KR100554478B1 - 아즐락톤 공중합체를 주성분으로 하는 광경화 및 광패턴화가능한 히드로겔 매트릭스 - Google Patents

아즐락톤 공중합체를 주성분으로 하는 광경화 및 광패턴화가능한 히드로겔 매트릭스 Download PDF

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KR100554478B1
KR100554478B1 KR1020017005395A KR20017005395A KR100554478B1 KR 100554478 B1 KR100554478 B1 KR 100554478B1 KR 1020017005395 A KR1020017005395 A KR 1020017005395A KR 20017005395 A KR20017005395 A KR 20017005395A KR 100554478 B1 KR100554478 B1 KR 100554478B1
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South Korea
Prior art keywords
azlactone
composition
hydrogel
substrate
photocurable
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Expired - Fee Related
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English (en)
Korean (ko)
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KR20010089379A (ko
Inventor
류지에
벤슨제임스쥐
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미네소타 마이닝 앤드 매뉴팩춰링 캄파니
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Ceramic Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1020017005395A 1998-10-30 1999-03-08 아즐락톤 공중합체를 주성분으로 하는 광경화 및 광패턴화가능한 히드로겔 매트릭스 Expired - Fee Related KR100554478B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/183,197 US6156478A (en) 1998-10-30 1998-10-30 Photocurable and photopatternable hydrogel matrix based on azlactone copolymers
US09/183,197 1998-10-30

Publications (2)

Publication Number Publication Date
KR20010089379A KR20010089379A (ko) 2001-10-06
KR100554478B1 true KR100554478B1 (ko) 2006-03-03

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020017005395A Expired - Fee Related KR100554478B1 (ko) 1998-10-30 1999-03-08 아즐락톤 공중합체를 주성분으로 하는 광경화 및 광패턴화가능한 히드로겔 매트릭스

Country Status (8)

Country Link
US (2) US6156478A (https=)
EP (1) EP1127293B1 (https=)
JP (1) JP4350906B2 (https=)
KR (1) KR100554478B1 (https=)
CN (1) CN1325505A (https=)
AU (1) AU749808B2 (https=)
DE (1) DE69912300T2 (https=)
WO (1) WO2000026725A1 (https=)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7534543B2 (en) * 1996-04-15 2009-05-19 3M Innovative Properties Company Texture control of thin film layers prepared via laser induced thermal imaging
US6376619B1 (en) * 1998-04-13 2002-04-23 3M Innovative Properties Company High density, miniaturized arrays and methods of manufacturing same
US7638464B2 (en) 1999-04-26 2009-12-29 Biocept, Inc. Three dimensional format biochips
US6482638B1 (en) * 1999-12-09 2002-11-19 3M Innovative Properties Company Heat-relaxable substrates and arrays
KR20020089315A (ko) * 2000-10-26 2002-11-29 바이오셉트 인코포레이티드 3차원 포맷 바이오칩
US6686431B2 (en) * 2000-11-01 2004-02-03 Avery Dennison Corporation Optical coating having low refractive index
EP1245272A1 (en) * 2001-03-30 2002-10-02 Ucb S.A. Substrates, preparation and use
US6794458B2 (en) * 2001-05-18 2004-09-21 3M Innovative Properties Company Azlactone-functional hydrophilic coatings and hydrogels
US20030040125A1 (en) * 2001-08-21 2003-02-27 3M Innovative Properties Company Methods for performing immunological assays
US7223350B2 (en) * 2002-03-29 2007-05-29 International Business Machines Corporation Planarization in an encapsulation process for thin film surfaces
US20030052003A1 (en) * 2002-10-15 2003-03-20 Kelly Patrick Cast analyte diffusion-limiting membranes using photopolymerizable hydrophylic monomers
US20070082019A1 (en) * 2003-02-21 2007-04-12 Ciphergen Biosystems Inc. Photocrosslinked hydrogel surface coatings
US6762257B1 (en) * 2003-05-05 2004-07-13 3M Innovative Properties Company Azlactone chain transfer agents for radical polymerization
JP4373260B2 (ja) * 2004-03-29 2009-11-25 一則 片岡 高分子複合体
BRPI0608156A2 (pt) * 2005-02-16 2017-05-23 3M Innovative Properties Co método para um revestimento topograficamente padronizado
WO2006088804A1 (en) * 2005-02-16 2006-08-24 3M Innovative Properties Company Method of making morphologically patterned coatings
JP2006316010A (ja) * 2005-05-13 2006-11-24 Institute Of Physical & Chemical Research 物質固定化剤、物質固定化方法および物質固定化基体
US7396631B2 (en) * 2005-10-07 2008-07-08 3M Innovative Properties Company Radiation curable thermal transfer elements
US7678526B2 (en) * 2005-10-07 2010-03-16 3M Innovative Properties Company Radiation curable thermal transfer elements
US8513322B2 (en) * 2007-05-31 2013-08-20 3M Innovative Properties Company Polymeric beads and methods of making polymeric beads
JP5432175B2 (ja) * 2007-12-12 2014-03-05 スリーエム イノベイティブ プロパティズ カンパニー 物品の製造方法及び物品
JP5330404B2 (ja) * 2007-12-12 2013-10-30 スリーエム イノベイティブ プロパティズ カンパニー 微小構造化された抗微生物フィルム
US8592493B2 (en) * 2008-06-26 2013-11-26 3M Innovative Properties Company Solid support with a grafted chain
US9296870B2 (en) * 2009-07-27 2016-03-29 The Trustees Of Columbia University In The City Of New York Modification of surfaces with nanoparticles
EP3191016B1 (en) * 2014-09-09 2021-10-27 University of Washington Functionalized zwitterionic and mixed charge polymers, related hydrogels, and methods for their use
TWI648271B (zh) 2014-09-23 2019-01-21 日商住友電木股份有限公司 二氮環丙烯化合物及由其衍生之組成物
EP3995828A1 (en) * 2020-11-04 2022-05-11 MicroCoat Biotechnologie GmbH Novel functionalized hydrogel coatings of assay plates and uses thereof
CN114839835B (zh) * 2022-03-18 2025-12-09 清华大学 量子点的无损光刻图案化方法和设备

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1745348A1 (de) * 1967-12-01 1971-09-09 Roehm Gmbh Azlactongruppen enthaltende Mischpolymerisate
US4451619A (en) * 1982-09-30 1984-05-29 Minnesota Mining And Manufacturing Company Method of hydrophilizing or hydrophobizing polymers
US5336742A (en) * 1987-03-13 1994-08-09 Minnesota Mining And Manufacturing Company Polymeric supports
US4737560A (en) * 1987-03-13 1988-04-12 Minnesota Mining And Manufacturing Company Polymer beads
US5292840A (en) * 1987-03-13 1994-03-08 Minnesota Mining And Manufacturing Company Polymeric supports
US4871824A (en) * 1987-03-13 1989-10-03 Minnesota Mining And Manufacturing Company Variably crosslinked polymeric supports
US5013795A (en) * 1989-04-10 1991-05-07 Minnesota Mining And Manufacturing Company Azlactone graft copolymers
US5744101A (en) * 1989-06-07 1998-04-28 Affymax Technologies N.V. Photolabile nucleoside protecting groups
US4981933A (en) * 1989-06-23 1991-01-01 Polaroid Corporation Azlactone copolymers
JPH0450946A (ja) * 1990-06-15 1992-02-19 Fujitsu Ltd 放射線レジストとパターン形成方法
US5200471A (en) * 1990-11-05 1993-04-06 Minnesota Mining And Manufacturing Company Biomolecules covalently immobilized with a high bound specific biological activity and method of preparing same
US5235015A (en) * 1991-02-21 1993-08-10 Minnesota Mining And Manufacturing Company High speed aqueous solvent developable photopolymer compositions
RU1794088C (ru) * 1991-03-18 1993-02-07 Институт Молекулярной Биологии Ан@ Ссср Способ определени нуклеотидной последовательности ДНК и устройство дл его осуществлени
US5352714A (en) * 1991-11-05 1994-10-04 Bausch & Lomb Incorporated Wettable silicone hydrogel compositions and methods for their manufacture
US5632957A (en) * 1993-11-01 1997-05-27 Nanogen Molecular biological diagnostic systems including electrodes
US5605662A (en) * 1993-11-01 1997-02-25 Nanogen, Inc. Active programmable electronic devices for molecular biological analysis and diagnostics
US5344701A (en) * 1992-06-09 1994-09-06 Minnesota Mining And Manufacturing Company Porous supports having azlactone-functional surfaces
JP3785599B2 (ja) * 1995-02-03 2006-06-14 ノバルティス アクチエンゲゼルシャフト エステル又はアミド基を含む架橋ポリマー
WO1996024644A1 (en) * 1995-02-10 1996-08-15 Minnesota Mining And Manufacturing Company Process for the production of an article coated with a crosslinked pressure sensitive adhesive
KR100206664B1 (ko) * 1995-06-28 1999-07-01 세키사와 다다시 화학증폭형 레지스트 조성물 및 레지스트 패턴의 형성방법
US5725989A (en) * 1996-04-15 1998-03-10 Chang; Jeffrey C. Laser addressable thermal transfer imaging element with an interlayer

Also Published As

Publication number Publication date
DE69912300T2 (de) 2004-07-29
US6372407B1 (en) 2002-04-16
JP4350906B2 (ja) 2009-10-28
EP1127293A1 (en) 2001-08-29
KR20010089379A (ko) 2001-10-06
AU749808B2 (en) 2002-07-04
WO2000026725A1 (en) 2000-05-11
US6156478A (en) 2000-12-05
JP2002529543A (ja) 2002-09-10
CN1325505A (zh) 2001-12-05
EP1127293B1 (en) 2003-10-22
DE69912300D1 (de) 2003-11-27
AU2902199A (en) 2000-05-22

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