KR100643965B1 - Wire-grid polarizer and the fabrication method - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to wire grid polarizers, and more particularly to wire grid polarizers operating in the visible light region and a method of manufacturing the same.

The present invention uses an embossing technique in the fabrication of a wire grid polarizer operating in the visible light band, a mold is produced using the imprinting technique, and the wire grid is repeatedly used using the mold. Easy and repeatable production of polarizers reduces manufacturing costs and enables mass production.

In addition, the wire grid polarizer manufacturing method according to the present invention does not require any additional device and shorten the process time, thereby increasing the manufacturing yield, and excellent polarization extinction ratio, so that it can be widely applied to flat panel displays, projection displays, optical devices, etc. High value for use

Wire grid, mold, imprinted, polymer, visible light

Description

Wire grid polarizer and its manufacturing method {Wire-grid polarizer and the fabrication method}

1 shows an embodiment of a basic wire grid of the prior art.

2 is a graph showing the relationship between the period of the metal lattice and the polarization extinction ratio in the visible light band.

Figure 3 schematically shows a process of manufacturing a mold for manufacturing a wire grid according to the present invention.

4 is a process flowchart showing a process of manufacturing a wire grid polarizer as a first embodiment according to the present invention.

5 is a process flowchart showing a process of manufacturing a wire grid polarizer as a second embodiment according to the present invention.

<Description of Signs of Major Parts of Drawings>

200a: mold substrate 200b, 330, 430: mold

210: polymer layer 300, 400: substrate

310a, 420a: metal thin film 310b, 420b: metal lattice pattern

320a, 410a: polymer

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to wire grid polarizers, and more particularly to wire grid polarizers operating in the visible light region and a method of manufacturing the same.

About 110 years have passed since the use of an array of parallel conducting wires to align parallel conductor lines to polarize only certain polarizations in electromagnetic waves.

This is generally called a wire grid and is formed on a transparent substrate and used as a polarizer in the infrared region among the wavelengths of electromagnetic waves.

Typically, an important factor in determining the polarizer performance of a wire grid is the distance between the parallel line and the center of the line, i.e. the relationship between the period and the wavelength of the incident wave.

If the spacing or period of the grid is long compared to the wavelength of the incident wave, the grid diffracts the polarization according to conventional principles as a function of the diffraction grating rather than the polarizer.

Thus, diffraction is performed irrespective of polarization to form diffraction interference fringes due to a theoretically well known phase difference.

If the interval or period between the line and the center of the line is shorter than the wavelength, the wire grid acts as a polarizer, reflecting that the electromagnetic wave is polarized parallel to the grid, and transmitting the electromagnetic wave of the orthogonal polarization.

Here, the transmission region in which the period of the wire grid is in the range of approximately half to twice the wavelength is determined according to the change in the transmission and reflection characteristics of the wire grid.

In particular, a sudden increase in reflectance and corresponding decrease in transmission for light polarized perpendicular to the grid will occur at one or more specific wavelengths at a given angle of incidence.

On the other hand, when manufacturing a polarizing beam splitter using such a wire grid, important factors include period, line width, line thickness, characteristics of the grid material, characteristics of the substrate (refractive index), wavelength and incident angle of the incident wave.

In this regard, the properties of the grid material do not appear to have a significant effect on the polarization characteristics of the polarization beam splitter.

1 is a diagram illustrating an embodiment of a basic wire grid of the prior art.

Referring to FIG. 1, the wire grid 100 is composed of several parallel conductive electrodes 110 supported by an insulating substrate 120.

This device is represented by the period or Λ of the conductor; Individual conductor widths, denoted by w; The thickness of the conductor, denoted by t.

Here, using the general definition of S, P polarization, light with S polarization has a polarization vector that is orthogonal to the plane of incidence and is therefore parallel to the conductive element.

In contrast, light with P polarization has a polarization vector parallel to the plane of incidence and is orthogonal to the conductive element.

When the period of the metal wire array is shorter than the wavelength of the incident electromagnetic wave, the polarization component (S polarization) parallel to the metal wire is reflected and the vertical polarization component (P polarization) is transmitted.

Generally, polarizers using the wire grid will reflect light having an electric field vector parallel to the conductive line of the grid and transmit light having an electric field vector perpendicular to the conductive line, but the plane of incidence is conductive as described above. It may or may not be perpendicular to the wire grid at. The geometrical representations described herein are for illustrative purposes only.

Ideally, the wire grid would be a perfect mirror like S polarized light for one light polarization and would be perfectly transparent to other polarizations like P polarized light.

In reality, however, the most reflective metal, such as a mirror, absorbs a small amount of angle of incidence and reflects only 90% to 95%, and planar glass does not transmit 100% incident light due to surface reflection.

As shown in FIG. 1, the performance of the wire grid polarizer can be represented by polarization extinction ratio and transmittance.

Here, the polarization extinction ratio and transmittance are defined as follows.

Polarization extinction ratio = (Si / St) | p _i = 0

Transmittance = (Pt / Pi) | s _i = 0

In the above formula, the polarization extinction ratio represents the optical power ratio of S wave Si incident upon S polarization incident and S wave St transmitted, and transmittance is transmitted when P polarization incident. The optical power ratio of P wave Pt and incident P wave Pi is shown.

At this time, in order for the wire grid polarizer to have a high polarization extinction ratio, there is a precondition that the period of the metal lattice is considerably shorter than the wavelength of the incident light.

But. The shorter the cycle, the more difficult the fabrication. Until now, the wire grid polarizer has been manufactured and applied mainly in the microwave or infrared region because the grid period has to be shortened to polarize light having a short wavelength.

However, with the development of semiconductor manufacturing equipment and exposure technology, fine pattern fabrication is possible, making it possible to manufacture wire grid polarizers that operate in visible light.

Visible light range refers to the wavelength range from 400nm to 700nm that humans can detect with their eyes.

In other words, in order for the wire grid polarizer to have high ER (Extinction Range) characteristics for the three primary colors including red, blue, and green (R, G, B) including blue color, at least 200 nm must be at least 200 nm. It can be expected, in order to give a polarization performance superior to the conventional polarizer, a wire grid having a period of 0.1 ㎛ or less is required.

The line width of the current semiconductor process is about 0.1 mu m. Here, when the line and the line are drawn periodically, the space between the line and the line also needs the same length, and thus has a grid period of 0.2 μm.

Here, when using an interference effect using a short wavelength argon laser is possible up to 200nm.

As such, when the period of about 200 nm is reduced to about 100 nm in the conventional wire grid polarizer, the performance of the wire grid polarizer can be dramatically improved, and thus the performance of the polarizer is improved.

An object of the present invention is to produce a wire grid polarizer that operates in the visible light band, so that the wire grid polarizer can be easily and repeatedly produced by using an embossing technique, thereby enabling mass production at low cost.

In addition, an object of the present invention is to provide a wire grid polarizer having good polarization performance in red (R), green (G), and blue (B) in the visible light band.

Wire grid polarizer according to the present invention for achieving the above object, the substrate; And a metal grid pattern formed on the substrate to polarize visible light.

The metal grid pattern is formed using a mold.

The period of the metal lattice is characterized in that it does not exceed 120nm.

The material of the mold is one of silicon (Si), SiO 2, quartz glass, nickel (Ni), platinum (Pt), chromium (Cr), and a polymer material.

The mold is characterized in that the grid structure having the same pattern as the metal grid pattern.

The metal lattice pattern may be manufactured by hot embossing or UV embossing using a mold.

In addition, the wire grid polarizer manufacturing method according to the present invention for achieving the above object comprises the steps of manufacturing a mold; Sequentially forming a metal thin film and a polymer on the substrate; Molding the polymer using the mold; Etching a metal thin film using the molded polymer to form a metal lattice pattern; Removing the polymer; characterized in that comprises a.

The material of the mold is one of silicon (Si), SiO 2, quartz glass, nickel (Ni), platinum (Pt), chromium (Cr), and a polymer material.

Forming a polymer using the mold, the method comprising: pressing the mold onto a polymer to transfer a pattern; Curing the polymer; Separating the mold from the polymer; characterized in that it further comprises.

The polymer is characterized in that it is a heat curable material or an ultraviolet curable material.

The manufacturing of the mold may include forming a photosensitive polymer on the mold substrate; Patterning the photosensitive polymer; Etching the photosensitive polymer using a mask; Removing the photosensitive polymer.

The photosensitive polymer may be patterned by photolithography, electron beam lithography, or semiconductor exposure.

The method of etching the metal thin film is characterized in that the dry etching (wet etching) or wet etching (wet etching) method.

In the step of removing the photosensitive polymer, the mold surface treatment is characterized in that to use a chemical containing a silane (silane) group.

In addition, another embodiment of the wire grid polarizer manufacturing method according to the present invention comprises the steps of manufacturing a mold; Forming a polymer on the substrate; Forming a polymer pattern using the mold; Etching the polymer pattern to expose a portion of the substrate; Depositing a metal thin film on the polymer pattern and the exposed substrate; And removing the polymer pattern.

The material of the mold is one of silicon (Si), SiO 2, quartz glass, nickel (Ni), platinum (Pt), chromium (Cr), and a polymer material.

Forming a polymer pattern using the mold may include pressing the mold onto a polymer to transfer the pattern; Curing the polymer; Separating the mold from the polymer.

The polymer is characterized in that it is a heat curable material or an ultraviolet curable material.

Fabricating the mold, forming a photosensitive polymer on the mold substrate; Patterning the photosensitive polymer; Etching the polymer as a mask; Removing the polymer; characterized in that it further comprises.

The photosensitive polymer may be patterned by photolithography, electron beam lithography, or semiconductor exposure.

The method of etching the metal thin film is characterized in that the dry etching (wet etching) or wet etching (wet etching) method.

In the step of removing the photosensitive polymer, the mold surface treatment is characterized in that to use a chemical containing a silane (silane) group.

Hereinafter, a wire grid polarizer according to the present invention will be described in detail with reference to the accompanying drawings.

2 is a graph showing the relationship between the period of the metal lattice and the polarization extinction ratio in the visible light band.

As shown in FIG. 2, the polarization efficiency of the wire grid polarizer is closely related to the period of the metal lattice.

Aluminum (Al) was used as the material of the metal lattice, and the height of the metal lattice was 140 nm.

The line width of the metal is 60 nm, and the periods of red (R), green (G), and blue (B) are 450 nm, 550 nm, and 650 nm, respectively.

Here, in order for the polarization extinction ratio to be 10,000 or more, the period of the lattice must be 120 nm or less.

In order to manufacture the wire grid polarizer by using the imprinting technique, a mold must first be manufactured.

3 is a view schematically showing a process of manufacturing a mold for manufacturing a wire grid according to the present invention.

Here, as a material of the mold used to manufacture the wire grid polarizer, silicon (Si), SiO₂, quartz glass, nickel (Ni), platinum (Pt), chromium (Cr), a polymer material, etc. may be used. Can be.

The stamping technique used to fabricate the wire grid includes a hot embossing technique for applying a heat to form a polymer and a UV embossing technique for curing and molding a polymer using ultraviolet light while pressing it into a mold.

The materials listed as materials of the mold may be used in the thermal stamping technique, and in particular, quartz glass, transparent polymer materials, etc. may be applied to the ultraviolet engraving technique because they are transparent materials.

First, as shown in FIG. 3A, the polymer layer 210 is formed on a mold substrate 200a such as silicon by a spray method, a spin coating method, or the like.

In addition, the polymer layer 210 uses a material sensitive to an electron beam, and may include PMMA (polymethylmethacrylate).

In this case, the polymer is sensitive to the electron beam, and multiplexing is performed on the irradiated portion, and a desired pattern can be formed through electron beam irradiation and development using such a property.

When the kind of the polymer is a positive photosensitive agent, the portion irradiated with the electron beam is melted in the developing solution, and in the case of the negative photosensitive agent, the portion not irradiated with the electron beam is dissolved in the developing solution.

Therefore, as described above, after the polymer layer 210 is formed on the mold substrate 200a, as shown in FIG. 3B, the electron beam is irradiated onto the polymer layer 210 to form a lattice pattern.

Thereafter, as shown in Figure 3c, it is immersed in the developing solution to be developed in the desired grid pattern.

As shown in FIG. 3D, the mold substrate 200a may be dry etched or wet etched using the grid pattern formed as described above as an etching mask.

Finally, when the polymer layer used as the etch mask is removed, as shown in FIG. 3E, a mold 200b for preparing a wire grid polarizer having a desired pattern is completed.

Here, in the mold fabrication process as described above, in order to facilitate separation of the polymer and the mold, the mold is surface treated using a chemical agent containing a silane group.

Using the mold manufactured as described above to produce a wire grid polarizer operating in the visible light band according to the present invention.

4 is a process flowchart showing a process of manufacturing a wire grid polarizer as a first embodiment according to the present invention.

As described above, a wire grid polarizer is manufactured by using a previously manufactured mold. First, a transparent glass substrate 300 having both surfaces polished is prepared (FIG. 4A).

4B, a metal thin film 310a is deposited on the glass substrate 300.

Aluminum (Al), silver (Ag), chromium (Cr), or the like may be used as the metal thin film 310a.

Subsequently, as illustrated in FIG. 4C, the polymer 320a is coated on the metal thin film 310a.

Then, the pressure is applied to the polymer 320a with the pre-made mold 330 to transfer the pattern of the mold to the polymer 320a.

Here, when the polymer 320a is a thermosetting material, a metal mold is used, and when the UV curing material is used, a transparent polymer mold is used.

Here, hot embossing is used if the polymer 320a is a heat curable material and pre-bake the polymer, and UV embossing is used if the polymer is an ultraviolet curable material. A transparent mold is used without curing the coated polymer.

Therefore, as illustrated in FIG. 4D, the polymer 320b is cured by applying heat to the mold 330 or irradiating ultraviolet rays.

Thereafter, the mold 330 is separated from the polymer 320b as shown in FIG. 4E.

Then, the pattern of the mold 330 is transferred to the polymer 320b to form a pattern in which yin and yang are opposite to the mold 330.

Here, in the case of using the thermal stamping technique, after the temperature of the substrate is cooled, the mold 330 is separated from the polymer 320b.

In the case of using the UV technique, after the UV curing is completed, the mold 330 is separated from the polymer 320b.

Next, as shown in FIG. 4F, the entire surface of the polymer pattern is dry-etched so that the surface of the metal thin film 310a is exposed.

Then, the dry-etched polymer 320c is previously formed with irregularities by the mold 330, so that the polymer 320c having a thin thickness is removed by the etching process to expose the metal thin film 310a to the surface. do.

Thereafter, as illustrated in FIG. 4G, the metal thin film 310a exposed on the surface is etched through a dry etching or a wet etching process to form a metal grid pattern 310b.

Finally, as shown in FIG. 4H, the polymer 320c remaining on the metal lattice pattern 310b is removed.

Then, the wire grid polarizer having the desired lattice pattern on the substrate 300 is completed.

5 is a flowchart illustrating a process of fabricating a wire grid polarizer as a second embodiment according to the present invention.

As described above, a wire grid polarizer is manufactured by using a previously manufactured mold. First, a transparent glass substrate having both surfaces polished is prepared (FIG. 5A).

As shown in FIG. 5B, the polymer 410a is coated on the glass substrate 400, and a pre-made mold 430 is prepared.

As illustrated in FIG. 5C, the mold 430 may be pressed to press the polymer 410a to transfer the pattern of the mold 430 to the polymer 410a.

Then, the pattern of the mold 430 is transferred to the polymer 410b to form a pattern in which yin and yang are opposite to the mold 430.

Subsequently, as shown in FIG. 5D, the polymer 410b is cured by applying heat to the mold 430 or irradiating ultraviolet rays.

Here, in the case of using the thermal stamping technique, after the temperature of the substrate 400 is cooled, the mold 430 is separated from the polymer 410b.

In the case of using the UV technique, after the UV curing is completed, the mold 430 is separated from the polymer 410b.

Herein, when the polymer is a thermosetting material, a metal mold is used, and when the UV curing material is used, a transparent polymer mold is used.

At this time, if the polymer is a heat curable material, a thermal stamping technique is used, and the polymer is pre-baked. If the polymer is an ultraviolet curable material, a UV stamping technique is used, and the coated polymer is not cured. Use a transparent mold.

Next, as shown in FIG. 5E, the entire surface of the polymer pattern is dry-etched to expose the surface of the substrate 400.

Then, the dry-etched polymer 410c is previously formed with irregularities by the mold 430, so that the polymer 410c having a thin thickness is removed by the etching process to expose the substrate 400 to the surface. .

As shown in FIG. 5F, a metal thin film 420a is vacuum deposited on the glass substrate 400.

Aluminum (Al), silver (Ag), chromium (Cr), or the like may be used as the metal thin film 420a.

Thereafter, the polymer 410c on which the metal thin film 420a is deposited is immersed and removed in an etchant to leave the metal lattice pattern 420b as shown in FIG. 5G.

Then, a wire grid polarizer having a desired lattice pattern may be manufactured on the substrate 400.

Although the present invention has been described in detail through specific examples, this is for describing the present invention in detail, and the method for manufacturing a wavelength filter according to the present invention is not limited thereto, and the present invention is not limited thereto. It is obvious that modifications and improvements are possible by the knowledgeable.

The wire grid polarizer according to the present invention has an effect of manufacturing a mold by using a stamping technique and repeatedly using the mold, thereby reducing manufacturing cost and mass-producing.

In addition, the wire grid polarizer manufacturing method according to the present invention does not require an additional device and has an effect of shortening the process time to increase the production yield.

In addition, the present invention has excellent polarization extinction ratio in visible light, so that the present invention can be widely applied to flat panel displays, projection displays, optical devices, and the like, and has high utility value.

Claims (22)

A substrate; And a metal lattice pattern formed using a mold having the same pattern on the substrate and polarizing visible light. delete The method of claim 1, And the period of the metal lattice does not exceed 120 nm. The method of claim 1, The material of the mold is silicon (Si), SiO₂, quartz glass (quartz glass), nickel (Ni), platinum (Pt), chromium (Cr), a wire grid polarizer, characterized in that one of the polymer materials. The method of claim 1, The mold is a wire grid polarizer, characterized in that the grid structure having the same pattern as the metal grid pattern. The method of claim 1, The metal grid pattern is a wire grid polarizer, characterized in that fabricated by hot embossing (hot embossing) or UV embossing (UV embossing) using a mold. Manufacturing a mold having a grid pattern formed thereon; Sequentially forming a metal thin film and a polymer on the substrate; Molding a polymer using a mold having the grid pattern formed thereon; Etching a metal thin film using the molded polymer to form a metal lattice pattern; Removing the polymer to complete a wire grid polarizer having a metal lattice pattern for polarizing visible light on the substrate. The method of claim 7, wherein The material of the mold is silicon (Si), SiO ₂, quartz glass (quartz glass), nickel (Ni), platinum (Pt), chromium (Cr), wire grid polarizer manufacturing method characterized in that one of the polymer materials. The method of claim 7, wherein Molding the polymer using the mold, Pressing the mold onto a polymer to transfer a pattern; Curing the polymer; Separating the mold from the polymer; wire grid polarizer manufacturing method, characterized in that consisting of. The method of claim 7, wherein Wherein said polymer is a heat curable material or an ultraviolet curable material. The method of claim 7, wherein In the step of manufacturing the mold, Forming a photosensitive polymer on the mold substrate; Patterning the photosensitive polymer to form a lattice pattern; Etching the mold substrate using the photosensitive polymer as a mask; Removing the photosensitive polymer; wire grid polarizer manufacturing method characterized in that it further comprises. The method of claim 11, The method of patterning the photosensitive polymer is a method of manufacturing a wire grid polarizer, characterized in that using photolithography, electron beam lithography, semiconductor exposure method. The method of claim 7, wherein The method of etching the metal thin film is a method of manufacturing a wire grid polarizer, characterized in that the dry etching (wet etching) or wet etching (wet etching) method. The method of claim 11, In the step of removing the photosensitive polymer, the mold surface treatment is a wire grid polarizer manufacturing method, characterized in that using a chemical containing a silane (silane) group. Manufacturing a mold; Forming a polymer on the substrate; Forming a polymer pattern using the mold; Etching the polymer pattern to expose a portion of the substrate; Depositing a metal thin film on the polymer pattern and the exposed substrate; Removing the polymer pattern; wire grid polarizer manufacturing method comprising a. The method of claim 15, The material of the mold is silicon (Si), SiO ₂, quartz glass (quartz glass), nickel (Ni), platinum (Pt), chromium (Cr), wire grid polarizer manufacturing method characterized in that one of the polymer materials. The method of claim 15, Forming a polymer pattern using the mold, Pressing the mold onto a polymer to transfer a pattern; Curing the polymer; Separating the mold from the polymer; wire grid polarizer manufacturing method, characterized in that consisting of. The method of claim 15, Wherein said polymer is a heat curable material or an ultraviolet curable material. The method of claim 15, In the step of manufacturing the mold, Forming a photosensitive polymer on the mold substrate; Patterning the photosensitive polymer to form a lattice pattern; Etching the polymer as a mask; Removing the polymer; wire grid polarizer manufacturing method characterized in that it further comprises. The method of claim 19, The method of patterning the photosensitive polymer is a method of manufacturing a wire grid polarizer, characterized in that using photolithography, electron beam lithography, semiconductor exposure method. The method of claim 15, The method of etching the metal thin film is a method of manufacturing a wire grid polarizer, characterized in that the dry etching (dry etching) or wet etching (wet etching) method. The method of claim 19, In the step of removing the photosensitive polymer, the mold surface treatment is a wire grid polarizer manufacturing method, characterized in that using a chemical containing a silane (silane) group.

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