바104: center panel 106: vertical bar
본 발명은 금속 식각 세정(metal etch cleaning)공정에서 복수개의 웨이퍼(wafer)를 탑재하여 이송시키는데 사용되는 보우트(boat)에 관한 것으로서, 더욱 상세하게는 내부에 탑재되는 웨이퍼와의 보우트간의 접촉을 최소화 한 웨이퍼 보우트에 관한 것이다.The present invention relates to a boat used to mount and transport a plurality of wafers in a metal etch cleaning process, and more particularly, minimizes contact between the boat and the wafer mounted therein. It relates to a wafer boat.
일반적으로, 반도체 제조공정 중 금속공정(metal)은 웨이퍼 상에 금속막을 형성한 후, 이 막을 사진/식각 공정을 통해 금속 배선의 패턴을 형성하며, 식각 후에 웨이퍼상에 잔존하는 금속재 잔여물 등의 오염물질을 세정(cleaning)공정에서 제거시킨다. 세정공정에서는 습식세정(wet cleaning) 방법이 이용되는데, 먼저 웨 이퍼를 케미컬(chemical)로 처리하여 오염물질을 제거한 후, 웨이퍼 상에 잔류된 케미컬을 초순수(DIW : De-Ionized Water)로 희석시켜 수세한다. 즉, 복수개의 웨이퍼를 탑재한 보우트(boat)를 케미컬조(chemical bath)에 딥핑(dipping)시켜 화학작용에 의해 웨이퍼 표면에 존재하는 오염물질을 제거한 후, QDR(Quick Dump Rinse bath) 내로 이송시켜 상부의 샤워노즐(shower nozzle)로부터 초순수를 분사하여 린스(즉, 수세)를 실시한다.In general, during a semiconductor manufacturing process, a metal process forms a metal film on a wafer, and then forms a pattern of metal wiring through a photo / etch process, and a metal residue, etc., remaining on the wafer after etching is formed. Contaminants are removed in the cleaning process. In the cleaning process, a wet cleaning method is used. First, the wafer is chemically treated to remove contaminants, and the chemical residue remaining on the wafer is diluted with ultrapure water (DIW: De-Ionized Water). Wash with water. In other words, a boat equipped with a plurality of wafers is dipped into a chemical bath to remove contaminants on the wafer surface by chemical reaction, and then transferred into a QDR (Quick Dump Rinse bath). Ultrapure water is sprayed from the upper shower nozzle to rinse (ie, rinse with water).
이러한 단위공정에서 복수개의 웨이퍼를 탑재하여 이송시키는 보우트(10)는 도 1에 그 일예를 도시한 바와 같이, 양단에 패널(11)이 형성되어지며, 그 패널(11)의 사이에 다수의 웨이퍼를 수직으로 꽂을 수 있도록 슬롯(slot)(12)들이 중첩되게 형성되어 있고, 중앙부에는 그 이송을 위해 로봇이 파지하도록 중앙 패널(panel)(14)이 상부로 돌출되게 형성되어 있으며, 석영(quartz) 재질로 되어 있다.In this unit process, the boat 10 for mounting and transferring a plurality of wafers has a panel 11 formed at both ends thereof, as shown in FIG. 1, and a plurality of wafers between the panels 11. Slots 12 are formed to overlap each other so as to be inserted vertically, and a central panel 14 is formed to protrude upwards so that the robot grips at the center thereof, and quartz ) Is made of material.
이에 따른 종래의 보우트(10)는, 대략 50개의 슬롯(12)이 있고, 중앙 패널(14)로 분리된 좌, 우측에 각각 25개의 슬롯(12)이 있으며, 좌측의 경우 바깥쪽에서부터 제 1 리어(rear) 슬롯으로 하여 제 25 리어 슬롯까지이며, 우측의 경우 안쪽으로부터 제 1 프론트(front) 슬롯으로 하여 제 25 프론트 슬롯까지 있다. 그리고, 웨이퍼는 일률적으로 금속배선이 형성된 전면이 우측을 향해 탑재된다.Accordingly, the conventional boat 10 has approximately 50 slots 12 and 25 slots 12 on each of the left and right sides separated by the center panel 14. The rear slot is the 25th rear slot, and the right side is the first front slot from the inside to the 25th front slot. The wafer is mounted on the right side with the entire surface on which the metal wiring is uniformly formed.
진동자를 포함하는 QDR 내에서, 보우트(10)에 탑재된 웨이퍼들의 상부에는 대응되는 샤워노즐이 50개 구비되어 이 샤워노즐들로부터 린스를 위한 초순수가 분사되며, 분사된 초순수는 일정간격 이격 되게 탑재된 웨이퍼간을 지그재그로 부딪히면서 하부로 이동하여 린스가 이루어지게 된다.In the QDR including the vibrator, 50 corresponding shower nozzles are provided at the top of the wafers mounted on the boat 10 to spray ultrapure water for rinsing from the shower nozzles, and the injected ultrapure water is mounted at a predetermined interval. The zigzag is moved to the lower side while zipping in between the wafers to be rinsed.
그러나, 종래의 보우트(10)는 양단이 패널(11)로 막혀 있어 QDR의 진동자에서 전달되는 진동 파장이 보우트(10)의 패널(11)에 전달된 후, 슬롯(12)에 채워진 웨이퍼로까지 전달되어 웨이퍼의 파손을 유발하게 되는 문제점이 있었다. However, the conventional boat 10 has both ends blocked by the panel 11 so that the vibration wavelength transmitted from the vibrator of the QDR is transmitted to the panel 11 of the boat 10 and then to the wafer filled in the slot 12. There was a problem that the transfer caused a breakage of the wafer.
본 발명은 상기와 같은 제반 문제점을 해결하기 위하여 창안된 것으로서, 보우트의 양단에 종래 패널의 면적을 최소화시킨 수직바를 형성시킴으로써, QDR의 진동자로부터 전달되는 진동 파장에 의한 종래의 패널과 웨이퍼간의 마찰을 최소화 한 웨이퍼 보우트를 제공하는데 그 목적이 있다.The present invention was devised to solve the above-mentioned problems, and by forming a vertical bar which minimizes the area of the conventional panel at both ends of the boat, friction between the conventional panel and the wafer due to the vibration wavelength transmitted from the vibrator of the QDR is eliminated. The aim is to provide a minimized wafer boat.
상술한 목적을 달성하기 위한 본 발명은, QDR을 위한 다수의 웨이퍼를 탑재하는 웨이퍼 보우트에 있어서, 보우트 내부에 웨이퍼들에 비례하게 형성되어 웨이퍼들이 각각 동일간격을 유지하며 위치하도록 하는 복수의 슬롯과, 복수의 슬롯들 중앙에 형성되어 보우트의 파지가 이루어지는 중앙패널과, 탑재되는 웨이퍼의 높이와 상응하는 높이로 하여 보우트의 양단 중앙부에 수직하게 형성되어 웨이퍼와의 접촉을 최소화하는 수직바로 이루어지는 웨이퍼 보우트를 제공한다.The present invention for achieving the above object is a wafer boat for mounting a plurality of wafers for QDR, a plurality of slots are formed in the boat in proportion to the wafers so that the wafers are located at equal intervals, respectively; A wafer boat formed in the center of the plurality of slots to hold the boat and having a height corresponding to the height of the wafer to be mounted perpendicular to the center of both ends of the boat to minimize contact with the wafer To provide.
이하, 첨부된 도면을 참조로 본 발명의 바람직한 실시예를 상세히 설명하기로 한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.
도 2는 본 발명에 따른 웨이퍼 보우트의 사시도이다.2 is a perspective view of a wafer boat according to the present invention.
도 2에 도시된 바와 같이 석영(quartz) 재질로 이루어지는 웨이퍼 보우트(100)는 크게, 보우트(100) 내부에 웨이퍼들에 탑재되는 복수의 슬롯(102)과, 복수 의 슬롯(102)들 중앙에 형성되어 미도시된 로봇에 의한 보우트(100)의 파지가 이루어지는 중앙패널(104)과, 보우트(100)의 양단 중앙부에 수직하게 형성되는 수직바(106)로 구성된다.As shown in FIG. 2, the wafer boat 100 made of quartz material is largely provided with a plurality of slots 102 mounted on the wafers in the boat 100 and in the center of the plurality of slots 102. The center panel 104 is formed to hold the boat 100 by a robot (not shown), and a vertical bar 106 vertically formed at both ends of the boat 100.
슬롯(102)은 대략 50개가 소정 거리 이격되어 형성되어지며, 중앙 패널(104)로 분리된 좌, 우측에 각각 25개의 슬롯(102)이 있으며, 좌측의 경우 바깥쪽에서부터 제 1 리어(rear) 슬롯으로 하여 제 25 리어 슬롯까지이며, 우측의 경우 안쪽으로부터 제 1 프론트(front) 슬롯으로 하여 제 25 프론트 슬롯까지 있다. 그리고, 웨이퍼는 일률적으로 금속배선이 형성된 전면이 우측을 향해 탑재된다.About 50 slots 102 are spaced apart from each other by a predetermined distance, and there are 25 slots 102 on the left side and the right side separated by the center panel 104. In the case of the left side, the first rear is formed from the outside. The slot is up to the 25th rear slot, and on the right side, the slot is up to the 25th front slot. The wafer is mounted on the right side with the entire surface on which the metal wiring is uniformly formed.
그리고 본 발명의 특징에 따른 수직바(106)는, QDR(미도시)의 진동자로부터 전달되는 진동 파장이 수직바(106)에 전달되었을 경우, 웨이퍼와의 접촉면적을 최소화하여 웨이퍼에 미치는 진동을 최소화시킨 것이다.And the vertical bar 106 according to the characteristics of the present invention, when the vibration wavelength transmitted from the vibrator of the QDR (not shown) is transmitted to the vertical bar 106, minimizes the contact area with the wafer to minimize the vibration on the wafer It is minimized.
따라서 수직바(106)는 웨이퍼와 접촉될 수 있는 면적이 최소화된 면적을 가지면서 웨이퍼의 이탈 방지 및 세정 효과를 높일 수 있으며, 더욱 바람직하게는 탑재되는 웨이퍼의 높이와 상응하는 높이를 갖도록 한다.Accordingly, the vertical bar 106 may have a minimum area that can be in contact with the wafer while increasing the separation and cleaning effect of the wafer, and more preferably, have a height corresponding to the height of the wafer to be mounted.
이와 같이 구성된 본 발명에 따른 웨이퍼 보우트의 작용을 설명하면 다음과 같다.Referring to the operation of the wafer boat according to the present invention configured as described above are as follows.
다시 도 2를 참고하면, 진동자를 포함하는 QDR 내에서, 보우트(100)의 슬롯(102)에 탑재된 웨이퍼들의 상부에는 대응되는 샤워노즐이 50개 구비되어 이 샤워노즐들로부터 린스를 위한 초순수가 분사되며, 분사된 초순수는 일정간격 이격 되게 탑재된 웨이퍼간을 지그재그로 부딪히면서 하부로 이동하여 린스가 이루어지게 된다.Referring back to FIG. 2, in the QDR including the vibrator, 50 corresponding shower nozzles are provided on the upper portions of the wafers mounted in the slots 102 of the boat 100, and ultrapure water for rinsing from the shower nozzles is provided. The sprayed ultrapure water is rinsed by moving downwards while zipping the wafers mounted at regular intervals with a zigzag.
또한, QDR조에서는 진동자를 사용하게 되며, 이 때, 진동자의 파장 일부가 웨이퍼 보우트(100)에 전달되어진다. 위의 진동자 파장이 종래에는 양단의 패널에 그대로 전달되고, 파장에 의하여 진동되는 패널이 근접한 웨이퍼에 손상을 입힐 수 있었다. 따라서 본 발명에서의 수직바(106)는 웨이퍼와 접촉되는 면적을 최소화하여 웨이퍼에 미치는 영향을 줄인 것이다.In the QDR tank, a vibrator is used, and at this time, a part of the wavelength of the vibrator is transmitted to the wafer boat 100. The above oscillator wavelength is conventionally transmitted to the panels at both ends, and the panel vibrated by the wavelength could damage the adjacent wafer. Therefore, the vertical bar 106 in the present invention is to minimize the area in contact with the wafer to reduce the impact on the wafer.
이상에서 설명한 것은 본 발명에 따른 웨이퍼 보우트를 실시하기 위한 하나의 실시예에 불과한 것으로서, 본 발명은 상기한 실시예에 한정되지 않고, 이하의 특허청구범위에서 청구하는 바와 같이 본 발명의 요지를 벗어남이 없이 당해 발명이 속하는 분야에서 통상의 지식을 가진 자라면 누구든지 다양한 변경 실시가 가능한 범위까지 본 발명의 기술적 정신이 있다고 할 것이다. What has been described above is only one embodiment for carrying out the wafer boat according to the present invention, and the present invention is not limited to the above-described embodiment, and the present invention deviates from the gist of the present invention as claimed in the following claims. Without this, anyone skilled in the art to which the present invention pertains will have the technical spirit of the present invention to the extent that various modifications can be made.
본 발명에 따른 웨이퍼 보우트는, 보우트의 양단에 종래 패널의 면적을 최소화시킨 수직바를 형성시킴으로써, QDR의 진동자로부터 전달되는 진동 파장에 의한 종래의 패널과 웨이퍼간의 마찰을 최소화하는 효과가 있다.The wafer boat according to the present invention has an effect of minimizing friction between the conventional panel and the wafer due to the vibration wavelength transmitted from the vibrator of the QDR by forming vertical bars on both ends of the boat to minimize the area of the conventional panel.
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