KR100228975B1 - 비점수차, 보우 왜곡 및 필드 곡률을 교정하기 위한 장치 및 그 방법 - Google Patents

비점수차, 보우 왜곡 및 필드 곡률을 교정하기 위한 장치 및 그 방법 Download PDF

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Publication number
KR100228975B1
KR100228975B1 KR1019950013799A KR19950013799A KR100228975B1 KR 100228975 B1 KR100228975 B1 KR 100228975B1 KR 1019950013799 A KR1019950013799 A KR 1019950013799A KR 19950013799 A KR19950013799 A KR 19950013799A KR 100228975 B1 KR100228975 B1 KR 100228975B1
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KR
South Korea
Prior art keywords
scanning
lens
cylindrical mirror
concave cylindrical
incident light
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Expired - Fee Related
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KR1019950013799A
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English (en)
Korean (ko)
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KR950033946A (ko
Inventor
몬로 코브 죠슈아
죠이 플래터리-프리든버그 캔더스
엑스. 토폴로벡 프란즈
아티스 지민스 얼디스
Original Assignee
포만 제프리 엘
인터내셔널 비지네스 머신즈 코포레이션
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Publication of KR950033946A publication Critical patent/KR950033946A/ko
Application granted granted Critical
Publication of KR100228975B1 publication Critical patent/KR100228975B1/ko
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0031—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration for scanning purposes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/105—Scanning systems with one or more pivoting mirrors or galvano-mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Laser Beam Processing (AREA)
  • Lenses (AREA)
KR1019950013799A 1994-05-31 1995-05-30 비점수차, 보우 왜곡 및 필드 곡률을 교정하기 위한 장치 및 그 방법 Expired - Fee Related KR100228975B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US25089094A 1994-05-31 1994-05-31
US08/250,890 1994-05-31
US8/250,890 1994-05-31

Publications (2)

Publication Number Publication Date
KR950033946A KR950033946A (ko) 1995-12-26
KR100228975B1 true KR100228975B1 (ko) 1999-11-01

Family

ID=22949573

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950013799A Expired - Fee Related KR100228975B1 (ko) 1994-05-31 1995-05-30 비점수차, 보우 왜곡 및 필드 곡률을 교정하기 위한 장치 및 그 방법

Country Status (5)

Country Link
US (2) US5828481A (https=)
EP (1) EP0686864A1 (https=)
JP (1) JP3147282B2 (https=)
KR (1) KR100228975B1 (https=)
TW (1) TW314666B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101369635B1 (ko) * 2006-08-31 2014-03-05 비아 메카닉스 가부시키가이샤 레이저 가공 방법 및 레이저 가공 장치

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US6469729B1 (en) * 1999-10-15 2002-10-22 Videojet Technologies Inc. Laser marking device and method for marking arcuate surfaces
TW552645B (en) 2001-08-03 2003-09-11 Semiconductor Energy Lab Laser irradiating device, laser irradiating method and manufacturing method of semiconductor device
JP4397571B2 (ja) 2001-09-25 2010-01-13 株式会社半導体エネルギー研究所 レーザ照射方法およびレーザ照射装置、並びに半導体装置の作製方法
DE10310602A1 (de) * 2003-03-11 2004-09-23 Olympus Biosystems Gmbh Zwischen wenigstens zwei optischen Systemen abbildende optische Abbildungsanordnung mit wenigstens einem torischen Spiegel
JP4408640B2 (ja) * 2003-03-17 2010-02-03 興和株式会社 眼科測定装置
US7466466B2 (en) * 2005-05-11 2008-12-16 Gsi Group Corporation Optical scanning method and system and method for correcting optical aberrations introduced into the system by a beam deflector
EP2106563A1 (en) * 2007-08-06 2009-10-07 Stephen Hastings Three-dimensional scanning method using a telecentric beam
CN101377567B (zh) * 2007-08-30 2011-06-15 株式会社东芝 光扫描装置、图像形成装置
DE102009057209B4 (de) * 2009-02-09 2012-06-28 Scansonic Mi Gmbh Vorrichtung mit Scanner-Optik zur Materialbearbeitung mittels Laser
EP2506291A1 (en) * 2011-03-28 2012-10-03 Excico France Method and apparatus for forming a straight line projection on a semiconductor substrate
JP5752082B2 (ja) * 2012-04-18 2015-07-22 株式会社日立エルジーデータストレージ 走査型投射装置
US9499909B2 (en) 2013-03-15 2016-11-22 Applied Materials, Inc. Methods for photo-excitation of precursors in epitaxial processes using a rotary scanning unit
CN109870825A (zh) * 2017-12-01 2019-06-11 北京万集科技股份有限公司 一种基于mems振镜的准直系统及激光雷达
DE102023203313A1 (de) 2023-04-12 2024-02-01 Carl Zeiss Smt Gmbh Optisches System für eine Projektionsbelichtungsvorrichtung

Family Cites Families (11)

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Publication number Priority date Publication date Assignee Title
DE2739119A1 (de) * 1977-08-31 1979-03-15 Elektro Optik Gmbh & Co Kg Mehrgliedrige linsenanordnung zur korrektur von bildfehlern
DE3020342C2 (de) * 1980-05-29 1985-10-03 Elektro-Optik GmbH & Co KG, 2392 Glücksburg Optisch-mechanische Abtastvorrichtung
JPS6028612A (ja) * 1983-07-27 1985-02-13 Nippon Kogaku Kk <Nikon> 大口径比望遠レンズ
US4588269A (en) * 1984-07-05 1986-05-13 Eastman Kodak Company Apparatus which shapes gaussian beams by spherical mirrors
US4633272A (en) * 1985-04-02 1986-12-30 Eastman Kodak Company Laser printing apparatus having a multiple formatted output
US4796962A (en) * 1987-03-23 1989-01-10 Eastman Kodak Company Optical scanner
JP2647091B2 (ja) * 1987-06-19 1997-08-27 富士写真フイルム株式会社 レーザビーム走査装置
US5168454A (en) * 1989-10-30 1992-12-01 International Business Machines Corporation Formation of high quality patterns for substrates and apparatus therefor
JPH04287011A (ja) * 1991-03-18 1992-10-12 Hitachi Ltd 光走査装置及び該光走査装置を使用した記録装置
JPH04305615A (ja) * 1991-04-03 1992-10-28 Matsushita Electric Ind Co Ltd 異方屈折力単レンズ
JPH06118325A (ja) * 1992-10-09 1994-04-28 Ricoh Co Ltd 光走査装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101369635B1 (ko) * 2006-08-31 2014-03-05 비아 메카닉스 가부시키가이샤 레이저 가공 방법 및 레이저 가공 장치

Also Published As

Publication number Publication date
JP3147282B2 (ja) 2001-03-19
US5828481A (en) 1998-10-27
KR950033946A (ko) 1995-12-26
EP0686864A1 (en) 1995-12-13
JPH07333540A (ja) 1995-12-22
TW314666B (https=) 1997-09-01
US5754328A (en) 1998-05-19

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