KR100588369B1 - 에너지감응성내식막재료및이를사용하는디바이스의제조방법 - Google Patents

에너지감응성내식막재료및이를사용하는디바이스의제조방법 Download PDF

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Publication number
KR100588369B1
KR100588369B1 KR1019980007413A KR19980007413A KR100588369B1 KR 100588369 B1 KR100588369 B1 KR 100588369B1 KR 1019980007413 A KR1019980007413 A KR 1019980007413A KR 19980007413 A KR19980007413 A KR 19980007413A KR 100588369 B1 KR100588369 B1 KR 100588369B1
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KR
South Korea
Prior art keywords
resist
polymer
polycyclic
moiety
substituent
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KR1019980007413A
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English (en)
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KR19980079960A (ko
Inventor
에드윈 아써 찬드로스
프란시스 마이클 홀리한
옴카람 날라마수
엘자 리크만니스
토마스 인골프 왈로우
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루센트 테크놀러지스 인크
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Priority to US08/813,732 priority Critical patent/US5879857A/en
Priority to US8/813,732 priority
Priority to US08/813732 priority
Application filed by 루센트 테크놀러지스 인크 filed Critical 루센트 테크놀러지스 인크
Publication of KR19980079960A publication Critical patent/KR19980079960A/ko
Application granted granted Critical
Publication of KR100588369B1 publication Critical patent/KR100588369B1/ko

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR